EP4172166A1 - Edelmetalkomplexe mit diolefin und c6-c18 monocarboxylatliganden zur oberflächenbeschichtung - Google Patents
Edelmetalkomplexe mit diolefin und c6-c18 monocarboxylatliganden zur oberflächenbeschichtungInfo
- Publication number
- EP4172166A1 EP4172166A1 EP20739612.8A EP20739612A EP4172166A1 EP 4172166 A1 EP4172166 A1 EP 4172166A1 EP 20739612 A EP20739612 A EP 20739612A EP 4172166 A1 EP4172166 A1 EP 4172166A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- noble metal
- metal complex
- integer
- cod
- diolefin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229910000510 noble metal Inorganic materials 0.000 title claims abstract description 49
- 239000003446 ligand Substances 0.000 title claims abstract description 20
- 150000001993 dienes Chemical class 0.000 title claims abstract description 16
- 239000011248 coating agent Substances 0.000 title claims description 4
- 238000000576 coating method Methods 0.000 title claims description 4
- 125000003118 aryl group Chemical group 0.000 claims abstract description 17
- 150000002763 monocarboxylic acids Chemical group 0.000 claims abstract description 14
- 150000004696 coordination complex Chemical class 0.000 claims abstract description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical group [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims abstract description 10
- 150000001875 compounds Chemical class 0.000 claims abstract description 10
- WLJVXDMOQOGPHL-UHFFFAOYSA-N phenylacetic acid Chemical group OC(=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-UHFFFAOYSA-N 0.000 claims abstract description 10
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical group I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims abstract description 9
- 150000001649 bromium compounds Chemical group 0.000 claims abstract description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 33
- 239000000243 solution Substances 0.000 claims description 14
- 239000010948 rhodium Substances 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 9
- 238000002360 preparation method Methods 0.000 claims description 7
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 6
- 238000000354 decomposition reaction Methods 0.000 claims description 6
- 229930195733 hydrocarbon Natural products 0.000 claims description 6
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 claims description 5
- 239000004215 Carbon black (E152) Substances 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- 239000003513 alkali Substances 0.000 claims description 2
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 claims description 2
- 229910000457 iridium oxide Inorganic materials 0.000 claims description 2
- 159000000003 magnesium salts Chemical class 0.000 claims description 2
- SJLOMQIUPFZJAN-UHFFFAOYSA-N oxorhodium Chemical compound [Rh]=O SJLOMQIUPFZJAN-UHFFFAOYSA-N 0.000 claims description 2
- 229960003424 phenylacetic acid Drugs 0.000 claims description 2
- 239000003279 phenylacetic acid Substances 0.000 claims description 2
- 229910003450 rhodium oxide Inorganic materials 0.000 claims description 2
- 150000001447 alkali salts Chemical class 0.000 claims 1
- 239000010970 precious metal Substances 0.000 claims 1
- 239000007858 starting material Substances 0.000 claims 1
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 30
- RRKODOZNUZCUBN-CCAGOZQPSA-N (1z,3z)-cycloocta-1,3-diene Chemical compound C1CC\C=C/C=C\C1 RRKODOZNUZCUBN-CCAGOZQPSA-N 0.000 description 21
- -1 s Chemical class 0.000 description 12
- SJYNFBVQFBRSIB-UHFFFAOYSA-N norbornadiene Chemical compound C1=CC2C=CC1C2 SJYNFBVQFBRSIB-UHFFFAOYSA-N 0.000 description 10
- 229910052763 palladium Inorganic materials 0.000 description 9
- 239000012071 phase Substances 0.000 description 8
- 150000002940 palladium Chemical class 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- VYPDUQYOLCLEGS-UHFFFAOYSA-M sodium;2-ethylhexanoate Chemical compound [Na+].CCCCC(CC)C([O-])=O VYPDUQYOLCLEGS-UHFFFAOYSA-M 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 229910052703 rhodium Inorganic materials 0.000 description 5
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 5
- 235000002639 sodium chloride Nutrition 0.000 description 5
- 150000002503 iridium Chemical class 0.000 description 4
- 229910052741 iridium Chemical group 0.000 description 4
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical group [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 101150003085 Pdcl gene Proteins 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000004945 emulsification Methods 0.000 description 3
- 239000012074 organic phase Substances 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 239000008346 aqueous phase Substances 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- NZNMSOFKMUBTKW-UHFFFAOYSA-N cyclohexanecarboxylic acid Chemical compound OC(=O)C1CCCCC1 NZNMSOFKMUBTKW-UHFFFAOYSA-N 0.000 description 2
- KDUIUFJBNGTBMD-VXMYFEMYSA-N cyclooctatetraene Chemical compound C1=C\C=C/C=C\C=C1 KDUIUFJBNGTBMD-VXMYFEMYSA-N 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000003208 petroleum Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 150000003283 rhodium Chemical class 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 238000007669 thermal treatment Methods 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- OBETXYAYXDNJHR-SSDOTTSWSA-M (2r)-2-ethylhexanoate Chemical compound CCCC[C@@H](CC)C([O-])=O OBETXYAYXDNJHR-SSDOTTSWSA-M 0.000 description 1
- PRBHEGAFLDMLAL-UHFFFAOYSA-N 1,5-Hexadiene Natural products CC=CCC=C PRBHEGAFLDMLAL-UHFFFAOYSA-N 0.000 description 1
- VYXHVRARDIDEHS-UHFFFAOYSA-N 1,5-cyclooctadiene Chemical compound C1CC=CCCC=C1 VYXHVRARDIDEHS-UHFFFAOYSA-N 0.000 description 1
- 239000004912 1,5-cyclooctadiene Substances 0.000 description 1
- YPIFGDQKSSMYHQ-UHFFFAOYSA-N 7,7-dimethyloctanoic acid Chemical compound CC(C)(C)CCCCCC(O)=O YPIFGDQKSSMYHQ-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910002666 PdCl2 Inorganic materials 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- OBETXYAYXDNJHR-UHFFFAOYSA-N alpha-ethylcaproic acid Natural products CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001734 carboxylic acid salts Chemical class 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 150000001805 chlorine compounds Chemical group 0.000 description 1
- VZFUCHSFHOYXIS-UHFFFAOYSA-N cycloheptane carboxylic acid Natural products OC(=O)C1CCCCCC1 VZFUCHSFHOYXIS-UHFFFAOYSA-N 0.000 description 1
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical class CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 1
- 230000001804 emulsifying effect Effects 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-N heptanoic acid group Chemical class C(CCCCCC)(=O)O MNWFXJYAOYHMED-UHFFFAOYSA-N 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical compound C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid group Chemical class C(CCCCC)(=O)O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002842 nonanoic acids Chemical class 0.000 description 1
- 125000005473 octanoic acid group Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- WQIQNKQYEUMPBM-UHFFFAOYSA-N pentamethylcyclopentadiene Chemical compound CC1C(C)=C(C)C(C)=C1C WQIQNKQYEUMPBM-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- CASCCINXYVTVRI-UHFFFAOYSA-M sodium;7,7-dimethyloctanoate Chemical compound [Na+].CC(C)(C)CCCCCC([O-])=O CASCCINXYVTVRI-UHFFFAOYSA-M 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
- C07F15/0006—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table compounds of the platinum group
- C07F15/006—Palladium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
- C07F15/0006—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table compounds of the platinum group
- C07F15/0033—Iridium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
- C07F15/0006—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table compounds of the platinum group
- C07F15/0046—Ruthenium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
- C07F15/0006—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table compounds of the platinum group
- C07F15/0073—Rhodium compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1295—Process of deposition of the inorganic material with after-treatment of the deposited inorganic material
Definitions
- the present invention relates to new noble metal complexes, processes for their production and their use for producing layers comprising noble metal.
- WO90 / 07561 A1 discloses noble metal complexes of the formula LM [0 (CO) R] 2 , where L is a nitrogen-free cyclic polyolefin ligand, preferably cyclooctadiene (COD) or pentamethylcyclopentadiene, and M is platinum or iridium, and where R is benzyl, aryl or alkyl with four or more carbon atoms, particularly preferably phenyl.
- the object of the present invention was to find noble metal compounds which can be used to produce layers comprising noble metal, in particular also on temperature-sensitive substrates.
- the object can be achieved by providing noble metal complexes of palladium, rhodium or iridium, each with diolefin and C6-C18 monocarboxylate ligands. More precisely, noble metal complexes of the type [LPd [O (CO) R1] X] n or of the type [LM [O (CO) R1]] m are provided, L being a compound functioning as a diolefin ligand, M being selected from Rhodium and iridium, where X is selected from bromide, chloride, iodide and -0 (CO) R2, where -0 (CO) R1 and -0 (CO) R2 are identical or different non-aromatic C6-C18 monocarboxylic acid residues, each with the exception of a phenylacetic acid residue mean, and where n is an integer> 1 and m is an integer> 2.
- n and m generally mean an integer, for example in the range from 2 to 5.
- integer n> 1 is generally in the range from 2 to 5; in particular, n is then equal to 2 and the noble metal complexes according to the invention are then binuclear palladium complexes.
- an integer m is generally in the range from 2 to 5; in particular, m is then equal to 2 and the noble metal complexes according to the invention are then dinuclear rhodium or iridium complexes.
- L is a compound which functions as a diolefin ligand on the central palladium atom; X denotes bromide, chloride, iodide or -O (CO) R2; and -O (CO) R1 and -O (CO) R2 denote identical or different non-aromatic C6-C18 monocarboxylic acid residues, each with the exception of a phenylacetic acid residue.
- n is equal to 1.
- L denotes a compound functioning as a diolefin ligand
- X denotes bromide, chloride, iodide or -O (CO) R2
- n is 2, 3, 4 or 5, preferably 2
- -O (CO) R1 and -O (CO) R2 denote identical or different non-aromatic C6-C18 monocarboxylic acid residues, each with the exception of a phenylacetic acid residue.
- L denotes a compound functioning as a diolefin ligand
- M means rhodium or iridium
- m is 2, 3, 4 or 5, preferably 2
- - O (CO) R1 means a non-aromatic C6-C18 monocarboxylic acid residue with the exception of a phenylacetic acid residue.
- the invention relates to said noble metal complexes in individualized but also in associated form, that is to say alone or also as a mixture of several different species.
- the invention can relate to palladium complexes in individualized or in associated form, that is to say alone or as a mixture of several different species, each of the type [LPd [O (CO) R1] X] n .
- the invention can also relate to rhodium complexes in individualized or grouped form, that is to say alone or as a mixture of several different species, each of the type [LRh [O (CO) R1]] m .
- the invention can relate to iridium complexes in individualized or in associated form, that is to say alone or as a mixture of several different species, each of the type [LIr [O (CO) R1]] m .
- diolefins or compounds of type L which are capable of functioning as diolefin ligand, include hydrocarbons such as COD (1,5-cyclooctadiene), NBD (norbornadiene), COT (cyclooctatetraene) and 1,5-hexadiene, in particular COD and NBD .
- hydrocarbons such as COD (1,5-cyclooctadiene), NBD (norbornadiene), COT (cyclooctatetraene) and 1,5-hexadiene, in particular COD and NBD .
- They are preferably pure hydrocarbons; however, the presence of heteroatoms, for example also in the form of functional groups, is also possible.
- X can be bromide, chloride, iodide or -O (CO) R2, preferably it is chloride or -O (CO) R2, in particular -O (CO) R2.
- non-aromatic monocarboxylic acid residues -O (CO) R1 and -O (CO) R2 mean identical or different non-aromatic C6-C18 monocarboxylic acid residues, each with the exception of a phenylacetic acid residue.
- nonaromatic used in this context excludes purely aromatic monocarboxylic acid residues, but not araliphatic monocarboxylic acid residues whose carboxyl function (s) is / are bonded to aliphatic carbon.
- -O (CO) R1 and -O (CO) R2 in no way denote a phenylacetic acid residue.
- -O (CO) R1 and -O (CO) R2 denote the same non-aromatic C6-C18 monocarboxylic acid residues, but in no case phenylacetic acid residues.
- Preferred among the non-aromatic C6-C18 monocarboxylic acid residues are monocarboxylic acid residues having 8 to 18 carbon atoms, ie non-aromatic C8-C18 monocarboxylic acid residues.
- non-aromatic C6-C18 or the preferred C8-C18 monocarboxylic acids with radicals -O (CO) R1 or -O (CO) R2 include hexanoic acids, heptanoic acids, octanoic acids, nonanoic acids, decanoic acids, to name just a few examples. It includes not only linear representatives but also those with branches and / or cyclic structures, such as, for example, 2-ethylhexanoic acid, cyclohexanecarboxylic acid and neodecanoic acid.
- the radicals R1 or R2 bonded to a carboxyl group in each case comprise 5 to 17 or even preferably 7 to 17 carbon atoms; Benzyl is excluded.
- Preferred examples of palladium complexes according to the invention include [(COD) Pd [O (CO) R1] 2 ] n and [(NBD) Pd [O (CO) R1] 2 ] n , where n is 1 or 2 and in particular 1, and where R1 is a non-aromatic C5-C17 hydrocarbon radical with the exception of benzyl.
- Preferred examples of rhodium complexes according to the invention include [(COD) Rh [O (CO) R1]] m and [(NBD) Rh [O (CO) R1]] m , where m is 2, and where R1 is a non-aromatic C5- C17 hydrocarbon radical with the exception of benzyl.
- Preferred examples of iridium complexes according to the invention include [(COD) Ir [O (CO) R1]] m and [(NBD) Ir [O (CO) R1]] m , where m is 2, and where R1 is a non-aromatic C5- C17 hydrocarbon radical with the exception of benzyl.
- the noble metal complexes according to the invention can be produced in a simple way by ligand exchange, in particular without using carboxylic acid salts of silver.
- the manufacturing process comprises mixing, suspending or emulsifying a two-phase system.
- One phase comprises an educt of the type LPdX2 or [LRhX] 2 or [LIrX] 2 each with X selected from bromide, chloride and iodide, preferably chloride, either as such or preferably in the form of an at least essentially water-immiscible organic solution such educt.
- the other phase comprises, for example, an aqueous solution of alkali metal salt (in particular sodium or potassium salt) and / or of magnesium salt of a C6-C18 monocarboxylic acid of the R1COOH type and optionally also of the R2COOH type.
- the choice of the type of monocarboxylic acid salt (s) depends on the type of noble metal complex according to the invention to be produced or the company of noble metal complexes according to the invention to be produced.
- the two phases are mixed intensively to form a suspension or emulsion, for example by shaking and / or stirring.
- the mixing is carried out, for example, for a period of 0.5 to 24 hours, for example at a temperature in the range from 20 to 50.degree.
- the ligand exchange takes place, the noble metal complexes according to the invention formed dissolving in the organic phase, while the alkali X salt or MgX 2 salt also formed dissolves in the aqueous phase.
- the organic and aqueous phases are separated from one another.
- the noble metal complex or complexes according to the invention formed can be obtained from the organic phase and, if necessary, subsequently purified by means of customary methods.
- (COD) Pd [O (CO) CH (C 2 H 5 ) C 4 H 9 ] 2 by joint emulsification of a solution of (COD) PdCl 2 in dichloromethane with an aqueous Solution of sodium 2-ethylhexanoate can be prepared.
- the solution containing common salt formed is separated from the dichloromethane phase and the (COD) Pd [O (CO) CH (C 2 H 5 ) C 4 H 9 ] 2 is isolated from the latter and, if necessary, purified by customary purification processes.
- the palladium complex (COD) Pd [O (CO) CH (C 2 H 5 ) C 4 H 9 ] Cl can, for example, also be prepared analogously with an appropriately chosen stoichiometry.
- the noble metal complexes according to the invention have good to unlimited solubility in customary organic solvents.
- the noble metal complexes according to the invention can be dissolved in aliphatics, cycloaliphatics, aromatics such as toluene or xylene, alcohols, ethers, glycol ethers, esters and ketones with the formation of real solutions, ie non-colloidal solutions.
- An important property in addition to said solubility in customary organic solvents is the comparatively low decomposition temperature of the noble metal complexes according to the invention, for example from 150.degree. C. up to generally not higher than 200.degree. This combination of properties makes it possible to use the noble metal complexes according to the invention for producing layers comprising noble metal on substrates.
- the organically dissolved noble metal complexes according to the invention can be applied to a substrate, for example directly as an organic solution or the organic solution can be part of a preparation having at least one further component.
- a noble metal complex according to the invention or a coating comprising noble metal complexes according to the invention can first be dried and freed from organic solvent before it or the dried residue is subjected to decomposition by thermal treatment to form a layer comprising noble metal.
- metallic palladium is formed in the form of a layer during thermal decomposition even in the presence of air as the surrounding atmosphere; in the thermal decomposition in the case of the embodiment of rhodium or iridium complexes according to the invention, on the other hand, in the presence of air as the ambient atmosphere, no noble metal layers but corresponding noble metal oxide layers form.
- layer comprising noble metal used herein as comprising or comprising palladium layer consisting therefrom, as a layer comprising or consisting of rhodium oxide or as a layer comprising or consisting of iridium oxide.
- the thermal treatment comprises heating to an object temperature above the decomposition temperature of a noble metal complex according to the invention or a company of noble metal complexes according to the invention. In general, this is done for a short time, for example, to an object temperature above the aforementioned decomposition temperature range of 150 ° C to 200 ° C, for example correspondingly to> 150 ° C to> 200 ° C, for example up to 250 ° C or even up to 1000 ° C, for example in an oven and / or by infrared radiation. In general, an object temperature slightly above the decomposition temperature is chosen. In general, the heating, more precisely maintaining the object temperature, does not take longer than 15 minutes.
- Palladium layers obtainable in this way are characterized by a high metallic luster comparable to a mirror, and the palladium layers are homogeneous in the sense of a smooth, non-grainy outer surface.
- the thickness of the layers comprising noble metal can be, for example, in the range from 50 nm to 5 ⁇ m and the layers comprising noble metal can have a flat nature with or without desired interruptions within the surface or have a desired pattern or design.
- the layers comprising noble metal can even be produced on temperature-sensitive substrates, that is to say for example on substrates that are not temperature-stable above 200.degree.
- it can be temperature-sensitive polymer substrates, for example those based on polyolefin or polyester.
- Example 1 production of (COD) Pd [O (CO) CH (C 2 H 5 ) C 4 H 9 ] 2 and its use for producing a palladium layer:
- a solution of 35 mmol (COD) PdCl 2 in 200 ml dichloromethane was stirred and a solution of 140 mmol of sodium 2-ethylhexanoate in 150 ml of water was added.
- the two-phase mixture was emulsified by vigorous stirring at 20 ° C. for 24 hours.
- the dichloromethane phase turned yellow.
- the dichloromethane phase was separated off and the solvent was distilled off.
- the viscous, yellow residue was taken up in petroleum spirit (40-60) and the solution with Dried magnesium sulfate and filtered.
- Example 2 preparation of (NBD) Pd [O (CO) CH (C 2 H 5 ) C 4 H 9 ] 2: Analogously to example 1, 35 mmol (NBD) PdCl 2 in 200 ml dichloromethane with 140 mmol sodium-2 -ethylhexanoate reacted in 150 ml of water.
- Example 3 Production of [(COD) Rh [O (CO) CH (C 2 H 5 ) C4H9]] m: Analogously to Example 1, 16.3 mmol of [(COD) RhCl] 2 in 200 ml of dichloromethane with 65, 3 mmol of sodium 2-ethylhexanoate reacted in 100 ml of water.
- Example 4 Production of [(COD) Ir [O (CO) CH (C 2 H 5 ) C4H9]] m: Analogously to Example 1, 16.3 mmol of [(COD) IrCl] 2 in 200 ml of dichloromethane with 65, 3 mmol of sodium 2-ethylhexanoate reacted in 100 ml of water.
- Example 5 preparation of (COD) Pd [O (CO) (CH 2 ) 5 C (CH 3 ) 3 ] 2 : Analogously to example 1, 35 mmol (COD) PdCl2 in 200 ml dichloromethane with 140 mmol sodium neodecanoate in 150 ml Water implemented.
- Example 6 Preparation of [(NBD) Rh [O (CO) CH (C 2 H 5 ) C 4 H 9 ]] m : Analogously to Example 1, 16.3 mmol of [(NBD) RhCl] 2 were added in 200 ml of dichloromethane reacted with 65.3 mmol of sodium 2-ethylhexanoate in 100 ml of water.
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Abstract
Description
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP20182155 | 2020-06-25 | ||
| PCT/EP2020/069185 WO2021259505A1 (de) | 2020-06-25 | 2020-07-08 | Edelmetalkomplexe mit diolefin und c6-c18 monocarboxylatliganden zur oberflächenbeschichtung |
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| US (1) | US20230242561A1 (de) |
| EP (1) | EP4172166A1 (de) |
| JP (1) | JP2023528800A (de) |
| KR (1) | KR20230005295A (de) |
| CN (1) | CN115803332A (de) |
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| WO (1) | WO2021259505A1 (de) |
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| DE102020214076A1 (de) | 2020-11-10 | 2022-05-12 | Heraeus Deutschland GmbH & Co. KG | Herstellungsverfahren für Edelmetall-Elektroden |
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| CA1340871C (en) | 1988-12-28 | 2000-01-04 | Robert W. Epperly | Method for reducing emissions from or increasing the utilizable energy of fuel for powering internal combustion engines |
| US5695815A (en) * | 1996-05-29 | 1997-12-09 | Micron Technology, Inc. | Metal carboxylate complexes for formation of metal-containing films on semiconductor devices |
| US8741037B2 (en) * | 2012-02-02 | 2014-06-03 | Xerox Corporation | Composition of palladium unsaturated carboxylate and palladium nanoparticles |
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- 2020-07-08 CN CN202080101386.9A patent/CN115803332A/zh not_active Withdrawn
- 2020-07-08 CA CA3182666A patent/CA3182666A1/en active Pending
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- 2020-07-08 WO PCT/EP2020/069185 patent/WO2021259505A1/de not_active Ceased
- 2020-07-08 KR KR1020227041358A patent/KR20230005295A/ko not_active Abandoned
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| US20230242561A1 (en) | 2023-08-03 |
| CA3182666A1 (en) | 2021-12-30 |
| KR20230005295A (ko) | 2023-01-09 |
| JP2023528800A (ja) | 2023-07-06 |
| CN115803332A (zh) | 2023-03-14 |
| WO2021259505A1 (de) | 2021-12-30 |
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