FR1409289A - Perfectionnements à l'obtention automatique de couches minces, et produits ainsi obtenus - Google Patents

Perfectionnements à l'obtention automatique de couches minces, et produits ainsi obtenus

Info

Publication number
FR1409289A
FR1409289A FR974791A FR974791A FR1409289A FR 1409289 A FR1409289 A FR 1409289A FR 974791 A FR974791 A FR 974791A FR 974791 A FR974791 A FR 974791A FR 1409289 A FR1409289 A FR 1409289A
Authority
FR
France
Prior art keywords
products
thin layers
automatic production
automatic
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR974791A
Other languages
English (en)
Inventor
Pierre Lostis
Jacques Simon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Original Assignee
Centre National de la Recherche Scientifique CNRS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS filed Critical Centre National de la Recherche Scientifique CNRS
Priority to FR974791A priority Critical patent/FR1409289A/fr
Application granted granted Critical
Publication of FR1409289A publication Critical patent/FR1409289A/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
FR974791A 1964-05-15 1964-05-15 Perfectionnements à l'obtention automatique de couches minces, et produits ainsi obtenus Expired FR1409289A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR974791A FR1409289A (fr) 1964-05-15 1964-05-15 Perfectionnements à l'obtention automatique de couches minces, et produits ainsi obtenus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR974791A FR1409289A (fr) 1964-05-15 1964-05-15 Perfectionnements à l'obtention automatique de couches minces, et produits ainsi obtenus

Publications (1)

Publication Number Publication Date
FR1409289A true FR1409289A (fr) 1965-08-27

Family

ID=8830219

Family Applications (1)

Application Number Title Priority Date Filing Date
FR974791A Expired FR1409289A (fr) 1964-05-15 1964-05-15 Perfectionnements à l'obtention automatique de couches minces, et produits ainsi obtenus

Country Status (1)

Country Link
FR (1) FR1409289A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000043119A1 (fr) * 1999-01-26 2000-07-27 Symyx Technologies, Inc. Appareil programmable permettant de deposer une composition a gradient par co-deposition
US6830663B2 (en) 1999-01-26 2004-12-14 Symyx Technologies, Inc. Method for creating radial profiles on a substrate

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000043119A1 (fr) * 1999-01-26 2000-07-27 Symyx Technologies, Inc. Appareil programmable permettant de deposer une composition a gradient par co-deposition
US6364956B1 (en) 1999-01-26 2002-04-02 Symyx Technologies, Inc. Programmable flux gradient apparatus for co-deposition of materials onto a substrate
US6632285B2 (en) 1999-01-26 2003-10-14 Symyx Technologies, Inc. Programmable flux gradient apparatus for co-deposition of materials onto a substrate
US6830663B2 (en) 1999-01-26 2004-12-14 Symyx Technologies, Inc. Method for creating radial profiles on a substrate

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