EP4285100A4 - Reflektometer, spektrophotometer, ellipsometer und polarimetersysteme mit einem wellenlängenmodifikator - Google Patents

Reflektometer, spektrophotometer, ellipsometer und polarimetersysteme mit einem wellenlängenmodifikator

Info

Publication number
EP4285100A4
EP4285100A4 EP21923502.5A EP21923502A EP4285100A4 EP 4285100 A4 EP4285100 A4 EP 4285100A4 EP 21923502 A EP21923502 A EP 21923502A EP 4285100 A4 EP4285100 A4 EP 4285100A4
Authority
EP
European Patent Office
Prior art keywords
reflectometer
ellipsometer
spectrophotometer
wavelength modifier
polarimeter systems
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP21923502.5A
Other languages
English (en)
French (fr)
Other versions
EP4285100A1 (de
Inventor
Ping He
Martin M. Liphardt
Jeremy A. Van Derslice
Craig M. Herzinger
Jeffrey S. Hale
Brian D. Guenther
Duane E. Meyer
Stefan Schoeche
James D. Welch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JA Woollam Co Inc
Original Assignee
JA Woollam Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US17/300,091 external-priority patent/US11675208B1/en
Application filed by JA Woollam Co Inc filed Critical JA Woollam Co Inc
Publication of EP4285100A1 publication Critical patent/EP4285100A1/de
Publication of EP4285100A4 publication Critical patent/EP4285100A4/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2803—Investigating the spectrum using photoelectric array detector
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/255—Details, e.g. use of specially adapted sources, lighting or optical systems
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/3528—Non-linear optics for producing a supercontinuum
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/58—Photometry, e.g. photographic exposure meter using luminescence generated by light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3581—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/359—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using near infrared light

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Optics & Photonics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Spectrometry And Color Measurement (AREA)
EP21923502.5A 2021-01-29 2021-12-27 Reflektometer, spektrophotometer, ellipsometer und polarimetersysteme mit einem wellenlängenmodifikator Pending EP4285100A4 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US202163143187P 2021-01-29 2021-01-29
US17/300,091 US11675208B1 (en) 2014-12-18 2021-03-05 Reflectometer, spectrophotometer, ellipsometer and polarimeter system with a super continuum laser source of a beam of electromagnetism, and improved detector system
US202163259830P 2021-08-17 2021-08-17
PCT/US2021/010069 WO2022164417A1 (en) 2021-01-29 2021-12-27 Reflectometer, spectrophotometer, ellipsometer and polarimeter systems including a wavelength modifier

Publications (2)

Publication Number Publication Date
EP4285100A1 EP4285100A1 (de) 2023-12-06
EP4285100A4 true EP4285100A4 (de) 2025-01-01

Family

ID=82653769

Family Applications (1)

Application Number Title Priority Date Filing Date
EP21923502.5A Pending EP4285100A4 (de) 2021-01-29 2021-12-27 Reflektometer, spektrophotometer, ellipsometer und polarimetersysteme mit einem wellenlängenmodifikator

Country Status (5)

Country Link
EP (1) EP4285100A4 (de)
JP (2) JP7735411B2 (de)
KR (1) KR20230133961A (de)
CN (1) CN115335684B (de)
WO (1) WO2022164417A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102023204171B4 (de) * 2023-05-05 2026-02-19 Carl Zeiss Smt Gmbh Optisches System für ein Metrologiesystem sowie Metrologiesystem mit einem derartigen optischen System
KR20260021354A (ko) 2024-08-06 2026-02-13 (주) 오로스테크놀로지 광학 계측 초점 얼라인 시스템 및 이를 활용한 얼라인 방법

Citations (2)

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Publication number Priority date Publication date Assignee Title
US20160154229A1 (en) * 2013-06-09 2016-06-02 Board Of Regents, The University Of Texas System Spectrally-encoded high-extinction polarization microscope and methods of use
US10073120B1 (en) * 2014-08-18 2018-09-11 Board Of Regents For The University Of Nebraska Integrated vacuum-ultraviolet, mid and near-ultraviolet, visible, near, mid and far infrared and terahertz optical hall effect (OHE) instrument, and method of use

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US5257085A (en) * 1991-04-24 1993-10-26 Kaman Aerospace Corporation Spectrally dispersive imaging lidar system
JPH04350524A (ja) * 1991-05-28 1992-12-04 Katsuya Masao 偏光測定装置
JPH09210904A (ja) * 1996-02-05 1997-08-15 Hitachi Ltd 赤外光透過像の顕微観察方法および密着型顕微鏡
US6541788B2 (en) * 1998-10-27 2003-04-01 The Regents Of The University Of California Mid infrared and near infrared light upconverter using self-assembled quantum dots
JP2008197161A (ja) 2007-02-08 2008-08-28 Olympus Corp アップコンバージョン蛍光体を備えた赤外線顕微鏡
US7889339B1 (en) * 2008-03-05 2011-02-15 Kla-Tencor Corporation Complementary waveplate rotating compensator ellipsometer
US8227778B2 (en) 2008-05-20 2012-07-24 Komatsu Ltd. Semiconductor exposure device using extreme ultra violet radiation
JP5650733B2 (ja) 2009-06-23 2015-01-07 ジェイ・エイ・ウーラム・カンパニー・インコーポレイテッドＪ．Ａ．Ｗｏｏｌｌａｍ Ｃｏ．，Ｉｎｃ． テラヘルツ赤外線エリプソメーターシステムおよびその使用方法
JP5793038B2 (ja) 2011-09-13 2015-10-14 キヤノン株式会社 投射型画像表示装置
DE102012205311B4 (de) * 2012-03-30 2013-10-17 Anton Paar Gmbh Optische Vorrichtung, insbesondere Polarimeter, zur Detektion von Inhomogenitäten in einer Probe
US20130313440A1 (en) * 2012-05-22 2013-11-28 Kla-Tencor Corporation Solid-State Laser And Inspection System Using 193nm Laser
US9254538B2 (en) 2013-04-16 2016-02-09 Corning Incorporated Method of minimizing stacking element distortions in optical assemblies
US9354118B2 (en) 2014-02-06 2016-05-31 Film Sense, LLC Multiple wavelength ellipsometer system and related method
US20170045397A1 (en) 2014-05-08 2017-02-16 National University Of Singapore Device for analysing a specimen and corresponding method
JP6096725B2 (ja) * 2014-09-09 2017-03-15 アイシン精機株式会社 膜厚測定装置及び膜厚測定方法
US10627288B1 (en) * 2015-10-06 2020-04-21 J.A. Woollam Co., Inc. Systems and methods for producing a more uniform intensity wavelength dispersed beam of electromagnetic radiation entering a multielement detector, while maintaining information content therein
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CN110806401B (zh) * 2019-09-27 2024-10-01 长春国科希莱科技有限公司 波长/角度调制自由转换偏光荧光成像表面等离子共振仪
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Publication number Priority date Publication date Assignee Title
US20160154229A1 (en) * 2013-06-09 2016-06-02 Board Of Regents, The University Of Texas System Spectrally-encoded high-extinction polarization microscope and methods of use
US10073120B1 (en) * 2014-08-18 2018-09-11 Board Of Regents For The University Of Nebraska Integrated vacuum-ultraviolet, mid and near-ultraviolet, visible, near, mid and far infrared and terahertz optical hall effect (OHE) instrument, and method of use

Non-Patent Citations (5)

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Title
GABORIT GWENAËL ET AL: "Second order nonlinear optical processes in [111] cubic crystals for terahertz optoelectronics", LITHUANIAN JOURNAL OF PHYSICS, vol. 58, no. 1, 1 January 2018 (2018-01-01), XP093225151, ISSN: 1648-8504, DOI: 10.3952/physics.v58i1.3649 *
HUANG SHAO-XIN ET AL: "Terahertz Mueller Matrix Polarimetry and Polar Decomposition", IEEE TRANSACTIONS ON TERAHERTZ SCIENCE AND TECHNOLOGY, IEEE, PISCATAWAY, NJ, USA, vol. 10, no. 1, 1 January 2020 (2020-01-01), pages 74 - 84, XP011764333, ISSN: 2156-342X, [retrieved on 20200102], DOI: 10.1109/TTHZ.2019.2947234 *
NAKAMURA RYOSUKE ET AL: "Polarization-sensitive femtosecond mid-infrared spectrometer with a tunable Fabry-Perot filter and chirped-pulse upconversion", APPLIED OPTICS, vol. 57, no. 36, 17 December 2018 (2018-12-17), US, pages 10517, XP093225746, ISSN: 1559-128X, DOI: 10.1364/AO.57.010517 *
SANDERS NICOLAI ET AL: "Mid infrared upconversion spectroscopy using diffuse reflectance", 20140220, vol. 8964, 20 February 2014 (2014-02-20), pages 89641K - 89641K, XP060034327, DOI: 10.1117/12.2039539 *
See also references of WO2022164417A1 *

Also Published As

Publication number Publication date
CN115335684A (zh) 2022-11-11
EP4285100A1 (de) 2023-12-06
WO2022164417A8 (en) 2022-09-15
WO2022164417A1 (en) 2022-08-04
CN115335684B (zh) 2025-02-14
JP2024516053A (ja) 2024-04-12
KR20230133961A (ko) 2023-09-19
JP2025170377A (ja) 2025-11-18
JP7735411B2 (ja) 2025-09-08

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