EP3903127A1

EP3903127A1 - Interference layer system without a carrier substrate, method for producing same, and use thereof

Info

Publication number: EP3903127A1
Application number: EP20705987.4A
Authority: EP
Inventors: Bernhard Von Blanckenhagen
Original assignee: Carl Zeiss Vision International GmbH
Current assignee: Carl Zeiss Vision International GmbH
Priority date: 2019-02-22
Filing date: 2020-02-21
Publication date: 2021-11-03
Also published as: CN113490866B; EP3699648A1; CN113490866A; US20220107451A1; WO2020169839A1

Abstract

The invention relates to an interference layer system, comprising a plurality of optically transparent layers. The interference layer system does not have a carrier substrate, and the optically transparent layers are arranged so as to lie flatly one on top of the other. The optically transparent layers are selected from the group consisting of dielectrics, metals, and combinations thereof. At least one first optically transparent layer has a refractive index n₁, and at least one second optically transparent layer has a refractive index n2, said first refractive index n₁ and second refractive index n₂ differing by at least 0.1. The invention additionally relates to the production and use of the interference layer system.

Description

Interference layer system without a carrier substrate, method for producing the same and its use

The present invention relates to an interference layer system which comprises a plurality of optically transparent layers. The present invention also relates to a method for producing such an interference layer system and its use.

Optical interference layer systems have been known for a long time and are used for a wide variety of purposes. Common to all is optical

Interference layer systems that layers are used whose thickness is in the order of magnitude of the wavelength of light. Depending on whether an optical interference layer system is designed for short wavelengths, for example the UV spectral range, or for longer wavelengths, for example the infrared (IR) spectral range, different layer thicknesses result.

Optical interference layer systems consist of stacks of layers with different refractive indices. Depending on the task at hand, layer stacks with different numbers of individual layers, different numbers of different layer materials and different layer thicknesses result.

Based on the physical laws of optical interference layers, the optical properties of surfaces for the light can be changed in a defined manner, so that special technical requirements can be implemented.

One example is the reduction of the reflectivity of a surface, such an application of an interference layer system also being referred to as an anti-reflective layer or an anti-reflective layer. For example, in the visible spectral range, ie from about 380 nm to about 780 nm, the reflection of a glass with a refractive index of n = 1.5 is about 4%.

By applying an interference layer system, which as

If the anti-reflective coating is designed, the reflection can be reduced to values below 1% in the visible spectral range. Such anti-reflective coatings are widely used in optical systems in which each lens surface has such an anti-reflective coating. Also found on eyeglass lenses

Use of anti-reflective coatings, as is known from EP 2 437 084 A1.

In addition to anti-reflective coating, suitably designed interference layer systems are also widely used for applications to increase reflection, e.g. in mirror layer systems, in wavelength filtering, e.g. in the case of color filters, when dividing a luminous flux into 2 polarized components, e.g. in polarization beam splitters, in the division of wavelength ranges, e.g. with long-pass or short-pass filters, as well as with the generation of defined phase shifts. All of these

Applications have in common that the interference layer system is applied to a substrate. In addition to the pure support function of the substrate for the

Interference layer system, many substrates also contribute to the optical imaging of an optical system by acting, for example, as lenses, imaging mirrors, beam splitter plates or beam splitter cubes. With regard to the mode of operation, these substrates are not part of the optical interference layer system, since these substrates are typically thicker than the coherence length of the light used. In general terms, the coherence length of light is the length over which electromagnetic waves are able to interfere. If a layer or a substrate is thicker than this length, this layer or the substrate does not contribute to the optical interference.

There is a need for optical filters that are selectively defined

Can filter out or reflect wavelength ranges from irradiated light, for example sunlight. There is also a need for optical filters which can be selectively adjusted with regard to the spectral range to be filtered or reflected, for example in addition to a reflector effect for the UV-A component Sunlight also have a filter effect into the blue spectral range of visible light or, for example, a selective filter effect for the IR component of sunlight. There is also a need for filters whose dimensions can be reduced in a simple manner. In particular, it is desirable to have such a filter after being crushed

For example, it can be used in an application medium and is harmless to humans and the environment.

For use in an application medium such as a lacquer or in a printing ink, interference layer systems in the form of pearlescent pigments are known from EP 0 950 693 A1

Have carrier substrate and produce a color impression in a viewer.

In the case of the pearlescent pigments known from EP 0 950 693 A1, high and low refractive index layers are applied wet-chemically to a substrate platelet, for example SiO 2 platelets, etc. The pearlescent pigments generally produce a color impression that is angle-dependent for the viewer. In the case of pearlescent pigments, therefore, a layer structure that is symmetrical to the substrate platelet usually results on the upper side and the underside of the substrate platelet, the high and low refractive index layers being closed in the edge areas due to the envelope. The outermost layer envelops the

next inner layer, which in turn envelops the next inner layer, etc. In the application described in EP 0 950 693 A1, however, there is the disadvantage that the possibilities for setting the spectral behavior are limited, for example because only a very limited number of layers can be deposited during the production of these pigments.

EP 1 270 683 A2 relates to an optical multilayer system based on a

Metal substrate on which at least one colorless dielectric layer with a refractive index n <1.8 and one colorless dielectric layer with a refractive index n> 1.8 as well as a selectively or non-selectively absorbing layer are applied. DE 41 24 937 A1 discloses an interference layer system with dielectric and / or metallic layers, the layer system having a layer holder in the edge zone.

US 2002/0171936 A1 relates to a multilayer interference filter in which a central area of the filter is essentially stress-free and unsupported. The filter has a frame surrounding the central area.

US 2004/0070833 A1 relates to a Fabry-Perot filter in which a multilayer system is arranged between a first reflector and a second reflector.

In view of the known art, there is a need for

Provision of a filter system with improved filter properties.

The object on which the present invention is based is achieved by providing an interference layer system comprising a plurality of optical

transparent layers, according to claim 1, wherein the

Interference layer system has no carrier substrate and wherein the optically transparent layers are arranged flat on top of one another, the optically transparent layers from the group consisting of dielectrics, metals and

Combinations thereof are selected, wherein at least one first optically transparent layer has a refractive index m and at least one second optically transparent layer has a refractive index r2 and wherein the first refractive index m and the second refractive index r2 differ by at least 0.1.

The object on which the invention is based is also achieved by providing an interference layer system according to claim 23. Preferred developments are specified in claims 24 to 29.

According to the invention, the reflection curve of the interference layer system has at least two ranges in a wavelength range from 300 nm to 800 nm

different reflection on. These at least two areas of different reflection can be used in the design of the interference layer system within the Wavelength range from 300 nm to 800 nm can be selected or set in a defined manner. Thus, the present invention allows one to be provided

Interference layer system in which the at least two wavelength ranges of different reflection in a wavelength curve from 300 nm to 800 nm can be freely selected and / or adjusted as required.

In the context of the invention, “optically transparent layer” or “optically transparent layers” is understood to mean that the layer or layers in the

Substantially no light in the visible spectral range, preferably no light in the visible spectral range, and / or essentially no radiation in the IR range, preferably no radiation in the IR range, absorbed or absorb. “Essentially no absorption” is understood to mean low absorption. The optically transparent layer (s) is / are preferably transparent to light in the visible spectral range or to radiation in the IR range. Preferably, the “optically transparent layer (s) is / are essentially transparent only to light in the visible spectral range. Preferably, the “optically transparent layer (s) is / are essentially transparent only to radiation in the IR range. According to one embodiment of the invention, “optically transparent layer” or “optically transparent layers” is preferably understood to mean that the materials from which the layer is built up or the layers are built up are preferably only slightly in the visible spectral range , more preferably no, have absorption.

The visible spectral range covers a wavelength range from 380 nm to 780 nm.

In the context of the invention, the IR range (IR: infrared radiation) detects near IR in a wavelength range from 800 nm to 1100 nm.

The UV-A range (UV: ultraviolet radiation) covers a wavelength range from 315 nm to 400 nm in the context of the invention.

For an individual layer in the context of the invention, “transparent” is understood to mean that at least 20% of the incident on an optically transparent layer visible light or the incident IR radiation passes through the layer. The transparency of a layer is preferably in a range from 25% to 100%, more preferably from 30% to 98%, more preferably from 40% to 95%, more preferably from 45% to 90%, more preferably from 50% to 85%, more preferably from 55% to 80%, more preferably from 60% to

75%.

When several optically transparent layers are arranged one above the other in a layer package, the transmission is determined by the interference effects. Over the course of the spectrum, there can therefore be wavelength ranges with high transmission and wavelength ranges with low transmission. A layer package that consists of the plurality of optically transparent layers preferably has a transmission of more than 20%, preferably at a desired level

Wavelength range. The transmission of the entire layer package is preferably in a range from 25% to 100%, more preferably from 30% to 98%, more preferably from 40% to 95%, more preferably from 45% to 90%, more preferably from 50% to 85%, more preferably from 55% to 80%, more preferably from 60% to 75%, each in a desired wavelength range.

With regard to the optical properties, the optical properties of the materials from which the layers are constructed are preferably defined by the refractive index n and more preferably by the absorption index k. Optically transparent layer materials preferably have an absorption index k <0.008, more preferably k <0.005, more preferably k <0.003, more preferably k <0.001, in the spectral range which is determined by the respective application. The absorption index is also called

Extinction coefficient or called the imaginary part of the complex refractive index.

For the purposes of the invention, the details of the refractive indices m and n2 and the absorption index k relate consistently to the respective refractive index or absorption index measured at a wavelength of 550 nm. The classic refractive index, also called the refractive index or optical density, is an optical material property. The classic refractive index is the ratio of the wavelength of light in a vacuum to the wavelength in the material. Of the

The refractive index is dimensionless and generally depends on the frequency of the light.

The complex refractive index is made up of a real part n _r , i.e. the classical refractive index, and an imaginary part k according to formula (I): n = nr-i / c (I)

The complex refractive index describes both the temporal and spatial progression of the wave and its absorption. The real-valued component n _r , which is usually greater than 1, shortens the wavelength in the medium. The complex-valued part dampens the wave.

In the context of the invention, an interference layer system is understood to mean an arrangement of several optically transparent layers in which, when light is irradiated, there is constructive and destructive interference on the individual optically transparent layers due to reflection and transmission phenomena. Among several optically transparent layers are at least 2, preferably at least 4, more preferably at least 6, more preferably at least 8, more preferably at least 10, more preferably at least 12, more preferably at least 14, more preferably at least 16, particularly preferably at least 18 and very particularly preferably understood at least 20 optically transparent layers. If the absorption index k of at least one optically transparent layer k> 0, preferably k> 0.008, the absorption of incident light also plays a role. The transmission is reduced by absorption. According to a preferred embodiment, the interference layer system according to the invention consists exclusively of this arrangement of several optically transparent layers, in which constructive and destructive interference occurs when light is irradiated due to reflection and transmission phenomena on the individual optically transparent layers. According to the invention, the interference layer system is a stack optically transparent layers as specified in claim 1 for generating optical interference. As a result of these reflection and transmission phenomena on the various layers of the interference layer system, there is a reduction in the intensity of the transmitted light in certain areas

Wavelength ranges, preferably to an extinction of

Wavelength ranges or destructive interference, creating an optical

Filter effect is generated. The interference layer system in the context of the invention can also be referred to as an interference filter.

The interference layer system of the present invention does not have a carrier substrate. The interference layer system according to the invention therefore does not contain any

Platelet-shaped substrates, such as glass flakes, SiO 2 flakes, A Os flakes, natural or synthetic mica flakes, etc.

Plastic plate, etc. arranged.

According to one embodiment of the invention, the interference layer system can also act as a UV-A reflector (UV: ultraviolet light), the UV-A light being reflected.

According to a further embodiment of the invention, the

Interference layer system have a filter effect for a wavelength range from 360 nm to 450 nm.

According to a further embodiment of the invention, the

Interference layer system have a filter effect for certain wavelength ranges of visible light, as specified in Table 1 below.

Table 1 :

According to a further embodiment of the invention, the

Interference layer system be designed as a heat reflection filter, preferably in the near infrared range. The near infrared (IR) is divided into IR-A in a range from 780 nm to 1.4 gm and IR-B in a range from 1.4 gm to 3 gm. The interference layer system according to the invention preferably has a

Filter effect in the IR-A range.

According to a further preferred embodiment, the interference layer system according to the invention is a heat reflection filter for a wavelength range from 800 to 850 nm.

According to a further preferred embodiment, the interference layer system according to the invention is a heat reflection filter for a wavelength range from 850 to 900 nm.

According to a further preferred embodiment, the interference layer system according to the invention is a heat reflection filter for a wavelength range from 870 to 950 nm. According to a further preferred embodiment, the interference layer system according to the invention is a heat reflection filter for a wavelength range from 1000 to 1100 nm. The filter properties of the interference layer system according to the invention can be determined by a selection of the materials from which the individual layers of the

Interference layer systems exist whose layer thickness and / or the number of layers and / or their layer sequence are adjusted. The interference layer system according to the invention can, for example, have defined values for the reflection, the transmission and / or the absorption for the light incident on the interference layer system. The filter properties of the interference layer system according to the invention can also be present at certain angles of incidence of the incident light. If the angle of incidence is different from 0 °, the filter properties can also affect the polarized components of the incident light. An angle of 0 ° is understood to mean the case that the light beam hits the surface perpendicularly. If the angle of incidence deviates from 0 °, the angle of incidence to the perpendicular is measured on this surface.

The interference layer system according to the invention, which has no carrier substrate, can advantageously, with regard to defined filter properties, the

preferably from the group consisting of reflection, transmission, absorption, spectral light filtering in a desired wavelength range, and

Combinations of these, consists, are selected and provided.

The interference layer system according to the present invention is preferably produced by vapor deposition, preferably by means of physical vapor deposition (PVD: physical vapor deposition). It is also possible to produce the individual layers by chemical vapor deposition (CVD: Chemical Vapor Deposition) or by sputtering. According to a preferred embodiment of the invention, the individual layers are applied by means of PVD.

The interference layer system of the present invention can therefore also be referred to as an interference layer system generated by vapor deposition, for example as a PVD interference layer system or CVD interference layer system. The interference layer system according to the invention is preferably not

Wet-chemically, for example by the individual layers falling on top of each other and successively in a liquid phase. According to a preferred Embodiment of the invention, the interference layer system according to the invention is a PVD interference layer system.

The interference layer system or the interference filter of the present invention can be made film-like or foil-like. In this case, the interference layer system can also be used as an interference layer film or as

Interference layer film are referred to.

The interference layer system can also be embodied in particulate form. The particulate interference layer system has a constant thickness over the entire surface with a maximum deviation of ± 10%, preferably ± 5%, more preferably ± 2%, each based on the total layer thickness of the stack of the individual layers applied one above the other. The invention

Interference layer particles have a flat surface. Since the particulate interference layer system is produced by comminution from the interference layer film or the interference layer foil, it preferably has at least partially straight breaking edges. This is done using

Scanning electron micrographs of the particulate

Interference layer system clearly visible.

In a further embodiment, the interference layer system of the present invention can also be referred to as a UV-A reflector or UV-A interference filter. The interference layer film can therefore also be referred to as a UV-A interference filter film or the interference layer film can also be referred to as a UV-A interference filter film. The interference layer particles can also be referred to as UV-A interference filter particles or UV-A reflector particles.

According to a preferred development of the invention, the interference layer system according to the invention can also have a filter effect in the violet and / or blue light range of visible light in addition to a reflector effect in the UV-A range. According to a further preferred embodiment of the invention, the interference layer system according to the invention reduces the transmission in the range from 360 nm to 450 nm. According to a further preferred

Embodiment of the invention reduces the inventive Interference layer system reduces the transmission in the range from 360 nm to 450 nm by at least 80%. In this embodiment, the absorption index k is all

Layers of the interference layer system equal to 0 are reflected 80% of the incident light. In practice, a reflection of almost 80% is achieved even if the absorption index k of all layers of the interference layer system is k <0.003.

In a further embodiment, the interference layer system of the present invention can also be referred to as a short-pass interference filter. The interference layer film can therefore also be referred to as a short-pass interference filter film or the interference layer film can also be referred to as a short-pass interference filter film. The interference layer particles can also be referred to as short-pass interference filter particles. A short-pass interference filter preferably has a high transmittance for short wavelengths and a low transmittance for long wavelengths. Short wavelengths are preferably in a range from 380 nm to 780 nm, more preferably from 420 nm to 800 nm. An example of a short-pass interference filter is an IR filter that has a low

Transmission in the IR range, but has a high transmission in the visible range.

In a further embodiment, the interference layer system of the present invention can also be referred to as a long-pass interference filter.

The interference layer film can therefore also be referred to as a long-pass interference filter film or the interference layer film can also be referred to as a long-pass interference filter film. The interference layer particles can also be referred to as long-pass interference filter particles. A long-pass interference filter preferably has a high degree of transmission for long wavelengths and a low degree of transmission for short wavelengths. Long wavelengths are preferably in a range from 420 nm to 780 nm, more preferably from 450 nm to 800 nm. An example of a long-pass interference filter is a UV reflector / olet filter that transmits visible light.

In a further embodiment, the interference layer system of the present invention can also be referred to as a bandpass interference filter. The interference layer film can therefore also be referred to as a bandpass interference filter film or the interference layer film can also be referred to as a bandpass interference filter film. The interference layer particles can also be referred to as bandpass interference filter particles. A bandpass filter preferably has a high degree of transmission for a specific wavelength band, while shorter and longer wavelengths are reflected or absorbed. Such a transmitted wavelength band can for example be in a range from 500 nm to 600 nm, further for example in a range from 540 nm to 580 nm. The transmitted wavelength range can, however, also be different

Concern wavelength band.

In a further embodiment, the interference layer system of the present invention can also be referred to as a bandstop interference filter. The interference layer film can therefore also be referred to as a band-stop interference filter film or the interference layer film can also be referred to as a band-stop interference filter film. The interference layer particles can also be referred to as band-stop interference filter particles. A band-stop filter preferably has a low degree of transmission for a certain wavelength range, while shorter and longer wavelengths are allowed through. Such a wavelength range with low transmission can for example be in a range from 500 nm to 600 nm, further for example from 540 nm to 580 nm. The wavelength range with low transmission can, however, also relate to a different wavelength range.

In a further embodiment, the interference layer system of the present invention can also be referred to as an IR interference filter. Thus, the interference layer film can also be used as an IR interference filter film or can

Interference layer film can also be referred to as an IR interference filter film. The interference layer particles can also be referred to as IR interference filter particles. An IR interference filter preferably has a small one

Transmittance for IR radiation in the range from 800 nm to 1100 nm, preferably from 850 nm to 1000 nm. When the interference layer system according to the invention is used in an application medium, for example a coating agent, there is preferably no material that is noticeable to a viewer

Color change or color generation, preferably no color change or color generation in the application medium, for example coating agent, provided the interference layer system is designed as a reflector for the UV-A spectral range. The preferably largely colorless or neutral, more preferably colorless or neutral impression enables the interference layer system according to the invention to be used as an optical filter and / or, for example, as a reflector for UV-A light in an application medium, for example a coating agent, without the application medium, for example a coating agent, to change color significantly. After the coating agent has been applied, the substrate is

Interference layer system according to the invention likewise not significantly changed optically, preferably not changed.

Likewise, when the interference system according to the invention is used in an application medium, for example a coating agent, there is no color change or color generation in the application medium, for example coating agent, provided the interference layer system is designed as a filter or reflector for the IR spectral range.

If the interference layer system according to the invention is to be used as a colorant, it can be an application medium, for example a

Coating agents, for example a lacquer, a paint or printing ink, also impart a coloring, for example blue, green, yellow, red, or combinations thereof.

The object on which the invention is based is thus achieved by providing an interference layer system according to claim 1, which preferably also has a reflector and / or filter effect in the UV-A light range and preferably also in the wavelength range from 380 nm to 430 nm, whereby the transmission of the UV-A light through the interference layer system and

preferably also in the wavelength range from 380 nm to 430 nm, is preferably reduced by more than 25%, more preferably by more than 50%, even more preferably by more than 60%, in each case based on the transmission without the filter effect.

To optimize the filter effect, the layer thicknesses of the plurality of optically transparent layers in the interference layer system and / or the number of layers can be adjusted to one another depending on the respective refractive index and with regard to the wavelength range to be reflected and / or filtered out.

It is essential to the invention that the interference layer system does not have a carrier substrate. In the context of the invention, a carrier substrate is understood to mean a substrate to which the optically transparent layers are applied, the substrate usually being mechanically more stable than the optically transparent layers.

According to a preferred development of the invention, the interference layer system according to the invention is constructed exclusively from dielectric layers, preferably exclusively from metal oxide layers. In this embodiment, the interference layer system according to the invention preferably does not contain any purely metallic layers and / or layers which contain elemental metal.

According to a further preferred embodiment of the invention, the interference system can have at least one optically semitransparent metal layer. The interference system of the invention can be constructed exclusively from a plurality of semitransparent metal layers. The metals can be silver, gold, aluminum, chromium, titanium, iron, or alloys, or mixtures thereof. A metal layer is generally semitransparent if the layer thickness is less than 40 nm. Preferably one has

Metal layer in the interference layer system according to the invention has a thickness in a range from 5 nm to 38 nm, more preferably from 8 nm to 35 nm, even more preferably from 10 nm to 30 nm, even more preferably from 15 nm to 25 nm. According to a further embodiment of the invention, the

Interference layer system both layers which consist of dielectrics, preferably metal oxide (s), and layers which consist of metal (s) on. For example, an interference layer system according to the invention in

Essentially composed of dielectric layers, preferably layers of metal oxide (s), and additionally, for example, one, two or three layers

Metal (s).

According to a further embodiment of the invention, the

Interference layer system also have semitransparent layers which have an absorption index k> 0.001, preferably k> 0.003, preferably k> 0.005, more preferably k> 0.008, for example k> 0.01. This can be, for example, metal oxides at wavelengths that are shorter than the wavelength of the absorption edge.

The interference layer system of the present invention is characterized, inter alia, in that there is no carrier substrate for the optically transparent layers. The inventors have found that if the optically transparent layers as such are arranged flat on top of each other and preferably directly flat adjacent to each other, a mechanically surprisingly stable interference layer system is obtained, which in particular can be handled.

The interference layer system of the present invention can be designed as a film or foil or also in particulate form. Preferably that exists

Interference layer system according to the invention exclusively from the optically transparent layers arranged flat on top of one another, these each consisting essentially, preferably completely, of one dielectric material or several dielectric materials, preferably one metal oxide or several metal oxides.

Thus, the interference layer system can be designed in film-like or foil-like fashion with a size of several square centimeters. The interference layer system can for example an area from 1 cm ² to 400 cm ² , preferably from 2 cm ² to 250 cm ² , more preferably from 4 cm ² to 150 cm ² .

According to a further preferred embodiment of the invention, the interference layer system according to the invention can also have one or more further surface layer (s), i.e. on the outside of the stack of layers of optically transparent layers arranged surface layers, which has / have no optical functions, but improve the application properties.

For example, the interference layer system according to the invention can be a

Flydrophobierungsschicht have, for example, a possible

Counteract pollution. Also can, for example

Interference layer particles be chemically modified on the surface to one

To counteract aggregation or sedimentation, for example in an application medium such as a coating agent.

The interference layer system can be flexible so that the film or foil can be rolled up.

Regardless of the flexibility of the interference layer system, it can easily be comminuted under the action of mechanical forces. Thus, the interference layer system provided in film or foil form can under

Under the action of mechanical forces, interference layer particles or interference filter particles are made available. These particles can have an area of 1 μm ² to 1 cm ² , preferably 5 μm ² to 40,000 μm ² , more preferably 10 μm ² to 10,000 μm ² , more preferably 100 μm ² to 5,000 μm ² .

Preferred embodiments of the interference layer system according to the invention are specified in the dependent claims 2 to 16.

The object on which the invention is based is further achieved by providing a method for producing an interference layer system according to one of claims 1 to 16, the method comprising the following steps:

(A) providing a flat carrier substrate material,

(b) applying a separating layer, (c) applying a plurality of optically transparent layers to produce an interference layer system,

(d) Detachment of the interference layer system from the flat

Carrier substrate material.

Preferred developments of the method according to the invention are given in the dependent claims 18 and 19.

According to a preferred embodiment of the method according to the invention, the flat carrier substrate has a low surface roughness, preferably a surface roughness of <3 nm rms, more preferably of <2 nm rms, further preferably of <1 nm rms.

“Rms” is understood to mean the square roughness (rms: root-mean-squared roughness), which is also referred to as R _q . The quadratic roughness "rms" or "R _q " represents the standard deviation of the distribution of the surface heights, as in ES Gadelmawla et al. , "Roughness Parameters", Journal of Materials Processing Technology 123 (2002) 133-145, section 2.2, the disclosure of which is hereby incorporated by reference. Mathematically, the quadratic roughness R _{q is defined} as specified in formula (II):

where: "l" for the measuring length,

“Stands for the surface height, and

where the length "x" goes from 0 to "l".

Furthermore, the object on which the invention is based is also carried out

Providing an optical filter which is or contains an interference layer system according to one of Claims 1 to 16, solved. The optical filter can be a UV reflector, color filter, heat reflection filter or IR filter and / or

Be anti-reflective filters.

Finally, the object on which the invention is based is also carried out

Provision of an application medium containing an interference layer system according to one of claims 1 to 16, solved. According to a preferred development of the invention, the

Application medium from the group consisting of glazes, glasses, plastics, and coating agents, preferably paints, varnishes, printing inks.

According to a further preferred embodiment of the invention that is

Application medium a coating agent.

The interference layer system according to the invention is distinguished, inter alia, by the fact that it does not have a carrier substrate.

In the interference layer system of the present invention, the optically transparent layers are arranged flat one above the other and preferably adjacent to one another. In the context of the invention, “arranged adjacent to one another” is understood to mean that adjacent layers are directly, i.e. are arranged in flat contact with one another. The optically transparent layers are preferably stacked flush in the edge areas. In the interference layer system according to the invention, therefore, in the edge areas, i.e. when viewed "from the side", there are preferably "open layer ends", i.e. not wrapped

Shift ends before.

According to the invention, the optically transparent layers are not applied in an enveloping manner. Rather, it is preferred that the optically transparent layers are defined layer stacks of layers each with a defined layer thickness over the entire width of the interference layer system. With this arrangement of the optically transparent layers, the identical and defined layer sequence, each with a defined layer thickness, is also present in the edge areas as in the middle area of the interference layer system. The edge regions of the optically transparent layers in the layer stack are preferably not encased.

According to a preferred embodiment, the layer thickness of each optically transparent layer is in a thickness range of 5 nm to 500 nm, preferably 6 nm to 460 nm, preferably 7 nm to 420 nm, preferably 8 nm to 380 nm, preferably 9 nm to 320 nm, preferably 10 nm to 280 nm, preferably 11 nm to 220 nm, preferably 12 nm to 180 nm, preferably 13 nm to

150 nm, preferably from 14 nm to 120 nm, more preferably from 15 nm to 110 nm, more preferably from 25 nm to 90 nm, even more preferably from 30 nm to 80 nm. The thickness of each layer represents the spatial extent of the layer perpendicular to the surface.

The interference layer system according to the present invention can be symmetrical or asymmetrical with regard to the layer sequence

Have layer structure.

An asymmetrical layer structure can result, for example, from the fact that the layer thickness of the layers arranged in the layer stack differs from one another depending on the arrangement in the layer stack. An asymmetrical layer structure can also result from the fact that the metal oxides used in the individual layers are different from one another, so that there is no symmetrical structure.

An asymmetrical layer structure can also result from the fact that the two outer layers are on the top and bottom of the

Interference layer system are different from each other. For example, with an alternating arrangement of high refractive index layers, for example TiO2 layers, and low refractive index layers, for example S1O2, the lower surface of the interference layer system can be designed as an SiO2 layer and the upper surface of the interference layer system as a TiO2 layer.

In the interference layer system according to the invention, none of the optically transparent layers has the function of a carrier substrate.

Surprisingly, the mechanical stability of the interference layer system according to the invention results from the plurality of optically transparent layers which, viewed individually, usually do not have sufficient mechanical stability. The inventors have surprisingly found that there is sufficient mechanical stabilization of the interference layer system when at least 4, preferably at least 6, more preferably at least 8, more preferably at least 10, more preferably at least 12, more preferably at least 14, optically transparent layers

are arranged one above the other.

The interference layer system according to the invention is a flat structure which preferably has a total thickness from a range of 40 nm to 5 μm,

preferably from 80 nm to 4 pm, more preferably from 140 nm to 3 pm, even more preferably from 260 nm to 2.5 pm, even more preferably from 400 nm to 2 pm, even more preferably from 600 nm to 1.5 pm having. A thickness range from 750 nm to 1.3 μm, more preferably from 800 nm to 1.2 μm, has proven to be very suitable.

According to a further preferred embodiment of the invention, the interference layer system comprises 4 to 100, preferably 6 to 80, more preferably 8 to 70, even more preferably 10 to 60, even more preferably 12 to 50, even more preferably 14 to 40, optically transparent layers or consists of it.

Due to the good mechanical stability, the inventive

Interference layer system as a film or foil, preferably as an optical film or optical foil, without a carrier substrate. That in film or foil form

The present inventive interference layer system is preferably flexible, so that the interference layer system according to one embodiment of the invention can be rolled up or can be adapted to a substrate.

The interference layer system according to the invention can therefore be present as a freely present interference layer film or as a freely present interference layer film or as freely present particles. According to the invention, “free” is understood to mean that the interference layer system according to the invention is in unbound form, i.e. without a carrier substrate or detached from a carrier substrate.

The interference layer film according to the invention or that according to the invention

Interference layer film can have an area of several square centimeters, for example from 2 to 400 cm ² , preferably from 3 to 200 cm ² , more preferably from 4 to 120 cm ² , even more preferably from 8 to 100 cm ² . The layer system according to the invention is surprisingly easy to handle, preferably as an interference layer film or interference layer film. For example, the interference layer system present as an interference layer film or interference layer film can be used directly as an optical film, for example in physical examinations or in complex optical systems, for example in

Brackets arranged to be used.

On the other hand, it can be in film form or sheet form

Interference layer system can be easily comminuted under the action of mechanical forces. For example, the inventive

Interference layer film or the interference layer film according to the invention are comminuted by swirling in a medium, for example a gas or a liquid. The interference layer system according to the invention can also be comminuted by the action of, for example, ultrasound. A defined size distribution can be set depending on the duration and the energy input during the comminution. Thus, the interference layer system according to the invention can also have an average particle diameter, also referred to as the average particle size, of, for example, 1 μm to 500 μm, more preferably 2 μm to 400 μm, more preferably 5 μm to 250 μm, even further

preferably from 10 pm to 170 pm, even more preferably from 20 pm to 130 pm, even more preferably from 40 pm to 90 pm.

According to the invention, an average particle size is understood to mean the median value D50 of the volume-averaged size, at which 50% of the particles have a size below the specified D50 value and 50% of the particles have a size above the specified D50 value.

The particle size distribution can be determined using laser diffractometry, for example using the CILAS 1064 device.

The particles obtained when the interference layer system is comminuted have a uniform, and therefore defined, surface over the entire surface of the particle

Layer structure, also in the edge areas. It has surprisingly been shown that after the interference layer system according to the invention has been comminuted, the interference layer particles thus obtained are mechanically stable and are essentially flat. The interference layer particles are therefore preferably in the

Essentially not presented in a rolled up form. Most preferably they are

interference layer particles according to the invention in planar form, i.e. not in a rolled up form.

According to a further preferred embodiment, the optically

transparent layers each have one or more dielectrics, preferably

Metal oxide (s), in an amount of 95 to 100% by weight, more preferably 97 to 99.5% by weight, more preferably 98 to 99% by weight, in each case based on the

Total weight of the respective optically transparent layer.

It is extremely preferable for each optically transparent layer to consist exclusively of one dielectric, preferably metal oxide, or of several dielectrics, preferably metal oxides. According to a further preferred embodiment, each optically transparent layer consists of a single metal oxide.

For the purposes of the invention, “metal oxide (s)” also includes metal oxide hydroxide (s) and metal hydroxide (s) and also mixtures thereof. The metal oxide or metal oxides are extremely preferably pure metal oxide (s) without any water content.

According to a further preferred embodiment, the interference layer system according to the invention has at least two low-refractive optically transparent layers with a refractive index m <1.8 and at least two high-refractive transparent layers with a refractive index n2.8.

According to a further preferred embodiment, the low-index, optically transparent layer has a refractive index m from a range from 1.3 to 1.78 and is preferably selected from the group consisting of silicon oxide,

Aluminum oxide, magnesium fluoride, and mixtures thereof. Boron oxide can also be used as the low refractive index metal oxide. According to a preferred embodiment of the invention are the aforementioned

low refractive index metal oxides, X-ray amorphous.

The silicon oxide is preferably SiO2. In the context of the invention, silicon oxide, in particular S1O2, is also understood as a metal oxide. Aluminum oxide is preferably Al2O3 or AlOOH. Boron oxide is preferably B2O3. Magnesium fluoride is preferably MgF2.

The low refractive index, optically transparent layer is most preferably selected from the group consisting of silicon oxide, aluminum oxide, magnesium fluoride, and mixtures thereof. The aforementioned low refractive index metal oxides are preferably X-ray amorphous. The silicon oxide is also preferably in the form of S1O2. The aluminum oxide is also preferably in the form of Al2O3. The magnesium fluoride is also preferably in the form of MgF2

According to a further preferred embodiment, the high-index, optically transparent layer has a refractive index n2 from a range from 2.0 to 2.9 and is preferably selected from the group consisting of titanium oxide, iron oxide, niobium oxide, tantalum oxide, zirconium oxide, tin oxide, cerium oxide, chromium oxide , Cobalt oxide, and mixtures thereof. According to a preferred embodiment of the invention, the aforementioned high refractive index metal oxides are X-ray amorphous.

Titanium oxide is preferably T1O2. The T1O2 is more preferably anatase or rutile, even more preferably rutile. According to a further embodiment of the invention, the T1O2 is amorphous, i.

preferably X-ray amorphous. The iron oxide is preferably in the form of Fe2O3 (flematite) or Fe3O4 (magnetite), more preferably as Fe203. The niobium oxide is preferably in the form of Nb20s. The tantalum oxide is preferably in the form of Ta20s. The zirconium oxide is preferably in the form of ZrO 2. The tin oxide is preferably in the form of SnO2.

Most preferably, the high refractive index layer is selected from the group consisting of rutile, niobium oxide, tantalum oxide, zirconium oxide, and mixtures thereof. The aforementioned high refractive index metal oxides are preferably X-ray amorphous. According to a further preferred embodiment, the titanium oxide is present as T1O2, preferably as rutile.

According to a preferred embodiment of the invention, the

Interference layer system an alternating layer sequence of two optically

transparent layers, the first optically transparent layer having a refractive index m and the second optically transparent layer one

Has refractive index n2 and where m and n2 preferably vary by 0.1 to 1.4, more preferably by 0.2 to 1.3, more preferably by 0.3 to 1.2, more preferably by 0.4 to 1, 1, more preferably by 0.5 to 1.0, further

preferably by 0.6 to 0.9 differ.

According to a preferred embodiment of the invention, this includes

Interference layer system as a low refractive index layer made of silicon oxide, preferably S1O2, and as a high refractive index layer made from titanium oxide, preferably T1O2, more preferably amorphous T1O2, the

Silicon oxide layers and the titanium oxide layers are preferably arranged alternately. Preferably includes the invention

Interference layer system in total 4 to 100, preferably 6 to 80,

preferably 8 to 70, more preferably 10 to 60, more preferably 12 to 50, titanium oxide layers and silicon oxide layers or consists thereof. According to a preferred embodiment, the titanium oxide layers and silicon oxide layers are X-ray amorphous.

Very preferably, the interference layer system according to the present invention consists essentially of metal oxide (s), preferably of metal oxide (s). Because of the preferred metal-oxide structure, the interference layer system according to the present invention is not susceptible to corrosion. The application of separate corrosion protection layers is therefore advantageously not necessary. The interference layer system according to the invention is therefore also in one

Corrosive environment, for example in the presence of water and oxygen, stable to corrosion. The interference layer system according to the present invention is extremely advantageous

Invention with regard to the naturally occurring metal oxides in terms of health and environmental technology.

The invention also relates to the use of an interference layer system according to one of Claims 1 to 16 as an optical filter. The optical filter can be in the form of a film or a foil. For example, the interference layer film or the interference layer film can be arranged in a holder.

According to a further preferred embodiment, the present relates

Invention an application medium, preferably a coating agent, which contains an optical interference layer system according to one of claims 1 to 16.

The coating agent can be lacquer, paint or medical products.

The application medium can also be a glaze, a ceramic or a plastic.

The interference layer system of the present invention can be produced by the method according to claim 17.

According to the invention, a flat carrier substrate material is provided which is provided with a separating layer. On this separation layer are then

successively a plurality of optically transparent layers which are selected from the group consisting of dielectrics, metals, and combinations thereof, to produce an interference layer system according to one of the

Claims 1 to 16 applied. The interference system thus obtained becomes

subsequently detached from the flat carrier substrate material.

The flat carrier substrate material can be an inorganic or organic surface. A metallic substrate or a ceramic substrate, for example, can be used as the inorganic surface. As

organic surface, a plastic surface can be used. The The plastic surface can be modified, for example with a varnish, such as a polysiloxane-based hard varnish.

The carrier substrate material can be designed to be immobile, for example as a disk substrate, or mobile, for example as a tape substrate.

According to a preferred embodiment of the invention, as

Carrier substrate material uses a plastic material, as is also used for the production of plastic glasses for glasses.

The carrier substrate material can comprise or consist of a plastic material, the plastic material from the group consisting of polythiourethane, polyepisulfide, polymethyl methacrylate, polycarbonate, polyallyl diglycol carbonate, polyacrylate, polyurethane, polyurea, polyamide, polysulfone, polyallyl,

Fumaric acid polymer, polystyrene, polymethyl acrylate, biopolymers, and mixtures thereof. Preferably, the plastic material comprises a polymer material or consists of that from the group consisting of

Polythiourethane, polyepisulphide, polymethyl methacrylate, polycarbonate,

Polyallyl diglycol carbonate, polyacrylate, polyurethane, polyurea, polyamide,

Polysulfone, polyallyl, fumaric acid polymer, polystyrene, polymethylacrylate,

Biopolymers, and mixtures thereof, is selected.

The plastic material is most preferably selected from the group consisting of polyurethane, polyurea, polythiourethane, polyepisulfide, polycarbonate, polyallyl diglycol carbonate, and mixtures thereof.

The same materials can be used as the plastic material as are also used in the production of plastic spectacle lenses. Suitable polymer materials are, for example, under the trade names MR6, MR7, MR8, MR10, MR20, MR174, CR39, CR330, CR607, CR630, RAV700, RAV7NG, RAV7AT, RAV710, RAV713, RAV720, TRIVEX, PANLITE, MGC 1.76, RAVolution, etc.

available. The base material of CR39, CR330, CR607, CR630, RAV700, RAV7NG, RAV7AT, RAV710, RAV713 and RAV720 is polyallyl diglycol carbonate. The basic material of RAVolution and TRIVEX is polyurea / polyurethane. The base material of MR6, MR7, MR8 and MR10 is polythiourethane. The base material of MR174 and

MGC1.76 is polyepisulphide.

These plastic materials known from the manufacture of plastic eyeglass lenses are usually provided with anti-reflective and anti-reflective layers, but these are permanently applied to the plastic surface.

According to a preferred embodiment of the invention, the carrier substrate is coated with a lacquer, for example a polysiloxane-based hard lacquer. This paint provides protection against mechanical damage,

from scratches, for example. According to a further preferred embodiment of the invention, a primer layer is arranged between the carrier substrate, for example plastic substrate, and the hard lacquer layer, which the adhesion of the

Hard lacquer layer on the carrier substrate, for example plastic substrate, improved.

The hard paints are typically made using dip coating processes or

Spin coating process liquid on both sides of the substrate

applied and then, for example, thermally cured. Depending on the composition of the lacquer, curing can also take place with UV light. The UV light induces chemical reactions that lead to the hardening of the liquid paint.

These hard lacquers are preferably harder than the plastic substrate. These lacquers preferably have an indentation hardness greater than 150 MPa, preferably greater than 250 MPa, measured with the aid of nanoindentation, which is also referred to as an instrumented penetrant test. The instrumented penetration depth is determined, as in Oliver WC and Pharr, GM, "Measurement of hardness and elastic modulus by instrumented indentation: Advances in understanding and refinements to methodology", J. Mater. Res., Vol. 19, No. 1, Jan 2004, pages 3 to 20. The layer thickness of the cured hard lacquer layer is typically 1 μm, preferably more than 1.5 μm, for example 2 μm or 3 μm.

In a further embodiment of the invention, a liquid primer layer is initially preferably applied directly to the plastic substrate

Dip coating method or spin coating method applied. After this primer layer has been thermally dried, it typically has a layer thickness of> 400 nm, for example from 500 nm to 1 μm. To this

The primer layer is then preferably applied with a hard lacquer layer, as described above. The primer layer serves to improve the adhesion of the hard lacquer layer to the plastic substrate.

The primer for the primer layer is preferably selected from the group consisting of

Polyurethane dispersion, polyurethane-polyurea dispersion and mixtures thereof is selected. In addition, reference is made in this regard to US Pat. No. 5,316,791, in particular to column 3, line 41 to column 6, line 11, the content of which is hereby incorporated by reference. A commercially available primer is, for example, the primer PR-1165 from SDC TECHNOLOGIES,

INC. 45 Parker, Suite 100 Irvine, CA 92618 USA.

The hard lacquer is preferably a polysiloxane which, for example, by converting at least one organosilane and at least one tetraalkoxysilane into

Presence of colloidal inorganic oxide, fluoride or oxyfluoride is available. In addition, reference is made in this regard to DE 10 201 1 083 960 A1, the content of which is hereby incorporated by reference. One commercial

Available polysiloxane hard lacquer is, for example, the MP-1154D from SDC TECHNOLOGIES, INC. 45 Parker, Suite 100 Irvine, CA 92618 USA

According to the invention, the cured hard lacquer layer preferably has a roughness <3 nm rms, preferably <2 nm rms, more preferably <1 nm rms.

The roughness of the hard lacquer layer can be determined by the choice of solvent,

for example 1 methoxy-2-propanol, ethanol and / or methanol or mixtures therefrom and / or by using at least one leveling additive, for example silicone surfactant (s) or fluorosurfactant (s).

With regard to this preferably low surface roughness, the subsequently applied separating layer as well as that applied to the separating layer are

Interference layer system according to the invention is preferably designed as smooth layers which preferably have correspondingly low roughness. In the case of a smooth separating layer and an interference layer system with smooth layers, the interference layer system according to the invention can easily be separated from the

Peel off the carrier substrate. Furthermore, smooth layers result in the

interference layer system according to the invention to defined optical

Properties, for example defined filter properties.

In the present invention, a separating layer is applied to the flat carrier substrate material, which separating layer enables the subsequently applied plurality of metal oxide-containing layers to be detached or separated.

Various materials can be used as the separating layer.

For example, organic materials can be applied that are soluble in an organic solvent. For example, as organic

Release agents Waxes or fats that are soluble in organic solvents, for example, can be used.

According to the invention, it is preferred to use a water-soluble inorganic salt as the separating layer. The use of a water-soluble salt is preferred in terms of work safety and the environment.

Salts of the alkali and / or alkaline earth metals are preferably used as inorganic salts. The usual salt formers, for example halides, sulfates, phosphates, etc., can be used as anions. To be favoured

Halides, especially chlorides, are used as anions of the salts. A separating layer made of NaCl is extremely preferred as the inexpensive salt. The separating layer is applied in a suitable layer thickness on the

Carrier substrate material applied. The layer is preferably vapor-deposited onto the flat carrier substrate material with a defined layer thickness in a vacuum. The separating layer thickness can be in a range from 10 nm to 100 nm, preferably from 20 nm to 50 nm. A separating layer thickness of 30 nm, for example made of NaCl, has proven to be very suitable. The separating layer can be applied, for example, with an electron beam evaporator without reactive gas. A defined number of metal oxide-containing layers is then applied to this separating layer in succession and preferably in direct succession by vapor deposition.

The number and thickness as well as the nature of the metal oxide-containing layers to be applied depends on the respective

Purpose, for example the optical filter properties of the

Interference layer system, set. The separation layer or the plurality of metal oxide-containing layers is applied using a conventional method

Vapor deposition system, preferably a PVD system (PVD: Physical Vapor Deposition; German: physical vapor deposition). The others

Process conditions, such as vacuum evaporation rate, inert gas, reactive gas, etc., are set according to the manufacturer's instructions and the desired optical properties of the interference layer system according to the invention.

After the desired number of metal oxide-containing layers has been applied, the coating system, usually a vacuum coating system, is ventilated. The substrates are then removed and placed in a water vapor-containing

Atmosphere stored, for example in the ambient atmosphere. The relative humidity is preferably more than 30%.

The separating layer, for example the NaCl layer, takes from the

Ambient atmosphere absorbs moisture and thus reduces the adhesion between the vapor-deposited interference layer system and the flat

Carrier substrate material. The coating systems from Satisloh GmbH, 35578 Wetzlar, for example the Satisloh 1200-DLX-2, can be used as the coating system.

With the coating system of the type Satisloh 1200-DLX-2, several grams of the invention can be used in one coating process

Interference layer systems are produced using the method according to the invention.

The calculation of the number and thickness of the layers is computer-based, taking into account the respective refractive index and the desired filter effect. For example, to calculate a

Interference layer system the software program OptiLayer, Version 12.37 from OptiLayer GmbH, 85748 Garching b. Munich, or the software program

Essential MacLeod Version 11.00.541 from Thin Film Center Inc., 2745 E Via Rotunda, Tucson, AZ USA, can be used.

Highly refractive, transparent optical has proven to be very suitable

Layer material titanium oxide, in particular T1O2, and as a low refractive index

transparent optical layer material silicon oxide, in particular S1O2, proved.

The detached interference layer system, preferably an interference layer film or an interference layer film, can be in a suitable medium, for example in a gas, in particular air, or in a liquid, for example water or in an aqueous solution, with energy input, for example by stirring or by irradiating ultrasound , to a desired size or

Particle size distribution are comminuted.

The interference layer system according to the invention can also be incorporated directly into a

Coating agents, for example a paint or a lacquer, are introduced and comminuted to a desired particle size or particle size distribution while stirring or irradiating with ultrasound. According to the invention, the interference layer system has a reflection curve which has at least two regions of different reflection in a wavelength range from 300 nm to 800 nm. These at least two areas of different reflection have a defined reflection in the respective wavelength range, the defined reflection of the at least one first reflection area from the defined reflection of an at least second

Reflection area is different from each other. A defined reflection can have a fluctuation range of the reflection within the respective range of preferably 25 percentage points, more preferably 20 percentage points, particularly preferably 15 percentage points and very particularly preferably 10 percentage points, each of the maximum reflection value of the respective area. The maximum reflection value does not exceed 100% reflection and the minimum reflection value does not come below 0% reflection. In this embodiment, the interference layer system particularly preferably has a reflection curve which in the wavelength range from 300 nm to 800 nm has at least one range in which the reflection for all wavelengths from a range of at least 70%, preferably at least 75%, particularly preferably at least 80 % of the half width FWHM (FWHM = Full Width at Half Maximum) is at least 85%, preferably at least 90% and very particularly preferably at least 95%. In the wavelength range from 300 nm to 800 nm, but outside the range described above, the reflection curve of the

Interference layer system has at least one area in which the reflection for all wavelengths of this area is preferably <30%, particularly preferably <25% and very particularly preferably <20%. In the wavelength range from 300 nm to 800 nm, but outside the range in which the reflection for all wavelengths from a range of at least 70%, preferably at least 75%, particularly preferably at least 80%, each of the half-width FWHM at at least 85%, preferably at least 90% and especially at least 95%, the reflection curve of the interference layer system particularly preferably has at least two ranges in which the reflection for all wavelengths of this range is preferably <30%, particularly preferably <25% and very particularly preferably <20 % lies. In a further preferred embodiment, the interference layer system has a reflection curve which for any wavelength lo, preferably selected from a wavelength range from 380 nm to 600 nm, including the wavelengths lo = 380 nm and lo = 600 nm, in a wavelength range of 300 nm up to 800 nm comprises at least one first range with a half width FWHM, calculated according to FWHM = (0.6 · lo) - 170 nm. The relative

The accuracy for the above calculation of FWHM is 10%. In this at least one first area, preferably in this precisely one first area, the interference layer system has a reflection curve which in at least one wavelength range of at least 65%, preferably at least 70%, particularly preferably at least 75%, in each case the half-width FWHM = (0 , 6 · lo) - 170 nm, has a reflection of at least 85%, preferably of at least 90% and very particularly preferably of at least 95%. The above information applies to all wavelengths of the at least one first range, i.e. for each wavelength of the at least one first range, the reflection curve has a reflection of at least 85%, preferably at least 90% and very particularly preferably at least 95%. In this further preferred

Embodiment, the interference layer system has a reflection curve, which for any wavelength lo, preferably selected from a

Wavelength range from 380 nm to 600 nm, including the wavelengths lo = 380 nm and lo = 600 nm, in a wavelength range from 1, 1 x lo to 800 nm, including 1, 1 x lo and 800 nm, but outside the at least one first Area comprising at least one second area in which the reflection for all wavelengths of this at least second area is <18%, preferably <15% and very particularly preferably <13%. The arbitrary wavelength lo for the first range is preferably to be chosen to be identical to the arbitrary wavelength for the second range.

In a further embodiment, the interference layer system comprises no carrier substrate and at least 4, more preferably at least 6, more preferably at least 8, particularly preferably at least 10 and very particularly preferably at least 12 alternating layers of different refractive indices. The reflection curve of the interference system preferably has at least one wavelength range from 365 nm to 425 nm for each of the mentioned wavelengths a reflection of preferably at least 85%, particularly preferably at least 90% and very particularly at least 95%. In the above-mentioned wavelength range, the reflection curve has a half width FWHM from a range preferably from 60 nm to 70 nm. Outside the aforementioned wavelength range, in a wavelength range from 440 nm to 800 nm, the reflection curve of the interference system has a reflection of preferably less than 17%, particularly preferably less than 13% and very particularly preferably less than 10%.

In a further preferred embodiment, this comprises

Interference layer system at least 20 layers, which alternate

are arranged one above the other and differ in their refractive index. At a wavelength of 550 nm, this difference in refractive index is preferably at least 0.90, particularly preferably at least 0.952. This interference layer system comprising at least 20 layers preferably has in the range of at least 60%, particularly preferably in the range of at least 65% and very particularly preferably in the range of at least 70% of the half width FWHM, with FWHM = (0.6 · lo) - 170 nm , where lo = 380 nm to 600 nm, a reflection of preferably at least 80%, particularly preferably of at least 85% and very particularly preferably of at least 90% and preferably in the range from 1.1 · lo to 800 nm, where lo = 380 nm to 600 nm, a reflection of preferably <20%, particularly preferably <15% and very particularly preferably <10%. lo is preferably identical for both ranges defined above. The relative

The accuracy for the above calculation of FWHM is 10%.

These at least 20 layers preferably include the following optical layer thicknesses, where T has a refractive index at 550 nm of n = 2.420 and L has a refractive index at 550 nm of n = 1.468:

lo is a wavelength that can be freely selected, lo is preferably any wavelength in the visible spectral range between 380 nm and 780 nm. The specification of the layer thicknesses in multiples of lo / 4 can be converted into the physical layer thickness d in the unit nm as follows are converted:

optical layer thickness

d = - - - -. Here n is the refractive index of the layer at wavelength lo.

In a further preferred embodiment, this comprises

Interference layer system at least 22 layers, which alternate

are arranged one above the other and differ in their refractive index. At a wavelength of 550 nm, this difference in refractive index is preferably at least 0.90, particularly preferably at least 0.952. The

The reflection curve of this interference layer system comprising at least 22 layers, preferably exactly 22 layers, preferably shows in the range of at least 62%, particularly preferably in the range of at least 67% and very particularly preferably in the range of at least 72% of the half-width FWHM, with FWHM = (0, 6 · lo) - 170 nm, where lo = 380 nm to 600 nm, a reflection of preferred at least 82%, particularly preferably at least 87% and very particularly preferably at least 92% and preferably in the range from 1.1 x lo to 800 nm, where lo = 380 nm to 600 nm, a reflection of preferably <18%, particularly preferably <15% and very particularly preferably <10%. lo is preferably identical for both ranges defined above. The relative accuracy for the above calculation of FWHM is 10%. These at least 22 layers preferably include the following optical layer thicknesses according to variant A or according to variant B or according to variant C, where T is one

Refractive index at 550 nm of n = 2.420 and L has a refractive index at 550 nm of n = 1.468:

lo is a wavelength which can be freely selected, lo is preferably any wavelength of the visible spectral range between 380 nm and 780 nm. The conversion into the physical layer thickness is carried out as described above

In a further preferred embodiment, this comprises

Interference layer system at least 24 layers, which alternate

The reflection curve of this interference layer system comprising at least 24 layers, preferably exactly 24 layers, preferably shows in the range of at least 65%, particularly preferably in the range of at least 69% and very particularly preferably in the range of at least 74% of the half-width FWHM, with FWHM = (0, 6 · lo) - 170 nm, where lo = 380 nm to 600 nm, a reflection of preferably at least 85%, particularly preferably of at least 89% and very particularly preferably of at least 93% and preferably in the range of 1.1 · lo to 800 nm, where lo = 380 nm to 600 nm, a reflection of preferably <17%, particularly preferably <14% and very particularly preferably <10%. lo is preferably identical for both ranges defined above. The relative accuracy for the above calculation of FWHM is 10%. These at least 24 layers preferably include the following optical layer thicknesses according to one of the variants D to L, where T has a refractive index at 550 nm of n = 2.420 and L has a refractive index at 550 nm of n = 1.468 and the optical layer thickness in lo / 4 is indicated:

1 ⁾ layer

²⁾ variant

Here, too, lo is a wavelength that can be freely selected; lo is preferably any wavelength of the visible spectral range between 380 nm and 780 nm. The conversion into the physical layer thickness is carried out as

described above.

In a further preferred embodiment, this comprises

Interference layer system at least 26 layers, which alternate

are arranged one above the other and differ in their refractive index. At a wavelength of 550 nm, this difference in refractive index is preferably at least 0.90, particularly preferably at least 0.952. The The reflection curve of this interference layer system comprising at least 26 layers, preferably exactly 26 layers, preferably has a range of at least 70%, particularly preferably a range of at least 73% and very particularly a range of at least 75% of the half-width FWHM, with FWHM = (0, 6 · lo) - 170 nm, where lo = 380 nm to 600 nm, a reflection of preferably at least 87%, particularly preferably of at least 90% and very particularly preferably of at least 95% and preferably in the range of 1.1 · lo to 800 nm, where lo = 380 nm to 600 nm, a reflection of preferably <16%, particularly preferably <13% and very particularly preferably <10%. lo is preferably identical for both ranges defined above. The relative accuracy for the above calculation of FWHM is 10%. These at least 26 layers preferably include the following optical layer thicknesses according to one of the variants M to Z and A 'to M', where T has a refractive index at 550 nm of n = 2.420 and L has a refractive index at 550 nm of n = 1.468 and the optical layer thickness in lo / 4 is given in the following three tables for the variants M to M ':

1 ⁾ layer

²⁾ variant

1 ⁾ layer

²⁾ variant

¹⁾ layer

²⁾ variant

As already mentioned above, in each of the three tables listed above for the variants M to A ', lo is a wavelength which can be freely selected; lo is any wavelength of the visible spectral range between 380 nm and 780 nm. The conversion in the physical layer thickness is as described above.

In another embodiment, each of those described herein

Interference layer systems have a surface roughness of preferably <3 nm rms, particularly preferably <2 nm rms and very particularly preferably <1 nm rms.

Those described in the above embodiments

Reflection curves of the interference layer system are preferred with the

Software program OptiLayer, version 12.37, from OptiLayer GmbH calculates based on the respective interference system, i.e. of the interference system without a carrier substrate. In particular, it should be emphasized here that the interference layer systems described retain their reflective properties, regardless of what is selected as the surrounding medium. In particular, the interference layer systems show the same reflection properties in the following surrounding media (optical entry and exit medium) in a range of preferably 10 percentage points, particularly preferably in a range of 5 percentage points of the corresponding areas:

- air (refractive index at 550 nm n = 1,000),

- water (refractive index at 550 nm n = 1. 330),

- oily / fatty substances (refractive index at 550 nm n = 1,400).

Thus, the interference layer systems can be used both in air and in aqueous and / or oil-based preparations without their

To lose reflective properties or to change them significantly. Alternatively, the reflection properties of the interference systems can be determined with the reflection spectrometer F10-AR-UV from Filmetrics, Inc., San Diego, CA 92121, USA. This determination can be based on the interference system with

Carrier substrate or take place using the interference system without a carrier substrate.

Reflection is generally understood to be the quotient formed from the reflected intensity IR divided by the total intensity Io of the incident radiation, here light. The information is given here in%: Reflection R = IR / IO · 100.

At angles of incidence of the light on the surface of the

So-called polarization effects occur, i.e. the

The reflection of unpolarized light differs from the reflection of light p- or s-polarized to the plane of incidence. Specifically, the reflection of the unpolarized light is the mean value of the reflection of the p- and s-polarized light. All information on reflection in this application relates to unpolarized light in an angle of incidence range from 0 to 15 °. The optical angle of incidence is determined perpendicular to the surface of the interference layer system. Through targeted use of the polarization splitting of the reflection between s- and p-polarized light, for example

Manufacture polarization splitter.

The interference layer systems described have the advantage that the at least one first region of the reflection curve and the at least one second region of the reflection curve different from the first region in the

Wavelength range from 300 nm to 800 nm can be chosen variably. The first area and the second area preferably have a different reflection over the respective complete area. The first range and the second range can preferably be set in the wavelength range from 300 nm to 800 nm when designing the interference layer system. This divisibility

ensures an adaptable reflection for different wavelength ranges. In addition, the wavelength range can be varied so that

different color ranges can be realized. Includes the

Reflection curve of the interference layer system, for example at least one, preferably exactly one first region with high reflection and at least one second region with low reflection, the at least one first region with high reflection can be in any wavelength range, preferably in any wavelength range from 300 nm to 800 nm, when designing the interference layer system move.

Another advantage of the interference layer system described is that its reflection curve is in a first range of at least 60%, more preferably in a first range of at least 65%, particularly preferably in a first range of at least 70% and very particularly preferably in a first range of at least 75% of the half-width FWHM, with

FWHM = (0.6 · lo) -170 nm, preferably lo = 380 nm to 600 nm, a reflection of preferably at least 80%, more preferably at least 85, particularly preferably of at least 90% and very particularly preferably of at least 95 % having. This at least one first range, preferably this precisely one first range, can be set within a wavelength range of preferably 300 nm to 800 nm when designing the interference layer system, so that the range of high reflection can be variably selected. The relative

The accuracy for the above calculation of FWHM is 10%. The reflection curve furthermore preferably has at least a second range from 1.1 x lo to 800 nm, where lo = 380 nm to 600 nm, in which the reflection is preferably 20%, particularly preferably <15% and very particularly preferably <10 % lies. Depending on the setting of the at least one first area, preferably precisely one first area, the at least one second area also shifts within the wavelength range of preferably 300 nm to 800 nm. This setting is made when designing the interference layer system by selecting lo, which is preferably selected from a range from lo = 380 nm to 600 nm.

The areas described above with different levels of reflection,

in particular the at least one area with high reflection and the at least one area with comparatively low reflection can be implemented with a very small number of layers.

Further embodiments are given by the following clauses: Clause 1: Interference layer system comprising a plurality of optically transparent layers, the interference layer system not having a carrier substrate and that the optically transparent layers are arranged flat on top of one another, the optically transparent layers being selected from the group consisting of dielectrics, metals and combinations thereof at least one first optically transparent layer having a refractive index m and at least one second optically transparent layer having a refractive index r2 and wherein the first refractive index m and the second refractive index n2 differ by at least 0.1.

Clause 2: Interference layer system according to Clause 1, the layer thickness of each optically transparent layer being in a thickness range from 5 nm to 500 nm.

Clause 3: Interference layer system according to Clause 1 or 2, the optically transparent layers each having dielectrics, preferably metal oxide (s), in an amount of 95 to 100% by weight, based in each case on the total weight of the respective optically transparent layer.

Clause 4: interference layer system according to one of clauses 1 to 3, the interference layer system having at least 2 low-refractive optically transparent layers with a refractive index m <1.8 and at least 2 high-refractive optically transparent layers with a refractive index n2> 1.8.

Clause 5: interference layer system according to one of clauses 1 to 4, the interference layer system having or consisting of 4 to 100 optically transparent layers.

Clause 6: interference layer system according to one of clauses 1 to 5, the low-refractive-index, optically transparent layer having a refractive index m from a range from 1.3 to 1.78 and preferably from the group consisting of

Silica, alumina, magnesium fluoride, and mixtures thereof. Clause 7: Interference layer system according to one of Clauses 1 to 6, wherein the high-index, optically transparent layer has a refractive index r2 from a range from 2.0 to 2.9 and preferably from the group consisting of

Titanium oxide, iron oxide, niobium oxide, tantalum oxide, zirconium oxide, chromium oxide, cerium oxide, cobalt oxide, and mixtures thereof.

Clause 8: Interference layer system according to any one of Clauses 1 to 7, wherein each optical transparent layer consists exclusively of a metal oxide.

Clause 9: Interference layer system according to one of Clauses 1 to 8, wherein the low-refractive-index and high-refractive-index optical transparent layers are arranged alternately one above the other and preferably adjacent to one another.

Clause 10: The interference layer system according to any one of Clauses 1 to 9, wherein the interference layer system is a foil, a film or a particle.

Clause 11: A method of establishing an interference layer system in accordance with any of Clauses 1 to 10, the method comprising the steps of:

(A) providing a flat carrier substrate material,

(b) applying a separating layer,

(c) applying a plurality of optically transparent layers underneath

Generation of an interference layer system,

(d) Detachment of the interference layer system from the flat

Carrier substrate material.

Clause 12: The method of Clause 11 wherein the optically transparent layers are vapor deposited.

Clause 13: The method under Clause 11 or 12 which separates the layer from a water soluble inorganic salt.

Clause 14: Optical filter, wherein the optical filter is or contains an interference layer system according to any one of Clauses 1 to 10. Clause 15: application medium, the application medium including an interference layer system according to any one of clauses 1 to 10.

The invention is illustrated in more detail below with reference to examples and figures, but without being restricted thereto.

characters

Fig. 1 shows a calculated reflection curve of an inventive

Interference layer system made up of a total of 26 alternating layers of T1O2 and S1O2.

Fig. 2 shows the inventive interference layer film or a

Interference layer film according to the invention, for which the reflection curve from FIG. 1 was calculated and measured, on a scanning electron microscope slide.

Fig. 3 shows an SEM image (SEM: scanning electron microscope) of the

interference layer film according to the invention, for which the reflection curve from FIG. 1 was calculated and measured and which can be seen in FIG.

FIG. 4 shows the reduction in transmission in the wavelength range between 350 nm and 800 nm when using an interference layer system for which the reflection curve from FIG. 1 was calculated and measured and which is shown in FIG.

Fig.3 can be seen.

example

A Satisloh 1200 DLF coating system was used as a flat

Substrate material is a plastic substrate coated with a polysiloxane-based flart varnish MP-1 154D (SDC TECFINOLOGIES, INC.) Arranged as a carrier substrate material in accordance with Fiersteller information. The plastic substrate material was an uncoated spectacle lens made of polymer CR39 which had a circular diameter of 6.5 cm and a thickness in the center of 1.5 mm. The primer PR-1 156 (SDC TECHNOLOGIES, INC.) Was first applied to the plastic substrate material in a layer thickness of 750 nm by means of dip coating. The drying took place for 5 min at a temperature of 70 ° C. in a standing oven from Memmert GmbH + Co. KG, D-91 126 Schwabach, type ULE 600. The polysiloxane-based hard lacquer MP-1 154D was then in a layer thickness of 2500 nm applied by means of dip coating. Drying and curing then took place for 120 minutes at a temperature of 110 ° C. in a standing oven from Memmert GmbH + Co. KG D-91 126 Schwabach, type ULE 600.

Before the actual deposition of the layer materials began, the surface was exposed to ions in a vacuum at a pressure of less than 8 × 10 ⁴ mbar. The ions came from an End-Hall-type ion source. This ion source is part of the coating system. The ions were Ar ions with an energy between 80 eV and 130 eV. The one that hits the substrates

Ion current density was between 20 and 60 pA / cm ^2. Ar ions were applied for 2 minutes.

After the Ar-ion exposure was complete, a 30 nm thick layer of NaCl without reactive gas was first applied in a high vacuum to the plastic substrate material provided with hard lacquer with the electron beam evaporator in the Satisloh

Coating system applied at a pressure of 4x10 ^-4 mbar and with a deposition rate of 0.2 nm / s. A total of 26 layers of T1O2 and S1O2 were then applied in a vacuum at a pressure of ⁴ × 10 ⁴ mbar. During the coating of the T1O2 layers, oxygen was added as a reactive gas (20sccm) so that the layers grew without absorption in the visible spectral range and were therefore optically transparent. During the deposition of the T1O2, the substrate was also exposed to ions. These ions came from an End-Hall-type ion source. This ion source is part of the

Coating system. The ions were oxygen ions with an energy between 80 eV and 130 eV. The ion current density striking the substrates was between 20 and 60 pA / cm ^2. The exposure of the growing T1O2 layer with Oxygen ions and the addition of reactive gas contributed to the fact that the T1O2 layers grew as an optically transparent layer. Layers of T1O2 and layers of S1O2 were applied alternately. The first metal oxide layer applied directly to the NaCl separating layer was a TiO2 layer. The respectively applied layer thickness of the TiO2 layer or S1O2 layer is given in [nm] in Table 2.

Table 2

t / nm: thickness in [nm]

The setting of the respective layer thickness took place over the duration of the vapor deposition in accordance with the manufacturer's instructions for the coating system. Determining the

The layer thickness was carried out using an oscillating quartz system (XTC Controller, Inficon, CH-7310 Bad Ragaz), which measures the change in the frequency of an electrical oscillating crystal, the frequency changing with the layer thickness of the growing interference layer system. During the coating process of the plastic carrier substrate, the quartz oscillator is in

analogously coated and its frequency change measured. The calculated reflection curve of the interference layer system with a total of 26

Layers (see Table 2) is shown in FIG.

A measurement was carried out to check the applied coating:

The reflection curve was measured using the F10-AR-UV reflection spectrometer from Filmetrics, Inc. (San Diego, CA 92121, USA) by placing the measuring head, after calibrating the device in accordance with the manufacturer's instructions, on a coated area of the

Plastic carrier substrate was placed. This measurement was carried out within 5 minutes of venting the vacuum coating system after the coating had ended. The measurement of the reflection curve was carried out on the interference layer film still adhering to the plastic carrier substrate, since performing the measurement of a reflection curve on an interference layer film detached from the plastic carrier substrate is complex.

The calculation of the applied layer thicknesses was carried out with the

Software program OptiLayer, version 12.37, from OptiLayer GmbH. For the purposes of calculating the target reflection curve, it was taken into account that the

Interference layer system according to the invention was also present during the measurement via the separating layer, hard lacquer layer and primer layer on the carrier substrate material. For the calculation, a Target reflection curve entered. The software program had algorithms that calculate interference layer systems taking into account boundary conditions. The “gradual evolution” algorithm was selected for the calculation. The substrate material, the primer layer with its optical properties and layer thickness, the hard lacquer layer with its optical properties and layer thickness, the separation layer made of NaCl with its optical properties and layer thickness and the use of T1O2 and S1O2 as layer materials were specified as boundary conditions. The maximum number of layers was limited to 26. The algorithm optimized the number of layers and their thickness until a minimal deviation from the target curve was achieved. As a result of this

Optimization, the layer thicknesses given in Table 2 were obtained. The

The results of the measured reflection curve agreed with the calculated one

Target reflection curve. The interference layer system detached from the carrier substrate therefore also had the calculated or measured reflection curve.

After the end of the coating process, the coated substrates were removed from the coating system and left to stand at room temperature in the laboratory for 5 hours. The relative humidity in the laboratory was more than 30%. The interference layer film or the interference layer film was then pulled off the substrate surface with tweezers. As a result of intrinsic

The interference layer film or the interference layer sheet rolled up under stresses, as shown in FIG.

In Fig. 3 is an SEM image (SEM: scanning electron microscope) of the

To see interference layer film according to the invention. The individual layers of T1O2 and S1O2 are clearly visible. To get the effect in a more viscous

To determine the coating material, about 1% by mass of the detached interference layer film was stirred into glycerine. The stirring became the

Interference layer film comminuted to obtain interference layer particles.

A film of the glycerol containing interference layer particles was then applied to a microscope slide in a layer thickness of 50 μm, and the spectral transmission in the wavelength range from 350 nm to 1050 nm was measured using an Ultrascan spectrophotometer from Hunter Associates Laboratory, Inc. 11491 Sunset Hills Road Reston, VA 20190-5280, USA. For calculating the contribution of the interference layer particles alone, a glycerol film without interference layer particles was measured beforehand.

In Fig. 4, the change in transmission Delta T is due to the addition of the

Interference layer particles applied. This was calculated as the difference in the transmission curve with and without interference layer particles in glycerol.

Fig. 4 can be seen that the addition of the invention

Interference layer particles led to a significant reduction in the transmission in a wavelength range <430 nm, while the transmission at larger wavelengths was not influenced.

The mean particle size of the interference layer particles according to the invention in glycerol, which was used as a model for a viscous coating system, was determined to be about 40 μm under a light microscope.

With an increase in the interference layer particle concentration in glycerine, the transmission could be further reduced.

Claims

1. interference layer system comprising a plurality of optical

transparent layers, which has no carrier substrate and in which the optically transparent layers are arranged flat on top of each other, the optically transparent layers being selected from the group consisting of dielectrics, metals and combinations thereof, at least one first optically transparent layer having a refractive index m and at least one second optically transparent layer has a refractive index r2 and wherein the first refractive index m and the second refractive index r2 differ by at least 0.1, characterized in that

that the reflection curve of the interference layer system in one

Wavelength range from 300 nm to 800 nm at least two ranges

has different reflection.

2. interference layer system according to claim 1,

characterized,

that the layer thickness of each optically transparent layer is in a thickness range from 5 nm to 500 nm.

3. interference layer system according to claim 1 or 2,

characterized,

that the optically transparent layers each have dielectrics, preferably

Metal oxide (s) in an amount of 95 to 100% by weight, based in each case on the total weight of the respective optically transparent layer.

4. interference layer system according to one of claims 1 to 3,

characterized, that the interference layer system has at least 2 low refractive optically transparent layers with a refractive index m <1.8 and at least 2 high refractive optically transparent layers with a refractive index n2.8.

5. interference layer system according to one of claims 1 to 4,

characterized,

that the interference layer system has or consists of 4 to 100 optically transparent layers.

6. interference layer system according to one of claims 1 to 5,

characterized,

that the low-index, optically transparent layer has a refractive index m from a range from 1.3 to 1.78 and is preferably selected from the group consisting of silicon oxide, aluminum oxide, magnesium fluoride, and mixtures thereof.

7. interference layer system according to one of claims 1 to 6,

characterized,

that the high-index optically transparent layer has a refractive index n2 from a range from 2.0 to 2.9 and preferably from the group consisting of titanium oxide, iron oxide, niobium oxide, tantalum oxide, zirconium oxide, chromium oxide, cerium oxide, cobalt oxide and mixtures thereof, is selected.

8. interference layer system according to one of claims 1 to 7,

characterized,

that each optically transparent layer consists exclusively of a metal oxide.

9. interference layer system according to one of claims 1 to 8,

characterized,

that the low-refractive and high-refractive optical transparent layers are arranged alternately one above the other and preferably adjacent to one another.

10. interference layer system according to one of claims 1 to 9,

characterized,

that the interference layer system is a foil, a film or a particle.

1 1. Interference layer system according to one of Claims 1 to 10,

characterized,

that the reflection curve of the interference layer system has a reflection of preferably at least 70% at least in a first range of at least 60% of the falsehood width FWFIM, with FWFIM = (0.6 · lo) - 170 nm, where lo = 380 nm to 600 nm .

12. interference layer system according to claim 1 1,

characterized,

that the calculation of the half value width FWFIM has a relative error of 10%.

13. interference layer system according to one of claims 1 to 12,

characterized,

that the reflection curve of the interference layer system has a reflection of <20% at least in a second range from> 1.1 · lo to <800 nm, with lo = 380 nm to 600 nm.

14. interference layer system according to one of claims 1 to 13,

characterized,

that the interference layer system comprises at least 20 optically transparent layers in which the difference in refractive index between two adjacent layers is at least 0.90.

15. interference layer system according to one of claims 1 to 14,

characterized,

that the reflection curve of the interference layer system for unpolarized light is determined in an angle of incidence range from 0 to 15 °.

16. interference layer system according to one of claims 1 to 15,

characterized,

that the interference system in the optical entry and exit media

- Air with a refractive index at 550 nm of n = 1,000 or

- Water with a refractive index at 550 nm of n = 1, 330 or

- oily / fat-like substances with a refractive index at 550 nm of n = 1,400

has the same reflection properties in a range of preferably 10 percentage points of the corresponding regions.

17. A method for producing an interference layer system according to any one of claims 1 to 16,

characterized,

that the procedure includes the following steps:

(A) providing a flat carrier substrate material,

(b) applying a separating layer,

(c) applying a plurality of optically transparent layers to produce an interference layer system,

(d) Detachment of the interference layer system from the flat

Carrier substrate material.

18. The method according to claim 17,

characterized,

that the optically transparent layers are vapor-deposited.

19. The method according to claim 17 or 18,

characterized,

that the separating layer is formed from a water-soluble inorganic salt.

20. Optical filter,

characterized,

that the optical filter is or contains an interference layer system according to one of claims 1 to 16.

21. Application medium,

characterized,

that the application medium has an interference layer system according to one of the

Claims 1 to 16 contains.

22. Application medium according to claim 21,

characterized,

that the optical entry and exit medium is air with a refractive index at 550 nm of n = 1,000, water with a refractive index at 550 nm of n = 1, 330 and / or oily / greasy substances with a refractive index at 550 nm of n = 1, 400 is.

23. Interference layer system comprising at least 20 alternating layers of different refractive indices,

characterized,

that the reflection curve of the interference layer system in one

Wavelength range of 300 nm and 800 nm at least two ranges

has different reflection and at least one area of these at least two areas in a range of at least 60% of the half-width FWHM, with FWHM = (0.6 · lo) - 170 nm, where lo = 380 nm to 600 nm, a reflection of at least 70%.

24. Interference layer system according to claim 23,

characterized,

that exactly one area of the at least two areas in a range of at least 60% of the half-width FWHM, with FWHM = (0.6 · lo) - 170 nm, where lo = 380 nm to 600 nm, has a reflection of at least 70% .

25. interference layer system according to one of claims 23 and 24,

characterized,

that at least one area which is from the area which is in a range of at least 60% of the half-width FWHM, with FWHM = (0.6 · lo) - 170 nm, where lo = 380 nm to 600 nm, a reflection of at least 70%, is different, in a range from> 1.1 · lo to <800 nm, with lo = 380 nm to 600 nm has a reflection of <20%.

26. Interference layer system according to one of claims 23 to 25, characterized in that

that the refractive index difference between two adjacent layers is at least 0.90.

27. Interference layer system according to one of claims 23 to 26,

characterized,

28. Interference layer system according to one of claims 23 to 27,

characterized,

that the interference layer system has a surface roughness of

Has a surface roughness of preferably <3 nm rms.

29. interference layer system according to one of claims 23 to 28,

characterized,

that the interference layer system has the layer sequence 0.227 T / 1.097 L / 0.661 T / 0.793 L / 1, 109 T / 0.668 L / 1.083 T / 0.922 L / 0.810 T / 0.971 L / 1.012 T / 0.708 L / 1 , 153 T / 1, 055 L / 0.611 T / 0.939 L / 1, 340 T / 0.263 U 1, 458 T / 1, 564 L, with the optical layer thicknesses in lo / 4, with a refractive index for T at 550 nm of n = 2.420 and a refractive index for L at 550 nm of n = 1.468.