ES8402621A1 - Procedimiento para la precipitacion de metales sobre polvos semiconductores. - Google Patents
Procedimiento para la precipitacion de metales sobre polvos semiconductores.Info
- Publication number
- ES8402621A1 ES8402621A1 ES519001A ES519001A ES8402621A1 ES 8402621 A1 ES8402621 A1 ES 8402621A1 ES 519001 A ES519001 A ES 519001A ES 519001 A ES519001 A ES 519001A ES 8402621 A1 ES8402621 A1 ES 8402621A1
- Authority
- ES
- Spain
- Prior art keywords
- semi
- conductive powders
- depositing metals
- palladium
- gold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000843 powder Substances 0.000 title abstract 3
- 238000000151 deposition Methods 0.000 title 1
- 229910052751 metal Inorganic materials 0.000 title 1
- 239000002184 metal Substances 0.000 title 1
- 150000002739 metals Chemical class 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 abstract 4
- 239000004065 semiconductor Substances 0.000 abstract 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 abstract 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract 2
- 229910052737 gold Inorganic materials 0.000 abstract 2
- 239000010931 gold Substances 0.000 abstract 2
- 229910052763 palladium Inorganic materials 0.000 abstract 2
- 229910052709 silver Inorganic materials 0.000 abstract 2
- 239000004332 silver Substances 0.000 abstract 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 230000001678 irradiating effect Effects 0.000 abstract 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 abstract 1
- 229910052753 mercury Inorganic materials 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 239000000725 suspension Substances 0.000 abstract 1
- 239000011135 tin Substances 0.000 abstract 1
- 229910052718 tin Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B13/00—Obtaining lead
- C22B13/04—Obtaining lead by wet processes
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B11/00—Obtaining noble metals
- C22B11/04—Obtaining noble metals by wet processes
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B15/00—Obtaining copper
- C22B15/0063—Hydrometallurgy
- C22B15/0084—Treating solutions
- C22B15/0086—Treating solutions by physical methods
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B17/00—Obtaining cadmium
- C22B17/04—Obtaining cadmium by wet processes
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B25/00—Obtaining tin
- C22B25/06—Obtaining tin from scrap, especially tin scrap
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B43/00—Obtaining mercury
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
- C22B9/16—Remelting metals
- C22B9/22—Remelting metals with heating by wave energy or particle radiation
- C22B9/221—Remelting metals with heating by wave energy or particle radiation by electromagnetic waves, e.g. by gas discharge lamps
- C22B9/225—Remelting metals with heating by wave energy or particle radiation by electromagnetic waves, e.g. by gas discharge lamps by microwaves
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
- C23C18/143—Radiation by light, e.g. photolysis or pyrolysis
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Catalysts (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH24182 | 1982-01-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| ES8402621A1 true ES8402621A1 (es) | 1984-03-01 |
| ES519001A0 ES519001A0 (es) | 1984-03-01 |
Family
ID=4182503
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES519001A Granted ES519001A0 (es) | 1982-01-15 | 1983-01-14 | Procedimiento para la precipitacion de metales sobre polvos semiconductores. |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US4559237A (OSRAM) |
| EP (2) | EP0084517B1 (OSRAM) |
| JP (1) | JPS58123888A (OSRAM) |
| CA (1) | CA1243272A (OSRAM) |
| DE (1) | DE3365362D1 (OSRAM) |
| ES (1) | ES519001A0 (OSRAM) |
| IN (1) | IN159370B (OSRAM) |
| ZA (1) | ZA83253B (OSRAM) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6120302A (ja) * | 1984-07-06 | 1986-01-29 | Hitachi Maxell Ltd | 強磁性粉末とその製造方法 |
| US4612208A (en) * | 1985-04-22 | 1986-09-16 | Westinghouse Electric Corp. | Coupling aid for laser fusion of metal powders |
| DE3772220D1 (de) * | 1986-01-22 | 1991-09-26 | Hitachi Ltd | Verfahren und vorrichtung zur photoelektrokatalytischen reduktion von edelmetallen in salpetersaurer loesung. |
| AT389099B (de) * | 1987-09-08 | 1989-10-10 | Simmering Graz Pauker Ag | Verfahren und vorrichtung zur reinigung einer mit organischen und/oder anorganischen fremdstoffen belasteten fluessigkeit, sowie verwendung einer halbleiterschicht |
| US4888204A (en) * | 1988-09-12 | 1989-12-19 | Hughes Aircraft Company | Photochemical deposition of high purity gold films |
| US5137607A (en) * | 1990-04-27 | 1992-08-11 | Wisconsin Alumni Research Foundation | Reactor vessel using metal oxide ceramic membranes |
| US5616532A (en) * | 1990-12-14 | 1997-04-01 | E. Heller & Company | Photocatalyst-binder compositions |
| JP2538851Y2 (ja) * | 1991-02-08 | 1997-06-18 | 矢崎総業株式会社 | 自動車用計器の照明装置 |
| US5849200A (en) * | 1993-10-26 | 1998-12-15 | E. Heller & Company | Photocatalyst-binder compositions |
| FR2763260A1 (fr) * | 1997-05-14 | 1998-11-20 | Rhodia Chimie Sa | Procede de traitement de gaz pour la reduction des emissions des oxydes d'azote utilisant un catalyseur a phase catalytique obtenue par reduction radiolytique ou photolytique et compositions catalytiques specifiques |
| US6342249B1 (en) | 1998-12-23 | 2002-01-29 | Alza Corporation | Controlled release liquid active agent formulation dosage forms |
| US6635281B2 (en) | 1998-12-23 | 2003-10-21 | Alza Corporation | Gastric retaining oral liquid dosage form |
| US20050232995A1 (en) | 2002-07-29 | 2005-10-20 | Yam Nyomi V | Methods and dosage forms for controlled delivery of paliperidone and risperidone |
| US20050152967A1 (en) * | 2003-03-28 | 2005-07-14 | Pfab, Lp | Dynamic variable release |
| ES2221802B1 (es) * | 2003-06-17 | 2006-04-16 | Universidad Rey Juan Carlos | Procedimiento para la recuperacion de oro y/o plata a partir de una disolucion de complejos cianuro de oro y/o plata. |
| JP2007511519A (ja) * | 2003-11-14 | 2007-05-10 | アルザ・コーポレーシヨン | 液状投薬形態物におけるトピラメートの制御放出 |
| JP2008510000A (ja) * | 2004-08-19 | 2008-04-03 | アルザ・コーポレーシヨン | 制御放出性ナノ粒子有効薬剤配合物投与剤型品および方法 |
| CA2596029A1 (en) * | 2005-01-27 | 2006-08-03 | David E. Edgren | Oral osmotic dosage form having a high flux membrane |
| KR20080005429A (ko) * | 2005-04-19 | 2008-01-11 | 알자 코포레이션 | 트라마돌 및 가바펜틴을 포함하는 물질의 배합물 |
| AR055099A1 (es) * | 2005-07-28 | 2007-08-08 | Alza Corp | Formulaciones liquidas para la administracion controlada de derivados de bencisoxazol |
| US20070077309A1 (en) * | 2005-09-30 | 2007-04-05 | Wong Patrick S | Banded controlled release nanoparticle active agent formulation dosage forms and methods |
| PL116330U1 (en) * | 2005-10-31 | 2007-04-02 | Alza Corp | Method for the reduction of alcohol provoked rapid increase in the released dose of the orally administered opioide with prolonged liberation |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3907566A (en) * | 1971-07-23 | 1975-09-23 | Canon Kk | Photosensitive material containing inorganic compound coated metal particles and the use thereof in photographic development processes |
| US3993802A (en) * | 1971-07-29 | 1976-11-23 | Photocircuits Division Of Kollmorgen Corporation | Processes and products for making articles for electroless plating |
| US4239789A (en) * | 1979-05-08 | 1980-12-16 | International Business Machines Corporation | Maskless method for electroless plating patterns |
| US4264421A (en) * | 1979-05-30 | 1981-04-28 | Board Of Regents, University Of Texas System | Photocatalytic methods for preparing metallized powders |
| DD157989A3 (de) * | 1980-10-10 | 1982-12-22 | Lothar Gierth | Verfahren zur strukturierten chemisch-reduktiven metallabscheidung |
-
1982
- 1982-12-28 IN IN939/DEL/82A patent/IN159370B/en unknown
-
1983
- 1983-01-10 EP EP19830810008 patent/EP0084517B1/de not_active Expired
- 1983-01-10 EP EP19850104692 patent/EP0163876B1/de not_active Expired
- 1983-01-10 DE DE8383810008T patent/DE3365362D1/de not_active Expired
- 1983-01-13 CA CA000419409A patent/CA1243272A/en not_active Expired
- 1983-01-14 JP JP58003613A patent/JPS58123888A/ja active Pending
- 1983-01-14 ZA ZA83253A patent/ZA83253B/xx unknown
- 1983-01-14 ES ES519001A patent/ES519001A0/es active Granted
-
1984
- 1984-10-30 US US06/666,127 patent/US4559237A/en not_active Expired - Fee Related
-
1985
- 1985-09-26 US US06/780,158 patent/US4619838A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| ZA83253B (en) | 1983-10-26 |
| US4619838A (en) | 1986-10-28 |
| US4559237A (en) | 1985-12-17 |
| CA1243272A (en) | 1988-10-18 |
| DE3365362D1 (en) | 1986-09-25 |
| EP0163876B1 (de) | 1987-09-30 |
| EP0163876A1 (de) | 1985-12-11 |
| EP0084517A1 (de) | 1983-07-27 |
| IN159370B (OSRAM) | 1987-05-09 |
| ES519001A0 (es) | 1984-03-01 |
| JPS58123888A (ja) | 1983-07-23 |
| EP0084517B1 (de) | 1986-08-20 |
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