EP4587441A1 - Verfahren zur herstellung von materialien für die verwendung in elektronischen vorrichtungen - Google Patents
Verfahren zur herstellung von materialien für die verwendung in elektronischen vorrichtungenInfo
- Publication number
- EP4587441A1 EP4587441A1 EP23768569.8A EP23768569A EP4587441A1 EP 4587441 A1 EP4587441 A1 EP 4587441A1 EP 23768569 A EP23768569 A EP 23768569A EP 4587441 A1 EP4587441 A1 EP 4587441A1
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- European Patent Office
- Prior art keywords
- aromatic
- radicals
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- atoms
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Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
- C07D487/06—Peri-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
- C07D211/02—Preparation by ring-closure or hydrogenation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
- C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D211/68—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having one double bond between ring members or between a ring member and a non-ring member
- C07D211/72—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms, with at the most one bond to halogen, directly attached to ring carbon atoms
- C07D211/74—Oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D491/00—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00
- C07D491/12—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00 in which the condensed system contains three hetero rings
- C07D491/16—Peri-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D513/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00
- C07D513/12—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00 in which the condensed system contains three hetero rings
- C07D513/16—Peri-condensed systems
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
- H10K85/6572—Polycyclic condensed heteroaromatic hydrocarbons comprising only nitrogen in the heteroaromatic polycondensed ring system, e.g. phenanthroline or carbazole
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Definitions
- the present invention relates in particular to methods for producing materials for use in electronic devices, in particular in organic electroluminescent devices.
- Organic-based charge transport materials e.g. triarylamine-based hole transporters
- organic or polymeric light-emitting diodes OLEDs or PLEDs
- organic solar cells O-SC
- organic field effect transistors O-FET
- organic thin film transistors O-TFT
- organic switching elements O-IC
- organic optical amplifiers and organic laser diodes O-Laser
- electronic devices are understood to be organic electronic devices which contain organic semiconductor materials as functional materials.
- the electronic devices stand for electroluminescent devices such as OLEDs.
- OLEDs in which organic compounds are used as functional materials, is known to those skilled in the art from the prior art.
- OLEDs are understood to mean electronic devices that have one or more layers that comprise organic compounds and emit light when a voltage is applied.
- Electronic devices usually include cathode, anode and at least one functional, preferably emissive, layer. In addition to these layers, they can also contain further layers, for example one or more hole injection layers, hole transport layers, hole blocking layers, electron transport layers, electron injection layers, exciton blocking layers, electron blocking layers and / or charge generation layers.
- the hole transport layers and electron transport layers have a major influence on the performance data of electronic devices.
- Indolo[3,2,1-jk]carbazole is a very important structural unit in such materials, especially in e- and h-TMM (electron-conducting or hole-conducting Tnplet matrix materials), narrow-band SEB (blue singlet emitter), HTM (hole transport materials) and EBM ( Electron blocking materials).
- e- and h-TMM electron-conducting or hole-conducting Tnplet matrix materials
- narrow-band SEB blue singlet emitter
- HTM hole transport materials
- EBM Electron blocking materials
- the second ring is closed starting from an N-arylated carbazole. This means that no control of the regioisomers is possible because the ring can be closed with either of the two six-membered rings of the carbazole.
- X' can represent H or a corresponding reactive group.
- Ring closure reactions include pyrolysis (Wharton et al., Chem. Eur. J. 15 (2009) 5482), oxidative cyclization (Jones et al., Adv. Synth. Catal. 357 (2015) 945), transition metal catalysis (Lv et al. , Tetrahedron Letters 53 (2012) 5248) and diazotization (Hiraga et al., Tetrahedron 94 (2021) 132317; Hiraga et al., Tetrahedron 86 (2021) 132049).
- Pyrolysis requires complex equipment and requires extreme conditions. It is also only applicable to vaporizable groups.
- Transition metal catalysis often requires high temperatures and long reaction times and the use of transition metals. Little to no regioselectivity is also observed. Large amounts of catalyst are also often required. Only low yields were achieved during diazotization and little or no regioselectivity was observed.
- the object of the present invention is to provide a process for producing indolo[3,2,1-jk]carbazole and derivatives thereof.
- the subject of the present invention is therefore to provide a process for the production of indolo[3,2,1-jk]carbazole and derivatives thereof, comprising the following steps: a) providing a composition comprising a compound of formula (1) and at least one nitrosyl cation source; b) reacting the composition from a) to form a diazonium salt; c) optionally isolation of the diazonium salt according to formula (2); d) reaction to give a compound according to formula (3); and where the following applies to the symbols used:
- Ar 1 , Ar 2 , Ar 3 are, in each case, the same or different, an aromatic or heteroaromatic ring system with 5 to 40 aromatic ring atoms, which can be substituted by one or more radicals R, where two or more R together form an aromatic or heteroaromatic ring system can;
- Ar' is, identically or differently, an aromatic or heteroaromatic ring system with 5 to 40 aromatic ring atoms, which can be substituted by one or more radicals R 1 , where two or more R 1 can together form an aromatic or heteroaromatic ring system;
- Z is an anion, preferably from the nitrosyl cation source.
- Ar 1 , Ar 2 and Ar 3 are, in each case, the same or different, an aryl or heteroaryl group with 6 to 13 aromatic ring atoms or a fluorene group, where the aryl or heteroaryl groups or the fluorene group are each separated by one or several radicals R can be substituted.
- Ar 1 , Ar 2 and Ar 3 in each occurrence, identically or differently, of an aryl group with 6 to 10 aromatic ring atoms or heteroaryl group with 6 to 13 aromatic ring atoms or a fluorene group, where the aryl or heteroaryl groups or the fluorene group are each replaced by one or several R radicals can be substituted.
- Ar 1 , Ar 2 and Ar 3 are identically or differently phenyl, naphthyl, fluorene, dibenzofuran, dibenzothiophene, carbazole, azadibenzofuran or diazadibenzofurn in each occurrence.
- Ar 1 , Ar 2 and Ar 3 are identical or different in each occurrence of phenyl, dibenzofuran or carbazole, with preferably at least two of the groups Ar 1 , Ar 2 and Ar 3 standing for phenyl.
- the compounds of the formulas (1), (2) and (3) are compounds of the formulas (1 -1), (2-1) and (3-1):
- X is the same or different for each occurrence of CR or N with the proviso that a maximum of two groups X per cycle represent N;
- the compound of formula (1) or (1 -1) it is also possible for the compound of formula (1) or (1 -1) to have more than one structural unit for carrying out the reaction according to the invention. This makes it possible to produce more complex structures in one step through multiple ring closures. Compounds with one, two or three, preferably one or two, structural units are preferred for carrying out the reaction according to the invention. Examples of such a structure with two structural units are, for example, the following structures of the formula (1a), (2a), or (3a):
- Preferred compounds with two structural units are compounds of the formula (1 -1 a), (2-1 a) and (3-1 a):
- An aryl group in the sense of this invention contains 6 to 40 carbon atoms;
- a heteroaryl group in the sense of this invention contains 5 to 40 carbon atoms and at least one heteroatom, with the proviso that the sum of carbon atoms and heteroatoms is at least 5.
- the heteroatoms are preferably selected from N, 0 and/or S.
- An aryl group or heteroaryl group is either a simple aromatic cycle, i.e.
- benzene or a simple heteroaromatic cycle, for example pyridine, pyrimidine, thiophene, etc., or a fused (fused) aryl or heteroaryl group, for example naphthalene, anthracene, phenanthrene, quinoline, isoquinoline, etc., understood.
- Aromatics linked to each other by a single bond, such as biphenyl, are not referred to as aryl or heteroaryl groups, but as aromatic ring systems.
- An aromatic ring system in the sense of this invention contains 6 to 60 carbon atoms, preferably 6 to 40 carbon atoms in the ring system.
- a heteroaromatic ring system in the sense of this invention contains 1 to 60 carbon atoms, preferably 1 to 40 carbon atoms and at least one heteroatom in the ring system, with the proviso that the sum of carbon atoms and heteroatoms is at least 5.
- the heteroatoms are preferably selected from N, O and/or S.
- An aromatic or heteroaromatic ring system in the context of this invention is intended to mean a system that does not necessarily only contain aryl or heteroaryl groups, but also in which several aryl or heteroaryl groups are replaced by a non-aromatic moiety (preferably less than 10% of the atoms other than H), such as B. a C, N or O atom or carbonyl group can be connected.
- B. a C, N or O atom or carbonyl group can be connected.
- systems such as fluorene, 9,9'-spirobifluorene, 9,9-diarylfluorene, triarylamine, diaryl ether, stilbene, etc. should also be understood as aromatic ring systems in the sense of this invention, as should systems in which two or more aryl groups, for example are connected by a linear or cyclic alkyl group or by a silyl group.
- Preferred aromatic or heteroaromatic ring systems are simple aryl or heteroaryl groups and groups in which two or more aryl or heteroaryl groups are linked directly to one another, for example biphenyl, terphenyl, quaterphenyl or bipyridine, as well as fluorene or spirobifluorene.
- An electron-rich heteroaromatic ring system is characterized in that it is a heteroaromatic ring system that does not contain any electron-poor heteroaryl groups.
- An electron-deficient heteroaryl group is a six-membered heteroaryl group with at least one nitrogen atom or a five-membered heteroaryl group with at least two heteroatoms, one of which is a nitrogen atom and the other is oxygen, sulfur or a substituted nitrogen atom, with additional aryl or heteroaryl groups attached to these groups may be condensed.
- electron-rich heteroaryl groups are five-ring heteroaryl groups with exactly one heteroatom, selected from oxygen, sulfur or substituted nitrogen, to which further aryl groups and / or further electron-rich five-ring heteroaryl groups can be fused.
- electron-rich heteroaryl groups are pyrrole, furan, thiophene, indole, benzofuran, benzothiophene, carbazole, dibenzofuran, dibenzothiophene or indenocarbazole.
- An electron-rich heteroaryl group is also called an electron-rich heteroaromatic residue.
- An electron-poor heteroaromatic ring system is characterized in that it contains at least one electron-poor heteroaryl group and particularly preferably no electron-rich heteroaryl groups.
- alkyl group is used as a generic term for both linear or branched alkyl groups as well as for cyclic alkyl groups.
- alkenyl group or alkynyl group are used as generic terms for both linear or branched alkenyl or alkynyl groups as well as for cyclic alkenyl or alkynyl groups.
- a cyclic alkyl, alkoxy or thioalkoxy group is understood to mean a monocyclic, a bicyclic, a tricyclic or a polycyclic group.
- an aliphatic hydrocarbon radical or an alkyl group or an alkenyl or alkynyl group which can contain 1 to 40 carbon atoms and in which individual H atoms or CH2 groups are also substituted by the above-mentioned groups can be, preferably the radicals methyl, ethyl, n-propyl, i-propyl, n-butyl, i-butyl, s-butyl, t-butyl, 2-methylbutyl, n-pentyl, s-pentyl, t-pentyl, 2-pentyl, neo-pentyl, cyclopentyl, n-hexyl, s-hexyl, t-hexyl, 2-hexyl, 3-hexyl, neo-hexyl, cyclohexyl, 1-methylcyclopentyl, 2-methyl-pentyl, n
- alkoxy group OR 1 with 1 to 40 carbon atoms, preference is given to methoxy, trifluoromethoxy, ethoxy, n-propoxy, i-propoxy, n-butoxy, i-butoxy, s-butoxy, t-butoxy, n-pentoxy, s- Pentoxy, 2-methylbutoxy, n-hexoxy, cyclohexyloxy, n-heptoxy, cycloheptyloxy, n-octyloxy, cyclooctyloxy, 2-ethylhexyloxy, pentafluorethoxy and 2,2, 2-trifluorethoxy understood.
- a thioalkyl group SR 1 with 1 to 40 carbon atoms includes, in particular, methylthio, ethylthio, n-propylthio, i-propylthio, n-butylthio, i-butylthio, s-butylthio, t-butylthio, n-pentylthio, s-Pentylthio, n-hexylthio, cyclohexylthio, n-heptylthio, cycloheptylthio, n-octylthio, cyclooctylthio, 2-ethylhexylthio, trifluoromethylthio, pentafluoroethylthio, 2,2,2-trifluoroethylthio, ethenylthio, propenylthio, butenylthio, pentenylthio, cyclopent
- alkyl, alkoxy or thioalkyl groups may be straight chain, branched or cyclic, where one or more non-adjacent CH2 groups may be replaced by the above groups;
- one or more H atoms can also be replaced by D, F, CI, Br, I, CN or NO2, preferably F, CI or CN, particularly preferably F or CN.
- An aromatic or heteroaromatic ring system with 5 - 60 aromatic ring atoms, preferably 5 - 40 aromatic ring atoms, which can also be substituted with the above-mentioned radicals or a hydrocarbon radical and which can be linked via any positions on the aromatic or heteroaromatic, are in particular Groups are understood to be derived from benzene, naphthalene, anthracene, benzanthracene, phenanthrene, pyrene, chrysene, perylene, fluoranthene, naphthacene, pentacene, benzopyrene, biphenyl, biphenylene, terphenyl, triphenylene, fluorene, spirobifluorene, dihydrophenanthrene, dihydropyrene, tetrahydropyrene, cis - or trans-indenofluorene, cis- or trans-lndenocarbazole, cis-
- the formulation that two or more radicals can form a ring system together is intended to mean, among other things, that the two radicals are linked to one another by a chemical bond with the formal elimination of two hydrogen atoms. This is illustrated by the following diagram:
- a composition comprising a compound of formula (1) and at least one nitrosyl cation source is provided.
- a nitrosyl cation source is understood to mean a compound or combination of compounds which releases nitrosyl cations under the reaction conditions.
- the nitrosyl cation can already be present in the source, as in the case of a nitrosyl salt, or it can be generated in situ, as in the case of a nitrite compound with an acid.
- the nitrosyl cation source is soluble in the composition.
- the nitrosyl cation source is selected from at least one nitrosyl salt and/or the combination of a nitrite compound with an acid, preferably at least one nitrosyl salt and/or the combination of an organic nitrite compound with an acid.
- the acid is preferably a protonic acid compound. This allows the nitrosyl cation to be formed with the elimination of water and/or alcohol.
- nitrosyl salts are nitrosyl fluoride, nitrosyl chloride, nitrosyl bromide, nitrosyl cyanide, nitrosyl azide, nitrosyl perchlorate, nitrosyl perfluoroborate and nitrosyl hexafluorophosphate.
- the use of nitrosyl salts avoids the use of an acid, allowing the presence of acid-labile groups in the compound of formula (1).
- nitrite compounds are inorganic nitrite salts, such as sodium nitrite, potassium nitrite or ammonium nitrite.
- Organic nitrite compounds in particular alkyl nitrites (nitric acid esters), are preferred, preferably selected from ethyl nitrite, propyl nitrite, isopropyl nitrite, 1-butyl nitrite, tert-butyl nitrite, amyl nitrite or iso-amyl nitrite.
- Nitrite compounds release nitrosyl cations in the presence of an acid.
- the acid is preferably a protic acid compound, such as nitric acid, sulfuric acid, hydrochloric acid, glacial acetic acid, trifluoroacetic acid, toluenesulfonic acid, in particular anhydrous or as a monohydrate, trifluoromethanesulfonic acid, tetrafluoroboric acid or ammonium salts, such as ammonium tetrafluoroborate.
- Profanated complexes of these acids with, for example, diethyl ether can also be used.
- Suitable compounds are also oxonium ions HOR'2 + , where R', the same or different, represents H, alkyl group or aryl group, as defined above. R' is preferably identical or different in each occurrence for H or a straight-chain, branched or cyclic alkyl group with 1 to 20 carbon atoms.
- composition is a solution of the compound of formula (1).
- the concentration can be adjusted according to the educts and the solvent.
- the at least one nitrosyl cation source is added to the compound of formula (1).
- the nitrosyl cation source is added at a temperature of below 10 °C, in particular below 8 °C, particularly preferably below 5 °C.
- the temperature is chosen so that the composition can still be stirred.
- a temperature of -10 to 5 °C is preferred, particularly preferably 0 °C.
- the acid is preferably added first and then the nitrite compound.
- At least the nitrite compound is preferably added at the above-mentioned temperatures, particularly preferably the acid and the nitrite compound are added at the above-mentioned temperatures.
- the nitrosyl cation source is preferably added while stirring the composition. If a solution is added, it is added dropwise. In the case of a solid, such as in the case of nitrosyl salts, the addition is preferably carried out in several portions.
- composition After each addition it may be advantageous to stir the composition for 5 minutes to 2 hours, preferably at the same temperature as the addition.
- the nitrosyl cation source is added to the compound of formula (1) in an equimolar amount or in excess based on the nitrosyl cations, preferably at least 1 equivalent, particularly preferably at least 1.01 equivalent, in particular at least 1.02 equivalent. 1.02 to 1.1 equivalents are particularly preferred. If the compound of formula (1) has several amino groups for diazotization, the equivalents refer to the number of amino groups for diazotization present in the compound of formula (1).
- the equivalents refer to the nitrite compound.
- the acid is preferably at least equimolar, in particular at least 1.02 equivalents, particularly at least 1.5 equivalents, most particularly at least 2 equivalents, based on the Amino groups are added for diazotization in the compound of formula (1). It may be necessary to adjust the amount of acid so that after protonation of the compound according to formula (1) at least 1 equivalent of protons are still available for protonation of the nitrite compound.
- the reaction in step a) is preferably carried out under protective gas, preferably under nitrogen or argon.
- An oxygen-poor to oxygen-free atmosphere is preferred. This means an oxygen content of preferably less than 10% by volume, in particular less than 5% by volume, very particularly preferably less than 1% by volume.
- the reaction is preferably carried out using dried starting materials and solvents.
- the reaction can also be carried out in the presence of water.
- hydrates of the acids or aqueous solutions of the acids e.g. B. HBF4 can be used as a 30% aqueous solution. It could then also be possible to carry out the reaction with an aqueous and an organic phase.
- the reaction is preferably carried out under normal pressure.
- the diazonium salt of formula (2) formed can be isolated.
- the anion Z" is preferably, depending on the nitrosyl cation source, the anion of the nitrosyl salt or the anion of the acid used.
- the solvent for the composition in step c) can also be changed.
- the solvent is preferably selected from the solvents for step a).
- a composition comprising a compound according to formula (2) is provided. This can be done by dissolving a compound of formula (2) or obtained by the reaction in step a).
- the composition is added at a temperature of below 10 °C, in particular below 8 °C, particularly preferably below 5 °C.
- the temperature is chosen so that the composition can still be stirred.
- a temperature of -10 °C to 5 °C is preferred, particularly preferably 0 °C.
- the composition is then converted into a compound according to formula (3). This results in the release of nitrogen. This is preferably done by heating the composition relative to the temperature in step a). Heating can be controlled according to nitrogen development.
- the temperature difference to step a) is preferably at least 10 ° C.
- Heating to at least 20 °C, preferably to at least 30 °C, is preferred. Heating to up to 200 °C, preferably up to 150 °C, particularly preferably up to 100 °C is particularly preferred.
- the degree of conversion can be determined.
- the reaction is preferably carried out until a molar amount of nitrogen corresponding to at least 80%, in particular at least 90%, very particularly preferably at least 95%, based on the molar amount of the starting material, has been released.
- the reaction is preferably carried out until the release of nitrogen has ended.
- the release of nitrogen can be modulated.
- the reaction in step c) is preferably carried out under protective gas, preferably under nitrogen or argon.
- An oxygen-free atmosphere is preferred.
- An oxygen-poor to oxygen-free atmosphere is preferred. This means an oxygen content of preferably less than 10% by volume, in particular less than 5% by volume, very particularly preferably less than 1% by volume.
- the reaction is preferably carried out using dried starting materials and solvents.
- the reaction is preferably carried out under pressure equalization with the environment.
- the product of formula (3) obtained is preferably isolated. This can be done by precipitation, extraction and/or removal of the solvent. The solid obtained can still be washed and dried. Furthermore, the product can be further purified by standard organic chemistry processes, for example recrystallization, chromatography and/or sublimation.
- the reaction of the compound according to formula (1) to formula (3) preferably takes place in at least 60% up to quantitative yield based on the molarity.
- the process according to the invention allows the production of the indolo-[3,2,1-jk]carbazole skeleton with high regioselectivity, under mild conditions and in high yields.
- Y 1 and Y 2 are selected from the following combinations:
- a maximum of two groups X represent N and all other groups X represent CR, particularly preferably in combination with the embodiments of the table above.
- a maximum of one group X represents N and very particularly preferably all groups X represent CR, particularly preferably in combination with the embodiments of the table above.
- Y 1 represents a single bond, BR, CR2, CO, N or 0, particularly preferably a single bond, BR, N or 0.
- Y 2 represents a single bond, BR, CR2, CO, N or 0, particularly preferably a single bond, BR, N or 0 and most preferably a single bond.
- Y 1 and Y 2 are selected from the following combinations:
- a maximum of two groups X represent N and all other groups X represent CR, particularly preferably in combination with the embodiments of the table above.
- a maximum of one group X represents N, and very particularly preferably all groups X represent CR, particularly preferably in combination with the embodiments of the table above.
- Two radicals R can also form an aliphatic, aromatic or heteroaromatic ring system with each other.
- R is selected identically or differently for each occurrence from the group consisting of H, F, CN, a straight-chain alkyl group with 1 to 6 carbon atoms, in particular with 1, 2, 3 or 4 carbon atoms, or a branched or cyclic alkyl group with 3 to 6 carbon atoms, where the alkyl group can be substituted with one or more R 1 radicals, but is preferably unsubstituted, or an aromatic or heteroaromatic ring system with 6 to 24 aromatic ring atoms, each with one or more radicals R 1 , preferably non-aromatic radicals R 1 , may be substituted.
- the 1 -(2-aminoaryl)-carbazoles (3) required to prepare the indolocarbazoles (4) can, for. B. from literature-known, 1-functionalized carbazoles (1) and 2-functionalized anilines (2) in a Suzuki coupling, in each case a CI, Br, I or OTf with a boronic acid or boronic acid ester function B (OR) 2 is reacted (step 1 in Scheme 1).
- 2-functionalized anilines (2) 2-functionalized nitro aromatics can also be used.
- the 1 -(2-nitroaryl)carbazoles obtained in this way can then be converted to the 1 -(2-aminoaryl)carbazoles using methods common to those skilled in the art, e.g.
- the following syntheses are carried out under an inert gas atmosphere in dried solvents.
- the metal complexes are also handled in the absence of light or under yellow light.
- the solvents and reagents can, for. B. can be obtained from Sigma-ALDRICH or ABCR.
- the respective information in square brackets or the numbers given for individual compounds refer to the CAS numbers of the compounds known from the literature. For compounds that can have multiple enantiomeric, diastereomeric or tautomeric forms, one form is shown as a representative.
- Stage 2 Diazotization and cyclization Variant 1: Diazotization with alkyl nitrites
- iso-amyl nitrite [110-46-3] can be used as an alternative.
- the following compounds can be prepared via the two steps Suzuki coupling and cyclization, in yields of typically 40-90% for monocyclizations and 20-60% for dicyclizations.
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Abstract
Description
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP22195805 | 2022-09-15 | ||
| PCT/EP2023/074948 WO2024056625A1 (de) | 2022-09-15 | 2023-09-12 | Verfahren zur herstellung von materialien für die verwendung in elektronischen vorrichtungen |
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| Publication Number | Publication Date |
|---|---|
| EP4587441A1 true EP4587441A1 (de) | 2025-07-23 |
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| Application Number | Title | Priority Date | Filing Date |
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| EP23768569.8A Pending EP4587441A1 (de) | 2022-09-15 | 2023-09-12 | Verfahren zur herstellung von materialien für die verwendung in elektronischen vorrichtungen |
Country Status (3)
| Country | Link |
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| EP (1) | EP4587441A1 (de) |
| CN (1) | CN119836423A (de) |
| WO (1) | WO2024056625A1 (de) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP5483962B2 (ja) * | 2008-09-04 | 2014-05-07 | ユー・ディー・シー アイルランド リミテッド | 有機電界発光素子 |
| DE102010005697A1 (de) * | 2010-01-25 | 2011-07-28 | Merck Patent GmbH, 64293 | Verbindungen für elektronische Vorrichtungen |
| US9929353B2 (en) * | 2014-04-02 | 2018-03-27 | Universal Display Corporation | Organic electroluminescent materials and devices |
| CN108368120B (zh) * | 2015-11-20 | 2022-02-08 | 罗门哈斯电子材料韩国有限公司 | 有机电致发光化合物、有机电致发光材料及包含其的有机电致发光装置 |
| KR102890850B1 (ko) * | 2019-10-24 | 2025-11-27 | 삼성디스플레이 주식회사 | 유기 전계 발광 소자 및 유기 전계 발광 소자용 다환 화합물 |
-
2023
- 2023-09-12 EP EP23768569.8A patent/EP4587441A1/de active Pending
- 2023-09-12 WO PCT/EP2023/074948 patent/WO2024056625A1/de not_active Ceased
- 2023-09-12 CN CN202380066228.8A patent/CN119836423A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN119836423A (zh) | 2025-04-15 |
| WO2024056625A1 (de) | 2024-03-21 |
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