EP3560299A1 - Réacteur plasma de décharge à barrière diélectrique - Google Patents
Réacteur plasma de décharge à barrière diélectriqueInfo
- Publication number
- EP3560299A1 EP3560299A1 EP17832277.2A EP17832277A EP3560299A1 EP 3560299 A1 EP3560299 A1 EP 3560299A1 EP 17832277 A EP17832277 A EP 17832277A EP 3560299 A1 EP3560299 A1 EP 3560299A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- outer tube
- high voltage
- tube
- reactor
- dielectric material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
- H05H1/246—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube the plasma being activated using external electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
Definitions
- the present invention relates to a dielectric barrier discharge plasma reactor for the production of cold plasma at atmospheric pressure.
- the invention is particularly applicable in the following fields: biomedical, sterilization, medicine, dermatology, cosmetics, material treatment, surface or deposit functionalization, depollution, food processing , germination, illumination, fast switching, flow modification, detection or metrology of nanoparticles.
- DBD Dielectric barrier discharges
- DBDs are often characterized by non-homogeneous plasma structures of the filament type.
- the inhomogeneous and filamentary nature of the plasma may be inadequate for some applications, for example in the case of certain surface treatments where it is important that the surface be treated uniformly.
- the invention aims to solve these problems by providing a dielectric barrier discharge plasma reactor capable of generating a cold plasma at atmospheric pressure without requiring draconian conditions surrounding the generation of the discharge.
- a dielectric barrier discharge plasma reactor comprising an enclosure subjected to atmospheric pressure and having at least one plasmagene gas inlet port and at least one cold plasma outlet port at atmospheric pressure.
- the reactor is characterized in that the enclosure further comprises an inner tube and an outer tube.
- the inner tube and the outer tube are of the dielectric type, each comprising an upper end, a lower end and a wall with an inner surface and an outer surface, the upper end of the inner tube being coupled to the inlet port of the a plasmagenic gas, the upper end of the outer tube being hermetically sealed and having the inner tube passing therethrough, the lower end of the inner tube being open and the lower end of the outer tube being coupled to the cold plasma outlet opening to atmospheric pressure.
- the inner tube and the outer tube are arranged so that at least a portion of the inner tube extends inside the outer tube parallel to the longitudinal axis of the outer tube and so as to define a diffusion space and an annular space.
- the diffusion space is formed inside the outer tube between the lower end of the inner tube and the lower end of the outer tube, and the annular space is formed between the outer surface of the inner tube wall and the inner tube.
- inner surface of the wall of the outer tube, the enclosure further comprises
- first high voltage electrode and a ground electrode spaced apart by an inter-electrode gap in which at least a first dielectric material is arranged
- a high voltage power supply input port coupled to the high voltage electrode, and capable of being coupled to a first high voltage supply so as to allow the generation of an electric discharge in the inter-electrode space;
- At least a portion of the inner tube is disposed as close as possible to the high voltage electrode, and extends through the first dielectric material and the ground electrode, and
- At least a portion of the outer tube extends through the ground electrode.
- the lower end of the inner tube and the lower end of the outer tube extend outside the chamber via the cold plasma outlet orifice at atmospheric pressure.
- the enclosure further comprises at least one surrounding fluid inlet port coupled to tm at least one passage extending through the wall of the outer tube.
- the passage extends substantially perpendicular to the longitudinal axis of the outer tube.
- the passage extends substantially obliquely to the longitudinal axis of the outer tube.
- the passage is disposed at a level between the first dielectric material and the ground electrode.
- the upper end of the outer tube is located between the first dielectric material and the ground electrode.
- the high voltage electrode, the first dielectric material and the ground electrode are each in the form of a plate. circular, oval or polygonal.
- the length of the plate of the first dielectric material is longer than that of the plates of the high voltage and ground electrodes.
- the enclosure further comprises an enclosure body molded in a second dielectric material.
- the enclosure body consists of a single piece.
- the enclosure body consists of three parts,
- the first part comprising the plasma gas inlet orifice, the high voltage electrode and the first dielectric material
- the second part comprising the surrounding fluid inlet orifice and the passage extending through the wall of the outer tube
- the third part comprising the ground electrode and the cold plasma outlet orifice at atmospheric pressure.
- the first dielectric material, the inner tube and the outer tube are made of quartz glass and the second dielectric material is made of plastic, PTFE, PFA or FEP type.
- the high voltage electrode and the ground electrode are made of brass.
- the reactor comprises a second high voltage electrode fixed around all or part of the outer surface of the wall of the outer tube.
- the second high voltage electrode is adapted to be coupled to a second high voltage power supply and to a different mass of the ground electrode so as to allow the generation of an electric discharge in the outer tube, in a direction perpendicular to the median longitudinal axis of the outer tube.
- Figure 1 shows a reactor according to a first implementation of the invention.
- FIG. 1 shows the reactor of Figure 1 according to another embodiment of the invention.
- Figures 3A and 3B show a cross-sectional view detailing the high voltage power supply and the grounding.
- Figure 4 shows a second implementation of the invention.
- Figure 5 shows a third implementation of the invention.
- FIGS 6A and 6B show particular arrangements of the inner and outer tubes of the invention.
- the example of Figure 1 illustrates a dielectric barrier discharge plasma reactor 100 for processing a target.
- the target may comprise a physical material such as a solid material, a living tissue or a volume of fluid.
- the reactor 100 comprises a sealed enclosure 1 10 subjected to atmospheric pressure.
- the sealed enclosure 1 10 comprises a plasmagene gas inlet port 1 1 1 and a cold plasma outlet port at atmospheric pressure 1 12.
- the plasmagene gas inlet 1 1 1 is intended to be coupled to a plasmagene gas source 120.
- the plasmagene gas source 120 may comprise a rare gas, a mixture of rare gases (typically Helium He, argon Ar, etc.) or a mixture of one or more noble gases with one or more molecular gases. (typically oxygen O 2, hydrogen H 2, carbon tetrafluoride CF 4, sulfur hexafluoride SF 6, nitrogen 2 and / or water vapor H 2 O, etc.), that is to say present in low concentration relative to the concentration of rare gas (s).
- a carrier gas from the plasma gas source 120 is injected into the plasma inlet 1 1 1 gas inlet.
- the flow rate of the carrier gas is of the order of one liter per minute.
- the cold plasma outlet orifice 1 12 at atmospheric pressure is provided to conduct a cold plasma at atmospheric pressure produced by the reactor 100 to the outside of the hermetic enclosure 1 10.
- the sealed chamber 1 10 further comprises an inner tube 1 13 and an outer tube 4.
- the inner tube 1 13 and the outer tube 1 14 are made of a material
- Each of the inner tubes 1 13 and outer 1 14 has a length and a wall thickness. The length of the inner and outer tubes 13 and 14 is determined between an upper end of the tube and a lower end of the tube, while the wall thickness is determined between an inner wall surface and an outer wall surface.
- the inner tube 1 13 has a length to thickness ratio not exceeding 30, preferably between 20 and 27 and advantageously between 24 and 26 while the outer tube 1 14 has a length to thickness ratio. thickness not exceeding 30, preferably between 20 and 27 and advantageously between 24 and 26.
- the length of the outer tube 1 14 is greater than that of the inner tube 3.
- the upper end of the inner tube 1 13 is coupled to the plasma gas inlet 1 1 1,
- the upper end of the outer tube 1 14 is hermetically sealed, the lower ends of the inner tubes 13 and outer tubes 14 are open, and
- the lower end of the outer tube 1 14 is coupled to the cold plasma outlet orifice at atmospheric pressure 1 12.
- the inner tubes 1 13 and outer 1 14 are arranged so that at least a portion of the inner tube 1 13 extends inside the outer tube 1 14 coaxially to the longitudinal axis. of the outer tube 1 14 and so as to define a diffusion space ED and an annular space EA.
- the diffusion space ED is formed inside the outer tube 1 14 between the lower end of the inner tube 1 13 and the lower end of the outer tube 1 14 while the annular space EA is formed between the outer surface of the wall of the inner tube 1 13 and the inner surface of the wall of the outer tube 1 14.
- the diameter of the outer tube 1 14 is large enough to accommodate the inner tube 1 13 inside .
- the diameter ratio between the outer diameter of the inner tube 1 13 and the inner diameter of the outer tube 1 14 exceeding 30%, preferably between 35 and 65%.
- the inner tubes 13 13 and external 1 14 are arranged entirely in the hermetic enclosure 110.
- FIG. 2 it is possible to envisage an implementation of the reactor 100 of FIG. 1 in which the lower end of the inner tube 1 13 and the lower end of the outer tube 1 14 extend. outside the hermetic enclosure 1 10 via the cold plasma outlet orifice at atmospheric pressure 1 12. This has the effect of allowing to bring as close as possible the cold plasma at diffuse atmospheric pressure generated by the reactor 100, the target to be treated.
- a plug covering the target (not shown).
- the cap may be completely airtight or partially sealed in order to prevent too much confinement. This arrangement can be advantageously used when the target to be treated is small and not bulky.
- the reactor 100 is arranged to generate an electric discharge necessary for the production of a cold plasma at atmospheric pressure in the inner tube 1 13.
- the reactor 100 is arranged according to a plan-plane configuration comprising a high voltage electrode 1 and a ground electrode 1 16 spaced apart by an inter-electrode gap in which at least a first dielectric material 1 17 is disposed.
- the electrodes 1 15 and 1 16 consist of an electrically conductive material having a
- Res st court of about 10 to 10 Om "Qm for example, made of a metal or a metal alloy.
- the electrodes 1 15 and 1 6 are made of tungsten, stainless steel 316L, copper, aluminum, brass or a catalytic catalytic material.
- the first dielectric material 1 17 is made of an electrical insulating material similar to that used, above, for the inner tubes 1 13 and external 14.
- At least one portion of the inner tube 1 13 is disposed as close as possible to the high voltage electrode 1 15.
- the inner tube 13 extends through the first dielectric material 1 17 and
- at least a portion of the outer tube 1 14 extends through the ground electrode 1 16.
- a hole is formed in the high voltage electrode 1 15, the first dielectric material 1 17 and the ground electrode 1 16, to accommodate the particular arrangement of the inner tube 1 13 and external 1 14.
- the passage to the outer tube 1 14 is disposed at a level between the first dielectric material 1 17 and the ground electrode 1 16. Nevertheless, the passage leading to the outer tube 1 14 may be disposed at any other level of the outer tube 1 14, preferably at a level which is above the lower end of the inner tube 1 13.
- the reactor 100 also comprises a high-voltage power supply input port 1 1 1 1 coupled to the high-voltage electrode 1 15 (FIG. 3a) and a setting port. to the ground 1 1 12 coupled to the ground electrode 1 16 ( Figure 3b).
- the coupling with the high voltage electrode 1 15 and with the ground electrode 1 16 is made by welding, in particular by welding with tin.
- the high voltage supply HT delivers a voltage of several kV, for example between 1 kV and 20 kV from a sinusoidal type signal, pulsed or chopped.
- the high voltage electrode 1 15, the first dielectric material 1 17 and the ground electrode 1 16 are each in the form of a circular plate, oval or polygonal.
- the length of the plate of the first dielectric material 1 17 is longer than that of the plates of the high voltage and ground electrodes 1 16. This has the effect of avoid the formation of an electric arc between the electrodes 1 15 and 1 16 by limiting the peak effects.
- the gaseous environment of the ambient air in which a cold plasma is propagated at atmospheric pressure such as that generated by the reactor 100, can have a significant impact on the variability of the effects obtained on a reactor. target to be treated. Then there is the problem of the reproducibility of cold plasmas at atmospheric pressure. In this respect, it is important to be able to control the gaseous environment prevailing around such a plasma in order to regulate the chemical reactivity in the gas phase.
- the sealed enclosure 1 10 comprises a surrounding fluid inlet port 1 18 coupled to a passage 1 19 extending through the wall of the outer tube 1 14.
- the surrounding fluid inlet port 1 18 is intended to be coupled to a source of surrounding fluid 130.
- the coupling is achieved through a straight stitching.
- the source of surrounding fluid 1 18 may consist of a pure gas, a mixture of pure gases (typically nitrogen N, oxygen O, methane CH4, carbon gases, hydrogen H2 , fluorinated gases, monomer gases, etc.), a pulverized liquid (e.g. loaded with target treatment particles), or a mixture of one or more pure gases with one or more pulverized liquids.
- a surrounding fluid from the source of surrounding fluid 130 is injected into the surrounding fluid inlet port 1 18.
- the incoming flow of the surrounding fluid is from the order of a few tens of cubic centimeters per minute.
- the surrounding fluid injected into the surrounding fluid inlet 1 circulates in the annular space EA and then leads into ED diffusion space to mix with the cold plasma at atmospheric pressure generated in the inner tube 1 13.
- This has the effect of allowing control of the environment of generation of the cold plasma at atmospheric pressure and therefore of its reactivity chemical against a given target.
- the upper end of the outer tube 1 14 is located between the first dielectric material 1 17 and the ground electrode 1 16.
- the upper end of the outer tube 1 14 can also be located outside the interelectrode space.
- the passage extends substantially perpendicular to the longitudinal axis of the outer tube 1 14. In another example, the passage extends substantially obliquely to the longitudinal axis of the outer tube 1 14.
- the sealed chamber 1 10 further comprises a housing body C molded in a second dielectric material.
- the enclosure body makes it possible to maintain the various elements constituting the reactor 100 in the hermetic enclosure 1 10.
- the second dielectric material is made of plastic, of the fluoropolymer type (PTFE, PFA or FEP).
- the enclosure body C consists of a single piece.
- the enclosure body C consists of three parts. In that case,
- the first part comprises the plasmagene gas inlet orifice 1 1 1, the high voltage electrode 1 15 and the first dielectric material 1 17,
- the second part comprises the surrounding fluid inlet opening 1 18 and the passage 1 19 extending through the wall of the outer tube 1 14, and
- the third part comprises the ground electrode 1 16 and the cold plasma outlet orifice at atmospheric pressure.
- the three parts can be machined separately before being assembled.
- the three parts can be assembled to form the enclosure body C, thanks to fastening means such as screws.
- the reactor 100 has been described as comprising a plasma gas inlet 1 1 1 and a surrounding fluid inlet port 1 18.
- other configurations are possible.
- the hermetic enclosure 1 10 may comprise a plurality of reactors 100.
- the hermetic enclosure 1 10 comprises an enclosure body C consisting of three parts P1, P2 and P3 in which two reactors 100 are arranged.
- the reactor 100 comprises an enclosure body C consisting of three parts P1, P2 and P3 in which Six reactors 100 are arranged.
- the arrangement of a plurality of reactors 100 according to the invention is particularly advantageous since only one high-voltage supply HT supplies power to all the reactors 100. It is therefore not necessary to use of as many high-voltage power supplies as of reactors 100.
- the use of the second insulating material in the constitution of the enclosure body C makes it possible to guarantee the independent generation of several cold plasmas at atmospheric pressure. America.
- Figure 6a shows a view from above. such a configuration in which four passages may be coupled to one or more surrounding fluid inlet ports 1 18.
- the plurality of passages leading to the outer tube 1 14 are disposed at different levels. of the outer tube 1 14.
- the energy transmitted in the cold plasma at atmospheric pressure.
- the objective of such an implementation It consists in acting on the reactivity of the target to be treated by allowing the control of the production of the reactive species produced in the gas phase.
- the axis central of propagation of the cold plasma at atmospheric pressure corresponds to the median longitudinal axis of the outer tube 1 14 passing substantially in the middle of the outer tube 1 14.
- the high voltage metal electrode is fixed on at least a portion of the outer surface of the wall of the outer tube 1.
- the high voltage metal electrode is formed in a metal ring that covers all or part of the outer surface of the wall of the outer tube 1 14.
- the high voltage metal electrode is formed in a metal tape that covers all or part of the outer surface of the wall of the 14. Then, when the reactor 100 is in operation, the high voltage metal electrode is electrically biased with a high voltage supply (not shown) which is decoupled from the high voltage supply HT of the reactor 100.
- different masses are used for the grounding of the high-voltage metal electrode and for the grounding of the ground electrode 1 16.
- the high voltage metal electrode is biased with a high voltage supply of positive or negative voltage.
- the high voltage supply delivers a DC or AC voltage.
- the high voltage supply delivers a voltage from a sinusoidal type signal, pulsed or chopped.
- a high voltage source delivering a DC voltage of 100V to 500V DC was used.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Fluid Mechanics (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1663220A FR3061402B1 (fr) | 2016-12-22 | 2016-12-22 | Reacteur plasma de decharge a barriere dielectrique |
| PCT/FR2017/053791 WO2018115774A1 (fr) | 2016-12-22 | 2017-12-21 | Réacteur plasma de décharge à barrière diélectrique |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP3560299A1 true EP3560299A1 (fr) | 2019-10-30 |
| EP3560299B1 EP3560299B1 (fr) | 2022-08-17 |
Family
ID=58547611
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP17832277.2A Active EP3560299B1 (fr) | 2016-12-22 | 2017-12-21 | Réacteur plasma de dbd |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP3560299B1 (fr) |
| FR (1) | FR3061402B1 (fr) |
| WO (1) | WO2018115774A1 (fr) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111494774A (zh) * | 2020-04-14 | 2020-08-07 | 西安交通大学 | 等离子体活性气体湿化器 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020187066A1 (en) * | 2001-06-07 | 2002-12-12 | Skion Corporation | Apparatus and method using capillary discharge plasma shower for sterilizing and disinfecting articles |
| DE102004029081A1 (de) * | 2004-06-16 | 2006-01-05 | Je Plasmaconsult Gmbh | Vorrichtung zur Bearbeitung eines Substrates mittels mindestens eines Plasma-Jets |
| WO2007105428A1 (fr) * | 2006-02-13 | 2007-09-20 | National University Corporation Gunma University | Buse de dispositif de generation de plasma, dispositif et procede de generation de plasma, dispositif et procede de traitement de surface de plasma |
| TWI432228B (zh) * | 2010-09-07 | 2014-04-01 | Univ Nat Cheng Kung | 微電漿產生裝置及其滅菌系統 |
| DE102011076806A1 (de) * | 2011-05-31 | 2012-12-06 | Leibniz-Institut für Plasmaforschung und Technologie e.V. | Vorrichtung und Verfahren zur Erzeugung eines kalten, homogenen Plasmas unter Atmosphärendruckbedingungen |
| CN105491774A (zh) * | 2016-01-18 | 2016-04-13 | 大连民族大学 | 一种基于导电涂层的阵列式微等离子体发生装置 |
-
2016
- 2016-12-22 FR FR1663220A patent/FR3061402B1/fr not_active Expired - Fee Related
-
2017
- 2017-12-21 EP EP17832277.2A patent/EP3560299B1/fr active Active
- 2017-12-21 WO PCT/FR2017/053791 patent/WO2018115774A1/fr not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| FR3061402A1 (fr) | 2018-06-29 |
| WO2018115774A1 (fr) | 2018-06-28 |
| EP3560299B1 (fr) | 2022-08-17 |
| FR3061402B1 (fr) | 2023-02-10 |
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