EP4387805A1 - Dispositif et procédé d'usinage d'une pièce - Google Patents

Dispositif et procédé d'usinage d'une pièce

Info

Publication number
EP4387805A1
EP4387805A1 EP22765438.1A EP22765438A EP4387805A1 EP 4387805 A1 EP4387805 A1 EP 4387805A1 EP 22765438 A EP22765438 A EP 22765438A EP 4387805 A1 EP4387805 A1 EP 4387805A1
Authority
EP
European Patent Office
Prior art keywords
polarization
laser beam
laser
partial
workpiece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP22765438.1A
Other languages
German (de)
English (en)
Inventor
Jonas Kleiner
Daniel FLAMM
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Trumpf Laser und Systemtechnik GmbH
Original Assignee
Trumpf Laser und Systemtechnik GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Trumpf Laser und Systemtechnik GmbH filed Critical Trumpf Laser und Systemtechnik GmbH
Publication of EP4387805A1 publication Critical patent/EP4387805A1/fr
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0626—Energy control of the laser beam
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/20—Bonding
    • B23K26/21—Bonding by welding
    • B23K26/24—Seam welding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/20—Bonding
    • B23K26/21—Bonding by welding
    • B23K26/24—Seam welding
    • B23K26/244—Overlap seam welding
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another

Definitions

  • the present invention relates to a device and a method for processing a workpiece with a laser beam of a laser.
  • the development of lasers has led to a new way of processing materials.
  • the short pulse length and high pulse peak power or the high pulse energy can lead to non-linear absorption of the pulse energy in the material of a workpiece, so that materials that are actually transparent or essentially transparent for the laser light wavelength used can also be processed.
  • a special area of application for such laser radiation is the cutting and processing of workpieces.
  • a laser beam is preferably introduced into the material with perpendicular incidence, as a result of which material modifications are produced in the material, which damage the material in a targeted manner. This creates a kind of perforation along which the material can be separated.
  • Another area of application for such laser radiation is the joining of two joining partners, with the respective joining partners being exposed to a laser beam in order to generate a melt in the zone impacted by the laser beam through energy absorption, which after the melt has solidified forms a weld seam between the joining partners.
  • Joining using ultra-short laser pulses enables a stable connection of the joining partners without the use of additional material.
  • a device for processing a workpiece with a laser beam of a laser comprising a laser that is set up to emit a laser beam, a polarization switch that is set up to switch the polarization of the laser beam between two polarization states and/or the polarization of the To rotate the laser beam, a polarization splitter which is adapted to split the laser beam into two partial laser beams, the two partial laser beams being orthogonal to one another
  • the polarization switch is arranged in front of the polarization splitter in the direction of beam propagation, the intensities of the two partial laser beams being alternately maximized by switching and/or rotating the polarization by the polarization switch.
  • a polarization switch makes it possible to modify the polarization of an incident laser beam provided by the laser.
  • a modification can consist in that a laser beam in an end polarization state is generated from a laser beam in an initial polarization state.
  • a laser beam in an s-polarization state whose polarization is perpendicular to the plane of incidence of the laser beam, can be generated from a laser beam in a p-polarization state, whose polarization is parallel to the plane of incidence.
  • the polarization of the laser beam is switched.
  • the laser beam then assumes only two polarization states over time, namely the initial polarization state and the final polarization state, ie, for example, an s-polarization state and a p-polarization state.
  • the polarization of the laser beam is also switched to intermediate polarization states lying between the initial polarization state and the final polarization state.
  • the laser beam can be switched between an s-polarization state and a p-polarization state to an intermediate polarization state in which the polarization is at an angle other than 0° or 90°, for example 30° or 45° or 60° to the plane of incidence.
  • an initial polarization state can consist of a polarization state of a first handedness, for example left-handedness
  • the end polarization state can consist of a polarization state of a second handedness, for example right-handedness
  • the intermediate polarization state can be, for example, a linear polarization state or an elliptical polarization state.
  • a polarization splitter makes it possible to split an incident laser beam into linear basic polarization states and to spatially separate the respective basic polarization states in the form of partial laser beams.
  • the polarization of the incident laser beam is projected onto the basic polarization states of the polarization splitter.
  • Such polarization splitters are typically based on birefringence of the laser beam in the polarization splitter.
  • Birefringence is the ability of an optical material to separate the incident laser beam into two partial laser beams that are polarized perpendicularly to one another. This occurs due to different refractive indices of the optical material depending on the polarization and the angle of incidence of the light relative to the optical axis of the optical material. Therefore, the separation of the arbitrarily polarized laser beam into the basic polarization states of the polarization splitter occurs due to the shape and form of the optical axis of the optical material of the polarization splitter.
  • partial laser beams polarized perpendicularly to one another are understood to mean linearly polarized partial laser beams whose directions of polarization are aligned at an angle of 90° to one another.
  • partial laser beams polarized perpendicularly to one another are also understood to mean circularly polarized partial laser beams with opposite directions of rotation, ie two partial laser beams circularly polarized to the left and right.
  • the conversion of linearly polarized partial laser beams with polarization directions aligned perpendicular to one another into circularly polarized partial laser beams with the opposite sense of rotation can take place, for example, with the aid of a suitably oriented retardation plate ( ⁇ /4 plate), see below.
  • the outgoing partial laser beams split by the polarization splitter according to basic polarization states can have an angular offset and/or a spatial offset in relation to one another. This can also be explained by the anisotropy of the refractive indices for different polarization directions of the optical material of the polarization splitter.
  • the partial laser beams can have an angular offset after passing through the polarization splitter. This means that the first partial laser beam with a first polarization does not run parallel to the second partial laser beam with a second polarization behind the polarization splitter.
  • the polarization splitter can have a beam exit surface which is inclined at an angle to the beam entry surface.
  • the optical axis of the birefringent crystal is typically aligned parallel to the beam entry surface.
  • the two partial laser beams exit the beam exit surface at the same location and with a defined angular offset from the birefringent crystal.
  • the partial laser beams can have a spatial offset after passing through the polarization splitter. This means that the partial laser beam with the first polarization runs parallel to the partial laser beam with the second polarization behind the birefringent polarization element. However, both partial laser beams are shifted parallel to each other, so that there is a finite distance between the two partial laser beams.
  • the polarization splitter can have, for example, beam entrance and beam exit surfaces that are aligned parallel and are generally planar.
  • the optical axis of the birefringent crystal is typically aligned at an angle to the beam entry surface. If the laser beam hits the beam entry surface perpendicularly, a pure spatial displacement is generated on the beam exit surface.
  • the distances between the individual partial laser beams with different polarization can be defined by the polarization splitter, for example during production or by orienting the optical axis of the crystal to the incident laser beam.
  • a polarization splitter cannot deflect a first partial laser beam and deflect a second partial laser beam. Accordingly, the first partial laser beam would continue to propagate on the optical axis, but not the second partial laser beam. It is also possible that both partial laser beams are deflected in opposite directions. It is also possible that both partial laser beams are deflected in the same direction but to different extents.
  • the first offset (or the second offset) can also be zero and only the second offset (or the first offset) can assume a finite value, since this already enables splitting into partial laser beams.
  • the processing optics make it possible to convert the partial laser beams of different polarization provided by the polarization splitter into two different focal zones and to introduce them into the workpiece.
  • a first partial laser beam of a first polarization is introduced into the workpiece in a first focal zone and the second partial laser beam of a second polarization is introduced into the workpiece in the second focal zone in order to machine the workpiece.
  • the focal zones can be in the same focal plane or in different focal planes. This can mean that the first focal zone is in front of or behind the second focal zone in the beam propagation direction, for example.
  • the two focal zones can also lie in the same focal plane, but the focal zones in the focal plane are offset from one another. For example, one focal zone may be below the mating interface and the other focal zone may be above the mating interface.
  • Processing can consist, for example, in a workpiece being separated, or an edge being chamfered, or a predetermined breaking point being produced, or a particularly directed material stress being produced, and so on.
  • the workpiece comprises two joining partners that are to be joined to one another. Different variants of editing are discussed below.
  • the polarization switch is arranged in front of the polarization splitter in the beam propagation direction.
  • the polarization splitter performs a fixed splitting and/or deflection of the laser beam into its orthogonal base polarization components. That means the Size of the spatial splitting of the two partial laser beams is independent of the polarization of the incident laser beam.
  • this also means that the first partial laser beam is in a first basic polarization state of the polarization splitter and propagates through and out of the polarization splitter along a first path and the second partial laser beam is in a second basic polarization state and propagates through and out of the polarization splitter along a second path.
  • the polarization of the incident laser beam can be manipulated such that the polarization state of the incident laser beam corresponds to a base polarization state of the polarization splitter. Then - with a complete polarization of the incident laser beam - the entire laser energy of the laser beam is transported along the path of the partial laser beam of the selected base polarization state.
  • the polarization splitter can deflect a laser beam into a first partial laser beam in a first base polarization state and a second partial laser beam in a second base polarization state. If the laser beam is already completely in the first basic polarization state before the polarization splitter, the laser beam is deflected onto the path of the first partial laser beam. A splitting of the laser beam does not take place because of the complete polarization of the incident laser beam.
  • the laser beam When the laser beam is switched back and forth between the two basic polarization states with the polarization switch, the laser beam is alternately deflected onto the path of the first and the second partial laser beam. Accordingly, the laser energy is alternately introduced into the first focal zone or the second focal zone.
  • the laser beam is rotated back and forth between the two basic polarization states with the polarization switch, the laser beam is alternately deflected onto the path of the first and the second partial laser beam, but the laser beam is also split at each intermediate polarization state of the laser beam. Accordingly, the laser power is first introduced into a first focal zone, then partly introduced into the first and partly introduced into the second focal zone and finally introduced into the second focal zone.
  • the proportions of the laser energy (or intensity) introduced into the first and second focus zones depend on the projection of the polarization of the incident laser beam onto the basic polarization states of the polarization splitter. In particular, the selection of the polarization state by the polarization switch alternately maximizes the intensity of the two partial beams or maximizes the energy introduced into the two different focal zones.
  • the alternating introduction of the laser energy into the focal zones can mean a behavior that is periodic at least in sections over the course of time. This makes it possible, in particular, to imitate a wobble movement of the laser beams.
  • the wobble amplitude is defined by the spatial distance between the focal zones.
  • the wobble frequency i.e. the temporal repetition rate of the alternating introduction of the laser energy into the focal zones, can be set using the polarization switch.
  • maximizing the intensity of the partial laser beams can mean that the workpiece can be processed with the device even when the laser light is not completely polarized. If, for example, the incident laser beam is only 80% polarized, then only 80% of the laser beam can be specifically split and/or deflected by the polarization splitter.
  • the device according to the invention has the advantage that the position of the laser beam is not changed by a movement of the processing optics, so that the device has a particularly high mechanical stability.
  • the change in position takes place at a different location than in the case of the processing optics, so that the processing optics can be produced in a particularly simple manner.
  • This enables the device to be constructed in a simple manner and to be implemented in a cost-effective manner, with high-performance elements also being able to be installed in a particularly simple manner.
  • processing optics with a large aperture and at high process speeds can be used.
  • the polarization splitter is preferably designed as a birefringent polarization splitter in the form of a birefringent crystal. This makes it possible to simplify beam guidance of the laser beam within the device and to reduce the effort required to adjust the laser beam in connection with the polarization splitter.
  • the wavelength of the laser beam can be between 200 nm and 2000 nm, preferably 257 nm or 343 nm or 515 nm or 1030 nm.
  • the device is therefore particularly well suited for processing a workpiece, regardless of the wavelength.
  • a suitable laser wavelength can be selected for the workpiece and the processing to be achieved, so that optimal processing is achieved can be.
  • the laser can be a continuous wave laser or a pulsed laser, in particular an ultra-short pulse laser, and/or a single-mode or multi-mode laser and/or be fiber-guided or free-space-guided.
  • a continuous wave laser provides a continuous laser beam such that laser energy is continuously transported along the laser beam.
  • the pulsed laser only provides laser energy during certain time intervals, the length of which is the so-called pulse length.
  • the energy transport through the laser pulses also takes place along the laser beam.
  • a pulsed laser can also be an ultra-short pulse laser, in which case the pulse duration of the laser pulses can be less than 10 ps, preferably less than 1 ps.
  • the laser can also provide bursts, with each burst comprising the transmission of a number of laser pulses. For a certain time interval, the emission of the laser pulses can follow one another very closely, at intervals of a few picoseconds up to hundreds of nanoseconds.
  • the bursts can in particular be so-called GHz bursts, in which the sequence of the successive laser pulses of the respective burst takes place in the GHz range.
  • a sequence of individual pulses means that the laser emits several individual pulses one after the other.
  • a sequence of individual pulses therefore includes at least two individual pulses.
  • a sequence of bursts means that the laser emits several bursts one after the other.
  • a sequence of bursts therefore includes at least two bursts.
  • the bursts or individual pulses of the sequence can each be of the same type.
  • the bursts or individual pulses are identical if the laser pulses used have essentially the same properties, ie approximately the same pulse energy, the same pulse length and—in the case of bursts—also the same pulse spacing within the burst.
  • individual pulses and/or bursts can be introduced into the material and, for example, successively absorbed.
  • the spot size describes the ultra-short laser pulses and/or bursts are emitted into the material over a soft spatial area.
  • the size of the processing area is additionally determined by the beam geometry, in particular the size of the focal zone of the focused laser beam.
  • the beam geometry describes the spatial configuration of the laser beam and other beam properties such as certain diffraction properties of the laser beam, see below.
  • a large number of longitudinal modes can result in the laser beam due to the resonator length of the laser.
  • Such a laser is also called a multi-mode laser. If only a single mode is provided by the laser, this is referred to as a single-mode laser. Both single-mode and multi-mode lasers can be used in the present invention.
  • the laser beam is coupled into a fiber and thus guided to the place of use or to the optical elements of the device.
  • a fiber can be, for example, an optical fiber, a glass fiber or a hollow-core fiber.
  • the laser beam is guided via an optical lens and/or mirror system to the optical elements of the device or to the processing optics. While flexible laser guidance can easily be implemented in the first case, for example in curves or from room to room, in the second case the laser beam can be manipulated particularly easily since the laser beam is freely accessible.
  • the degree of polarization of the laser beam can be greater than 50% in front of the polarization switch.
  • the polarization switch can manipulate the polarization of the laser beam particularly well. If the laser beam were unpolarized, the polarization switch could not modify polarization. The higher the degree of polarization, the higher the contrast of the two partial laser beams in the two focal zones.
  • a polarization filter can be arranged in front of the polarization switch in order to polarize the laser beam or to increase the degree of polarization.
  • the laser can include the polarization switch.
  • the polarization switch can be a Pockels cell and/or a rotating ⁇ /4 plate and/or a rotating ⁇ /2 plate.
  • a Pockels cell is an optoelectronic device that can modify the polarization of a laser beam running through the Pockels cell by applying a control voltage.
  • it is possible to rotate the polarization of the laser beam and/or convert a linear (elliptical or circular) polarization into an elliptical or circular (linear) polarization. Accordingly, switching or rotation or modification of the polarization can be carried out in a particularly simple manner by means of the voltage control.
  • a sinusoidal voltage can be applied to the Pockels cell, so that the energy deposited in each focus zone, or the intensity of the two partial laser beams, is sinusoidally modulated.
  • the voltage it is also possible for the voltage to have a different curve shape, for example to be rectangular or sawtooth-shaped. As a result, the polarization can in particular be switched.
  • a Pockels cell makes it possible to dispense with moving parts in the device, so that particular mechanical stability can be achieved.
  • a rotating A/2 plate rotates the polarization of the laser beam around the optical axis of the built-in optical crystal in proportion to the rotation angle of the A/2 plate.
  • the A/2 plate can also be segmented, with a first segment having a first optical axis and a second segment having a second optical axis.
  • a jump in the polarization rotation of the laser beam can be generated.
  • switching of the polarization can also be achieved, in particular, with a rotating A/2 plate.
  • a rotating A/4 plate generates a left-hand or right-hand circularly polarized laser beam from an incident linearly polarized laser beam in a periodic manner corresponding to the rotation.
  • the circularly polarized laser beam can be converted back into a linearly polarized laser beam by a subsequent ⁇ /4 plate, with all linear polarization states being passed through as with the rotating ⁇ /2 plate.
  • An A/4 plate can be arranged in front of the polarization splitter in the beam propagation direction and can be set up to convert a circularly polarized laser beam into a linearly polarized laser beam.
  • circularly polarized light from the polarization switch can be converted into linearly polarized light in this way, so that a projection of the polarization state onto the base polarization states of the polarization splitter leads to a modulation of the intensity of the partial laser beams in the focal zones.
  • the two partial laser beams can be linearly polarized orthogonally to one another in the beam propagation direction behind the polarization splitter, preferably p- and s-polarized.
  • the mutually orthogonally linearly polarized partial laser beams can be converted into mutually orthogonally circularly polarized partial laser beams by means of an A/4 plate, which is arranged behind the polarization splitter in the direction of beam propagation.
  • a Pockels cell and an ⁇ /4 plate can be combined as the polarization switch.
  • the polarization of the laser beam can be switched by ⁇ /4 with the Pockels cell, for example, so that in combination with the ⁇ /4 plate, which can be arranged before or after the Pockels cell, a rotation of the polarization is achieved.
  • the direction of polarization can be determined overall, as well as the handedness of the polarization.
  • an ideal adjustment of the polarization to the processing of the workpiece is possible.
  • the processing optics can include a collimating lens and a focusing lens.
  • the collimation lens is set up to convert bundles of rays of non-parallel partial beams, in particular divergent partial beams, into parallel partial beams.
  • the partial laser beams of the polarization splitter can be parallelized with an angular offset by a collimation lens.
  • the focusing lens can convert the partial beams of a bundle of rays into a focal zone.
  • this makes it possible to convert two different bundles of rays, such as those of the partial laser beams that are provided by the polarization splitter, into two different focal zones. Only through the focusing and the consequent convergence of the bundles of rays of the partial laser beams in the respective focal zone is an intensity increase achieved in the focal zone, through which the workpiece can be processed.
  • the processing optics can include a beam-shaping element, preferably a diffractive optical element or a microlens array, which is set up to convert a first intensity distribution of the laser beam into a second intensity distribution of the laser beam.
  • a beam-shaping element preferably a diffractive optical element or a microlens array
  • a diffractive optical element is set up to influence the incident laser beam in one or more properties in two spatial dimensions.
  • a diffractive optical element is a fixed component that can be used, for example, to produce a specific non-diffracting laser beam from the incident laser beam.
  • a diffractive optical element can also be suitable for splitting an incident laser beam into several partial laser beams.
  • a diffractive optical element is a specially shaped diffraction grating, whereby the incident laser beam is brought into the desired beam shape by the diffraction.
  • a microlens array is an arrangement of a large number of lenses, each of which produces its own image of the partial laser beams.
  • the two partial laser beams of the polarization splitter can be split into a large number of partial partial laser beams.
  • the beam-shaping element can be set up to impress a Gaussian beam profile or a non-diffracting beam profile or a flat-top beam profile on the laser beam.
  • Non-diffracting rays and/or Bessel-like rays are to be understood in particular as rays in which a transverse intensity distribution is propagation-invariant.
  • a transverse intensity distribution is essentially constant along the beam propagation direction.
  • Non-diffracting laser beams therefore have the advantage that they can have a focal zone that is elongated in the direction of beam propagation, which is significantly larger than that are transverse dimensions of the focal zone. For example, a material modification that is elongated in the beam propagation direction can be produced in this way.
  • the beam-shaping device may introduce focal zones of different depths in the beam propagation direction for the various partial laser beams.
  • a flat-top beam profile corresponds to a homogeneous and sharply defined beam cross-section, with the same high intensity being present everywhere in the homogeneous part of the beam cross-section, but the intensity falling quickly to an almost vanishing value across the sharp boundary.
  • a Gaussian beam profile has a Gaussian bell curve as the beam cross section.
  • the second intensity distribution by the beam-shaping element can be a multi-spot distribution, with each individual spot of the multi-spot distribution having a Gaussian beam profile or a non-diffracting beam profile or a flat-top beam profile.
  • the number of partial laser beams can be defined via the beam-shaping element. This results in what is known as a multi-spot distribution, which is made up of various individual spots.
  • the beam-shaping element can be used to determine whether the split partial laser beams lie on a one-dimensional line or on a two-dimensional grid.
  • the splitting can be effected independently of the polarization of the laser beam.
  • the polarization of the laser beam is retained as it passes through the beam-shaping element.
  • any positional deviations or angular offsets from the optical axis are taken into account when passing through the beam-shaping element, so that a splitting and deflection by the beam-shaping element is effected in addition to a previous splitting and deflection.
  • a first sub-laser beam may be a Gaussian laser beam
  • a second sub-laser beam may be a flat-top beam
  • a third sub-laser beam may be a non-diffractive beam.
  • all partial laser beams are Gaussian laser beams.
  • a two-dimensional multi-spot distribution consisting of, for example, 4 ⁇ 4 multi-spots to be generated by the beam-shaping optics.
  • the polarization of the adjacent multispots can be different.
  • the polarization is the same in rows or columns.
  • the workpiece can be separated by machining along a parting line.
  • Type I is an isotropic refractive index change
  • Type II is a birefringent refractive index change
  • Type III is a so-called void.
  • the material modification produced depends on laser parameters such as the pulse duration, the wavelength, the pulse energy and the repetition frequency of the laser, on the material properties such as the electronic structure and the thermal expansion coefficient, as well as on the numerical aperture (NA) of the imaging optics.
  • the isotropic type I refractive index changes are attributed to localized melting by the laser pulses and rapid resolidification of the transparent material of the workpiece.
  • the density and refractive index of the material is higher when the fused silica is rapidly cooled from a higher temperature. So if the material in the focus volume melts and then cools down quickly, the quartz glass has a higher refractive index in the areas of material modification than in the unmodified areas.
  • the type II birefringent refractive index changes can arise, for example, as a result of interference between the ultrashort laser pulse and the electric field of the plasma generated by the laser pulses. This interference leads to periodic modulations in the electron plasma density, which leads to a birefringent property, i.e. direction-dependent refractive indices, of the transparent material when it solidifies.
  • a type II modification is also accompanied, for example, by the formation of so-called nanogratings.
  • the voids (cavities) of the Type 111 modifications can be generated with a high laser pulse energy, for example.
  • the formation of the voids is attributed to an explosive expansion of highly excited, vaporized material from the focus volume into the surrounding material. This process is also known as a micro-explosion. Because this expansion occurs within the bulk of the material, the microblast leaves behind a less dense or hollow core (the void), or submicron or atomic-scale microscopic defect, surrounded by a densified shell of material. Due to the compression at the impact front of the microexplosion, stresses arise in the transparent material, which can lead to spontaneous cracking or can promote cracking. In particular, the formation of voids can also be associated with type I and type II modifications.
  • Type I and Type II modifications can arise in the less stressed areas around the introduced laser pulses. Therefore, if a type III modification is introduced, then in any case a less dense or hollow core or a defect is present. For example, in a type III modification of sapphire, the microexplosion does not create a cavity, but rather an area of lower density. Due to the material stresses that occur in a type III modification, such a modification is often accompanied by cracking or at least promotes it. The formation of type I and type II modifications cannot be completely prevented or avoided when introducing type III modifications. Finding "pure" Type III modifications is therefore not likely.
  • the device to process, in particular to cut, opaque materials such as metals or sheet metal.
  • material is vaporized and removed by the high-energy excitation of the material of the workpiece.
  • the typical spot size is between 50 pm and 500 pm, preferably 150 pm
  • the typical seam width is between 50 pm and 500 pm, preferably 200 pm.
  • the so-called wobble amplitude i.e. the spatial distance between the focal zones, which is generated by the polarization splitter and the processing optics, is between 100pm and 4000pm, typically 600pm.
  • the wobble frequency when cutting sheet metal is typically less than 5 kHz, preferably between 200 Hz and 2000 Hz.
  • the workpiece can include two parts to be joined, which are joined together by machining.
  • the joining partners can be arranged one on top of the other, so that the boundary surfaces of the joining partners, across which the joining partners are to be joined, point towards one another.
  • the abutting surface is the surface on which the joining partners are in contact.
  • the successive absorption of the laser beam preferably the ultra-short laser pulses, and thus heat accumulation takes place if the energy input of the laser beam is greater than the rate of heat removal through material-specific heat transport mechanisms, in particular through heat diffusion. Due to the increasing temperature in the material of at least the first joining partner, the Melting temperature of the material of the joining partners can be reached, which leads to a local melting of the material of the joining partners.
  • the joining area is therefore understood to be that area of the joining partner in which the material is melted.
  • the entirety of the locally melted material in the joining area can also be referred to as a melt bubble.
  • the resulting melt can bridge the common interface of the joining partners and permanently connect the joining partners to one another when cooling down.
  • the network structure of the joining partners can also change.
  • the joint seam is then referred to as the cooled melt which connects the joint partners to one another or results in the joint connection.
  • the typical seam width is between 10 pm and 500 pm, preferably 50 pm with a beam diameter of 2 pm.
  • the effective area of an individual spot compared to the beam diameter is significantly larger, since due to heat accumulation and heat transport, an area is melted that exceeds the spatial dimensions of the individual spot.
  • the wobble amplitude is between 1 pm and 1000 pm, typically 200 pm.
  • the wobble frequency when cutting sheet metal is typically less than 5 kHz, preferably between 200 Hz and 2000 Hz.
  • the device can have a feed device which is set up to move the workpiece and the laser beam relative to one another with a feed along a trajectory, with the feed preferably taking place perpendicularly or parallel to the splitting of the laser beam.
  • the trajectory describes the line of incidence of the laser beam when no splitting is produced by the polarization splitter or a beam-shaping element.
  • the wobble movement is superimposed on this trajectory, so that the material is processed around the trajectory.
  • the device can have a scanner unit which is set up to scan the partial laser beams over the workpiece, with the scanner unit preferably being a galvanic scanner.
  • the scanner unit preferably being a galvanic scanner.
  • a galvano scanner allows the laser field to be positioned precisely and quickly over the workpiece.
  • the polarization switch can be arranged before or after the fiber guide or free space guide and/or before or after the collimating lens and the polarization splitter can be arranged after the collimating optics and after the polarizing switch and before the focusing optics or before the collimating optics and after the polarizing switch .
  • the polarization switch can be arranged after the fiber guide or free space guide and after the collimating lens and the polarization splitter can be arranged after the collimating optics and before the focusing optics
  • the polarization switch can, for example, be arranged after the fiber guide or free space guide and before that of the collimating lens and the polarization splitter can be arranged after the collimating optics and before the focusing optics.
  • the polarization switch can be arranged, for example, in front of the fiber guide or free-space guide and thus in front of the collimating lens, and the polarization splitter can be arranged after the collimating optics and before the focusing optics.
  • the polarization splitter can also be arranged before the collimation optics and after the polarization switch.
  • a method for processing a workpiece with a laser beam of a laser wherein a laser beam is provided by a laser, the polarization of the laser beam is switched and/or rotated between two polarization states by a polarization switch, the laser beam is split into two partial laser beams by a polarization splitter is, wherein the two partial laser beams mutually orthogonal polarizations and wherein the first partial laser beam with the first polarization has a first offset after passing through the polarization splitter and the second partial laser beam of a second polarization has a second offset after passing through the polarization splitter, and the two partial laser beams are introduced into the workpiece by processing optics in two focal zones be, whereby the workpiece is machined.
  • the intensities of the two partial laser beams are alternately maximized by switching and/or rotating the polarization by the polarization switch.
  • Figure 1 is a schematic representation of the proposed device
  • FIG. 2A, B, C, D shows a schematic representation of a polarization splitter and the interaction with a polarization switch
  • Figure 3A, B is a schematic representation of the polarization-based
  • FIG. 4A, B, C, D, E further schematic representations of the devices
  • Figure 5A, B, C is a schematic representation of a beam shaping element
  • FIG. 6A, B shows a further schematic representation of the device
  • FIG. 7 shows a further schematic representation of the device and the method.
  • FIG. 8 shows a further schematic representation of the device and the method.
  • FIG. 1 A proposed device 1 is shown schematically in FIG.
  • the device 1 has a laser 3 which makes a laser beam 30 available.
  • the laser beam 30 is guided through a fiber guide 16 to the processing optics 8 which comprises a collimating lens 81 and a focusing lens 82 .
  • the processing optics 8 also includes a polarization switch 4 which is suitable for switching and/or rotating the polarization of the laser beam 30 .
  • the laser beam 30 with the polarization defined by the polarization switch 4 is then directed to a polarization splitter 5, the laser beam 30 being broken down into the basic polarization states of the polarization splitter 5 and split up.
  • the polarization splitter 5 generates a first partial laser beam 301, which is polarized according to a first basic polarization state, and a second partial laser beam 302, which is polarized according to a second basic polarization state.
  • the first partial laser beam 301 is then introduced into a first focal zone 801 in the workpiece 10 through the focusing lens 82 and the second partial laser beam 302 is introduced through the focusing lens into the second focal zone 802 in the workpiece 10 .
  • the workpiece 10 is processed by the energy of the partial laser beams 301 , 302 deposited there.
  • the polarization splitters 5 are birefringent polarization splitters 5 and can be provided, for example, in the form of a birefringent crystal.
  • Different birefringent materials can be used as the crystal material for the polarization splitter 5, e.g. alpha-BBO (alpha-barium borate), YVO4 (yttrium vanadate), crystalline quartz, etc.
  • the polarization splitter 5 in Figure 2A is wedge-shaped, i.e. a plane beam entry surface 52 for the entry of an entering laser beam 30 and a plane beam exit surface 54 of the polarization splitter 5 are aligned at a (wedge) angle to one another.
  • the or an optical axis 56 of the crystal material is aligned parallel to the beam entry surface 52 .
  • the first, p-polarized sub-laser beam 301 is at the exit from the polarization splitter 5 is refracted less than the second, s-polarized partial laser beam 302, so that an angular offset a between the first and the second partial laser beam 300 occurs.
  • the first and second partial laser beams 300 emerge from the polarization splitter 5 at the same point on the beam exit surface 54, which means that although an angular offset a is generated, there is no spatial offset between the two partial laser beams 300.
  • the beam entry surface 52 and the beam exit surface 54 are aligned parallel to one another and the optical axis 56 of the crystal material is aligned at an angle of 45° to the beam entry surface 52 .
  • the laser beam 30 striking perpendicularly to the beam entry surface 52 is divided at the beam entry surface 52 into a first, ordinary partial laser beam 301 and a second, extraordinary partial laser beam 302 .
  • the two partial laser beams 301, 302 exit parallel at the beam exit surface 54, that is to say without an angular offset, but with a spatial offset Ax.
  • the two polarization splitters 5 shown in Figures 2A, B therefore differ fundamentally in that the polarization splitter 5 shown in Figure 2A generates an angular offset a (without spatial offset) and that the polarization splitter 5 shown in Figure 2B generates a spatial offset Ax (without angular offset).
  • FIGS. 2C, D the mode of interaction with an upstream polarization switch 4 is shown, it being assumed that the laser beam 30 which impinges on the polarization switch is or has already been linearly polarized.
  • the polarization switch 4 applies a defined polarization to the laser beam 30 . If the polarization of the laser beam 30 corresponds to one of the basic polarization states of the polarization splitter 5, the entire energy of the laser beam 30 is directed via the path of the respective partial laser beam 301, 302 into the corresponding focal zone 801, 802.
  • FIG. 2C shows that the polarization switch 4 converts the laser beam 30 into an s-polarization state.
  • the s-polarization state is one of the basic polarization states of the polarization splitter 5. Accordingly, the laser beam 30 is deflected onto the path of the partial laser beam 302.
  • FIG. in particular, the s-polarized laser beam 30 does not contain any p-polarized beam parts, so that there is no splitting into two partial laser beams 301 , 302 , but only one laser beam 30 (called partial laser beam 302 ) exits the polarization splitter 5 .
  • the same polarization splitter 5 is shown in FIG. 2D when a p-polarized laser beam 30 is provided by the polarization switch 4 . Also the p-polarization state is on Basic polarization state of the polarization splitter 5, so that the energy transport via the path of the partial laser beam 301 is realized. In this case, the laser beam 30 is deflected by an angle ⁇ with respect to the optical axis of the device 58 .
  • FIG. 3A A corresponding time course of such a polarization change is shown in Figure 3A, as well as the associated intensity of the laser beam 30 or the partial laser beams 301, 302 in the focal zones 801 and 802.
  • the laser beam 30 can have a polarization of 0° due to a polarization switch, so that the entire laser beam 30 is directed into the focal zone 801 along the path of the partial laser beam 301 .
  • the laser beam 30 is split by the polarization splitter 5 into the corresponding base polarization states and partial laser beams 301 and 302 .
  • the intensity in the focus zone 801 is therefore significantly greater than the intensity in the focus zone 802.
  • the intensity in both focus zones 801 and 802 is the same.
  • the intensity in the focal zone 802 is greater than in the focal zone 801.
  • the polarization of the laser beam 30 again coincides with a basic polarization state of the polarization splitter 5, so that the entire energy of the laser beam 30 is transported into the focal zone 802 of the second partial laser beam 302.
  • a variation in the polarization has caused a change in the point of impact of the laser beam 30 in the workpiece 10 over the course of time.
  • a wobble movement of the laser beam 30 can therefore be imitated by a periodic change in polarization of the laser beam 30 .
  • FIG. 3B A further illustration of the wobble movement is shown in FIG. 3B.
  • a Gaussian laser beam 30 was simulated, the polarization of which is sinusoidally modulated and thus a splitting along the x-axis takes place and a feed along the y-axis takes place at the same time.
  • the mean laser intensity is shown.
  • a low intensity is shown in black and a high intensity is shown in white. It can be clearly seen that the laser intensity introduced into the workpiece 10 alternates between the focal zones 801, 802, so that the laser beam 30 executes a wobbling movement on the workpiece 10, which is additionally illustrated by the white dashed line .
  • a polarization switch 4 can be a rotating ⁇ /4 plate or an ⁇ /2 plate or a voltage-controlled Pockels cell.
  • the rotating wave plates can be used to rotate the polarization of the laser beam in a particularly simple manner, while the Pockels cell can be used to switch the polarization in a particularly simple manner.
  • a first segment of the waveplate can have a birefringent crystal with a first optical axis and a second segment can have a birefringent crystal with a second optical axis.
  • a rotating segmented waveplate when the laser beam passes through the first crystal, the polarization undergoes a first rotation, while the laser beam 30 when passing through the second crystal undergoes a second polarization rotation.
  • the rotation of the wave plate can also switch the polarization of the laser beam 30 in this way.
  • the laser beam 30 of the laser 3 is guided through the polarization switch 4 before it is introduced into the workpiece 10 through a fiber guide 16 and a downstream polarization splitter 5 through the processing optics 81, 82.
  • the laser beam 30 of the laser is guided through the polarization switch 4 before it is collimated by a fiber guide 16 through the collimating lens 81 of the processing optics 8 .
  • the polarization splitter 5 is arranged between the collimating lens 81 and the focusing lens 82, The focusing lens 82 brings the partial laser beams 301 and 302 into the focus zones 801 , 802 in the workpiece 10 after the polarization splitter 5 .
  • the laser beam 30 of the laser is guided to the polarization switch 4 through a fiber guide 16 .
  • the laser beam 30 is then collimated by the collimation lens 81 of the processing optics 8 and sent through the polarization splitter 5, which splits the laser beam 30 into two partial laser beams 301, 302.
  • the partial laser beams 301 , 302 are finally introduced into the workpiece in the focus zones 801 , 802 through the focusing lens 82 .
  • FIG. 4E the laser beam 30 of the laser 3 is circularly polarized.
  • the circular polarization can be converted into a linear polarization by an ⁇ /4 plate 40 .
  • FIG. 4E on the other hand, the laser beam 30 of the laser 3 already has a linear polarization. It is shown in both FIGS. 4D and 4E that the linear basic polarization states of the polarization splitter 5 can be converted into circular polarizations with a subsequent ⁇ /4 plate 50 .
  • FIG. 5A shows the mode of operation of a beam shaping optics 6 .
  • a beam shaping optics 6 is arranged behind the polarization splitter 5 .
  • the beam-shaping optics 6 can split the two partial laser beams 301, 302 into a large number of partial partial laser beams 3000, so that the laser energy can be introduced into a large number of focal zones in the workpiece.
  • the intensity of the partial partial laser beams 3000, which originate from a partial laser beam 301, 032 of a specific basic polarization, can be modified by means of an upstream polarization switch 4. This is shown in Figure 5B.
  • FIG. 5B the intensity of the individual partial laser beams 3000 is modified by the polarization switch 4, analogously to FIG. 3A.
  • a wobble movement can thus also be implemented with a large number of partial partial laser beams 3000 .
  • FIG. 5C this is shown for the multi-spot profile in FIG. 5C.
  • FIG. 6A shows a feed device 12 which is set up to move the processing optics 8 and the workpiece 10 in a translatory manner along three spatial axes XYZ.
  • the laser beam 30 of the laser 3 is directed onto the workpiece 10 by deflection optics.
  • the workpiece 10 is arranged on a support surface of the feed device 12 , the support surface preferably neither reflecting nor absorbing the laser energy, which the workpiece does not absorb, nor strongly scattering it back into the workpiece 10 .
  • the laser beam 30 can be coupled into the processing optics 8 by a free beam guide 18 .
  • the free beam guide 18 can be a free space section with a lens and mirror system, as shown in FIG. 6A.
  • the beam can also be guided via a fiber guide 16, in particular via a hollow-core fiber with coupling and decoupling optics, as shown in FIG. 6B.
  • the laser beam 30 is guided by a mirror construction in the direction of the workpiece 10 and introduced into the workpiece 10 by the processing optics 8, as a result of which the workpiece 10 is processed.
  • the processing optics 8 can be moved and adjusted relative to the workpiece 10 with the feed device 12 .
  • the feed device 12 can move the workpiece 10 under the laser beam 30 with a feed V, so that the laser beam 30 processes the workpiece 10 along the desired trajectory.
  • the feed device 6 comprises a first axis system 120, with which the workpiece 10 can be moved along the XYZ axes and, if necessary, rotated.
  • the feed device 12 can also have a workpiece holder 122 which is set up to hold the workpiece 10 .
  • FIG. 10 A further device according to the invention, which is suitable for joining two joining partners of the workpiece 10, is shown schematically in FIG.
  • the joining partners 101 , 102 are arranged one on top of the other at a common interface 103 .
  • a laser 3 provides ultra-short laser pulses, for example. These can be introduced into the joining partners 101, 102 in the form of a sequence of individual pulses or in the form of a sequence of bursts.
  • the average power of the laser spot can be between 0.1 W and 50 W.
  • the laser pulses of a burst can each have a time interval of at most 1 ps, preferably between 0.05 ns and 1000 ns, particularly preferably between 20 ns and 80 ns, with a burst comprising between 2 and 64 burst pulses, preferably between 2 and 16 burst pulses.
  • the repetition frequency of the individual laser pulses and/or the bursts can be between 0.5 kHz and 10 MHz, preferably between 1 kHz and 4 MHz.
  • the laser wavelength can be between 200 nm and 5000 nm, preferably 1000 nm, and/or the pulse duration of the laser pulses can be between 10 fs and 50 ps
  • the laser 3 contains the polarization switch and the processing optics 8 includes the polarization splitter 5.
  • the processing optics 8 focuses the generated Partial laser beams 301, 302 such that the focal zones 801, 802 approximately coincide with the common interface 103 of the two joining partners 101, 101.
  • the first joining partner 101 in the direction of beam propagation must be transparent for the wavelength of the laser 3 .
  • the first joining partner 101 can be a glass or a crystal or a ceramic or a plastic.
  • the second joining partner 102 can be opaque or transparent.
  • the second joining partner 102 can be a metal or a semiconductor or a plastic or a ceramic.
  • successive laser pulses are absorbed in the focal zones 801, 802 in such a way that the material of the joining partners 101, 102 melts and connects across the boundary surface 103 to the other joining partner 102, 101 in each case.
  • a permanent connection is created between the two parts to be joined 101, 102.
  • the two parts to be joined 101, 102 are joined to one another in this area by welding.
  • This area in which the melting and joining of the materials and the subsequent cooling of the melt takes place and in which the actual joining takes place, is also referred to as the joint.
  • the cooled melt and material connection of the joining partners 101, 102 forms a weld seam.
  • the laser beam and the joining partners can be moved and/or positioned relative to one another with a feed rate V between 0.01 mm/s and 1000 mm/s, preferably between 0.1 mm/s and 300 mm/s.
  • the joining partners can be positioned, for example, on a feed device 12, as already shown above. It can thereby be achieved that the partial laser beams 301, 302 are moved along a joint seam over the joint partners 101, 102, so that the joint partners 101, 102 can be joined along the joint seam.
  • a melting zone is produced to a certain extent periodically to the left and right of the joining trajectory 14 .
  • the melting zones it is also possible for the melting zones to be produced above and below the trajectory 14, ie a first melting zone is produced in the first joining partner and a second melting zone is produced in the second joining partner.
  • FIG. 8 schematically shows a further device according to the invention, which is suitable for cutting a workpiece 10, in particular for cutting sheet metal.
  • the partial laser beams 301, 302 are introduced along a trajectory 14 along which the material is to be separated.
  • the focal zones 801, 802 can lie on the trajectory, so that a higher cutting speed or higher process speed can be achieved with a simultaneous increase in the cutting quality.
  • the focal zones 801, 802 it is also possible for the focal zones 801, 802 to be introduced in a manner analogous to FIG. 7 next to the actual trajectory.

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Laser Beam Processing (AREA)

Abstract

L'invention concerne un procédé et un dispositif (1) pour usiner une pièce (10) au moyen d'un faisceau laser (30) d'un laser (3), comprenant un laser (3) qui est conçu pour commuter la polarisation du faisceau laser (30) entre deux états de polarisation et/ou faire tourner la polarisation du faisceau laser, un séparateur de polarisation (5) conçu pour diviser le faisceau laser (30) en deux faisceaux laser partiels (300), les deux faisceaux laser partiels (300) présentant des polarisations orthogonales entre elles, le premier faisceau laser partiel (301) possédant la première polarisation présentant un premier décalage après le passage dans le séparateur de polarisation, et le deuxième faisceau laser partiel (302) possédant une deuxième polarisation présentant un deuxième décalage après le passage dans le séparateur de polarisation, et un système optique d'usinage (8) conçu pour injecter le premier faisceau laser partiel (301) dans une première zone de focalisation (801) de la pièce (10) et le deuxième faisceau laser partiel (302) dans une deuxième zone de focalisation (802) de la pièce (10), pour usiner cette pièce (10), le commutateur de polarisation (4) étant disposé en amont du séparateur de polarisation (5) dans la direction de propagation du faisceau, la commutation et/ou la rotation de la polarisation par l'intermédiaire du commutateur de polarisation (4) maximalisant en alternance les intensités des deux faisceaux laser partiels (300).
EP22765438.1A 2021-08-18 2022-08-10 Dispositif et procédé d'usinage d'une pièce Pending EP4387805A1 (fr)

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US20240181563A1 (en) 2024-06-06

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