FR1352900A - Photosensitive diazo compositions - Google Patents

Photosensitive diazo compositions

Info

Publication number
FR1352900A
FR1352900A FR920030A FR920030A FR1352900A FR 1352900 A FR1352900 A FR 1352900A FR 920030 A FR920030 A FR 920030A FR 920030 A FR920030 A FR 920030A FR 1352900 A FR1352900 A FR 1352900A
Authority
FR
France
Prior art keywords
photosensitive diazo
diazo compositions
compositions
photosensitive
diazo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR920030A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US163055A external-priority patent/US3154417A/en
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Priority to FR920030A priority Critical patent/FR1352900A/en
Application granted granted Critical
Publication of FR1352900A publication Critical patent/FR1352900A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
FR920030A 1961-12-29 1962-12-28 Photosensitive diazo compositions Expired FR1352900A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR920030A FR1352900A (en) 1961-12-29 1962-12-28 Photosensitive diazo compositions

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US163055A US3154417A (en) 1961-12-29 1961-12-29 Heat developable light sensitive diazo compositions containing dicyandiamide
FR920030A FR1352900A (en) 1961-12-29 1962-12-28 Photosensitive diazo compositions

Publications (1)

Publication Number Publication Date
FR1352900A true FR1352900A (en) 1964-02-21

Family

ID=26199150

Family Applications (1)

Application Number Title Priority Date Filing Date
FR920030A Expired FR1352900A (en) 1961-12-29 1962-12-28 Photosensitive diazo compositions

Country Status (1)

Country Link
FR (1) FR1352900A (en)

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