EP3679322B1 - Scharnier- und nutresonator aus mems-silizium mit hohem gütefaktor für einen vibrationskreisel - Google Patents
Scharnier- und nutresonator aus mems-silizium mit hohem gütefaktor für einen vibrationskreisel Download PDFInfo
- Publication number
- EP3679322B1 EP3679322B1 EP18854502.4A EP18854502A EP3679322B1 EP 3679322 B1 EP3679322 B1 EP 3679322B1 EP 18854502 A EP18854502 A EP 18854502A EP 3679322 B1 EP3679322 B1 EP 3679322B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- ring
- radial
- connection structure
- rings
- ring portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title description 11
- 229910052710 silicon Inorganic materials 0.000 title description 11
- 239000010703 silicon Substances 0.000 title description 11
- 239000000758 substrate Substances 0.000 claims description 8
- 230000035939 shock Effects 0.000 claims description 6
- 235000012431 wafers Nutrition 0.000 description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- 238000013016 damping Methods 0.000 description 6
- 239000012634 fragment Substances 0.000 description 6
- 230000035945 sensitivity Effects 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 238000009826 distribution Methods 0.000 description 5
- 238000000708 deep reactive-ion etching Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000005457 optimization Methods 0.000 description 3
- 239000005350 fused silica glass Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000001845 vibrational spectrum Methods 0.000 description 2
- 241001289753 Graphium sarpedon Species 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000010141 design making Methods 0.000 description 1
- 230000003467 diminishing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
- G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
- G01C19/567—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using the phase shift of a vibration node or antinode
- G01C19/5677—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using the phase shift of a vibration node or antinode of essentially two-dimensional vibrators, e.g. ring-shaped vibrators
- G01C19/5684—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using the phase shift of a vibration node or antinode of essentially two-dimensional vibrators, e.g. ring-shaped vibrators the devices involving a micromechanical structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0035—Constitution or structural means for controlling the movement of the flexible or deformable elements
- B81B3/004—Angular deflection
- B81B3/0045—Improve properties related to angular swinging, e.g. control resonance frequency
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
- G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
- G01C19/567—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using the phase shift of a vibration node or antinode
- G01C19/5677—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using the phase shift of a vibration node or antinode of essentially two-dimensional vibrators, e.g. ring-shaped vibrators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0228—Inertial sensors
- B81B2201/0242—Gyroscopes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/01—Suspended structures, i.e. structures allowing a movement
- B81B2203/0145—Flexible holders
- B81B2203/0163—Spring holders
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/05—Type of movement
- B81B2203/056—Rotation in a plane parallel to the substrate
Definitions
- This presentation relates to MEMS Disk Resonator Gyroscopes, and in particular relates to the disk resonators of Coriolis Vibratory Gyroscopes.
- FIG. 1 illustrates a perspective view and a detailed fragment of a perspective view of a portion of a known disc resonator 10 architecture for an all-quartz or all silicon resonator gyroscope.
- Resonator 10 can be fabricated out of a fused quartz or silicon plane disc in which deep reactive ion etching may be used to slot the disc into a system of adjacent coaxial rings 12 supported at a central support 14; adjacent coaxial rings 12 having adjacent peripheries 13 and being attached together by a plurality of connection structures 16 regularly arranged along said adjacent peripheries.
- a problem of known resonator 10 is that vibratory Gyroscopes using such resonators are sensitive to vibration, shock, and temperature.
- vibratory gyroscope designs especially disk resonator gyroscopes having a resonator such as 10 with a plurality of interconnected concentric rings 12, reducing ring 12 width reduces the resonator's stiffness dramatically, resulting in lower resonance frequency, thus improving the tuning capability of the resonator (which allows for example to accommodate a temperature induced drift) but also at the same time making the resonator more susceptible to environmental vibrations and/or shocks.
- US 2007/017287 discloses apparatuses and methods of making a micromachined resonator gyroscope, e.g. a disc resonator gyro (DRG), including a triple-wafer stack gyroscope with an all fused quartz (or all silicon) construction for an electrical baseplate, resonator and vacuum cap.
- DDG disc resonator gyro
- a typical resonator embodiment may include a centrally anchored disc with high aspect-ratio in-plane electrostatic drive and sense electrodes to create large capacitance.
- a silicon sacrificial layer may be employed for attaching a quartz resonator wafer to a quartz handle wafer for high aspect-ratio etching.
- embodiments of the invention may comprise a low thermal stress, wafer-level vacuum packaged gyroscope with on-chip getter.
- An ultra-thin conductive layer deposited on the quartz resonator may also be utilized for high Q.
- DRG disk resonator gyroscope
- the rule of the optimized ring thickness distribution is that the outer ring is thicker than the other rings (1.7-1.8 times for this DRG) whereas the other rings should be as thin as possible. Meanwhile the optimized distribution rules can be used on series of DRGs and the optimization methods can be widely used on other MEMS devices.
- This presentation relates to resonators or resonant structures, such as for a disk resonator gyroscope, having concentric rings attached to each other by "Hinge and/or Slot" connection structures wherein the width of the rings is reduced in the vicinity of the connection structures, such design making the resonators less sensitive to vibration and shock compared to known resonators having rings of same width but no "Hinge and/or Slot” connection structures.
- the present disclosure improves MEMS gyroscope having concentric rings attached together by joints, or connection structures, by making the joints between the rings as compliant as the remaining portions of the rings, without reducing the resonance frequency of the resonator.
- An embodiment of this presentation comprises a resonant structure consisting of a rotationally-symmetric array of hinged joint designs connecting concentric rings.
- the hinged joint comprises two circular cuts with radius greater than inter-ring gap width, and optionally two slot cuts on the two sides of the joint (inner and outer sides of the joint), as illustrated for example in figures 2 , 3 .
- the hinged joint comprises an ellipse or circle cut at the center of the joint; as illustrated for example in Figure 7a .
- the hinged joint comprises two slot cuts at the two side of the joint (inner and outer sides of the joint); as illustrated for example in Figure 7b .
- the hinged joint has one slot cut starting from one edge of the joint, and all the slot-cuts are facing the same direction; as illustrated for example in Figures 7c , d.
- slot cuts of the hinged joint of two consecutive pairs of rings are facing opposite radial directions; as illustrated for example in Figure 7e .
- the hinged joint comprises a teardrop shaped cut out; as illustrated for example in Figures 7f, 7g and 7h .
- the teardrop shape is formed by a smooth curve with continuous radius of curvature.
- the teardrop shape comprises a large lobe near the hinged joint between rings and a narrower width away from the hinged joint such that the ring width equals a desired design value away from the joint.
- the hinged joint region comprises a rounded or smoothed slot cut defined by a smooth curve; as illustrated for example in Figure 7g .
- the hinged joint region has an extended rounded or smooth slot cut which transitions to a region of constant width; as illustrated for example in Figure 7h .
- the resonant structure is surrounded by peripheral electrodes; as illustrated for example in Figure 8 .
- the resonant structure is fabricated on SOI wafers; as illustrated for example in Figures 6A to 6D .
- An embodiment of this presentation relates to a MEMS disc resonator having top and bottom main surfaces; the resonator having a central support and including a first plurality of circumferential slots regularly arranged around the central support between the top and bottom main surfaces; each circumferential slot of the first plurality having: an inner vertical circumferential wall that follows an arc of a circle having a first radius centered on an axis of the central support; an outer vertical circumferential wall that follows an arc of a circle having a second radius centered on the axis of the central support, the second radius being larger than the first radius; a first vertical cylindrical side wall that extends between a first end of the inner vertical circumferential wall and a first end of the outer vertical circumferential wall, along an arc of a circle having a third radius and having a center on a circle having a fourth radius, the third radius being larger than a difference between the second and first radiuses and the fourth radius being equal to half a sum of the second and first radiuses; and
- the MEMS disc resonator comprises a second plurality of circumferential slots arranged regularly around the central support between the top and bottom main surfaces; each circumferential slot of the second plurality having: an inner vertical circumferential wall that follows an arc of a circle having a fifth radius centered on the axis of the central support; the fifth radius being larger than a sum of the third and fourth radiuses; an outer vertical circumferential wall that follows an arc of a circle having a sixth radius centered on the axis of the central support, the sixth radius being larger than the fifth radius; a first vertical cylindrical side wall that extends between a first end of the inner vertical circumferential wall and a first end of the outer vertical circumferential wall, along an arc of a circle having a seventh radius and having a center on a circle having an eight radius, the seventh radius being larger than a difference between the sixth and fifth radiuses and the eighth radius being equal to half a sum of the sixth and fifth radiuses; and a second
- At least one of the inner vertical circumferential wall and the outer vertical circumferential wall comprises a radial recess symmetrical with respect to a vertical plane that contains the axis of the central support and the center of the circumferential slot.
- An embodiment of this presentation relates to a resonant structure comprising at least two coaxial rings, wherein: adjacent coaxial rings have adjacent peripheries and are attached together by a plurality of connection structures regularly arranged along the adjacent peripheries; and a first ring has a first ring portion with a first radial thickness and a second ring portion, in a vicinity of a first connection structure, with a second radial thickness smaller than the first radial thickness.
- the at least two coaxial rings and the plurality of connection structures are formed out of a single plane substrate.
- the second ring portion is angularly offset to a first side of a radial axis of the first connection structure.
- the first ring has a third ring portion, having the second radial thickness, angularly offset to a second side of the radial axis of the first connection structure.
- the resonant structure comprises a second ring concentrically attached to the first ring by the first connection structure; wherein the second ring has a fourth ring portion having a third radial thickness and has fifth and sixth ring portions having each a fourth radial thickness smaller than the third radial thickness; the fifth ring portion being radially aligned with the second ring portion and the sixth ring portion being radially aligned with the third ring portion.
- the peripheries of the first and second rings, in the second, third, fifth and sixth ring portions follow, along a plane perpendicular to the axis of the rings, portions of a shape selected among: a circle; an ellipse; and a rectangle.
- an angular thickness of the first connection structure varies along a radial axis of the first connection structure.
- the first ring portion is aligned with a radial axis of the first connection structure.
- the second ring portion is formed by a first radial recess developing from a periphery of the first ring distal from the first connection structure toward the first connection structure.
- the periphery of the first ring, in the second ring portion follow, along a plane perpendicular to the axis of the rings, portions of a shape selected among: a circle; an ellipse; and a rectangle.
- the resonant structure comprises: a second ring concentrically attached to the first ring by the first connection structure; and third and fourth concentric rings attached together by a second connection structure radially aligned with the first connection structure; wherein the third ring has a third ring portion having a third radial thickness and has a fourth ring portion having a fourth radial thickness smaller than the third radial thickness; the fourth ring portion being radially aligned with the second ring portion; the fourth ring portion being formed by a second radial recess developing from a periphery of the third ring distal from the second connection structure toward the second connection structure.
- one of the first and second rings is attached to one of the third and fourth rings by a plurality of regularly arranged connection structures angularly offset from the connection structures attaching the first and second rings.
- connection structures attach each ring to a neighboring ring; and connection structures attached to the inner and outer periphery of each ring are angularly offset by ⁇ /N from each other.
- the first and second radial recesses develop in a same radial direction.
- the first and second radial recesses develop in opposite radial directions.
- the resonant structure comprises a second ring concentrically attached to the first ring by the first connection structure; wherein the second ring has a third ring portion having a third radial thickness and has a fourth ring portion having a fourth radial thickness smaller than the third radial thickness; the fourth ring portion being radially aligned with the second ring portion; the fourth ring portion being formed by a second radial recess developing from a periphery of the second ring distal from the first connection structure toward the first connection structure.
- the first radial recess develops into the first connection structure.
- the first radial recess develops into a second ring concentrically attached to the first ring by the first connection structure.
- the first reduced radial thickness is formed by a first radial recess developing from a center of the first connection structure toward a periphery of the first ring distal from the first connection structure.
- an angular thickness of the first connection structure varies along a radial axis of the first connection structure.
- This presentation also relates to a Gyroscope using any of the resonators described above.
- the Inventors have conducted finite element analysis COMSOL models with thermoelastic damping, and have come to the conclusion that the critical location of energy loss of the known Disc Resonator of Disc Resonator Gyroscopes, is at the joint between the rings of the Resonator.
- the present disclosure improves MEMS gyroscope having concentric rings attached together by joints, or connection structures, by making the joints between the rings as compliant as the remaining portions of the rings, without reducing the resonance frequency of the resonator.
- the inventors have found, after performing a deep and exhaustive study of known Disc Resonator and Hinge and Slot-cut Resonators side by side, that Hinge and Slot-cut resonators satisfy the long felt-need for high performance inertial navigation in smaller packages with lower cost, weight, and power.
- Embodiments of this presentation provide for a high-Q (Quality Factor) MEMS silicon Hinge and Slot-cut Vibratory Gyroscope /(HSVG).
- a novel feature is the unique Hinge and Slot-cut vibratory resonator design which allows deformation of its structure without twisting, thus reducing strain-induced thermal gradient and resulting in high thermoelastic damping limited quality factor (QTED > 100,000).
- the Hinge and Slot-cut design according to this presentation enables reducing stiffness of joints/interconnections between rings while maintaining wider ring width (15-20 um), minimizing heat loss regions at the joint to increase thermoelastic damping limited quality factor (QTED).
- Hinge and Slot-cut Vibratory Gyroscopes according to this presentation, with a thickness of 350 um (micrometers) or more, have reduced acceleration sensitivity (up to 50,000 G) in any acceleration direction.
- the Hinge and Slot-cut Vibratory design can have high adiabatic QTED since wider ring width (> 100 um) will have frequency >100 kHz.
- Hinge and Slot-cut Vibratory design as disclosed, in addition to particular implementations, can be thought of as a method to design high-Q silicon vibratory gyroscope and resonator structures in frequency ranges where this was previously not possible.
- Embodiment of this presentation enable designing high-Q MEMS silicon Coriolis Vibratory Gyroscopes (CVGs).
- Current state-of-art (SOA) CVGs include silicon disk resonator gyroscopes (DRGs) exhibiting resonance frequencies around 1.4 kHz and Q-factors upward of 80,000.
- Embodiment of this presentation have a similar resonance frequency but with QTED >1.5X of known, state of the art, DRG.
- Figure 2A is a top view of a fragment of a resonator 20 according to an embodiment of this presentation; comprising a plurality of coaxial rings 22 wherein adjacent coaxial rings 22 have adjacent peripheries 24 and are attached together by a plurality of connection structures 26 regularly arranged along the adjacent peripheries 24.
- rings 22 comprise each at least one first ring portion 22 with a first radial thickness (the radial thickness of most of the ring) and at least one second ring portion 2.2" (2.2" a, 22"b, 22"c), in a vicinity of each connection structure 26, which has a reduced radial thickness (a second radial thickness smaller than the first radial thickness), thus forming a hinged and slot-cut joint.
- each ring 22 comprises as many first ring portions 22' as the ring 22 comprises connection structures 26 attached to both its inner and outer peripheries 24.
- each ring 22 can comprise one to three ring portions of reduced radial thickness (22"a, 22"b, 22"c) in the vicinity of each connection structure 26 the ring is attached to.
- the rings 22 of resonator 20 are connected to an outer periphery 27 of a central support 28 having a rotational axis by connection structures 26 attached to an inner periphery 24 of an innermost ring 22.
- the coaxial rings 22, the connection structures 26 and central support 28 can all be formed by deep reactive ion etching of a single, plane, wafer, for example a plane wafer of silicon.
- the second ring portion (22"a) is angularly offset to a first side of a radial axis of the connection structure 26 it is closest to.
- ring 22 comprises a third ring portion (22"b), having the same reduced radial thickness as the second ring portion 22"a, angularly offset to a second side of the radial axis of the first connection structure 26 the second ring portion 22"a, is closest to.
- second ring 32 when a first ring 22 of resonator 20 is connected to a second ring 22 (hereafter referenced 32 for clarity) of resonator 20 by the connection structure 26, second ring 32 has a fourth ring portion 32' having a third radial thickness (the radial thickness of most of ring 32) and has fifth (32"a) and sixth (32"b) ring portions having each a fourth radial thickness smaller than the third radial thickness; the fifth ring portion 32"a being radially aligned with the second ring portion 22"a and the sixth ring portion 32"b being radially aligned with the third ring portion 22"b.
- all the rings 22 have a same (non-reduced) thickness along most of their length, and the above-mentioned first and third radial thicknesses are equal.
- the above-mentioned second and fourth radial thicknesses can then also be equal.
- the second (22"a), third (22"b), fifth (32"a) and sixth (32"b) ring portions can alternatively follow each a portion of an ellipse, or of a rectangle shape or of a circle.
- an angular thickness of connection structure 26 can vary along its radial axis 26'.
- the angular thickness of connection structure 26 varies along its radial axis such that the walls of connection structure 26 follow a same circular shape as the second (22"a), third (22"b), fifth (32"a) and sixth (32"b) ring portions, thus forming circular-hole shapes at each junction between two rings 22 and a connection structure 26.
- the rings 22 (32) of resonator 20 comprise another ring portion 22"c (32"c) of reduced radial thickness that is aligned with the radial axis 26' of the first connection structure 26.
- Such other ring portion of reduced radial thickness is formed by a radial recess 34 developing from a periphery of the ring 22 distal from the first connection structure 26 toward the first connection structure 26.
- Radial recess 34 is shown in Figure 2A as following portions of a rectangle. However, according to other embodiments of this presentation, radial recess 34 can also follow portions of a circle or of an ellipse.
- the radial recess 34 can have a radial depth equal to or larger than the first (non-reduced) radial thickness of the rings 22.
- the reduced thickness of the ring in the radial axis of radial recess 34 is a null thickness; and the angular width of connection structure 26 must always be larger than the angular width of radial recess 34.
- the radial recess 34 can also have a radial depth smaller than or equal to the first (non-reduced) radial thickness of the rings 22.
- both the inner periphery and the outer periphery of a ring 22 of resonator 20 are attached to another portion of resonator 20 each by a number N of connections structures 26; and the connection structures 26 attached to the inner periphery of ring 22 are offset angularly with respect to the connection structures 26 attached to the inner periphery of ring 22 by an angle of ⁇ /N.
- the inner periphery and the outer periphery of the rings 22 of resonator 20 are not necessarily attached to another portion of resonator 20 by a same number.
- the number and position of the connection structures 26 attached to each periphery of each ring 22 of resonator 20 is nevertheless chosen such that resonator 20 shows a rotational symmetry.
- a resonator according to an embodiment of this presentation such as illustrated in Figure 2A , achieves high thermal elastic damping limited and anchor limited quality factor (QTED and Qanchor), low acceleration sensitivity, high frequency tuning range and similar frequency than known Disc Resonator Gyroscopes ( ⁇ 10-15 kHz).
- central support 28 can be coupled to a solid cylinder to support resonator 20 on a substrate of a gyroscope using resonator 20.
- resonator 20 can comprise 70 rings 22 (less are illustrated), with an outermost ring 22 having an 8 mm outer periphery diameter and a central support having a 3.8 mm anchor outer periphery diameter; each ring 22 generally having a radial width of 20 ⁇ m (away from the connection structures 26, in portion 22'); wherein the rings 22 are radially distant from each other of 10 ⁇ m away from the connection structures 26.
- the portions of reduced radial width of rings 22 (portions 22"a, 22"b) on each side of connection structures 26 as well as the edges of connection structures 26 follow each portions of a circle shape having a diameter of 30 ⁇ m, the minimum angular width of the connection structures being of 30 ⁇ m; and the vertical thickness of rings 22 as well as connection structures 26 being of 350 ⁇ m.
- there can be a slot of full radial width between the central support and the inner periphery of the innermost ring contrary to what is illustrated in Figures 2 , 3 which show only a half radial width slot between the central support and the inner periphery of the innermost ring.
- connection structure 26 causes the rings of the resonator to be joined with more compliant connectors than in known disc resonators, thus making the rings of this presentation less stiff than the prior art rings with the same radial ring width.
- prior art rings are stiffer, they deform less easily into an N2 elliptical mode shape than rings according to embodiments of this presentation, which eventually results in the rings of the known disc resonators to twist during resonance. Twisting of the rings generates hot and cold spots that is indicative of unwanted damping and a lowering of the QTED in the prior art disc resonator structures.
- disc resonators according to embodiments of this presentation minimize hot and cold spots, because they have rings that are freer to deform.
- varying the distance between the rings, the radial depth and angular width of radial thickness reductions of the rings allows optimizing the performance for each ring width, resulting in optimized geometry for different frequency operational range applications.
- embodiments of this presentation relate to a resonant structure 20 comprising a plurality of concentric ring-like structures 22; each ring like structure 22 comprising a plurality of ring segments 22' of constant radial thickness; and a plurality of connection structures (22"a, 22"b, 22"c); each connection structure attaching together the plurality of ring segments 22' of two adjacent ring-like structures 22; wherein at least one portion (22"a, 22"b, 22"c) of each connection structure has a reduced radial thickness less than the sum of the radial thicknesses of the two adjacent ring-like structures 22 it connects.
- each connection structure (22"a, 22"b, 22"c) comprises at least two portions (22"a, 22"b) of reduced radial thickness arranged symmetrically at equal angular distances from a central portion of the connection structure (22"a, 22"b, 22"c).
- said at least one portion of reduced radial thickness is a central portion (22"c) of the connection structure (22"a, 22"b, 22"c).
- FIG. 2B is a top view of a resonator 20 according to an embodiment of this presentation; comprising a plurality of coaxial rings 22 wherein adjacent coaxial rings 22 have adjacent peripheries 24 and are attached together by a plurality of connection structures 26 regularly arranged along the adjacent peripheries 24.
- rings 22 comprise each at least one first ring portion 22' with a first radial thickness (the radial thickness of most of the ring) and at least one second ring portion 22" (22"a, 22"b, 22"c), in a vicinity of each connection structure 26, which has a reduced radial thickness (a second radial thickness smaller than the first radial thickness), thus forming a hinged and slot-cut joint.
- two portions 22"' of ring 22 having the same thickness as portions 22' separate reduced thickness portion 22"c from reduced thickness portions 22" a and 22"b.
- Figure 3 is a perspective view of the portion of resonator 20 illustrated in Figure 2A .
- Figure 4 comprises a graph illustrating that a gyroscope using a resonator according to an embodiment of this presentation (a fragment of which is seen in perspective on the right of Figure 4 ) can achieve a ThermoElastic Damping limited quality factor (QTED) of 148,000 (1.48E5) at a frequency of 15 kHz.
- the QTED data for the embodiment is simulated (circle and triangle).
- the SOA DRG (known resonator) measured Q (black circle) is 80,000.
- the blue triangle marks the QTED for the Gyroscope using a resonator according to this presentation; and circles represent possible Disc Resonator Gyroscopes designs with the black circle marking the known Disc Resonator Gyroscopes design.
- the dashed line in figure 4 shows the performance barrier of prior art DRGs.
- gyroscopes using a resonator according to embodiments of this presentation can operate at a frequency greater than 15 kHz without compromising other performance aspects, including vibration insensitivity and electrical frequency tuning range.
- Figure 5 illustrates the QTED of two gyroscopes: one using a known resonator having rings connected as illustrated in Figure 5 (circle mark) and one using a resonator according to an embodiment of this presentation, having a same ring radial width (and axial height) but having reduced radial widths as disclosed in relation with Figure 2A and illustrated in Figure 5 (triangle mark).
- the HSVG and DRG resonators in this figures have the same ring (label 22 in Figure 2A ) width.
- the conventional DRG has higher resonant frequency and lower QTED.
- Figure 5 shows that the QTED of a gyroscope using a resonator according to embodiments of this presentation can be 2.3 times the QTED of a conventional Disc Resonator Gyroscopes with same ring width.
- FIGs 6A to 6D illustrate a fabrication process of a gyroscope comprising a resonator according to embodiments of this presentation.
- a backside alignment target 40 is formed by etching a substrate 42, for example a Si (silicon) substrate, attached by a partly sacrificial layer 44 on the backside of a another Si wafer 46, thus forming a SOI wafer 47; followed by a patterning of a backside metal layer 48 (which for example allows a subsequent die attachment to an Leadless Chip Carrier package).
- a front side alignment target 50 is then etched in a substrate (here Si) 46 on the front side of SOI wafer 47, following by a patterning of a front side metal layer to form electrical contacts 52.
- the rings 22 (two illustrated) and central support 28 of the resonator structure are formed, for example by Deep Reactive-Ion Etching (DRIE) of the substrate 46 (here Si), exposing portions of layer 44, the buried oxide, for a hydrofluoric acid (HF) undercut to release the structure in step four, as shown in Figure 6D .
- DRIE Deep Reactive-Ion Etching
- HF hydrofluoric acid
- the resonator is completed by etching away (for example using hydrofluoric acid (HF)) the portions of layer 44 that maintain the rings 22 (while keeping a portion of layer 44 below central support 28 to keep the resonator attached to substrate 42).
- etching away for example using hydrofluoric acid (HF)
- HF hydrofluoric acid
- FIG. 7a illustrates an embodiment of the cormection structures 26 of the rings 22 of a resonator according to an embodiment of this presentation, wherein the reduced radial thickness portion 22" of a ring 22 is formed by a radial recess 60 that develops radially from a center of the connection structure 26 that is attached to a periphery of the ring 22, toward the other periphery of the ring 22.
- radial recess 60 forms an elliptic cut out in the connection structure between the rings.
- Figure 7b illustrates an embodiment of the connection structures 26 of the rings 22 of a resonator according to an embodiment of this presentation, wherein the reduced radial thickness portion 22" of a ring 22 is formed by a radial recess 34 that develops radially from a periphery of the ring 22 distal from the connection structure 26 that is attached to it, toward the connection structure 26.
- Figure 7c illustrates an embodiment of the connection structures 26 of the rings 22 of a resonator according to an embodiment of this presentation, wherein, for two rings 22 attached by a connection structure 26, at least a first ring 22 comprises a reduced radial thickness portion 22" formed by a radial recess 62 that develops radially from a periphery of the first ring 22 distal from the connection structure 26, into connection structure 26 toward the second ring 22 attached to connection structure 26.
- radial recess 62 may have a radial length larger than the radial thickness of the first ring 22 (in which case its portion of reduced thickness 22" has a null thickness) and may have a radial length larger than the sum of the radial thickness of the first ring 22 and of the connection structure 26 (in which case also the second ring 22 has a portion of reduced thickness 22").
- the radial recesses formed in consecutive pairs of rings 22 can all develop in a same radial direction (from a periphery of a ring 22 on the right of the figure in Figure 7c ).
- Figure 7d is essentially identical to Figure 7c , but for having radial recesses 62 that develop in a direction opposite the direction in Figure 7c .
- Figure 7e is essentially identical to Figure 7c or 7d , except that for each couple of pairs of rings 22 attached by couple of connection structures 26, the resonator comprises a couple of radial recesses 62 that develop in opposite directions.
- Figure 7f illustrates a portion of a single pair of rings 22 of a resonator according to embodiments of this disclosure, attached by a connection structure 26, where each ring 22 comprises two ring portions 22"a, 22"b of reduced radial thickness, on each side of a radial axis of connection structure 26, that follow each, along a plane perpendicular to the axis of the rings (i.e. the plane of the paper in Figure 2A ), a portion of an ellipsoid shape.
- connection structure 26 varies radially, such that the periphery of the ring portions 22"a or 22"b of reduced radial thickness of the rings attached by connections structure 26, as well as the edge of connections structure 26 that joins these ring portions, follow a teardrop-shaped curve (whereby the peripheries of the rings 22 and their junction to connection structures 26 comprise no sharp angle).
- Figure 7g illustrates a portion of a single pair of rings 22 of a resonator according to embodiments of this disclosure, attached by a connection structure 26, similar to the embodiment illustrated in Figure 7f but where each ring 22 comprises three ring portions 22"a, 22"b and 22"c of reduced radial thickness.
- the two first ring portions 22"a and 22"b on each side of a radial axis of connection structure 26 are identical to those disclosed in Figure 7f .
- the third ring portion 22"c of reduced radial thickness is formed by a radial recess 34 developing from the periphery of ring 22 that is distal from connection structure 26, toward connection structure 26.
- radial recess follows a trigonometric function such that the junction between the ring periphery and recess comprises no sharp angle.
- Figure 7h illustrates an embodiment of this presentation that differs from the embodiment of Figure 7g by having a connection structure 26 and a recess 34 angularly wider than in Figure 7g , where the deepest point of recess 34 is essentially flat (normal to a radial axis of connection structure 26).
- FIG. 7i illustrates a portion of rings 22 of a resonator according to embodiments of this disclosure, attached by a connection structure 26, where each ring 22 comprises three ring portions 22"a, 22"b and 22"c of reduced radial thickness, arranged symmetrically with respect to a radial axis of connection structure 26, identical to for example the embodiment illustrated in Figure 2A , except that the angular width of connection structure 26 does not vary radially, such that the periphery of the ring portions 22"a or 22"b of reduced radial thickness of the rings attached by connections structure 26, as well as the edge of connections structure 26 that joins these ring portions, follow a rectangular-shaped curve.
- Figure 8A is a top view of a portion of a Gyroscope using a resonator 20 according to embodiments of this presentation, having concentric rings 22 attached together by connection structures 26 arranged regularly on the peripheries of the rings.
- Figure 8B shows an enlarged view of a portion of the gyroscope of Figure 8A with peripheral electrodes 80 (two shown in Figure 8B ) for driving the resonator or sensing the resonator's motion; as well as a peripheral electrode 82, which can be a ground resonator.
- Figures 8A to 8E are "negative" figures in which the darker areas such as between the rings represent voids or spaces between the white, material, areas.
- connection structures 26 attached to each periphery of a same ring 22 are radially offset.
- Figure 8C shows that the inner periphery of the outward-most ring 22 of resonator 20 is attached to the outward periphery of the second outward-most ring 22 of resonator 20 by a first connection structure 26.
- the inner periphery of the second outward-most ring 22 of resonator 20 is not attached to the outer periphery of the third outward-most ring 22 by a second connection structure 26 that would be radially aligned with the first connection structure 26.
- the inner periphery of the second outward-most ring 22 of resonator 20 is attached to the outer periphery of the third outward-most ring 22 by a second connection structure 26 that is angularly offset from the first connection structure 26 (by an angle of ⁇ /N where each ring is connected to the next ring by N connection structures 26).
- connection structure 26 of same radial length as the connection structures 26 connecting the rigs 22 together.
- the innermost ring 22 of resonator 20 can be connected to central support 28 by a connection structure of reduced radial length with respect to the radial length of the connection structures 26 connecting the rings 22 together.
- the outer periphery of the central support 28 can comprise regions of reduced radial length, arranged to match the inward-facing portions of reduced radial width of the innermost ring 22.
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Radar, Positioning & Navigation (AREA)
- Remote Sensing (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Gyroscopes (AREA)
Claims (13)
- Resonante MEMS-Struktur, die mindestens zwei koaxiale Ringe (22) umfasst, wobei:benachbarte koaxiale Ringe (22) der mindestens zwei koaxialen Ringe benachbarte Peripherien (24) aufweisen und aneinander angebracht sind durch eine Mehrzahl von Verbindungsstrukturen (26), die entlang der benachbarten Peripherien (24) gleichmäßig angeordnet sind;dadurch gekennzeichnet, dass:ein erster Ring (22) der benachbarten koaxialen Ringe einen ersten Ringabschnitt (22') mit einer ersten radialen Dicke aufweist, undeinen zweiten Ringabschnitt (22", 22"c) an einer ersten Verbindungsstruktur der Mehrzahl von Verbindungsstrukturen, mit einer zweiten radialen Dicke, die kleiner ist als die erste radiale Dicke;wobei der zweite Ringabschnitt (22", 22"c) durch eine erste radiale Aussparung (34; 62) ausgebildet ist, die von einer Peripherie des ersten Rings (22), distal zu der ersten Verbindungsstruktur (26) in Richtung der ersten Verbindungsstruktur (26) ausgebildet ist;wobei der zweite Ringabschnitt (22", 22"c) so angeordnet ist, dass er die resonante MEMS-Struktur weniger empfindlich in Bezug auf Schwingungen und Stöße gestaltet im Vergleich zu der gleichen resonanten MEMS-Struktur, bei der der zweite Ringabschnitt die gleiche radiale Dicke wie der erste Ringabschnitt (22') aufweist.
- Resonante MEMS-Struktur nach Anspruch 1, wobei die mindestens zwei koaxialen Ring (22) und die Mehrzahl von Verbindungsstrukturen (26) aus einem Substrat mit einer einzigen Ebene gestaltet sind.
- Resonante MEMS-Struktur nach Anspruch 1, wobei eine Dicke der ersten Verbindungsstruktur (26) in eine Winkelrichtung entlang einer radialen Achse der ersten Verbindungsstruktur (26) variiert.
- Resonante MEMS-Struktur nach Anspruch 1, wobei die Peripherie des ersten Rings (22) in dem zweiten Ringabschnitt (22", 22"c) einer Ebene folgt, die senkrecht ist zu der Achse der Ringe, wobei Teile einer Form ausgewählt sind aus:einem Kreis;einer Ellipse; undeinem Rechteck.
- Resonante MEMS-Struktur nach Anspruch 1, wobei diese folgendes umfasst:einen zweiten Ring (22), der durch die erste Verbindungsstruktur (26) konzentrisch an dem ersten Ring (22) angebracht ist; unddritte (22) und vierte (22) konzentrische Ringe, die durch eine zweite Verbindungsstruktur (26), radial ausgerichtet mit der ersten Verbindungsstruktur (26) durch eine zweite Verbindungsstruktur (26) angebracht sind; wobei der dritte Ring (22) einen dritten Ringabschnitt (22') mit einer dritten radialen Dicke aufweist, und mit einem vierten Ringabschnitt (22") mit einer vierten radialen Dicke, die kleiner ist als die dritte radiale Dicke; wobei der vierte Ringabschnitt (22", 22"c) radial mit dem zweiten Ringabschnitt (22", 22"c) ausgerichtet ist;wobei der vierte Ringabschnitt (22") durch eine zweite radiale Aussparung (34; 62) ausgebildet ist, die von einer Peripherie des dritten Rings (22), distal zu der zweiten Verbindungsstruktur, in Richtung der zweiten Verbindungsstruktur ausgebildet ist.
- Resonante MEMS-Struktur nach Anspruch 5, wobei der erste oder der zweite Ring (22) an dem dritten oder dem vierten Ring (22) angebracht ist durch eine Mehrzahl gleichmäßig angeordneter Verbindungsstrukturen (26), mit einem Winkelversatz zu den Verbindungsstrukturen (26), welche den ersten und den zweiten Ring (22) anbringen.
- Resonante MEMS-Struktur nach Anspruch 5, wobei eine gleiche Anzahl N von Verbindungsstrukturen (26) jeden Ring (22) an einem benachbarten Ring (22) anbringen; und wobei die Verbindungsstrukturen (26), die an der inneren und äußeren Peripherie jedes Rings (22) angebracht sind, um π/N in einem Winkel versetzt sind.
- Resonante MEMS-Struktur nach Anspruch 5, wobei die ersten und zweiten radialen Aussparungen (34; 62) in eine gleiche radiale Richtung ausgebildet sind; oder wobei die ersten und zweiten radialen Aussparungen (34; 62) in entgegengesetzte radiale Richtungen ausgebildet sind.
- Resonante MEMS-Struktur nach Anspruch 1, wobei diese folgendes umfasst:einen zweiten Ring (22), der durch eine erste Verbindungsstruktur (26) konzentrisch an dem ersten Ring (22) angebracht ist; wobei der zweite Ring (22) einen dritten Ringabschnitt (22') mit einer dritten radialen Dicke aufweist und einen vierten Ringabschnitt (22", 22"c) mit einer vierten radialen Dicke, die kleiner ist als die dritte radiale Dicke; wobei der vierte Ringabschnitt (22", 22"c) mit dem zweiten Ringabschnitt (22", 22"c) radial ausgerichtet ist;wobei der vierte Ringabschnitt (22", 22"c) ausgebildet ist durch eine zweite radiale Aussparung (34), die von einer Peripherie des zweiten Rings (22), distal zu der ersten Verbindungsstruktur (26) in Richtung der ersten Verbindungsstruktur (26) ausgebildet ist.
- Resonante MEMS-Struktur nach Anspruch 1, wobei die erste radiale Aussparung (34) in die erste Verbindungsstruktur (26) ausgebildet ist.
- Resonante MEMS-Struktur nach Anspruch 1, wobei die erste radiale Aussparung (62) in einen zweiten Ring (22) ausgebildet ist, der durch die erste Verbindungsstruktur (26) konzentrisch an dem ersten Ring (22) angebracht ist.
- Resonante MEMS-Struktur, die mindestens zwei koaxiale Ring (22) umfasst, wobei:benachbarte koaxiale Ring (22) benachbarte Peripherien (24) aufweisen und durch eine Mehrzahl von Verbindungsstrukturen (26) aneinander angebracht sind, die gleichmäßig entlang den benachbarten Peripherien (24) angeordnet sind; und wobeiein erster Ring (22) einen ersten Ringabschnitt (22') mit einer ersten radialen Dicke aufweist, und einen zweiten Ringabschnitt (22", 22"c) in einer Umgebung einer ersten Verbindungsstruktur (26), mit einer zweiten radialen Dicke, die kleiner ist als die erste radiale Dicke;wobei die zweite radiale Dicke ausgebildet ist durch eine erste radiale Aussparung (60), die von einer Mitte der ersten Verbindungsstruktur (26) in Richtung einer Peripherie (24) des ersten Rings (22) ausgebildet ist, distal zu der ersten Verbindungsstruktur (26); wobei der zweite Ringabschnitt (22", 22"c) so angeordnet ist, dass er die resonante MEMS-Struktur weniger empfindlich gestaltet in Bezug auf Schwingungen und Stöße im Vergleich zu einer gleichen MEMS-Struktur, bei der der zweite Ringabschnitt eine gleiche radiale Dicke aufweist wie der erste Ringabschnitt (22').
- Resonante MEMS-Struktur nach Anspruch 12, wobei eine Dicke der ersten Verbindungsstruktur (26) entlang einer Winkelrichtung entlang einer radialen Achse der ersten Verbindungsstruktur (26) variiert.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201762555617P | 2017-09-07 | 2017-09-07 | |
PCT/US2018/046559 WO2019050659A1 (en) | 2017-09-07 | 2018-08-13 | MEMS SILICON HINGE WITH HIGH QUALITY FACTOR AND CUTTING SLIT RESONATOR FOR VIBRANT GYROSCOPE |
Publications (3)
Publication Number | Publication Date |
---|---|
EP3679322A1 EP3679322A1 (de) | 2020-07-15 |
EP3679322A4 EP3679322A4 (de) | 2021-05-05 |
EP3679322B1 true EP3679322B1 (de) | 2023-05-10 |
Family
ID=65518706
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP18854502.4A Active EP3679322B1 (de) | 2017-09-07 | 2018-08-13 | Scharnier- und nutresonator aus mems-silizium mit hohem gütefaktor für einen vibrationskreisel |
Country Status (4)
Country | Link |
---|---|
US (1) | US11137249B2 (de) |
EP (1) | EP3679322B1 (de) |
CN (1) | CN111051814B (de) |
WO (1) | WO2019050659A1 (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3721055B1 (de) | 2017-12-04 | 2023-04-26 | HRL Laboratories, LLC | Kontinuierliche bahnberechnung für richtungsbohren |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6367786B1 (en) | 1999-06-07 | 2002-04-09 | California Institute Of Technology | Micromachined double resonator |
CN1265547C (zh) | 1999-11-02 | 2006-07-19 | Eta草图制造公司 | 包括集成微机械式环形谐振器的时基 |
US7168318B2 (en) * | 2002-08-12 | 2007-01-30 | California Institute Of Technology | Isolated planar mesogyroscope |
US7581443B2 (en) | 2005-07-20 | 2009-09-01 | The Boeing Company | Disc resonator gyroscopes |
US7493814B2 (en) * | 2006-12-22 | 2009-02-24 | The Boeing Company | Vibratory gyroscope with parasitic mode damping |
IL181367A (en) * | 2007-02-15 | 2013-03-24 | Elbit Systems Electro Optics Elop Ltd | Vibrating gyroscopic device for measuring angular velocity |
US7987714B2 (en) * | 2007-10-12 | 2011-08-02 | The Boeing Company | Disc resonator gyroscope with improved frequency coincidence and method of manufacture |
CN104613952B (zh) * | 2015-02-12 | 2017-09-19 | 东南大学 | 三轴单片集成全解耦角振动环式硅陀螺仪及其加工方法 |
CN104931031B (zh) * | 2015-05-29 | 2018-02-09 | 上海交通大学 | 一种外缘固定式静电驱动多环陀螺及其制备方法 |
CN104976995B (zh) * | 2015-08-07 | 2018-05-25 | 中国人民解放军国防科学技术大学 | 变谐振环壁厚的嵌套环式mems振动陀螺 |
US10794700B1 (en) * | 2015-10-30 | 2020-10-06 | Garmin International, Inc. | Stress isolation of resonating gyroscopes |
CN105486297B (zh) * | 2015-11-19 | 2018-05-29 | 上海交通大学 | 一种圆盘多环内s形柔性梁谐振陀螺及其制备方法 |
-
2018
- 2018-08-13 WO PCT/US2018/046559 patent/WO2019050659A1/en unknown
- 2018-08-13 US US16/102,565 patent/US11137249B2/en active Active
- 2018-08-13 CN CN201880055973.1A patent/CN111051814B/zh active Active
- 2018-08-13 EP EP18854502.4A patent/EP3679322B1/de active Active
Also Published As
Publication number | Publication date |
---|---|
EP3679322A1 (de) | 2020-07-15 |
CN111051814B (zh) | 2023-09-05 |
US11137249B2 (en) | 2021-10-05 |
CN111051814A (zh) | 2020-04-21 |
EP3679322A4 (de) | 2021-05-05 |
WO2019050659A1 (en) | 2019-03-14 |
US20190072388A1 (en) | 2019-03-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN110998231B (zh) | 高品质因数mems硅生命之花式振动陀螺仪 | |
US10746548B2 (en) | Ring gyroscope structural features | |
CN102449434B (zh) | 陀螺仪封装组件 | |
US9494425B2 (en) | Gyroscope and method of fabricating a resonator for a gyroscope | |
US11326883B2 (en) | Inertial sensing systems and methods of manufacturing the same | |
EP2578994A2 (de) | Drehscheibengyroskop | |
CN105486297A (zh) | 一种圆盘多环内s形柔性梁谐振陀螺及其制备方法 | |
CN104931031A (zh) | 一种外缘固定式静电驱动多环陀螺及其制备方法 | |
CN105371833A (zh) | 一种圆盘多环外s形柔性梁谐振陀螺及其制备方法 | |
EP3574286B1 (de) | Verfahren zur optimierung der leistung eines mems-ratengyroskops | |
KR20190015992A (ko) | 각속도 센서들 | |
EP2616773B1 (de) | Winkelgeschwindigkeitssensor | |
CN105371832B (zh) | 一种圆盘多环内双梁孤立圆环谐振陀螺及其制备方法 | |
EP3679322B1 (de) | Scharnier- und nutresonator aus mems-silizium mit hohem gütefaktor für einen vibrationskreisel | |
KR101463151B1 (ko) | 정전기장 방식의 진동형 자이로스코프 | |
US11614328B2 (en) | Sensing device | |
US11725941B2 (en) | Sensing device | |
US11060865B1 (en) | Disk resonator gyroscope (DRG) with engineered radial stiffness for high anchor quality factor (Q) | |
CN105466407A (zh) | 一种圆盘多环外双梁孤立圆环谐振陀螺及其制备方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE |
|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
|
17P | Request for examination filed |
Effective date: 20200331 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
AX | Request for extension of the european patent |
Extension state: BA ME |
|
RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: HUANG, LIAN X. Inventor name: SORENSON, LOGAN D. Inventor name: PERAHIA, RAVIV Inventor name: NGUYEN, HUNG Inventor name: CHANG, DAVID T. Inventor name: CHANG, CHIA-MING "GAVIN" |
|
DAV | Request for validation of the european patent (deleted) | ||
DAX | Request for extension of the european patent (deleted) | ||
A4 | Supplementary search report drawn up and despatched |
Effective date: 20210409 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: G01C 19/5684 20120101AFI20210401BHEP |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: GRANT OF PATENT IS INTENDED |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: B81B 3/00 20060101ALI20221121BHEP Ipc: G01C 19/5684 20120101AFI20221121BHEP |
|
INTG | Intention to grant announced |
Effective date: 20221207 |
|
GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE PATENT HAS BEEN GRANTED |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D |
|
REG | Reference to a national code |
Ref country code: AT Ref legal event code: REF Ref document number: 1567071 Country of ref document: AT Kind code of ref document: T Effective date: 20230515 Ref country code: CH Ref legal event code: EP |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R096 Ref document number: 602018049789 Country of ref document: DE |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FG4D |
|
P01 | Opt-out of the competence of the unified patent court (upc) registered |
Effective date: 20230523 |
|
REG | Reference to a national code |
Ref country code: LT Ref legal event code: MG9D |
|
REG | Reference to a national code |
Ref country code: NL Ref legal event code: MP Effective date: 20230510 |
|
REG | Reference to a national code |
Ref country code: AT Ref legal event code: MK05 Ref document number: 1567071 Country of ref document: AT Kind code of ref document: T Effective date: 20230510 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 Ref country code: PT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230911 Ref country code: NO Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230810 Ref country code: NL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 Ref country code: ES Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 Ref country code: AT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: RS Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 Ref country code: PL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 Ref country code: LV Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 Ref country code: LT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 Ref country code: IS Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230910 Ref country code: HR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 Ref country code: GR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230811 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20230829 Year of fee payment: 6 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SM Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 Ref country code: SK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 Ref country code: RO Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 Ref country code: EE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 Ref country code: DK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 Ref country code: CZ Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R097 Ref document number: 602018049789 Country of ref document: DE |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MC Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MC Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20230813 |
|
26N | No opposition filed |
Effective date: 20240213 |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20230813 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20230813 Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20230831 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230510 |
|
REG | Reference to a national code |
Ref country code: BE Ref legal event code: MM Effective date: 20230831 |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: MM4A |