EP4318580A1 - Semiconductor package using substrate block integration - Google Patents

Semiconductor package using substrate block integration Download PDF

Info

Publication number
EP4318580A1
EP4318580A1 EP23185716.0A EP23185716A EP4318580A1 EP 4318580 A1 EP4318580 A1 EP 4318580A1 EP 23185716 A EP23185716 A EP 23185716A EP 4318580 A1 EP4318580 A1 EP 4318580A1
Authority
EP
European Patent Office
Prior art keywords
substrate
semiconductor package
partitioned
die
integrated circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP23185716.0A
Other languages
German (de)
French (fr)
Inventor
Wei-Chih Chen
Shi-Bai Chen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MediaTek Inc
Original Assignee
MediaTek Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MediaTek Inc filed Critical MediaTek Inc
Publication of EP4318580A1 publication Critical patent/EP4318580A1/en
Pending legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5385Assembly of a plurality of insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49833Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers the chip support structure consisting of a plurality of insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49811Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
    • H01L23/49816Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49822Multilayer substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/50Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor for integrated circuit devices, e.g. power bus, number of leads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5383Multilayer substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L24/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L24/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/16Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B80/00Assemblies of multiple devices comprising at least one memory device covered by this subclass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • H01L2224/13001Core members of the bump connector
    • H01L2224/13099Material
    • H01L2224/131Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/13138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/13147Copper [Cu] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L24/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/73Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L25/0655Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00 the devices being arranged next to each other
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/18Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different subgroups of the same main group of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N

Definitions

  • the present disclosure relates generally to the field of semiconductor packaging. More particularly, the present disclosure relates to a cost-effective, large-die semiconductor package using substrate block integration (SBI).
  • SBI substrate block integration
  • Advanced packaging is playing a bigger role across the semiconductor industry.
  • Networking equipment, servers, and smartphones are among the applications that have adopted advanced packaging.
  • IC vendors develop an ASIC. Then, vendors will shrink different functions at each node and pack them onto the ASIC. But this approach is becoming more complex and expensive at each node.
  • an ASIC for switch routers or data centers may include a large die and the size of the package may typically exceed 4500 mm 2 , which leads to a rising cost of the ASIC package because of the low production yield of the package substrate at this size.
  • the ASIC package with large die also encounters warpage problems.
  • a semiconductor package according to the invention is defined in independent claim 1.
  • the dependent claims define preferred embodiments thereof.
  • One aspect of the invention provides a semiconductor package including a partitioned package substrate composed of substrate parts arranged in a side-by-side manner; an integrated circuit die mounted on a first surface of the partitioned package substrate; and solder balls mounted on a second surface of the partitioned package substrate opposite to the first surface.
  • the at least one integrated circuit die is electrically connected to the partitioned package substrate through a conductive elements.
  • the conductive elements comprise micro-bumps, copper bumps or copper pillars.
  • the substrate parts are physically separated from one another.
  • the substrate parts are rearranged and adjoined together with a gap therebetween.
  • the substrate parts are adjoined together by using an adhesive that fills into the gap.
  • the gap has a width ranging between 1-3 mm.
  • the substrate parts are homogeneous substrates.
  • the substrate parts are heterogeneous substrates.
  • the substrate parts have the same thickness.
  • the substrate parts have different thicknesses.
  • the semiconductor package further includes at least one die mounted on the first surface of the partitioned package substrate in a flip-chip manner.
  • the at least one die is a dummy die.
  • the at least one die is a memory die.
  • the semiconductor package further includes a second integrated circuit die; and an electronic device mounted on the first surface of the partitioned package substrate.
  • the electronic device comprises a decoupling capacitor.
  • the second integrated circuit die and the electronic device do not overlap with the gap.
  • the semiconductor package further includes an annular frame mounted on the first surface of the partitioned package substrate.
  • the frame is a metal frame.
  • the frame is attached to the first surface of the partitioned package substrate by using joint bumps.
  • the frame is attached to the first surface of the partitioned package substrate by using adhesive.
  • the frame comprise an opening for accommodating the at least one integrated circuit die.
  • the semiconductor package further includes a lid installed on the first surface of the partitioned package substrate, wherein the at least one integrated circuit die is housed by the lid and encapsulated by a mold cap.
  • the semiconductor package further includes a re-distribution layer (RDL) structure on the first surface of the partitioned package substrate, wherein the at least one integrated circuit die is mounted on the RDL structure.
  • RDL re-distribution layer
  • FIG. 1A is a schematic diagram showing an exemplary semiconductor package in accordance with an embodiment of the invention.
  • FIG. 1B is a cross-sectional view taken along line I-I' in FIG. 1A .
  • the semiconductor package 1 comprises a partitioned package substrate 10 and at least one integrated circuit die 20 mounted on a first surface S1 of the partitioned package substrate 10.
  • the first surface S1 of the partitioned package substrate 10 is a flat surface.
  • the at least one integrated circuit die 20 may be mounted on the first surface S1 of the partitioned package substrate 10 in a flip-chip manner.
  • the at least one integrated circuit die 20 is electrically connected to the partitioned package substrate 10 through a plurality of conductive elements 201 such as micro-bumps, copper bumps or copper pillars, but is not limited thereto.
  • An underfill 210 may be filled into a space between the at least one integrated circuit die 20 and the first surface S1 of the partitioned package substrate 10.
  • the partitioned package substrate 10 may have a dimension of, for example, between 60 mm x 60mm and 70 mm x 70 mm.
  • the partitioned package substrate 10 is composed of at least two smaller substrates (hereinafter referred to as substrate parts) arranged in a side-by-side manner.
  • substrate parts For example, four coplanar substrate parts 10a-10d are demonstrated in FIG. 1A . It is to be understood that the number and shape of the substrates 10a-10d are for illustration purposes only.
  • the four substrate parts 10a-10d are physically separated from one another.
  • each of the four substrate parts 10a-10d may have a dimension of, for example, between 30 mm x 30mm and 40 mm x 40 mm.
  • the four substrate parts 10a-10d are rearranged and adjoined together with a gap G therebetween.
  • the four substrate parts 10a-10d may be adjoined or glued together side-by-side by using an adhesive or a molding compound that fills into the gap G.
  • the width of the gap G may range between 1-3 mm.
  • the four substrate parts 10a-10d may be homogeneous substrates.
  • the four substrate parts 10a-10d may be composed of substantially the same substrate materials such as BT substrates or ABF substrates.
  • the four substrate parts 10a-10d may be heterogeneous substrates.
  • the four substrate parts 10a-10d may be composed of different substrate materials such as glass substrates, ceramic substrates, BT substrates, ABF substrates, etc.
  • the four substrate parts 10a-10d may have substantially the same thickness.
  • the four substrate parts 10a-10d may have different thicknesses.
  • each of the four substrate parts 10a-10d may comprise an interconnect structure 101 for electrically connecting the integrated circuit die 20 to the respective solder balls SB mounted on a second surface S2 of the partitioned package substrate 10.
  • the interconnect structures 101 of the four substrate parts 10a-10d may be the same as or similar to one another.
  • the interconnect structures 101 of the four substrate parts 10a-10d may be different from one another.
  • the semiconductor package 1 may further comprise at least one die 30 mounted on the first surface S1 of the partitioned package substrate 10 in a flip-chip manner.
  • the die 30 may overlap with at least two of the four substrate parts 10a-10d.
  • a die 30a is disposed between the substrate parts 10a and 10b, and a die 30b is disposed between the substrate parts 10c and 10d.
  • the die 30 may be a dummy die that contains no active integrated circuit elements. The dummy die is used to bridge or interconnect the two adjacent substrate parts.
  • the die 30 may comprise a memory die such as a high bandwidth memory (HBM) die.
  • HBM high bandwidth memory
  • the semiconductor package 1 may further comprise an integrated circuit die 40 and an electronic device 50 such as decoupling capacitors mounted on the first surface S1 of the partitioned package substrate 10.
  • the integrated circuit die 40 and the electronic device 50 may not overlap with the gap G.
  • FIG. 2A is a schematic diagram showing an exemplary semiconductor package in accordance with another embodiment of the invention, wherein like regions, layers or elements are designated by like numeral numbers or labels.
  • FIG. 2B is a cross-sectional view taken along line II-II' in FIG. 2A .
  • the semiconductor package 2 comprises a partitioned package substrate 10 and at least one integrated circuit die 20 mounted on a first surface S1 of the partitioned package substrate 10.
  • the first surface S1 of the partitioned package substrate 10 is a flat surface.
  • the at least one integrated circuit die 20 may be mounted on the first surface S1 of the partitioned package substrate 10 in a flip-chip manner.
  • the at least one integrated circuit die 20 is electrically connected to the partitioned package substrate 10 through a plurality of conductive elements 201 such as micro-bumps, copper bumps or copper pillars, but is not limited thereto.
  • An underfill 210 may be filled into a space between the at least one integrated circuit die 20 and the first surface S1 of the partitioned package substrate 10.
  • the partitioned package substrate 10 may have a dimension of, for example, between 60 mm x 60mm and 70 mm x 70 mm.
  • the partitioned package substrate 10 is composed of at least two substrate parts arranged in a side-by-side manner.
  • four coplanar substrate parts 10a-10d are demonstrated in FIG. 2A . It is to be understood that the number and shape of the substrates 10a-10d are for illustration purposes only.
  • the four substrate parts 10a-10d are physically separated from one another.
  • each of the four substrate parts 10a-10d may have a dimension of, for example, between 30 mm x 30mm and 40 mm x 40 mm.
  • the four substrate parts 10a-10d are rearranged and adjoined together with a gap G therebetween.
  • the four substrate parts 10a-10d may be adjoined or glued together side-by-side by using an adhesive or a molding compound that fills into the gap G.
  • the width of the gap G may range between 1-3 mm.
  • the four substrate parts 10a-10d may be homogeneous substrates.
  • the four substrate parts 10a-10d may be composed of substantially the same substrate materials such as BT substrates or ABF substrates.
  • the four substrate parts 10a-10d may be heterogeneous substrates.
  • the four substrate parts 10a-10d may be composed of different substrate materials such as glass substrates, ceramic substrates, BT substrates, ABF substrates, etc.
  • the four substrate parts 10a-10d may have substantially the same thickness.
  • the four substrate parts 10a-10d may have different thicknesses.
  • each of the four substrate parts 10a-10d may comprise an interconnect structure 101 for electrically connecting the integrated circuit die 20 to the respective solder balls SB mounted on a second surface S2 of the partitioned package substrate 10.
  • the interconnect structures 101 of the four substrate parts 10a-10d may be the same as or similar to one another.
  • the interconnect structures 101 of the four substrate parts 10a-10d may be different from one another.
  • the semiconductor package 2 may further comprise at least one die 30 mounted on the first surface S1 of the partitioned package substrate 10 in a flip-chip manner.
  • the die 30 may overlap with at least two of the four substrate parts 10a-10d.
  • a die 30a is disposed between the substrate parts 10a and 10b, and a die 30b is disposed between the substrate parts 10c and 10d.
  • the die 30 may be a dummy die that contains no active integrated circuit elements. The dummy die is used to bridge or interconnect the two adjacent substrate parts.
  • the die 30 may comprise a memory die such as a high bandwidth memory (HBM) die.
  • HBM high bandwidth memory
  • the semiconductor package 2 may further comprise an annular frame 60 mounted on the first surface S1 of the partitioned package substrate 10.
  • the frame 60 may be a metal frame, but is not limited thereto.
  • the frame 60 may be attached to the first surface S1 of the partitioned package substrate 10 by using joint bumps 601.
  • the frame 60 may be attached to the first surface S1 of the partitioned package substrate 10 by using an adhesive.
  • the frame 60 may comprise an opening 60a for accommodating the integrated circuit die 20, the die 30a and the die 30b.
  • the integrated circuit die 20, the die 30a and the die 30b may be surrounded by the frame 60.
  • FIG. 3A is a schematic diagram showing an exemplary semiconductor package in accordance with still another embodiment of the invention, wherein like regions, layers or elements are designated by like numeral numbers or labels.
  • FIG. 3B is a cross-sectional view taken along line III-III' in FIG. 3A .
  • the semiconductor package 3 comprises a partitioned package substrate 10 and at least one integrated circuit die 20 mounted on a first surface S1 of the partitioned package substrate 10.
  • the first surface S1 of the partitioned package substrate 10 is a flat surface.
  • the at least one integrated circuit die 20 may be mounted on the first surface S1 of the partitioned package substrate 10 in a flip-chip manner.
  • the at least one integrated circuit die 20 is electrically connected to the partitioned package substrate 10 through a plurality of conductive elements 201 such as micro-bumps, copper bumps or copper pillars, but is not limited thereto.
  • An underfill 210 may be filled into a space between the at least one integrated circuit die 20 and the first surface S1 of the partitioned package substrate 10.
  • the partitioned package substrate 10 may have a dimension of, for example, between 60 mm x 60mm and 70 mm x 70 mm.
  • the partitioned package substrate 10 is composed of at least two substrate parts arranged in a side-by-side manner.
  • four coplanar substrate parts 10a-10d are demonstrated in FIG. 3A . It is to be understood that the number and shape of the substrates 10a-10d are for illustration purposes only.
  • the four substrate parts 10a-10d are physically separated from one another.
  • each of the four substrate parts 10a-10d may have a dimension of, for example, between 30 mm x 30mm and 40 mm x 40 mm.
  • the four substrate parts 10a-10d are rearranged and adjoined together with a gap G therebetween.
  • the four substrate parts 10a-10d may be adjoined or glued together side-by-side by using an adhesive or a molding compound that fills into the gap G.
  • the width of the gap G may range between 1-3 mm.
  • the four substrate parts 10a-10d may be homogeneous substrates.
  • the four substrate parts 10a-10d may be composed of substantially the same substrate materials such as BT substrates or ABF substrates.
  • the four substrate parts 10a-10d may be heterogeneous substrates.
  • the four substrate parts 10a-10d may be composed of different substrate materials such as glass substrates, ceramic substrates, BT substrates, ABF substrates, etc.
  • the four substrate parts 10a-10d may have substantially the same thickness.
  • the four substrate parts 10a-10d may have different thicknesses.
  • each of the four substrate parts 10a-10d may comprise an interconnect structure 101 for electrically connecting the integrated circuit die 20 to the respective solder balls SB mounted on a second surface S2 of the partitioned package substrate 10.
  • the interconnect structures 101 of the four substrate parts 10a-10d may be the same as or similar to one another.
  • the interconnect structures 101 of the four substrate parts 10a-10d may be different from one another.
  • the semiconductor package 3 may further comprise at least one die 30 mounted on the first surface S1 of the partitioned package substrate 10 in a flip-chip manner.
  • the die 30 may overlap with at least two of the four substrate parts 10a-10d.
  • a die 30a is disposed between the substrate parts 10a and 10b
  • a die 30b is disposed between the substrate parts 10c and 10d.
  • the die 30 may be a dummy die that contains no active integrated circuit elements. The dummy die is used to bridge or interconnect the two adjacent substrate parts.
  • the die 30 may comprise a memory die such as a high bandwidth memory (HBM) die.
  • HBM high bandwidth memory
  • the semiconductor package 3 may further comprise an integrated circuit die 40 and an electronic device 50 such as decoupling capacitors mounted on the first surface S1 of the partitioned package substrate 10.
  • the integrated circuit die 40 and the electronic device 50 may not overlap with the gap G.
  • the semiconductor package 3 may further a lid 70 installed on the first surface S1 of the partitioned package substrate 10.
  • the integrated circuit die 20, the die 30a, the die 30b, the integrated circuit die 40, and an electronic device 50 may be housed by the lid 70 and may be encapsulated by a mold cap 80.
  • FIG. 4 is a schematic, cross-sectional diagram showing another embodiment of the invention.
  • a re-distribution layer (RDL) structure 90 may be disposed on the first surface S 1 of the partitioned package substrate 10.
  • the integrated circuit die 20 is mounted on the RDL structure 90.
  • the integrated circuit die 20 is electrically connected to the respective solder balls SB mounted on a second surface S2 of the partitioned package substrate 10 through the RDL structure 90 and the partitioned package substrate 10.

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Structures For Mounting Electric Components On Printed Circuit Boards (AREA)

Abstract

A semiconductor package (1) includes a partitioned package substrate (10) composed of substrate parts (10a, 10b) arranged in a side-by-side manner; an integrated circuit die (20) mounted on a first surface (S1) of the partitioned package substrate (10); and solder balls (SB) mounted on a second surface (S2) of the partitioned package substrate (10) opposite to the first surface (S1).

Description

    Cross Reference to Related Applications
  • This application claims the benefit of U.S. Provisional Application No. 63/369,980 , filed on August 1st, 2022. The content of the application is incorporated herein by reference.
  • Background
  • The present disclosure relates generally to the field of semiconductor packaging. More particularly, the present disclosure relates to a cost-effective, large-die semiconductor package using substrate block integration (SBI).
  • As more consumers embrace smart devices, demand grows for networking data centers, Internet of Things, smart sensors, etc. To meet these needs, semiconductor design companies are encountering challenges in chip design complexity and PPA (power, performance, area) factors in lower geometries, such as 7 nm, 5 nm, and 3 nm.
  • Advanced packaging is playing a bigger role across the semiconductor industry. Networking equipment, servers, and smartphones are among the applications that have adopted advanced packaging. To advance a design, IC vendors develop an ASIC. Then, vendors will shrink different functions at each node and pack them onto the ASIC. But this approach is becoming more complex and expensive at each node.
  • For example, an ASIC for switch routers or data centers may include a large die and the size of the package may typically exceed 4500 mm2, which leads to a rising cost of the ASIC package because of the low production yield of the package substrate at this size. The ASIC package with large die also encounters warpage problems.
  • Summary
  • It is one object of the present disclosure to provide an improved large-die semiconductor package using substrate block integration (SBI) in order to solve the prior art shortcomings or deficiencies. A semiconductor package according to the invention is defined in independent claim 1. The dependent claims define preferred embodiments thereof.
  • One aspect of the invention provides a semiconductor package including a partitioned package substrate composed of substrate parts arranged in a side-by-side manner; an integrated circuit die mounted on a first surface of the partitioned package substrate; and solder balls mounted on a second surface of the partitioned package substrate opposite to the first surface.
  • Preferably, the at least one integrated circuit die is electrically connected to the partitioned package substrate through a conductive elements.
  • Preferably, the conductive elements comprise micro-bumps, copper bumps or copper pillars.
  • Preferably, the substrate parts are physically separated from one another.
  • Preferably, the substrate parts are rearranged and adjoined together with a gap therebetween.
  • Preferably, the substrate parts are adjoined together by using an adhesive that fills into the gap.
  • Preferably, the gap has a width ranging between 1-3 mm.
  • Preferably, the substrate parts are homogeneous substrates.
  • Preferably, the substrate parts are heterogeneous substrates.
  • Preferably, the substrate parts have the same thickness.
  • Preferably, the substrate parts have different thicknesses.
  • Preferably, the semiconductor package further includes at least one die mounted on the first surface of the partitioned package substrate in a flip-chip manner.
  • Preferably, the at least one die is a dummy die.
  • Preferably, the at least one die is a memory die.
  • Preferably, the semiconductor package further includes a second integrated circuit die; and an electronic device mounted on the first surface of the partitioned package substrate.
  • Preferably, the electronic device comprises a decoupling capacitor.
  • Preferably, the second integrated circuit die and the electronic device do not overlap with the gap.
  • Preferably, the semiconductor package further includes an annular frame mounted on the first surface of the partitioned package substrate.
  • Preferably, the frame is a metal frame.
  • Preferably, the frame is attached to the first surface of the partitioned package substrate by using joint bumps.
  • Preferably, the frame is attached to the first surface of the partitioned package substrate by using adhesive.
  • Preferably, the frame comprise an opening for accommodating the at least one integrated circuit die.
  • Preferably, the semiconductor package further includes a lid installed on the first surface of the partitioned package substrate, wherein the at least one integrated circuit die is housed by the lid and encapsulated by a mold cap.
  • Preferably, the semiconductor package further includes a re-distribution layer (RDL) structure on the first surface of the partitioned package substrate, wherein the at least one integrated circuit die is mounted on the RDL structure.
  • These and other objectives of the present invention will no doubt become obvious to those of ordinary skill in the art after reading the following detailed description of the preferred embodiment that is illustrated in the various figures and drawings.
  • Brief Description of the Drawings
  • The accompanying drawings are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification. The drawings illustrate embodiments of the invention and, together with the description, serve to explain the principles of the invention. In the drawings:
    • FIG. 1A is a schematic diagram showing an exemplary semiconductor package in accordance with an embodiment of the invention;
    • FIG. 1B is a cross-sectional view taken along line I-I' in FIG. 1A;
    • FIG. 2A is a schematic diagram showing an exemplary semiconductor package in accordance with another embodiment of the invention;
    • FIG. 2B is a cross-sectional view taken along line II-II' in FIG. 2A;
    • FIG. 3A is a schematic diagram showing an exemplary semiconductor package in accordance with still another embodiment of the invention;
    • FIG. 3B is a cross-sectional view taken along line III-III' in FIG. 3A; and
    • FIG. 4 is a schematic, cross-sectional diagram showing another embodiment of the invention.
    Detailed Description
  • In the following detailed description of embodiments of the invention, reference is made to the accompanying drawings, which form a part hereof, and in which is shown by way of illustration specific preferred embodiments in which the disclosure may be practiced.
  • These embodiments are described in sufficient detail to enable those skilled in the art to practice them, and it is to be understood that other embodiments may be utilized and that mechanical, chemical, electrical, and procedural changes may be made without departing from the scope of the present disclosure. The following detailed description is, therefore, not to be taken in a limiting sense, and the scope of embodiments of the present invention is defined only by the appended claims.
  • It will be understood that when an element or layer is referred to as being "on", "connected to" or "coupled to" another element or layer, it can be directly on, connected or coupled to the other element or layer or intervening elements or layers may be present. In contrast, when an element is referred to as being "directly on," "directly connected to" or "directly coupled to" another element or layer, there are no intervening elements or layers present. Like numbers refer to like elements throughout. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
  • Please refer to FIG. 1A and FIG. 1B. FIG. 1A is a schematic diagram showing an exemplary semiconductor package in accordance with an embodiment of the invention. FIG. 1B is a cross-sectional view taken along line I-I' in FIG. 1A. As shown in FIG. 1A and FIG. 1B, the semiconductor package 1 comprises a partitioned package substrate 10 and at least one integrated circuit die 20 mounted on a first surface S1 of the partitioned package substrate 10. Preferably, the first surface S1 of the partitioned package substrate 10 is a flat surface. Preferably, for example, the at least one integrated circuit die 20 may be mounted on the first surface S1 of the partitioned package substrate 10 in a flip-chip manner. Preferably, the at least one integrated circuit die 20 is electrically connected to the partitioned package substrate 10 through a plurality of conductive elements 201 such as micro-bumps, copper bumps or copper pillars, but is not limited thereto. An underfill 210 may be filled into a space between the at least one integrated circuit die 20 and the first surface S1 of the partitioned package substrate 10. Preferably, the partitioned package substrate 10 may have a dimension of, for example, between 60 mm x 60mm and 70 mm x 70 mm.
  • Preferably, the partitioned package substrate 10 is composed of at least two smaller substrates (hereinafter referred to as substrate parts) arranged in a side-by-side manner. For example, four coplanar substrate parts 10a-10d are demonstrated in FIG. 1A. It is to be understood that the number and shape of the substrates 10a-10d are for illustration purposes only.
  • Preferably, the four substrate parts 10a-10d are physically separated from one another. Preferably, each of the four substrate parts 10a-10d may have a dimension of, for example, between 30 mm x 30mm and 40 mm x 40 mm. By adopting the substrate parts having smaller dimensions, the reliability and the design flexibility of the semiconductor package structure can be improved and the production cost can be reduced. The partitioned package substrate 10 also improves the package warpage issues.
  • Preferably, the four substrate parts 10a-10d are rearranged and adjoined together with a gap G therebetween. Preferably, for example, the four substrate parts 10a-10d may be adjoined or glued together side-by-side by using an adhesive or a molding compound that fills into the gap G. Preferably, for example, the width of the gap G may range between 1-3 mm.
  • Preferably, the four substrate parts 10a-10d may be homogeneous substrates. For example, the four substrate parts 10a-10d may be composed of substantially the same substrate materials such as BT substrates or ABF substrates. According to another embodiment of the invention, the four substrate parts 10a-10d may be heterogeneous substrates. For example, the four substrate parts 10a-10d may be composed of different substrate materials such as glass substrates, ceramic substrates, BT substrates, ABF substrates, etc. Preferably, the four substrate parts 10a-10d may have substantially the same thickness. Preferably, the four substrate parts 10a-10d may have different thicknesses.
  • Preferably, each of the four substrate parts 10a-10d may comprise an interconnect structure 101 for electrically connecting the integrated circuit die 20 to the respective solder balls SB mounted on a second surface S2 of the partitioned package substrate 10. Preferably, the interconnect structures 101 of the four substrate parts 10a-10d may be the same as or similar to one another. Preferably, the interconnect structures 101 of the four substrate parts 10a-10d may be different from one another.
  • Preferably, the semiconductor package 1 may further comprise at least one die 30 mounted on the first surface S1 of the partitioned package substrate 10 in a flip-chip manner. Preferably, the die 30 may overlap with at least two of the four substrate parts 10a-10d. For example, in FIG. 1A, a die 30a is disposed between the substrate parts 10a and 10b, and a die 30b is disposed between the substrate parts 10c and 10d. Preferably, the die 30 may be a dummy die that contains no active integrated circuit elements. The dummy die is used to bridge or interconnect the two adjacent substrate parts. According to another embodiment of the invention, the die 30 may comprise a memory die such as a high bandwidth memory (HBM) die.
  • Preferably, the semiconductor package 1 may further comprise an integrated circuit die 40 and an electronic device 50 such as decoupling capacitors mounted on the first surface S1 of the partitioned package substrate 10. The integrated circuit die 40 and the electronic device 50 may not overlap with the gap G.
  • Please refer to FIG. 2A and FIG. 2B. FIG. 2A is a schematic diagram showing an exemplary semiconductor package in accordance with another embodiment of the invention, wherein like regions, layers or elements are designated by like numeral numbers or labels. FIG. 2B is a cross-sectional view taken along line II-II' in FIG. 2A. As shown in FIG. 2A and FIG. 2B, likewise, the semiconductor package 2 comprises a partitioned package substrate 10 and at least one integrated circuit die 20 mounted on a first surface S1 of the partitioned package substrate 10. Preferably, the first surface S1 of the partitioned package substrate 10 is a flat surface. Preferably, for example, the at least one integrated circuit die 20 may be mounted on the first surface S1 of the partitioned package substrate 10 in a flip-chip manner. Preferably, the at least one integrated circuit die 20 is electrically connected to the partitioned package substrate 10 through a plurality of conductive elements 201 such as micro-bumps, copper bumps or copper pillars, but is not limited thereto. An underfill 210 may be filled into a space between the at least one integrated circuit die 20 and the first surface S1 of the partitioned package substrate 10. Preferably, the partitioned package substrate 10 may have a dimension of, for example, between 60 mm x 60mm and 70 mm x 70 mm.
  • Preferably, the partitioned package substrate 10 is composed of at least two substrate parts arranged in a side-by-side manner. For example, four coplanar substrate parts 10a-10d are demonstrated in FIG. 2A. It is to be understood that the number and shape of the substrates 10a-10d are for illustration purposes only.
  • Preferably, the four substrate parts 10a-10d are physically separated from one another. Preferably, each of the four substrate parts 10a-10d may have a dimension of, for example, between 30 mm x 30mm and 40 mm x 40 mm. Preferably, the four substrate parts 10a-10d are rearranged and adjoined together with a gap G therebetween. Preferably, for example, the four substrate parts 10a-10d may be adjoined or glued together side-by-side by using an adhesive or a molding compound that fills into the gap G. Preferably, for example, the width of the gap G may range between 1-3 mm.
  • Preferably, the four substrate parts 10a-10d may be homogeneous substrates. For example, the four substrate parts 10a-10d may be composed of substantially the same substrate materials such as BT substrates or ABF substrates. According to another embodiment of the invention, the four substrate parts 10a-10d may be heterogeneous substrates. For example, the four substrate parts 10a-10d may be composed of different substrate materials such as glass substrates, ceramic substrates, BT substrates, ABF substrates, etc. Preferably, the four substrate parts 10a-10d may have substantially the same thickness. Preferably, the four substrate parts 10a-10d may have different thicknesses.
  • Preferably, each of the four substrate parts 10a-10d may comprise an interconnect structure 101 for electrically connecting the integrated circuit die 20 to the respective solder balls SB mounted on a second surface S2 of the partitioned package substrate 10. Preferably, the interconnect structures 101 of the four substrate parts 10a-10d may be the same as or similar to one another. Preferably, the interconnect structures 101 of the four substrate parts 10a-10d may be different from one another.
  • Preferably, the semiconductor package 2 may further comprise at least one die 30 mounted on the first surface S1 of the partitioned package substrate 10 in a flip-chip manner. Preferably, the die 30 may overlap with at least two of the four substrate parts 10a-10d. For example, in FIG. 1A, a die 30a is disposed between the substrate parts 10a and 10b, and a die 30b is disposed between the substrate parts 10c and 10d. Preferably, the die 30 may be a dummy die that contains no active integrated circuit elements. The dummy die is used to bridge or interconnect the two adjacent substrate parts. According to another embodiment of the invention, the die 30 may comprise a memory die such as a high bandwidth memory (HBM) die.
  • Preferably, the semiconductor package 2 may further comprise an annular frame 60 mounted on the first surface S1 of the partitioned package substrate 10. Preferably, the frame 60 may be a metal frame, but is not limited thereto. Preferably, the frame 60 may be attached to the first surface S1 of the partitioned package substrate 10 by using joint bumps 601. Preferably, the frame 60 may be attached to the first surface S1 of the partitioned package substrate 10 by using an adhesive. The frame 60 may comprise an opening 60a for accommodating the integrated circuit die 20, the die 30a and the die 30b. The integrated circuit die 20, the die 30a and the die 30b may be surrounded by the frame 60.
  • Please refer to FIG. 3A and FIG. 3B. FIG. 3A is a schematic diagram showing an exemplary semiconductor package in accordance with still another embodiment of the invention, wherein like regions, layers or elements are designated by like numeral numbers or labels. FIG. 3B is a cross-sectional view taken along line III-III' in FIG. 3A. As shown in FIG. 3A and FIG. 3B, likewise, the semiconductor package 3 comprises a partitioned package substrate 10 and at least one integrated circuit die 20 mounted on a first surface S1 of the partitioned package substrate 10. Preferably, the first surface S1 of the partitioned package substrate 10 is a flat surface. Preferably, for example, the at least one integrated circuit die 20 may be mounted on the first surface S1 of the partitioned package substrate 10 in a flip-chip manner. Preferably, the at least one integrated circuit die 20 is electrically connected to the partitioned package substrate 10 through a plurality of conductive elements 201 such as micro-bumps, copper bumps or copper pillars, but is not limited thereto. An underfill 210 may be filled into a space between the at least one integrated circuit die 20 and the first surface S1 of the partitioned package substrate 10. Preferably, the partitioned package substrate 10 may have a dimension of, for example, between 60 mm x 60mm and 70 mm x 70 mm.
  • Preferably, the partitioned package substrate 10 is composed of at least two substrate parts arranged in a side-by-side manner. For example, four coplanar substrate parts 10a-10d are demonstrated in FIG. 3A. It is to be understood that the number and shape of the substrates 10a-10d are for illustration purposes only.
  • Preferably, the four substrate parts 10a-10d are physically separated from one another. Preferably, each of the four substrate parts 10a-10d may have a dimension of, for example, between 30 mm x 30mm and 40 mm x 40 mm. Preferably, the four substrate parts 10a-10d are rearranged and adjoined together with a gap G therebetween. Preferably, for example, the four substrate parts 10a-10d may be adjoined or glued together side-by-side by using an adhesive or a molding compound that fills into the gap G. Preferably, for example, the width of the gap G may range between 1-3 mm.
  • Preferably, the four substrate parts 10a-10d may be homogeneous substrates. For example, the four substrate parts 10a-10d may be composed of substantially the same substrate materials such as BT substrates or ABF substrates. According to another embodiment of the invention, the four substrate parts 10a-10d may be heterogeneous substrates. For example, the four substrate parts 10a-10d may be composed of different substrate materials such as glass substrates, ceramic substrates, BT substrates, ABF substrates, etc. Preferably, the four substrate parts 10a-10d may have substantially the same thickness. Preferably, the four substrate parts 10a-10d may have different thicknesses.
  • Preferably, each of the four substrate parts 10a-10d may comprise an interconnect structure 101 for electrically connecting the integrated circuit die 20 to the respective solder balls SB mounted on a second surface S2 of the partitioned package substrate 10. Preferably, the interconnect structures 101 of the four substrate parts 10a-10d may be the same as or similar to one another. Preferably, the interconnect structures 101 of the four substrate parts 10a-10d may be different from one another.
  • Preferably, the semiconductor package 3 may further comprise at least one die 30 mounted on the first surface S1 of the partitioned package substrate 10 in a flip-chip manner. Preferably, the die 30 may overlap with at least two of the four substrate parts 10a-10d. For example, in FIG. 1A, a die 30a is disposed between the substrate parts 10a and 10b, and a die 30b is disposed between the substrate parts 10c and 10d. Preferably, the die 30 may be a dummy die that contains no active integrated circuit elements. The dummy die is used to bridge or interconnect the two adjacent substrate parts. According to another embodiment of the invention, the die 30 may comprise a memory die such as a high bandwidth memory (HBM) die.
  • Preferably, the semiconductor package 3 may further comprise an integrated circuit die 40 and an electronic device 50 such as decoupling capacitors mounted on the first surface S1 of the partitioned package substrate 10. The integrated circuit die 40 and the electronic device 50 may not overlap with the gap G.
  • Preferably, the semiconductor package 3 may further a lid 70 installed on the first surface S1 of the partitioned package substrate 10. Preferably, the integrated circuit die 20, the die 30a, the die 30b, the integrated circuit die 40, and an electronic device 50 may be housed by the lid 70 and may be encapsulated by a mold cap 80.
  • Please refer to FIG. 4. FIG. 4 is a schematic, cross-sectional diagram showing another embodiment of the invention. As shown in FIG. 4, a re-distribution layer (RDL) structure 90 may be disposed on the first surface S 1 of the partitioned package substrate 10. The integrated circuit die 20 is mounted on the RDL structure 90. The integrated circuit die 20 is electrically connected to the respective solder balls SB mounted on a second surface S2 of the partitioned package substrate 10 through the RDL structure 90 and the partitioned package substrate 10.
  • Those skilled in the art will readily observe that numerous modifications and alterations of the device and method may be made while retaining the teachings of the invention. Accordingly, the above disclosure should be construed as limited only by the metes and bounds of the appended claims.

Claims (15)

  1. A semiconductor package (1; 2; 3;4), comprising:
    a partitioned package substrate (10) composed of a plurality of substrate parts (10a - 10d) arranged in a side-by-side manner;
    at least one integrated circuit die (20) mounted on a first surface (S1) of the partitioned package substrate (10); and
    a plurality of solder balls (SB) mounted on a second surface (S2) of the partitioned package substrate (10) opposite to the first surface (S1).
  2. The semiconductor package (1; 2; 3;4) according to claim 1, wherein the at least one integrated circuit die (20) is electrically connected to the partitioned package substrate (10) through a plurality of conductive elements (201).
  3. The semiconductor package (1; 2; 3;4) according to claim 2, wherein the conductive elements (201) comprise micro-bumps, copper bumps or copper pillars.
  4. The semiconductor package (1; 2; 3;4) according to any one of claims 1 to 3, wherein the plurality of substrate parts (10a - 10d) are physically separated from one another.
  5. The semiconductor package (1; 2; 3;4) according to any one of claims 1 to 4, wherein the plurality of substrate parts (10a - 10d) are rearranged and adjoined together with a gap (G) therebetween.
  6. The semiconductor package (1; 2; 3;4) according to claim 5, wherein the plurality of substrate parts (10a - 10d) are adjoined together by using an adhesive (110) that fills into the gap (G).
  7. The semiconductor package (1; 2; 3;4) according to claim 5 or 6, wherein the gap (G) has a width (W) ranging between 1-3 mm.
  8. The semiconductor package (1; 2; 3;4) according to any one of claims 1 to 7, wherein the plurality of substrate parts (10a - 10d) are homogeneous substrates or heterogeneous substrates; and/or
    wherein the plurality of substrate parts (10a - 10d) have the same thickness or different thicknesses.
  9. The semiconductor package (1; 2; 3;4) according to any one of claims 1 to 8, further comprising:
    at least one die (30) mounted on the first surface (S1) of the partitioned package substrate (10) in a flip-chip manner.
  10. The semiconductor package (1; 2; 3;4) according to claim 9, wherein the at least one die (30) is a dummy die or a memory die.
  11. The semiconductor package (1; 3) according to any one of claims 5 to 7, or any one of claims 8 to 10 in combination with any one of claims 5 to 7, further comprising:
    a second integrated circuit die (40); and
    an electronic device (50) mounted on the first surface (S1) of the partitioned package substrate (10).
  12. The semiconductor package (1; 3) according to claim 11, wherein the electronic device (50) comprises a decoupling capacitor; and/or
    wherein the second integrated circuit die (40) and the electronic device (50) do not overlap with the gap (G).
  13. The semiconductor package (2) according to any one of claims 1 to 12, further comprising:
    an annular frame (60) mounted on the first surface (S1) of the partitioned package substrate (10).
  14. The semiconductor package (2) according to claim 13, wherein the frame (60) is a metal frame; and/or
    wherein the frame (60) is attached to the first surface (S1) of the partitioned package substrate (10) by using joint bumps; and/or
    wherein the frame (60) is attached to the first surface (S1) of the partitioned package substrate (10) by using adhesive; and/or
    wherein the frame (60) comprise an opening (60a) for accommodating the at least one integrated circuit die (20).
  15. The semiconductor package (3; 4) according to any one of claims 1 to 14, further comprising:
    a lid (70) installed on the first surface (S1) of the partitioned package substrate (10), wherein the at least one integrated circuit die (20) is housed by the lid (70) and encapsulated by a mold cap (80); and/or
    a re-distribution layer, in the following also referred to as RDL, structure (90) on the first surface (S1) of the partitioned package substrate (10), wherein the at least one integrated circuit die (20) is mounted on the RDL structure (90).
EP23185716.0A 2022-08-01 2023-07-17 Semiconductor package using substrate block integration Pending EP4318580A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US202263369980P 2022-08-01 2022-08-01
US18/215,830 US20240038647A1 (en) 2022-08-01 2023-06-29 Semiconductor package using substrate block integration

Publications (1)

Publication Number Publication Date
EP4318580A1 true EP4318580A1 (en) 2024-02-07

Family

ID=87429391

Family Applications (1)

Application Number Title Priority Date Filing Date
EP23185716.0A Pending EP4318580A1 (en) 2022-08-01 2023-07-17 Semiconductor package using substrate block integration

Country Status (2)

Country Link
US (1) US20240038647A1 (en)
EP (1) EP4318580A1 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20200312826A1 (en) * 2019-03-26 2020-10-01 Samsung Electronics Co., Ltd. Semiconductor package and method of fabricating the same
US20210111141A1 (en) * 2019-10-11 2021-04-15 Globalfoundries Inc. Partitioned substrates with interconnect bridge
US20210143119A1 (en) * 2019-11-12 2021-05-13 Advanced Semiconductor Engineering, Inc. Semiconductor package structures, semiconductor device packages and methods of manufacturing the same
US20210175163A1 (en) * 2019-12-04 2021-06-10 Advanced Semiconductor Engineering, Inc. Semiconductor device package and method of manufacturing the same
US20210265290A1 (en) * 2020-02-21 2021-08-26 Advanced Semiconductor Engineering, Inc. Semiconductor package structures and methods of manufacturing the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20200312826A1 (en) * 2019-03-26 2020-10-01 Samsung Electronics Co., Ltd. Semiconductor package and method of fabricating the same
US20210111141A1 (en) * 2019-10-11 2021-04-15 Globalfoundries Inc. Partitioned substrates with interconnect bridge
US20210143119A1 (en) * 2019-11-12 2021-05-13 Advanced Semiconductor Engineering, Inc. Semiconductor package structures, semiconductor device packages and methods of manufacturing the same
US20210175163A1 (en) * 2019-12-04 2021-06-10 Advanced Semiconductor Engineering, Inc. Semiconductor device package and method of manufacturing the same
US20210265290A1 (en) * 2020-02-21 2021-08-26 Advanced Semiconductor Engineering, Inc. Semiconductor package structures and methods of manufacturing the same

Also Published As

Publication number Publication date
US20240038647A1 (en) 2024-02-01

Similar Documents

Publication Publication Date Title
US8159058B2 (en) Semiconductor device having wiring substrate stacked on another wiring substrate
US8592952B2 (en) Semiconductor chip and semiconductor package with stack chip structure
US9129870B2 (en) Package structure having embedded electronic component
US20080124835A1 (en) Hermetic seal and reliable bonding structures for 3d applications
TWI584446B (en) Semiconductor package and manufacturing method thereof
US20140084416A1 (en) Stacked Package and Method of Manufacturing the Same
KR20040014156A (en) Semiconductor device
KR101809521B1 (en) Semiconductor package and method of manufacturing the same
EP3128551B1 (en) Semiconductor package and manufacturing method thereof
EP3104410B1 (en) Multi-chip module, on-board computer, sensor interface substrate, and multi-chip module manufacturing method
CN111799230A (en) Semiconductor package
KR20110105159A (en) Stacked semiconductor package and method for forming the same
US10515883B2 (en) 3D system-level packaging methods and structures
EP4318580A1 (en) Semiconductor package using substrate block integration
US9001521B2 (en) Substrate assembly provided with capacitive interconnections, and manufacturing method thereof
EP4322206A1 (en) Semiconductor package using substrate block integration
US20220310502A1 (en) Semiconductor device and manufacturing method thereof
CN118039572A (en) Electronic package and method for manufacturing the same
KR100671268B1 (en) Semiconductor package having z-shaped outer leads and package stack structure and method using the same
TWI766192B (en) Electronic package and method for manufacturing the same
US20210050326A1 (en) Semiconductor package
US20160079210A1 (en) Semiconductor packages including through electrodes and methods of manufacturing the same
KR20230016520A (en) Semiconductor package
US9041221B2 (en) Electronic component implementing structure intermediate body, electronic component implementing structure body and manufacturing method of electronic component implementing structure body
KR20080020137A (en) Stack package having a reverse pyramidal shape

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION HAS BEEN PUBLISHED

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC ME MK MT NL NO PL PT RO RS SE SI SK SM TR

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

17P Request for examination filed

Effective date: 20240806

RBV Designated contracting states (corrected)

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC ME MK MT NL NO PL PT RO RS SE SI SK SM TR