FR1304205A - Photosensitive composition usable for the preparation of photoresists - Google Patents

Photosensitive composition usable for the preparation of photoresists

Info

Publication number
FR1304205A
FR1304205A FR871462A FR871462A FR1304205A FR 1304205 A FR1304205 A FR 1304205A FR 871462 A FR871462 A FR 871462A FR 871462 A FR871462 A FR 871462A FR 1304205 A FR1304205 A FR 1304205A
Authority
FR
France
Prior art keywords
photoresists
preparation
photosensitive composition
composition usable
usable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR871462A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Pathe SA
Original Assignee
Kodak Pathe SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US51695A external-priority patent/US3072485A/en
Application filed by Kodak Pathe SA filed Critical Kodak Pathe SA
Priority to FR871462A priority Critical patent/FR1304205A/en
Application granted granted Critical
Publication of FR1304205A publication Critical patent/FR1304205A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/34—Introducing sulfur atoms or sulfur-containing groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
FR871462A 1960-08-24 1961-08-23 Photosensitive composition usable for the preparation of photoresists Expired FR1304205A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR871462A FR1304205A (en) 1960-08-24 1961-08-23 Photosensitive composition usable for the preparation of photoresists

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US51695A US3072485A (en) 1960-08-24 1960-08-24 Optically sensitized azido polymers for photomechanical resist compositions
FR871462A FR1304205A (en) 1960-08-24 1961-08-23 Photosensitive composition usable for the preparation of photoresists

Publications (1)

Publication Number Publication Date
FR1304205A true FR1304205A (en) 1962-09-21

Family

ID=26192004

Family Applications (1)

Application Number Title Priority Date Filing Date
FR871462A Expired FR1304205A (en) 1960-08-24 1961-08-23 Photosensitive composition usable for the preparation of photoresists

Country Status (1)

Country Link
FR (1) FR1304205A (en)

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