ES2111378T3 - Catodo rotativo de pulverizacion catodica de varios anticatodos. - Google Patents
Catodo rotativo de pulverizacion catodica de varios anticatodos.Info
- Publication number
- ES2111378T3 ES2111378T3 ES95402127T ES95402127T ES2111378T3 ES 2111378 T3 ES2111378 T3 ES 2111378T3 ES 95402127 T ES95402127 T ES 95402127T ES 95402127 T ES95402127 T ES 95402127T ES 2111378 T3 ES2111378 T3 ES 2111378T3
- Authority
- ES
- Spain
- Prior art keywords
- several anti
- rotary cathode
- cathodic spraying
- tube
- cylinders
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3423—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
- H01J37/3429—Plural materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3447—Collimators, shutters, apertures
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Microwave Tubes (AREA)
- Coating By Spraying Or Casting (AREA)
- Solid Thermionic Cathode (AREA)
Abstract
LA INVENCION SE REFIERE A UN CATODO DE PULVERIZACION CATODICA DE MAGNETRONES DONDE EL CAMBIO DE BLANCO SE HACE INMEDIATAMENTE. EL CATODO GIRATORIO COMPRENDE VARIOS BLANCOS QUE CONSTITUYEN SECTORES DEL CILINDRO GIRATORIO. DURANTE EL DEPOSITO, EL CATODO OSCILA ALREDEDOR DE UNA POSICION DE EQUILIBRIO CENTRADA RESPECTO DEL BLANCO EN ACTIVIDAD.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9411319A FR2725073B1 (fr) | 1994-09-22 | 1994-09-22 | Cathode rotative de pulverisation cathodique a plusieurs cibles |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2111378T3 true ES2111378T3 (es) | 1998-03-01 |
Family
ID=9467173
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES95402127T Expired - Lifetime ES2111378T3 (es) | 1994-09-22 | 1995-09-21 | Catodo rotativo de pulverizacion catodica de varios anticatodos. |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0703599B1 (es) |
AT (1) | ATE160901T1 (es) |
DE (1) | DE69501139T2 (es) |
ES (1) | ES2111378T3 (es) |
FR (1) | FR2725073B1 (es) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10213043B4 (de) * | 2002-03-22 | 2008-10-30 | Von Ardenne Anlagentechnik Gmbh | Rohrmagnetron und seine Verwendung |
PL1626433T3 (pl) * | 2004-08-10 | 2007-06-29 | Applied Mat Gmbh & Co Kg | Urządzenie do rozpylania magnetronowego, cylindryczna katoda i sposób nakładania cienkich warstw wieloskładnikowych na podłoże |
EP1626432A1 (de) * | 2004-08-10 | 2006-02-15 | Applied Films GmbH & Co. KG | Magnetronsputtereinrichtung, Zylinderkathode und Verfahren zur Aufbringung von dünnen Schichten aus unterschiedlichen Materialien auf einem Substrat |
ATE366327T1 (de) * | 2005-05-13 | 2007-07-15 | Applied Materials Gmbh & Co Kg | Verfahren zum betreiben einer sputterkathode mit einem target |
US7842355B2 (en) | 2005-11-01 | 2010-11-30 | Applied Materials, Inc. | System and method for modulation of power and power related functions of PECVD discharge sources to achieve new film properties |
EP1804275B1 (de) | 2005-12-22 | 2009-03-11 | Applied Materials GmbH & Co. KG | Zerstäubungsvorrichtung mit einer Rohrkathode und Verfahren zum Betreiben dieser Zerstäubungsvorrichtung |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57145983A (en) * | 1981-03-04 | 1982-09-09 | Murata Mfg Co Ltd | Coaxial barrel sputtering device |
US4424916A (en) | 1981-06-11 | 1984-01-10 | Pearson Donald L | Toothpaste dispenser |
US4443318A (en) | 1983-08-17 | 1984-04-17 | Shatterproof Glass Corporation | Cathodic sputtering apparatus |
JPS63266062A (ja) * | 1987-04-23 | 1988-11-02 | Sumitomo Metal Mining Co Ltd | 多元素スパツタ薄膜の製造方法及びスパツタ装置 |
EP0393344A1 (de) | 1989-04-20 | 1990-10-24 | Balzers Aktiengesellschaft | Haltevorrichtung für Targets von Zerstäubungsquellen und Verfahren zum Festhalten eines Targets in einer Halterung |
BE1003701A3 (fr) * | 1990-06-08 | 1992-05-26 | Saint Roch Glaceries | Cathode rotative. |
GB9121665D0 (en) * | 1991-10-11 | 1991-11-27 | Boc Group Plc | Sputtering processes and apparatus |
JPH05263225A (ja) * | 1992-03-18 | 1993-10-12 | Asahi Glass Co Ltd | スパッタリング方法 |
-
1994
- 1994-09-22 FR FR9411319A patent/FR2725073B1/fr not_active Expired - Fee Related
-
1995
- 1995-09-21 AT AT95402127T patent/ATE160901T1/de not_active IP Right Cessation
- 1995-09-21 EP EP95402127A patent/EP0703599B1/fr not_active Expired - Lifetime
- 1995-09-21 DE DE69501139T patent/DE69501139T2/de not_active Expired - Fee Related
- 1995-09-21 ES ES95402127T patent/ES2111378T3/es not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0703599B1 (fr) | 1997-12-03 |
DE69501139T2 (de) | 1998-05-28 |
ATE160901T1 (de) | 1997-12-15 |
FR2725073A1 (fr) | 1996-03-29 |
DE69501139D1 (de) | 1998-01-15 |
EP0703599A1 (fr) | 1996-03-27 |
FR2725073B1 (fr) | 1996-12-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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