FI20090476A - Förfarande och anordning för tillverkning av ett glasunderlägg - Google Patents

Förfarande och anordning för tillverkning av ett glasunderlägg Download PDF

Info

Publication number
FI20090476A
FI20090476A FI20090476A FI20090476A FI20090476A FI 20090476 A FI20090476 A FI 20090476A FI 20090476 A FI20090476 A FI 20090476A FI 20090476 A FI20090476 A FI 20090476A FI 20090476 A FI20090476 A FI 20090476A
Authority
FI
Finland
Prior art keywords
manufacturing
glass substrate
glass
substrate
Prior art date
Application number
FI20090476A
Other languages
English (en)
Finnish (fi)
Other versions
FI122881B (sv
FI20090476A0 (sv
Inventor
Tommi Vainio
Jarmo Skarp
Original Assignee
Beneq Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beneq Oy filed Critical Beneq Oy
Priority to FI20090476A priority Critical patent/FI122881B/sv
Publication of FI20090476A0 publication Critical patent/FI20090476A0/sv
Priority to EA201290493A priority patent/EA201290493A1/ru
Priority to CN2010800566160A priority patent/CN102666905A/zh
Priority to US13/511,905 priority patent/US20120315709A1/en
Priority to EP10803259A priority patent/EP2513353A1/en
Priority to PCT/FI2010/051016 priority patent/WO2011073508A1/en
Publication of FI20090476A publication Critical patent/FI20090476A/sv
Application granted granted Critical
Publication of FI122881B publication Critical patent/FI122881B/sv

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
    • B05D1/08—Flame spraying
    • B05D1/10—Applying particulate materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/16—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/16—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
    • B05B7/20—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed by flame or combustion
    • B05B7/201—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed by flame or combustion downstream of the nozzle
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/129—Flame spraying
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/008—Surface plasmon devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/054—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/52—PV systems with concentrators
FI20090476A 2009-12-15 2009-12-15 Förfarande för tillverkning av ett glasunderlägg FI122881B (sv)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FI20090476A FI122881B (sv) 2009-12-15 2009-12-15 Förfarande för tillverkning av ett glasunderlägg
EA201290493A EA201290493A1 (ru) 2009-12-15 2010-12-13 Способ и устройство для изготовления подложки
CN2010800566160A CN102666905A (zh) 2009-12-15 2010-12-13 制造衬底的方法和设备
US13/511,905 US20120315709A1 (en) 2009-12-15 2010-12-13 Process and apparatus for producing a substrate
EP10803259A EP2513353A1 (en) 2009-12-15 2010-12-13 Process and apparatus for producing a substrate
PCT/FI2010/051016 WO2011073508A1 (en) 2009-12-15 2010-12-13 Process and apparatus for producing a substrate

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20090476 2009-12-15
FI20090476A FI122881B (sv) 2009-12-15 2009-12-15 Förfarande för tillverkning av ett glasunderlägg

Publications (3)

Publication Number Publication Date
FI20090476A0 FI20090476A0 (sv) 2009-12-15
FI20090476A true FI20090476A (sv) 2011-06-16
FI122881B FI122881B (sv) 2012-08-15

Family

ID=41462698

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20090476A FI122881B (sv) 2009-12-15 2009-12-15 Förfarande för tillverkning av ett glasunderlägg

Country Status (6)

Country Link
US (1) US20120315709A1 (sv)
EP (1) EP2513353A1 (sv)
CN (1) CN102666905A (sv)
EA (1) EA201290493A1 (sv)
FI (1) FI122881B (sv)
WO (1) WO2011073508A1 (sv)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110290316A1 (en) * 2010-05-28 2011-12-01 Daniel Warren Hawtof Light scattering inorganic substrates by soot deposition
FI20115683A0 (sv) * 2011-06-30 2011-06-30 Beneq Oy Ytbehandlingsanording
US11014118B2 (en) * 2015-12-11 2021-05-25 Vitro Flat Glass Llc Float bath coating system
CN111168080B (zh) * 2020-01-17 2023-03-24 陕西瑞科新材料股份有限公司 一种纳米铂金属的制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI98832C (sv) 1995-09-15 1997-08-25 Juha Tikkanen Förfarande och anordning för sprutning av ett material
US20090032097A1 (en) * 2007-07-31 2009-02-05 Bigioni Terry P Enhancement of dye-sensitized solar cells using colloidal metal nanoparticles
FI20085085A0 (sv) * 2008-01-31 2008-01-31 Jyrki Maekelae Från rulle till rulle-förfarande och ytbeläggningsanordning

Also Published As

Publication number Publication date
CN102666905A (zh) 2012-09-12
FI122881B (sv) 2012-08-15
EA201290493A1 (ru) 2013-01-30
US20120315709A1 (en) 2012-12-13
WO2011073508A1 (en) 2011-06-23
EP2513353A1 (en) 2012-10-24
FI20090476A0 (sv) 2009-12-15

Similar Documents

Publication Publication Date Title
FI20085443A0 (sv) Kretsmodul och förfarande för tillverkning av en kretsmodul
FI20085937A0 (sv) Fiberprodukt med ett bärriärskikt och förfarande för framställning därav
FI20080217A (sv) Förfarande och anordning för ytbeläggning av glas
FI20070584A0 (sv) Tunnbatteri och förfarande för framställning av ett tunnbatteri
FI20095392A0 (sv) Förfarande för behandling av ytan på ett substrat
FI20060373A (sv) Förfarande och anordning för ytbeläggning av glas
FI20105498A0 (sv) Förfarande för framställning av ett lager och lager på ytan av ett silikonsubstrat
FI20070107A0 (sv) Tunnbatteri och förfarande för framställning av ett tunnbatteri
FI20096059A0 (sv) Förfarande och anordning för framställning av biokol
FI20105092A0 (sv) Process och anordning för producering av kolväte
FI20070125A0 (sv) Förfarande för framställning av en katodskiva och katodskiva
FI20090476A (sv) Förfarande och anordning för tillverkning av ett glasunderlägg
FI20115534A0 (sv) Förfarande och struktur för att skydda ett passiverande skikt
FI20115170A0 (sv) Förfarande och anordning för härdning av glasskivor
FI20095651A0 (sv) Metod och apparat för beläggning av glassubstrat
FI20095777A (sv) Gasfilteranordning och förfarande för framställning av en gasfilteranordning
FI20096112A0 (sv) Förfarande för tillverkning av en träskiva och träskiva
FI20096154A0 (sv) Förfarande för bildning av en film, film och användningar därav
FI20085810A (sv) Förfarande och anordning för tillverkning av mekanisk massa
FI20085669A0 (sv) Förfarande för framställning av ett kylelement och ett kylelement
FI20096025A0 (sv) Förfarande för framställning av en bana och bana
FI20096086A0 (sv) Skivformigt filter, samt förfarande och anordning för justering av ett skivformigt filter
FI20085440A (sv) Förfarande och anordning för inmatning av en fibermassa på ett formningsunderlag
FI20105346A0 (sv) Beklädnadselement och förfarande för tillverkning av ett beklädnadselement
FI20095319A0 (sv) Förfarande och anordning för bildning av en förpackning

Legal Events

Date Code Title Description
FG Patent granted

Ref document number: 122881

Country of ref document: FI

Kind code of ref document: B

MM Patent lapsed