FI922852A0 - Menetelmä ja laitteisto nestemäisten reagenssien syöttämiseksi kemialliseen reaktoriin - Google Patents

Menetelmä ja laitteisto nestemäisten reagenssien syöttämiseksi kemialliseen reaktoriin

Info

Publication number
FI922852A0
FI922852A0 FI922852A FI922852A FI922852A0 FI 922852 A0 FI922852 A0 FI 922852A0 FI 922852 A FI922852 A FI 922852A FI 922852 A FI922852 A FI 922852A FI 922852 A0 FI922852 A0 FI 922852A0
Authority
FI
Finland
Prior art keywords
supplying liquid
chemical reactor
liquid reagents
reagents
reactor
Prior art date
Application number
FI922852A
Other languages
English (en)
Swedish (sv)
Other versions
FI922852A (fi
FI91422B (fi
FI91422C (fi
Inventor
Tuomo Suntola
Sven Lindfors
Markku Tammenmaa
Pekka Soininen
Vesa Lujala
Original Assignee
Mikrokemia Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mikrokemia Oy filed Critical Mikrokemia Oy
Priority to FI922852A priority Critical patent/FI91422C/fi
Publication of FI922852A0 publication Critical patent/FI922852A0/fi
Priority to FR9307243A priority patent/FR2692597A1/fr
Publication of FI922852A publication Critical patent/FI922852A/fi
Publication of FI91422B publication Critical patent/FI91422B/fi
Application granted granted Critical
Publication of FI91422C publication Critical patent/FI91422C/fi

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
FI922852A 1992-06-18 1992-06-18 Menetelmä ja laitteisto nestemäisten reagenssien syöttämiseksi kemialliseen reaktoriin FI91422C (fi)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FI922852A FI91422C (fi) 1992-06-18 1992-06-18 Menetelmä ja laitteisto nestemäisten reagenssien syöttämiseksi kemialliseen reaktoriin
FR9307243A FR2692597A1 (fr) 1992-06-18 1993-06-16 Procédé et appareil pour introduire des réactifs en phase liquide dans un réacteur chimique, et application au dépôt chimique en phase vapeur d'un revêtement sur un substrat.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI922852 1992-06-18
FI922852A FI91422C (fi) 1992-06-18 1992-06-18 Menetelmä ja laitteisto nestemäisten reagenssien syöttämiseksi kemialliseen reaktoriin

Publications (4)

Publication Number Publication Date
FI922852A0 true FI922852A0 (fi) 1992-06-18
FI922852A FI922852A (fi) 1993-12-19
FI91422B FI91422B (fi) 1994-03-15
FI91422C FI91422C (fi) 1994-06-27

Family

ID=8535501

Family Applications (1)

Application Number Title Priority Date Filing Date
FI922852A FI91422C (fi) 1992-06-18 1992-06-18 Menetelmä ja laitteisto nestemäisten reagenssien syöttämiseksi kemialliseen reaktoriin

Country Status (2)

Country Link
FI (1) FI91422C (fi)
FR (1) FR2692597A1 (fi)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW565626B (en) * 1996-11-20 2003-12-11 Ebara Corp Liquid feed vaporization system and gas injection device
US6635114B2 (en) 1999-12-17 2003-10-21 Applied Material, Inc. High temperature filter for CVD apparatus
US6620723B1 (en) 2000-06-27 2003-09-16 Applied Materials, Inc. Formation of boride barrier layers using chemisorption techniques
US6551929B1 (en) 2000-06-28 2003-04-22 Applied Materials, Inc. Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniques
US7964505B2 (en) 2005-01-19 2011-06-21 Applied Materials, Inc. Atomic layer deposition of tungsten materials
US7732327B2 (en) 2000-06-28 2010-06-08 Applied Materials, Inc. Vapor deposition of tungsten materials
US7405158B2 (en) 2000-06-28 2008-07-29 Applied Materials, Inc. Methods for depositing tungsten layers employing atomic layer deposition techniques
US6825447B2 (en) 2000-12-29 2004-11-30 Applied Materials, Inc. Apparatus and method for uniform substrate heating and contaminate collection
US6765178B2 (en) 2000-12-29 2004-07-20 Applied Materials, Inc. Chamber for uniform substrate heating
US6951804B2 (en) 2001-02-02 2005-10-04 Applied Materials, Inc. Formation of a tantalum-nitride layer
US6660126B2 (en) 2001-03-02 2003-12-09 Applied Materials, Inc. Lid assembly for a processing system to facilitate sequential deposition techniques
US6878206B2 (en) 2001-07-16 2005-04-12 Applied Materials, Inc. Lid assembly for a processing system to facilitate sequential deposition techniques
US6734020B2 (en) 2001-03-07 2004-05-11 Applied Materials, Inc. Valve control system for atomic layer deposition chamber
US7211144B2 (en) 2001-07-13 2007-05-01 Applied Materials, Inc. Pulsed nucleation deposition of tungsten layers
US6916398B2 (en) 2001-10-26 2005-07-12 Applied Materials, Inc. Gas delivery apparatus and method for atomic layer deposition
US6729824B2 (en) 2001-12-14 2004-05-04 Applied Materials, Inc. Dual robot processing system
US6620670B2 (en) 2002-01-18 2003-09-16 Applied Materials, Inc. Process conditions and precursors for atomic layer deposition (ALD) of AL2O3
US6998014B2 (en) 2002-01-26 2006-02-14 Applied Materials, Inc. Apparatus and method for plasma assisted deposition
US6911391B2 (en) 2002-01-26 2005-06-28 Applied Materials, Inc. Integration of titanium and titanium nitride layers
US6827978B2 (en) 2002-02-11 2004-12-07 Applied Materials, Inc. Deposition of tungsten films
US6833161B2 (en) 2002-02-26 2004-12-21 Applied Materials, Inc. Cyclical deposition of tungsten nitride for metal oxide gate electrode
US6720027B2 (en) 2002-04-08 2004-04-13 Applied Materials, Inc. Cyclical deposition of a variable content titanium silicon nitride layer
US7279432B2 (en) 2002-04-16 2007-10-09 Applied Materials, Inc. System and method for forming an integrated barrier layer
KR100877020B1 (ko) * 2005-03-29 2009-01-07 가시오게산키 가부시키가이샤 증발 장치 및 액체 흡수 부재

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4076866A (en) * 1975-03-30 1978-02-28 Massachusetts Institute Of Technology Method of growing films by flash vaporization
JPS58143522A (ja) * 1982-02-19 1983-08-26 Matsushita Electric Ind Co Ltd 液体気化装置
DE8910733U1 (fi) * 1989-09-08 1990-04-12 Hussla, Ingo, Dr., 6450 Hanau, De
US5204314A (en) * 1990-07-06 1993-04-20 Advanced Technology Materials, Inc. Method for delivering an involatile reagent in vapor form to a CVD reactor

Also Published As

Publication number Publication date
FR2692597A1 (fr) 1993-12-24
FI922852A (fi) 1993-12-19
FI91422B (fi) 1994-03-15
FI91422C (fi) 1994-06-27

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