Classifications

• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
  • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
  • C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
  • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
  • C03C17/3642—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating containing a metal layer
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
  • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
  • C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
  • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
  • C03C17/3647—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer in combination with other metals, silver being more than 50%
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
  • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
  • C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/90—Other aspects of coatings
  • C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/90—Other aspects of coatings
  • C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
  • C03C2217/944—Layers comprising zinc oxide
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/90—Other aspects of coatings
  • C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
  • C03C2217/948—Layers comprising indium tin oxide [ITO]

Definitions

• Such insulated glazings are intended to equip more particularly buildings, in particular to reduce heat loss in winter (so-called “low-emissive glazing”) and maximize heat gain from sunlight.
• Heat gain from sunlight may be evaluated using the solar factor SF or g. It is defined as the ratio between the energy entering the room through the glazing and the incident solar energy.
• the energy entering the room is the sum of the energy from the sun transmitted directly through the glazing and of the energy absorbed by the glazing that is re-emitted inwards.
• the solar factor SF is measured in the scope of the invention according to the conditions described in the international standard ISO 9050-2003.
• the latter kind of low-E coating generally comprises an alternating sequence of n metallic functional layers and n+1 dielectric or antireflective coatings and is deposited, for example, by means of vacuum deposition techniques such as magnetic field-assisted cathodic sputtering, more commonly referred to as “magnetron sputtering” or simply “sputtering”.
• Such low-E coatings are generally deposited faces in contact with a cavity of the multiple glazing to protect them from degradation.
• the presence of a low-emissive coating also has the effect of lowering the solar factor and generally the higher the emissivity of a metallic functional layer based low-E coating, the lower its solar factor.
• the presence of two low-E coatings on two different faces of a glazing may advantageously reduce the energy transmission coefficient U, the inventor(s) have found that it is also accompanied by a significant decrease in light transmittance and/or Solar Factor.
• a second low emissivity coating comprising at least one functional layer of transparent conductive oxide (TCO) and having a second emissivity value s n 2; wherein a ratio of emissivity of the second low emissivity coating by the emissivity of the first low emissivity coating (£ n 2/£ n 1 ) is less than 4.2.
• double glazing units may be obtained that provide the following advantages, with two 4 mm thick clear or preferably mid-iron sodalime glass sheets and a space between glass sheets of 15 mm filled to 90% with argon: a. a high solar factor SF, with SF > 65%, preferably SF > 68%, more preferably SF > 70%; b. an insulating property enabling a value U ⁇ 1.1 W/(m 2 K), preferably U ⁇ 1 .0 W/(m 2 K) to be reached; c.
• triple glazing units may be obtained that provide the following advantages, with three 4 mm thick clear or preferably mid-iron sodalime glass sheets and spaces between glass sheets of 14 to 18 mm filled to 90% with argon: a. a high solar factor SF, with SF > 56%, preferably SF > 58%, more preferably SF > 60%; b. an insulating property enabling a value U ⁇ 0.6 W/(m 2 K), preferably U ⁇ 0.5 W/(m 2 K) to be reached; c.
• triple glazing units such values may in particular be obtained with a third low emissivity coating on face 2 or face 3, that is, on the inwards facing side of the first glass substrate or on the outwards facing side of the second substrate.
• FIG. 2 is a schematic cross-sectional view of a triple glazing unit (TGU) according to an embodiment of the invention.
• TGU triple glazing unit
• the present invention relates to a glazing unit according to claim 1 and the dependent claims present preferred embodiments.
• a “low emissivity coating” is considered any known coating in the field to reduce the normal emissivity s n of a glass substrate.
• the term “emissivity” is understood to mean the normal emissivity at 283 K within the meaning of standard EN 12898:2019.
• the functional layers are the infrared reflecting layers, that are responsible for the low emissivity property.
• a layer comprises at least 80%, or even 90% and even 95% by weight of the material considered.
• the glass substrates of the present invention may independently be soda-lime- silicate glass, alumino-silicate glass, alkali-free glass, boro-silicate glass, etc.
• the glass substrates of the invention are made of soda-lime glass or alumino-silicate glass.
• the glass substrate of the invention is a float glass pane.
• float glass pane is understood to mean a glass pane formed by the float process, which is well known in the art.
• Clear glass substrates are considered herein having a composition comprising a total iron content (expressed in terms of Fe 2 O3) ranging from 0.002 to 0.15 weight%, alternatively from 0.002 to 0.10 weight%, or from 0.002 to 0.08 weight%.
• Clear glass substrates are typically characterised by a light transmittance ranging from 89 to 90.3% (for a 4 mm sheet, at D65/2°).
• the total iron content expressed in the form of Fe2O3, is less than or equal to 0.06 weight%, generally ranging from 0.002 to 0.06 weight%, for at least one, preferably for all of the glass substrates of the multiple glazing unit.
• the total iron content it is possible to obtain a glass pane with high transmittance. Thereby high solar factors can be obtained, reaching at least 65%, 68%, even 70% in a double glazing and at least 56%, 58%, even 60% in a triple glazing.
• the composition comprises a total iron (expressed in the form of Fe 2 O3) content ranging from 0.02 to 0.06 weight%, as is considered typical for a mid-iron soda lime glass. Such a glass composition allows for high light transmission at reasonable cost.
• the composition comprises a total iron (expressed in the form of Fe2Os) content ranging from 0.002 to 0.02 weight%, as is considered typical in a low-iron soda lime glass. More advantageously, the composition comprises a total iron (expressed in the form of Fe2Os) content ranging from 0.002 to 0.015 weight%.
• Such low iron contents allow for the highest light transmission levels, though the raw materials necessary are generally more expensive.
• the glass composition does not comprise B2O3 (meaning that it is not intentionally added, but could be present as undesired impurities in very low amounts).
• the glass substrates of the multiple glazing units according to the invention may independently have a thickness of from 0.1 to 25 mm.
• the glass substrates according to the invention independently have a thickness of from 1 to 12 mm, 2 to 12 mm, 3 to 12 mm, alternatively 2 to 7 mm, alternatively 3 to 6 mm.
• the invention also relates to a multiple glazing unit wherein one or more glass substrates are heat strengthened or tempered.
• At least the last glass susbtrate is heat strengthened or tempered.
• heat load induced mechanical stresses may be experienced by the last substrate bearing the first and second low emissivity coatings and the improved U value and SF value may lead to glass breakage due to heat accumulation when the last substrate is not heat strengthened or tempered.
• the last substrate may also be chemically strengthened before being coated with any of the first and second low-emissivity coatings.
• the first low emissivity coating comprising at least one metallic functional layer comprises an alternating arrangement of n infrared reflecting metallic functional layers and n+1 dielectric films, with n > 1 , such that each functional layer is surrounded by dielectric films.
• a dielectric film may comprise one or more layers of dielectric material.
• the first low emissivity coating may comprise one, two, or three infrared reflecting metallic functional layers.
• the infrared reflecting metallic functional layers’ material may be selected from silver or of silver-containing metal alloys or may essentially consist of silver.
• metallic functional layers may comprise gold or copper.
• the first low emissivity coating provides an otherwise uncoated clear glass substrate, for example having a thickness ranging from 4 to 12 mm, with a first normal emissivity s n 1 less than or equal to 0.07, preferably less than or equal to 0.06, and greater or equal to 0.01 .
• Each infrared reflecting metallic functional layer of the first low emissivity coating may be in direct contact with one or two contact layers, for instance comprising zinc oxide, or comprising titanium, nickel, chromium, palladium, tungsten, or niobium or comprising oxides or sub-oxides of titanium, nickel, chromium, palladium, tungsten, or niobium or comprising nitrides or oxynitrides of titanium, nickel, chromium, palladium, tungsten, or niobium.
• one or more zinc oxide comprising contact layers are doped with aluminium or gallium.
• one or more zinc oxide comprising contact layers comprise or are based on an oxide of zinc combined with at least two elements selected from the group comprising titanium, aluminium, indium, gallium, vanadium, molybdenum, magnesium, chromium, zirconium, copper, or silicon.
• the first low emissivity coating may further comprise an absorber layer, for example inserted in a dielectric film or below or above a dielectric film.
• an absorber layer comprises a material, for example metal or a metal nitride, having an extinction coefficient k at a wavelength in the range from 380 nm to 780 nm of at least 1.0 or even of at least 2.0. More details on absorbers are provided below.
• the first low emissivity coating does preferably not comprise an absorbing layer inserted in a dielectric film or below or above a dielectric film.
• the first low emissivity coating may also comprise an uppermost protective film for increased chemical and/or mechanical durability.
• the uppermost protective film may comprise a silicon nitride comprising layer and may further comprise, above and in contact with the silicon nitride based layer, a layer comprising an oxide of titanium and/or of zirconium.
• the first low emissivity coating may have a normal emissivity s n 1 ranging of from 0.035 to 0.07, alternatively of from 0.035 to 0.065, preferably 0.045 to 0.060.
• the advantage of having such a first low emissivity is that the solar factor remains optimal.
• the normal emissivity of the first low emissivity coating is lower than 0.030, and for example as low as from 0.010 to 0.025, the solar factor is negatively impacted and thus too low.
• the emissivity is adjusted mainly by the layer thickness of the metallic functional layer.
• the first low emissivity coating preferably comprises one single infrared reflecting metallic functional layer surrounded by two dielectric films.
• Such coatings with one single infrared reflecting metallic functional layer surrounded by two dielectric films may easily achieve a normal emissivity s n 1 ranging of from 0.035 to 0.065, preferably 0.045 to 0.060, and is easily produced at reasonable cost.
• Such coatings also tend to have higher SF values than coatings with two or more infrared reflecting metallic functional layers.
• each infrared reflecting metallic functional layer of the first low emissivity coating may have a physical thickness of from 5 to 20 nm, alternatively of from 6 to 16 nm, alternatively of from 7 to 14 nm, alternatively of from 7 to 10 nm.
• thicknesses of layers are physical thicknesses in nm, unless otherwise indicated.
• the first low emissivity coating comprising one single layer of infrared reflecting metallic functional layer, comprises in sequence starting from the substrate surface
• a first dielectric film in direct contact with the substrate, which may comprise one or more layers made from an oxide, a nitride or an oxynitride material and having a thickness greater than 3 nm; such materials, which may have a refractive index ranging from 1.7 to 2.5, include but are not limited to silicon nitride, optionally doped with zirconium; titanium oxide; mixed titanium and zirconium oxide; zinc oxide; silicon oxide; mixed zinc tin oxide, in particular Z ⁇ SnCU;
• a second contact layer based on metallic titanium, titanium oxide, titanium suboxide, zinc oxide, aluminium doped zinc oxide, zinctin oxide, with a thickness greater than 3 nm,
• a second dielectric film furthest away from the substrate which may comprise one or more layers made from an oxide, a nitride, or an oxynitride material and having a thickness greater than 3 nm; such materials, having a refractive index ranging from 1.7 to 2.5, include but are not limited to silicon nitride, optionally doped with zirconium; titanium oxide; mixed titanium and zirconium oxide; zinc oxide; silicon oxide; mixed zinc tin oxide, in particular Zn2SnO4;
• a protective top layer such as a layer comprising mixed nitride of silicon and zirconium, or a mixed oxide of titanium and zirconium.
• the refractive indexes are determined at a wavelength of 550 nm.
• the second dielectric film comprises, in sequence starting from the second contact layer: a layer made from an oxide other than silicon oxide with a thickness greater than 3 nm and a layer made from a silicon nitride or a silicon oxide with a thickness greater than 10 nm,
• the second low emissivity coating comprises a single functional layer of TCO.
• the second low emissivity coating comprises a neutralizing undercoat between the substrate and the at least one TCO functional layer.
• the function of the neutralizing undercoat is to allow the neutralization of the color in reflection of the coated pane, i.e. to avoid interference colors in reflection, in particular for the thickness of the functional layer chosen. It is preferably in direct contact with the glass substrate. It is preferably in direct contact with at least one TCO, in particular with a single TCO.
• the neutralizing undercoat of the second low emissivity coating is a double neutralization layer consisting of a first underlayer of a material having a higher refractive index than that of glass, such as TiO2, SnO2 or ZnO, or a mixture of ZnO and SnCh, coated with a second underlayer having a lower refractive index than the first underlayer.
• This second underlayer is for example a layer of a silicon oxide, silicon oxycarbide, such as SiOxCy, or silicon oxynitride, such as SiO x N y , x being less than or equal to 2.
• Exemplary embodiments of the second low emissivity coating’s layer sequences are shown in Table 1 , starting from the glass.
• the undercoats here are double neutralizing layer undercoats.
• Table 1 Exemplary embodiments of the second low emissivity coating’s layer sequences are shown in Table 1 , starting from the glass.
• the undercoats here are double neutralizing layer undercoats.
• the second low emissivity coating does not contain an absorber layer.
• Absorber layers may be layers having an extinction coefficient k above 0.1 in the visible wavelength range.
• Absorber layers may also have a, refractive index n above 1 in the visible wavelength range.
• Example thicknesses for absorber layers may range from 0.2 to 15 nm.
• Absorber layers may for example comprise or consist of NiCr, W, Nb, Pd, Si, Ti, or alloys based on Ni and/or Cr and/or W, or from TiN, CrN, WN, NbN, TaN, ZrN, NiCrN, or NiCrWN, or a mixture of these nitrides.
• the glass substrates other than the last glass substrate are free of any low emissivity coatings.
• the first glass substrate may be free of any low emissivity coating.
• a triple glazing may comprise on face 2 or 3 a third low emissivity coating. Any possible embodiment of the first low emissivity coating is also an available embodiment of the third low emissivity coating. Such a third low emissivity coating may further increase solar and thermal protection.
• the third low emissivity coating has a third emissivity value £n3.
• the first and second low emissivity coatings may be provided by various vacuum deposition methods or combinations thereof, including magnetron sputtering, LPCVD (low pressure chemical vapor deposition), plasma enhanced chemical vapor deposition (PECVD). Individual layers of the same coating may be provided by different deposition methods.
• the first low emissivity coating is deposited by magnetron sputtering.
• the second low emissivity coating may also be, at least partly, deposited by chemical vapor deposition (CVD) in particular directly on a float line during the production of the last glass substrate.
• CVD chemical vapor deposition
• the TCO layer comprises preferably fluorine doped tin oxide SnO 2 :F.
• the layer T of the second low emissivity coating is deposited by magnetron sputtering or PECVD, in particular while all other layers of this coating are deposited by CVD.
• PECVD magnetron sputtering
• Certain float lines may have limited space available for additional coatings as a large part of the float line needs to be dedicated to controlled cooling of the glass substrate.
• a titanium oxide based layer may be provided using titanium tetraisopropoxide (TTIP) or TiCI4.
• TTIP titanium tetraisopropoxide
• a tin based layer may be provided using monobutyl-tin- trichloride (MBTC) combined with a fluorine source such as trifluoroacetic acid (TFA), ammonium bifluoride (NF F.HF) or hydrofluoric acid (HF), for example.
• a fluorine source such as trifluoroacetic acid (TFA), ammonium bifluoride (NF F.HF) or hydrofluoric acid (HF), for example.
• FFA trifluoroacetic acid
• NF F.HF ammonium bifluoride
• HF hydrofluoric acid
• tin precursors include, but are not limited to, dimethyltin dichloride, dibutyltin dichloride, tetramethyltin, tetrabutyltin, dioctyltin dichloride, dibutyltin diacetate and tin tetrachloride.
• fluorine sources include fluorine gas, hydrogen fluoride, nitrogen trifluoride, trifluoroacetic acid (CF3CO2H), bromo- trifluoromethane, difluoroethane and chlorodifluoromethane.
• the precursors used to provide for the silicon oxide comprising layer may include silane, oxygen or CO2 and a carrier gas (N2).
• aluminium precursors may include trimethylaluminium, alane, aluminium trichloride.
• FIG. 1 is a schematical cross-section of a double glazing unit (DGU) according to an embodiment of the present invention.
• the DGU of Fig. 1 comprises two sheets of glass, a first substrate (101 ) and a second substrate (102). The two substrates are held apart by spacer (110), the assembly delimiting an enclosed space, or cavity, filled with an intermediate gas cavity (104).
• the first substrate (201 ) defines the outer wall of the glazing, in contact with the outside (211 ) and the last substrate, that is the third substrate (203) defines the inner wall of the TGU glazing, in contact with the inside (212).
• the third (and last) substrate incorporates on the outwards-facing face, face 5 (205), a first low emissivity coating (206) comprising at least one metallic functional layer and on the inwards-facing face, face 6 (207) a second low emissivity coating (208) comprising at least one functional layer of transparent conductive oxide.
• a third low emissivity coating (213) comprising at least one metallic functional layer is present on the outwards facing face, face 3 (214) of the second glass substrate (202).
• the coatings are deposited on clear soda-lime glass substrates.
• Table 2 summarizes the layer sequences, starting from the glass surface, of coatings A to D used in the different examples below. Layer thicknesses are indicated in brackets.
• first and second low emissivity coatings were deposited on face 3 and face 4. All glass substrates are normal clear soda lime glass float glass substrates of 4 mm thickness. The first glass substrate bears no coating. The glass substrates are held apart by spacers at a distance of 15 mm and the cavity between the two glass substrates is filled with an Ar/air 90/10 mixture.
• the first low emissivity coating is coating A.
• Coating A provides an otherwise uncoated glass substate with an emissivity s n 1 of 0.048.
• Example 1 the second low emissivity coating is coating B.
• Coating B provides an otherwise uncoated glass substrate with an emissivity s n 2 of 0.12.
• Example 2 the second low emissivity coating is coating C.
• Coating C provides an otherwise uncoated glass substrate with an emissivity s n 2 of 0.12.
• ZSO stands for Zn2SnO4
• AZO zinc oxide doped with aluminium in an approximate proportion of 2% by weight
• SiN represents silicon nitride
• TZO stands for a mixed oxide of titanium and zirconium with a TiO2/ZrO2 weight ratio of 65/35
• SiZrOx stands for a mixed oxide of silicon and zirconium with an Zr/Si atomic ratio of 0.12.
• WO2011/161204A1 provided for a configuration 4, which is considered herein as Comparative example 1 , of a DGU of 2 glass sheets of 4 mm thickness held apart by spacers at a distance of 15 mm having the cavity between the two glass substrates filled with an Ar/air 90/10 mixture.
• Such double glazing unit was found to demonstrate a U value of 0.9 W/(m 2 K), however at the detriment of a lower light transmission of 62%, a higher exterior reflectance of 21 % and a lower solar factor of 49%.
• Coating D provides an otherwise uncoated glass substate with an emissivity £ n 1 of 0.072.
• the triple glazing units of Examples 3 to 8 bear a third low emissivity coating which is identical to the respective first low emissivity coating of each Example.
• the third low emissivity coating is on face 2
• the third low emissivity coating is on face 3.

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• Geochemistry & Mineralogy (AREA)
• Materials Engineering (AREA)
• Organic Chemistry (AREA)
• Surface Treatment Of Glass (AREA)

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• 2023
  • 2023-11-06 WO PCT/EP2023/080833 patent/WO2024120712A1/en not_active Ceased
  • 2023-11-06 EP EP23801429.4A patent/EP4587399A1/de active Pending

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