ES1004432U - Estructura perfeccionada para clises de fotopolimero. - Google Patents

Estructura perfeccionada para clises de fotopolimero.

Info

Publication number
ES1004432U
ES1004432U ES19878701429U ES8701429U ES1004432U ES 1004432 U ES1004432 U ES 1004432U ES 19878701429 U ES19878701429 U ES 19878701429U ES 8701429 U ES8701429 U ES 8701429U ES 1004432 U ES1004432 U ES 1004432U
Authority
ES
Spain
Prior art keywords
cliches
photopolymer
translation
providing
machine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES19878701429U
Other languages
English (en)
Other versions
ES1004432Y (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to ES8701429U priority Critical patent/ES1004432Y/es
Publication of ES1004432U publication Critical patent/ES1004432U/es
Application granted granted Critical
Publication of ES1004432Y publication Critical patent/ES1004432Y/es
Expired legal-status Critical Current

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  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

ESTRUCTURA PERFECCIONADA PARA CLISES DE FOTOPOLIMERO, QUE SE CARACTERIZA PORQUE EL CLISE QUE HA SIDO OBTENIDO POR LOS MEDIOS CONVENCIONALES, COMPORTA UN ESPESOR LIGERAMENTE MENOR QUE PERMITE LA INCORPORACION DE UNA CAPA DE GOMAESPUMA MEDIANTE EL DESPRENDIDO DE LA BASE DE POLIESTER Y SU REINCIRPORACION POSTERIOR SOBRE DICHA CAPA DE GOMAESPUMA, SIN QUE SE VEAN ALTERADAS LAS DIMENSIONES USUALES, CON LO QUE SE OBTIENE UNA CAPA FLEXIBLE O MULLIDA DE ABSORCION Y DE RECUPERACION, LO QUE PERMITE LA ADAPTACION DEL CLISE CUANDO IMPRIME SOBRE EL CARTON ONDULADO, FACILITANDO UNA CORRECTA IMPRESION SIN DETERIORAR TANTO LA SUPERFICIE ONDULADA COMO EL PROPIO CLISE, QUE REDUNDA EN UNA MAYOR VELOCIDAD DE IMPRESION, AL PROPORCIONAR DICHA CAPA DE GOMAESPUMA LA RAPIDA RECUPERACION, LO QUE PROPORCIONA UNA MAYOR DURACION, POR ABSORBER LA PRESION DEL RODILLO ENTINTADOR, EVITANDO UN DESGASTE ANORMAL DEL CLISE.
ES8701429U 1987-04-28 1987-04-28 Estructura perfeccionada para clises de fotopolimero. Expired ES1004432Y (es)

Priority Applications (1)

Application Number Priority Date Filing Date Title
ES8701429U ES1004432Y (es) 1987-04-28 1987-04-28 Estructura perfeccionada para clises de fotopolimero.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ES8701429U ES1004432Y (es) 1987-04-28 1987-04-28 Estructura perfeccionada para clises de fotopolimero.

Publications (2)

Publication Number Publication Date
ES1004432U true ES1004432U (es) 1988-10-01
ES1004432Y ES1004432Y (es) 1989-04-01

Family

ID=8250908

Family Applications (1)

Application Number Title Priority Date Filing Date
ES8701429U Expired ES1004432Y (es) 1987-04-28 1987-04-28 Estructura perfeccionada para clises de fotopolimero.

Country Status (1)

Country Link
ES (1) ES1004432Y (es)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2162726A1 (es) * 1999-04-06 2002-01-01 Artegraf Fotopolimero S L Cliche para la impresion desuperficies rusticas e irregulares.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2162726A1 (es) * 1999-04-06 2002-01-01 Artegraf Fotopolimero S L Cliche para la impresion desuperficies rusticas e irregulares.

Also Published As

Publication number Publication date
ES1004432Y (es) 1989-04-01

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Legal Events

Date Code Title Description
FD1K Utility model lapsed

Effective date: 19991108