EP3398407A1 - Integrated circuit intended for insulation defect detection and having a conductive armature - Google Patents
Integrated circuit intended for insulation defect detection and having a conductive armatureInfo
- Publication number
- EP3398407A1 EP3398407A1 EP16826103.0A EP16826103A EP3398407A1 EP 3398407 A1 EP3398407 A1 EP 3398407A1 EP 16826103 A EP16826103 A EP 16826103A EP 3398407 A1 EP3398407 A1 EP 3398407A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- armature
- electronic
- electronic components
- voltage
- leds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000007547 defect Effects 0.000 title claims abstract description 7
- 238000009413 insulation Methods 0.000 title description 19
- 238000001514 detection method Methods 0.000 title description 4
- 239000000615 nonconductor Substances 0.000 claims abstract description 17
- 239000000758 substrate Substances 0.000 claims description 31
- 238000010292 electrical insulation Methods 0.000 claims description 22
- 230000002787 reinforcement Effects 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 8
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 6
- 229920005591 polysilicon Polymers 0.000 claims description 6
- 239000002019 doping agent Substances 0.000 claims description 3
- 230000007257 malfunction Effects 0.000 description 13
- 238000010586 diagram Methods 0.000 description 10
- 239000012212 insulator Substances 0.000 description 10
- 238000000926 separation method Methods 0.000 description 8
- 239000011159 matrix material Substances 0.000 description 7
- 239000003990 capacitor Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000002070 nanowire Substances 0.000 description 3
- 229910001199 N alloy Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 230000004064 dysfunction Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000000750 progressive effect Effects 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 230000004936 stimulating effect Effects 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/2607—Circuits therefor
- G01R31/2632—Circuits therefor for testing diodes
- G01R31/2635—Testing light-emitting diodes, laser diodes or photodiodes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2801—Testing of printed circuits, backplanes, motherboards, hybrid circuits or carriers for multichip packages [MCP]
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2832—Specific tests of electronic circuits not provided for elsewhere
- G01R31/2836—Fault-finding or characterising
- G01R31/2839—Fault-finding or characterising using signal generators, power supplies or circuit analysers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2832—Specific tests of electronic circuits not provided for elsewhere
- G01R31/2836—Fault-finding or characterising
- G01R31/2839—Fault-finding or characterising using signal generators, power supplies or circuit analysers
- G01R31/2841—Signal generators
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/50—Testing of electric apparatus, lines, cables or components for short-circuits, continuity, leakage current or incorrect line connections
- G01R31/52—Testing for short-circuits, leakage current or ground faults
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/006—Electronic inspection or testing of displays and display drivers, e.g. of LED or LCD displays
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
- G09G3/22—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources
- G09G3/30—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels
- G09G3/32—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B45/00—Circuit arrangements for operating light-emitting diodes [LED]
- H05B45/50—Circuit arrangements for operating light-emitting diodes [LED] responsive to malfunctions or undesirable behaviour of LEDs; responsive to LED life; Protective circuits
- H05B45/52—Circuit arrangements for operating light-emitting diodes [LED] responsive to malfunctions or undesirable behaviour of LEDs; responsive to LED life; Protective circuits in a parallel array of LEDs
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B45/00—Circuit arrangements for operating light-emitting diodes [LED]
- H05B45/50—Circuit arrangements for operating light-emitting diodes [LED] responsive to malfunctions or undesirable behaviour of LEDs; responsive to LED life; Protective circuits
- H05B45/54—Circuit arrangements for operating light-emitting diodes [LED] responsive to malfunctions or undesirable behaviour of LEDs; responsive to LED life; Protective circuits in a series array of LEDs
Definitions
- the invention relates to electronic circuits comprising conductive reinforcements and, in particular, electronic circuits for detecting a malfunction by a lack of electrical insulation between an electronic component of the electronic circuit and a conductive reinforcement surrounding this component.
- Electroluminescent diodes are experiencing a significant development, in particular because of reduced power consumption, a long life deemed high, and a good integration ability for electronic circuits.
- the ability to integrate such LEDs has the reverse side to prevent the replacement of an LED cell in the matrix.
- a complete failure of one LED cell may affect the operation of all other LED cells with which it can be connected in series.
- Document US2015 / 0021629 describes the fixing of an array of LEDs on the substrate of a control module, and thus forming an electronic circuit.
- the LEDs are soldered to a conductive and rectangular metal plate.
- the LEDs are in electrical contact with this metal plate.
- the voltage of the LEDs is measured to determine a progressive shifting of the voltage level to ensure a brightness level.
- Document FR3009474 describes a matrix of LEDs in series / parallel. In order to avoid a malfunction of the lighting of a vehicle, a functional failure is detected for an LED, then it is short-circuited by a current source which guarantees a balance of current between different branches in parallel. Lighting of the remaining LEDs in the branch with a faulty LED is ensured. This document thus describes a detection of a fault by analyzing the voltage across an LED.
- US2014 / 0084941 discloses a matrix of LEDs of a screen, provided with a device for testing dysfunction.
- the document describes a DFL detection line offset laterally with respect to the LEDs.
- An electrical insulator is interposed between the detection line and pixel feed tracks.
- the invention aims to solve one or more of these disadvantages.
- the invention thus relates to an electronic circuit, as defined in appended claim 1.
- the invention also relates to the variants detailed in the dependent claims. It will be understood by those skilled in the art that each of the features of the variants of the dependent claims may be independently combined with the features of claim 1, without necessarily constituting an intermediate generalization.
- the invention also relates to a method for determining a defect of an electrical insulator, as defined in the appended claims.
- FIG 1 is a cross sectional view of an integrated circuit according to an exemplary embodiment of the invention.
- FIG. 2 is a sectional view from above of the integrated circuit of FIG.
- FIG 3 is a current / voltage diagram illustrating the aging of a multi-chip LED connected in series, partly related to a degradation of the insulation;
- FIGS. 4a and 4b are equivalent electrical diagrams for the association of LEDs connected in series and of an armature, in the case of normal operation, and in the case of a short circuit to the armature;
- FIG. 5 is an equivalent electrical diagram for the association of LEDs connected in parallel and of an armature;
- FIG. 6 illustrates components of a matrix, tested sequentially;
- FIG. 7 is a diagram illustrating different cases of leakage resistance;
- FIG 8 is a cross sectional view of an integrated circuit according to another exemplary embodiment of the invention.
- FIGS 1 and 2 are sectional views of an exemplary integrated circuit 1 according to an exemplary embodiment of the invention.
- the integrated circuit 1 comprises several electronic components 1 1 to 16, in this case light-emitting diodes or LEDs with nanowires. Each of the LEDs 1 1 to 16 forms an emitting pixel.
- the LEDs 1 1 to 16 are here formed in and on a semiconductor substrate 91.
- the substrate 91 is delimited into different parts separated by vertical trenches.
- the vertical trenches pass through the substrate 91 from one side to the other, so that the different parts of the substrate 91 are physically separated from each other.
- the different parts of the substrate 91 correspond to LEDs 1 1 to 16 respectively.
- the integrated circuit 1 further comprises a conductive armature 4 surrounding the LEDs 1 1 to 16.
- the conductive armature 4 is at least partially housed in the separation trenches between the different parts of the substrate 91.
- the integrated circuit 1 further comprises an electrical insulator 5.
- the electrical insulator 5 is at least partially housed in the separation trenches between the different parts of the substrate 91.
- the electrical insulation 5 covers in particular the lateral faces of the various parts of the substrate 91.
- the electrical insulation 5 form on the one hand an electrical insulation between the armature 4 and the LEDs 1 1 to 16.
- a side face 51 of the electrical insulation 5 forms in particular a separation between the LED 1 1 and the armature 4.
- a side face 52 of the electrical insulation 5 forms a separation between the LED 12 and the armature 4.
- the electrical insulation 5 forms on the other hand an electrical insulation between the various LEDs 1 1 to 16.
- the LEDs 1 1 to 16 may have a structure known per se.
- the LEDs 1 1 to 16 here comprise respective electrodes, positioned under the substrate 91.
- the LEDs 1 1 to 13 respectively comprise lower electrodes 21 to 23 disposed under their respective portion of substrate 91, and typically made of metal.
- the substrate 91 is made of semiconductor material.
- the substrate 91 is for example sufficiently doped to be conductive.
- the Substrate material 91 may be selected to promote the growth of LED nanowires in an organized manner.
- the substrate 91 is surmounted by an insulating layer 92.
- This insulating layer 92 is for example made of silicon oxide or silicon nitride. This layer 92 may typically comprise a thickness of between 25 nm and 25 ⁇ m.
- Each of the LEDs 1 1 to 16 comprises several pins 1 1 1 passing through the thickness of the insulating layer 92.
- the pads 1 1 1 are intended to conduct the respective polarizations of the lower electrodes to the son of the various LEDs 1 1 to 16.
- the for example, studs 11 are made of a III-N alloy, for example GaN.
- the pads 1 1 1 may for example be made of unintentionally doped GaN or GaN type doping.
- a respective wire is formed in line with each of the pads 1 1 1.
- the structure of the son will be described with reference to the LED 1 1, the LEDs 12 to 16 may have a similar structure.
- a wire comprises an amount 1 12 in contact with a stud 1 1 1 at its lower part.
- the amount 1 12 can be produced in a manner known per se in a III-N alloy, for example N-type doping GaN or unintentionally doped type.
- the amount 1 12 is covered in a manner known per se by a quantum well structure 1 13.
- the structure 1 13 here comprises an alternation of layers (for example alternating layers of undoped GaN and layers of InGaN). Most of the light radiation of the LED is generated in the quantum well structure 1 13.
- the quantum well structure 1 13 is covered in a manner known in either by a layer 1 14, for example P-doped GaN, so as to form a PN or P-N junction with the upright 1 12 or the quantum well 1 13.
- the son of the LED 1 1 are covered by a conductive layer 31 forming an upper electrode.
- the layer 31 is conductive in order to be able to electrically polarize each P-N junction.
- the conductive layer 31 is transparent for the emission wavelength of the LED 1 1.
- the layer 31 can be made in a manner known per se indium tin oxide (usually designated by the acronym ITO) or aluminum doped zinc oxide.
- a power supply circuit (not shown) makes it possible to selectively apply a potential difference of an appropriate amplitude between the lower electrode 21 and the layer 31 of the upper common electrode, in order to obtain a light emission by the LED. 1 1.
- the electronic circuit 1 comprises a device 7 configured to measure the current flowing through the armature 4, the voltage on this armature 4 or on each of the LEDs 1 1 to 16.
- the device 7 is for example implemented under the form of a microcontroller.
- the electronic circuit 1 further comprises a device 8, connected to the device 7.
- the device 8 is configured to determine a fault of the electrical insulator 5 as a function of the voltage or current measured by the device 7. As detailed more precisely in FIG. practical examples thereafter, the device 8 can anticipate or see a malfunction of the electronic circuit 1.
- the device 8 is for example implemented in the form of a microcontroller.
- the conductive reinforcement 4 is advantageously made of doped polysilicon.
- the polysilicon may for example be doped with a concentration of at least than 10 19 CNRR 3, preferably at least 5 * 10 19 cm "3, to form an armature 4 with little residual thermomechanical stresses after fabrication.
- a such doped polysilicon thus forms an inexpensive filling material for the reinforcement 4.
- the doped polysilicon has mechanical properties similar to those of the doped silicon substrate 91 (having for example a dopant concentration of the same order of magnitude as the reinforcement 4), during a rise in temperature
- the mechanical stresses in the armature 4 are reduced during a rise in temperature linked for example to the formation of silicon oxide layers by thermal oxidation or during annealing of a layer of the LEDs, or during any other step of a manufacturing process that may involve significant heating, and potentially mechanical constraints between frame 4 and substrate 91.
- Figure 3 is a representative diagram of an example of aging of a multi-chip LED connected in series.
- the diagram shows on the ordinate the current flowing through the LED, and on the abscissa the potential difference applied across the LEDs.
- the voltage Vm corresponds to the minimum voltage for stimulating the spontaneous emission in the junction (light emission) of the LED.
- the curve in solid line corresponds to a new LED, the curve in dashed line corresponds to an LED after 5000 hours of operation.
- the potential difference Vm corresponds to the minimum voltage to obtain an ignition of the light emitting diode. It is generally found that the current flowing for a bias lower than Vm increases as a function of time. It can be seen that the leakage current flowing through the LED, powered by a potential difference of less than Vm, is much higher for the LED having undergone a certain period of use. An insulation fault with a conductive frame 4 surrounding the LED may be an important factor in such a leakage current.
- the structure illustrated in FIGS. 1 and 2 can be used, for example, to connect the LEDs 1 1 to 16 in series, in parallel, or according to a time-multiplexed matrix, as a function of the interconnections made between the different electrodes of these LEDs 1 1 to 16 .
- Figures 4a and 4b are equivalent electrical diagrams of several LEDs 1 1 to 14 connected in series.
- the armature 4 is comparable to a first conductive plate of several capacities 45.
- the insulation 5 of the armature 4 can be modeled as the insulation of these capacitors 45.
- Each connection node between the LEDs can be likened to a second plate Conducting capabilities 45.
- the armature 4 (and therefore the first conductive plates of the capacitors 45) is placed at a floating potential.
- the first conductive plates of the capacitors 45 are thus isolated from the second conductive plates by means of the insulator 5.
- FIG. 4b illustrates an example of a malfunction, materialized by a short circuit between the armature 4 and the connection node of the LEDs 12 and 13.
- the armature 4 is then brought to the potential of this connection node.
- the armature 4 must thus have a floating potential in normal operation. This floating potential must take a value corresponding to the average of the potentials applied across the LEDs.
- the armature 4 then takes the potential of this LED.
- the device 7 is connected to the armature 4 and measures the potential of the armature 4.
- the device 7 supplies the potential measured to the device 8.
- the device 8 can:
- the armature 4 is at a floating potential V4 "Vin / 2. If the measured potential Vm takes this value V4, the device 8 determines that the armature 4 is at its normal potential and therefore that the insulator 5 has a priori no fault.
- the device 8 determines a failure of the insulator 5.
- the position of the faulty LED in the string of LEDs connected in series will be identified by an index k, this index position k being determined from the potential of mass up to the potential Vin.
- the measured voltage Vm is V4
- one can dynamically analyze the evolution of the voltage Vm during the application of a step of the voltage Vin on the chain of LEDs connected in series.
- the amplitude of this current may be representative of the leakage impedance of the insulator 5, and therefore of the amplitude of the defect. insulation 5.
- Figure 5 is an equivalent electrical diagram of several LEDs connected in parallel in a matrix, in the absence of malfunction.
- the armature 4, a common electrode of the LEDs 1 1 to 14 and the insulator 5 can be modeled as a capacitor 45.
- the armature 4 forms a conductive plate at a floating potential in normal operation.
- the armature 4 must have a floating potential during normal operation.
- This floating potential must take a value Vf / 2, corresponding to half the potential Vf applied across the LEDs.
- Vf / 2 corresponding to half the potential Vf applied across the LEDs.
- the device 7 is connected to the armature 4 and measures the potential of the armature 4.
- the device 7 supplies the measured potential to the device 8.
- the device 8 can determine an abnormal deviation of the floating potential, representative of a failure of the insulator 5.
- a capacitor 45 is sequentially connected in parallel with each powered LED.
- the test mode that will be described can also be used for an integrated circuit 1 provided with a set of LEDs connected in parallel, if this integrated circuit 1 is configured to sequentially supply each of the LEDs.
- FIG. 6 illustrates a configuration of an integrated circuit 1 in which each LED 10 is connected to the intersection between a line track and a column track.
- each LED 10 comprises an electrode connected to a line track and an electrode connected to a column track.
- a line control circuit 61 is connected to lines 1 to m.
- the control circuit 61 selectively applies a first supply potential (for example a ground potential) on one of the lines and keeps the other lines in a floating state.
- Column control circuit 62 is connected to columns 1 to n.
- the control circuit 62 selectively applies a second supply potential (the potential Vf) on one of the columns and keeps the other columns in a floating state.
- the insulation between each of the LEDs 10 and the armature 4 can be sequentially tested.
- the potential Vm can be measured.
- Vf / 2 or Vf for each of the LEDs 10 it is possible to determine whether its insulation with respect to the armature 4 is deteriorated or not. Since the position of the LED during power supply is known, the location of a possible defect of the insulator 5 is known.
- Figure 7 is a diagram illustrating different cases of leakage resistances that can be determined. For example, it is conceivable to determine the leakage resistance through the frame 4. By considering the frame 4 to its floating potential as a voltage source, it can be connected to the mass successively by means of several different calibrated resistors, in order to calculate its internal resistance. By measuring the drained currents of the armature 4 for these two resistance values and by measuring the potential on the armature 4, it is possible to extrapolate diagrams as illustrated, representing the potential Vm as a function of the drained current. The leakage resistance can be deduced as a function of the slope of these characteristics.
- the solid line curve corresponds, for example, to a quasi-zero leakage resistance towards the armature 4, that is to say a free short-circuit between an LED and the armature 4.
- the curve in dashed line corresponds to a higher leakage resistance to the frame 4.
- Figure 8 is a cross-sectional view of an integrated circuit 1 according to another embodiment of the invention.
- the integrated circuit 1 comprises several LEDs according to another design. Each of the LEDs 1 1 to 13 forms an emitting pixel.
- the integrated circuit 1 further comprises a conductive reinforcement 4 surrounding the LEDs 1 1 to 13.
- the integrated circuit 1 further comprises an electrical insulator 5.
- the electrical insulator 5 on the one hand forms an electrical insulation between the armature 4 and the LEDs 1 1 to 13.
- a side face 51 of the electrical insulation 5 forms in particular a separation between the LED 1 1 and the armature 4.
- a side face 52 of the electrical insulation 5 forms a separation between the LED 12 and the armature 4.
- the electrical insulation 5 on the other hand forms an electrical insulation between the various LEDs 1 1 to 13.
- the LEDs 1 1 to 13 may have a structure known per se.
- LEDs 1 1 to 13 here comprise respective electrodes.
- the LEDs 1 1 to 13 respectively comprise lower electrodes 21 to 23 typically made of reflective metal.
- the electrodes 21 to 23 are each covered with a P-doped semiconductor layer 1 16 (for example P-doped GaN) with which they are in contact.
- the semiconductor layer 1 16 is covered with an N-type doped semiconductor layer 1 18 (for example N-type doped GaN).
- An active layer 1 17 is formed at the interface between the layers 1 16 and 1 18.
- the superposition of the layers 1 16 to 1 18 will here be assimilated to a substrate.
- the superposition of the layers 116 to 18 forming a substrate is delimited into different parts separated by vertical trenches.
- the vertical trenches pass through the superposition of layers from one side to the other, so that the different parts of the substrate are physically separated from each other.
- the conductive reinforcement 4 is at least partially housed in the separation trenches between the different parts of the substrate.
- the electrical insulation 5 is at least partially housed in the separation trenches between the different parts of the substrate.
- the electrical insulation 5 covers in particular the lateral faces of the different parts of the superposition of layers 1 16 to 1 18.
- the active layer 11 may in particular comprise one or more quantum wells.
- the LEDs 1 1 to 13 comprise respective upper electrodes 31 1 to 313 formed in contact on the layer 1 18.
- the LEDs 1 1 to 13 can thus be polarized via their respective lower and upper electrodes.
- the electrodes 31 1 to 313 are transparent for the emission wavelength of their respective LEDs.
- the electrodes 31 1 to 313 are for example made of tin indium oxide.
- the electronic circuit 1 also comprises a device 7 configured to measure the current flowing through the armature 4, the voltage on this armature 4 or on each of the LEDs 1 1 to 13.
- the device 7 is for example implemented. in the form of a microcontroller.
- the electronic circuit 1 further comprises a device 8, connected to the device 7.
- the device 8 is configured to determine a fault of the electrical insulator 5 as a function of the voltage or current measured by the device 7. As detailed more precisely in FIG. practical examples thereafter, the device 8 can anticipate or see a malfunction of the electronic circuit 1.
- the device 8 is for example implemented in the form of a microcontroller. The mode of identifying and locating a malfunction may be similar to that described with reference to the first embodiment.
- the armature 4 is at a floating potential. It is also possible to apply a potential on the armature 4 and determine the current flowing through it.
- the measurements made can also be cross-checked with optical measurements in order to refine the diagnosis of the dysfunction.
- the invention has been described for a particular application to LED-type electronic components, the invention is also applicable to any other type of segmented or pixelated electronic component containing a conductive reinforcement and electrically isolated from the pixel array.
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1563404A FR3046247B1 (en) | 2015-12-28 | 2015-12-28 | INTEGRATED CIRCUIT FOR DETECTING AN INSULATION FAULT WITH CONDUCTIVE FRAME |
PCT/FR2016/053468 WO2017115027A1 (en) | 2015-12-28 | 2016-12-15 | Integrated circuit intended for insulation defect detection and having a conductive armature |
Publications (1)
Publication Number | Publication Date |
---|---|
EP3398407A1 true EP3398407A1 (en) | 2018-11-07 |
Family
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Family Applications (1)
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EP16826103.0A Pending EP3398407A1 (en) | 2015-12-28 | 2016-12-15 | Integrated circuit intended for insulation defect detection and having a conductive armature |
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US (1) | US10845405B2 (en) |
EP (1) | EP3398407A1 (en) |
FR (1) | FR3046247B1 (en) |
WO (1) | WO2017115027A1 (en) |
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EP3715884A1 (en) * | 2019-03-29 | 2020-09-30 | Automotive Lighting Italia S.p.A. | Automobile lighting unit with oled light sources and related operating method |
DE102021200002A1 (en) * | 2021-01-04 | 2022-07-07 | Robert Bosch Gesellschaft mit beschränkter Haftung | Apparatus and method for monitoring a semiconductor device |
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FR2782842B1 (en) * | 1998-08-25 | 2003-09-05 | Commissariat Energie Atomique | DEVICE COMPRISING ELECTRONIC COMPONENTS IN MUTUALLY INSOLE REGIONS OF A LAYER OF SEMICONDUCTOR MATERIAL AND METHOD OF MANUFACTURING SUCH A DEVICE |
US20090314510A1 (en) * | 2008-01-11 | 2009-12-24 | Kukowski Thomas R | Elastomeric Conductors and Shields |
FR2964793B1 (en) * | 2010-09-09 | 2014-04-11 | Ipdia | INTERPOSITION DEVICE |
FR2991502B1 (en) * | 2012-05-29 | 2014-07-11 | Commissariat Energie Atomique | METHOD FOR MANUFACTURING INTEGRATED CIRCUIT HAVING INSULATION TRENCHES WITH SEPARATE DEPTHS |
FR2992465B1 (en) | 2012-06-22 | 2015-03-20 | Soitec Silicon On Insulator | METHOD FOR THE COLLECTIVE PRODUCTION OF LEDS AND STRUCTURE FOR THE COLLECTIVE MANUFACTURE OF LEDS |
KR101535825B1 (en) * | 2012-09-25 | 2015-07-10 | 엘지디스플레이 주식회사 | Display device and method for detecting line defects |
FR3000838B1 (en) * | 2013-01-07 | 2015-01-02 | St Microelectronics Rousset | METHOD FOR MANUFACTURING NON-VOLATILE MEMORY |
US8941129B1 (en) * | 2013-07-19 | 2015-01-27 | Bridgelux, Inc. | Using an LED die to measure temperature inside silicone that encapsulates an LED array |
FR3009474B1 (en) * | 2013-08-02 | 2015-07-31 | Renault Sa | ELECTROLUMINESCENT DIODE DEVICE |
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- 2016-12-15 WO PCT/FR2016/053468 patent/WO2017115027A1/en active Application Filing
- 2016-12-15 US US16/066,142 patent/US10845405B2/en active Active
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FR3046247B1 (en) | 2018-06-15 |
FR3046247A1 (en) | 2017-06-30 |
US20190369157A1 (en) | 2019-12-05 |
WO2017115027A1 (en) | 2017-07-06 |
US10845405B2 (en) | 2020-11-24 |
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