FI20106357A0 - Method and apparatus for an action directed to a portion of an electronic structure - Google Patents
Method and apparatus for an action directed to a portion of an electronic structureInfo
- Publication number
- FI20106357A0 FI20106357A0 FI20106357A FI20106357A FI20106357A0 FI 20106357 A0 FI20106357 A0 FI 20106357A0 FI 20106357 A FI20106357 A FI 20106357A FI 20106357 A FI20106357 A FI 20106357A FI 20106357 A0 FI20106357 A0 FI 20106357A0
- Authority
- FI
- Finland
- Prior art keywords
- electronic structure
- action directed
- directed
- action
- electronic
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67294—Apparatus for monitoring, sorting or marking using identification means, e.g. labels on substrates or labels on containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20106357A FI20106357A0 (en) | 2010-12-21 | 2010-12-21 | Method and apparatus for an action directed to a portion of an electronic structure |
PCT/FI2011/051138 WO2012085347A1 (en) | 2010-12-21 | 2011-12-20 | Method and apparatus for performing an operation aimed at a part of an electronic structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20106357A FI20106357A0 (en) | 2010-12-21 | 2010-12-21 | Method and apparatus for an action directed to a portion of an electronic structure |
Publications (1)
Publication Number | Publication Date |
---|---|
FI20106357A0 true FI20106357A0 (en) | 2010-12-21 |
Family
ID=43415046
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI20106357A FI20106357A0 (en) | 2010-12-21 | 2010-12-21 | Method and apparatus for an action directed to a portion of an electronic structure |
Country Status (2)
Country | Link |
---|---|
FI (1) | FI20106357A0 (en) |
WO (1) | WO2012085347A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111229990B (en) * | 2020-01-19 | 2021-08-17 | 中义(杭州)医药科技有限公司 | Electronic chip tray filler |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4342090A (en) * | 1980-06-27 | 1982-07-27 | International Business Machines Corp. | Batch chip placement system |
JP5017147B2 (en) * | 2008-03-06 | 2012-09-05 | 東京エレクトロン株式会社 | Substrate processing method, program, computer storage medium, and substrate processing system |
US20100154870A1 (en) * | 2008-06-20 | 2010-06-24 | Nicholas Bateman | Use of Pattern Recognition to Align Patterns in a Downstream Process |
-
2010
- 2010-12-21 FI FI20106357A patent/FI20106357A0/en not_active Application Discontinuation
-
2011
- 2011-12-20 WO PCT/FI2011/051138 patent/WO2012085347A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2012085347A1 (en) | 2012-06-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FD | Application lapsed |