FR1363984A - Photo-sensitive diazo coated composite sheet - Google Patents

Photo-sensitive diazo coated composite sheet

Info

Publication number
FR1363984A
FR1363984A FR931982A FR931982A FR1363984A FR 1363984 A FR1363984 A FR 1363984A FR 931982 A FR931982 A FR 931982A FR 931982 A FR931982 A FR 931982A FR 1363984 A FR1363984 A FR 1363984A
Authority
FR
France
Prior art keywords
photo
composite sheet
coated composite
sensitive diazo
diazo coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR931982A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Priority to FR931982A priority Critical patent/FR1363984A/en
Application granted granted Critical
Publication of FR1363984A publication Critical patent/FR1363984A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
FR931982A 1962-04-27 1963-04-19 Photo-sensitive diazo coated composite sheet Expired FR1363984A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR931982A FR1363984A (en) 1962-04-27 1963-04-19 Photo-sensitive diazo coated composite sheet

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US19078962A 1962-04-27 1962-04-27
FR931982A FR1363984A (en) 1962-04-27 1963-04-19 Photo-sensitive diazo coated composite sheet

Publications (1)

Publication Number Publication Date
FR1363984A true FR1363984A (en) 1964-06-19

Family

ID=26200867

Family Applications (1)

Application Number Title Priority Date Filing Date
FR931982A Expired FR1363984A (en) 1962-04-27 1963-04-19 Photo-sensitive diazo coated composite sheet

Country Status (1)

Country Link
FR (1) FR1363984A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2452731A1 (en) * 1979-03-28 1980-10-24 Rhone Poulenc Syst WATER-DEVELOPABLE FILM-FORMING PHOTOPOLYMERIZABLE COMPOSITIONS
FR2508188A1 (en) * 1981-06-19 1982-12-24 Sericol Group Ltd PHOTOSENSITIVE COMPOSITIONS AND THEIR USE
FR2510770A1 (en) * 1981-06-15 1983-02-04 Polychrome Corp RADIATION EXPOSURE-SENSITIVE COMPOSITION FOR LITHOGRAPHIC PLATES
FR2510771A1 (en) * 1981-06-15 1983-02-04 Polychrome Corp COMPOSITION SENSITIVE TO RADIATION EXPOSURE FOR LITHOGRAPHIC PLATES
EP0089506A2 (en) * 1982-03-18 1983-09-28 American Hoechst Corporation Light-sensitive mixture based on polycondensation products of diazonium salts, and light-sensitive recording material made therefrom

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2452731A1 (en) * 1979-03-28 1980-10-24 Rhone Poulenc Syst WATER-DEVELOPABLE FILM-FORMING PHOTOPOLYMERIZABLE COMPOSITIONS
EP0018860A1 (en) * 1979-03-28 1980-11-12 Rhone-Poulenc Systemes Water-developable photopolymerisable film-forming compositions and lithographic plate
FR2510770A1 (en) * 1981-06-15 1983-02-04 Polychrome Corp RADIATION EXPOSURE-SENSITIVE COMPOSITION FOR LITHOGRAPHIC PLATES
FR2510771A1 (en) * 1981-06-15 1983-02-04 Polychrome Corp COMPOSITION SENSITIVE TO RADIATION EXPOSURE FOR LITHOGRAPHIC PLATES
FR2508188A1 (en) * 1981-06-19 1982-12-24 Sericol Group Ltd PHOTOSENSITIVE COMPOSITIONS AND THEIR USE
EP0089506A2 (en) * 1982-03-18 1983-09-28 American Hoechst Corporation Light-sensitive mixture based on polycondensation products of diazonium salts, and light-sensitive recording material made therefrom
EP0089506A3 (en) * 1982-03-18 1984-04-11 American Hoechst Corporation Light-sensitive mixture based on polycondensation products of diazonium salts, and light-sensitive recording material made therefrom

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