FR1416542A - Improvement of the process for obtaining a gas mixture by bubbling a gas through a liquid mixture of volatile bodies - Google Patents

Improvement of the process for obtaining a gas mixture by bubbling a gas through a liquid mixture of volatile bodies

Info

Publication number
FR1416542A
FR1416542A FR989207A FR989207A FR1416542A FR 1416542 A FR1416542 A FR 1416542A FR 989207 A FR989207 A FR 989207A FR 989207 A FR989207 A FR 989207A FR 1416542 A FR1416542 A FR 1416542A
Authority
FR
France
Prior art keywords
gas
mixture
bubbling
improvement
obtaining
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR989207A
Other languages
French (fr)
Inventor
Jean-Pierre Biet
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Radiotechnique SA
Original Assignee
Radiotechnique SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Radiotechnique SA filed Critical Radiotechnique SA
Priority to FR989207A priority Critical patent/FR1416542A/en
Application granted granted Critical
Publication of FR1416542A publication Critical patent/FR1416542A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/10—Mixing gases with gases
    • B01F23/12—Mixing gases with gases with vaporisation of a liquid
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
FR989207A 1964-09-24 1964-09-24 Improvement of the process for obtaining a gas mixture by bubbling a gas through a liquid mixture of volatile bodies Expired FR1416542A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR989207A FR1416542A (en) 1964-09-24 1964-09-24 Improvement of the process for obtaining a gas mixture by bubbling a gas through a liquid mixture of volatile bodies

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR989207A FR1416542A (en) 1964-09-24 1964-09-24 Improvement of the process for obtaining a gas mixture by bubbling a gas through a liquid mixture of volatile bodies

Publications (1)

Publication Number Publication Date
FR1416542A true FR1416542A (en) 1965-11-05

Family

ID=8839005

Family Applications (1)

Application Number Title Priority Date Filing Date
FR989207A Expired FR1416542A (en) 1964-09-24 1964-09-24 Improvement of the process for obtaining a gas mixture by bubbling a gas through a liquid mixture of volatile bodies

Country Status (1)

Country Link
FR (1) FR1416542A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995008387A1 (en) * 1993-09-24 1995-03-30 Lentek S.R.L. Method and device for the controlled forming and feeding of a gaseous atmosphere having at least two components, and application in plants of thermal or carburizing treatment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995008387A1 (en) * 1993-09-24 1995-03-30 Lentek S.R.L. Method and device for the controlled forming and feeding of a gaseous atmosphere having at least two components, and application in plants of thermal or carburizing treatment
US5749978A (en) * 1993-09-24 1998-05-12 Lentek S.R.L. Method and device for the controlled forming and feeding of a gaseous atmosphere having at least two components, and application in plants of thermal or carburizing treatment

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