EP4318580A1 - Semiconductor package using substrate block integration - Google Patents
Semiconductor package using substrate block integration Download PDFInfo
- Publication number
- EP4318580A1 EP4318580A1 EP23185716.0A EP23185716A EP4318580A1 EP 4318580 A1 EP4318580 A1 EP 4318580A1 EP 23185716 A EP23185716 A EP 23185716A EP 4318580 A1 EP4318580 A1 EP 4318580A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- substrate
- semiconductor package
- partitioned
- die
- integrated circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 180
- 239000004065 semiconductor Substances 0.000 title claims abstract description 46
- 230000010354 integration Effects 0.000 title description 3
- 229910000679 solder Inorganic materials 0.000 claims abstract description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 10
- 229910052802 copper Inorganic materials 0.000 claims description 10
- 239000010949 copper Substances 0.000 claims description 10
- 239000000853 adhesive Substances 0.000 claims description 8
- 230000001070 adhesive effect Effects 0.000 claims description 8
- 239000003990 capacitor Substances 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 6
- 239000000919 ceramic Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 238000004806 packaging method and process Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000006855 networking Effects 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5385—Assembly of a plurality of insulating substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49833—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers the chip support structure consisting of a plurality of insulating substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49811—Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
- H01L23/49816—Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49822—Multilayer substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/50—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor for integrated circuit devices, e.g. power bus, number of leads
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5383—Multilayer substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L24/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L24/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/16—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B80/00—Assemblies of multiple devices comprising at least one memory device covered by this subclass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/13099—Material
- H01L2224/131—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/13138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/13147—Copper [Cu] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/73—Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/065—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L25/0655—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00 the devices being arranged next to each other
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/18—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different subgroups of the same main group of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N
Definitions
- the present disclosure relates generally to the field of semiconductor packaging. More particularly, the present disclosure relates to a cost-effective, large-die semiconductor package using substrate block integration (SBI).
- SBI substrate block integration
- Advanced packaging is playing a bigger role across the semiconductor industry.
- Networking equipment, servers, and smartphones are among the applications that have adopted advanced packaging.
- IC vendors develop an ASIC. Then, vendors will shrink different functions at each node and pack them onto the ASIC. But this approach is becoming more complex and expensive at each node.
- an ASIC for switch routers or data centers may include a large die and the size of the package may typically exceed 4500 mm 2 , which leads to a rising cost of the ASIC package because of the low production yield of the package substrate at this size.
- the ASIC package with large die also encounters warpage problems.
- a semiconductor package according to the invention is defined in independent claim 1.
- the dependent claims define preferred embodiments thereof.
- One aspect of the invention provides a semiconductor package including a partitioned package substrate composed of substrate parts arranged in a side-by-side manner; an integrated circuit die mounted on a first surface of the partitioned package substrate; and solder balls mounted on a second surface of the partitioned package substrate opposite to the first surface.
- the at least one integrated circuit die is electrically connected to the partitioned package substrate through a conductive elements.
- the conductive elements comprise micro-bumps, copper bumps or copper pillars.
- the substrate parts are physically separated from one another.
- the substrate parts are rearranged and adjoined together with a gap therebetween.
- the substrate parts are adjoined together by using an adhesive that fills into the gap.
- the gap has a width ranging between 1-3 mm.
- the substrate parts are homogeneous substrates.
- the substrate parts are heterogeneous substrates.
- the substrate parts have the same thickness.
- the substrate parts have different thicknesses.
- the semiconductor package further includes at least one die mounted on the first surface of the partitioned package substrate in a flip-chip manner.
- the at least one die is a dummy die.
- the at least one die is a memory die.
- the semiconductor package further includes a second integrated circuit die; and an electronic device mounted on the first surface of the partitioned package substrate.
- the electronic device comprises a decoupling capacitor.
- the second integrated circuit die and the electronic device do not overlap with the gap.
- the semiconductor package further includes an annular frame mounted on the first surface of the partitioned package substrate.
- the frame is a metal frame.
- the frame is attached to the first surface of the partitioned package substrate by using joint bumps.
- the frame is attached to the first surface of the partitioned package substrate by using adhesive.
- the frame comprise an opening for accommodating the at least one integrated circuit die.
- the semiconductor package further includes a lid installed on the first surface of the partitioned package substrate, wherein the at least one integrated circuit die is housed by the lid and encapsulated by a mold cap.
- the semiconductor package further includes a re-distribution layer (RDL) structure on the first surface of the partitioned package substrate, wherein the at least one integrated circuit die is mounted on the RDL structure.
- RDL re-distribution layer
- FIG. 1A is a schematic diagram showing an exemplary semiconductor package in accordance with an embodiment of the invention.
- FIG. 1B is a cross-sectional view taken along line I-I' in FIG. 1A .
- the semiconductor package 1 comprises a partitioned package substrate 10 and at least one integrated circuit die 20 mounted on a first surface S1 of the partitioned package substrate 10.
- the first surface S1 of the partitioned package substrate 10 is a flat surface.
- the at least one integrated circuit die 20 may be mounted on the first surface S1 of the partitioned package substrate 10 in a flip-chip manner.
- the at least one integrated circuit die 20 is electrically connected to the partitioned package substrate 10 through a plurality of conductive elements 201 such as micro-bumps, copper bumps or copper pillars, but is not limited thereto.
- An underfill 210 may be filled into a space between the at least one integrated circuit die 20 and the first surface S1 of the partitioned package substrate 10.
- the partitioned package substrate 10 may have a dimension of, for example, between 60 mm x 60mm and 70 mm x 70 mm.
- the partitioned package substrate 10 is composed of at least two smaller substrates (hereinafter referred to as substrate parts) arranged in a side-by-side manner.
- substrate parts For example, four coplanar substrate parts 10a-10d are demonstrated in FIG. 1A . It is to be understood that the number and shape of the substrates 10a-10d are for illustration purposes only.
- the four substrate parts 10a-10d are physically separated from one another.
- each of the four substrate parts 10a-10d may have a dimension of, for example, between 30 mm x 30mm and 40 mm x 40 mm.
- the four substrate parts 10a-10d are rearranged and adjoined together with a gap G therebetween.
- the four substrate parts 10a-10d may be adjoined or glued together side-by-side by using an adhesive or a molding compound that fills into the gap G.
- the width of the gap G may range between 1-3 mm.
- the four substrate parts 10a-10d may be homogeneous substrates.
- the four substrate parts 10a-10d may be composed of substantially the same substrate materials such as BT substrates or ABF substrates.
- the four substrate parts 10a-10d may be heterogeneous substrates.
- the four substrate parts 10a-10d may be composed of different substrate materials such as glass substrates, ceramic substrates, BT substrates, ABF substrates, etc.
- the four substrate parts 10a-10d may have substantially the same thickness.
- the four substrate parts 10a-10d may have different thicknesses.
- each of the four substrate parts 10a-10d may comprise an interconnect structure 101 for electrically connecting the integrated circuit die 20 to the respective solder balls SB mounted on a second surface S2 of the partitioned package substrate 10.
- the interconnect structures 101 of the four substrate parts 10a-10d may be the same as or similar to one another.
- the interconnect structures 101 of the four substrate parts 10a-10d may be different from one another.
- the semiconductor package 1 may further comprise at least one die 30 mounted on the first surface S1 of the partitioned package substrate 10 in a flip-chip manner.
- the die 30 may overlap with at least two of the four substrate parts 10a-10d.
- a die 30a is disposed between the substrate parts 10a and 10b, and a die 30b is disposed between the substrate parts 10c and 10d.
- the die 30 may be a dummy die that contains no active integrated circuit elements. The dummy die is used to bridge or interconnect the two adjacent substrate parts.
- the die 30 may comprise a memory die such as a high bandwidth memory (HBM) die.
- HBM high bandwidth memory
- the semiconductor package 1 may further comprise an integrated circuit die 40 and an electronic device 50 such as decoupling capacitors mounted on the first surface S1 of the partitioned package substrate 10.
- the integrated circuit die 40 and the electronic device 50 may not overlap with the gap G.
- FIG. 2A is a schematic diagram showing an exemplary semiconductor package in accordance with another embodiment of the invention, wherein like regions, layers or elements are designated by like numeral numbers or labels.
- FIG. 2B is a cross-sectional view taken along line II-II' in FIG. 2A .
- the semiconductor package 2 comprises a partitioned package substrate 10 and at least one integrated circuit die 20 mounted on a first surface S1 of the partitioned package substrate 10.
- the first surface S1 of the partitioned package substrate 10 is a flat surface.
- the at least one integrated circuit die 20 may be mounted on the first surface S1 of the partitioned package substrate 10 in a flip-chip manner.
- the at least one integrated circuit die 20 is electrically connected to the partitioned package substrate 10 through a plurality of conductive elements 201 such as micro-bumps, copper bumps or copper pillars, but is not limited thereto.
- An underfill 210 may be filled into a space between the at least one integrated circuit die 20 and the first surface S1 of the partitioned package substrate 10.
- the partitioned package substrate 10 may have a dimension of, for example, between 60 mm x 60mm and 70 mm x 70 mm.
- the partitioned package substrate 10 is composed of at least two substrate parts arranged in a side-by-side manner.
- four coplanar substrate parts 10a-10d are demonstrated in FIG. 2A . It is to be understood that the number and shape of the substrates 10a-10d are for illustration purposes only.
- the four substrate parts 10a-10d are physically separated from one another.
- each of the four substrate parts 10a-10d may have a dimension of, for example, between 30 mm x 30mm and 40 mm x 40 mm.
- the four substrate parts 10a-10d are rearranged and adjoined together with a gap G therebetween.
- the four substrate parts 10a-10d may be adjoined or glued together side-by-side by using an adhesive or a molding compound that fills into the gap G.
- the width of the gap G may range between 1-3 mm.
- the four substrate parts 10a-10d may be homogeneous substrates.
- the four substrate parts 10a-10d may be composed of substantially the same substrate materials such as BT substrates or ABF substrates.
- the four substrate parts 10a-10d may be heterogeneous substrates.
- the four substrate parts 10a-10d may be composed of different substrate materials such as glass substrates, ceramic substrates, BT substrates, ABF substrates, etc.
- the four substrate parts 10a-10d may have substantially the same thickness.
- the four substrate parts 10a-10d may have different thicknesses.
- each of the four substrate parts 10a-10d may comprise an interconnect structure 101 for electrically connecting the integrated circuit die 20 to the respective solder balls SB mounted on a second surface S2 of the partitioned package substrate 10.
- the interconnect structures 101 of the four substrate parts 10a-10d may be the same as or similar to one another.
- the interconnect structures 101 of the four substrate parts 10a-10d may be different from one another.
- the semiconductor package 2 may further comprise at least one die 30 mounted on the first surface S1 of the partitioned package substrate 10 in a flip-chip manner.
- the die 30 may overlap with at least two of the four substrate parts 10a-10d.
- a die 30a is disposed between the substrate parts 10a and 10b, and a die 30b is disposed between the substrate parts 10c and 10d.
- the die 30 may be a dummy die that contains no active integrated circuit elements. The dummy die is used to bridge or interconnect the two adjacent substrate parts.
- the die 30 may comprise a memory die such as a high bandwidth memory (HBM) die.
- HBM high bandwidth memory
- the semiconductor package 2 may further comprise an annular frame 60 mounted on the first surface S1 of the partitioned package substrate 10.
- the frame 60 may be a metal frame, but is not limited thereto.
- the frame 60 may be attached to the first surface S1 of the partitioned package substrate 10 by using joint bumps 601.
- the frame 60 may be attached to the first surface S1 of the partitioned package substrate 10 by using an adhesive.
- the frame 60 may comprise an opening 60a for accommodating the integrated circuit die 20, the die 30a and the die 30b.
- the integrated circuit die 20, the die 30a and the die 30b may be surrounded by the frame 60.
- FIG. 3A is a schematic diagram showing an exemplary semiconductor package in accordance with still another embodiment of the invention, wherein like regions, layers or elements are designated by like numeral numbers or labels.
- FIG. 3B is a cross-sectional view taken along line III-III' in FIG. 3A .
- the semiconductor package 3 comprises a partitioned package substrate 10 and at least one integrated circuit die 20 mounted on a first surface S1 of the partitioned package substrate 10.
- the first surface S1 of the partitioned package substrate 10 is a flat surface.
- the at least one integrated circuit die 20 may be mounted on the first surface S1 of the partitioned package substrate 10 in a flip-chip manner.
- the at least one integrated circuit die 20 is electrically connected to the partitioned package substrate 10 through a plurality of conductive elements 201 such as micro-bumps, copper bumps or copper pillars, but is not limited thereto.
- An underfill 210 may be filled into a space between the at least one integrated circuit die 20 and the first surface S1 of the partitioned package substrate 10.
- the partitioned package substrate 10 may have a dimension of, for example, between 60 mm x 60mm and 70 mm x 70 mm.
- the partitioned package substrate 10 is composed of at least two substrate parts arranged in a side-by-side manner.
- four coplanar substrate parts 10a-10d are demonstrated in FIG. 3A . It is to be understood that the number and shape of the substrates 10a-10d are for illustration purposes only.
- the four substrate parts 10a-10d are physically separated from one another.
- each of the four substrate parts 10a-10d may have a dimension of, for example, between 30 mm x 30mm and 40 mm x 40 mm.
- the four substrate parts 10a-10d are rearranged and adjoined together with a gap G therebetween.
- the four substrate parts 10a-10d may be adjoined or glued together side-by-side by using an adhesive or a molding compound that fills into the gap G.
- the width of the gap G may range between 1-3 mm.
- the four substrate parts 10a-10d may be homogeneous substrates.
- the four substrate parts 10a-10d may be composed of substantially the same substrate materials such as BT substrates or ABF substrates.
- the four substrate parts 10a-10d may be heterogeneous substrates.
- the four substrate parts 10a-10d may be composed of different substrate materials such as glass substrates, ceramic substrates, BT substrates, ABF substrates, etc.
- the four substrate parts 10a-10d may have substantially the same thickness.
- the four substrate parts 10a-10d may have different thicknesses.
- each of the four substrate parts 10a-10d may comprise an interconnect structure 101 for electrically connecting the integrated circuit die 20 to the respective solder balls SB mounted on a second surface S2 of the partitioned package substrate 10.
- the interconnect structures 101 of the four substrate parts 10a-10d may be the same as or similar to one another.
- the interconnect structures 101 of the four substrate parts 10a-10d may be different from one another.
- the semiconductor package 3 may further comprise at least one die 30 mounted on the first surface S1 of the partitioned package substrate 10 in a flip-chip manner.
- the die 30 may overlap with at least two of the four substrate parts 10a-10d.
- a die 30a is disposed between the substrate parts 10a and 10b
- a die 30b is disposed between the substrate parts 10c and 10d.
- the die 30 may be a dummy die that contains no active integrated circuit elements. The dummy die is used to bridge or interconnect the two adjacent substrate parts.
- the die 30 may comprise a memory die such as a high bandwidth memory (HBM) die.
- HBM high bandwidth memory
- the semiconductor package 3 may further comprise an integrated circuit die 40 and an electronic device 50 such as decoupling capacitors mounted on the first surface S1 of the partitioned package substrate 10.
- the integrated circuit die 40 and the electronic device 50 may not overlap with the gap G.
- the semiconductor package 3 may further a lid 70 installed on the first surface S1 of the partitioned package substrate 10.
- the integrated circuit die 20, the die 30a, the die 30b, the integrated circuit die 40, and an electronic device 50 may be housed by the lid 70 and may be encapsulated by a mold cap 80.
- FIG. 4 is a schematic, cross-sectional diagram showing another embodiment of the invention.
- a re-distribution layer (RDL) structure 90 may be disposed on the first surface S 1 of the partitioned package substrate 10.
- the integrated circuit die 20 is mounted on the RDL structure 90.
- the integrated circuit die 20 is electrically connected to the respective solder balls SB mounted on a second surface S2 of the partitioned package substrate 10 through the RDL structure 90 and the partitioned package substrate 10.
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Structures For Mounting Electric Components On Printed Circuit Boards (AREA)
Abstract
Description
- This application claims the benefit of
U.S. Provisional Application No. 63/369,980 - The present disclosure relates generally to the field of semiconductor packaging. More particularly, the present disclosure relates to a cost-effective, large-die semiconductor package using substrate block integration (SBI).
- As more consumers embrace smart devices, demand grows for networking data centers, Internet of Things, smart sensors, etc. To meet these needs, semiconductor design companies are encountering challenges in chip design complexity and PPA (power, performance, area) factors in lower geometries, such as 7 nm, 5 nm, and 3 nm.
- Advanced packaging is playing a bigger role across the semiconductor industry. Networking equipment, servers, and smartphones are among the applications that have adopted advanced packaging. To advance a design, IC vendors develop an ASIC. Then, vendors will shrink different functions at each node and pack them onto the ASIC. But this approach is becoming more complex and expensive at each node.
- For example, an ASIC for switch routers or data centers may include a large die and the size of the package may typically exceed 4500 mm2, which leads to a rising cost of the ASIC package because of the low production yield of the package substrate at this size. The ASIC package with large die also encounters warpage problems.
- It is one object of the present disclosure to provide an improved large-die semiconductor package using substrate block integration (SBI) in order to solve the prior art shortcomings or deficiencies. A semiconductor package according to the invention is defined in
independent claim 1. The dependent claims define preferred embodiments thereof. - One aspect of the invention provides a semiconductor package including a partitioned package substrate composed of substrate parts arranged in a side-by-side manner; an integrated circuit die mounted on a first surface of the partitioned package substrate; and solder balls mounted on a second surface of the partitioned package substrate opposite to the first surface.
- Preferably, the at least one integrated circuit die is electrically connected to the partitioned package substrate through a conductive elements.
- Preferably, the conductive elements comprise micro-bumps, copper bumps or copper pillars.
- Preferably, the substrate parts are physically separated from one another.
- Preferably, the substrate parts are rearranged and adjoined together with a gap therebetween.
- Preferably, the substrate parts are adjoined together by using an adhesive that fills into the gap.
- Preferably, the gap has a width ranging between 1-3 mm.
- Preferably, the substrate parts are homogeneous substrates.
- Preferably, the substrate parts are heterogeneous substrates.
- Preferably, the substrate parts have the same thickness.
- Preferably, the substrate parts have different thicknesses.
- Preferably, the semiconductor package further includes at least one die mounted on the first surface of the partitioned package substrate in a flip-chip manner.
- Preferably, the at least one die is a dummy die.
- Preferably, the at least one die is a memory die.
- Preferably, the semiconductor package further includes a second integrated circuit die; and an electronic device mounted on the first surface of the partitioned package substrate.
- Preferably, the electronic device comprises a decoupling capacitor.
- Preferably, the second integrated circuit die and the electronic device do not overlap with the gap.
- Preferably, the semiconductor package further includes an annular frame mounted on the first surface of the partitioned package substrate.
- Preferably, the frame is a metal frame.
- Preferably, the frame is attached to the first surface of the partitioned package substrate by using joint bumps.
- Preferably, the frame is attached to the first surface of the partitioned package substrate by using adhesive.
- Preferably, the frame comprise an opening for accommodating the at least one integrated circuit die.
- Preferably, the semiconductor package further includes a lid installed on the first surface of the partitioned package substrate, wherein the at least one integrated circuit die is housed by the lid and encapsulated by a mold cap.
- Preferably, the semiconductor package further includes a re-distribution layer (RDL) structure on the first surface of the partitioned package substrate, wherein the at least one integrated circuit die is mounted on the RDL structure.
- These and other objectives of the present invention will no doubt become obvious to those of ordinary skill in the art after reading the following detailed description of the preferred embodiment that is illustrated in the various figures and drawings.
- The accompanying drawings are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification. The drawings illustrate embodiments of the invention and, together with the description, serve to explain the principles of the invention. In the drawings:
-
FIG. 1A is a schematic diagram showing an exemplary semiconductor package in accordance with an embodiment of the invention; -
FIG. 1B is a cross-sectional view taken along line I-I' inFIG. 1A ; -
FIG. 2A is a schematic diagram showing an exemplary semiconductor package in accordance with another embodiment of the invention; -
FIG. 2B is a cross-sectional view taken along line II-II' inFIG. 2A ; -
FIG. 3A is a schematic diagram showing an exemplary semiconductor package in accordance with still another embodiment of the invention; -
FIG. 3B is a cross-sectional view taken along line III-III' inFIG. 3A ; and -
FIG. 4 is a schematic, cross-sectional diagram showing another embodiment of the invention. - In the following detailed description of embodiments of the invention, reference is made to the accompanying drawings, which form a part hereof, and in which is shown by way of illustration specific preferred embodiments in which the disclosure may be practiced.
- These embodiments are described in sufficient detail to enable those skilled in the art to practice them, and it is to be understood that other embodiments may be utilized and that mechanical, chemical, electrical, and procedural changes may be made without departing from the scope of the present disclosure. The following detailed description is, therefore, not to be taken in a limiting sense, and the scope of embodiments of the present invention is defined only by the appended claims.
- It will be understood that when an element or layer is referred to as being "on", "connected to" or "coupled to" another element or layer, it can be directly on, connected or coupled to the other element or layer or intervening elements or layers may be present. In contrast, when an element is referred to as being "directly on," "directly connected to" or "directly coupled to" another element or layer, there are no intervening elements or layers present. Like numbers refer to like elements throughout. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
- Please refer to
FIG. 1A and FIG. 1B. FIG. 1A is a schematic diagram showing an exemplary semiconductor package in accordance with an embodiment of the invention.FIG. 1B is a cross-sectional view taken along line I-I' inFIG. 1A . As shown inFIG. 1A and FIG. 1B , thesemiconductor package 1 comprises a partitionedpackage substrate 10 and at least one integrated circuit die 20 mounted on a first surface S1 of the partitionedpackage substrate 10. Preferably, the first surface S1 of the partitionedpackage substrate 10 is a flat surface. Preferably, for example, the at least one integrated circuit die 20 may be mounted on the first surface S1 of the partitionedpackage substrate 10 in a flip-chip manner. Preferably, the at least one integrated circuit die 20 is electrically connected to the partitionedpackage substrate 10 through a plurality ofconductive elements 201 such as micro-bumps, copper bumps or copper pillars, but is not limited thereto. Anunderfill 210 may be filled into a space between the at least one integrated circuit die 20 and the first surface S1 of the partitionedpackage substrate 10. Preferably, the partitionedpackage substrate 10 may have a dimension of, for example, between 60 mm x 60mm and 70 mm x 70 mm. - Preferably, the partitioned
package substrate 10 is composed of at least two smaller substrates (hereinafter referred to as substrate parts) arranged in a side-by-side manner. For example, fourcoplanar substrate parts 10a-10d are demonstrated inFIG. 1A . It is to be understood that the number and shape of thesubstrates 10a-10d are for illustration purposes only. - Preferably, the four
substrate parts 10a-10d are physically separated from one another. Preferably, each of the foursubstrate parts 10a-10d may have a dimension of, for example, between 30 mm x 30mm and 40 mm x 40 mm. By adopting the substrate parts having smaller dimensions, the reliability and the design flexibility of the semiconductor package structure can be improved and the production cost can be reduced. The partitionedpackage substrate 10 also improves the package warpage issues. - Preferably, the four
substrate parts 10a-10d are rearranged and adjoined together with a gap G therebetween. Preferably, for example, the foursubstrate parts 10a-10d may be adjoined or glued together side-by-side by using an adhesive or a molding compound that fills into the gap G. Preferably, for example, the width of the gap G may range between 1-3 mm. - Preferably, the four
substrate parts 10a-10d may be homogeneous substrates. For example, the foursubstrate parts 10a-10d may be composed of substantially the same substrate materials such as BT substrates or ABF substrates. According to another embodiment of the invention, the foursubstrate parts 10a-10d may be heterogeneous substrates. For example, the foursubstrate parts 10a-10d may be composed of different substrate materials such as glass substrates, ceramic substrates, BT substrates, ABF substrates, etc. Preferably, the foursubstrate parts 10a-10d may have substantially the same thickness. Preferably, the foursubstrate parts 10a-10d may have different thicknesses. - Preferably, each of the four
substrate parts 10a-10d may comprise aninterconnect structure 101 for electrically connecting the integrated circuit die 20 to the respective solder balls SB mounted on a second surface S2 of the partitionedpackage substrate 10. Preferably, theinterconnect structures 101 of the foursubstrate parts 10a-10d may be the same as or similar to one another. Preferably, theinterconnect structures 101 of the foursubstrate parts 10a-10d may be different from one another. - Preferably, the
semiconductor package 1 may further comprise at least one die 30 mounted on the first surface S1 of the partitionedpackage substrate 10 in a flip-chip manner. Preferably, thedie 30 may overlap with at least two of the foursubstrate parts 10a-10d. For example, inFIG. 1A , adie 30a is disposed between thesubstrate parts die 30b is disposed between thesubstrate parts die 30 may be a dummy die that contains no active integrated circuit elements. The dummy die is used to bridge or interconnect the two adjacent substrate parts. According to another embodiment of the invention, thedie 30 may comprise a memory die such as a high bandwidth memory (HBM) die. - Preferably, the
semiconductor package 1 may further comprise an integrated circuit die 40 and anelectronic device 50 such as decoupling capacitors mounted on the first surface S1 of the partitionedpackage substrate 10. The integrated circuit die 40 and theelectronic device 50 may not overlap with the gap G. - Please refer to
FIG. 2A and FIG. 2B. FIG. 2A is a schematic diagram showing an exemplary semiconductor package in accordance with another embodiment of the invention, wherein like regions, layers or elements are designated by like numeral numbers or labels.FIG. 2B is a cross-sectional view taken along line II-II' inFIG. 2A . As shown inFIG. 2A and FIG. 2B , likewise, thesemiconductor package 2 comprises a partitionedpackage substrate 10 and at least one integrated circuit die 20 mounted on a first surface S1 of the partitionedpackage substrate 10. Preferably, the first surface S1 of the partitionedpackage substrate 10 is a flat surface. Preferably, for example, the at least one integrated circuit die 20 may be mounted on the first surface S1 of the partitionedpackage substrate 10 in a flip-chip manner. Preferably, the at least one integrated circuit die 20 is electrically connected to the partitionedpackage substrate 10 through a plurality ofconductive elements 201 such as micro-bumps, copper bumps or copper pillars, but is not limited thereto. Anunderfill 210 may be filled into a space between the at least one integrated circuit die 20 and the first surface S1 of the partitionedpackage substrate 10. Preferably, the partitionedpackage substrate 10 may have a dimension of, for example, between 60 mm x 60mm and 70 mm x 70 mm. - Preferably, the partitioned
package substrate 10 is composed of at least two substrate parts arranged in a side-by-side manner. For example, fourcoplanar substrate parts 10a-10d are demonstrated inFIG. 2A . It is to be understood that the number and shape of thesubstrates 10a-10d are for illustration purposes only. - Preferably, the four
substrate parts 10a-10d are physically separated from one another. Preferably, each of the foursubstrate parts 10a-10d may have a dimension of, for example, between 30 mm x 30mm and 40 mm x 40 mm. Preferably, the foursubstrate parts 10a-10d are rearranged and adjoined together with a gap G therebetween. Preferably, for example, the foursubstrate parts 10a-10d may be adjoined or glued together side-by-side by using an adhesive or a molding compound that fills into the gap G. Preferably, for example, the width of the gap G may range between 1-3 mm. - Preferably, the four
substrate parts 10a-10d may be homogeneous substrates. For example, the foursubstrate parts 10a-10d may be composed of substantially the same substrate materials such as BT substrates or ABF substrates. According to another embodiment of the invention, the foursubstrate parts 10a-10d may be heterogeneous substrates. For example, the foursubstrate parts 10a-10d may be composed of different substrate materials such as glass substrates, ceramic substrates, BT substrates, ABF substrates, etc. Preferably, the foursubstrate parts 10a-10d may have substantially the same thickness. Preferably, the foursubstrate parts 10a-10d may have different thicknesses. - Preferably, each of the four
substrate parts 10a-10d may comprise aninterconnect structure 101 for electrically connecting the integrated circuit die 20 to the respective solder balls SB mounted on a second surface S2 of the partitionedpackage substrate 10. Preferably, theinterconnect structures 101 of the foursubstrate parts 10a-10d may be the same as or similar to one another. Preferably, theinterconnect structures 101 of the foursubstrate parts 10a-10d may be different from one another. - Preferably, the
semiconductor package 2 may further comprise at least one die 30 mounted on the first surface S1 of the partitionedpackage substrate 10 in a flip-chip manner. Preferably, thedie 30 may overlap with at least two of the foursubstrate parts 10a-10d. For example, inFIG. 1A , adie 30a is disposed between thesubstrate parts die 30b is disposed between thesubstrate parts die 30 may be a dummy die that contains no active integrated circuit elements. The dummy die is used to bridge or interconnect the two adjacent substrate parts. According to another embodiment of the invention, thedie 30 may comprise a memory die such as a high bandwidth memory (HBM) die. - Preferably, the
semiconductor package 2 may further comprise anannular frame 60 mounted on the first surface S1 of the partitionedpackage substrate 10. Preferably, theframe 60 may be a metal frame, but is not limited thereto. Preferably, theframe 60 may be attached to the first surface S1 of the partitionedpackage substrate 10 by usingjoint bumps 601. Preferably, theframe 60 may be attached to the first surface S1 of the partitionedpackage substrate 10 by using an adhesive. Theframe 60 may comprise anopening 60a for accommodating the integrated circuit die 20, thedie 30a and thedie 30b. The integrated circuit die 20, thedie 30a and thedie 30b may be surrounded by theframe 60. - Please refer to
FIG. 3A and FIG. 3B. FIG. 3A is a schematic diagram showing an exemplary semiconductor package in accordance with still another embodiment of the invention, wherein like regions, layers or elements are designated by like numeral numbers or labels.FIG. 3B is a cross-sectional view taken along line III-III' inFIG. 3A . As shown inFIG. 3A and FIG. 3B , likewise, thesemiconductor package 3 comprises a partitionedpackage substrate 10 and at least one integrated circuit die 20 mounted on a first surface S1 of the partitionedpackage substrate 10. Preferably, the first surface S1 of the partitionedpackage substrate 10 is a flat surface. Preferably, for example, the at least one integrated circuit die 20 may be mounted on the first surface S1 of the partitionedpackage substrate 10 in a flip-chip manner. Preferably, the at least one integrated circuit die 20 is electrically connected to the partitionedpackage substrate 10 through a plurality ofconductive elements 201 such as micro-bumps, copper bumps or copper pillars, but is not limited thereto. Anunderfill 210 may be filled into a space between the at least one integrated circuit die 20 and the first surface S1 of the partitionedpackage substrate 10. Preferably, the partitionedpackage substrate 10 may have a dimension of, for example, between 60 mm x 60mm and 70 mm x 70 mm. - Preferably, the partitioned
package substrate 10 is composed of at least two substrate parts arranged in a side-by-side manner. For example, fourcoplanar substrate parts 10a-10d are demonstrated inFIG. 3A . It is to be understood that the number and shape of thesubstrates 10a-10d are for illustration purposes only. - Preferably, the four
substrate parts 10a-10d are physically separated from one another. Preferably, each of the foursubstrate parts 10a-10d may have a dimension of, for example, between 30 mm x 30mm and 40 mm x 40 mm. Preferably, the foursubstrate parts 10a-10d are rearranged and adjoined together with a gap G therebetween. Preferably, for example, the foursubstrate parts 10a-10d may be adjoined or glued together side-by-side by using an adhesive or a molding compound that fills into the gap G. Preferably, for example, the width of the gap G may range between 1-3 mm. - Preferably, the four
substrate parts 10a-10d may be homogeneous substrates. For example, the foursubstrate parts 10a-10d may be composed of substantially the same substrate materials such as BT substrates or ABF substrates. According to another embodiment of the invention, the foursubstrate parts 10a-10d may be heterogeneous substrates. For example, the foursubstrate parts 10a-10d may be composed of different substrate materials such as glass substrates, ceramic substrates, BT substrates, ABF substrates, etc. Preferably, the foursubstrate parts 10a-10d may have substantially the same thickness. Preferably, the foursubstrate parts 10a-10d may have different thicknesses. - Preferably, each of the four
substrate parts 10a-10d may comprise aninterconnect structure 101 for electrically connecting the integrated circuit die 20 to the respective solder balls SB mounted on a second surface S2 of the partitionedpackage substrate 10. Preferably, theinterconnect structures 101 of the foursubstrate parts 10a-10d may be the same as or similar to one another. Preferably, theinterconnect structures 101 of the foursubstrate parts 10a-10d may be different from one another. - Preferably, the
semiconductor package 3 may further comprise at least one die 30 mounted on the first surface S1 of the partitionedpackage substrate 10 in a flip-chip manner. Preferably, thedie 30 may overlap with at least two of the foursubstrate parts 10a-10d. For example, inFIG. 1A , adie 30a is disposed between thesubstrate parts die 30b is disposed between thesubstrate parts die 30 may be a dummy die that contains no active integrated circuit elements. The dummy die is used to bridge or interconnect the two adjacent substrate parts. According to another embodiment of the invention, thedie 30 may comprise a memory die such as a high bandwidth memory (HBM) die. - Preferably, the
semiconductor package 3 may further comprise an integrated circuit die 40 and anelectronic device 50 such as decoupling capacitors mounted on the first surface S1 of the partitionedpackage substrate 10. The integrated circuit die 40 and theelectronic device 50 may not overlap with the gap G. - Preferably, the
semiconductor package 3 may further alid 70 installed on the first surface S1 of the partitionedpackage substrate 10. Preferably, the integrated circuit die 20, thedie 30a, thedie 30b, the integrated circuit die 40, and anelectronic device 50 may be housed by thelid 70 and may be encapsulated by amold cap 80. - Please refer to
FIG. 4. FIG. 4 is a schematic, cross-sectional diagram showing another embodiment of the invention. As shown inFIG. 4 , a re-distribution layer (RDL)structure 90 may be disposed on thefirst surface S 1 of the partitionedpackage substrate 10. The integrated circuit die 20 is mounted on theRDL structure 90. The integrated circuit die 20 is electrically connected to the respective solder balls SB mounted on a second surface S2 of the partitionedpackage substrate 10 through theRDL structure 90 and the partitionedpackage substrate 10. - Those skilled in the art will readily observe that numerous modifications and alterations of the device and method may be made while retaining the teachings of the invention. Accordingly, the above disclosure should be construed as limited only by the metes and bounds of the appended claims.
Claims (15)
- A semiconductor package (1; 2; 3;4), comprising:a partitioned package substrate (10) composed of a plurality of substrate parts (10a - 10d) arranged in a side-by-side manner;at least one integrated circuit die (20) mounted on a first surface (S1) of the partitioned package substrate (10); anda plurality of solder balls (SB) mounted on a second surface (S2) of the partitioned package substrate (10) opposite to the first surface (S1).
- The semiconductor package (1; 2; 3;4) according to claim 1, wherein the at least one integrated circuit die (20) is electrically connected to the partitioned package substrate (10) through a plurality of conductive elements (201).
- The semiconductor package (1; 2; 3;4) according to claim 2, wherein the conductive elements (201) comprise micro-bumps, copper bumps or copper pillars.
- The semiconductor package (1; 2; 3;4) according to any one of claims 1 to 3, wherein the plurality of substrate parts (10a - 10d) are physically separated from one another.
- The semiconductor package (1; 2; 3;4) according to any one of claims 1 to 4, wherein the plurality of substrate parts (10a - 10d) are rearranged and adjoined together with a gap (G) therebetween.
- The semiconductor package (1; 2; 3;4) according to claim 5, wherein the plurality of substrate parts (10a - 10d) are adjoined together by using an adhesive (110) that fills into the gap (G).
- The semiconductor package (1; 2; 3;4) according to claim 5 or 6, wherein the gap (G) has a width (W) ranging between 1-3 mm.
- The semiconductor package (1; 2; 3;4) according to any one of claims 1 to 7, wherein the plurality of substrate parts (10a - 10d) are homogeneous substrates or heterogeneous substrates; and/or
wherein the plurality of substrate parts (10a - 10d) have the same thickness or different thicknesses. - The semiconductor package (1; 2; 3;4) according to any one of claims 1 to 8, further comprising:
at least one die (30) mounted on the first surface (S1) of the partitioned package substrate (10) in a flip-chip manner. - The semiconductor package (1; 2; 3;4) according to claim 9, wherein the at least one die (30) is a dummy die or a memory die.
- The semiconductor package (1; 3) according to any one of claims 5 to 7, or any one of claims 8 to 10 in combination with any one of claims 5 to 7, further comprising:a second integrated circuit die (40); andan electronic device (50) mounted on the first surface (S1) of the partitioned package substrate (10).
- The semiconductor package (1; 3) according to claim 11, wherein the electronic device (50) comprises a decoupling capacitor; and/or
wherein the second integrated circuit die (40) and the electronic device (50) do not overlap with the gap (G). - The semiconductor package (2) according to any one of claims 1 to 12, further comprising:
an annular frame (60) mounted on the first surface (S1) of the partitioned package substrate (10). - The semiconductor package (2) according to claim 13, wherein the frame (60) is a metal frame; and/orwherein the frame (60) is attached to the first surface (S1) of the partitioned package substrate (10) by using joint bumps; and/orwherein the frame (60) is attached to the first surface (S1) of the partitioned package substrate (10) by using adhesive; and/orwherein the frame (60) comprise an opening (60a) for accommodating the at least one integrated circuit die (20).
- The semiconductor package (3; 4) according to any one of claims 1 to 14, further comprising:a lid (70) installed on the first surface (S1) of the partitioned package substrate (10), wherein the at least one integrated circuit die (20) is housed by the lid (70) and encapsulated by a mold cap (80); and/ora re-distribution layer, in the following also referred to as RDL, structure (90) on the first surface (S1) of the partitioned package substrate (10), wherein the at least one integrated circuit die (20) is mounted on the RDL structure (90).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US202263369980P | 2022-08-01 | 2022-08-01 | |
US18/215,830 US20240038647A1 (en) | 2022-08-01 | 2023-06-29 | Semiconductor package using substrate block integration |
Publications (1)
Publication Number | Publication Date |
---|---|
EP4318580A1 true EP4318580A1 (en) | 2024-02-07 |
Family
ID=87429391
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP23185716.0A Pending EP4318580A1 (en) | 2022-08-01 | 2023-07-17 | Semiconductor package using substrate block integration |
Country Status (2)
Country | Link |
---|---|
US (1) | US20240038647A1 (en) |
EP (1) | EP4318580A1 (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20200312826A1 (en) * | 2019-03-26 | 2020-10-01 | Samsung Electronics Co., Ltd. | Semiconductor package and method of fabricating the same |
US20210111141A1 (en) * | 2019-10-11 | 2021-04-15 | Globalfoundries Inc. | Partitioned substrates with interconnect bridge |
US20210143119A1 (en) * | 2019-11-12 | 2021-05-13 | Advanced Semiconductor Engineering, Inc. | Semiconductor package structures, semiconductor device packages and methods of manufacturing the same |
US20210175163A1 (en) * | 2019-12-04 | 2021-06-10 | Advanced Semiconductor Engineering, Inc. | Semiconductor device package and method of manufacturing the same |
US20210265290A1 (en) * | 2020-02-21 | 2021-08-26 | Advanced Semiconductor Engineering, Inc. | Semiconductor package structures and methods of manufacturing the same |
-
2023
- 2023-06-29 US US18/215,830 patent/US20240038647A1/en active Pending
- 2023-07-17 EP EP23185716.0A patent/EP4318580A1/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20200312826A1 (en) * | 2019-03-26 | 2020-10-01 | Samsung Electronics Co., Ltd. | Semiconductor package and method of fabricating the same |
US20210111141A1 (en) * | 2019-10-11 | 2021-04-15 | Globalfoundries Inc. | Partitioned substrates with interconnect bridge |
US20210143119A1 (en) * | 2019-11-12 | 2021-05-13 | Advanced Semiconductor Engineering, Inc. | Semiconductor package structures, semiconductor device packages and methods of manufacturing the same |
US20210175163A1 (en) * | 2019-12-04 | 2021-06-10 | Advanced Semiconductor Engineering, Inc. | Semiconductor device package and method of manufacturing the same |
US20210265290A1 (en) * | 2020-02-21 | 2021-08-26 | Advanced Semiconductor Engineering, Inc. | Semiconductor package structures and methods of manufacturing the same |
Also Published As
Publication number | Publication date |
---|---|
US20240038647A1 (en) | 2024-02-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8159058B2 (en) | Semiconductor device having wiring substrate stacked on another wiring substrate | |
US8592952B2 (en) | Semiconductor chip and semiconductor package with stack chip structure | |
US9129870B2 (en) | Package structure having embedded electronic component | |
US20080124835A1 (en) | Hermetic seal and reliable bonding structures for 3d applications | |
TWI584446B (en) | Semiconductor package and manufacturing method thereof | |
US20140084416A1 (en) | Stacked Package and Method of Manufacturing the Same | |
KR20040014156A (en) | Semiconductor device | |
KR101809521B1 (en) | Semiconductor package and method of manufacturing the same | |
EP3128551B1 (en) | Semiconductor package and manufacturing method thereof | |
EP3104410B1 (en) | Multi-chip module, on-board computer, sensor interface substrate, and multi-chip module manufacturing method | |
CN111799230A (en) | Semiconductor package | |
KR20110105159A (en) | Stacked semiconductor package and method for forming the same | |
US10515883B2 (en) | 3D system-level packaging methods and structures | |
EP4318580A1 (en) | Semiconductor package using substrate block integration | |
US9001521B2 (en) | Substrate assembly provided with capacitive interconnections, and manufacturing method thereof | |
EP4322206A1 (en) | Semiconductor package using substrate block integration | |
US20220310502A1 (en) | Semiconductor device and manufacturing method thereof | |
CN118039572A (en) | Electronic package and method for manufacturing the same | |
KR100671268B1 (en) | Semiconductor package having z-shaped outer leads and package stack structure and method using the same | |
TWI766192B (en) | Electronic package and method for manufacturing the same | |
US20210050326A1 (en) | Semiconductor package | |
US20160079210A1 (en) | Semiconductor packages including through electrodes and methods of manufacturing the same | |
KR20230016520A (en) | Semiconductor package | |
US9041221B2 (en) | Electronic component implementing structure intermediate body, electronic component implementing structure body and manufacturing method of electronic component implementing structure body | |
KR20080020137A (en) | Stack package having a reverse pyramidal shape |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN PUBLISHED |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC ME MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
|
17P | Request for examination filed |
Effective date: 20240806 |
|
RBV | Designated contracting states (corrected) |
Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC ME MK MT NL NO PL PT RO RS SE SI SK SM TR |