FR1018953A - Couches photosensibles pour la technique de la reproduction graphique - Google Patents
Couches photosensibles pour la technique de la reproduction graphiqueInfo
- Publication number
- FR1018953A FR1018953A FR1018953DA FR1018953A FR 1018953 A FR1018953 A FR 1018953A FR 1018953D A FR1018953D A FR 1018953DA FR 1018953 A FR1018953 A FR 1018953A
- Authority
- FR
- France
- Prior art keywords
- photosensitive layers
- reproduction technology
- graphic reproduction
- graphic
- technology
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEP42777A DE832546C (de) | 1949-05-14 | 1949-05-14 | Lichtempfindliche Schichten fuer die Reproduktionstechnik |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1018953A true FR1018953A (fr) | 1953-01-15 |
Family
ID=7378888
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1018953D Expired FR1018953A (fr) | 1949-05-14 | 1950-05-02 | Couches photosensibles pour la technique de la reproduction graphique |
Country Status (5)
Country | Link |
---|---|
US (1) | US2687958A (fr) |
DE (1) | DE832546C (fr) |
FR (1) | FR1018953A (fr) |
GB (1) | GB676665A (fr) |
NL (1) | NL150528B (fr) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE540601A (fr) * | 1950-12-06 | |||
US3003873A (en) * | 1953-12-23 | 1961-10-10 | Rca Corp | Color kinescopes and methods of making the same |
GB763288A (en) * | 1954-06-16 | 1956-12-12 | Kodak Ltd | Improvements in photo mechanical processes and materials therefor |
DE955928C (de) * | 1954-06-18 | 1957-01-10 | Kalle & Co Ag | Verfahren zur photomechanischen Herstellung von Metalldruckformen unter Verwendung von Diazosulfonaten als Lichtempfindliche Substanzen |
DE949383C (de) * | 1954-08-26 | 1956-09-20 | Kalle & Co Ag | Lichtempfindliche Metallfolie fuer die Druckplattenherstellung, welche mit Diazosulfonaten lichtempfindlich gemacht ist |
US2852379A (en) * | 1955-05-04 | 1958-09-16 | Eastman Kodak Co | Azide resin photolithographic composition |
US2990281A (en) * | 1956-12-17 | 1961-06-27 | Monsanto Chemicals | Photosensitive resinous compositions and photographic elements |
NL102798C (fr) * | 1956-12-28 | |||
BE563723A (fr) * | 1957-01-04 | |||
US2996381A (en) * | 1957-07-02 | 1961-08-15 | Kalvar Corp | Photographic materials and procedures for using same |
NL103360C (fr) * | 1957-08-03 | 1962-07-16 | ||
US2982648A (en) * | 1958-06-09 | 1961-05-02 | Gen Aniline & Film Corp | Process of producing a master plate for offset printing and the master plate so produced |
NL132073C (fr) * | 1959-10-03 | |||
US3114651A (en) * | 1960-07-22 | 1963-12-17 | American Cyanamid Co | Water insolubilization of acrylamido polymers with a salt of trivalent chromium |
US3118765A (en) * | 1960-08-26 | 1964-01-21 | Litho Chemical And Supply Co I | Lithographic product comprising lightsensitive diazido stilbene sulfonic acid salt |
NL275561A (fr) * | 1961-03-15 | |||
US3227555A (en) * | 1961-10-02 | 1966-01-04 | Eastman Kodak Co | Raw striping process for sonotrack dispersions |
US3375113A (en) * | 1962-09-21 | 1968-03-26 | Scott Paper Co | Sensitizing planographic plates for photo-lithography |
US3255007A (en) * | 1963-03-19 | 1966-06-07 | Keuffel & Esser Co | Diazotype reproduction materials |
US3469981A (en) * | 1963-03-19 | 1969-09-30 | Keuffel & Esser Co | Diazotype reproduction materials |
US3287128A (en) * | 1963-04-22 | 1966-11-22 | Martin Mariatta Corp | Lithographic plates and coatings |
US3348948A (en) * | 1964-03-11 | 1967-10-24 | Litho Chemical & Supply Co Inc | Presensitized deep etch lithographic plates |
US3850646A (en) * | 1970-03-24 | 1974-11-26 | H Wagner | Light sensitive photographic element |
US3715210A (en) * | 1971-02-19 | 1973-02-06 | Howson Algraphy Ltd | Lithographic printing plates |
US3790382A (en) * | 1971-04-16 | 1974-02-05 | Minnesota Mining & Mfg | Fluorinated polyamide-diazo resin coating composition |
US4131466A (en) * | 1972-03-05 | 1978-12-26 | Somar Manufacturing Co., Ltd. | Photographic method of making relief member with negative dye image |
JPS515935B2 (fr) * | 1972-04-17 | 1976-02-24 | ||
US3900325A (en) * | 1972-06-12 | 1975-08-19 | Shipley Co | Light sensitive quinone diazide composition with n-3-oxohydrocarbon substituted acrylamide |
US4194912A (en) * | 1973-10-29 | 1980-03-25 | Rca Corporation | Water based photoresist |
JPS51149021A (en) * | 1974-12-28 | 1976-12-21 | Fuji Yakuhin Kogyo Kk | Water soluble photosensitive resin composition |
US4211563A (en) * | 1978-02-13 | 1980-07-08 | Rca Corporation | Aqueous photoresist of casein and N-methylol acrylamide |
US4158566A (en) * | 1978-02-13 | 1979-06-19 | Rca Corporation | Aqueous photoresist comprising casein and methylol acrylamide |
JPS56101144A (en) * | 1980-01-16 | 1981-08-13 | Kimoto & Co Ltd | Photosensitive material and its developing method |
US4247615A (en) * | 1980-03-06 | 1981-01-27 | Eastman Kodak Company | Continuous-tone dyed diazo imaging process |
US4264706A (en) * | 1980-03-12 | 1981-04-28 | Eastman Kodak Company | Dichromated hydrophilic colloid-latex copolymer compositions |
JPH01128064A (ja) * | 1987-11-12 | 1989-05-19 | Chisso Corp | 光硬化性樹脂組成物 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE332468A (fr) * | 1922-11-18 | |||
US1628279A (en) * | 1924-05-28 | 1927-05-10 | Kalle & Co Ag | Sensitive layer on alpha suitable base and process of making same |
BE365001A (fr) * | 1928-11-03 | |||
US2184288A (en) * | 1937-06-14 | 1939-12-26 | Du Pont | Photographic and printing media |
BE447449A (fr) * | 1941-12-13 | |||
US2461023A (en) * | 1944-10-25 | 1949-02-08 | Gen Aniline & Film Corp | Photographic silver halide emulsions |
US2522771A (en) * | 1944-11-03 | 1950-09-19 | Gen Aniline & Film Corp | Photographic silver halide emulsions |
-
0
- NL NL747406030A patent/NL150528B/xx unknown
-
1949
- 1949-05-14 DE DEP42777A patent/DE832546C/de not_active Expired
-
1950
- 1950-05-02 FR FR1018953D patent/FR1018953A/fr not_active Expired
- 1950-05-10 US US161260A patent/US2687958A/en not_active Expired - Lifetime
- 1950-05-12 GB GB11963/50A patent/GB676665A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
NL150528B (nl) | |
DE832546C (de) | 1952-02-25 |
US2687958A (en) | 1954-08-31 |
GB676665A (en) | 1952-07-30 |
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