ES2015599B3 - Diamino-9, 10-dihidroantraceno y ester de acido poliamidico y poliimidas derivadas. - Google Patents

Diamino-9, 10-dihidroantraceno y ester de acido poliamidico y poliimidas derivadas.

Info

Publication number
ES2015599B3
ES2015599B3 ES87810357T ES87810357T ES2015599B3 ES 2015599 B3 ES2015599 B3 ES 2015599B3 ES 87810357 T ES87810357 T ES 87810357T ES 87810357 T ES87810357 T ES 87810357T ES 2015599 B3 ES2015599 B3 ES 2015599B3
Authority
ES
Spain
Prior art keywords
dihidroantraceno
diamino
ester
polyamidic acid
polyimides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES87810357T
Other languages
English (en)
Inventor
Josef Pfeifer
Rudolf Duthaler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Application granted granted Critical
Publication of ES2015599B3 publication Critical patent/ES2015599B3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387Polyamides or polyimides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1057Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
    • C08G73/1064Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
    • C08G73/1071Wholly aromatic polyimides containing oxygen in the form of ether bonds in the main chain
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1075Partially aromatic polyimides
    • C08G73/1078Partially aromatic polyimides wholly aromatic in the diamino moiety
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1085Polyimides with diamino moieties or tetracarboxylic segments containing heterocyclic moieties

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Paints Or Removers (AREA)
ES87810357T 1986-06-30 1987-06-24 Diamino-9, 10-dihidroantraceno y ester de acido poliamidico y poliimidas derivadas. Expired - Lifetime ES2015599B3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH261886 1986-06-30

Publications (1)

Publication Number Publication Date
ES2015599B3 true ES2015599B3 (es) 1990-09-01

Family

ID=4237807

Family Applications (1)

Application Number Title Priority Date Filing Date
ES87810357T Expired - Lifetime ES2015599B3 (es) 1986-06-30 1987-06-24 Diamino-9, 10-dihidroantraceno y ester de acido poliamidico y poliimidas derivadas.

Country Status (7)

Country Link
US (1) US4847359A (es)
EP (1) EP0253765B1 (es)
JP (1) JPS6339925A (es)
BR (1) BR8703288A (es)
CA (1) CA1281481C (es)
DE (1) DE3762345D1 (es)
ES (1) ES2015599B3 (es)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3851134D1 (de) * 1987-12-15 1994-09-22 Ciba Geigy Ag Autophotovernetzbare Copolyimide und Polyimidzusammensetzungen.
JP2575815B2 (ja) * 1988-06-14 1997-01-29 東芝ケミカル株式会社 プリント回路板の製造方法
JPH0415226A (ja) * 1990-05-10 1992-01-20 Chisso Corp ヒドロキシフェニル基を有する感光性耐熱重合体
EP0478321B1 (en) * 1990-09-28 1997-11-12 Kabushiki Kaisha Toshiba Photosenstive resin composition for forming polyimide film pattern and method of forming polyimide film pattern
US5206117A (en) * 1991-08-14 1993-04-27 Labadie Jeffrey W Photosensitive polyamic alkyl ester composition and process for its use
GB9320191D0 (en) * 1993-09-30 1993-11-17 Univ Napier Compounds
US6342333B1 (en) * 1999-09-23 2002-01-29 Hitachi Chemical Dupont Microsystems, L.L.C. Photosensitive resin composition, patterning method, and electronic components
TWI304076B (es) * 2001-07-13 2008-12-11 Nippon Catalytic Chem Ind
GB0124595D0 (en) * 2001-10-12 2001-12-05 Savair & Aro Ltd Pressure sensor
KR101485866B1 (ko) * 2013-04-23 2015-01-27 한국화학연구원 신규한 폴리이미드 중합체, 이의 제조방법 및 이를 이용한 유기절연막
EP3017945B1 (en) 2014-11-06 2017-10-25 Agfa Graphics Nv Inkjet CTP method for preparing a set of lithographic printing plates
PL3017944T3 (pl) 2014-11-06 2017-11-30 Agfa Graphics Nv Sposób wytwarzania prekursora litograficznej płyty drukowej

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RO64228A (ro) * 1973-10-13 1980-06-15 Bayer Ag,De Procedeu de separare a 1,5-dinitroantrachinonei si 1,8-dinitroantrachinonei
US4657832A (en) * 1983-05-18 1987-04-14 Ciba-Geigy Corporation Photosensitive polymers as coating materials
US4629777A (en) * 1983-05-18 1986-12-16 Ciba-Geigy Corporation Polyimides, a process for their preparation and their use
EP0162017B1 (de) * 1984-05-17 1991-08-21 Ciba-Geigy Ag Homo- und Copolymere, Verfahren zu deren Vernetzung und derenVerwendung

Also Published As

Publication number Publication date
EP0253765B1 (de) 1990-04-18
CA1281481C (en) 1991-03-12
BR8703288A (pt) 1988-03-15
EP0253765A1 (de) 1988-01-20
US4847359A (en) 1989-07-11
DE3762345D1 (de) 1990-05-23
JPS6339925A (ja) 1988-02-20

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