EP4323172A1 - Additive manufacturing system, methods of forming the same and of forming a composite structure - Google Patents
Additive manufacturing system, methods of forming the same and of forming a composite structureInfo
- Publication number
- EP4323172A1 EP4323172A1 EP22788563.9A EP22788563A EP4323172A1 EP 4323172 A1 EP4323172 A1 EP 4323172A1 EP 22788563 A EP22788563 A EP 22788563A EP 4323172 A1 EP4323172 A1 EP 4323172A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- printed portion
- light
- pool
- slice
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/10—Formation of a green body
- B22F10/12—Formation of a green body by photopolymerisation, e.g. stereolithography [SLA] or digital light processing [DLP]
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
- B22F7/06—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools
- B22F7/08—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools with one or more parts not made from powder
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/30—Auxiliary operations or equipment
- B29C64/307—Handling of material to be used in additive manufacturing
- B29C64/321—Feeding
- B29C64/336—Feeding of two or more materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/30—Auxiliary operations or equipment
- B29C64/35—Cleaning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y40/00—Auxiliary operations or equipment, e.g. for material handling
- B33Y40/20—Post-treatment, e.g. curing, coating or polishing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y80/00—Products made by additive manufacturing
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
- C23C18/143—Radiation by light, e.g. photolysis or pyrolysis
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1605—Process or apparatus coating on selected surface areas by masking
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1607—Process or apparatus coating on selected surface areas by direct patterning
- C23C18/1608—Process or apparatus coating on selected surface areas by direct patterning from pretreatment step, i.e. selective pre-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1619—Apparatus for electroless plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1655—Process features
- C23C18/1657—Electroless forming, i.e. substrate removed or destroyed at the end of the process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0014—Shaping of the substrate, e.g. by moulding
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2031/00—Other particular articles
- B29L2031/34—Electrical apparatus, e.g. sparking plugs or parts thereof
- B29L2031/3425—Printed circuits
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0284—Details of three-dimensional rigid printed circuit boards
Definitions
- Various aspects of this disclosure relate to an additive manufacturing system. Various aspects of this disclosure relate to a method of forming an additive manufacturing system. Various aspects of this disclosure may provide a method of forming a composite structure according to various embodiments.
- 3D metal-plastic composite functional devices have more complex and sophisticated structures with higher degrees of design freedom and higher integration.
- 2D printed circuit boards PCBs
- the selective construction of metallized layouts in specific regions of 3D substrates can allow the fabrication of interconnecting devices having a variety of complicated geometric shapes.
- ELP electroplating
- ELP electroless plating
- VE vacuum evaporation
- sputtering complex 3D printed structures having surfaces with metallic properties.
- ELP is the most cost-effective technique for the deposition of metal onto non-metallic structures. ELP is based on simple wet chemical processing and allows the deposition of a uniform metal coating onto the surface of a part without applying an external electrical potential.
- MM3DP multi-material 3DP
- materials having special functions can be applied at any location of a part to form interconnected 3D patterns that can be used to activate the ELP process.
- An activation- sensitization pre-treatment is required prior to performing ELP, and this necessity has been exploited to achieve patterned plating.
- the most straightforward approach to this process is to coarsen specific regions on the material surface by creating microstructures.
- Various embodiments may provide an additive manufacturing system for forming a composite structure.
- the system may include a first pool including or configured to include an active solution or mixture to form a first printed portion of a workpiece, the active solution or a mixture including a solvent, an activation seed soluble in the solvent, and a light curable resin.
- the system may also include a second pool including or configured to include a further light curable resin to form a second printed portion of the workpiece.
- the system may additionally include a light source configured to provide light.
- the system may further include a mask configured to be arranged such that the light provided by the light source is irradiated onto the workpiece through the mask.
- the system may also include a third pool including or configured to include a cleaning solution or mixture for cleaning the workpiece.
- the first printed portion including the activation seed may be configured to form a metallic layer via an electroless deposition process, thereby forming the composite structure.
- Various embodiments may provide a method of forming an additive manufacturing system for forming a composite structure.
- the method may include providing a first pool including or configured to include an active solution or mixture to form a first printed portion of a workpiece, the active solution or mixture including a solvent, an activation seed soluble in the solvent, and a light curable resin.
- the method may also include providing a second pool including or configured to include a further light curable resin to form a second printed portion of the workpiece.
- the method may further include providing a light source configured to provide light.
- the method may additionally include providing or arranging a mask such that the light provided by the light source is irradiated onto the workpiece through the mask.
- the method may also include providing a third pool including or configured to include a cleaning solution or mixture for cleaning the workpiece.
- the first printed portion including the activation seed is configured to form a metallic layer via an electroless deposition process, thereby forming the composite structure.
- Various embodiments may provide a method of forming a composite structure.
- the method may include depositing an active solution or mixture to form a first printed portion of a workpiece, the active solution including a solvent, an activation seed soluble in the solvent, and a light curable resin.
- the method may also include depositing a further light curable resin to form a second printed portion of the workpiece.
- the method may additionally include irradiating light provided by a light source onto the workpiece through a mask.
- the method may also include dispensing a cleaning solution or mixture for cleaning the workpiece.
- the method may further include forming a metallic layer on the first printed portion via an electroless plating process due to the activation seed included in the first printed portion, thereby forming the composite structure.
- FIG. 1 shows a general illustration of an additive manufacturing system according to various embodiments for forming a composite structure.
- FIG. 2 shows a general illustration of a method of forming an additive manufacturing system for forming a composite structure.
- FIG. 3 shows a general illustration of a method of forming a composite structure according to various embodiments.
- FIG. 4 is a schematic illustrating the multi-material digital light processing three-dimensional printing (MM-DLP3DP) process according to various embodiments.
- FIG. 5 shows (a) a multi-material digital light processing three-dimensional printing (MM- DLP3DP) apparatus according to various embodiments, and (b) numerical processing of multi material models in which the slicing data are obtained by treating different material topologies in the same part as units with separate slicing according to various embodiments.
- MM- DLP3DP multi-material digital light processing three-dimensional printing
- FIG. 6 is a schematic showing an arbitrary complex multi-material model and the printing process of printing the model according to various embodiments.
- FIG. 7 shows (a) a plot of absorption as a function of wavelength (in nanometres or nm) showing the ultraviolet spectra of a rigid light-cured resin before and after modification with palladium (Pd 2+ ) ions according to various embodiments; and (b) a plot of absorption as a function of wavelength (in nanometres or nm) showing the ultraviolet spectra of a flexible light-cured resin before and after modification with palladium (Pd 2+ ) ions according to various embodiments.
- FIG. 8 shows (a) three micro- structured metallized surfaces each with a thickness of 200 pm: circular with a radius of 200 pm, ortho -hexagonal with an inner circle radius of 200 pm, and circular groove with a groove width of 400 pm using the process according to various embodiments; (b) a skeletonized ball structure with a circular base that has been covered with Ni metal using the process according to various embodiments; (c) an Eiffel Tower with a microfine structure in which selected parts have been uniformly covered with nickel (Ni) plating using the process according to various embodiments; (d) a five-sided structure with a complex nickel (Ni) metal distribution and multi-material nesting between layers and within layers using the process according to various embodiments; (e) a dome structure with an arc shaped metal distribution using the process according to various embodiments; (f) a U-shaped tube with an internal metal mesh having a thickness of 1 mm and square hexagons each with a 500 pm inner diameter using the process according to various embodiments, demonstrating the construction and
- FIG. 9 shows (a) an light emitting diode (LED) stereo circuit with complex nickel (Ni) metal wire topology using the process according to various embodiments; (b) a double-layer three- dimensional (3D) circuit structure with a complex three-dimensional (3D) copper wire structure using the process according to various embodiments, and which is difficult to fabricate by traditional processes; and (c) a plot of impedance (in ohms or W) as a function of frequency as a function of frequency (in hertz or Hz) showing the impedance of nickel (Ni) and copper (Cu) coatings formed using the process according to various embodiments.
- FIG. 9 shows (a) an light emitting diode (LED) stereo circuit with complex nickel (Ni) metal wire topology using the process according to various embodiments; (b) a double-layer three- dimensional (3D) circuit structure with a complex three-dimensional (3D) copper wire structure using the process according to various embodiments, and which is difficult to fabricate by traditional processes; and (c)
- FIG. 10 shows (a) nickel (Ni)-plated structures with widths of 1 mm, 500 pm and 100 pm and with widths of 50 and 40 pm formed by the process according to various embodiments; and (b) a circuit board part having a width of 1 mm incorporating 500 pm copper wires formed by the process according to various embodiments.
- FIG 10(a) shows images of Ni wires having widths of 1 mm, 500 pm, 100 pm, 50 pm, and 40 pm. High-magnification microscopy showed that the Ni was precisely distributed on these active precursor wires, thus showing exceptional resolution of the printing method and the effectiveness of selective metal deposition.
- the Cu plating on the circuit board shown in FIG. 10(b) shows that various embodiments may provide a manufacturing resolution of at least 40 pm, which is sufficient to meet the processing requirements of most electronic products.
- FIG. 11 shows (a) a standard flat nickel (Ni) plating according to various embodiments; (b) and (c) scanning electron microscopy (SEM) images of the indicated area in (a) with different magnifications according to various embodiments; (d) a nickel (Ni) plating on the surface of a circular micro structure according to various embodiments; (e) and (f) scanning electron microscopy (SEM) images of the indicated area in (d) with different magnifications according to various embodiments; (g) a nickel (Ni) plating on the surface of an annular groove microstructure according to various embodiments; (h) and (i) scanning electron microscopy (SEM) images of the indicated area in (g) with different magnifications according to various embodiments; (j) a nickel (Ni) plating on the surface of an ortho-hexagonal microstructure according to various embodiments; (k) - (1) scanning electron microscopy (SEM) images of the indicated area in (j) with different magnifications according to
- FIG. 12 shows (a) a cross-sectional transmission electron microscopy (TEM) image indicating the resin layer, the conjunction layer, and the nickel layer of the composite structure according to various embodiments; (b) an energy-dispersive X-ray spectroscopy (EDS) image showing the distribution of iron according to various embodiments; (c) an energy-dispersive X-ray spectroscopy (EDS) image showing the distribution of palladium according to various embodiments; and (d) an energy-dispersive X-ray spectroscopy (EDS) image showing the distribution of nickel according to various embodiments.
- TEM transmission electron microscopy
- EDS energy-dispersive X-ray spectroscopy
- FIG. 13 shows (a) a schematic of a three-dimensional (3D) printed integrated strain gauge according to various embodiments on the measured object; (b) images of the strain gauge according to various embodiments and a schematic on the measurement of the strain gauge according to various embodiments; (c) an image showing the bending deformation of the gauge under stress according to various embodiments; (d) a plot of voltage (in volts or V) as a function of load (in grams or g) showing the voltage measurement characteristics of the strain gauge according to various embodiments; (e) a plot of strain as a function of load (in grams or g) showing the strain characteristics of the strain gauge according to various embodiments calculated from experiment data; and (f) a plot of deformation (in millimetres or mm) as a function of load (in grams or g) showing the experimental deformation data of the strain gauge according to various embodiments.
- 3D three-dimensional
- FIG. 14 shows (a) schematics illustrating the operation principles of a three-dimensional (3D) printed piezoelectric sensor according to various embodiments; (b) images showing the piezoelectric sensor according to various embodiments being bent at bending angles 30°, 60°, 90° and 120°; (c) a plot of voltage (in volts or V) as a function of time (in seconds or s) showing the voltage waveforms generated by the piezoelectric sensor according to various embodiments at 30°, 60°, 90° and 120°; and (d) a plot of voltage (in volts or V) as a function of deformation (in nanometers or nm) showing the voltage generated by the piezoelectric sensor according to various embodiments in tension as a function of deformation.
- 3D three-dimensional
- FIG. 15 shows (a) a schematic showing a measurement system including three-dimensional (3D) electrocardiogram (ECG) electrodes formed according to various embodiments; (b) images showing the device components of the system including the electrodes formed according to various embodiments; (c) a plot showing five electrocardiogram (ECG) signals measured by the electrodes formed according to various embodiments based on random measurements of a subject at rest; and (d) a plot showing electrocardiogram (ECG) signals measured by the electrodes formed according to various embodiments based on measurements when the subject is swing an arm, clicking a computer mouse, and writing.
- 3D three-dimensional electrocardiogram
- Embodiments described in the context of one of the methods or additive manufacturing system are analogously valid for the other methods or additive manufacturing systems. Similarly, embodiments described in the context of a method are analogously valid for a system, and vice versa.
- Various embodiments may relate to a simple means of fabricating metal -plastic functional devices with complex shapes based on a multi-material digital light processing 3DP (MM-DFP3DP) process.
- This technique may allow the fabrication of microstructures containing active precursors and substrate materials having specific 3D spatial distributions that can selectively activate EFP.
- the active precursors may be prepared by adding a saturated aqueous solution of Pd 2+ ions to water-washable light-cured resins (either rigid or flexible). Subsequently, complex microstructures with specific topological distributions of material properties (comprising combinations of standard resin with the active precursor) may be fabricated using a MM-DFP3DP apparatus with multiple workstations.
- Pd 2+ ions may be homogeneously dispersed throughout the active precursor, and irradiation of the treated resin with patterned UV light caused a photo -initiator to generate free radicals. These radicals may initiate a double-bond cross-linking reaction between the monomer and the low- molecular- weight polymer that produced a rigid cured structure in which the Pd 2+ ions were embedded.
- the Pd 2+ ions exposed at the surface of the material may be reduced by NafhPC to Pd and may serve as catalytic nuclei after forming Pd particles, following which they induced the targeted metal deposition.
- This method may produce a conjunction layer where the deposited metal is microscopically embedded in the plastic layer. This technique may simplify the production process and may reduce costs while providing the capability to manufacture various complex 3D structures with special metal patterns.
- FIG. 1 shows a general illustration of an additive manufacturing system according to various embodiments for forming a composite structure.
- the system may include a first pool 102 including or configured to include an active solution or mixture to form a first printed portion of a workpiece, the active solution or a mixture including a solvent, an activation seed soluble in the solvent, and a light curable resin.
- the system may also include a second pool 104 including or configured to include a further light curable resin to form a second printed portion of the workpiece.
- the system may additionally include a light source 106 configured to provide light.
- the system may further include a mask 108 configured to be arranged such that the light provided by the light source 106 is irradiated onto the workpiece through the mask.
- the system may also include a third pool 110 including or configured to include a cleaning solution or mixture for cleaning the workpiece.
- the first printed portion including the activation seed may be configured to form a metallic layer via an electroless deposition process, thereby forming the composite structure.
- the additive manufacturing system may include a first pool 102, a second pool 104, and a third pool 110 for storing an active solution or mixture, a further light curable resin and a cleaning solution or mixture respectively.
- the additive manufacturing system may also include a light source 106 and a mask 108.
- FIG. 1 seeks to illustrate an additive manufacturing system having certain features according to various embodiments, and is not intended to limit the arrangement, size, shape, orientation etc. of the features.
- the activation seed may be a catalyst or a catalyst precursor.
- the catalyst precursor may include metallic ions such as palladium ion or silver ion.
- the catalyst may include metals such as palladium metal or silver metal.
- the light curable resin and the further light curable resin may be of a same material. In various other embodiments, the light curable resin and the further light curable resin may be of different materials.
- the light may be any light that is able to cure the light curable resin and the further light curable resin.
- the light source 106 may be chosen based on the ability of light emitted by the light source 106 to cure the resins.
- the light may be ultraviolet light or visible light.
- the light may be any other light that is able to cure the light curable resin and the further light curable resin.
- the mask 108 may be any suitable mask. The mask 108 may be configured to allow light to pass through to irradiate certain portions of the first printed portion and/or second printed portion, while blocking the light from irradiating other portions, thereby forming masking patterns.
- the mask 108 may be a liquid crystal display (LCD) mask.
- the additive manufacturing system may also include a controller in electrical connection with the first pool 102, the second pool 104, the third pool 110, the light source 106, and the mask 108.
- the controller may be configured to control the first pool 102 to deposit the active solution or mixture onto a predetermined position of a substrate or an underlying layer to form the first printed portion.
- the controller may be configured to control the mask 108 to generate a first masking pattern, or to position or arrange the mask 108 having the first masking pattern.
- the controller may be further configured to control the light source 106 to irradiate the light onto the first printed portion through the first masking pattern, thereby curing at least a slice of the first printed portion.
- the controller may be further configured to control the third pool 110 to dispense the cleaning solution or mixture for cleaning the first printed portion and to remove a remaining uncured slice of the first printed portion.
- the controller may also be configured to control the second pool 104 to deposit the further light curable resin onto another predetermined position of the substrate or the underlying layer to form the second printed portion.
- the controller may be also configured to control the mask 108 to generate a second masking pattern, or to position or arrange a further mask having the second masking pattern.
- the controller may also be configured to control the light source 106 to irradiate the light onto the second printed portion through the second masking pattern, thereby curing at least a slice of the second printed portion.
- the controller may be further configured to control the third pool 110 to dispense the cleaning solution or mixture for cleaning the second printed portion and to remove a remaining uncured slice of the second printed portion.
- the controller may be configured to control the first pool 102 to deposit the active solution or mixture onto a substrate or an underlying layer to form the first printed portion.
- the controller may be configured to control the mask 108 to generate a first masking pattern, or to position or arrange the mask having the first masking pattern.
- the controller may also be further configured to control the light source 106 to irradiate the light onto the first printed portion through the first masking pattern, thereby curing at least a slice of the first printed portion, the cured slice of the first printed portion forming a first layer.
- the controller may be further configured to control the third pool 110 to dispense the cleaning solution or mixture for cleaning the first printed portion and to remove a remaining uncured slice of the first printed portion.
- the controller may also be configured to control the second pool 104 to deposit the further light curable resin onto the cured slice of the first printed portion to form the second printed portion.
- the controller may also be configured to control the mask 108 to generate a second masking pattern, or to position or arrange a further mask having the second masking pattern.
- the controller may be further configured to control the light source 106 to irradiate the light onto the second printed portion through the second masking pattern, thereby curing at least a slice of the second printed portion, the cured slice of the second printed portion forming a second layer on the first layer.
- the controller may also be configured to control the third pool 110 to dispense the cleaning solution or mixture for cleaning the first printed portion and the second printed portion and to remove a remaining uncured slice of the second printed portion.
- the additive manufacturing system may also include one or more additional pools including the cleaning solution or mixture for cleaning the workpiece.
- the cleaning solution or mixture may be a liquid including water, an alcohol and/or an acid.
- the cleaning solution or mixture may, for instance, including ethanol, acetone and sulfuric acid.
- the cleaning solution or mixture may be configured to wash the substrate and/or the printed portion(s). Additionally, the cleaning solution or mixture may be further configured to remove uncured resin.
- the first pool 102, the second pool 104, the third pool 110, and the one or more additional pools may each be a container or tank.
- the additive manufacturing system may including a printer including the first pool 102, the second pool 104 and the third pool 110.
- the printer may also include the one or more additional pools including or configured to include the cleaning solution or mixture.
- the printer may also include the light source 106, the mask 108 and/or the controller.
- the printer may also be referred to as a multi-material digital light processing three- dimensional printing (MM-DLP3DP) apparatus.
- MM-DLP3DP multi-material digital light processing three- dimensional printing
- the additive manufacturing system may include a plating bath for forming the metallic layer via the electroless plating process.
- the plating bath may be a standalone component, or may be included in a fourth pool of the printer. In other words, the plating bath may be integrated together with the printer, or may be separate from the 3D printer.
- the metallic layer may include a metal or a metal alloy.
- the metallic layer may include nickel metal, copper metal, gold metal, cobalt metal, silver metal, platinum metal or an alloy including any combination thereof.
- the metallic layer may be formed on or over the first printed portion.
- a conjunction layer may be formed between the metallic layer and the first printed portion.
- the conjunction layer may be formed by the interaction or diffusion between the metal or metal alloy of the metallic layer, and the active solution or mixture included in the material(s) included in the first printed portion.
- the composite structure may be a strain gauge, a piezoelectric sensor, or an electrocardiogram (ECG) electrode.
- FIG. 2 shows a general illustration of a method of forming an additive manufacturing system for forming a composite structure.
- the method may include, in 202, providing a first pool including or configured to include an active solution or mixture to form a first printed portion of a workpiece, the active solution or mixture including a solvent, an activation seed soluble in the solvent, and a light curable resin.
- the method may also include, in 204, providing a second pool including or configured to include a further light curable resin to form a second printed portion of the workpiece.
- the method may further include, in 206, providing a light source configured to provide light.
- the method may additionally include, in 208, providing or arranging a mask such that the light provided by the light source is irradiated onto the workpiece through the mask.
- the method may also include, in 210, providing a third pool including or configured to include a cleaning solution or mixture for cleaning the workpiece.
- the first printed portion including the activation seed is configured to form a metallic layer via an electroless deposition process, thereby forming the composite structure.
- the method may include providing the first pool, the second pool, and the third pool as well as the mask and the light source.
- step 202 can occur before, during, or after step 204.
- the method may include providing or forming a controller in electrical connection with the first pool, the second pool, the third pool, the light source, and the mask.
- the method may include electrically connecting the controller with the first pool, the second pool, the third pool, the light source, and the mask.
- the method may also include providing one or more additional pools including the cleaning solution or mixture for cleaning the workpiece.
- the first pool, the second pool and the third pool may be part of a printer.
- the printer may also include the light source, the mask and/or the controller.
- the printer may also include the one or more additional pools including the cleaning solution or mixture.
- the method may additionally include providing a plating bath for forming the metallic layer via the electroless plating process.
- the plating bath may be a standalone component, or may be included in a fourth pool of the printer. In other words, the plating bath may be integrated together with the printer, or may be separate from the printer.
- FIG. 3 shows a general illustration of a method of forming a composite structure according to various embodiments. The method may include, in 302, depositing an active solution or mixture to form a first printed portion of a workpiece, the active solution including a solvent, an activation seed soluble in the solvent, and a light curable resin.
- the method may also include, in 304, depositing a further light curable resin to form a second printed portion of the workpiece.
- the method may additionally include, in 306, irradiating light provided by a light source onto the workpiece through a mask.
- the method may also include, in 308, dispensing a cleaning solution or mixture for cleaning the workpiece.
- the method may further include, in 310, forming a metallic layer on the first printed portion via an electroless plating process due to the activation seed included in the first printed portion, thereby forming the composite structure.
- step 302 can occur before, during, or after step 304.
- the activation seed may be a catalyst or a catalyst precursor.
- the light curable resin and the further light curable resin may be of a same material. In various other embodiments, the light curable resin and the further light curable resin may be of different materials.
- the light may be any light that is able to cure the light curable resin and the further light curable resin, e.g. ultraviolet light or visible light.
- the mask may be any suitable mask, such as a liquid crystal display (LCD) mask.
- LCD liquid crystal display
- the active solution or mixture may be deposited onto a predetermined position of a substrate or an underlying layer to form the first printed portion.
- the method may include generating a first masking pattern using the mask, or arranging or positioning the mask having the first masking pattern.
- the light may be irradiated onto the first printed portion through the first masking pattern, thereby curing at least a slice of the first printed portion.
- the cleaning solution or mixture may be dispensed for cleaning the first printed portion and to remove a remaining uncured slice of the first printed portion.
- the further light curable resin may be deposited onto another predetermined position of the substrate or the underlying layer to form the second printed portion.
- the method may include generating a second masking pattern using the mask, or arranging or positioning a further mask having the second masking pattern.
- the light may be irradiated onto the second printed portion through the second masking pattern, thereby curing at least a slice of the second printed portion.
- the cleaning solution or mixture may be dispensed for cleaning the second printed portion and to remove a remaining uncured slice of the second printed portion.
- the active solution or mixture may be deposited onto a substrate or an underlying layer to form the first printed portion.
- the method may include generating a first masking pattern using the mask, or arranging or positioning the mask having the first masking pattern.
- the light may be irradiated onto the first printed portion through the first masking pattern, thereby curing at least a slice of the first printed portion, the cured slice of the first printed portion forming a first layer.
- the cleaning solution or mixture may be dispensed for cleaning the first printed portion and to remove a remaining uncured slice of the first printed portion.
- the further light curable resin may be deposited onto the cured slice of the first printed portion to form the second printed portion.
- the method may also include generating a second masking pattern using the mask, or arranging or positioning a further mask having the second masking pattern.
- the light may be irradiated onto the second printed portion through the second masking pattern, thereby curing at least a slice of the second printed portion, the cured slice of the second printed portion forming a second layer on the first layer.
- the cleaning solution or mixture may be dispensed for cleaning the first printed portion and the second printed portion and to remove a remaining uncured slice of the second printed portion.
- the cleaning solution or mixture may include water, an alcohol and an acid.
- the electroless plating process may be carried out by immersing the workpiece in a plating bath.
- the metallic layer may include a metal or a metal alloy.
- the metallic layer may be formed on or over the first printed portion.
- a conjunction layer may be formed between the metallic layer and the first printed portion. The conjunction layer may be formed by the interaction or diffusion between the metal or metal alloy of the metallic layer, and the active solution or mixture included in the material(s) included in the first printed portion.
- the technique described herein may enable the indirect fabrication of metal-plastic composite structures via the selective three-dimensional (3D) deposition of active precursors that subsequently promote electroless plating (ELP) reactions.
- Precursors exhibiting high catalytic activity and positive stability were obtained by adding activation seeds to standard photocurable resins.
- Light-curable resins may usually be modified by incorporating nano-powders with specific desired properties as fillers, along with dispersants that ensure the uniform distribution of these fillers.
- dispersants that ensure the uniform distribution of these fillers.
- the stability of modified resins prepared in this manner is low because the filler tends to eventually settle, such that the material becomes inhomogeneous.
- the dispersants required for different fillers can be incompatible and may degrade the physical properties of the original substrate materials.
- various embodiments may make use of the ability of certain water-washable light-cured resins to form homogeneous mixtures with low concentrations ( ⁇ 10%) of aqueous solutions.
- the addition of an aqueous solution containing active seeds directly to the resin may provide a well-mixed and stable active precursor after sufficient agitation.
- Palladium (Pd 2+ ) ions may provide superior catalytic activity during ELP and may often be used as activation seeds.
- Various embodiments as described herein may be based on the solubility of metal ions, such as Pd 2+ ions, in aqueous solutions containing chloride (Cl ) ions by employing an activation solution containing PdC 12 powder and NH4CI.
- the activated precursors may be obtained by homogeneously mixing the activation solution with various resins. This method may both be simple and versatile, and may be applicable to most of the resins in which a polyurethane is the primary component.
- Crystalline NH4C1 was purchased from the FUJIFILM Wako Pure Chemical Corporation while PdCh nano-powder (purity: 99.0%) was obtained from the Kanto Chemical Company, Inc.
- White rigid (Washable, 405 nm, ASIN: JP206000BK510.)
- green transparent rigid (405 nm, ASIN: B07CQF6QNM.)
- acrylic (405 nm, model: PMMA-like
- ASIN: B07SKCNMZX. dark gray flexible (405nm, model: SK01F, ASIN: B08T929XVW.) and light gray flexible light-cured resins (405nm, model: SK02F, ASIN: B08T929RXB.) were purchased from the Nova Robot Technology Co., Ltd., Elegoo Co., Ltd., eSun Co., Ltd., Siraya Tech Co. Ltd. and Japan SK Honpo Co., Ltd., respectively. These resins are denoted by resins #1 through 5.
- Each active precursor was prepared at room temperature (20 °C) by dissolving 3.7 g of NELCl in 10 ml of deionized water, to which 50 mg PdCF was added and dissolved with agitation. This produced 10 ml of a saturated activation solution. This solution was allowed to stand for some time, after which a 5 ml portion of the upper, clear part of the solution was removed. Subsequently, a 45 ml quantity of one of the light-cured resins was transferred into a vessel with a magnetic stirrer turning at 1000 revolutions per minute (rpm), and 5 ml of the activation solution was added dropwise. Following this addition, the mixture was stirred at 1200 rpm for a further 30 min to obtain 50 ml of an active precursor solution.
- DLP3DP may allow surface molding with higher resolution, so that parts with smoother surfaces, higher molding accuracy and fill rates can be obtained.
- FIG. 4 is a schematic illustrating the multi-material digital light processing three- dimensional printing (MM-DLP3DP) process according to various embodiments.
- the 3DP of a standard resin (serving as the substrate) and of an active solution containing an active precursor may form a part having the desired 3D topology.
- the surface on which the active precursor is exposed may exhibit catalytic activity.
- the deposition of metal particles from solution may be promoted by catalytic ions (e.g. Pd 2+ ) ions in the active precursor, and selective deposition may occur to form the desired metal pattern.
- catalytic ions e.g. Pd 2+
- FIG. 5 shows (a) a multi-material digital light processing three-dimensional printing (MM-DLP3DP) apparatus according to various embodiments, and (b) numerical processing of multi-material models in which the slicing data are obtained by treating different material topologies in the same part as units with separate slicing according to various embodiments.
- MM-DLP3DP multi-material digital light processing three-dimensional printing
- FIG. 5(a) To enable the manufacturing of multi-material 3D printed parts containing both standard resin and the active precursor, an MM-DLP3DP device incorporating three stations or pools may be developed as shown in FIG. 5(a).
- the apparatus may include a printer platform.
- the printing platform may be able to select from three pools (referred to as material pool A, material pool B and the cleaning pool), and the printing platform can move in both the x and y directions to switch between the different pools to form the work piece.
- material pool A, material pool B and the cleaning pool By dipping into the different pools, the initial layers of the work piece may be formed adhered to or suspended from the printing platform.
- the material pools A, B and cleaning pool hold the standard light- cured resin, the active precursor, and cleaning solution or mixture, respectively.
- the partially formed work piece may be held or suspended by the printing platform using adhesion, and by continuously switching and dipping into the various pool, the remaining layers of the work piece may be formed.
- FIG. 5(a) The right-hand diagram in FIG. 5(a) summarizes the structural features of the printer.
- a 2K black-and-white liquid crystal display (LCD) mask may be used to provide transmissive graphics masking.
- Ultraviolet (UV) light at 405 nm was passed through a mask to form light fields related to specific slice patterns, thus enabling layered curing and molding of parts.
- the LCD mask may be capable of moving in the x and y directions together with along the z-axis of the printer.
- the entire 3D printed workpiece may be moved as one piece, thus enabling material switching and ensuring that different material topologies in the same part had precise interpositional relationships.
- Acquiring digital model data for the multi-material part may be an critical initial step, even though there are currently no mature multi-material slicing software programs that enable the labeling of material properties in conjunction with specific and complex topologies.
- this issue may be addressed by using a modeling- assembly-disassembly-slicing method to assist in the numerical processing of multi-material models (FIG. 5(b)).
- topologies having the same physical properties may be created as a single unit and then converted to the standard template library (STL) format.
- the slicing software assembled units with different properties according to the desired topological relationships, following which these parts may be sliced separately to obtain the respective slice data.
- the slice data for the different materials may incorporate the required topological relationships.
- Various embodiments may use specially developed control software for slice data processing, the setting of printing parameters and the control of the MM-DLP3DP system.
- the manufacturing of multi-material parts with 3D active precursors may be made possible by performing a series of cycles in which material A was applied, followed by cleaning, followed by the application of material B.
- FIG. 6 is a schematic showing an arbitrary complex multi-material model and the printing process of printing the model according to various embodiments.
- each multi-material part having an arbitrarily complex structure may be analyzed in terms of the different material topologies. This analysis may involve both the interlayer multi-material stacking topology and multi-material nested topology. In the case of the former, the various materials may be nestled between layers, thus eliminating the need for the printer to perform a cleaning and material switching process at each slice. However, when processing the latter topology, the printer had to cycle through printing of material A, printing of material B and a cleaning process for each slice.
- multi-material model of an arbitrary complex structure may be divided into interlayer multi material stacking and multi-material nested topologies according to the desired distributions of the material topologies.
- the printed part may be firmly adhered to the printing platform and so, because the platform was made of metal, a small amount of metal residue may remain on the base of the part after it was removed. This residue may promote the precipitation of nickel (Ni) and so degrade the accuracy of subsequent selective ELP and interrupt the metal distribution pattern.
- uncured resin remaining on the surface of the part could obscure Pd 2+ ions inside the resin and so affect the catalytic activity of the active precursor during plating. For these reasons, it was vital to clean parts after the 3DP.
- the cleaning solution may be composed of 40 % ethanol (analysis pure), 50 % acetone (analysis pure) and 10 % dilute sulfuric acid (40 wt %) in volume. The alcohol and acetone in this mixture may dissolve any uncured resin on the part surface (both the standard resin substrate and the active precursor) while the sulfuric acid may remove residual metal powder adhering to the bottom of the part.
- Ni plating bath employed in this process may have the primary components summarized in Table 1.
- the plating bath may have a pH of 9 and may be held at 70 °C.
- the active precursor in which Pd 2+ ions were homogeneously dispersed
- the exposed Pd 2+ ions on the surface may initially be reduced to Pd monomers that served as catalytically active metal nuclei to initiate the ELP reaction in specific microscopic regions, and so achieve targeted Ni metal deposition.
- the reactions shown in equations (l)-(4) may include the mechanism by which the reactive precursor catalyze the directed deposition of Ni metal.
- hypophosphite may be oxidized in solution to generate adsorbed hydrogen atoms on the surface of the substrate.
- these hydrogen atoms may reduce Ni ions in the solution.
- the reduced Ni may naturally be deposited on the same surface after 5-10 min to form a coating.
- Pd 2+ ions are embedded on the surface of the active precursor portions of the part, there may be no overflow or deviated deposition of the plating layer due to migration of the catalyst during the ELP process.
- FIG. 7 shows (a) a plot of absorption as a function of wavelength (in nanometres or nm) showing the ultraviolet spectra of a rigid light-cured resin before and after modification with palladium (Pd 2+ ) ions according to various embodiments; and (b) a plot of absorption as a function of wavelength (in nanometres or nm) showing the ultraviolet spectra of a flexible light-cured resin before and after modification with palladium (Pd 2+ ) ions according to various embodiments.
- FIG. 7(a) shows the UV absorption spectra obtained from the #1 resin before and after modification. Both spectra are basically about equivalent with peak absorbance at approximately 405 nm. These results may demonstrate that the addition of the Pd 2+ solution does not change the basic properties of the resin, especially the molding properties, and does not decrease the light sensitivity of the original resin. Similar results were obtained from the analysis of the #4 resin before and after it was modified, as shown in FIG. 7(b).
- Circuit boards are traditionally made from flat modules or a combination of multiple flat modules such that the processing surfaces are 2D planes or combinations of such planes. These structures are relatively simple and so the manufacturing process is not complex but has limited applications. The demands for more structurally complex parts with regular cylindrical or freeform processing surfaces requires improved manufacturing capabilities. To illustrate the fabrication capabilities of our new approach, metal-plastic composite parts having representative structures were fabricated and then processed via ELP. Compared with multi material 3DP using multiple nozzles, the technique demonstrated herein may provide higher resolution, and may thus allow the construction of micro- structured surfaces with special functions. This may be important because metallized micro-structured surfaces have numerous potential applications.
- FIG. 8 shows (a) three micro- structured metallized surfaces each with a thickness of 200 pm: circular with a radius of 200 pm, ortho -hexagonal with an inner circle radius of 200 pm, and circular groove with a groove width of 400 pm using the process according to various embodiments; (b) a skeletonized ball structure with a circular base that has been covered with Ni metal using the process according to various embodiments; (c) an Eiffel Tower with a microfine structure in which selected parts have been uniformly covered with nickel (Ni) plating using the process according to various embodiments; (d) a five-sided structure with a complex nickel (Ni) metal distribution and multi-material nesting between layers and within layers using the process according to various embodiments; (e) a dome structure with an arc- shaped metal distribution using the process according to various embodiments; (f) a U-shaped tube with an internal metal mesh having a thickness of 1 mm and square hexagons each with a 500 pm inner diameter using the process according to various embodiments, demonstrating
- FIG. 8(a) shows three different surface structures constructed on circular substrates. These include a circular microstructure with a radius of 200 pm, an ortho-hexagonal microstructure with an inner circle radius of 200 pm and a circumferential groove microstructure with a groove width of 400 pm. After printing and cleaning, these microstructures could be clearly seen under a high magnification microscope. After plating, metallic Ni uniformly covered the microstructure surface and a 3D profile consistent with the active precursor was obtained.
- FIG. 8(b) shows metal skeleton ball structure with a circular base has also been fabricated using this process.
- This microfine structure may be interconnected in an irregular manner and, after plating, the skeleton may be covered with Ni metal.
- the structure was evenly plated inside and outside and had a metallic luster with no under-plating or missing plating.
- FIG. 8(c) shows a 3D printed Eiffel Tower model with the tip and middle part made of the active precursor material, and the rest made of standard resin. After plating, Ni metal was precisely deposited on both the tip and central surface of the tower.
- the original hollow microstructure remained intact and that the interior and exterior of the hollow structure in the middle of the tower were covered with Ni metal having a metallic luster.
- the manufacturing of these multi-material nested parts may demonstrate the capabilities of the MM-DLP3DP as described herein.
- FIG. 8(d) shows a multi-material five-sided part with a specific metal topology distributed on four faces. This structure is highly complex, with the metal portions and the resin substrate nested within one another such that there are both interlayer and intralayer nesting. Despite this complexity, clear boundaries are evident between these portions of the part, confirming that precise selective metallization was achieved. There was a uniform plating distribution and no spillage or contamination of the Ni plating.
- FIG. 8(e) shows a dome structure with six curved metal bands evenly distributed around its surface
- FIG. 8(f) shows a U-tube part having an internal hexagonal mesh made of Ni.
- the U-tube part with internal mesh structure shown in FIG. 8(f) is particularly difficult to fabricate by most other manufacturing technologies.
- This highly complex part could not be fabricated by conventional methods using laser etching or 3DP, but was obtainable based on slicing and material switching that permitted deposition of the active precursor inside the U-tube.
- the plating solution was able to flow into the tubular part to form the mesh in the cavity via the deposition of Ni.
- the right-hand side of this figure indicates the intricate structure of the metal mesh after removal from the part.
- the mesh had a thickness of 1 mm and contained hexagonal holes each with an inner diameter of 500 pm.
- FIG. 8(g) shows a double-layer 3D hollow part in which the large ball (radius 15 mm) with triangular hollow holes wrapped around the small ball (radius 8 mm) with regular hexagon hollow holes.
- the plating solution enters through the holes of the outer large ball, so that the selective Ni deposition of the inner small ball can be successfully achieved.
- the enlarged image shows the metallic luster of the inner ball and illustrates a good Ni coating.
- FIG. 8(h) demonstrates a flexible carbon nanotube structure, the central part of which was selectively applied using ELP.
- the high-resolution image shows the junction between the metal and resin in this item.
- the metal plating was evidently uniformly distributed and the boundaries between the different materials are well defined, indicating the effective formation of a flexible metal-plastic composite structure using this method. After being stressed, the Ni metal plating remained intact and did not break.
- FIG. 8(i) shows a flexible wearable hoop-shaped structure.
- FIG. 9 shows (a) an light emitting diode (LED) stereo circuit with complex nickel (Ni) metal wire topology using the process according to various embodiments; (b) a double layer three-dimensional (3D) circuit structure with a complex three-dimensional (3D) copper wire structure using the process according to various embodiments, and which is difficult to fabricate by traditional processes; and (c) a plot of impedance (in ohms or W) as a function of frequency as a function of frequency (in hertz or Hz) showing the impedance of nickel (Ni) and copper (Cu) coatings formed using the process according to various embodiments.
- LED light emitting diode
- FIG. 9(a) shows diagrams and a photographic image of a light-emitting diode (LED) circuit with an irregular 3D structure.
- the circuit board model in the figure shows that the substrate had an irregular surface profile while the wires had a complex 3D alignment. After printing, soldering, and powering up at 3.3 V, the LED was found to function with a normal level of brightness. This result confirmed that the metal wire structure distributed on the substrate was suitably conductive.
- FIG. 9(b) shows a double-layer 3D circuit with a through- hole structure in which the width of the conductor was 800 pm. The diameter of the through hole was 500 pm and the inner wall was covered with copper (Cu) metal that connected the inner and outer layers of the circuit.
- Cu copper
- FIG. 9(c) shows a plot summarizing the impedance characteristics of Cu and Ni plating obtained using the process as described herein and may confirm that the resulting 3D metal wires exhibited electrical conductivity that meets the requirements for use in electronic devices.
- FIG. 10 shows (a) nickel (Ni)-plated structures with widths of 1 mm, 500 pm and 100 pm and with widths of 50 and 40 pm formed by the process according to various embodiments; and (b) a circuit board part having a width of 1 mm incorporating 500 pm copper wires formed by the process according to various embodiments.
- FIG 10(a) shows images of Ni wires having widths of 1 mm, 500 pm, 100 pm, 50 pm, and 40 pm. High-magnification microscopy showed that the Ni was precisely distributed on these active precursor wires, thus showing exceptional resolution of the printing method and the effectiveness of selective metal deposition.
- the Cu plating on the circuit board shown in FIG. 10(b) shows that various embodiments may provide a manufacturing resolution of at least 40 pm, which is sufficient to meet the processing requirements of most electronic products.
- FIG. 11 shows (a) a standard flat nickel (Ni) plating according to various embodiments; (b) and (c) scanning electron microscopy (SEM) images of the indicated area in (a) with different magnifications according to various embodiments; (d) a nickel (Ni) plating on the surface of a circular microstructure according to various embodiments; (e) and (f) scanning electron microscopy (SEM) images of the indicated area in (d) with different magnifications according to various embodiments; (g) a nickel (Ni) plating on the surface of an annular groove micro structure according to various embodiments; (h) and (i) scanning electron microscopy (SEM) images of the indicated area in (g) with different magnifications according to various embodiments; (j) a nickel (Ni) plating on the surface of an ortho- hexagonal microstructure according to various embodiments; (k) - (1) scanning electron microscopy (SEM) images of the indicated area in (j) with different magnifications according to
- FIGS. 11(a) - (c) present microscopic characterization results for a planar sample after a 5 min plating process.
- the sample was uniformly covered with Ni and a metallic luster can be observed in the low-magnification light microscope image (right side of the FIG. 11 (a)).
- SEM images acquired with a 100 pm scale bar show the surface profile of the Ni layer, which is flat in most places, in agreement with the planar profile of the active precursor. Some minor protrusions are evident due to the accumulation of Ni metal caused by high local Pd 2+ concentrations. Higher magnification shows that the Ni metal particles were closely packed together with a more even distribution of crystals and less discontinuity.
- FIGS. 11(d) - (f) present images of the specimen obtained after a 6 min plating of a circular surface having a radius of 200 pm and a depth of 200 pm.
- FIGS. 11(g) - (i) show the plating on the surface of an annular groove with a width of 200 pm and a depth of 200 pm
- FIGS. 1 l(j) - (1) show images of a plated hexagonal microstmcture having an inner radius of 200 pm and a depth of 200 pm. All three-parts exhibit complete and uniform plating with a metallic luster.
- the SEM images with a 100 pm scale bar demonstrate that the Ni metal particles all grew along the surface profile in a uniform manner. The plating did not make the original surface structure unclear due to uneven thickness, again demonstrating the uniformity of the plating.
- SEM images with the 500 nm scale bar clearly demonstrate the morphology and distribution of the Ni metal particles.
- FIGS. 1 l(m)-(o) show the results for 3 min Ni plating of a flexible active precursor specimen.
- the resulting metalized microstmcture not only increased the functionality of the part but also strengthened the bond between the plating and the substrate.
- Various embodiments may involve incorporating catalytic seeds into standard resins, which allow metal layers with higher confinement and bonding strength to be obtained.
- Ni-plated samples were processed using a focused ion beam to obtain cross sections allowing better examination of the microstmctures at the metal-resin junctions. Analyses by transmission electron microscopy (TEM) and energy-dispersive X-ray spectroscopy (EDS) were subsequently performed.
- TEM transmission electron microscopy
- EDS energy-dispersive X-ray spectroscopy
- TEM transmission electron microscopy
- EDS energy-dispersive X-ray spectroscopy
- FIG. 12(a) presents a TEM image acquired at the boundary between the resin and the Ni metal layer.
- the cross section shows the Ni metal, conjunction, and resin layers after plating.
- FIG. 12(b) indicates the distribution of carbon along the cross section containing the resin boundary. Carbon was more abundant in the resin layer and significantly less abundant in the intermediate layer, such that the partition between these two phases is highly consistent with the image shown in FIG. 12(a). This result supports the existence of a conjunction layer.
- the sodium hypophosphite in the plating solution reduced Pd 2+ ions to Pd particles that were attached to the surface.
- the Pd in the interlayer catalyzed the deposition of Ni such that the Ni metal migrated into the resin to generate an interlayer of Ni embedded in the material. This effect improved the adhesion of the Ni plating.
- 3D printed metal-plastic composite parts for electronic devices [0096] Various embodiments may relate to combining non-metallic materials having different functions with specific metal patterns to generate metal -plastic composite parts. [0097] 3D printed strain gauge
- a metal-based resistance strain gauge works on the principle of the resistance strain effect. Specifically, when a Cu wire is subjected to stress, its resistance will change in proportion to the degree of stretching or compression.
- a resistive measurement grid is usually laminated between a carrier and cover film, and this foil strain gauge is bonded using an adhesive to the component being assessed. Strain in the component is transferred to the measurement grid via two intermediate layers.
- the measurement grid should be placed as close as possible to the component surface in order to avoid force transmission losses. In such devices, variations in bonding thickness will be reflected in the degree of force transmission, meaning that the response of the strain gauge may change.
- Various embodiments may relate to printing s strain gauge on an object to be measured.
- Various embodiments may allow strain gauges to be printed inside complex parts. This may not only ensure consistent mechanical deformation between the strain gauge and the measured object, but may also enable the design and manufacture of specific strain gauges that match the actual 3D shape of the object.
- FIG. 13 shows (a) a schematic of a three-dimensional (3D) printed integrated strain gauge according to various embodiments on the measured object; (b) images of the strain gauge according to various embodiments and a schematic on the measurement of the strain gauge according to various embodiments; (c) an image showing the bending deformation of the gauge under stress according to various embodiments; (d) a plot of voltage (in volts or V) as a function of load (in grams or g) showing the voltage measurement characteristics of the strain gauge according to various embodiments; (e) a plot of strain as a function of load (in grams or g) showing the strain characteristics of the strain gauge according to various embodiments calculated from experiment data; and (f) a plot of deformation (in millimetres or mm) as a function of load (in grams or g) showing the experimental deformation data of the strain gauge according to various embodiments.
- 3D three-dimensional
- FIG. 13(a) shows a strain gauge according to various embodiments that is integrated with the measured object.
- the overall part is a cuboid with openings, and the strain gauge is in the interior of the base. Electrical signals generated when the internal strain gauge is deformed are extracted via a hole in the device.
- FIG. 13(b) presents images indicating the structure of the internal strain gauge. Using a 3D printing and copper (Cu) plating process, metal electrodes having a pitch and width of 500 pm may be formed. When the strain gauge was bent and deformed as the object being tested was subjected to force, the overall length of the through- electrode changed and so its resistance was varied. By measuring the change in voltage, the strain and thus the amount of deformation could be calculated.
- Cu copper
- FIG. 13(c) provides a photographic image of the strain gauge after it has been deformed. As an acrylic-type UV resin was used, the strain gauge was highly flexible and so did not break when bent.
- FIG. 13(d) plots the voltage generated by the strain gauge as a function of the load, as obtained using a star shaped circuit.
- FIGS. 13(e) - (f) summarize the calculated strain and deformation values, respectively. When the load is 10 g, the strain value of the sensor obtained through the experiment is 0.003. This data is basically consistent with the result of the simulation calculation (the upper left corner of FIG. 13(e)), which verifies the effectiveness of the sensor. This device may therefore be used to perform strain measurements when correcting for variations in temperature and material properties.
- PVDF-TrFE polymer polyvinylidene fluoride- trifluoroethylene
- FIG. 14 shows (a) schematics illustrating the operation principles of a three-dimensional (3D) printed piezoelectric sensor according to various embodiments; (b) images showing the piezoelectric sensor according to various embodiments being bent at bending angles 30°, 60°, 90° and 120°; (c) a plot of voltage (in volts or V) as a function of time (in seconds or s) showing the voltage waveforms generated by the piezoelectric sensor according to various embodiments at 30°, 60°, 90° and 120°; and (d) a plot of voltage (in volts or V) as a function of deformation (in nanometers or nm) showing the voltage generated by the piezoelectric sensor according to various embodiments in tension as a function of deformation.
- 3D three-dimensional
- the 3D printed piezoelectric sensor includes a thin film substrate made of a piezoelectric material and comb electrodes.
- an electric charge source that is, an electrostatic generator.
- the piezoelectric effect allows the device to sense deformation and thus can be used to measure deformation, strain, angular changes, and other variables.
- FIG. 14(b) provides photographic images showing the device being bent at various angles, while the resulting voltage values are presented in the oscilloscope trace in FIG. 14(c).
- FIG. 14(d) shows a plot indicating the piezoelectric effect for the sensor in the stretched state.
- piezoelectric sensors made by 3DP may require a less complex manufacturing process that can be integrated with that for the object being examined to permit a wider range of applications.
- An electrocardiogram may provide information regarding the electrical activity of the heart and is widely used for the diagnosis and analysis of many diseases.
- ECG electrocardiogram
- a complete ECG measurement system is primarily made of electrodes, digital processing circuits and data analysis terminals.
- the electrodes may be the key components that affect the quality of the electrical signals received from the heart.
- Various embodiments may relate to forming a wearable flexible 3D printed ECG electrode.
- FIG. 15 shows (a) a schematic showing a measurement system including three- dimensional (3D) electrocardiogram (ECG) electrodes formed according to various embodiments; (b) images showing the device components of the system including the electrodes formed according to various embodiments; (c) a plot showing five electrocardiogram (ECG) signals measured by the electrodes formed according to various embodiments based on random measurements of a subject at rest; and (d) a plot showing electrocardiogram (ECG) signals measured by the electrodes formed according to various embodiments based on measurements when the subject is swing an arm, clicking a computer mouse, and writing.
- 3D three- dimensional electrocardiogram
- the measurement system shown in FIG. 15(a) may use a dual-lead measurement method in which the host ECG electrode and vice ECG electrode may be worn on the right and left wrists of the subject, respectively.
- the electrodes may acquire the ECG signal and send the acquired signal to a computer via a Bluetooth module attached to the host ECG, and the computer may in turn process and display the signal.
- FIG. 15(b) shows images of the 3D printed strap-like wearable device having a specially patterned metal electrode, a circuit for connecting with a portable battery, and the Bluetooth module. This configuration eliminated measurement errors and inconvenience caused by wires and made it easier to measure ECG signals while the subject was in motion.
- FIG. 15(b) shows images of the 3D printed strap-like wearable device having a specially patterned metal electrode, a circuit for connecting with a portable battery, and the Bluetooth module. This configuration eliminated measurement errors and inconvenience caused by wires and made it easier to measure ECG signals while the subject was in motion.
- FIG. 15(c) shows plots of five different ECG signals obtained with the proposed ECG electrode with the subject in the resting state. The five plots essentially overlap and that the waveforms reflected the expected ECG waveforms of a normal human heart.
- FIG. 15(d) shows the measurement signals obtained with the ECG electrode during writing, swinging of one arm and clicking of a computer mouse. Compared with a conventional ECG, the electrode may offer an easier measurement process together with efficient output of the resulting data.
- Various embodiments may relate to an approach to construct precise metal patterns on the surfaces or interiors of 3D plastic parts with arbitrary complex shapes, along with potential applications. By modifying standard resins, active precursors that were able to promote the ELP process may be prepared. Various embodiments may relate to an MM- DLP3DP apparatus to permit the fabrication of micro-nano 3D metal-plastic component structures. The method according to various embodiments had been employed to fabricate various parts as a demonstration of manufacturing capability. These parts were primarily multi material and involved nesting layers, including microporous and small hollow structures with the smallest size being 40 pm. A 3D circuit with a double-sided structure connected by a through hole was manufactured to illustrate the manufacturing capabilities of the proposed technology.
- a series of sensors operating on different principles were fabricated to illustrate the superiority of this technique.
- various embodiments may allow integrated manufacturing of the sensor and the object, thus avoiding measurement errors and complex processes caused by assembly.
- light-cured resins such as acrylonitrile -butadiene-styrene, acrylic and silicon materials
- metals including Ni, Co, Cu, Au, Ag and Pt
- This process may enable the 3D nesting of a variety of composites and thus has promising applications, especially in micro electromechanical systems (MEMS), sensors and robotics, wearable devices, and 3D precision electronics.
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| Application Number | Priority Date | Filing Date | Title |
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| SG10202103820Q | 2021-04-14 | ||
| PCT/SG2022/050216 WO2022220751A1 (en) | 2021-04-14 | 2022-04-13 | Additive manufacturing system, methods of forming the same and of forming a composite structure |
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| CN117619392A (en) * | 2023-11-27 | 2024-03-01 | 广东省科学院新材料研究所 | A catalyst with multi-stage component structure and its preparation method |
| EP4610027A1 (en) * | 2024-02-27 | 2025-09-03 | Université de Liège | Method for controlling a 3d printing system and 3d printing system |
| CN120003028B (en) * | 2025-02-26 | 2025-10-03 | 吉林大学 | High-efficiency 3D printing method and device based on surface tension thin-wall structure |
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| JP2004022623A (en) * | 2002-06-13 | 2004-01-22 | Shinko Electric Ind Co Ltd | Manufacturing method of wiring board |
| JP2011195896A (en) * | 2010-03-19 | 2011-10-06 | Seiko Epson Corp | Method of forming metal film, method of manufacturing transmittance control plate, and method of manufacturing wiring substrate |
| WO2012058278A2 (en) * | 2010-10-27 | 2012-05-03 | Eugene Giller | Process and apparatus for fabrication of three-dimensional objects |
| ES2934103T3 (en) * | 2011-01-31 | 2023-02-16 | Global Filtration Systems Dba Gulf Filtration Systems Inc | Apparatus for manufacturing three-dimensional objects from multiple solidifiable materials |
| JP6335782B2 (en) * | 2011-07-13 | 2018-05-30 | ヌボトロニクス、インク. | Method for fabricating electronic and mechanical structures |
| US20160145755A1 (en) * | 2013-07-09 | 2016-05-26 | United Technologies Corporation | Lightweight metal parts produced by plating polymers |
| US10197708B2 (en) * | 2013-12-19 | 2019-02-05 | Hrl Laboratories, Llc | Structures having selectively metallized regions and methods of manufacturing the same |
| US11498267B2 (en) * | 2018-12-21 | 2022-11-15 | General Electric Company | Multi-material additive manufacturing apparatus and method |
| DE102019106134A1 (en) * | 2019-03-11 | 2020-09-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Concept for the production of a three-dimensional circuit carrier |
| CN111531876B (en) * | 2020-02-29 | 2022-02-18 | 湖南大学 | A multi-axis photocuring 3D printing device and method for realizing mixed materials |
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| EP4323172A4 (en) | 2025-03-05 |
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