ES339435A1 - Metodo de preparacion de una laca fotosensible de polivinilbutiral. - Google Patents

Metodo de preparacion de una laca fotosensible de polivinilbutiral.

Info

Publication number
ES339435A1
ES339435A1 ES339435A ES339435A ES339435A1 ES 339435 A1 ES339435 A1 ES 339435A1 ES 339435 A ES339435 A ES 339435A ES 339435 A ES339435 A ES 339435A ES 339435 A1 ES339435 A1 ES 339435A1
Authority
ES
Spain
Prior art keywords
polyvinyl butyral
photosensitive
lacquer
organic
polyvinylbutyral
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES339435A
Other languages
English (en)
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of ES339435A1 publication Critical patent/ES339435A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D129/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Coating compositions based on hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Coating compositions based on derivatives of such polymers
    • C09D129/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Paints Or Removers (AREA)
ES339435A 1966-04-20 1967-04-18 Metodo de preparacion de una laca fotosensible de polivinilbutiral. Expired ES339435A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6605244A NL6605244A (enrdf_load_stackoverflow) 1966-04-20 1966-04-20

Publications (1)

Publication Number Publication Date
ES339435A1 true ES339435A1 (es) 1968-10-01

Family

ID=19796338

Family Applications (1)

Application Number Title Priority Date Filing Date
ES339435A Expired ES339435A1 (es) 1966-04-20 1967-04-18 Metodo de preparacion de una laca fotosensible de polivinilbutiral.

Country Status (9)

Country Link
US (1) US3545973A (enrdf_load_stackoverflow)
AT (1) AT278997B (enrdf_load_stackoverflow)
BE (1) BE697257A (enrdf_load_stackoverflow)
CH (1) CH483657A (enrdf_load_stackoverflow)
DE (1) DE1669238B2 (enrdf_load_stackoverflow)
ES (1) ES339435A1 (enrdf_load_stackoverflow)
GB (1) GB1123642A (enrdf_load_stackoverflow)
NL (1) NL6605244A (enrdf_load_stackoverflow)
SE (1) SE330828B (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6605244A (enrdf_load_stackoverflow) * 1966-04-20 1967-10-23
US4262080A (en) * 1978-10-31 1981-04-14 Nasa Method for applying photographic resist to otherwise incompatible substrates

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6412172A (enrdf_load_stackoverflow) * 1964-10-20 1966-04-21
NL6605244A (enrdf_load_stackoverflow) * 1966-04-20 1967-10-23

Also Published As

Publication number Publication date
DE1669238A1 (de) 1971-06-09
NL6605244A (enrdf_load_stackoverflow) 1967-10-23
BE697257A (enrdf_load_stackoverflow) 1967-10-19
SE330828B (enrdf_load_stackoverflow) 1970-11-30
DE1669238B2 (de) 1976-06-16
GB1123642A (en) 1968-08-14
CH483657A (de) 1969-12-31
AT278997B (de) 1970-02-25
US3545973A (en) 1970-12-08

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