FR1402377A - Formation of p-n junctions in silicon - Google Patents

Formation of p-n junctions in silicon

Info

Publication number
FR1402377A
FR1402377A FR982841A FR982841A FR1402377A FR 1402377 A FR1402377 A FR 1402377A FR 982841 A FR982841 A FR 982841A FR 982841 A FR982841 A FR 982841A FR 1402377 A FR1402377 A FR 1402377A
Authority
FR
France
Prior art keywords
junctions
silicon
formation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR982841A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CBS Corp
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27248176&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=FR1402377(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from US297343A external-priority patent/US3271211A/en
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Priority to FR982841A priority Critical patent/FR1402377A/en
Application granted granted Critical
Publication of FR1402377A publication Critical patent/FR1402377A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/02Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion materials in the solid state
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/04Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion materials in the liquid state
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • C30B33/08Etching
    • C30B33/10Etching in solutions or melts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
FR982841A 1963-07-24 1964-07-23 Formation of p-n junctions in silicon Expired FR1402377A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR982841A FR1402377A (en) 1963-07-24 1964-07-23 Formation of p-n junctions in silicon

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US297343A US3271211A (en) 1963-07-24 1963-07-24 Processing semiconductive material
US297309A US3271210A (en) 1963-07-24 1963-07-24 Formation of p-nu junctions in silicon
FR982841A FR1402377A (en) 1963-07-24 1964-07-23 Formation of p-n junctions in silicon

Publications (1)

Publication Number Publication Date
FR1402377A true FR1402377A (en) 1965-06-11

Family

ID=27248176

Family Applications (1)

Application Number Title Priority Date Filing Date
FR982841A Expired FR1402377A (en) 1963-07-24 1964-07-23 Formation of p-n junctions in silicon

Country Status (1)

Country Link
FR (1) FR1402377A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016162608A1 (en) 2015-04-10 2016-10-13 Ab7 Innovation S.A.S.U Controlled stand-alone matrix system for the controlled distribution of active substances

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016162608A1 (en) 2015-04-10 2016-10-13 Ab7 Innovation S.A.S.U Controlled stand-alone matrix system for the controlled distribution of active substances

Similar Documents

Publication Publication Date Title
DD76744A5 (en) Symmetrical switchable semiconductor component
CH474851A (en) Semiconductor device
FR1435786A (en) Process for the preparation of p-n junctions in silicon
FR1398424A (en) Semiconductor device
FR1386650A (en) Semiconductor device
CH429953A (en) Semiconductor device
CH438497A (en) Semiconductor device
FR1225563A (en) Fused junctions in silicon carbide
CH406446A (en) Semiconductor component
FR1421136A (en) Semiconductor device with auxiliary junction to improve the breakdown characteristic of the main junction
FR1402377A (en) Formation of p-n junctions in silicon
AT264623B (en) Semiconductor thermoelectric device
CH469357A (en) Semiconductor device
CH427043A (en) Semiconductor device
CH426018A (en) Semiconductor component of the pnpn type
FR1389820A (en) Semiconductor device
CH399601A (en) Semiconductor device
CH458545A (en) Semiconductor element
CH477093A (en) Semiconductor element
FR1537646A (en) Silicon planar transistor
SE339267C (en) Controllable semiconductor device of PNPN type
FR1348174A (en) Epitaxial growth of silicon crystals
AT243859B (en) Semiconductor device
FR1518231A (en) Sun protection agents containing silicon
CH440479A (en) Semiconductor device