EP4663818A4 - Plattiertes element und verschlussleiste - Google Patents
Plattiertes element und verschlussleisteInfo
- Publication number
- EP4663818A4 EP4663818A4 EP23921022.2A EP23921022A EP4663818A4 EP 4663818 A4 EP4663818 A4 EP 4663818A4 EP 23921022 A EP23921022 A EP 23921022A EP 4663818 A4 EP4663818 A4 EP 4663818A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- closure strip
- plated element
- plated
- closure
- strip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- A—HUMAN NECESSITIES
- A44—HABERDASHERY; JEWELLERY
- A44B—BUTTONS, PINS, BUCKLES, SLIDE FASTENERS, OR THE LIKE
- A44B19/00—Slide fasteners
- A44B19/42—Making by processes not fully provided for in one other class, e.g. B21D53/50, B21F45/18, B22D17/16, B29D5/00
-
- A—HUMAN NECESSITIES
- A44—HABERDASHERY; JEWELLERY
- A44B—BUTTONS, PINS, BUCKLES, SLIDE FASTENERS, OR THE LIKE
- A44B19/00—Slide fasteners
- A44B19/02—Slide fasteners with a series of separate interlocking members secured to each stringer tape
- A44B19/04—Stringers arranged edge-to-edge when fastened, e.g. abutting stringers
- A44B19/06—Stringers arranged edge-to-edge when fastened, e.g. abutting stringers with substantially rectangular members having interlocking projections and pieces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/005—Contacting devices
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/10—Agitating of electrolytes; Moving of racks
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/007—Electroplating using magnetic fields, e.g. magnets
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/22—Electroplating combined with mechanical treatment during the deposition
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
- C25D5/617—Crystalline layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/02—Slide fasteners
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mechanical Engineering (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrotherapy Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2023/003857 WO2024166186A1 (ja) | 2023-02-06 | 2023-02-06 | めっき材、及びファスナーストリンガー |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP4663818A1 EP4663818A1 (de) | 2025-12-17 |
| EP4663818A4 true EP4663818A4 (de) | 2026-05-20 |
Family
ID=92262124
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP23921022.2A Pending EP4663818A4 (de) | 2023-02-06 | 2023-02-06 | Plattiertes element und verschlussleiste |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP4663818A4 (de) |
| JP (1) | JP7847678B2 (de) |
| KR (1) | KR20250145049A (de) |
| CN (1) | CN120584220A (de) |
| MX (1) | MX2025009144A (de) |
| TW (1) | TWI887832B (de) |
| WO (1) | WO2024166186A1 (de) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN122160683B (zh) * | 2026-04-30 | 2026-07-21 | 歌尔股份有限公司 | 一种导磁板组件、发声装置和电子设备 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080038574A1 (en) * | 2004-07-07 | 2008-02-14 | Cheng-Fu Yu | Electronic Component Having Tin Rich Deposit Layer and the Process for Depositing the Same |
| EP3611294A1 (de) * | 2017-04-14 | 2020-02-19 | YKK Corporation | Galvanisierungsverfahren und -vorrichtung |
| CN111254467A (zh) * | 2020-01-20 | 2020-06-09 | 广东省焊接技术研究所(广东省中乌研究院) | 一种梯度结构镍钨合金、制备方法及新型层状结构 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005166910A (ja) * | 2003-12-02 | 2005-06-23 | Fujikura Ltd | プリント配線板およびその製造方法 |
| JP5940256B2 (ja) * | 2011-07-13 | 2016-06-29 | 住友金属鉱山株式会社 | 銅電気めっき方法及びその銅電気めっき方法を用いて成膜された銅めっき被膜を有する金属化樹脂フィルム |
| JP2013133504A (ja) * | 2011-12-27 | 2013-07-08 | Toyama Sumitomo Denko Kk | 金属多孔体の製造方法及び金属多孔体 |
| US9388502B2 (en) * | 2012-07-12 | 2016-07-12 | Ykk Corporation | Button or fastener member of copper-plated aluminum or aluminum alloy and method of production thereof |
| US11781234B2 (en) * | 2018-12-26 | 2023-10-10 | Mitsubishi Materials Corporation | Copper alloy plate, plating film-attached copper alloy plate, and methods respectively for manufacturing these products |
| JP7596662B2 (ja) * | 2019-08-06 | 2024-12-10 | 三菱マテリアル株式会社 | 銅合金板、めっき皮膜付銅合金板及びこれらの製造方法 |
| JP7604778B2 (ja) * | 2020-03-19 | 2024-12-24 | 三菱マテリアル株式会社 | Cu-Ni-Si系銅合金板、めっき皮膜付Cu-Ni-Si系銅合金板及びこれらの製造方法 |
| CN117836472A (zh) * | 2021-08-06 | 2024-04-05 | Ykk株式会社 | 拉链牙链带、拉链链条及拉链的制造方法、以及电镀装置 |
-
2023
- 2023-02-06 KR KR1020257029399A patent/KR20250145049A/ko active Pending
- 2023-02-06 EP EP23921022.2A patent/EP4663818A4/de active Pending
- 2023-02-06 CN CN202380092407.9A patent/CN120584220A/zh active Pending
- 2023-02-06 JP JP2024575893A patent/JP7847678B2/ja active Active
- 2023-02-06 WO PCT/JP2023/003857 patent/WO2024166186A1/ja not_active Ceased
- 2023-11-02 TW TW112142150A patent/TWI887832B/zh active
-
2025
- 2025-08-05 MX MX2025009144A patent/MX2025009144A/es unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080038574A1 (en) * | 2004-07-07 | 2008-02-14 | Cheng-Fu Yu | Electronic Component Having Tin Rich Deposit Layer and the Process for Depositing the Same |
| EP3611294A1 (de) * | 2017-04-14 | 2020-02-19 | YKK Corporation | Galvanisierungsverfahren und -vorrichtung |
| CN111254467A (zh) * | 2020-01-20 | 2020-06-09 | 广东省焊接技术研究所(广东省中乌研究院) | 一种梯度结构镍钨合金、制备方法及新型层状结构 |
Non-Patent Citations (1)
| Title |
|---|
| See also references of WO2024166186A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202432901A (zh) | 2024-08-16 |
| JP7847678B2 (ja) | 2026-04-17 |
| JPWO2024166186A1 (de) | 2024-08-15 |
| CN120584220A (zh) | 2025-09-02 |
| EP4663818A1 (de) | 2025-12-17 |
| WO2024166186A1 (ja) | 2024-08-15 |
| MX2025009144A (es) | 2025-09-02 |
| TWI887832B (zh) | 2025-06-21 |
| KR20250145049A (ko) | 2025-10-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE |
|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
|
| 17P | Request for examination filed |
Effective date: 20250526 |
|
| AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC ME MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
| DAV | Request for validation of the european patent (deleted) | ||
| DAX | Request for extension of the european patent (deleted) | ||
| A4 | Supplementary search report drawn up and despatched |
Effective date: 20260422 |
|
| RIC1 | Information provided on ipc code assigned before grant |
Ipc: C25D 7/02 20060101AFI20260416BHEP Ipc: A44B 19/42 20060101ALI20260416BHEP Ipc: C25D 5/10 20060101ALI20260416BHEP Ipc: C25D 17/16 20060101ALI20260416BHEP Ipc: A44B 19/06 20060101ALI20260416BHEP Ipc: C25D 5/00 20060101ALI20260416BHEP Ipc: C25D 5/22 20060101ALI20260416BHEP Ipc: C25D 7/06 20060101ALI20260416BHEP Ipc: C25D 17/00 20060101ALI20260416BHEP Ipc: C25D 21/10 20060101ALI20260416BHEP |