EP4584415A1 - Closure for pharmaceutical preparations and method and rotary deposition apparatus for manufacturing therefor - Google Patents
Closure for pharmaceutical preparations and method and rotary deposition apparatus for manufacturing thereforInfo
- Publication number
- EP4584415A1 EP4584415A1 EP22768861.1A EP22768861A EP4584415A1 EP 4584415 A1 EP4584415 A1 EP 4584415A1 EP 22768861 A EP22768861 A EP 22768861A EP 4584415 A1 EP4584415 A1 EP 4584415A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- barrier layer
- layer material
- closure body
- pharmaceutical preparations
- adhesion promotion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61J—CONTAINERS SPECIALLY ADAPTED FOR MEDICAL OR PHARMACEUTICAL PURPOSES; DEVICES OR METHODS SPECIALLY ADAPTED FOR BRINGING PHARMACEUTICAL PRODUCTS INTO PARTICULAR PHYSICAL OR ADMINISTERING FORMS; DEVICES FOR ADMINISTERING FOOD OR MEDICINES ORALLY; BABY COMFORTERS; DEVICES FOR RECEIVING SPITTLE
- A61J1/00—Containers specially adapted for medical or pharmaceutical purposes
- A61J1/14—Details; Accessories therefor
- A61J1/1406—Septums, pierceable membranes
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61J—CONTAINERS SPECIALLY ADAPTED FOR MEDICAL OR PHARMACEUTICAL PURPOSES; DEVICES OR METHODS SPECIALLY ADAPTED FOR BRINGING PHARMACEUTICAL PRODUCTS INTO PARTICULAR PHYSICAL OR ADMINISTERING FORMS; DEVICES FOR ADMINISTERING FOOD OR MEDICINES ORALLY; BABY COMFORTERS; DEVICES FOR RECEIVING SPITTLE
- A61J1/00—Containers specially adapted for medical or pharmaceutical purposes
- A61J1/14—Details; Accessories therefor
- A61J1/1412—Containers with closing means, e.g. caps
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
- A61M5/00—Devices for bringing media into the body in a subcutaneous, intra-vascular or intramuscular way; Accessories therefor, e.g. filling or cleaning devices, arm-rests
- A61M5/178—Syringes
- A61M5/24—Ampoule syringes, i.e. syringes with needle for use in combination with replaceable ampoules or carpules, e.g. automatic
- A61M5/2455—Ampoule syringes, i.e. syringes with needle for use in combination with replaceable ampoules or carpules, e.g. automatic with sealing means to be broken or opened
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D39/00—Closures arranged within necks or pouring openings or in discharge apertures, e.g. stoppers
- B65D39/04—Cup-shaped plugs or like hollow flanged members
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D41/00—Caps, e.g. crown caps or crown seals, i.e. members having parts arranged for engagement with the external periphery of a neck or wall defining a pouring opening or discharge aperture; Protective cap-like covers for closure members, e.g. decorative covers of metal foil or paper
- B65D41/02—Caps or cap-like covers without lines of weakness, tearing strips, tags, or like opening or removal devices
- B65D41/28—Caps combined with stoppers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D43/00—Lids or covers for rigid or semi-rigid containers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D81/00—Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents
- B65D81/24—Adaptations for preventing deterioration or decay of contents; Applications to the container or packaging material of food preservatives, fungicides, pesticides or animal repellants
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/027—Graded interfaces
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
- C23C14/0652—Silicon nitride
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0676—Oxynitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
- C23C16/029—Graded interfaces
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/308—Oxynitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
- C23C16/325—Silicon carbide
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/345—Silicon nitride
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4584—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally the substrate being rotated
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4587—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically
- C23C16/4588—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically the substrate being rotated
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D2251/00—Details relating to container closures
Definitions
- Embodiments of the present disclosure relate to a closure for pharmaceutical preparations, a method for manufacturing closures for pharmaceutical preparations, and a rotary deposition apparatus for manufacturing closures for pharmaceutical preparations.
- the at least one barrier layer comprises a barrier layer material within at least a portion of the thickness of the at least one barrier layer distal from the surface of the polymeric closure body, the barrier layer material being selected from the group consisting of SixNy, SixCy, SixOyNz, SixOyCz, SiCh, AlxOy, AlOxNy, TiCh, and combinations thereof.
- a method for manufacturing closures for pharmaceutical preparations includes: providing at least one polymeric closure body and forming at least one barrier layer over the at least one polymeric closure body.
- forming at least one barrier layer over the at least one polymeric closure body includes depositing an adhesion promotion layer material and depositing at least one barrier layer material in this order.
- the at least one barrier layer comprises the adhesion promotion layer material within at least a portion of a thickness of the at least one barrier layer proximal to a surface of the at least one polymeric closure body, the adhesion promotion layer material including SiOxCy:H.
- Figure 6 shows a flow chart of a method for manufacturing closures for pharmaceutical preparations according to embodiments described herein;
- closures for pharmaceutical preparations with improved performance, particularly with barrier properties against extractables or leachables, are desired. Further, the closures for pharmaceutical preparations are also expected to exhibit water vapor and oxygen barrier properties, which also help to preserve the desired properties of the pharmaceutical preparations for a longer time.
- the present disclosure fulfills the above-mentioned needs by providing a closure for pharmaceutical preparations, a method for manufacturing closures for pharmaceutical preparations, and a rotary deposition apparatus for manufacturing closures for pharmaceutical preparations.
- the closure for pharmaceutical preparations of the present disclosure includes at least one barrier layer comprising an adhesion promotion layer material comprising SiOxCy:H and a barrier layer material selected from the group consisting of SixNy, SixCy, SixOyNz, SixOyCz, SiCh, AlxOy, AlOxNy, TiCh, and combinations thereof, the closure for pharmaceutical preparations of the present disclosure shows improved barrier properties, e.g., barrier properties against extractables or leachables, water vapor, and oxygen.
- the at least one barrier layer shows an appropriate balance between flexural rigidity and crack onset strain, i.e., fracture toughness, and thus the at least one barrier layer can undergo significant levels of mechanical strain and match mechanical properties of the polymeric closure body.
- the adhesion promotion layer material provides an intermediate region between the barrier layer material and the polymeric closure body that functions as a mechanical cushioning for mechanical strains.
- the method for manufacturing closures for pharmaceutical preparations of the present disclosure allows a reduction of the production costs and time, and permits modulation of the barrier properties of the closure for pharmaceutical preparations by depositing further barrier layers with different barrier layer materials.
- drug includes vaccines, antibodies, cells, gene, blood factors, proteins, recombinant proteins, peptides, and hormones, e.g., intended for human or veterinary use and, particularly, for treatment of illness or injury.
- drug particularly may also refer to any natural or artificially-made chemical, e.g., intended for human or veterinary use and, particularly, for treatment of illness or injury.
- the closure for pharmaceutical preparations 100 includes a polymeric closure body 110. Further, the closure for pharmaceutical preparations 100 includes at least one barrier layer 160 over the polymeric closure body 110. Furthermore, the at least one barrier layer 160 comprises an adhesion promotion layer material within at least a portion of a thickness of the at least one barrier layer 160 proximal to a surface of the polymeric closure body 110, particularly in a vertical direction relative to the surface of the polymeric closure body 110. Moreover, the adhesion promotion layer material includes SiOxCy:H. In some embodiments, the at least one barrier layer 160 can have a sufficiently high degradation temperature to remain stable during subsequent processing, e.g., sterilization of the closure for pharmaceutical preparations 100, which can involve extreme temperatures.
- the at least one barrier layer 160 shows an appropriate balance between flexural rigidity and crack onset strain, i.e., fracture toughness, and thus the at least one barrier layer 160 can undergo significant levels of mechanical strain and match mechanical properties of the polymeric closure body 110.
- the adhesion promotion layer material provides an intermediate region between the barrier layer material and the polymeric closure body 110 that functions as a mechanical cushioning for mechanical strains.
- the at least one barrier layer 160 may have a thickness of 120 nm or above and of 500 nm or below, particularly a thickness of 140 nm or above and of 480 nm or below, and more particularly a thickness of 160 nm or above and of 460 nm or below.
- the at least one barrier layer 160 may have a water vapor transmission rate of less than 10' 1 g/m 2 /day, particularly less than 10' 2 g/m 2 /day, and more particularly 10' 3 g/m 2 /day. Measurement of water vapor transmission rate may be performed according to ISO 2528:2017.
- the at least one barrier layer 160 may have an oxygen gas transmission rate of less than 10' 1 ml/m 2 /day, particularly less than 10' 2 ml/m 2 /day, and more particularly 10' 3 ml/m 2 /day, at 23 °C and 0% relative humidity. Measurement of the oxygen gas transmission rate may be performed according to ISO 15105-1 :2007.
- the at least one barrier layer 160 may include barrier properties against the migration of extractables, particularly leachables, from the polymeric closure body 110.
- the extractables, particularly the leachables may comprise at least one chemical of the group consisting of phthalates, trialkyl benzene- 1, 2, 4-tricarboxylates, and combinations thereof.
- the at least one barrier layer 160 may be directly disposed or deposited over the polymeric closure body 110. In some embodiments, no further layers or films are present between the polymeric closure body 110 and the at least one barrier layer 160.
- the barrier layer material may comprise SiCh and the at least one barrier layer 160 may comprise a first barrier layer over the polymeric closure body 110 with a gradient chemical composition across a thickness of the first barrier layer, particularly in a vertical direction relative to a surface of the polymeric closure body 110, as shown in an exemplary manner in Figure 1.
- the at least one barrier layer 160 may correspond to a first barrier layer with a gradient chemical composition, wherein the gradient chemical composition is represented in an exemplary manner by a color transition across the thickness of the first barrier layer, particularly in a vertical direction related to a surface of the polymeric closure body.
- a darkened section of the first barrier layer in Figure 1 corresponds to a portion of the thickness of the first barrier layer proximal to the surface of the polymeric closure body 110 and a colorless section of the first barrier layer corresponds to a portion of the thickness of the first barrier layer distal from the surface of the polymeric closure body 110.
- the gradient chemical composition may comprise a first chemical composition corresponding to the adhesion promotion layer material within at least a portion of the thickness of the first barrier layer proximal to a surface of the polymeric closure body 110, particularly in a vertical direction relative to a surface of the polymeric closure body 110.
- the gradient chemical composition may further comprise a second chemical composition corresponding to the barrier layer material within at least a portion of the thickness of the first barrier layer distal from the surface of the polymeric closure body 110, particularly in a vertical direction relative to a surface of the polymeric closure body 110.
- a surface of the polymeric closure body 110 onto which the at least one barrier layer is provided, e.g. deposited, may be treated to improve adhesion.
- Useful surface treatments may comprise electrical discharge in the presence of a suitable reactive or non-reactive atmosphere (e.g., plasma, glow discharge, corona discharge, dielectric barrier discharge or atmospheric pressure discharge), chemical pretreatment, or flame pretreatment.
- Figure 2 shows a schematic cross-sectional view of a portion of a closure for pharmaceutical preparations 200 according to further embodiments described herein.
- depiction of a whole closure for pharmaceutical preparations 200 similar to the closure for pharmaceutical preparations 100 in Figure 1 has been omitted for the sake of simplicity.
- the adhesion promotion layer 215 may have a thickness equal to or smaller than 350 nm, particularly a thickness equal to or smaller than 330 nm, and more particularly a thickness equal to or smaller than 310 nm. In some embodiments, the adhesion promotion layer 215 may have a thickness equal to or greater than 100 nm, particularly a thickness equal to or greater than 120 nm, and more particularly a thickness equal to or greater than 140 nm.
- the closure for pharmaceutical preparations 300, 400, 500 includes a polymeric closure body 310, 410, 510. Furthermore, the closure for pharmaceutical preparations 300, 400, 500 includes at least one barrier layer 360, 460, 560 over the polymeric closure body 310, 410, 510. Furthermore, the at least one barrier layer 360, 460, 560 comprises an adhesion promotion layer material within at least a portion of a thickness of the at least one barrier layer 360, 460, 560 proximal to a surface of the polymeric closure body 310, 410, 510, particularly in a vertical direction relative to the surface of the polymeric closure body 310, 410, 510.
- the at least one barrier layer 360 may comprise an adhesion promotion layer 315 over the polymeric closure body 310. Furthermore, the at least one barrier layer 360 may comprise a first barrier layer 320 over the adhesion promotion layer 315. In addition, the at least one barrier layer 360 may comprise a second barrier layer 330 over the first barrier layer 320. In this particular example, the adhesion promotion layer 315 may comprise the adhesion promotion layer material.
- the second barrier layer 330 may comprise a barrier layer material.
- the first barrier layer 320 and the second barrier layer 330 may comprise different barrier layer materials selected from the group consisting of SixNy, SixCy, SixOyNz, SixOyCz, SiCh, AlxOy, AlOxNy, TiCh, and combinations thereof.
- the first barrier layer 320 and the second barrier layer 330 may be in the following order: SixNy/SixCy.
- the closure for pharmaceutical preparations 400 is similar to the closure for pharmaceutical preparations 300 of Figure 3, with the difference being that the at least one barrier layer 460 includes a further barrier layer, e.g., a third barrier layer 440.
- the third barrier layer 440 may have a thickness equal to or smaller than 150 nm, particularly a thickness equal to or smaller than 130 nm, and more particularly a thickness equal to or smaller than 110 nm. In some embodiments, the third barrier layer 440 may have a thickness equal to or greater than 20 nm, particularly a thickness equal to or greater than 40 nm, and more particularly a thickness equal to or greater than 60 nm.
- the term “in this order” together with the term “includes” in the sentence “forming at least one barrier layer over the at least one polymeric closure body includes depositing an adhesion promotion layer material and depositing at least one barrier layer material, in this order” may be understood as following a sequence of events in time, e.g., depositing an adhesion promotion layer material and thereafter depositing at least one barrier layer material, without excluding other sequences of the events in time, e.g., depositing an adhesion promotion layer material and depositing at least one barrier layer material simultaneously, e.g., between depositing an adhesion promotion layer material and thereafter depositing at least one barrier layer material.
- the method 600 for manufacturing closures for pharmaceutical preparations of the present disclosure allows a reduction of production costs and production time, and permits modulation of the barrier properties of the closure for pharmaceutical preparations by depositing further barrier layers with different barrier layer materials. Furthermore, the method 600 for manufacturing closures for pharmaceutical preparations of the present disclosure permits the formation of least one barrier layer over the at least one polymeric closure body even if the polymeric closure body has a three- dimensional shape or structure, particularly including portions of a surface of the polymeric closure body which are difficult to access.
- providing at least one polymeric closure body may comprise treating a surface of the at least one polymeric closure body, e.g., onto which the at least one barrier layer is formed or deposited, by applying an electrical discharge in the presence of a suitable reactive or non-reactive atmosphere (e.g., plasma, glow discharge, corona discharge, dielectric barrier discharge or atmospheric pressure discharge), a chemical pretreatment, or a flame pretreatment.
- a suitable reactive or non-reactive atmosphere e.g., plasma, glow discharge, corona discharge, dielectric barrier discharge or atmospheric pressure discharge
- forming at least one barrier layer over the at least one polymeric closure body, depositing an adhesion promotion layer material, and/or depositing at least one barrier layer material may be conducted by physical vapor deposition or chemical vapor deposition, for example sputtering or evaporation.
- depositing an adhesion promotion layer material may comprise depositing an adhesion promotion layer material over the at least one polymeric closure body.
- depositing an adhesion promotion layer material may comprise forming an adhesion promotion layer, particularly over the at least one polymeric closure body.
- depositing at least one barrier layer material may comprise depositing at least one barrier layer material over the adhesion promotion layer material.
- depositing at least one barrier layer material may comprise depositing a first barrier layer material, particularly over the adhesion promotion layer material, and more particularly over the adhesion promotion layer.
- depositing a first barrier layer material may comprise forming a first barrier layer.
- depositing at least one barrier layer may further comprise depositing a second barrier material, particularly over the first barrier layer material, and more particularly over the first barrier layer. In some embodiments, depositing a second barrier layer material may comprise forming a second barrier layer. In some embodiments, depositing at least one barrier layer may further comprise depositing a third barrier layer material, particularly over the second barrier layer material, and more particularly over the second barrier layer. In some embodiments, depositing a third barrier layer material may comprise forming a third barrier layer.
- depositing at least one barrier layer may further comprise depositing a fourth barrier layer material, particularly over the third barrier layer material, and more particularly over the third barrier layer.
- depositing a fourth barrier layer material may comprise forming a fourth barrier layer.
- the first barrier layer material, the second barrier layer material, the third barrier layer material, and/or the fourth barrier layer material may comprise different barrier layer materials selected from the group consisting of SixNy, SixCy, SixOyNz, SixOyCz, SiCh, AlxOy, AlOxNy, TiCh, and combinations thereof.
- depositing an adhesion promotion layer material may comprise introducing at least one adhesion promotion layer precursor into a plasma.
- depositing a first barrier layer material may comprise introducing at least one first barrier layer precursor into a plasma.
- depositing a second barrier layer material may comprise introducing at least one second barrier layer precursor into a plasma.
- depositing a third barrier layer material may comprise introducing at least one third barrier layer material precursor into a plasma.
- depositing a fourth barrier layer material may comprise introducing at least one fourth barrier layer material precursor into a plasma.
- first barrier layer material precursor, the second barrier layer material precursor, the third barrier layer material precursor, and the fourth barrier layer material precursor can be silanes, siloxanes, HMDSN (Hexamethyldi silazane), O2, N2O, NH3, AICI3 (Aluminum trichloride), TMA (Trimethylaluminum), AIP (aluminum tri-isopropoxide), Titanium isopropoxide (Ti ⁇ OCH(CH3)2 ⁇ 4), Titanium butoxide (Ci 6 H36O 4 Ti), Titanium(IV) Acetylacetonate (Ti(C5H?O2)4).
- the first barrier layer material and the second barrier layer material may comprise different barrier layer materials selected from the group consisting of SixNy, SixCy, SixOyNz, SixOyCz, SiCE, AlxOy, AlOxNy, TiCh, and combinations thereof.
- the first barrier layer material, the second barrier layer material, and the third barrier layer material may comprise different barrier layer materials selected from the group consisting of SixNy, SixCy, SixOyNz, SixOyCz, SiO2, AlxOy, AlOxNy, TiO?, and combinations thereof.
- the first barrier layer material, the second barrier layer material, the third barrier layer material, and the fourth barrier layer material may comprise different barrier layer materials selected from the group consisting of SixNy, SixCy, SixOyNz, SixOyCz, SiO2, AlxOy, AlOxNy, TiO2, and combinations thereof.
- the barrier layer material may comprise SiO2 and forming the at least one barrier layer over the at least one polymeric closure body may further include decreasingly depositing the adhesion promotion layer material and increasingly depositing the at least one barrier layer material, particularly increasingly depositing a first barrier layer material, simultaneously.
- decreasingly depositing the adhesion promotion layer material and increasingly depositing the at least one barrier layer material, particularly increasingly depositing a first barrier layer material may be conducted by gradually modifying at least one plasma-related process parameter while depositing the adhesion promotion layer material and/or gradually varying an amount or a chemical composition of at least one barrier layer material precursor, particularly of the first barrier layer material precursor, while depositing the adhesion promotion layer material.
- a perforated area of a perforated wall 920 with respect to a non-perforated area of the perforated wall 920 may be at least 75%, particularly at least 80%, more particularly at least 85%.
- the perforated wall 920 may include circular, triangular, or square through- holes 930.
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- Hematology (AREA)
- Heart & Thoracic Surgery (AREA)
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Abstract
Description
Claims
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2022/074900 WO2024051936A1 (en) | 2022-09-07 | 2022-09-07 | Closure for pharmaceutical preparations and method and rotary deposition apparatus for manufacturing therefor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP4584415A1 true EP4584415A1 (en) | 2025-07-16 |
Family
ID=83280204
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP22768861.1A Withdrawn EP4584415A1 (en) | 2022-09-07 | 2022-09-07 | Closure for pharmaceutical preparations and method and rotary deposition apparatus for manufacturing therefor |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP4584415A1 (en) |
| KR (1) | KR20250067143A (en) |
| CN (1) | CN119866387A (en) |
| WO (1) | WO2024051936A1 (en) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6171622A (en) * | 1984-09-17 | 1986-04-12 | Ulvac Corp | Plasma discharge processing apparatus |
| RU2010043C1 (en) * | 1991-07-01 | 1994-03-30 | Конончук Игорь Иванович | Apparatus for deposition of layers from gas phase |
| CA3005132A1 (en) * | 2015-11-18 | 2017-05-26 | Sio2 Medical Products, Inc. | Coated syringe for ophthalmic formulations containing a vegf antagonist |
| CA3125944A1 (en) * | 2019-01-07 | 2020-07-16 | Sio2 Medical Products, Inc. | Polymer process bags and methods for manufacturing the same |
-
2022
- 2022-09-07 EP EP22768861.1A patent/EP4584415A1/en not_active Withdrawn
- 2022-09-07 KR KR1020257010782A patent/KR20250067143A/en active Pending
- 2022-09-07 CN CN202280099852.3A patent/CN119866387A/en active Pending
- 2022-09-07 WO PCT/EP2022/074900 patent/WO2024051936A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| CN119866387A (en) | 2025-04-22 |
| KR20250067143A (en) | 2025-05-14 |
| WO2024051936A1 (en) | 2024-03-14 |
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