FI870357A - POLYMER ANALOGUE MODIFIED POLYMERATER. - Google Patents

POLYMER ANALOGUE MODIFIED POLYMERATER. Download PDF

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Publication number
FI870357A
FI870357A FI870357A FI870357A FI870357A FI 870357 A FI870357 A FI 870357A FI 870357 A FI870357 A FI 870357A FI 870357 A FI870357 A FI 870357A FI 870357 A FI870357 A FI 870357A
Authority
FI
Finland
Prior art keywords
meth
polymer
polymerater
copolymer
modified
Prior art date
Application number
FI870357A
Other languages
Finnish (fi)
Other versions
FI87226B (en
FI870357A0 (en
FI87226C (en
Inventor
Horst Koch
Walter Ziegler
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Publication of FI870357A0 publication Critical patent/FI870357A0/en
Publication of FI870357A publication Critical patent/FI870357A/en
Publication of FI87226B publication Critical patent/FI87226B/en
Application granted granted Critical
Publication of FI87226C publication Critical patent/FI87226C/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12Polymers provided for in subclasses C08C or C08F
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/14Esterification
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/30Introducing nitrogen atoms or nitrogen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/34Introducing sulfur atoms or sulfur-containing groups
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S525/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S525/91Polymer from ethylenic monomers only, having terminal unsaturation
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S525/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S525/911Polymer from ethylenic monomers only, having terminal functional group other than unsaturation

Abstract

Polymers which have been modified by a polymer-analogous reaction, in the acid form or in the form of their salts, consist of a copolymer of ethylene, (meth)acrylic acid and one or more compounds selected from the group consisting of vinyl esters, vinyl ethers, (meth)acrylates and (meth)acrylamides, and olefinically unsaturated side radicals which have been introduced into the said copolymer by a polymer-analogous reaction and are of the general formula I <IMAGE> I where X is hydroxyl, amino or mercapto, Y is an ester, amide, ether or C1-C10-alkylene group and R is hydrogen or methyl.
FI870357A 1986-01-28 1987-01-27 POLYMER ANALOGUE MODIFIED POLYMER FI87226C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19863602472 DE3602472A1 (en) 1986-01-28 1986-01-28 POLYMER ANALOG MODIFIED POLYMERISATE
DE3602472 1986-01-28

Publications (4)

Publication Number Publication Date
FI870357A0 FI870357A0 (en) 1987-01-27
FI870357A true FI870357A (en) 1987-07-29
FI87226B FI87226B (en) 1992-08-31
FI87226C FI87226C (en) 1992-12-10

Family

ID=6292778

Family Applications (1)

Application Number Title Priority Date Filing Date
FI870357A FI87226C (en) 1986-01-28 1987-01-27 POLYMER ANALOGUE MODIFIED POLYMER

Country Status (10)

Country Link
US (1) US4762892A (en)
EP (1) EP0231002B1 (en)
JP (1) JP2716432B2 (en)
AT (1) ATE79382T1 (en)
AU (1) AU592404B2 (en)
CA (1) CA1276333C (en)
DE (2) DE3602472A1 (en)
DK (1) DK42687A (en)
ES (1) ES2033696T3 (en)
FI (1) FI87226C (en)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3633436A1 (en) 1986-10-01 1988-04-14 Basf Ag PHOTOPOLYMERIZABLE RECORDING MEASURES, IN PARTICULAR FOR THE PRODUCTION OF PRINTING PLATES AND RELIEF FORMS
US4956252A (en) * 1988-08-30 1990-09-11 E. I. Dupont De Nemours And Company Aqueous processible photosensitive compositions containing core shell microgels
US5171655A (en) * 1989-08-03 1992-12-15 Fuji Photo Film Co., Ltd. Photohardenable light-sensitive composition
FI85499C (en) * 1989-12-18 1992-04-27 Neste Oy Preparation of an Ethylene-Vinyl Alcohol Acrylate Polymer That Can Crosslink and Use
US5407784A (en) * 1990-04-26 1995-04-18 W. R. Grace & Co.-Conn. Photocurable composition comprising maleic anhydride adduct of polybutadiene or butadiene copolymers
DE4023240A1 (en) * 1990-07-21 1992-01-23 Basf Ag MODIFIED EMULSION POLYMERISES, ESPECIALLY FOR PHOTOPOLYMERIZABLE RECORDING MATERIALS DEVELOPABLE IN WATER AND WAITRESS SOLVENTS
US5268257A (en) * 1990-08-01 1993-12-07 W. R. Grace & Co.-Conn. Aqueous developable, photocurable composition, and flexible, photosensitive articles made therefrom
WO1992005202A1 (en) * 1990-09-26 1992-04-02 Nippon Zeon Co., Ltd. Colored fine spherical grain, production thereof, and use thereof
US5290663A (en) * 1991-03-01 1994-03-01 W. R. Grace & Co.-Conn. Photocurable polyurethane-acrylate ionomer compositions for aqueous developable printing plates
US5328805A (en) * 1992-08-28 1994-07-12 W. R. Grace & Co.-Conn. Aqueous developable photosensitive polyurethane-(meth)acrylate
US5362806A (en) * 1993-01-07 1994-11-08 W. R. Grace & Co.-Conn. Toughened photocurable polymer composition for processible flexographic printing plates
JP2910902B2 (en) * 1993-03-17 1999-06-23 東洋紡績株式会社 Anti-adhesion layer for photosensitive resin printing plate and composition thereof
US5362605A (en) * 1993-05-10 1994-11-08 W. R. Grace & Co.-Conn. Photosensitive polymer composition for flexographic printing plates processable in aqueous media
JP3510393B2 (en) 1994-08-10 2004-03-29 シエル・インターナシヨナル・リサーチ・マートスハツペイ・ベー・ヴエー Flexographic printing plate obtained from a photocurable elastomer composition
US5773194A (en) * 1995-09-08 1998-06-30 Konica Corporation Light sensitive composition, presensitized lithographic printing plate and image forming method employing the printing plate
US5753414A (en) * 1995-10-02 1998-05-19 Macdermid Imaging Technology, Inc. Photopolymer plate having a peelable substrate
US5882799A (en) * 1996-12-16 1999-03-16 Vernay Laboratories, Inc. Polymeric coupling agents for the adhesion of macromolecular materials and metal substrates
US7008979B2 (en) 2002-04-30 2006-03-07 Hydromer, Inc. Coating composition for multiple hydrophilic applications
DE10241851A1 (en) * 2002-09-09 2004-03-18 Basf Drucksysteme Gmbh Production of flexographic printing plates, comprises heating exposed flexographic printing element, and removal of softened, unpolymerized parts of relief-forming layer
EP1978013A1 (en) * 2007-04-04 2008-10-08 Cognis IP Management GmbH Diols and polyols
EP2591024B1 (en) * 2010-07-06 2014-06-25 Basf Se Copolymer having high chemical uniformity and use thereof for improving cold flow properties of fuel oils
US8721744B2 (en) * 2010-07-06 2014-05-13 Basf Se Copolymer with high chemical homogeneity and use thereof for improving the cold flow properties of fuel oils

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3448089A (en) * 1966-03-14 1969-06-03 Du Pont Photopolymerizable polymers containing free acid or acid anhydride groups reacted with glycidyl acrylate or glycidyl methacrylate
US3746673A (en) * 1970-12-22 1973-07-17 Du Pont Aziridinyl alkyl-acrylate or methacrylate graft copolymers
US3796578A (en) * 1970-12-26 1974-03-12 Asahi Chemical Ind Photopolymerizable compositions and elements containing addition polymerizable polymeric compounds
FR2125958A5 (en) * 1971-02-20 1972-09-29 Asahi Chemical Ind
JPS5527433B2 (en) * 1972-08-01 1980-07-21
US3786116A (en) * 1972-08-21 1974-01-15 Cpc International Inc Chemically joined,phase separated thermoplastic graft copolymers
US4216302A (en) * 1978-12-11 1980-08-05 The B. F. Goodrich Company Liquid vinylidene-terminated polymers
US4540742A (en) * 1982-11-12 1985-09-10 The B. F. Goodrich Company Graft copolymers and process for their preparation
US4659781A (en) * 1983-05-19 1987-04-21 Nippon Paint Co., Ltd. Reactive acrylic oligomer, grafted acrylic resinous composition based on said oligomer and coating composition containing the same
US4656217A (en) * 1983-05-31 1987-04-07 Nippon Shokubai Kagaku Kogyo Co. Ltd. Reactive polymer, method for manufacturing thereof and use thereof
US4537667A (en) * 1984-04-25 1985-08-27 Desoto, Inc. Radiation-curable copolymers of monoethylenic monomers
DE3540950A1 (en) * 1985-11-19 1987-05-21 Basf Ag MIXTURES CROSS-LINKABLE BY PHOTOPOLYMERISATION

Also Published As

Publication number Publication date
AU6801287A (en) 1987-07-30
CA1276333C (en) 1990-11-13
JP2716432B2 (en) 1998-02-18
JPS62190202A (en) 1987-08-20
DE3602472A1 (en) 1987-07-30
ES2033696T3 (en) 1993-04-01
ATE79382T1 (en) 1992-08-15
FI87226B (en) 1992-08-31
US4762892A (en) 1988-08-09
DK42687A (en) 1987-07-29
EP0231002A3 (en) 1989-08-16
FI870357A0 (en) 1987-01-27
EP0231002B1 (en) 1992-08-12
AU592404B2 (en) 1990-01-11
EP0231002A2 (en) 1987-08-05
DE3780974D1 (en) 1992-09-17
FI87226C (en) 1992-12-10
DK42687D0 (en) 1987-01-27

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MM Patent lapsed
MM Patent lapsed

Owner name: BASF AKTIENGESELLSCHAFT