Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nokia Spain SA
Original Assignee
Alcatel Espana SA
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Filing date
Publication date
Application filed by Alcatel Espana SAfiledCriticalAlcatel Espana SA
Priority to ES0245996ApriorityCriticalpatent/ES245996A3/en
Publication of ES245996A3publicationCriticalpatent/ES245996A3/en
A process for making substantially pure silicon comprising passing substantially pure silane in a substantially less than normal molecular concentration to a limited zone within an enclosure, said zone being heated to a temperature at least equal to the silane decomposition temperature. (Machine-translation by Google Translate, not legally binding)
ES0245996A1958-12-171958-12-17A substantially pure silicon manufacturing procedure (Machine-translation by Google Translate, not legally binding)
ExpiredES245996A3
(en)