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Individual
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Individual
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Application filed by IndividualfiledCriticalIndividual
Priority to ES114779UpriorityCriticalpatent/ES114779Y/es
Publication of ES114779UpublicationCriticalpatent/ES114779U/es
Application grantedgrantedCritical
Publication of ES114779YpublicationCriticalpatent/ES114779Y/es
Perfeccionamientos en portarretratos caracterizados esencialmente por comprender un marco el cual en su parte posterior comporta dos escotaduras para el alojamiento del correspondiente soporte.
ES114779U1965-07-091965-07-09Perfeccionamientos en portarretratos.
ExpiredES114779Y
(es)