EP4453639A1 - Lasersystem zur erzeugung einer laserlinie - Google Patents
Lasersystem zur erzeugung einer laserlinieInfo
- Publication number
- EP4453639A1 EP4453639A1 EP22840120.4A EP22840120A EP4453639A1 EP 4453639 A1 EP4453639 A1 EP 4453639A1 EP 22840120 A EP22840120 A EP 22840120A EP 4453639 A1 EP4453639 A1 EP 4453639A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- laser
- laser beam
- diaphragm
- opening
- state
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
- G02B19/0052—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C15/00—Surveying instruments or accessories not provided for in groups G01C1/00 - G01C13/00
- G01C15/002—Active optical surveying means
- G01C15/004—Reference lines, planes or sectors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
- G02B26/0883—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements the refracting element being a prism
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
- G02B26/108—Scanning systems having one or more prisms as scanning elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0972—Prisms
Definitions
- the present invention relates to a laser system for generating a laser line according to the preamble of claim 1.
- laser systems which generate a laser line on a projection surface.
- rotary lasers which generate the laser line by rotating deflection optics around an axis of rotation
- line lasers which generate the laser line using beam-shaping optics, for example a cylindrical lens, a pentaprism or a conical mirror.
- the laser power must be limited in order to prevent damage to the human eye.
- the maximum permissible laser power is 1 mW.
- the width of the laser line that the laser systems generate on a projection surface depends, among other things, on the distance between the laser system and the projection surface. Starting from the laser system, the width of the laser line decreases and reaches a minimum value in the beam waist. With greater distances between the laser system and the projection surface, the width of the laser line behind the beam waist increases again.
- laser systems with adjustable focusing optics are known.
- the adjustable focusing optics make it possible to shift the position of the beam waist of the laser beam.
- the object of the present invention is to develop a laser system with which a narrow laser line can be generated in at least two distance ranges of the laser system from a projection surface.
- the laser line should be clearly visible for at least two distance ranges on the projection surface.
- the laser system is characterized in that an adjustable aperture device is arranged between the laser beam source and the deflection optics.
- the adjustable aperture device can shape the laser beam generated by the laser beam source and reduce the beam diameter. The beam diameter is reduced via the aperture diameter of the aperture.
- the panel device can preferably be adjusted between a first position and a second position.
- An aperture device which is adjustable between a first position and a second position, can generate a first beam diameter in the first position and a second beam diameter, which is smaller than the first beam diameter, in the second position.
- the laser system according to the invention is designed such that the first beam diameter is provided for a first distance range and the second beam diameter is provided for a second distance range, the first distance range comprising greater distances than the second distance range. Since the visibility of a laser line decreases with greater distances, it is advantageous that the larger first beam diameter is provided for greater distances, since the full laser power can be used at greater distances.
- the focusing optics of the laser system are selected in such a way that the beam waist of the laser beam is in the first distance range and a narrow, clearly visible laser line is generated on the projection surface. At smaller distances, the laser power is reduced by the aperture device; Limiting the beam diameter has a positive effect on the width of the laser line (narrow laser line) and is not critical with regard to the visibility of the laser line on the projection surface.
- the diaphragm device has a first opening diameter in the first position and a second opening diameter in the second position, the first opening diameter and the second opening diameter being different.
- the diaphragm device is arranged outside the beam path of the laser beam in the first position and in the beam path of the laser beam in the second position. If the diaphragm device is arranged outside the beam path of the laser beam in the first position, the laser beam is not limited. If the diaphragm device is arranged in the second position in the beam path of the laser beam, the laser beam is limited by the diaphragm device. A narrow laser line is generated on a projection surface, the width of which is smaller than without the limitation of the laser beam.
- the diaphragm device is designed as an iris diaphragm that can be adjusted between a minimum diaphragm opening and a maximum diaphragm opening.
- the use of an iris diaphragm as the diaphragm device has the advantage that the diaphragm opening can be continuously adjusted. The user can use the iris diaphragm to generate a narrow laser line at different distances between the laser system and a projection surface.
- the diaphragm device has a circular opening and a first circular ring, the first circular ring being arranged concentrically to the circular opening and being switchable between a first state and a second state.
- the first circular ring is preferably designed to be permeable to the wavelength of the laser beam source in the first state with a degree of transmission T greater than 90% and impermeable in the second state with a degree of transmission T less than 10%.
- a first annulus switchable between a transmissive first state and an opaque second state enables the formation of a first laser beam having a first beam diameter and a second laser beam having a second beam diameter smaller than the first beam diameter.
- the first beam diameter is designed for a first distance range and the second beam diameter is designed for a second distance range, with the first distance range comprising greater distances than the second distance range.
- the diaphragm device preferably has a second circular ring, the second circular ring being arranged concentrically to the first circular ring and being switchable between a first state and a second state.
- the second circular ring is permeable to the wavelength of the laser beam source in the first state with a transmittance T greater than 90% and impermeable in the second state with a transmittance T less than 10%.
- a second annulus which is arranged concentrically to the first annulus and is switchable between a transparent first state and an opaque second state, enables the formation of a third laser beam with a third beam diameter which is smaller than the second beam diameter.
- the third beam diameter is designed for a third distance range, with the third distance range comprising smaller distances than the second distance range.
- FIG. 1 shows a laser system according to the invention, which has a laser beam source, focusing optics, deflection optics and an adjustable aperture device;
- FIGN. 2A,B the laser system of FIG. 1 in a first position (FIG. 2A) and a second position (FIG. 2B) of the screen device;
- FIGN. 3A, B another laser system according to the invention with an adjustable aperture device in a first position (FIG. 3A) and a second position (FIG. 3B) of the aperture device;
- FIGN. 4A, B an aperture device designed as an iris diaphragm which can be continuously adjusted between a minimum aperture opening (FIG. 4A) and a maximum aperture opening (FIG. 4B);
- FIG. 5 a further diaphragm device designed as a diaphragm wheel, which can be adjusted between a first position, a second position and a third position;
- FIG. 6 shows a further screen device which can be adjusted between a first position, a second position and a third position
- FIGN. 7A-C the shutter assembly of FIG. 6 in the first position (FIG. 7A), the second position (FIG. 7B) and the third position (FIG. 7C).
- FIG. 1 shows a laser system 10 according to the invention, which is designed as a rotating laser and generates a laser line on a projection surface.
- the laser system 10 comprises a laser beam source 11, a beam shaping optics 12 designed as a focusing optics with an optical axis 13, a deflection optics 14 designed as a pentaprism and a diaphragm device 15.
- the components of the laser system 10 are in the order laser beam source 11, focusing optics 12, diaphragm device 15 and deflection optics 14 arranged.
- the laser beam source 11 can be designed as a semiconductor laser with a wavelength in the visible spectrum, for example as a red semiconductor laser with a wavelength of 635 nm or as a green semiconductor laser with a wavelength between 510 and 555 nm.
- the properties of the other optical components 12, 14, 15 of the Laser system 10 are adapted to the wavelength of the laser beam source 11.
- the focusing optics 12 have a planar entry surface 16 and a curved exit surface 17 .
- the entry surface 16 can be designed as a curved surface and the exit surface 17 can be designed as a flat surface, or the entry and exit surfaces 16, 17 are designed as curved surfaces.
- a straight line is defined as the optical axis 13 of the focusing optics 12, which runs through the center of curvature of the curved surface and is perpendicular to the flat surface or, in the case of two curved surfaces, runs through the centers of curvature of the curved surfaces.
- the diaphragm device 15 which is arranged between the focusing optics 12 and the deflection optics 14, can be adjusted between a first position and a second position.
- the diaphragm device 15 has a diaphragm opening 18 with an opening diameter D. In the first position, the aperture 18 has a first opening diameter and in the second position has a second opening diameter that is different from the first opening diameter.
- the deflection optics 14 designed as a pentaprism has an entry surface 21 , a first reflection surface 22 , a second reflection surface 23 and an exit surface 24 .
- the Entry surface 21 and exit surface 24 are designed as transmission surfaces for the wavelength of the laser beam source 11 and a laser beam impinging on the entry or exit surface 21, 24 is predominantly transmitted.
- the first reflection surface 22 and second reflection surface 23 are designed as reflection surfaces for the wavelength of the laser beam source 11 and an impinging laser beam is predominantly reflected.
- the laser system 10 is designed as a rotating laser.
- the deflection optics 14 designed as a pentaprism is moved about an axis of rotation 25 by means of a motor unit.
- the axis of rotation 25 runs parallel to the beam axis of a laser beam entering the pentaprism 14 .
- FIGN. 2A, B show the inventive laser system 10 of FIG. 1 that generates a laser line on a projection surface.
- the laser system 10 comprises the laser beam source 11, the focusing optics 12, the aperture device 15 and the pentaprism 14.
- the laser system 10 can be adjusted between a first position (FIG. 2A) and a second position (FIG. 2B) using the aperture device 15.
- the laser beam source 11 generates a divergent laser beam 31 which is emitted along a propagation direction 32 .
- the axis of symmetry of the beam distribution is defined as the optical axis of the laser beam.
- the laser beam 31 preferably has a beam distribution in the form of a Gaussian distribution, a Lorentz distribution or a Bessel distribution. These beam distributions do not show any abrupt jump in intensity and support the generation of a sharply defined laser line on a projection surface.
- the divergent laser beam 31 impinges on the focusing optics 12, which generates a focused laser beam 33.
- the focused laser beam 33 hits the diaphragm device 15, which can shape the laser beam.
- the aperture 18 has a first aperture diameter Di and at the first position shown in FIG. 2B has a second opening diameter D2 that is smaller than the first opening diameter Di.
- the aperture device 15 In the first position, the aperture device 15 generates a first shaped laser beam 34-1 with a first beam axis 35-1 (FIG. 2A) and in the second position a second shaped laser beam 34-2 with a second beam axis 35-2 (FIG. 2B ).
- the first opening diameter Di is selected such that the first shaped laser beam 34-1 passes the aperture 18 almost unchanged
- the second opening diameter D2 is selected such that the second shaped laser beam 34-2 is limited by the aperture 18 in the edge area.
- the diaphragm device 15 can be adjusted to a position outside the beam path of the laser beam.
- the first or second shaped laser beam 34 - 1 , 34 - 2 strikes the entry surface 21 and enters the pentaprism 14 through the entry surface 21 as the first or second transmitted laser beam 36 - 1 , 36 - 2 .
- a first reflection takes place in the pentaprism 14 on the first reflection surface 22 and a second reflection on the second reflection surface 23 .
- the laser beam reflected on the first reflecting surface 22 is referred to as the first and second single-reflected laser beams 37-1, 37-2, and the laser beam reflected on the second reflecting surface 23 is referred to as the first and second double-reflected laser beams 38-1, 38-2.
- the first or second twice reflected laser beam 38-1, 38-2 strikes the exit surface 24, leaves the pentaprism 14 as the first or second deflected laser beam 39-1, 39-2 and generates a laser line on a projection surface.
- the first reflective surface 22 and second reflective surface 23 are aligned with one another in such a way that the first or second deflected laser beam 39-1, 39-2 propagates in a propagation plane 40-1, 40-2 that is perpendicular to the first or second beam axis 35 -1, 35-2 of the first and second shaped laser beams 34-1, 34-2, respectively.
- the width of the laser line can be adjusted in two distance ranges by the aperture device 15, which can be adjusted between the first position (FIG. 2A) and the second position (FIG. 2B).
- the diaphragm device 15 can be adjusted steplessly or in discrete steps between the first opening diameter Di and the second opening diameter D2.
- the first deflected laser beam 39-1 with a first beam diameter is provided for a first distance range and the second deflected laser beam 39-2 with a second beam diameter for a second distance range, the first distance range comprising greater distances than the second distance range. Since the visibility of a laser line decreases with greater distances, it is advantageous that the larger first beam diameter is provided for greater distances, since the full laser power can be used at greater distances.
- the focusing optics 12 of the laser system 10 are selected in such a way that the beam waist of the laser beam is in the first distance range and a narrow, clearly visible laser line is generated on the projection surface. At smaller distances, the laser power is reduced by the aperture device 15; Limiting the beam diameter has a positive effect on the width of the laser line (narrow laser line) and is not critical with regard to the visibility of the laser line on the projection surface.
- a deflection optics 14 designed as a pentaprism
- a deflection optics which has a first mirror and a second mirror.
- the first mirror replaces the first reflection surface 22 and the second mirror the second reflection surface 23 of the pentaprism 14.
- the arrangement of the first and second mirrors is analogous to the first and second reflection surfaces 22, 23 in such a way that the deflected laser beam is perpendicular to the beam axis of the incident laser beam is arranged.
- FIGN. 3A, B show a further embodiment of a laser system 50 according to the invention, which is designed as a line laser and generates a laser line on a projection surface.
- the laser system 50 comprises the laser beam source 11, a beam shaping optics 51 designed as a focusing optics with an optical axis 52, a deflection optics 53 designed as a conical mirror and an aperture device 54.
- the components of the laser system 50 are in the order laser beam source 11, aperture device 54, focusing optics 51 and deflection optics 53 arranged.
- the laser system 50 is adjustable between a first position (FIG. 3A) and a second position (FIG. 3B) using the aperture assembly 54.
- the laser beam source 11 generates the divergent laser beam 31 which is emitted along the direction of propagation 32 and hits the diaphragm device 54 which can shape the divergent laser beam 31 .
- the orifice means 54 has a first opening diameter Di and at the first position shown in FIG. 3B has a second opening diameter D2 that is smaller than the first opening diameter Di.
- the shutter assembly 54 produces a first shaped laser beam 55-1 (FIG. 3A) in the first position and a second shaped laser beam 55-2 (FIG. 3B) in the second position.
- the first or second shaped laser beam 55-1, 55-2 impinges on the focusing optics 51, which generates a first or second focused laser beam 56-1, 56-2 with a first or second beam axis 57-1, 57-2 .
- the first or second focused laser beam 56-1, 56-2 impinges on the deflection optics 53 designed as a conical mirror.
- the cone mirror 53 is designed as a section of a right cone with a cone axis 58 and has a lateral surface 59 which is designed as a reflection surface for the wavelength of the laser beam source 11 .
- the first or second focused laser beam 56-1, 56-2 impinging on the lateral surface 59 is predominantly reflected on the lateral surface 59 and converted into a first or second deflected laser beam 60-1, 60-2.
- the first or second deflected laser beam 60-1, 60-2 propagates in a propagation plane 61-1, 61-2, which is arranged perpendicular to the first or second beam axis 57-1, 57-2 of the focused laser beam 56-1, 56-2.
- the width of the laser line can be adjusted in two distance ranges by the aperture device 54, which can be adjusted between the first position (FIG. 3A) and second position (FIG. 3B).
- the diaphragm device 54 can be adjusted steplessly or in discrete steps between the first opening diameter Di and the second opening diameter D2.
- the first deflected laser beam 60-1 with a first beam diameter is provided for a first distance range and the second deflected laser beam 60-2 with a second beam diameter, which is smaller than the first beam diameter, for a second distance range, the first distance range comprising larger distances as the second distance range. Since the visibility of a laser line decreases with greater distances, it is advantageous that the larger first beam diameter is provided for greater distances, since the full laser power can be used at greater distances.
- FIGN. 4A, B show a diaphragm device 70 designed as an iris diaphragm, which can be continuously adjusted between a minimum diaphragm opening D m in (FIG. 4A) and a maximum diaphragm opening D max (FIG. 4B).
- the iris diaphragm 70 can replace the diaphragm device 15 in the laser system 10 and the diaphragm device 54 in the laser system 50 .
- the iris diaphragm 70 consists of a ring 71 and a plurality of lamellae 72 which can be turned inwards or outwards together via a lever 73 .
- the iris diaphragm 70 can be continuously adjusted between the minimum diaphragm opening Dmin and the maximum diaphragm opening Dmax using the lever 73 .
- Each blade 72 is mounted on a separate axle and all blades 72 are connected to the ring 71 via another axle so that they move together. The more slats 72 that are used, the better the diaphragm opening can be approximated to the circular shape during the adjustment.
- the use of the 70 iris diaphragm as the diaphragm device has the advantage that the diaphragm opening can be continuously adjusted.
- the user can adjust the width of the laser line, which the laser system generates on a projection surface, very precisely to his requirements and the distance range.
- FIG. 5 shows a further diaphragm device 80 designed as a diaphragm wheel, which can be adjusted between a first position, a second position and a third position.
- the aperture wheel 80 can replace the aperture device 15 in the laser system 10 and the aperture device 54 in the laser system 50 .
- the aperture wheel 80 has a first aperture 81 with a first aperture diameter Di in the first position, a second aperture 82 with a second aperture diameter D2 in the second position, and a third aperture 83 with a third aperture diameter D3 in the third position.
- the first diaphragm opening 81 , second diaphragm opening 82 and third diaphragm opening 83 are arranged in an optics carrier 84 and designed to be rotatable about an axis of rotation 85 .
- the diaphragm wheel 80 can be rotated about the axis of rotation 85 between the first position in which the first diaphragm opening 81 is arranged in the beam path of the laser beam, the second position in which the second diaphragm opening 82 is arranged in the beam path of the laser beam, and the third position in which the third diaphragm opening 83 is arranged in the beam path of the laser beam.
- first, second and third diaphragm openings 81 , 82 , 83 can be integrated into the optics carrier 84 .
- the aperture wheel 80 enables the aperture opening to be adjusted in discrete steps.
- FIG. 6 shows a further screen device 90 which can be adjusted between a first position, a second position and a third position.
- the diaphragm device 90 can replace the diaphragm device 15 in the laser system 10 and the diaphragm device 54 in the laser system 50 .
- the aperture device 90 has a circular opening 91 , a first circular ring 92 and a second circular ring 93 .
- the first circular ring 92 and second circular ring 93 are arranged concentrically to the circular opening 91 and can be switched independently of one another between a first state (permeable) and a second state (impermeable).
- the first circular ring 92 is used as a polarization filter for an incident laser beam and is designed in such a way that its transmittance T can be adjusted.
- the first circular ring 92 can be switched for the wavelength of the laser beam source 11 between the first state in which the transmittance T is greater than 90% and the second state in which the transmittance T is less than 10%.
- the second circular ring 93 is used as a polarization filter for an incident laser beam and is designed in such a way that its transmittance T can be adjusted.
- the second circular ring 93 can be switched for the wavelength of the laser beam source 11 between the first state in which the transmittance T is greater than 90% and the second state in which the transmittance T is less than 10%.
- the circular aperture 91 is also used as a polarization filter for an incident laser beam and is formed so that its transmittance T is adjustable.
- the circular opening 91 can be switched for the wavelength of the laser beam source 11 between the first state in which the transmittance T is greater than 90% and the second state in which the transmittance T is less than 10%.
- FIGN. 7A-C show the shutter assembly 90 of FIG. 6 in a first position (FIG. 7A), a second position (FIG. 7B) and a third position (FIG. 7C).
- the circular opening 91, the first circular ring 92 and the second circular ring 93 are switched to the first state and are predominantly transparent with a transmittance T greater than 90% for the wavelength of the laser beam source 11.
- the diaphragm device 90 In the first position, the diaphragm device 90 has a first diaphragm diameter Di, which corresponds to the outer ring diameter of the second circular ring 93 .
- the circular opening 91 and the first circular ring 92 are switched to the first state and the second circular ring 93 is switched to the second state.
- the circular opening 91 and the first circular ring 92 are predominantly transparent with a transmittance T greater than 90% for the wavelength of the laser beam source 11 and the second circular ring 93 is predominantly impermeable with a transmittance T less than 10% for the wavelength of the laser beam source 11.
- the diaphragm device 90 has a second diaphragm diameter D2 which corresponds to the outer ring diameter of the first circular ring 92 .
- the circular opening 91 is switched to the first state and the first annulus 92 and second annulus 93 are switched to the second state.
- the circular opening 91 is predominantly permeable with a transmittance T greater than 90% for the wavelength of the laser beam source 11 and the first annulus 92 and second annulus 93 are predominantly opaque with a transmittance T less than 10% for the wavelength of the laser beam source 11.
- the diaphragm device 90 has a third diaphragm diameter D3 which corresponds to the circular diameter of the circular opening 91 .
- the first and second annuli 92, 93 which are switchable between a transmissive first state and an opaque second state, enable the formation of a first laser beam with a first beam diameter, a second laser beam with a second beam diameter and a third laser beam with a third beam diameter.
- the first range of distances includes greater distances than the second range of distances and the first range of distances includes lesser distances than the first range of distances.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Radar, Positioning & Navigation (AREA)
- Remote Sensing (AREA)
- Lasers (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP21217423.9A EP4202535A1 (de) | 2021-12-23 | 2021-12-23 | Lasersystem zur erzeugung einer laserlinie |
| PCT/EP2022/086637 WO2023117892A1 (de) | 2021-12-23 | 2022-12-19 | Lasersystem zur erzeugung einer laserlinie |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP4453639A1 true EP4453639A1 (de) | 2024-10-30 |
Family
ID=79164728
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP21217423.9A Withdrawn EP4202535A1 (de) | 2021-12-23 | 2021-12-23 | Lasersystem zur erzeugung einer laserlinie |
| EP22840120.4A Withdrawn EP4453639A1 (de) | 2021-12-23 | 2022-12-19 | Lasersystem zur erzeugung einer laserlinie |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP21217423.9A Withdrawn EP4202535A1 (de) | 2021-12-23 | 2021-12-23 | Lasersystem zur erzeugung einer laserlinie |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20250044088A1 (de) |
| EP (2) | EP4202535A1 (de) |
| WO (1) | WO2023117892A1 (de) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2620173A1 (de) * | 1976-05-07 | 1977-11-10 | Storz Karl | Strahlungsblende |
| US5825555A (en) * | 1994-09-19 | 1998-10-20 | Asahi Kogaku Kogyo Kabushiki Kaisha | Beam projecting apparatus |
| EP1758216B1 (de) * | 2005-08-26 | 2013-04-10 | Trumpf Laser- und Systemtechnik GmbH | Zweistufige Blende für einen Laserstrahl |
-
2021
- 2021-12-23 EP EP21217423.9A patent/EP4202535A1/de not_active Withdrawn
-
2022
- 2022-12-19 EP EP22840120.4A patent/EP4453639A1/de not_active Withdrawn
- 2022-12-19 US US18/716,427 patent/US20250044088A1/en active Pending
- 2022-12-19 WO PCT/EP2022/086637 patent/WO2023117892A1/de not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| EP4202535A1 (de) | 2023-06-28 |
| WO2023117892A1 (de) | 2023-06-29 |
| US20250044088A1 (en) | 2025-02-06 |
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Legal Events
| Date | Code | Title | Description |
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