FI20106059A - Changing the operating frequency in an LBAW filter - Google Patents

Changing the operating frequency in an LBAW filter Download PDF

Info

Publication number
FI20106059A
FI20106059A FI20106059A FI20106059A FI20106059A FI 20106059 A FI20106059 A FI 20106059A FI 20106059 A FI20106059 A FI 20106059A FI 20106059 A FI20106059 A FI 20106059A FI 20106059 A FI20106059 A FI 20106059A
Authority
FI
Finland
Prior art keywords
changing
operating frequency
lbaw filter
lbaw
filter
Prior art date
Application number
FI20106059A
Other languages
Finnish (fi)
Swedish (sv)
Other versions
FI20106059A0 (en
Inventor
Johanna Meltaus
Tuomas Pensala
Markku Ylilammi
Original Assignee
Valtion Teknillinen
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Valtion Teknillinen filed Critical Valtion Teknillinen
Priority to FI20106059A priority Critical patent/FI20106059A/en
Publication of FI20106059A0 publication Critical patent/FI20106059A0/en
Priority to PCT/FI2011/050893 priority patent/WO2012049373A1/en
Publication of FI20106059A publication Critical patent/FI20106059A/en

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/46Filters
    • H03H9/54Filters comprising resonators of piezoelectric or electrostrictive material
    • H03H9/56Monolithic crystal filters
    • H03H9/564Monolithic crystal filters implemented with thin-film techniques
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H3/04Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02007Details of bulk acoustic wave devices
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02228Guided bulk acoustic wave devices or Lamb wave devices having interdigital transducers situated in parallel planes on either side of a piezoelectric layer
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/46Filters
    • H03H9/54Filters comprising resonators of piezoelectric or electrostrictive material
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/01Manufacture or treatment

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
FI20106059A 2010-10-14 2010-10-14 Changing the operating frequency in an LBAW filter FI20106059A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FI20106059A FI20106059A (en) 2010-10-14 2010-10-14 Changing the operating frequency in an LBAW filter
PCT/FI2011/050893 WO2012049373A1 (en) 2010-10-14 2011-10-14 Changing operation frequency in a lbaw filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FI20106059A FI20106059A (en) 2010-10-14 2010-10-14 Changing the operating frequency in an LBAW filter

Publications (2)

Publication Number Publication Date
FI20106059A0 FI20106059A0 (en) 2010-10-14
FI20106059A true FI20106059A (en) 2012-04-15

Family

ID=43064217

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20106059A FI20106059A (en) 2010-10-14 2010-10-14 Changing the operating frequency in an LBAW filter

Country Status (2)

Country Link
FI (1) FI20106059A (en)
WO (1) WO2012049373A1 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4908226A (en) * 1988-05-23 1990-03-13 Hughes Aircraft Company Selective area nucleation and growth method for metal chemical vapor deposition using focused ion beams
US6963155B1 (en) * 1997-04-24 2005-11-08 Mitsubishi Denki Kabushiki Kaisha Film acoustic wave device, manufacturing method and circuit device
US6456173B1 (en) * 2001-02-15 2002-09-24 Nokia Mobile Phones Ltd. Method and system for wafer-level tuning of bulk acoustic wave resonators and filters

Also Published As

Publication number Publication date
WO2012049373A1 (en) 2012-04-19
FI20106059A0 (en) 2010-10-14

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