EP3419945A1 - Method for the selective etching of a layer or a stack of layers on a glass substrate - Google Patents

Method for the selective etching of a layer or a stack of layers on a glass substrate

Info

Publication number
EP3419945A1
EP3419945A1 EP17710353.8A EP17710353A EP3419945A1 EP 3419945 A1 EP3419945 A1 EP 3419945A1 EP 17710353 A EP17710353 A EP 17710353A EP 3419945 A1 EP3419945 A1 EP 3419945A1
Authority
EP
European Patent Office
Prior art keywords
layer
essentially
decorative
stack
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP17710353.8A
Other languages
German (de)
French (fr)
Inventor
Barbara BRUDIEU
Leila DUMOTIER
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Original Assignee
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain Glass France SAS, Compagnie de Saint Gobain SA filed Critical Saint Gobain Glass France SAS
Publication of EP3419945A1 publication Critical patent/EP3419945A1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3657Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3649Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/70Properties of coatings
    • C03C2217/72Decorative coatings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/30Aspects of methods for coating glass not covered above
    • C03C2218/32After-treatment
    • C03C2218/328Partly or completely removing a coating
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/30Aspects of methods for coating glass not covered above
    • C03C2218/34Masking

Definitions

  • the invention relates to a glazing on which has been deposited by a physical vapor deposition (PVD) process, mainly magnetron-assisted cathodic sputtering, plasma-assisted chemical vapor deposition (PECVD). Plasma Enhanced Chemical Vapor Deposition) or evaporation or a method of liquid deposition, of one or more thin layers having spatial structuring at scales ranging from several cm to less than 10 ⁇ .
  • PVD physical vapor deposition
  • PECVD plasma-assisted chemical vapor deposition
  • the targeted products are decorative: layers modifying the optical properties, the level of reflection in the visible (mirror or anti-reflection %), colored or absorbent layers to modify the transmittance in the visible for aesthetic purposes, electrochromic layers, electroluminescent , anti-iridescence.
  • the invention aims at the industrial manufacture of transparency zones in these layers, that is to say zones of ablation of these layers in patterns that may require an extremely fine resolution of the order of a few ⁇ even a few tens of nm in some cases.
  • the decorative effect is sought for building glazing applications, interior decoration, street furniture and even transport vehicles (land, air, water).
  • the targeted products are in particular the stacks deposited by magnetron sputtering.
  • the invention relates in particular to the reflecting layers (mirrors) as described in particular in the document EP 0 962 429 A1.
  • thermocontrol function not by a conductive thin layer but not a polyvinyl butyral interlayer (PVB) or other containing nanoparticles of a conductive compound such as indium tin oxide (ITO indium tin oxide) for example.
  • ITO indium tin oxide indium tin oxide
  • the second solution consists in etching the layer with silver after deposition so as to selectively remove the silver on sufficiently fine strips (100 ⁇ ) to be easily perceived by the eye and separated from each other by a few mm depending on the wavelengths which we wish to promote the transmission.
  • Complex patterns can be used for this application in the face. Representatives of this technique are in particular the documents WO9954961 A1 and WO2014033007 A1.
  • the heating efficiency of a conductive layer depends on its resistance square R 2 , the voltage between the electrodes but also the distance between the electrodes. For building applications, this dependency is a problem because, at the same power source, an electrical resistance of the glazing is required for each heating zone size.
  • One solution may be to burn one more time for example a base layer Ag so as to modulate its resistance by global square to enable it to be compatible with the distance between electrodes and the desired surface heating power.
  • a silver-based glazing can be functionalized in the form of an antenna provided the electromagnetic decoupling of the layer with the frame of the car for example. This operation is also ensured by an engraving.
  • Alternative selective etching methods are mainly from the microelectronics industry. Some use temporary layers, others consist of direct engraving.
  • photolithography uses temporary layers to mask selective acid attacks. The photo lithography allows very fine engravings (45-90 nm today industrially) but remains limited to the size of the masks today limited by the size of the optics.
  • the laser etching of the conductive layer is provided by a point-etch laser which will sublimate the thin-film stack by scanning the beam. This operation has a low productivity on large glazings and requires a significant investment compared to the treated surfaces.
  • Impact etching of ions or electrons has the same limitations as laser etching in terms of productivity.
  • Other engraving methods come from traditional printing.
  • inkjet printing techniques are still limited for sizes greater than 10m 2 at print times greater than one minute.
  • Screen printing may be preferred over other techniques when a resolution scale smaller than 50 ⁇ is desired: this process provides relatively poor edge qualities at these small scales.
  • the invention therefore aims to provide decorative glazing as defined above, having ablation zones - transparency in resolution patterns that can be very thin, a few ⁇ even a few tens of nm.
  • the subject of the invention is a process for depositing on a glass substrate a layer or a stack of layers which are essentially mineral (s) decorative (s), characterized in that it comprises the steps of depositing on the substrate an essentially organic coating on a part but not all of its surface, in accordance with a pattern,
  • the product of the combustion of the organic coating is a powder which does not adhere to the substrate, so that it can then be removed with the mineral layer (s) which covers it (s) without exerting a mechanical action of the type brushing, friction or any abrasion likely to deteriorate the substrate and especially the quality of the edges of areas not printed by the organic coating and covered with the mineral layer (s) (sharpness, resolution).
  • the method makes it possible to produce on an industrial production line, on a large-area substrate, a substantially organic coating pattern with a surface area of dimensions ranging from 1 m to 10 ⁇ or less.
  • the reduced cycle time makes it possible to validate the applicable character industrially.
  • the method of the invention may end with the deposition of a layer of paint above the layer or stack of decorative layer (s) when the one (s) is (are) reflective (s), or above another reflective layer covering this (these) mineral layer (s) decorative (s). This measurement is classic in the making of mirrors.
  • the method of the invention may also comprise the formation of a metallic discontinuous layer associated with one or more layers dielectric, as described in WO2015177474A1. These layers have the function of modifying the absorption spectrum in the visible of a mirror so as to produce a reflection image whose color is modified.
  • the pattern-based deposition of the essentially organic coating is carried out by a liquid, direct or indirect engraved roll method such as offset, flexography, inkjet printing, masking, lithography or screen printing.
  • a roll with a width of at least 3210mm can be used, the engraving of which will reproduce the desired pattern. In this case it is a repetitive pattern but it remains compatible for example with the improvement of electromagnetic transmission.
  • the essentially organic coating is chosen from a monomer and / or oligomer acrylate, epoxy acrylate, polyester acrylate, polyurethane acrylate, polyvinylpyrrolidone + EDTA composition, polyamide, polyvinyl butyral, positive photosensitive resin diazonaphthoquinone-novolac, any organic material crosslinked under radiation ultraviolet or infrared, alone or in a mixture of several of them.
  • the substantially organic coating has a thickness of at most 30, and in order of increasing preference, at most equal to 20 and 10 ⁇ , and particularly preferably of approximately 5 ⁇ . Thicknesses of 1 ⁇ or even a few hundred nm are however not excluded from the invention. Apart from the printed areas of this organic coating corresponding to patterns ranging from 1 m to 10 ⁇ m or less in surface dimensions, it is necessary to have no temporary organic coating so as not to degrade the decorative mineral stack in these supposed areas. have an intact mineral stack after quenching.
  • the development of the essentially organic coating comprises a crosslinking by heat treatment and / or under radiation such as ultraviolet (UV ) and / or drying, then the whole is washed.
  • the essentially organic coating may be advantageously crosslinked under UV to limit the space required for drying.
  • the varnish or resin will be properly dried before going under a conventional washing machine to coater and then the deposition operation of the (mineral) thin layer (s) essentially mineral (s) decorative (s) is performed.
  • the layer or stack of essentially mineral (s) decorative layers (s) is formed (e) by a physical vapor deposition (PVD for Physical Vapor Deposition) under vacuum such as cathodic sputtering especially assisted by magnetron, evaporation or plasma enhanced chemical vapor deposition (PECVD for Plasma Enhanced Chemical Vapor Deposition) or liquid.
  • PVD Physical Vapor Deposition
  • PECVD plasma enhanced chemical vapor deposition
  • the layer or the stack of layers essentially mineral decorative (s) consists of Ag, Cr, Ti, Al, Nb, Cu, Au, Ga or similar metal metal oxide such as Ti, Si, Sn, Zn or the like, transparent conductive oxide (TCO) such as tin doped indium oxide (ITO), zinc doped indium oxide (IZO), ZnO: Al, stannate cadmium, compound of Si and N such as Si 3 N 4 undoped or doped with Al or the like, dielectric stack thereon, alone or in combination of several of them.
  • TCO transparent conductive oxide
  • ITO tin doped indium oxide
  • IZO zinc doped indium oxide
  • ZnO Al
  • stannate cadmium compound of Si and N such as Si 3 N 4 undoped or doped with Al or the like, dielectric stack thereon, alone or in combination of several of them.
  • the glass can not be cut once soaked, it can be, in some applications, for example building, stored and cut, started etc. before quenching.
  • This glazing can be sold as such, mainly in this case with a layer then removed by quenching at a transformer.
  • the heat treatment is part of a thermal tempering of the glass substrate.
  • the varnish or the resin disappears by combustion and effectively eliminates the layer or stack of essentially mineral layers (s) decorative (s) at the locations of the grounds, which causes the desired selective etching.
  • the heat treatment is part of a bending of the glass substrate, in particular a bending by pressing.
  • a preliminary heat treatment causes the disappearance of the varnish or the resin. If pressing tools are used to bend, it will be ensured that the combustion of the essentially organic coating takes place before this pressing phase.
  • the deposition of the layer or the stack of essentially mineral (s) decorative layers (s) is deposited again at least one essentially organic coating sequence - layer or stack of essentially mineral layers (s) decorative (s).
  • This deposition is preferably carried out before the heat treatment for the combustion of the essentially organic coating closest to the substrate, and a subsequent heat treatment will produce the combustion of several superimposed organic overlays as well as the subsequent removal of several layers or layers of layers. essentially mineral decorative covering them.
  • essentially organic coating sequences - layer or stack of essentially mineral (s) decorative layers (s), from the second sequence, after the combustion heat treatment of the first substantially organic coating and wiping or gaseous blast removal of its organic residues and mineral residues covering them is also part of the invention. It is thus possible to combine different patterns of areas of transparency of a mirror, or such areas of transparency with differently colored areas.
  • the glass substrate obtained by the process of the invention is also capable of being integrated in a laminated glazing unit or other laminated composite product, and / or in a multiple glazing unit.
  • Other objects of the invention consist in
  • a glazing obtained by a method as described previously as a decorative mirror having zones of transparency in accordance with a pattern; it may be a layer glazing modifying the optical properties, the level of reflection in the visible (mirror or anti-reflection ...), colored or absorbent layers to modify the transmittance in the visible for aesthetic purposes, electrochromic, electroluminescent, anti-iridescent layers, for building, interior decoration, street furniture and even transport vehicles (land, air, water).
  • Example 1 Referring to Figure 1, the method of the invention can be represented in four views corresponding to three successive main steps, from left to right in the Figure.
  • a UV crosslinkable acrylate lacquer having the following formulation is used, in which the proportions are by weight: 57% of aliphatic urethane hexaacrylate oligomer (CN9276 manufactured by Sartomer), 38% of monomers and more exactly 19% of tricyclodecanedimethanol diacrylate (TCDDMDA or SR833S from Sartomer) as well as 19% trimethylolpropane thacrylate (TMPTA or SR351 from Sartomer) and finally 5% of ketone-type photoinitiator is more precisely a mixture of benzophenone and methanone (Speedcure 500 or Irgacure 500 from BASF).
  • This varnish is prepared by mechanically mixing all these compounds (resins and photoinitiator) using a blade. After several hours of agitation, the varnish can be stored for several months if it is protected from light and strong temperature variations.
  • step 1 of Figure 1 a certain amount of this varnish is applied to the clean glass and sharpened by the method of indirect gravure roller as shown in step 1 of Figure 1. After rolling, the substrate + varnish deposited is exposed to UV (mercury type lamp). The thickness of the lacquer pattern coating is 5 ⁇ .
  • a stack of thin layers is deposited in a conformal manner by sputtering in step 2 on the glass + acrylate varnish system.
  • This stack of thin layers has the following constitution (starting from the glass substrate), in which the thicknesses are in nm: SiO 2 20 / Cr 27 / Si 3 N: Al 1 1, 7 / TiO x 2.3. This stack reflecting the visible light is soakable.
  • a quenching step (in FIG. 1), generally in a convection oven at 730 ° C. for 35 seconds per mm of glass (140 seconds for a 4 mm thick glass), the organic layer is degraded. which leads to the detachment of the magnetron layers in the areas where it is present.
  • the final system consists of the stack of thin layers described above, structured in a pattern corresponding to the negative of that made with the resin.
  • Example 2 This example differs from the previous one by the essentially organic coating.
  • This is an ink jet deposit of an ink marketed by the Marabu Company in the Ultra-Jet DUV A range, especially in cyan or magenta color. A thickness of a few hundred nm to a few ⁇ is obtained.
  • the ink (patterns) is cross-linked under ultraviolet light.
  • the resolution provided by the process of the invention depends solely on the method of printing the organic coating. It is not or little modified during quenching. Printed lines having a fineness of 25 ⁇ gave a pattern width in transparency of 25 ⁇ (line of ablation of the reflective stack in the visible).

Abstract

The invention relates to a method for depositing one or more decorative mineral layers on a glass substrate, comprising steps consisting in: depositing an organic coating on part, but not all of the surface of the substrate, according to a pattern; depositing one or more decorative mineral layer(s) on the thus coated substrate; subjecting the assembly to a heat treatment for combustion of the organic coating; and subsequently removing said coating and the decorative mineral layer(s) covering same, by wiping with a cloth and/or gas jet and/or washing, such that the remaining decorative mineral layer(s) are arranged in a pattern corresponding to the negative of that made with the organic coating. The invention also relates to an intermediate product of the method, and to the use of the glass obtained as a decorative mirror having transparent zones.

Description

PROCEDE DE GRAVURE SELECTIVE D'UNE COUCHE OU D'UN EMPILEMENT DE COUCHES SUR SUBSTRAT VERRIER  METHOD FOR SELECTIVELY ENGRAVING LAYER OR LAYER STACK ON GLASS SUBSTRATE
L'invention est relative à un vitrage sur lequel on a déposé par un procédé de dépôt physique en phase vapeur (PVD pour Physical Vapor Déposition) sous vide, principalement pulvérisation cathodique assistée par magnétron, dépôt chimique en phase vapeur assisté par plasma (PECVD pour Plasma Enhanced Chemical Vapor Déposition) ou évaporation ou un procédé de dépôt par voie liquide, de une ou plusieurs couches minces présentant une structuration spatiale à des échelles pouvant varier de plusieurs cm à moins de 10 μιτι. The invention relates to a glazing on which has been deposited by a physical vapor deposition (PVD) process, mainly magnetron-assisted cathodic sputtering, plasma-assisted chemical vapor deposition (PECVD). Plasma Enhanced Chemical Vapor Deposition) or evaporation or a method of liquid deposition, of one or more thin layers having spatial structuring at scales ranging from several cm to less than 10 μιτι.
Les produits visés sont décoratifs : couches modifiant les propriétés optiques, le niveau de réflexion dans le visible (miroir ou anti-reflet...), couches colorées ou absorbantes pour modifier la transmittance dans le visible à des fins esthétiques, couches électrochromes, électroluminescentes, anti-irisation.  The targeted products are decorative: layers modifying the optical properties, the level of reflection in the visible (mirror or anti-reflection ...), colored or absorbent layers to modify the transmittance in the visible for aesthetic purposes, electrochromic layers, electroluminescent , anti-iridescence.
En particulier, l'invention vise la confection industrielle de zones de transparence dans ces couches, c'est-à-dire de zones d'ablation de ces couches selon des motifs pouvant exiger une résolution extrêmement fine de l'ordre de quelques μιτι voire quelques dizaines de nm dans certains cas. In particular, the invention aims at the industrial manufacture of transparency zones in these layers, that is to say zones of ablation of these layers in patterns that may require an extremely fine resolution of the order of a few μιτι even a few tens of nm in some cases.
L'effet décoratif est recherché pour des applications de vitrage de bâtiment, décoration d'intérieur, mobilier urbain et même de véhicule de transport (terrestre, aérien, aquatique). The decorative effect is sought for building glazing applications, interior decoration, street furniture and even transport vehicles (land, air, water).
Les produits visés sont en particulier les empilements déposés par pulvérisation magnétron. L'invention a trait notamment aux couches réfléchissantes (miroirs) telles que décrites notamment dans le document EP 0 962 429 A1 . The targeted products are in particular the stacks deposited by magnetron sputtering. The invention relates in particular to the reflecting layers (mirrors) as described in particular in the document EP 0 962 429 A1.
Il existe actuellement plusieurs solutions pour intégrer des couches non continues dans un vitrage, c'est-à-dire des couches à motifs, présentant des zones d'ablation. Selon une première solution, on sait apporter une fonction de contrôle thermique non pas par une couche mince conductrice mais pas un intercalaire polyvinylbutyral (PVB) ou autre contenant des nanoparticules d'un composé conducteur comme l'oxyde d'indium dopé à l'étain (ITO pour indium tin oxide) par exemple. Dans ce cas, le contrôle thermique est assuré par absorption et non plus réflexion de la partie énergétique du spectre. Cette solution n'est possible que pour le contrôle solaire, et peu efficace par rapport à la solution en réflexion et nécessite un vitrage feuilleté. There are currently several solutions for integrating non-continuous layers in a glazing unit, that is, patterned layers, having ablation zones. According to a first solution, it is known to provide a thermal control function not by a conductive thin layer but not a polyvinyl butyral interlayer (PVB) or other containing nanoparticles of a conductive compound such as indium tin oxide (ITO indium tin oxide) for example. In this case, the thermal control is ensured by absorption and not reflection of the energy portion of the spectrum. This solution is only possible for solar control, and inefficient compared to the solution in reflection and requires a laminated glazing.
La deuxième solution consiste à graver la couche à l'argent après dépôt de façon à éliminer sélectivement l'argent sur des bandes suffisamment fines (100 μιτι) pour être difficilement perceptibles par l'œil et éloignées les unes des autres de quelques mm selon les longueurs d'onde dont on souhaite favoriser la transmission. Des motifs complexes peuvent être utilisés pour cette application en pleine face. Des représentants de cette technique sont notamment les documents WO9954961 A1 et WO2014033007 A1 . En sus, l'efficacité de chauffage d'une couche conductrice dépend de sa résistance par carré R2, de la tension entre les électrodes mais aussi de la distance entre les électrodes. Pour les applications bâtiment, cette dépendance pose un problème car, à même source électrique, il faut une résistance électrique du vitrage pour chaque taille de zone chauffante. Une solution peut consister à graver une fois de plus par exemple une couche base Ag de façon à moduler sa résistance par carré globale pour lui permettre d'être compatible avec la distance entre électrodes et la puissance de chauffe surfacique recherchée. D'autre part, un vitrage à base d'argent peut être fonctionnalisé sous forme d'une antenne à condition d'assurer le découplage électromagnétique de la couche avec le cadre de la voiture par exemple. Cette opération est également assurée par une gravure. Les méthodes de gravure sélectives alternatives sont essentiellement issues de l'industrie micro-électronique. Certaines emploient des couches temporaires, d'autres consistent en de la gravure directe. Dans l'industrie micro-électronique, la photolithographie : met en œuvre des couches temporaires pour servir de masque à des attaques acides sélectives. La photo lithographie permet des gravures très fines (45-90 nm aujourd'hui industriellement) mais reste limitée à la taille des masques aujourd'hui limitée par la taille des optiques. The second solution consists in etching the layer with silver after deposition so as to selectively remove the silver on sufficiently fine strips (100 μιτι) to be easily perceived by the eye and separated from each other by a few mm depending on the wavelengths which we wish to promote the transmission. Complex patterns can be used for this application in the face. Representatives of this technique are in particular the documents WO9954961 A1 and WO2014033007 A1. In addition, the heating efficiency of a conductive layer depends on its resistance square R 2 , the voltage between the electrodes but also the distance between the electrodes. For building applications, this dependency is a problem because, at the same power source, an electrical resistance of the glazing is required for each heating zone size. One solution may be to burn one more time for example a base layer Ag so as to modulate its resistance by global square to enable it to be compatible with the distance between electrodes and the desired surface heating power. On the other hand, a silver-based glazing can be functionalized in the form of an antenna provided the electromagnetic decoupling of the layer with the frame of the car for example. This operation is also ensured by an engraving. Alternative selective etching methods are mainly from the microelectronics industry. Some use temporary layers, others consist of direct engraving. In the microelectronics industry, photolithography: uses temporary layers to mask selective acid attacks. The photo lithography allows very fine engravings (45-90 nm today industrially) but remains limited to the size of the masks today limited by the size of the optics.
La gravure laser de la couche conductrice est assurée par un laser de gravure ponctuelle qui va sublimer l'empilement de couche mince par balayage du faisceau. Cette opération présente une productivité faible sur des vitrages de grande dimension et demande un investissement important au regard des surfaces traitées.  The laser etching of the conductive layer is provided by a point-etch laser which will sublimate the thin-film stack by scanning the beam. This operation has a low productivity on large glazings and requires a significant investment compared to the treated surfaces.
La gravure par impact d'ions ou d'électrons présente les mêmes limitations que la gravure laser en termes de productivité. D'autres méthodes de gravure viennent de l'impression traditionnelle.Impact etching of ions or electrons has the same limitations as laser etching in terms of productivity. Other engraving methods come from traditional printing.
A ce jour, les techniques d'impression par jet d'encre restent encore limitées pour les tailles supérieures à 10m2 à des temps d'impression supérieure à la minute. To date, inkjet printing techniques are still limited for sizes greater than 10m 2 at print times greater than one minute.
A l'impression par sérigraphie (screen printing) peuvent être préférées d'autres techniques lorsqu'une échelle de résolution plus petite que 50 μιτι est recherchée : ce procédé procure en effet des qualités de bord relativement médiocres à ces petites échelles.  Screen printing may be preferred over other techniques when a resolution scale smaller than 50 μιτι is desired: this process provides relatively poor edge qualities at these small scales.
L'invention a donc pour but la mise à disposition de vitrages décoratifs tels que définis ci-dessus, présentant des zones d'ablation - transparence selon des motifs de résolution pouvant être très fine, de quelques μιτι voire quelques dizaines de nm. The invention therefore aims to provide decorative glazing as defined above, having ablation zones - transparency in resolution patterns that can be very thin, a few μιτι even a few tens of nm.
A cet effet, l'invention a pour objet un procédé de dépôt sur un substrat verrier d'une couche ou d'un empilement de couches essentiellement minérale(s) décorative(s), caractérisé en ce qu'il comprend les étapes consistant à - déposer sur le substrat un revêtement essentiellement organique sur une partie mais non la totalité de sa surface, conformément à un motif, à To this end, the subject of the invention is a process for depositing on a glass substrate a layer or a stack of layers which are essentially mineral (s) decorative (s), characterized in that it comprises the steps of depositing on the substrate an essentially organic coating on a part but not all of its surface, in accordance with a pattern,
- déposer sur le substrat ainsi revêtu une couche ou un empilement de couches essentiellement minérale(s) décorative(s), à  depositing on the substrate thus coated a layer or a stack of essentially mineral (s) decorative layers, to
- soumettre l'ensemble à un traitement thermique de manière à effectuer la combustion du revêtement essentiellement organique, puis à  subjecting the assembly to a heat treatment so as to effect the combustion of the essentially organic coating, then to
- éliminer celui-ci et la couche ou l'empilement de couches essentiellement minérale(s) décorative(s) qui le recouvre par essuyage tel qu'au chiffon et/ou souffle gazeux et/ou lavage, de manière à obtenir la couche ou l'empilement de couches essentiellement minérale(s) décorative(s) selon un motif correspondant au négatif de celui réalisé avec le revêtement essentiellement organique.  - Eliminating it and the layer or stack of essentially mineral (s) decorative layers (s) which covers it by wiping such as cloth and / or gaseous and / or wash, so as to obtain the layer or the stack of essentially mineral layers (s) decorative (s) in a pattern corresponding to the negative of that made with the substantially organic coating.
Le produit de la combustion du revêtement organique est une poudre qui n'adhère pas au substrat, de sorte qu'elle peut alors être éliminée avec la ou les couches minérale(s) qui la recouvre(nt) sans exercer une action mécanique du type brossage, frottement ou abrasion quelconque susceptible de détériorer le substrat et surtout la qualité des bords de zones non imprimées par le revêtement organique et recouvertes de la ou des couches minérale(s) (netteté, résolution). The product of the combustion of the organic coating is a powder which does not adhere to the substrate, so that it can then be removed with the mineral layer (s) which covers it (s) without exerting a mechanical action of the type brushing, friction or any abrasion likely to deteriorate the substrate and especially the quality of the edges of areas not printed by the organic coating and covered with the mineral layer (s) (sharpness, resolution).
Le procédé permet de réaliser sur ligne de production industrielle, sur un substrat de grande surface, un motif de revêtement essentiellement organique d'une surface de dimensions allant de 1 m à 10 μιτι voire moins Le temps de cycle réduit permet de valider le caractère applicable industriellement.  The method makes it possible to produce on an industrial production line, on a large-area substrate, a substantially organic coating pattern with a surface area of dimensions ranging from 1 m to 10 μιτι or less. The reduced cycle time makes it possible to validate the applicable character industrially.
Le procédé de l'invention peut se terminer par le dépôt d'une couche de peinture au-dessus de la couche ou de l'empilement de couche(s) décorative(s) lorsque celle(s)-ci est (sont) réfléchissante(s), ou au-dessus d'une autre couche réfléchissante recouvrant cette (ces) couche(s) minérale(s) décorative(s). Cette mesure est classique dans la confection de miroirs.  The method of the invention may end with the deposition of a layer of paint above the layer or stack of decorative layer (s) when the one (s) is (are) reflective (s), or above another reflective layer covering this (these) mineral layer (s) decorative (s). This measurement is classic in the making of mirrors.
Le procédé de l'invention peut également comprendre la formation d'une couche discontinue métallique associée à une ou plusieurs couches diélectriques, comme décrit dans le document WO2015177474A1 . Ces couches ont pour fonction de modifier le spectre d'absorption dans le visible d'un miroir de sorte à produire une image en réflexion dont la couleur est modifiée. The method of the invention may also comprise the formation of a metallic discontinuous layer associated with one or more layers dielectric, as described in WO2015177474A1. These layers have the function of modifying the absorption spectrum in the visible of a mirror so as to produce a reflection image whose color is modified.
De préférence, le dépôt conformément à un motif du revêtement essentiellement organique est effectué par un procédé par voie liquide, de rouleau gravé direct ou indirect tel qu'offset, flexographie, d'impression par jet d'encre, de masquage, lithographie ou sérigraphie. On peut utiliser un rouleau de largeur au moins 3210mm (Pleine Largeur Float - PLF) dont la gravure reproduira le motif recherché. Il s'agit dans ce cas précis d'un motif répétitif mais cela reste compatible par exemple avec l'amélioration de transmission électromagnétique.  Preferably, the pattern-based deposition of the essentially organic coating is carried out by a liquid, direct or indirect engraved roll method such as offset, flexography, inkjet printing, masking, lithography or screen printing. . A roll with a width of at least 3210mm (Full Float Width - PLF) can be used, the engraving of which will reproduce the desired pattern. In this case it is a repetitive pattern but it remains compatible for example with the improvement of electromagnetic transmission.
De préférence, le revêtement essentiellement organique est choisi parmi un monomère et/ou oligomère acrylate, époxyacrylate, polyester acrylate, polyuréthane acrylate, composition polyvinylpyrrolidone + EDTA, polyamide, polyvinylbutyral, résine photosensible positive de type diazonaphtoquinone- novolaque, tout matériau organique réticulé sous rayonnement ultraviolet ou infrarouge, seul(e) ou en mélange de plusieurs d'entre eux (elles). Preferably, the essentially organic coating is chosen from a monomer and / or oligomer acrylate, epoxy acrylate, polyester acrylate, polyurethane acrylate, polyvinylpyrrolidone + EDTA composition, polyamide, polyvinyl butyral, positive photosensitive resin diazonaphthoquinone-novolac, any organic material crosslinked under radiation ultraviolet or infrared, alone or in a mixture of several of them.
De préférence, le revêtement essentiellement organique a une épaisseur au plus égale à 30, et par ordre de préférence croissant, au plus égale à 20 et 10 μιτι, et de manière particulièrement préférée d'approximativement 5 μιτι. Des épaisseurs de 1 μιτι voire quelques centaines de nm ne sont cependant pas exclues de l'invention. En dehors des zones imprimées de ce revêtement organique correspondant aux motifs allant de 1 m à 10 pm ou moins de dimensions de surface, il est nécessaire de n'avoir aucun revêtement organique temporaire pour ne pas dégrader l'empilement minéral décoratif dans ces zones censées avoir un empilement minéral intact après trempe. Preferably, the substantially organic coating has a thickness of at most 30, and in order of increasing preference, at most equal to 20 and 10 μιτι, and particularly preferably of approximately 5 μιτι. Thicknesses of 1 μιτι or even a few hundred nm are however not excluded from the invention. Apart from the printed areas of this organic coating corresponding to patterns ranging from 1 m to 10 μm or less in surface dimensions, it is necessary to have no temporary organic coating so as not to degrade the decorative mineral stack in these supposed areas. have an intact mineral stack after quenching.
De préférence, préalablement au dépôt de la couche ou de l'empilement de couches essentiellement minérale(s) décorative(s), l'élaboration du revêtement essentiellement organique comprend une réticulation par traitement thermique et/ou sous rayonnement tel qu'ultraviolet (UV) et/ou un séchage, puis l'ensemble est lavé. Le revêtement essentiellement organique pourra être avantageusement réticulé sous UV pour limiter l'espace nécessaire pour le séchage. On s'assurera néanmoins que le fluage du revêtement essentiellement organique (vernis, résine...) avant réticulation est limité afin d'éviter la perte de précision du motif. Preferably, prior to the deposition of the essentially mineral layer (s) of layer (s), the development of the essentially organic coating comprises a crosslinking by heat treatment and / or under radiation such as ultraviolet (UV ) and / or drying, then the whole is washed. The essentially organic coating may be advantageously crosslinked under UV to limit the space required for drying. However, it will be ensured that the creep of the essentially organic coating (varnish, resin, etc.) before crosslinking is limited in order to avoid the loss of accuracy of the pattern.
Le vernis ou résine sera séché convenablement avant de passer sous une machine à laver conventionnelle de coater puis l'opération de dépôt de la ou des couches (minces) essentiellement minérale(s) décorative(s) est effectué. On pourrait aussi envisager de laver le verre avant le dépôt partiel (impression) du revêtement organique, puis effectuer cette impression éventuellement suivie d'une réticulation, puis entrer directement dans le coater (sans lavage préalable).  The varnish or resin will be properly dried before going under a conventional washing machine to coater and then the deposition operation of the (mineral) thin layer (s) essentially mineral (s) decorative (s) is performed. One could also consider washing the glass before the partial deposition (printing) of the organic coating, then perform this printing optionally followed by crosslinking, then enter directly into the coater (without prior washing).
De préférence, la couche ou l'empilement de couches essentiellement minérale(s) décorative(s) est formé(e) par un procédé de dépôt physique en phase vapeur (PVD pour Physical Vapor Déposition) sous vide tel que pulvérisation cathodique notamment assistée par magnétron, évaporation ou dépôt chimique en phase vapeur assisté par plasma (PECVD pour Plasma Enhanced Chemical Vapor Déposition) ou par voie liquide. Preferably, the layer or stack of essentially mineral (s) decorative layers (s) is formed (e) by a physical vapor deposition (PVD for Physical Vapor Deposition) under vacuum such as cathodic sputtering especially assisted by magnetron, evaporation or plasma enhanced chemical vapor deposition (PECVD for Plasma Enhanced Chemical Vapor Deposition) or liquid.
De préférence, la couche ou l'empilement de couches essentiellement minérale(s) décorative(s) est constitué(e) d'Ag, Cr, Ti, Al, Nb, Cu, Au, Ga ou métal similaire, oxyde métallique tel que de Ti, Si, Sn, Zn ou similaire, oxyde conducteur transparent (TCO) tel qu'oxyde d'indium dopé à l'étain (ITO), oxyde d'indium dopé au zinc (IZO), ZnO : Al, stannate de cadmium, composé de Si et N tel que Si3N4 non dopé ou dopé par Al ou autre, empilement diélectrique afférent, seul ou en combinaison de plusieurs d'entre eux. Preferably, the layer or the stack of layers essentially mineral decorative (s) consists of Ag, Cr, Ti, Al, Nb, Cu, Au, Ga or similar metal metal oxide such as Ti, Si, Sn, Zn or the like, transparent conductive oxide (TCO) such as tin doped indium oxide (ITO), zinc doped indium oxide (IZO), ZnO: Al, stannate cadmium, compound of Si and N such as Si 3 N 4 undoped or doped with Al or the like, dielectric stack thereon, alone or in combination of several of them.
Le verre ne pouvant plus être coupé une fois trempé, il peut être, dans certaines applications, par exemple bâtiment, stocké puis découpé, démargé etc .. avant trempe. Ce vitrage pourra être vendu comme tel, principalement dans ce cas avec une couche éliminée ensuite à la trempe chez un transformateur. De préférence, le traitement thermique fait partie d'une trempe thermique du substrat verrier. Lors de la trempe, le vernis ou la résine disparait par combustion et élimine de fait la couche ou l'empilement de couches essentiellement minérale(s) décorative(s) aux endroits des motifs, ce qui provoque la gravure sélective recherchée. The glass can not be cut once soaked, it can be, in some applications, for example building, stored and cut, started etc. before quenching. This glazing can be sold as such, mainly in this case with a layer then removed by quenching at a transformer. Preferably, the heat treatment is part of a thermal tempering of the glass substrate. During quenching, the varnish or the resin disappears by combustion and effectively eliminates the layer or stack of essentially mineral layers (s) decorative (s) at the locations of the grounds, which causes the desired selective etching.
Dans une réalisation particulière, le traitement thermique fait partie d'un bombage du substrat verrier, notamment d'un bombage par pressage. Dans ce cas, un traitement thermique préliminaire provoque la disparition du vernis ou de la résine. Si des outils de pressage sont mis en œuvre pour bomber, on s'assurera que la combustion du revêtement essentiellement organique ait lieu avant cette phase de pressage. In a particular embodiment, the heat treatment is part of a bending of the glass substrate, in particular a bending by pressing. In this case, a preliminary heat treatment causes the disappearance of the varnish or the resin. If pressing tools are used to bend, it will be ensured that the combustion of the essentially organic coating takes place before this pressing phase.
Selon une variante du procédé, après le dépôt de la couche ou l'empilement de couches essentiellement minérale(s) décorative(s), on dépose à nouveau au moins une séquence revêtement essentiellement organique - couche ou empilement de couches essentiellement minérale(s) décorative(s). Ce dépôt est de préférence effectué avant le traitement thermique pour la combustion du revêtement essentiellement organique le plus proche du substrat, et un traitement thermique ultérieur produira la combustion de plusieurs revêtements essentiellement organiques superposés ainsi que l'élimination subséquente de plusieurs couches ou empilements de couches essentiellement minérales décoratives les recouvrant. Cependant le dépôt de séquences revêtement essentiellement organique - couche ou empilement de couches essentiellement minérale(s) décorative(s), à partir de la deuxième séquence, après le traitement thermique de combustion du premier revêtement essentiellement organique et essuyage ou élimination par souffle gazeux de ses résidus organiques et des résidus minéraux les recouvrant, fait également partie de l'invention. On peut ainsi combiner différents motifs de zones de transparence d'un miroir, ou de telles zones de transparence avec des zones différemment colorées.  According to a variant of the process, after the deposition of the layer or the stack of essentially mineral (s) decorative layers (s), is deposited again at least one essentially organic coating sequence - layer or stack of essentially mineral layers (s) decorative (s). This deposition is preferably carried out before the heat treatment for the combustion of the essentially organic coating closest to the substrate, and a subsequent heat treatment will produce the combustion of several superimposed organic overlays as well as the subsequent removal of several layers or layers of layers. essentially mineral decorative covering them. However, the deposition of essentially organic coating sequences - layer or stack of essentially mineral (s) decorative layers (s), from the second sequence, after the combustion heat treatment of the first substantially organic coating and wiping or gaseous blast removal of its organic residues and mineral residues covering them, is also part of the invention. It is thus possible to combine different patterns of areas of transparency of a mirror, or such areas of transparency with differently colored areas.
Le substrat verrier obtenu par le procédé de l'invention est également susceptible d'être intégré dans un vitrage feuilleté ou autre produit composite feuilleté, et/ou dans un vitrage multiple. D'autres objets de l'invention consistent en The glass substrate obtained by the process of the invention is also capable of being integrated in a laminated glazing unit or other laminated composite product, and / or in a multiple glazing unit. Other objects of the invention consist in
- un substrat verrier revêtu d'au moins une séquence constituée d'un revêtement essentiellement organique non aisément éliminable par lavage à l'eau (éventuellement acidifiée ou baséifiée) ou solvant organique, sur une partie mais non la totalité de sa surface, conformément à un motif, recouvert d'une couche ou d'un empilement de couches essentiellement minérale(s) décorative(s) ; il s'agit donc d'un produit intermédiaire (à vocation de commercialisation courante) du procédé de l'invention ;.  a glass substrate coated with at least one sequence consisting of a substantially organic coating that is not easily removable by washing with water (optionally acidified or based on) or organic solvent, on a part but not on its entire surface, in accordance with a pattern, covered with a layer or stack of essentially mineral (s) decorative layers; it is therefore an intermediate product (intended for routine commercialization) of the process of the invention;
- l'application d'un vitrage obtenu par un procédé tel que décrit précédemment comme miroir décoratif présentant des zones de transparence conformément à un motif; il peut s'agir d'un vitrage à couches modifiant les propriétés optiques, le niveau de réflexion dans le visible (miroir ou anti-reflet...), couches colorées ou absorbantes pour modifier la transmittance dans le visible à des fins esthétiques, couches électrochromes, électroluminescentes, anti-irisation, pour le bâtiment, la décoration d'intérieur, le mobilier urbain et même les véhicules de transport (terrestre, aérien, aquatique).  the application of a glazing obtained by a method as described previously as a decorative mirror having zones of transparency in accordance with a pattern; it may be a layer glazing modifying the optical properties, the level of reflection in the visible (mirror or anti-reflection ...), colored or absorbent layers to modify the transmittance in the visible for aesthetic purposes, electrochromic, electroluminescent, anti-iridescent layers, for building, interior decoration, street furniture and even transport vehicles (land, air, water).
L'invention sera mieux comprise à la lumière des exemples suivants. The invention will be better understood in light of the following examples.
Exemple 1 En référence à la Figure 1 , le procédé de l'invention peut être représenté en quatre vues correspondant à trois étapes principales successives, de gauche à droite sur la Figure. Example 1 Referring to Figure 1, the method of the invention can be represented in four views corresponding to three successive main steps, from left to right in the Figure.
On utilise un vernis d'acrylate réticulable sous UV, ayant la formulation suivante, où les proportions sont en masse : 57% d'oligomère hexaacrylate urethane aliphatique (CN9276 fabriqué par Sartomer), 38% de monomères et plus exactement 19% de tricyclodecanedimethanol diacrylate (TCDDMDA ou SR833S de Sartomer) ainsi que 19% de trimethylolpropane thacrylate (TMPTA ou SR351 de Sartomer) et enfin 5% de photoinitiateur de type cétone soit plus précisément un mélange de benzophénone et de méthanone (Speedcure 500 ou Irgacure 500 de BASF). Ce vernis est préparé en mélangeant mécaniquement tous ces composés (résines et photoinitiateur) à l'aide d'une pale. Après plusieurs heures d'agitation, le vernis peut être stocké plusieurs mois s'il est à l'abri de la lumière et des fortes variations de température. A UV crosslinkable acrylate lacquer having the following formulation is used, in which the proportions are by weight: 57% of aliphatic urethane hexaacrylate oligomer (CN9276 manufactured by Sartomer), 38% of monomers and more exactly 19% of tricyclodecanedimethanol diacrylate (TCDDMDA or SR833S from Sartomer) as well as 19% trimethylolpropane thacrylate (TMPTA or SR351 from Sartomer) and finally 5% of ketone-type photoinitiator is more precisely a mixture of benzophenone and methanone (Speedcure 500 or Irgacure 500 from BASF). This varnish is prepared by mechanically mixing all these compounds (resins and photoinitiator) using a blade. After several hours of agitation, the varnish can be stored for several months if it is protected from light and strong temperature variations.
Pour réaliser le dépôt, une certaine quantité de ce vernis est appliquée sur le verre propre et avivé selon la méthode de gravure indirecte au rouleau comme le présente l'étape 1 de la figure 1 . Après passage au rouleau, le substrat+vernis déposé est exposé aux UV (lampe de type mercure). L'épaisseur du revêtement à motif de vernis est de 5 μιτι.  To make the deposit, a certain amount of this varnish is applied to the clean glass and sharpened by the method of indirect gravure roller as shown in step 1 of Figure 1. After rolling, the substrate + varnish deposited is exposed to UV (mercury type lamp). The thickness of the lacquer pattern coating is 5 μιτι.
Un empilement de couches minces est déposé de manière conforme par pulvérisation cathodique lors de l'étape 2 sur le système verre+vernis acrylate. Cet empilement de couches minces a la constitution suivante (en partant du substrat verrier), dans laquelle les épaisseurs sont en nm : S1O2 20 / Cr 27 / Si3N : Al 1 1 ,7 / TiOx 2,3. Cet empilement réfléchissant la lumière visible est trempable. A stack of thin layers is deposited in a conformal manner by sputtering in step 2 on the glass + acrylate varnish system. This stack of thin layers has the following constitution (starting from the glass substrate), in which the thicknesses are in nm: SiO 2 20 / Cr 27 / Si 3 N: Al 1 1, 7 / TiO x 2.3. This stack reflecting the visible light is soakable.
Lors d'une étape de trempe (3 sur la figure 1 .), généralement dans un four à convection à 730°C pendant 35 secondes par mm de verre (140 secondes pour un verre épais de 4mm), la couche organique est dégradée ce qui entraîne le décollement des couches magnétrons dans les zones où elle est présente. Le système final consiste en l'empilement de couches minces décrit ci-dessus, structuré selon un motif correspondant au négatif de celui réalisé avec la résine. During a quenching step (3 in FIG. 1), generally in a convection oven at 730 ° C. for 35 seconds per mm of glass (140 seconds for a 4 mm thick glass), the organic layer is degraded. which leads to the detachment of the magnetron layers in the areas where it is present. The final system consists of the stack of thin layers described above, structured in a pattern corresponding to the negative of that made with the resin.
D'excellents résultats ont aussi été obtenus en appliquant le vernis par sérigraphie, qui a permis de former une couche de 10 m d'épaisseur.  Excellent results were also obtained by applying the varnish by screen printing, which made it possible to form a layer 10 m thick.
Exemple 2 Cet exemple diffère du précédent par le revêtement essentiellement organique. Il s'agit ici d'un dépôt par jet d'encre d'une encre commercialisée par la Société Marabu dans la gamme Ultra-Jet DUV A, notamment en couleur cyan ou magenta. On obtient une épaisseur de quelques centaines de nm à quelques μιτι. L'encre (motifs) est réticulée sous ultraviolet. La résolution procurée par le procédé de l'invention dépend uniquement de la méthode d'impression du revêtement organique. Elle n'est pas ou peu modifiée lors de la trempe. Des lignes imprimées ayant une finesse de 25 μιτι ont donné une largeur de motif en transparence de 25 μιτι (ligne d'ablation de l'empilement réfléchissant dans le visible). Example 2 This example differs from the previous one by the essentially organic coating. This is an ink jet deposit of an ink marketed by the Marabu Company in the Ultra-Jet DUV A range, especially in cyan or magenta color. A thickness of a few hundred nm to a few μιτι is obtained. The ink (patterns) is cross-linked under ultraviolet light. The resolution provided by the process of the invention depends solely on the method of printing the organic coating. It is not or little modified during quenching. Printed lines having a fineness of 25 μιτι gave a pattern width in transparency of 25 μιτι (line of ablation of the reflective stack in the visible).

Claims

REVENDICATIONS
1 . Procédé de dépôt sur un substrat verrier d'une couche ou d'un empilement de couches essentiellement minérale(s) décorative(s), caractérisé en ce qu'il comprend les étapes consistant à 1. A process for depositing on a glass substrate a layer or a stack of essentially mineral decorative layers, characterized in that it comprises the steps of
déposer sur le substrat un revêtement essentiellement organique sur une partie mais non la totalité de sa surface, conformément à un motif, à déposer sur le substrat ainsi revêtu une couche ou un empilement de couches essentiellement minérale(s) décorative(s), à  depositing on the substrate an essentially organic coating on a part but not all of its surface, in accordance with a pattern, to deposit on the substrate thus coated a layer or a stack of layers essentially mineral (s) decorative (s), to
- soumettre l'ensemble à un traitement thermique de manière à effectuer la combustion du revêtement essentiellement organique, puis à  subjecting the assembly to a heat treatment so as to effect the combustion of the essentially organic coating, then to
éliminer celui-ci et la couche ou l'empilement de couches essentiellement minérale(s) décorative(s) qui le recouvre par essuyage tel qu'au chiffon et/ou souffle gazeux et/ou lavage, de manière à obtenir la couche ou l'empilement de couches essentiellement minérale(s) décorative(s) selon un motif correspondant au négatif de celui réalisé avec le revêtement essentiellement organique.  removing it and the layer or stack of essentially mineral layers (s) decorative covering it by wiping such as cloth and / or gaseous and / or wash, so as to obtain the layer or l stack of essentially mineral (s) decorative layers (s) in a pattern corresponding to the negative of that made with the essentially organic coating.
2. Procédé selon la revendication 1 , caractérisé en ce que le dépôt conformément à un motif du revêtement essentiellement organique est effectué par un procédé par voie liquide, de rouleau gravé direct ou indirect tel qu'offset, flexographie, d'impression par jet d'encre, de masquage, lithographie ou sérigraphie. 2. Method according to claim 1, characterized in that the deposition according to a pattern of the essentially organic coating is carried out by a liquid process, direct or indirect engraved roll such as offset, flexography, jet printing. ink, masking, lithography or screen printing.
3. Procédé selon la revendication 2, caractérisé en ce que le revêtement essentiellement organique est choisi parmi un monomère et/ou oligomère acrylate, époxyacrylate, polyester acrylate, polyuréthane acrylate, composition polyvinylpyrrolidone + EDTA, polyamide, polyvinylbutyral, résine photosensible positive de type diazonaphtoquinone-novolaque, tout matériau organique réticulé sous rayonnement ultraviolet ou infrarouge, seul(e) ou en mélange de plusieurs d'entre eux (elles). 3. Method according to claim 2, characterized in that the essentially organic coating is selected from a monomer and / or oligomer acrylate, epoxy acrylate, polyester acrylate, polyurethane acrylate, composition polyvinylpyrrolidone + EDTA, polyamide, polyvinyl butyral, positive photosensitive resin type diazonaphthoquinone -novolaque, any organic material crosslinked under ultraviolet or infrared radiation, alone or in a mixture of several of them.
4. Procédé selon l'une des revendications précédentes, caractérisé en ce que le revêtement essentiellement organique a une épaisseur au plus égale à 30, et par ordre de préférence croissant, au plus égale à 20 et à 10 μητι, et de manière particulièrement préférée d'approximativement 5 μιτι. 4. Method according to one of the preceding claims, characterized in that the substantially organic coating has a thickness at most equal to 30, and in order of increasing preference, at most equal to 20 and 10 μητι, and particularly preferably of approximately 5 μιτι.
5. Procédé selon l'une des revendications précédentes, caractérisé en ce que préalablement au dépôt de la couche ou de l'empilement de couches essentiellement minérale(s) décorative(s), l'élaboration du revêtement essentiellement organique comprend une réticulation par traitement thermique et/ou sous rayonnement tel qu'ultraviolet et/ou un séchage, puis l'ensemble est lavé. 5. Method according to one of the preceding claims, characterized in that prior to the deposition of the layer or the stack of essentially mineral layers (s) decorative (s), the development of substantially organic coating comprises a crosslinking treatment thermal and / or radiation such as ultraviolet and / or drying, then the whole is washed.
6. Procédé selon l'une des revendications précédentes, caractérisé en ce que la couche ou l'empilement de couches essentiellement minérale(s) décorative(s) est formé(e) par un procédé de dépôt physique en phase vapeur (PVD pour Physical Vapor Déposition) sous vide tel que pulvérisation cathodique notamment assistée par magnétron, évaporation ou dépôt chimique en phase vapeur assisté par plasma (PECVD pour Plasma Enhanced Chemical Vapor Déposition) ou par voie liquide. 6. Method according to one of the preceding claims, characterized in that the layer or the stack of essentially mineral (s) decorative layer (s) is formed (e) by a physical vapor deposition process (PVD for Physical Vacuum Vapor Deposition) such as cathodic assisted sputtering assisted by magnetron, evaporation or plasma enhanced chemical vapor deposition (PECVD for Plasma Enhanced Chemical Vapor Deposition) or liquid.
7. Procédé selon la revendication 6, caractérisé en ce que la couche ou l'empilement de couches essentiellement minérale(s) décorative(s) est constitué(e) d'Ag, Cr, Ti, Al, Nb, Cu, Au, Ga ou métal similaire, oxyde métallique tel que de Ti, Si, Sn, Zn ou similaire, oxyde conducteur transparent (TCO) tel qu'oxyde d'indium dopé à l'étain (ITO), oxyde d'indium dopé au zinc (IZO), ZnO : Al, stannate de cadmium, composé de Si et N tel que Si3N non dopé ou dopé par Al ou autre, empilement diélectrique afférent, seul ou en combinaison de plusieurs d'entre eux. 7. Method according to claim 6, characterized in that the layer or the stack of essentially mineral layers (s) decorative (s) consists of Ag, Cr, Ti, Al, Nb, Cu, Au, Ga or similar metal, metal oxide such as Ti, Si, Sn, Zn or the like, transparent conductive oxide (TCO) such as tin-doped indium oxide (ITO), zinc-doped indium oxide ( IZO), ZnO: Al, cadmium stannate, composed of Si and N such as undoped or doped Al or other doped Si3N, afferent dielectric stack, alone or in combination of several of them.
8. Procédé selon l'une des revendications précédentes, caractérisé en ce que le traitement thermique fait partie d'une trempe thermique du substrat verrier. 8. Method according to one of the preceding claims, characterized in that the heat treatment is part of a thermal quenching of the glass substrate.
9. Procédé selon l'une des revendications précédentes, caractérisé en ce que le traitement thermique fait partie d'un bombage du substrat verrier. 9. Method according to one of the preceding claims, characterized in that the heat treatment is part of a bending of the glass substrate.
10. Procédé selon la revendication 9, caractérisé en ce que le bombage est effectué par pressage. 10. The method of claim 9, characterized in that the bending is performed by pressing.
1 1 . Procédé selon l'une des revendications précédentes, caractérisé en ce qu'après le dépôt de la couche ou l'empilement de couches essentiellement minérale(s) décorative(s), on dépose à nouveau au moins une séquence revêtement essentiellement organique - couche ou empilement de couches essentiellement minérale(s) décorative(s). 1 1. Method according to one of the preceding claims, characterized in that after the deposition of the layer or the essentially inorganic mineral layer (s), is deposited again at least one essentially organic coating layer - layer or stacking of essentially mineral (s) decorative layers.
12. Substrat verrier revêtu d'au moins une séquence constituée d'un revêtement essentiellement organique non aisément éliminable par lavage à l'eau ou solvant organique, sur une partie mais non la totalité de sa surface, conformément à un motif, recouvert d'une couche ou d'un empilement de couches essentiellement minérale(s) décorative(s). 12. Glass substrate coated with at least one sequence consisting of an essentially organic coating which is not readily removable by washing with water or an organic solvent, on a part but not on its entire surface, in accordance with a pattern covered with a layer or stack of essentially mineral (s) decorative layers.
13. Application d'un vitrage obtenu par un procédé selon l'une des revendications 1 à 1 1 comme miroir décoratif présentant des zones de transparence conformément à un motif. 13. Application of a glazing obtained by a method according to one of claims 1 to 1 1 as a decorative mirror having areas of transparency in a pattern.
EP17710353.8A 2016-02-26 2017-02-23 Method for the selective etching of a layer or a stack of layers on a glass substrate Withdrawn EP3419945A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1651630A FR3048245B1 (en) 2016-02-26 2016-02-26 METHOD FOR SELECTIVELY ENGRAVING LAYER OR LAYER STACK ON GLASS SUBSTRATE
PCT/FR2017/050406 WO2017144824A1 (en) 2016-02-26 2017-02-23 Method for the selective etching of a layer or a stack of layers on a glass substrate

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EP (1) EP3419945A1 (en)
KR (1) KR20180101585A (en)
CN (1) CN108698920A (en)
FR (1) FR3048245B1 (en)
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WO (1) WO2017144824A1 (en)

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TWI776067B (en) 2018-06-29 2022-09-01 美商維托平面玻璃有限責任公司 Burn-off protective coating
US20220073424A1 (en) * 2018-11-14 2022-03-10 Saint-Gobain Glass France Method for the selective etching of a layer or a stack of layers on a glass substrate
HUE062827T2 (en) * 2019-04-11 2023-12-28 Saint Gobain Method for assessing the sensitivity of a glass panel to forming quench marks
US11602767B2 (en) 2019-06-28 2023-03-14 Vitro Flat Glass Llc Substrate having a burnable coating mask
US11639470B2 (en) 2020-12-28 2023-05-02 Samsung Display Co., Ltd. Etching composition for thin film containing silver, method for forming pattern and method for manufacturing a display device using the same

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US2807111A (en) * 1953-09-18 1957-09-24 Turner Mfg Company Ornamented mirrors and method of making same
DE19817712C1 (en) 1998-04-21 2000-02-03 Sekurit Saint Gobain Deutsch Transparent plate, in particular glass pane with a coating and a radiation window
DE19825424C1 (en) 1998-06-06 2000-01-05 Ver Glaswerke Gmbh Glass pane with a metallic reflective layer system
US20080213482A1 (en) * 2007-03-01 2008-09-04 Stephan Lvovich Logunov Method of making a mask for sealing a glass package
PT2890655T (en) 2012-08-28 2019-07-17 Saint Gobain Coated pane with partially uncoated sections
FR3021414B1 (en) 2014-05-21 2022-09-09 Saint Gobain COLORED MIRROR

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WO2017144824A1 (en) 2017-08-31
FR3048245A1 (en) 2017-09-01
KR20180101585A (en) 2018-09-12
FR3048245B1 (en) 2018-03-16
CN108698920A (en) 2018-10-23

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