FR1397575A - Photopolymérisation de compositions organiques non saturées de type éthylénique - Google Patents

Photopolymérisation de compositions organiques non saturées de type éthylénique

Info

Publication number
FR1397575A
FR1397575A FR972980A FR972980A FR1397575A FR 1397575 A FR1397575 A FR 1397575A FR 972980 A FR972980 A FR 972980A FR 972980 A FR972980 A FR 972980A FR 1397575 A FR1397575 A FR 1397575A
Authority
FR
France
Prior art keywords
ethylenic
photopolymerization
compositions
unsaturated organic
unsaturated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR972980A
Other languages
English (en)
Inventor
Gerard Albert Delzenne
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Gevaert Photo Producten NV
Original Assignee
Gevaert Photo Producten NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gevaert Photo Producten NV filed Critical Gevaert Photo Producten NV
Application granted granted Critical
Publication of FR1397575A publication Critical patent/FR1397575A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/36—Polymerisation in solid state
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/42—Nitriles
    • C08F20/44—Acrylonitrile
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/52—Amides or imides
    • C08F20/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/62—Monocarboxylic acids having ten or more carbon atoms; Derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F26/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • C08F26/06—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
FR972980A 1963-05-02 1964-04-30 Photopolymérisation de compositions organiques non saturées de type éthylénique Expired FR1397575A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US277460A US3297440A (en) 1963-05-02 1963-05-02 Photopolymerization of ethylenically unsaturated organic compositions and the formation of a relief image

Publications (1)

Publication Number Publication Date
FR1397575A true FR1397575A (fr) 1965-04-30

Family

ID=23060969

Family Applications (1)

Application Number Title Priority Date Filing Date
FR972980A Expired FR1397575A (fr) 1963-05-02 1964-04-30 Photopolymérisation de compositions organiques non saturées de type éthylénique

Country Status (5)

Country Link
US (1) US3297440A (fr)
BE (1) BE647442A (fr)
DE (1) DE1300672B (fr)
FR (1) FR1397575A (fr)
GB (1) GB1066083A (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3678850A (en) * 1966-05-02 1972-07-25 Xerox Corp Porous printing plate prepared from particulate photosensitive resinous material
US3944417A (en) * 1968-11-27 1976-03-16 Hoechst Aktiengesellschaft Process for the electrophotographic production of printing plates
US3871885A (en) * 1971-05-18 1975-03-18 Du Pont Crystalline photo-polymerizable composition
US3862855A (en) * 1972-12-04 1975-01-28 Eastman Kodak Co Photographic receiver elements containing a cobalt(III) ion complex
US4324852A (en) * 1974-04-15 1982-04-13 Eastman Kodak Company Transition metal photoreduction systems and processes
US4195998A (en) * 1974-04-15 1980-04-01 Eastman Kodak Company CO(III) Complex containing radiation sensitive element with diazo recording layer
CA1051705A (fr) * 1974-04-15 1979-04-03 Thap Dominh Formation d'images au moyen d'un complexe a metal de transition a gain eleve
US4201588A (en) * 1974-04-15 1980-05-06 Eastman Kodak Company Radiation sensitive co(III)complex photoreduction element with image recording layer
US4239848A (en) * 1979-02-26 1980-12-16 Eastman Kodak Company Photocrosslinkable carbonyl-containing polymeric composition and element with cobalt complex
EP0555749B1 (fr) * 1992-02-14 1999-05-19 Shipley Company Inc. Compositions sensibles aux rayonnements et procédés

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2880153A (en) * 1957-01-28 1959-03-31 American Viscose Corp Photopolymerization process
US2972540A (en) * 1958-08-05 1961-02-21 Du Pont Photopolymerizable compositions and elements

Also Published As

Publication number Publication date
BE647442A (fr) 1964-08-31
DE1300672B (de) 1969-08-07
US3297440A (en) 1967-01-10
GB1066083A (en) 1967-04-19

Similar Documents

Publication Publication Date Title
FR1381265A (fr) Préparation de polysulfures organiques
FR1487052A (fr) Compositions photoconductrices organiques persistantes
FR1397575A (fr) Photopolymérisation de compositions organiques non saturées de type éthylénique
FR1187771A (fr) Polymérisation de composés organiques non saturés
BE754916A (nl) Fotopolymerisatie van ethylenisch onverzadigde organische verbindingen
FR1456277A (fr) Dérivés organiques du silicium métallocénylaryl-substitués
BE619971A (nl) Fotografische ontwikkelsamenstellingen
FR1319255A (fr) Compositions adhésives
CH435521A (de) Riechstoffkomposition
IT955003B (it) Composizioni propellenti
FR1414274A (fr) Plâtres légers
CH442738A (de) Härtbare Polymermasse
FR1424599A (fr) Compositions durcissables
OA01219A (fr) Fabrication de disulfures organiques.
BE615088A (fr) Composition thérapeutique parfumée
FR2557M (fr) Composition pharmaceutique.
FR1319095A (fr) Servomécanisme hydraulique
FR1306648A (fr) Composition désinfectante
FR1316295A (fr) Silicates organiques
FR1316398A (fr) Silicates organiques
FR1364168A (fr) Dérivés organiques du silicium
FR1353723A (fr) Compositions de matières colorantes
FR1386688A (fr) Nouveaux polyisocyanates organiques
FR1410551A (fr) Compositions polymérisables contenant des groupements éther insaturés
FR1376479A (fr) Fabrication de diacides organiques