EP4265648A4 - HOLLOW RESIN PARTICLES, THEIR PRODUCTION PROCESS AND THEIR USE - Google Patents

HOLLOW RESIN PARTICLES, THEIR PRODUCTION PROCESS AND THEIR USE Download PDF

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Publication number
EP4265648A4
EP4265648A4 EP21906491.2A EP21906491A EP4265648A4 EP 4265648 A4 EP4265648 A4 EP 4265648A4 EP 21906491 A EP21906491 A EP 21906491A EP 4265648 A4 EP4265648 A4 EP 4265648A4
Authority
EP
European Patent Office
Prior art keywords
production process
resin particles
hollow resin
hollow
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP21906491.2A
Other languages
German (de)
French (fr)
Other versions
EP4265648A1 (en
Inventor
Haruhiko MATSUURA
Shinya Matsuno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Kasei Co Ltd
Original Assignee
Sekisui Kasei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Kasei Co Ltd filed Critical Sekisui Kasei Co Ltd
Publication of EP4265648A1 publication Critical patent/EP4265648A1/en
Publication of EP4265648A4 publication Critical patent/EP4265648A4/en
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06Polymers provided for in subclass C08G
    • C08F290/062Polyethers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00Processes of treating or compounding macromolecular substances
    • C08J3/12Powdering or granulating
    • C08J3/16Powdering or granulating by coagulating dispersions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/02Making microcapsules or microballoons
    • B01J13/06Making microcapsules or microballoons by phase separation
    • B01J13/14Polymerisation; cross-linking
    • B01J13/18In situ polymerisation with all reactants being present in the same phase
    • B01J13/185In situ polymerisation with all reactants being present in the same phase in an organic phase
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02Monomers containing only one unsaturated aliphatic radical
    • C08F212/04Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06Hydrocarbons
    • C08F212/12Monomers containing a branched unsaturated aliphatic radical or a ring substituted by an alkyl radical
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/34Monomers containing two or more unsaturated aliphatic radicals
    • C08F212/36Divinylbenzene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/34Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
    • C08G65/46Post-polymerisation treatment, e.g. recovery, purification, drying
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D171/08Polyethers derived from hydroxy compounds or from their metallic derivatives
    • C09D171/10Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
    • C09D171/12Polyphenylene oxides
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0205Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/021Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2371/00Characterised by the use of polyethers obtained by reactions forming an ether link in the main chain; Derivatives of such polymers
    • C08J2371/08Polyethers derived from hydroxy compounds or from their metallic derivatives
    • C08J2371/10Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
    • C08J2371/12Polyphenylene oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyethers (AREA)
EP21906491.2A 2020-12-17 2021-12-09 HOLLOW RESIN PARTICLES, THEIR PRODUCTION PROCESS AND THEIR USE Pending EP4265648A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020209336 2020-12-17
PCT/JP2021/045348 WO2022131128A1 (en) 2020-12-17 2021-12-09 Hollow resin particles, production method therefor, and use thereof

Publications (2)

Publication Number Publication Date
EP4265648A1 EP4265648A1 (en) 2023-10-25
EP4265648A4 true EP4265648A4 (en) 2024-11-20

Family

ID=82059154

Family Applications (1)

Application Number Title Priority Date Filing Date
EP21906491.2A Pending EP4265648A4 (en) 2020-12-17 2021-12-09 HOLLOW RESIN PARTICLES, THEIR PRODUCTION PROCESS AND THEIR USE

Country Status (7)

Country Link
US (1) US20240059847A1 (en)
EP (1) EP4265648A4 (en)
JP (1) JP7583832B2 (en)
KR (1) KR102896990B1 (en)
CN (1) CN116635433A (en)
TW (2) TWI893253B (en)
WO (1) WO2022131128A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN121532448A (en) * 2023-07-21 2026-02-13 积水化成品工业株式会社 Resin Particles and Resin Compositions for Semiconductor Components
WO2026070397A1 (en) * 2024-09-30 2026-04-02 積水化成品工業株式会社 Hollow resin particles, production method therefor, and use therefor

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0385065B1 (en) * 1989-03-01 1994-01-12 General Electric Company Method of preparing beads of polyphenylene ether-polystyrene, beads thus formed
US8574669B2 (en) * 2008-05-21 2013-11-05 Toray Industries, Inc. Method for producing polymer fine particle comprising contacting an emulsion with a poor solvent
CN109232890A (en) * 2016-12-09 2019-01-18 苏州大学 A kind of preparation method of low dielectric bismaleimide resin system performed polymer

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55147369A (en) 1979-05-07 1980-11-17 Tokyo Keiki Co Ltd Information processing system
US4782098A (en) * 1987-06-12 1988-11-01 General Electric, Co. Expandable thermoplastic resin beads
JP4409683B2 (en) 1999-11-12 2010-02-03 ダイセル化学工業株式会社 Optical molding resin composition, method for producing the same, and optical molding
JP4448930B2 (en) 2000-09-04 2010-04-14 財団法人新産業創造研究機構 Hollow polymer fine particles and production method thereof
JP4651883B2 (en) 2001-09-05 2011-03-16 ガンツ化成株式会社 Skin cosmetics containing spherical porous crosslinked polymer particles
JP4171489B2 (en) 2003-01-28 2008-10-22 松下電工株式会社 Resin composition containing hollow particles, prepreg and laminate including the composition
JP4445495B2 (en) 2006-08-17 2010-04-07 積水化学工業株式会社 Porous hollow polymer particle, method for producing porous hollow polymer particle, porous ceramic filter, and method for producing porous ceramic filter
JP5255340B2 (en) 2007-10-22 2013-08-07 積水化学工業株式会社 Porous hollow polymer particle, method for producing porous hollow polymer particle, perfume-carrying polymer particle, and method for producing perfume-carrying polymer particle
CN103814070B (en) * 2011-09-09 2016-08-24 沙特基础工业公司 water-swellable polymer beads
JP2014111728A (en) 2012-10-29 2014-06-19 Nippon Shokubai Co Ltd Method of producing porous resin particle
US10590223B2 (en) 2013-06-18 2020-03-17 Panasonic Intellectual Property Management Co., Ltd. Polyphenylene ether resin composition, prepreg, metal-clad laminate and printed wiring board
KR102019707B1 (en) * 2015-01-08 2019-09-09 세키스이가세이힝코교가부시키가이샤 Hollow particles, method for producing same, use thereof, and method for producing microcapsule particles
JP6549507B2 (en) * 2016-03-11 2019-07-24 旭化成株式会社 Polyphenylene ether powder having minute voids and manufacturing method
JP6513273B1 (en) 2018-08-31 2019-05-15 三井化学株式会社 Resin particles
JP7761380B2 (en) 2020-10-05 2025-10-28 味の素株式会社 resin composition
US20230391900A1 (en) * 2020-12-17 2023-12-07 Sekisui Kasei Co., Ltd. Hollow resin particles, method for producing hollow resin particles, and use of hollow resin particles
JP7236794B1 (en) * 2021-10-27 2023-03-10 日本化薬株式会社 Amine compound, maleimide compound, curable resin composition and cured product thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0385065B1 (en) * 1989-03-01 1994-01-12 General Electric Company Method of preparing beads of polyphenylene ether-polystyrene, beads thus formed
US8574669B2 (en) * 2008-05-21 2013-11-05 Toray Industries, Inc. Method for producing polymer fine particle comprising contacting an emulsion with a poor solvent
CN109232890A (en) * 2016-12-09 2019-01-18 苏州大学 A kind of preparation method of low dielectric bismaleimide resin system performed polymer

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2022131128A1 *

Also Published As

Publication number Publication date
KR102896990B1 (en) 2025-12-05
TW202544098A (en) 2025-11-16
WO2022131128A1 (en) 2022-06-23
JP7583832B2 (en) 2024-11-14
TW202231693A (en) 2022-08-16
TWI893253B (en) 2025-08-11
CN116635433A (en) 2023-08-22
US20240059847A1 (en) 2024-02-22
EP4265648A1 (en) 2023-10-25
KR20230104261A (en) 2023-07-07
JPWO2022131128A1 (en) 2022-06-23

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