ES2518040A1 - Low resistance macroporous silicon condenser series (Machine-translation by Google Translate, not legally binding) - Google Patents
Low resistance macroporous silicon condenser series (Machine-translation by Google Translate, not legally binding) Download PDFInfo
- Publication number
- ES2518040A1 ES2518040A1 ES201330643A ES201330643A ES2518040A1 ES 2518040 A1 ES2518040 A1 ES 2518040A1 ES 201330643 A ES201330643 A ES 201330643A ES 201330643 A ES201330643 A ES 201330643A ES 2518040 A1 ES2518040 A1 ES 2518040A1
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- low resistance
- legally binding
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 229910052710 silicon Inorganic materials 0.000 title abstract 2
- 239000010703 silicon Substances 0.000 title abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title 1
- 238000010276 construction Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/005—Electrodes
- H01G4/008—Selection of materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G13/00—Apparatus specially adapted for manufacturing capacitors; Processes specially adapted for manufacturing capacitors not provided for in groups H01G4/00 - H01G11/00
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Silicon Compounds (AREA)
- Semiconductor Integrated Circuits (AREA)
- Secondary Cells (AREA)
Abstract
The present application for patent of invention consists, as indicated in its statement, in a "condenser of macroporous silicon of low resistance series", whose new characteristics of construction, conformation and design give it a high capacity/surface ratio of the sample while improving the frequency response with respect to previous devices. (Machine-translation by Google Translate, not legally binding)
Description
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ES201330643A ES2518040B1 (en) | 2013-05-03 | 2013-05-03 | Low resistance macroporous silicon condenser series |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ES201330643A ES2518040B1 (en) | 2013-05-03 | 2013-05-03 | Low resistance macroporous silicon condenser series |
Publications (2)
Publication Number | Publication Date |
---|---|
ES2518040A1 true ES2518040A1 (en) | 2014-11-04 |
ES2518040B1 ES2518040B1 (en) | 2015-08-12 |
Family
ID=51830038
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES201330643A Active ES2518040B1 (en) | 2013-05-03 | 2013-05-03 | Low resistance macroporous silicon condenser series |
Country Status (1)
Country | Link |
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ES (1) | ES2518040B1 (en) |
-
2013
- 2013-05-03 ES ES201330643A patent/ES2518040B1/en active Active
Non-Patent Citations (7)
Title |
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D. HERNÁNDEZ, D. LANGE, T. TRIFONOV, M. GARÍN, M. GARCÍA, A. RODRÍGUEZ, R. ALCUBILLA, ¿3D Metallo-dielectric Structures combining Electrochemical and Electroplating techniques¿, Microelectronic Engineering, Mayo-Agosto 2010, Volumen 87, números 5-8, Páginas 1458-1462 * |
F. ROOZEBOOM, R. ELFRINK, G.S.M. RIJKS, J.F. VERHOEVEN, A. KEMMEREN, J.VAN DEN MERAKKER, ¿Hingh Density, Low-Loss MOS Capacitors for Integrated RF Decoupling¿, The International Journal of Microcircuits and Electronic Packaging, Octubre 2001, Volumen 24, Nº 3, Tercer Cuarto * |
F. ROOZEBOOM, R. ELFRINK, J.VAN DEN MERAKKER AND F. HOLTHUYSEN, ¿High-Value MOS Capacitor arrays in Ultradeep Trenches in Silicon¿, Microelectronic Engeenering, Junio 2000, Volumen 53, Nºs 1-4, Páginas 581-584 * |
J.H. KLOOTWIJK, JINESH W. DEKKERS, J.F. VERHOEVEN, F.C. VAN DE HEUVEL, H.D. KIM, D. BLIN, M.A. VERHEIJEN, R.G.R. WEEMAES, M. KAISER, J.J. RUIGROK, AND F. ROOZEBOOM, ¿Ultrahigh Capacitance Density for multiple ALD-Grown MIM Capacitor Stacks in 3-D Silicon¿, IEEE Electron Device Letters, Julio 2008, Volumen 29, Nº 7, Páginas 740-742 * |
MARIANNA KEMELL, MIKKO RITALA, MARKKU LESKELA, EMMANUEL OSSEI-WUSU, JURGEN CARSTENSEN, HELMUT FOLL, ¿Si/Al2O3/Zno: AL Capacitor arrays formed in Electrochemically etched porous Si by Atomic Layer Deposition¿, Microelectronic Engeenering, Noviembre 2006, Volumen 84, Páginas 313-318 * |
PARAG BANERJEE, ISRAEL PEREZ, LAURENT HENN-LECORDIER, SANG BOK LEE, AND GARY W. RUBLOFF, ¿Nanotubular Metal-insulator-metal Capacitor arrays for energy storage¿, Nature Nanotechnology, 15 Marzo de 2009, Letters, DOI: 10.1038/Nnano.2009.37 * |
V. LEHMANN, W. HONLEIN, H. REISINGER, A. SPITZER, H. WENDT, J. WILLER, ¿A Novel Capacitor technology based on Porous Silicon¿, Thin Solid Films, 1996, Volumen 276, Páginas 138-142 * |
Also Published As
Publication number | Publication date |
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ES2518040B1 (en) | 2015-08-12 |
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