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Priority to FI20225231ApriorityCriticalpatent/FI20225231A/en
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Publication of FI20225231ApublicationCriticalpatent/FI20225231A/en
A substrate processing apparatus, comprising an inner chamber (130), an outer chamber (140) at least partly surrounding the inner chamber (130), a substrate support (110) to support a substrate in the inner chamber (130), a lid system (161), and a plasma generator (175) comprising a plasma applicator integrated with the lid system (161), wherein the apparatus is configured to discharge non-plasma gas into the inner chamber (130) at point(s) beneath a plasma generation volume of the plasma generator (175).
FI20225231A2020-01-102020-01-10Substrate processing apparatus and method
FI20225231A
(en)