EP3146601A1 - Vertical external cavity surface emitting laser devices allowing high coherence, high power and large tunability - Google Patents
Vertical external cavity surface emitting laser devices allowing high coherence, high power and large tunabilityInfo
- Publication number
- EP3146601A1 EP3146601A1 EP15728770.7A EP15728770A EP3146601A1 EP 3146601 A1 EP3146601 A1 EP 3146601A1 EP 15728770 A EP15728770 A EP 15728770A EP 3146601 A1 EP3146601 A1 EP 3146601A1
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- European Patent Office
- Prior art keywords
- laser
- optical
- mirror
- gain
- microcavity
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/14—External cavity lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/139—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/041—Optical pumping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1039—Details on the cavity length
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1042—Optical microcavities, e.g. cavity dimensions comparable to the wavelength
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1053—Comprising an active region having a varying composition or cross-section in a specific direction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18383—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] with periodic active regions at nodes or maxima of light intensity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/341—Structures having reduced dimensionality, e.g. quantum wires
- H01S5/3412—Structures having reduced dimensionality, e.g. quantum wires quantum box or quantum dash
Definitions
- the invention relates to Vertical External Cavity Surface Emitting Laser devices (VeCSEL) which allows achieving high coherence, power and tunability.
- VeCSEL Vertical External Cavity Surface Emitting Laser devices
- the field of the invention is, but not limited to, semiconductor laser sources for metrology and telecom applications.
- VeCSEL Vertical External Cavity Surface Emitting Laser devices
- They comprise basically a semiconductor element with a gain medium for generating the optical radiation and a first mirror.
- the gain medium may comprise for instance quantum wells or quantum dots. It may be electrically or optically pumped .
- the first mirror may comprise a succession of layers constituting a Bragg grating which reflects the optical waves around the laser frequency.
- a second external mirror is provided and arranged so as to form an external optical cavity with the first mirror.
- This kind of lasers has several advantages, such as a high intrinsic stability and a good tunability, which may be achieved by moving the external mirror for adjusting the length of the external cavity.
- High coherence and /or high frequency stability are usually achieved by introducing an etalon plate or an absorption cell into a long external cavity. In that case, the tunability is lost.
- a laser device for generating an optical wave at a laser frequency comprising:
- a semiconductor element comprising a gain region with quantum wells or quantum dots, said gain region being located between a first mirror and an exit region defining an optical microcavity
- a second mirror distinct from the semiconductor element, and arranged so as to form with the first mirror an external optical cavity including the gain region
- the optical microcavity with the gain region and the external optical cavity are arranged so that the spectral ratio between the Half Width Half Maximum (HWHM) spectral bandwidth of the round trip net modal gain and the free spectral range of the external cavity is in the range of 2 to 50, and in that the ratio between the light power inside the optical microcavity and the light power inside the external cavity is lower than or equal to 1
- HWHM Half Width Half Maximum
- the device of the invention may comprise a spectral ratio in the range of 11 to 50, which leads to an easier design, less complicated to implement.
- the device of the invention may comprise a spectral ratio in the range of 2 to 9 which is more robust for avoiding mode hops and long-term stability, and also for obtaining broad tenability.
- the Half Width Half Maximum (HWHM) spectral bandwidth of the modal gain corresponds to the round-trip net modal gain bandwidth (equal to modal gain minus modal intracavity optical losses).
- the round trip modal gain corresponds to the gain of the material (quantum wells or quantum dots for example) multiplied by the relative light intensity (pointing vector flux) compared to the incident medium (air here).
- the microcavity characteristics, and so the spectral filtering bandwidth and the relative light intensity, are given by the light field spatial confinement factor (wavelength dependent), which is calculated through the ratio between the pointing vector flux on the gain layers and the one in the incident medium (air here).
- the modal gain is thus the product of the material gain (quantum wells or quantum dots for example) with the light field spatial confinement factor.
- the round trip modal losses corresponds to the material losses, or/and output coupler losses multiplied by the relative light intensity (pointing vector flux) compared to the incident medium (air usually). Both modal gain and modal losses are wavelength dependent, which will define the net modal gain bandwidth in the following .
- the gain confinement factor also defines the ratio between light power/intensity on gain medium and outside.
- the free spectral range of the external cavity is the spectral range separating two consecutive resonance frequencies of the external cavity.
- the semiconductor element with its first mirror and the second mirror constitute a laser cavity with a gain medium formed by the gain region with the quantum wells.
- the means for pumping the gain region may comprise electrical pumping means.
- the means for pumping the gain region may comprise optical pumping means.
- the first mirror may comprise a Bragg Mirror with a succession of layers of higher and lower indices of refraction, so as to have a high reflectivity at the laser frequency. It may for instance comprise 10 to 40 pairs of high/low index layers made of semiconductor or dielectric materials. It could be a hybrid mirror with a gold layer or coating added.
- the second mirror may have a transmittance in the order of 0.1 % to 15 %.
- the gain region may comprise 3 to 24 quantum wells separated with barriers.
- the gain region may comprise quantum dots.
- the microcavity with the gain region may be several ⁇ /4 layer thick ( ⁇ being the laser wavelength), to allow absorption of the optical pump power in the barriers, or alternatively directly in the quantum wells (or quantum dots) to reduce heating.
- the quantum wells longitudinal distribution along the barrier layers may be optimized for homogeneous excitation of these quantum wells.
- the thickness (or the length) of the gain region may be limited to only a few laser wavelengths to avoid the appearance of longitudinal spatial mode competition.
- the invention aims at providing lasers which allow achieving high power, narrow spectral linewidth, low intensity noise and tunability.
- the spectral bandwidth of the modal gain depends on the gain curve of the gain med ium (the q uantum wells) and on the resonance (or anti- resonance) spectral characteristicsof the micro-cavity.
- the free spectral range of the external cavity depends on its optical length .
- desig n constraints may lead to a large variety of specific desig ns with d ifferent trade-offs and optimizations between the above mentioned specifications (for instance power, tunability%) . However, they ensure that the trade-offs are optimal .
- the device of the invention may comprise :
- the device of the invention may further comprise an external optical cavity with a length adjusted to be smal ler than or equal to 2 mm .
- the device of the invention may further comprise an external optical cavity with a length smaller than 0.5 mm .
- the free spectral range FSR 500 G Hz.
- the antiresonance strength can be further increased by desig ning an anti-resonant microcavity.
- the length of the microcavity is stil l adjusted to an odd number of ⁇ /4 layers (such as for the simple anti-resonant microcavity), but the exit reg ion further comprises a bragg mirror with about 1 to 15 pairs of layers of higher and lower ind ices of refraction (instead of a simple transition between med iums of d ifferent ind ices of refraction such as for the simple anti-resonant microcavity) .
- the device may further comprise a capping layer to protect the semiconductor structure (GaAs, InGaP, Dielectric), whose thickness is incl uded in the last top layer.
- a capping layer to protect the semiconductor structure (GaAs, InGaP, Dielectric), whose thickness is incl uded in the last top layer.
- a spectral filter may comprise an element distinct from the semicond uctor element.
- the second mirror of the device may be a concave mirror.
- the device of the invention may further comprise tuning means for moving the second mirror so as to change the length of the external cavity and/or coarse tuning means so as to change the gain chip temperature so as to change the gain peak wavelength .
- the tuning means may comprise a (metal lic) flexible part actuated by a piezo-electric actuator.
- an embodiment of the present invention may include a specifically designed flexible part in order to carry out the cavity length (and thus wavelength) tunability. Indeed, the use of such a part leads to a quasi- monolithic cavity construction, which is a great advantage for laser operation stability.
- the said flexible part is possibly metallic and partially thinned.
- An actuator is inserted in the flexible part in order to tune the optical cavity length.
- a ceramic piezoelectric actuator is used.
- the device of the invention may comprise only free space between the exit region of the semiconductor element and the second mirror.
- the device of the invention may be filled with a transparent material (at least at pump and laser wavelength) between the exit region of the semiconductor element and the second mirror.
- the material may be gaseous, liquid or solid.
- the cavity is also available for inserting other elements for specific functions which are not directly related to the generation of the high-quality laser beam (such as beam shaping elements, absorption cells for analysis devices).
- the device of the invention may comprise a semiconductor element based on one of the following substrates:
- GaSb gallium antimonide
- GaAs gallium arsenide
- MOCVD MetalOrganic Chemical Vapour Deposition method
- Molecular beam Epitaxy Molecular beam Epitaxy
- a substrate with a high thermal conductivity may be used, such as for instance a semiconductor or gold or Diamond or Sapphire or Silcon Carbide substrate.
- the device of the invention may further comprise optical pumping means with a pump laser arranged so that its beam falls on the exit region of the semiconductor element at or around (for instance within ⁇ 5 degrees) the Brewster angle.
- the pump laser may comprise at least one multimode continuous laser diode.
- the pump energy may be either absorbed in the quantum well (or quantum dot) barrier material or directly in the quantum well (or quantum dot) for thermal load reduction.
- a 808 nm pump diode may be use to be absorbed in the GaAs barriers for 1-1.3pm VECSEL emission.
- a 980nm pump diode may be use to be directly absorbed in the quantum wells.
- the pump laser may be arranged to that its beam covers an area of 25 prn 2 or more in the exit region.
- the pump laser may be arranged to that its beam covers an area of 100 prn 2 or more in the exit region.
- Several pump diodes may be arranged to pump the microcavity, in order to increase the launched pump power.
- a low-cost multimode laser diode may be used for the pump. It has the advantage of allowing covering a relatively large surface on the exit region with an optical power distribution which is more homogeneous than with a single mode laser. So, a broader area of the quantum wells may be used, which allows generating more optical power. The heat dissipation and the thermal lens effects are also limited, which allows improving the quality of the laser beam generated.
- the device of the invention may further comprise stabilization means for stabilizing the intensity of the pump laser beam.
- the stabilization means may comprise a photod iode for measuring the intensity noise of the pump laser beam and a control loop for driving the pump laser so as to cancel said intensity noise .
- the laser stabil ization techniq ues (for instance for limiting the intensity noise) involve a measurement of the generated laser beam and a regu lation loop acting on internal components of the laser such as the pump . So the whole laser is enclosed in a closed loop .
- These kinds of config urations have the d rawback of leading to complex devices with a limited versatil ity (for instance limited tunabil ity %) and do not permit to take benefit on feed back based measurements (for example Doppler velocimetry systems) .
- the control of the intensity noise can be done with a control loop just on the pump laser.
- the rest of the laser set-up is intrinsically stable enoug h to achieve good performance in these cond itions.
- the laser assembly is an open-loop, free running system . So, in add ition to a very hig h beam q uality, it provides also a good versatility and can be easily adapted to a large variety of configurations.
- tun ing ranges are easily achieved because there is no g lobal control loop to take into accou nt.
- the semicond uctor element is arranged so as to allow generating a linearly polarized beam . That linear polarization is obtained by using the slight gain d ichroism between the semiconductor crystal axis, and more specifical ly between [ 110] and [ 1- 10] crystal axis.
- the device of the invention further comprises electrical pumping means for injecting a pump current in the semicond uctor element.
- a method for desig ning a tunable and robust laser device of anyone of the mode of real ization of the invention comprising at least one of the steps of: - adjusting in the range of 2 to 50 the spectral ratio between the Half Width Half Maximum ( HWH M) spectral bandwidth of the modal gain and the free spectral range of the optical microcavity and the external cavity, and/or
- the modal gain bandwidth is based on the confinement factor properties on gain layers and material gain properties.
- the confinement factor can be mod ified by varying the optical layers properties, as the gain reg ion thickness and/or the top layers properties located before incident medium for example, the incident med ium being air for example, and the top layers being a Bragg g rating with a predetermined pair number of layers for example. So by varying the microcavity finesse and center wavelength for resonance or anti-resonance conditions, and alternatively the gain layer position relatively to light field antinodes, one can tune both modal gain bandwidth and the ratio of light power inside/outside the gain reg ion .
- the material gain bandwidth can be mod ified by chang ing for example (i) the atomic composition of the material used in the semicond uctor element (semiconductor, doped crystal or fiber...) and/or (ii) the excitation density (for semicond uctor materials) and/or (iii) the morphology (thickness, geometry like dots, dash, well ... with semiconductor technolog ies) .
- the modal losses filter bandwidth can be adjusted to vary the net modal gain bandwidth (thanks to a metall ic absorbing nanometer thick layer on the gain structure and located on or closed to a light field node at center wavelength, an external etalon element, an external fibre based DBR mirror or output coupler, external volume Bragg grating mirror%) .
- the modal gain bandwidth with the microcavity properties can vary from lOOG Hz to lOTHz .
- the material gain bandwidth with semicond uctor can vary from ITHz to 30THz.
- the modal losses bandwidth can be varied from 30GHz to lOTHz with the different technologies.
- the step of adjusting the ratio between the light power inside the optical microcavity and the light power inside the external cavity may comprise the adjustment of the confinment factor.
- the step of meeting the anti- resonance condition may be obtained by adjusting the total optical length of the microcavity to be an odd number of ⁇ /4 layers and/or by placing a Bragg mirror onto the exit region to further enhance the light field intensity reduction (antiresonance of the microcavity).
- the intensity ratio can be varied also by choosing a design wavelength in-between a resonant and an antiresonant wavelength condition.
- Fig. 1 shows a schematic view of the laser assembly
- FIG. 2 shows a schematic view of the mechanical concept of the optical cavity control
- FIG. 3 shows a schematic view of the semiconductor element according to a first mode of realization, in the form of a graph with the elements represented in function of their band gap energy
- Fig. 4 shows the reflectivity or the gain spectrum in percents, in function of the wavelength, obtained with the semiconductor element of Fig .
- Fig. 5 shows a detailed view of the gain spectrum of Fig. 4 around the laser frequency
- - Fig. 6 shows the modes of the external cavity and the gain spectrum
- - Fig. 7 shows the reflectivity (in percent) as a function the incident angle (in degrees) at a pump wavelength of 808nm of the resonant structure with typical gain/absorption in the active region, for TM orTE polarized pump beams,
- Fig. 8 shows an example of Relative Intensity Noise (dB/Hz) at quantum limit (pump RIN ⁇ -160dB) as a function of radio frequency (Hz) of a 10 mm long resonant VECSEL emitting 100 mW at 1 pm,
- Hz 2 /Hz Frequency Noise Spectral density
- FIG. 10 shows a schematic view of the semiconductor element according to a second mode of realization in an enhanced anti-resonant microcavity configuration, in the form of a graph with the elements represented in function of their band gap energy,
- Fig. 11 shows the reflectivity or the gain spectrum in percents, in function of the wavelength, obtained with the semiconductor element of Fig. 10,
- Fig. 12 shows a detailed view of the gain spectrum of Fig. 11 around the laser frequency
- Fig. 13 shows an example of Relative Intensity Noise (dB/Hz) at quantum limit (pump RIN ⁇ -152dB) as a function of radio frequency (Hz) of a 0.3 mm long anti-resonant VECSEL emitting 5 mW at 2.3 pm,
- Hz 2 /Hz Frequency Noise Spectral density
- Hz radio frequency
- - Fig. 15 shows a simple antiresonant design of the device according to a mode of realization of the invention and without the use of top Bragg mirror,
- Fig 16 shows the ratio between the light power inside the gain structure and through the external cavity as a function of wavelength for the antiresonant, for the design illustrated in Fig. 15,
- - Fig. 18 shows an enhanced antiresonant design of the device according to another mode of realization of the invention and using a top Bragg mirror over the microcavity.
- the laser device comprises a semiconductor element 10.
- This semiconductor element 10 is mounted on a heat sink 15 with Peltier elements for stabilizing and controlling the temperature.
- the semiconductor element 10 comprises a succession of layers grown by epitaxy.
- base substrate 11 either native or host substrate
- the laser device further comprises a second mirror 16 of a concave shape which forms with the first mirror 12 an external optical cavity. That second mirror 16 has a few percent of transmittance so as to allow the laser beam 21 to exit the laser.
- the second mirror 16 is mounted on a high stability mechanical mount 17.
- the mount 17 is equipped with a piezoelectric actuator 22 which allows moving the second mirror 16 relative to the semiconductor element 10 so as to vary the length of the external cavity.
- the mount 17 further comprises a flexible part 23 that is elongated by the piezo-electric actuator 22.
- the laser device further comprises a continuous, linearly polarized multimode laser diode 18 with beam shaping optics 19 for generating an optical pump beam 20.
- the assembly is arranged so that the pump beam 20 is incident on the exit region 14 of the semiconductor element at the Brewster angle, so as to have a maximum of coupling into the gain region 13.
- the first hig h-reflectivity Bragg mirror 12 is of course reflective for the laser wavelength . It may be also reflective, or partial ly or total ly transparent for the pump wavelength .
- the elements comprised in the exit reg ion 14 as described below are partially or totally transparent for the pump wavelength .
- the device of the invention further comprises stabil ization means for stabil izing the intensity of the pump beam 20.
- stabilization means comprise a wide-band low-noise photodetection system (comprising a photodiode located on the back side of the laser d iode 18 and a low noise amplifier) for measuring the intensity noise of the pump beam 20, a low noise high current wide-modulation-band d river for d riving the pump laser d iode 18, and a wide-band control loop so as to cancel the intensity noise.
- the noise red uction may be then l imited on ly by the partition noise (that is the noise d ue to the relative variations of ampl itude of the modes), and can lead - for example - to noise red uction down to - 160 d B/Hz at low freq uencies ( ⁇ 100kHz) for 1 mA ( ⁇ ⁇ 1%) detected by the photod iode.
- the overal l system benefits then of low 1/f noise in multimode pumps and low 1/f noise in the low freq uency transimpedance circuit cond itioning the photodiode signal , combined to a strong integ rator gain stage in the servo-loop .
- the external optical cavity is cal led "external" in the sense that it comprises a part which is d istinct from the semicond uctor element 10. In does not need any extra component inside for the proper operation of the laser. Its external part is filled with air.
- the device al lows easy adjustment of the laser freq uency by moving the second mirror 16 with the piezo actuator 23 so as to vary the length of the external cavity.
- the laser freq uency may also be varied by varying the temperature of the semiconductor element 10 with the Peltier elements of the heat sink 15.
- the present invention aims at provid ing d ifferent laser desig n that leads to single freq uency, hig h power and fast tunable over a broad frequency range, with tuning repetition rate up to few M Hz.
- Such lasers are obtained thanks to some parameters that have to be carefully adapted in order to reach those performances :
- a short external cavity whose length is preferably comprised between 0.2 mm and 2 mm, and/or - a high finesse, typically higher than 100, and preferably higher than 600, in order to reduce optical losses onto the first and the second mirror, and reduce the laser cavity cutoff RF frequency ( FSR x losses / 2 ⁇ ) for the intensity fluctuations, at a value below 1GHz of great interest for telecom, opto-hyper, or fundamental applications and/or
- HWHM Half Width Half Maximum
- a possible design for single frequency operation is to use a long cavity that is much more longer than 1mm instead of a short cavity for long photon life time (lower laser cutoff frequency of intensity fluctuations, lower frequency noise), allowing reduction of the finesse, to the detriment of spectral tuning repetition rate and achievable range.
- the semiconductor element is based on a GaAs substrate.
- It comprises a high-reflectivity Bragg mirror 12 with 31.5 pairs 30 of
- AIAs/GaAs layers of ⁇ /4 thickness each ( ⁇ 1000 nm), or in other words 32 layers of AIAs alternating with 31 layers of GaAs.
- the quantum wells 31 are distributed so as to be located along the maximum of intensity or the anti- nodes of the stationary wave which establishes into the active region, in such a way that the carrier density is the same in all the quantum wells 31. So their repartition is as follows, starting from the entrance side of the pump beam 20:
- the spectral filter forms with the first mirror 12 a microcavity.
- Fig. 4 shows a calculated reflectivity or gain spectrum 40 of the GaAs based structure with broadband InGaAs/GaAsP quantum wells emitting at 1 pm. It is calculated for a pump intensity of 2 kW/cm2.
- the gain spectrum 40 results from the intrinsic gain curve of the quantum wells, modified by the resonance characteristics of the microcavity formed by the spectral filter and the first mirror 12.
- Fig. 5 shows an enlarged view 41 of the gain curve around the operating wavelength ⁇ .
- the spectral filter has the effect of spectrally limiting the gain around the operating wavelength ⁇ .
- the net bandwidth of the gain filter is smaller than 300GHz (HWHM).
- HWHM 300GHz
- the spectral ratio between the Half Width Half Maximum (HWHM) spectral bandwidth of the modal gain and the free spectral range of the external cavity is equal to 30.
- Fig. 6 illustrates the spectral gain curve 40 and the modes 52 of the external cavity.
- the FSR is the frequency interval between two consecutive cavity modes 52 located around the operating frequency.
- the bandwidth 51 of the gain corresponds to the half width at half maximum (HWHM, -3 dB) of the spectral gain curve.
- Fig. 7 shows the reflectivity (in percent) as a function of the incident angle (in degrees) at a pump wavelength of 808nm of the resonant structure with typical gain/absorption in the active region, for TM orTE polarized pump beam 20. It illustrates how to obtain a maximum of coupling of the pump beam 20 into the gain region 13 by arranging the angle of incidence of the pump beam at the Brewster angle.
- Fig. 8 illustrates an example of Relative Intensity Noise (dB/Hz) at quantum limit (pump RIN ⁇ -160dB) plotted in function of the radio frequency RF (Hz), obtained with a device of the invention with a 10 mm long resonant cavity emitting 100 mW at 1 pm. It can be seen that the shot noise for 1mA of photocurrent is reached at any RF frequency.
- Fig. 9 illustrates an example of Frequency Noise Spectral density (Hz 2 /Hz) at quantum limit plotted in function of the radio frequency RF (Hz), obtained with a device of the invention with a 10 mm long resonant cavity emitting 100 mW at 1 ⁇ .
- the fundamental laser linewidth (FWHM) is thus lHz here.
- This kind of laser is very useful for instance for spectroscopy applications (at lpm range for seeding, 0.85 pm for atomic clock).
- the exit region 14 of the semiconductor element does not comprise a spectral filter.
- the exit region 14 of the semiconductor element comprises instead an antireflection coating.
- the length of the microcavity formed by the first mirror 12 and the exit region 14 is adjusted so as to obtain an anti- resonance condition. That condition is reached by adjusting the length of the microcavity to an odd number of ⁇ /4 layers.
- the exit region 14 of the semiconductor element comprises a simple transition between mediums of different indices of refraction (caping layer 33 and air) to reflect part of the optical wave.
- an enhanced anti-resonant microcavity is built.
- the length of the microcavity is still adjusted to an odd number of ⁇ /4 layers such as for the simple anti-resonant microcavity, but the exit region 14 further comprises a bragg mirror with about 1 to 15 pairs of layers of higher and lower indices of refraction (instead of a simple transition between mediums of different indices of refraction such as for the simple anti-resonant microcavity).
- a bragg mirror with about 1 to 15 pairs of layers of higher and lower indices of refraction (instead of a simple transition between mediums of different indices of refraction such as for the simple anti-resonant microcavity).
- Fig. 11 shows a calculated reflectivity or gain spectrum 40 (in percent) in function of the wavelength (nm) of an enhanced anti-resonant structure such as shown on Fig. 10.
- the gain spectru m 40 results from the intrinsic gain curve of the q uantum wells, mod ified by the enhanced anti-resonance characteristics of the microcavity formed by the partial Bragg mirror of the exit reg ion 14 and the first mirror 12.
- Fig . 12 shows an enlarged view 41 of the gain curve around the operating wavelength ⁇ .
- the result of both first, second and third variant is to obtain a broad spectral gain curve, which corresponds to the spectral gain curve of the q uantum wel ls in the case of the anti-reflective coating, a broader curve when using the anti-resonance condition, and a stil l broader curve when using the enhanced anti-resonance cond ition ( Fig . 11 and Fig . 12) .
- the finesse can be for instance increased by a factor of 3 for an anti-resonant design, the thermal lens red uced by 3, and the freq uency noise spectral density red uced by 10 compared to a design with an antireflection coating .
- the length of the external cavity is set around 0.3 mm, which corresponds to a FSR of 500 G Hz.
- the spectral ratio between the Half Width Half Maximum ( HWH M) spectral bandwidth of the modal gain and the free spectral range of the external cavity is between 10 and 20.
- This configuration allows broad continuous laser frequency tunabil ity (without mode hops), larger than 500 G Hz at constant power, thanks to Piezo-based cavity length tuning .
- a freq uency tunabil ity of more than 500 G Hz may also be achieved by combining piezo d isplacement of the second mirror 16 and tuning of the temperature of the semiconductor element 10.
- the external cavity has a hig h finesse, superior to 600 (or 2000 for an anti-resonant desig n) .
- This config uration allows achieving : - a Side Mode Suppression Ratio at Quantum limit >45 d B.
- Fig . 13 illustrates an example of Relative Intensity Noise (d B/Hz) at quantum limit (pump RIN ⁇ - 152dB) plotted in function of the radio frequency RF (Hz), obtained with a device of the invention with a 0.3 mm long anti- resonant cavity emitting 5 mW at 2.3 prn . It can be seen that the shot noise for 1mA of photocurrent is reached at 500 M Hz here.
- Fig . 9 illustrates an example of Frequency Noise Spectral density (Hz 2 /Hz) at quantum limit plotted in function of the radio frequency RF (Hz), obtained with a device of the invention with a 0.3 mm long anti-resonant cavity emitting 5 mW at 2.3 prn.
- the fundamental laser linewidth (FWH M) is thus 147 Hz here.
- a simple antiresonant design as illustrated in Fig . 15, with an odd number of ⁇ /4 layers (equal to 15 in Fig . 16) located between the substrate and the caping layer, and without a Bragg mirror onto the top surface of the microcavity. It provides a broad tunable laser, with a large bandwidth, for which the ratio between the light power inside the optical microcavity and the light power inside the external cavity is equal to 0.3.
- the length of the external optical cavity may be typically included between 0.4 mm and 1 mm, which leads to a Free Spectral Range in the range of 150 GHz to 375 GHz and a net bandwidth comprised between 1 THz and 6 THz. Fig .
- Fig . 17 illustrates the electrical filed density across a simple antiresonant laser device
- the optical bandwidth of such design is broader than the modal gain bandwidth in order to keep antiresonance condition across the full gain bandwidth and to allow broad temperature- based wavelength tuning .
- the ratio between the light power inside the optical microcavity and the light power inside the external cavity is equal to 0.1.
- the length of the external optical cavity may be typically included between 0.2 mm and 1 mm, which leads to a Free Spectral Range in the range of 150 GHz to 750 GHz and a net bandwidth comprised between 1 THz and 6 THz.
- the external cavity may be filled with any relevant medium such as vacuum, gel, liquid, or solid material,
- the second mirror 16 may be of any usable shape. It may for instance be flat.
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Abstract
Description
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EP14305752.9A EP2947729A1 (en) | 2014-05-21 | 2014-05-21 | Vertical external cavity surface emitting laser devices allowing high coherence, high power and large tunability |
PCT/EP2015/061341 WO2015177323A1 (en) | 2014-05-21 | 2015-05-21 | Vertical external cavity surface emitting laser devices allowing high coherence, high power and large tunability |
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EP15728770.7A Active EP3146601B1 (en) | 2014-05-21 | 2015-05-21 | Vertical external cavity surface emitting laser devices allowing high coherence, high power and large tunability |
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US (1) | US9774165B2 (en) |
EP (2) | EP2947729A1 (en) |
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US10714893B2 (en) * | 2017-07-17 | 2020-07-14 | Thorlabs, Inc. | Mid-infrared vertical cavity laser |
WO2019217444A1 (en) * | 2018-05-08 | 2019-11-14 | The Regents Of The University Of California | Air cavity dominant vcsels with a wide wavelength sweep |
US10680408B2 (en) | 2018-08-22 | 2020-06-09 | Hewlett Packard Enterprise Development Lp | Quantum dot comb lasers with external cavity |
US20210036489A1 (en) * | 2019-08-02 | 2021-02-04 | Innolight Technology (Suzhou) Ltd. | Narrow linewidth external cavity laser and optical module |
CN114389143B (en) * | 2020-10-20 | 2023-12-29 | 中国科学院半导体研究所 | Coherence-tunable semiconductor laser and application |
CN113252085B (en) * | 2021-06-30 | 2021-09-17 | 中国人民解放军国防科技大学 | Opto-mechanical microcavity structure containing nonlinear mechanical oscillator, measurement system and measurement method |
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US6741629B1 (en) * | 2000-09-22 | 2004-05-25 | Blueleaf, Inc. | Optical transmitter having optically pumped vertical external cavity surface emitting laser |
US6658034B2 (en) * | 2000-12-13 | 2003-12-02 | Picarro, Inc. | Surface-emitting semiconductor laser |
US6711203B1 (en) * | 2000-09-22 | 2004-03-23 | Blueleaf, Inc. | Optical transmitter comprising a stepwise tunable laser |
US20030112843A1 (en) * | 2001-01-19 | 2003-06-19 | Siros Technology, Inc. | Method and apparatus for mode-locked vertical cavity laser with equalized mode response |
US7630417B1 (en) * | 2004-06-24 | 2009-12-08 | California Institute Of Technology | Crystal whispering gallery mode optical resonators |
KR101100431B1 (en) * | 2005-11-22 | 2011-12-30 | 삼성전자주식회사 | High efficient second harmonic generation vertical external cavity surface emitting laser |
US8331008B1 (en) * | 2008-10-14 | 2012-12-11 | Oewaves, Inc. | Photonic microwave and RF receivers based on electro-optic whispering-gallery-mode resonators |
CN104521078B (en) * | 2012-07-27 | 2018-03-20 | 统雷有限公司 | Widely tunable amplification short cavity laser |
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US20170117684A1 (en) | 2017-04-27 |
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WO2015177323A1 (en) | 2015-11-26 |
EP2947729A1 (en) | 2015-11-25 |
MA39889A (en) | 2021-04-28 |
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