EP3959082A1 - Procédé de fabrication d'un élément de sécurité et élément de sécurité - Google Patents

Procédé de fabrication d'un élément de sécurité et élément de sécurité

Info

Publication number
EP3959082A1
EP3959082A1 EP20722995.6A EP20722995A EP3959082A1 EP 3959082 A1 EP3959082 A1 EP 3959082A1 EP 20722995 A EP20722995 A EP 20722995A EP 3959082 A1 EP3959082 A1 EP 3959082A1
Authority
EP
European Patent Office
Prior art keywords
embossing
grid
spacer structures
spacer
recess
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP20722995.6A
Other languages
German (de)
English (en)
Inventor
Kai Herrmann SCHERER
Raphael DEHMEL
Maik Rudolf Johann Scherer
Giselher Dorff
Moritz HÖFER
Christian Stöckl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Giesecke and Devrient Currency Technology GmbH
Original Assignee
Giesecke and Devrient Currency Technology GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Giesecke and Devrient Currency Technology GmbH filed Critical Giesecke and Devrient Currency Technology GmbH
Publication of EP3959082A1 publication Critical patent/EP3959082A1/fr
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/425—Marking by deformation, e.g. embossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/324—Reliefs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/373—Metallic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/43—Marking by removal of material
    • B42D25/44—Marking by removal of material using mechanical means, e.g. engraving

Definitions

  • the invention relates to a method for producing a security element, as well as a corresponding security element for securing security papers, documents of value and other data carriers.
  • Data carriers such as value or identity documents, or other objects of value, such as branded articles and packaging or outer packaging of high-quality branded articles, are often provided with security elements that allow the authenticity of the data carrier to be checked and at the same time provide protection serve for unauthorized reproduction.
  • a so-called washing process is often used to produce subregions only partially provided with a cover layer, as is basically described, for example, in the publication WO 99/13157.
  • a substrate that is only to be provided with the desired top layer in some areas is first printed with a desired pattern using a printing ink with a high pigment content. Due to the high pigment content, the printing ink forms a porous, raised ink application after drying. A top layer is then applied to the printed substrate, which only partially covers the ink in the area of the ink application due to its large surface and porous structure.
  • the paint application and the overlying cover layer can then be removed by washing out with a suitable solvent, so that recesses in the form of the pattern printed on are produced in the cover layer in the originally printed areas of the substrate.
  • a suitable solvent such as a solvent for removing recesses in the form of the pattern printed on.
  • it has been shown that such a washing process does not lead to satisfactory results under some circumstances. If, for example, there are embossed structures in the substrate to be coated which have no or only slight height variations over larger partial areas, there is a risk when applying the washing color due to the large contact area with the washing color cylinder that a washing color toning film is unwantedly deposited in such partial areas and therefore the desired recess pattern is not produced in the subsequent washing step.
  • the invention is based on the object of avoiding the disadvantages of the prior art and, in particular, of specifying a generic manufacturing method with which large-area, structured subregions can also be reliably manufactured in a washing method.
  • the invention is also intended to provide a correspondingly manufactured security element.
  • a carrier is provided with an embossing lacquer layer and the embossing lacquer layer is provided with a desired effect embossing, in particular a micromirror embossing or a hologram embossing, a color is applied in areas to the embossed embossing lacquer layer, a cover layer is applied to the area of the embossing lacquer layer that is provided with color in certain areas and the color with the cover layer on it is subsequently removed,
  • large-area partial areas of the embossed effect which should remain uncoated during the subsequent color imprint, are formed with a dot and / or line grid of small spacer structures, which is not visually recognizable with the naked eye when viewing the security element and the spacer structures have lateral dimensions of more than 2 gm in each spatial direction.
  • the color can be removed, for example, by etching, lasering, washing or using an adhesive element or an adhesive element.
  • a carrier is provided with an embossing lacquer layer and the embossing lacquer layer is provided with a desired effect embossing, in particular a micromirror embossing or a hologram embossing, a wash color is applied in areas to the embossed embossing lacquer layer in washing ink printing, and
  • a cover layer is applied to the surface area of the embossing lacquer layer that has been provided with washing ink in some areas and the washing ink with the cover layer on it is subsequently removed.
  • the invention also contains a security element for securing security papers, documents of value and other data carriers, with a carrier with an embossing lacquer layer which is provided with an effect embossing, in particular a Fresnel structure, micro-mirror embossing or a hologram embossing, and in the case of the effect embossing be richly a top layer is applied.
  • an effect embossing in particular a Fresnel structure, micro-mirror embossing or a hologram embossing, and in the case of the effect embossing be richly a top layer is applied.
  • a dot and / or line grid of small spacer structures is formed in large areas of the effect embossing provided with the cover layer, which is not visually recognizable with the naked eye when the security element is viewed and in which the spacer structures are lateral Have dimensions of more than 2 pm in each spatial direction.
  • the carrier is in particular made of a film, for example a thermoplastic, such as polymethyl methacrylate (PMMA).
  • a film for example a thermoplastic, such as polymethyl methacrylate (PMMA).
  • the spacer structures are formed in particular from the embossing lacquer of the embossing lacquer layer.
  • the embossed effect can also be a vellum area, which is designed, for example, as a surface area with a relatively unstructured surface.
  • the vellum area is thus characterized in that it is small compared to a main surface or a surface area of the carrier Inclination, in particular less than 5 °, and / or a slight height variance, in particular less than 500 nm.
  • a partial area of the effect embossing is regarded as having a large area if it has an expansion of more than 100 ⁇ m, in particular of more than 250 ⁇ m, in each lateral direction.
  • the spacer structures can form a grid with a constant stand from the grid elements, the symmetry of the grid in particular the symmetry of a square grid, rectangular grid, diamond grid, hexagonal grid or parallelogram grid.
  • the spacer structures can also be displaced with respect to the starting positions of the grid positions of such grids in order to form a "shaky" grid that generates particularly low differences for active interference.
  • the shift can be up to 5%, 10% or even up to 25% of the starting distance in the grid.
  • the lateral dimensions of the spacer structures are at least 2 mih in all spatial directions in order to minimize disruptive diffractive color splitting.
  • the lateral dimensions of the spacer structures are further advantageously at least in one spatial direction, preferably even in both spatial directions, below 40 ⁇ m, preferably below 30 ⁇ m, in particular below 20 ⁇ m.
  • the base of the structures is preferably at least 3-sided and can in particular be 4, 5 or 6-sided. Round, in particular circular or elliptical, base areas are also possible.
  • the ratio of length to width of the base area is advantageously between 0.25 and 4.
  • the expedient tapering of the spacer structures reduces the base area towards the upper contact surface of the spacer structures by at least 20%, advantageously by at least 40%.
  • the flanks of the spacer structures can converge at one point, for example in the case of spacer structures in the form of a pyramid, a cone or a hemisphere.
  • the aspect ratio height: length or height: width is advantageously between 0.05 and 2, preferably between 0.1 and 1.
  • the absolute height of the spacer structures is expediently below 5 ⁇ m, in particular below 3 ⁇ m, and is particularly advantageous at about 1 to 2 pm.
  • the area coverage of the spacer structures is advantageously below 20%, particularly advantageously below 17% and in particular below 10%, in order not to reduce the effective hologram area too much.
  • the area coverage in a vellum area is preferably below 10%, in particular 5%, preferably below 1%.
  • the cover layer typically consists of metal, such as aluminum, chromium, copper and / or metal alloys. In one embodiment, it can be provided that the cover layer consists of several layers, in particular metal layers, for example chromium and aluminum. In one refinement, the cover layer can be designed as an interference layer which comprises a dielectric layer.
  • the spacer structures form a regular grid with constant spacing of the grid elements, the grid in particular having the symmetry of a square grid, rectangular grid, diamond grid, hexagonal grid or parallelogram grid having.
  • the spacer structures form an irregular grid with varying spacing of the grid elements, wherein the grid is built on the basis of a square grid, rectangular grid, diamond grid, hexagonal grid or parallelogram grid, and the spacer structures from up to 25%, advantageously by up to 10%, against the starting positions at a constant distance are moved.
  • the displacement of the spacer structures is advantageously carried out in an irregular manner, in particular in the case of a point-like grid structure, it also being possible to provide a displacement in the case of a differently designed spacer structure.
  • An irregular shift can be generated in particular with the aid of random numbers or pseudo-random numbers.
  • the spacer structures of the dot and / or line grid in the large area effect areas advantageously have an area coverage of less than 20%, preferably less than 17% and in particular less than 10%.
  • the aspect ratio height: width of the spacer structures in the method or the security element is advantageously between 0.05 and 2, preferably between 0.1 and 1.
  • the aspect ratio height: length is also Spacer structures between 0.05 and 2, preferably between 0.1 and 1.
  • the height of the spacer structures i.e. the vertical extent of the spacer structures above the plane of the embossing lacquer layer, is advantageously below 10 ⁇ m in the method or the security element, in particular below 4 ⁇ m and is particularly advantageously around 1 to 2 ⁇ m.
  • Spacer structures that are cuboid, pyramidal, truncated pyramidal, conical, frustoconical or hemispherical have proven to be particularly advantageous in the method or the security selement.
  • the spacer structures are designed to taper upwards, the upper contact surface advantageously being at least 20%, advantageously at least 40%, particularly advantageously at least 60% smaller than the base area.
  • the contact area between the spacer structures and the wash color printing cylinder is minimized, so that as little wash color as possible is transferred to the spacer structures themselves.
  • the tapering spacer structures can be particularly easily demolded from an embossing tool, so that reliable and precise manufacture is ensured.
  • the spacer structures can also be provided with a hydrophobic nanostructuring on their upper contact surface in order to suppress the adhesion of washing paint.
  • the spacer structures are arranged in the form of characters, patterns or a code in order to form a hidden authenticity feature that can only be perceived with auxiliaries. This can be done with local compression or thinning of the spacer structures.
  • the spacer structures can advantageously also have side surfaces which are provided with microstructures or nanostructures. Such structures are at most recognizable from a very steep viewing angle and do not appear at viewing angles that dominate the normal handling of value or security documents.
  • the spacer structures are provided with a micro- or nanostructure on their upper contact surface.
  • the micro- or nanostructure can correspond to the optical effect of the effect stamping.
  • the spacer structures can still visually match the effect embossing so that the spacer structures have no visual effect when viewed.
  • At least one spacer structure of the spacer structures is at least partially, in particular completely, around the spacer structure circumferential, and in particular directly adjoining the spacer structure, recess, in particular special in the embossing lacquer layer is formed.
  • recess in particular special in the embossing lacquer layer is formed.
  • the depression is designed as a trench or channel.
  • the recess is annular.
  • the trench can correspond in cross-section to a right-angled triangle, the right angle of this triangle being formed in particular between the surface of the embossing lacquer layer and a wall of the embossing lacquer layer formed opposite the spacer structure or support structure.
  • the depression is formed with a depth of less than 10 ⁇ m, in particular less than 5 ⁇ m, preferably between 0.1 ⁇ m and 2 ⁇ m. This displaces sufficient material to produce the spacer structure.
  • the recess is formed with a depth which corresponds to the height of the spacer structure.
  • the height of the spacer structure is in particular determined by the plane through which the main surface of the embossing lacquer layer runs and the point of the spacer structure that is furthest away from the carrier.
  • the depth of the recess is in particular be determined by the plane through which the main surface of the embossing lacquer layer runs and the point of the recess furthest from the carrier.
  • the recess is formed with an air volume which is essentially, in particular at least, equal to a material volume of the spacer structure. This also makes it easy to displace the same amount of material from the recess that is required for the spacer structure.
  • the air volume is present in particular in the space filled with air or not filled with carrier material, which space is restricted by the side walls of the depression and the imaginary continuous surface of the carrier.
  • the invention also relates to an apparatus for producing a spacer structure.
  • the device has a base element and an embossing element, the embossing element being designed at least as a recess in the base element, and the embossing element being designed in particular as a negative cone shape.
  • the embossing element can also be designed in the shape of a pin.
  • the device for producing the spacer structure is preferably formed from metal, for example from a nickel-based alloy.
  • the embossing elements are pressed into the embossing lacquer layer and the material displaced by the embossing elements is moved, in particular pressed, into the recess of the base element.
  • the spacer structure is formed by the recess in the device.
  • the embossed elements or pins form a direct extension of the, preferably conical, spacer structure.
  • the spacer structure is conical. Due to the conical shape, the material transport to the center of the spacer structure is carried out with less effort.
  • the embossing element has a recess embossing which is raised relative to the base element and at least partially encompasses the recess.
  • the recess embossing or the pegs it is possible to push or displace material from the embossing lacquer layer. In particular, this material is moved into the recess and creates a spacer structure there.
  • the volume of the recess embossing device is equal to the volume of the recess.
  • the spacer structure can be produced entirely with material that is displaced by the embossing element.
  • FIG. 1 shows a schematic representation of a section of the effect area of a holographic security element in the step of applying washing color, with (a) showing a cross section and (b) a plan view of the security element,
  • Fig. 2 is a schematic representation as in Fig. 1 (b) for an Ab
  • FIG. 3 in a schematic representation a section of the effect area of a micromirror security element in the step of applying washing paint, with (a) a cross section and (b) a plan view of the security element shows
  • Fig. 4 is a schematic representation of a point grid from small spacer structures from, in which a hidden authenticity feature is coded times
  • Fig. 5 is a schematic sectional view of a spacer struc ture with a recess
  • Fig. 6 is a schematic sectional view of a device for
  • FIG. 1 shows schematically a section of the effect area of a holographic security element in an intermediate step of production, namely the step of applying washing color.
  • FIG. 1 (a) shows a cross section and
  • FIG. 1 (b) shows a top view of the security element.
  • an embossing lacquer layer 14 was first applied to a carrier 12, for example a PET film, and this was then provided with the desired hologram embossing 16 in an embossing step.
  • the embossing lacquer layer 14 is preferably formed from a material that can be hardened by UV radiation, for example a thermoset.
  • a washing ink 24 is applied to the embossed embossing lacquer layer 14 in the areas to be cut out by means of a washing ink cylinder 20 in the washing ink printing.
  • the embossing lacquer layer is metallized over the entire surface and the washing color is then removed together with the metallization on it, so that in the metallization just in the previously areas of the embossing lacquer layer provided with washing ink are generated.
  • an unintentional transfer of the wash color 24 to the hologram embossing 16 should be prevented with the help of the wash color cylinder.
  • a region is regarded as having a large area which has an extension of more than 100 mhti, in particular of more than 250 ⁇ m, in each lateral direction. In the case of smaller areas, the risk of a toning film being unintentionally deposited has been found to be low, so that no special measures are required there.
  • the corresponding effect areas were formed according to the invention with a point grid 30 of small spacer structures 32.
  • the grid of points 30 fulfills two conditions that are decisive for the present invention: the spacer structures 32 are on the one hand so small and have such a small area coverage that the grid of points 30 cannot be visually recognized with the naked eye when viewing the security element 10. At the same time, due to the large lateral dimension of 5 gm in every spatial direction compared to the light wavelength, hardly any disruptive color-splitting diffraction effects occur on the spacer structures.
  • the spacer structures 32 protruding above the hologram embossing 16 prevent the washing ink cylinder 20 or washing ink toning film 22 from coming into contact with the surface of the hologram embossing in undesired areas and depositing a toning film there.
  • the spacer structures 32 can be produced both by means of electron beam lithography and by means of laser lithography.
  • the two lithography processes can also be combined with one another using combined processes.
  • the spacer structures 32 are already produced with the production of the embossed structures on the embossing tool.
  • the embossed structures and the spacer structures are molded into the embossing lacquer.
  • the point grid 30 can also be designed to be slightly “blurred”, as shown in FIG.
  • the positions of the spacer structures 34 are each shifted in an irregular manner by a few percent from their equidistant starting positions 36 (shown in dashed lines).
  • the shift is a maximum of 10% of the initial distance, but can also be up to 25% of the starting distance of the starting positions in other configurations.
  • the spacer structures 32, 34 are further tapered towards the top and thus have the shape of a truncated pyramid. This minimizes the contact area with the washing ink printing cylinder in order to transfer as little washing ink as possible to the spacer structures.
  • the tapering spacer structures can be particularly easily removed from the embossing tool, which ensures reliable and precise manufacture.
  • the spacer structures can form a grid with a constant stand from the grid elements, the symmetry of the grid is in particular the symmetry of a square grid, rectangular grid, diamond grid, hexagonal grid or parallelogram grid.
  • the spacer structures can also be displaced with respect to the starting positions of the grid positions of such grids in order to form a "shaky" grid that generates particularly low differences for active interference.
  • the shift can be up to 5%, 10% or even up to 25% of the starting distance in the grid.
  • the lateral dimensions of the spacer structures are at least 2 mih in all spatial directions in order to minimize disruptive diffractive color splitting. Further advantageously, the lateral dimensions of the spacer structures are at least in one spatial direction, preferably even in both spatial directions, below 40 ⁇ m, preferably below 30 ⁇ m and in particular below 20 ⁇ m.
  • the base of the structures is preferably at least 3-sided and can in particular be 4, 5 or 6-sided. Round, in particular circular or elliptical, base areas are also possible.
  • the ratio of length to width of the base area is advantageously between 0.25 and 4.
  • the useful tapering of the spacer structures reduces the base area towards the upper contact surface by at least 20%, advantageously by at least 40%.
  • the flanks of the spacer structures can converge at one point, for example in the case of spacer structures in the form of a pyramid, a cone or a hemisphere.
  • the aspect ratio height: length or higher width is advantageously between 0.05 and 2, preferably between 0.1 and 1.
  • the absolute height the spacer structures is expediently below 5 gm, in particular below 3 gm and is particularly advantageously around 1 to 2 gm.
  • the area coverage of the spacer structures is advantageously below 20%, particularly advantageously below 17% and in particular below 10%, in order not to reduce the effective hologram area too much.
  • the area coverage in the vellum area is preferably below 10%, in particular 5%, preferably below 1%.
  • FIG. 3 shows a further application of the spacer structures according to the invention in the step of applying washing color during the production of a micromirror security element.
  • FIG. 3 (a) shows a cross section and
  • FIG. 3 (b) shows a plan view of the security element.
  • an embossing lacquer layer 14 was first applied to a carrier 12, for example a PET film, and this was then provided with the desired micromirror embossing 40 in an embossing step.
  • the micromirrors of the effect area are parallel to the carrier surface, that is, they have a tilt angle ⁇ to the security element upper surface equal to or close to 0 °.
  • a wash color is then applied in areas to the embossed embossing lacquer layer 14 using a wash color cylinder (not shown in FIG. 3). After the wash color has been applied, the embossing lacquer layer is metallized over the entire surface or with a high-index coating over the entire surface Layer steamed. The washing ink is then removed together with the cover layer on it, so that recesses are created in the cover layer precisely in the areas of the embossing lacquer layer that are to be pre-printed.
  • micromirror embossing 40 in the flat areas with mirror angles close to 0 ° has only slight height variations and thus a large contact area with the washing ink cylinder, there is a risk that in large flat areas 42 a washing ink toning film is unintentionally deposited by the washing ink cylinder on areas that are actually uncoated should last.
  • these areas can be formed with a point grid from small spacer structures, as already described in more detail in connection with FIGS. 1 and 2.
  • line grids from the spacer structures in particular line grids made from continuous or broken lines, for example a cross grid, can be used.
  • a line grid 46 of narrow, linear spacer structures 44 is formed in the large flat areas 42 in the exemplary embodiment.
  • the spacer lines 44 have a width of 4 pm, an average spacing of 40 pm and a height of 2 pm.
  • the area coverage of the line grid 46 in the areas 42 is therefore 10%.
  • the spacer lines 44 are so narrow and their area coverage is so small that the line grid 46 cannot be visually recognized with the naked eye when viewing the security element 10.
  • the width of the spacer lines is 4 mhi, however, well above the light wave length, so that hardly any color-splitting diffraction effects occur.
  • the line grid 46 is designed to be slightly "shaky" for the additional suppression of diffraction effects, the distance between adjacent spacer lines being irregularly increased or decreased by up to 20% compared to their equidistant starting positions.
  • the spacer lines 44 protruding above the micromirror embossing 40 reliably prevent the washing ink cylinder from depositing a toning film on the flat micromirror area 42 in undesired areas.
  • the spacer lines 44 are tapered towards the top and are provided with a hydrophobically acting nanostructuring 48 on their upper contact surface. These measures ensure that no wash color is transferred to the spacer lines 44 themselves.
  • the spacer lines can form a grid with a constant distance between the lines.
  • the lines can be continuous or interrupted and also include an angle other than 0 °.
  • Several line systems can also be provided, which are arranged, for example, in the form of a cross grid.
  • the spacer lines can be shifted in relation to the starting positions of a regular grid in order to form a "shaky" grid which generates particularly low diffractive disturbances. The shift can be up to 5%, 10% or even up to 25% of the starting distance.
  • the lateral widths of the spacer lines are at least 2 gm in order to minimize diffractive effects.
  • the useful tapering of the spacer lines reduces the cross-sectional area by at least 20%, advantageously by at least 40%.
  • the flanks of the spacer lines can converge on a line so that the spacer lines form a roof structure.
  • Width is advantageously between 0.05 and 2, preferably between 0.1 and 1.
  • the absolute height of the spacer lines is expediently below 5 gm, in particular below 3 gm, and is particularly advantageously around 1 to 2 gm.
  • the surface coverage of the spacer structures can be higher than with holographic embossing, since the spacer structures themselves look optically smooth except for the side surfaces and their optical effect is therefore similar to the flat micromirrors.
  • the area coverage is advantageously below of 20%, particularly advantageously below 15%, in particular below 10%.
  • a combined point and line grid can also be used with the micromirror embossing, which has both point and line spacer structures.
  • a hidden security feature can also be encoded in a point grid 30 of small spacer structures 32.
  • individual spacer structures 32 for example in the form of a letter (here the letter "E") or some other coding, a characteristic identification 50 of the embossing tool used can be introduced into the security element.
  • FIG. 5 shows a sectional illustration of the security element 10 with the carrier 12 and the embossing lacquer layer 14.
  • a spacer structure 32, 34 is formed in the embossing lacquer layer 14.
  • the spacer structure 32, 34 conical in the exemplary embodiment, is of a Surrounding recess 52, in particular completely. Furthermore, according to the exemplary embodiment, the recess is directly adjacent to the spacer structure 32, 34.
  • the spacer structure 32, 34 has a height 52.
  • the recess has a depth 54.
  • the height 52 and the depth 54 are preferably the same size. According to the exemplary embodiment, the height 52 and the depth 54 added together are 1 pm to 8 mht, preferably 2 pm to 6 pm, in particular 2 pm to 3 pm.
  • the 6 shows a device 58 for producing the spacer structure 32, 34.
  • the device 58 is designed in particular as a stamp or embossing tool.
  • the device 58 is preferably made of metal, in particular a nickel-based alloy.
  • the device 58 can be produced, for example, by molding in several interim steps with different sized positive molds and negative molds.
  • the device 58 can for example also be milled.
  • the device 58 has a base element 60 and an embossing element 62.
  • the base element 60 is designed in particular as a stamp base or stamp main plate.
  • the embossing element 62 is designed to shape the raised part of the, in particular conical, spacer structure 32, 34.
  • the embossing element 62 is preferably designed to be rotationally symmetrical.
  • the embossing element has a recess 66.
  • the device also has a recess embossing device 64.
  • the recess stamping device 64 is designed to produce the recess 52.
  • the Vertie fungsconceger 64 appears in the cross-sectional drawing of FIG. 6 as two before standing pins.
  • the recess embossing device 64 is preferably designed to be rotationally symmetrical.

Abstract

L'invention concerne un procédé de fabrication d'un élément de sécurité (10), selon lequel un support (12) est muni d'une couche de vernis d'estampage (14) et ladite couche de vernis d'estampage (14) est munie d'un estampage d'effet (16) voulu, en particulier d'un estampage micromiroir (40) ou d'un estampage hologramme (16), une encre lavable étant appliquée par endroits sur la couche de vernis d'estampage (14) estampée, et une couche de recouvrement étant appliquée sur la zone superficielle de la couche de vernis d'estampage, munie par endroits de l'encre lavable et ensuite, l'encre lavable est éliminée conjointement avec la couche de recouvrement qui se situe dessus. Selon l'invention, des zones partielles étendues de l'estampage d'effet (16) qui doivent demeurées dégagées lors du processus d'impression d'encre lavable subséquent, sont conçues avec une trame à points et/ou en lignes (30) composée de petites structures d'espacement (32), visuellement non perceptible lorsque l'élément de sécurité (10) est observé à l'œil nu et pour laquelle les structures d'espacement (32) présentent des dimensions supérieures à 2 μm dans chaque direction spatiale. L'invention concerne également un élément de sécurité fabriqué en conséquence.
EP20722995.6A 2019-04-26 2020-04-23 Procédé de fabrication d'un élément de sécurité et élément de sécurité Pending EP3959082A1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102019003042 2019-04-26
DE102019006978.1A DE102019006978A1 (de) 2019-04-26 2019-10-08 Verfahren zum Herstellen eines Sicherheitselements und Sicherheitselement
PCT/EP2020/000088 WO2020216466A1 (fr) 2019-04-26 2020-04-23 Procédé de fabrication d'un élément de sécurité et élément de sécurité

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EP3959082A1 true EP3959082A1 (fr) 2022-03-02

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EP (1) EP3959082A1 (fr)
DE (1) DE102019006978A1 (fr)
WO (1) WO2020216466A1 (fr)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19739193B4 (de) 1997-09-08 2006-08-03 Giesecke & Devrient Gmbh Verfahren zur Herstellung von Sicherheitsfolien für Wertpapiere
DE102008008685A1 (de) * 2008-02-12 2009-08-13 Giesecke & Devrient Gmbh Sicherheitselement und Verfahren zu seiner Herstellung
DE102017004784A1 (de) * 2017-05-18 2018-11-22 Giesecke+Devrient Currency Technology Gmbh Verfahren zum Herstellen eines Sicherheitselements mit einem metallisierten Reliefbereich und zugehöriges Sicherheitselement

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DE102019006978A1 (de) 2020-10-29
WO2020216466A1 (fr) 2020-10-29

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