EP2735002B1 - Method for producing thin electrically conductive layers of silver, a silver layer, a silver complex, the solution of said silver complex, and the use of the silver complex in a solution - Google Patents

Method for producing thin electrically conductive layers of silver, a silver layer, a silver complex, the solution of said silver complex, and the use of the silver complex in a solution Download PDF

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EP2735002B1
EP2735002B1 EP12733165.0A EP12733165A EP2735002B1 EP 2735002 B1 EP2735002 B1 EP 2735002B1 EP 12733165 A EP12733165 A EP 12733165A EP 2735002 B1 EP2735002 B1 EP 2735002B1
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Prior art keywords
silver
solution
method step
pyrrolidone
complex
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German (de)
French (fr)
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EP2735002A1 (en
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Julia FRITSCH
Benjamin SCHUMM
Julia Grothe
Stefan Kaskel
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Technische Universitaet Dresden
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Technische Universitaet Dresden
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/14Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
    • C23C18/143Radiation by light, e.g. photolysis or pyrolysis
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys

Definitions

  • the invention relates to a method for producing thin electrically conductive layers of silver on a surface of substrates, a silver complex and a solution of the silver complex and the use of a silver complex solution. It can preferably be used for the production of electrically conductive structural elements, such as electrodes or conductor tracks, which may also be optically transparent, as is the case, for example, with thin-film solar cells or light-emitting diodes.
  • Metal layers which are preferably made of silver, can hitherto be produced in the required thickness only by means of a known vacuum coating technique, in the required homogeneity while at the same time maintaining sufficient optical transparency, which likewise increases the production costs.
  • the JP 2000 144440 A discloses an electrolytic solution for the electroless deposition of silver.
  • the WO 2006/076611 A2 discloses a process for the preparation of metal nanoparticles.
  • the US 2009/0041404 A1 and the US 2005/0221116 A1 each reveal a deposition of a 100 nm thick silver layer on a substrate.
  • this object is achieved by a method having the features of claim 1.
  • the claim 7 relates to a silver complex and the claim 8 is a solution of the silver complex.
  • Advantageous embodiments and further developments of the invention can be achieved with features described in the subordinate claims.
  • the procedure is that, in a first method step, silver nitrate (AgNO 3 ) and 2-pyrrolidone in a solvent, preferably water or an ethanol / water mixture be solved. It is also possible, for example, to use water / acetone or water / THF as solvent.
  • the solution obtained can be subjected directly to a second process step.
  • the solution is kept at room temperature with exclusion of light for several days is, and there is an evaporation of liquid.
  • a second process step the solution is applied to a surface of the substrate to be coated and then subsequently in a third process layer a chemical reduction, which leads to the separation of silver from the other contained chemical components, by irradiation with electromagnetic radiation from the wavelength spectrum of the UV light over a period of at least 15 min, preferably 20 min performed.
  • a heat treatment is carried out at a temperature of at most 500 ° C., preferably at 250 ° C., more preferably 220 ° C. over a period of at least 30 min, preferably 60 min, and one at least almost exclusively of silver formed layer on the surface of the substrate. Remains of other chemical elements and compounds with a content of ⁇ 2% can remain in the layer.
  • the maximum temperature depends on the temperature permissible for a substrate to be coated and, if appropriate, the melting temperature of silver.
  • the substrate material should not be adversely affected by the temperature used and at least neither deform nor chemically react. Diffusion processes with components contained in the substrate material should also be avoided.
  • silver nitrate and 2-pyrrolidone [Ag (pyl) 2] form NO3 - (C8H14Ag1N3O5) as a complex that can crystallize.
  • the monoclinic space group C2 / c (No. 15) with four formula units forms a cell unit.
  • the asymmetric unit contains the 2-pyrrolidone molecules, half a silver atom, half a nitrate anion, which occupy certain positions of a double axis, one of which passes through the N1-O4 bond, as shown in FIG FIG. 1 evident.
  • the silver atom has a disordered irregular AgO 6 geometry consisting of two oxygen atoms of a pyrrolidone molecule and four oxygen atoms of the nitrate anion.
  • the distances between the silver atom and the oxygen atoms are in the range 2.358 to 2.683 angstroms.
  • the nitrate anions have a linker function and connect the structure in 1-D polymer chains in one direction.
  • the silver atoms are arranged with linear polymer chains through ⁇ 2 -O oxygen-bridge atoms with significantly larger distances between Ag1 and O4 of 2.683 angstroms compared to the distance between Ag1 and O2 of 2.536 angstroms.
  • the 1-D polymer chains in the 2D network are linked by intermolecular NH ... O bonds.
  • a pyrollidone derivative as crystallization inhibitor preferably tert-butylpyrrolidone, may be used at least 2% by mass to a maximum of 20% by mass of the solution are added. This addition may take place before, during or after the first process step.
  • a crystallization inhibitor By using a crystallization inhibitor, a homogeneous and uniform silver layer can be obtained.
  • a ratio of water to ethanol of 1 to 4 is selected smaller amounts of water.
  • any influence of electromagnetic radiation should be avoided and the solution enclosed in a hermetically sealed optically nontransparent container.
  • the surface of the substrate should be cleaned.
  • a suitable liquid which can be selected taking into account the substrate material, are used.
  • this may be "piranha solution”, So be an aqueous solution of Peroxomonosschwefelklare. It can be cleaned with ultrasound support.
  • the order of the solution after the first process step on the surface of the substrate can be done by a dip, spin coating or a printing process. It should only be ensured that a constant layer thickness can be achieved in order to achieve homogeneous electrical and / or optical properties of the layer formed over the coated surface.
  • nanoimprint lithography or microcontact printing can be used as the printing method. It is thus also possible to produce geometrically differently structured layers on substrate surfaces. This is also possible with screen printing technology.
  • a substrate can also be immersed in the prepared solution and pulled out again (dipcoating) before the third and fourth process steps are carried out.
  • the formation of the layers can also be done by spin coating.
  • the layers formed by the invention should not exceed a maximum layer thickness of 200 nm. Layer thicknesses in the range 50 nm to 100 nm are to be preferred in order to be able to comply with a sufficient electrical conductivity.
  • the tert-butylpyrrolidone can be prepared from 20 ml of tetrahydrofuran (THF), triethylamine and tert-butylamine, which are purged with argon and mixed together at a temperature of 0 ° C. 4-Chlorobutyryl chloride is added to the mixture and vigorous stirring is carried out at this temperature. Subsequently, triethylamine hydrochloride is filtered out and a double washing with THF is carried out. The resulting filtrate is concentrated under reduced pressure and the resulting starting material is mixed with acetate and then washed once with HCL and twice with brine. The resulting organic phase can be dried on a substrate with MgSO4 and the solvent removed at reduced pressure.
  • THF tetrahydrofuran
  • triethylamine and tert-butylamine which are purged with argon and mixed together at a temperature of 0 ° C. 4-Chlorobutyryl chloride is added
  • the tert-buty-4-chlorobutanamide then obtained is dissolved in THF and added to a solution of potassium tert-butylate with THF. After prolonged stirring in an ice bath, this mixture from the container can be placed in another container and mixed therein with ethyl acetate and then washed twice with brine. The resulting organic phase can be dried again with MgSO 4 and the solvent removed under reduced pressure. After distillation at reduced pressure and a temperature of 75 ° C, the tert-butylpyrrolidone can be obtained as a colorless liquid.
  • sufficiently conductive thin silver layers can be produced which have electrical resistivities ⁇ 10 ⁇ / ⁇ at a thickness of 100 nm, which is a sheet resistance, which is expressed by the " ⁇ ".
  • FIG. 1 shows the linkage function of nitrate anions connecting the 1-D polymer chains of [Ag (pyl) 2 ] NO 3 .
  • the formed reaction product [Ag (pyl) 2 ] NO 3 crystallizes out during storage at normal room temperature and the water as solvent evaporates slowly.
  • the water preferably after several days storage of the solution previously prepared in a first process step can be added with ethanol, so that a ratio of water to ethanol of 1 to 4 and maintained a 0.8 M solution.
  • the substrate was preliminarily cleaned with a solution of 30% H 2 O 2 and three parts of concentrated H 2 SO 4 over a period of 30 minutes, then thoroughly washed with deionized water and then dried.
  • the substrate thus prepared On the surface of the substrate thus prepared was applied the previously prepared solution with the [Ag (pyl) 2 ] NO 3 by immersion and extraction, and then over a period of 20 minutes with electromagnetic radiation in a UV box with an F-emitter irradiated.
  • the irradiation took place in the wavelength range between 280 nm and 400 nm, so that a partial region of the radiation used was above 315 nm and the remainder in the UV range.
  • an approximately 100 nm thick layer could be obtained on the substrate, which had an electrical resistance of ⁇ 10 ⁇ / ⁇ .
  • the solution obtained by the first process step may be added to suppress the crystallization of the [Ag (pyl) 2 ] NO 3 complex 10% by mass of the pyrrolidone derivative tert-butylpyrrolidone.
  • a disorder in the polymer chain can be achieved, which prevents the crystallization, which facilitates the application of the solution to the substrate surface.

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Description

Die Erfindung betrifft ein Verfahren zur Herstellung dünner elektrisch leitfähiger Schichten aus Silber auf einer Oberfläche von Substraten, einen Silberkomplex und eine Lösung des Silberkomplexes sowie die Verwendung einer Silberkomplex-Lösung. Sie kann bevorzugt für die Herstellung elektrisch leitender Strukturelemente, wie Elektroden oder Leiterbahnen, die auch optisch transparent sein können, eingesetzt werden, wie dies beispielsweise bei Dünnschichtsolarzellen oder Leuchtdioden der Fall ist.The invention relates to a method for producing thin electrically conductive layers of silver on a surface of substrates, a silver complex and a solution of the silver complex and the use of a silver complex solution. It can preferably be used for the production of electrically conductive structural elements, such as electrodes or conductor tracks, which may also be optically transparent, as is the case, for example, with thin-film solar cells or light-emitting diodes.

Für diese Anwendungen ist der Einsatz unterschiedlicher Stoffe, wie z.B. elektrisch leitfähiger Oxide (TCO's), Modifikationen von Kohlenstoff (CNT's), elektrisch leitfähiger Polymere und von Metallen bekannt. Bis auf die Metalle weisen die anderen Stoffe jedoch einen erhöhten elektrischen Widerstand auf, wenn die ausgebildeten Schichten auch optisch transparent sein sollen. Zusätzlich ist ihr Einsatz mit erhöhten Kosten verbunden.For these applications, the use of different materials, such as electrically conductive oxides (TCOs), modifications of carbon (CNTs), electrically conductive polymers and metals is known. Except for the metals, however, the other substances have an increased electrical resistance, if the formed layers should also be optically transparent. In addition, their use is associated with increased costs.

Metallschichten, die bevorzugt aus Silber hergestellt werden, können bisher in der erforderlichen Dicke lediglich mit bekannter Vakuumbeschichtungstechnik, in der erforderlichen Homogenität bei gleichzeitiger Einhaltung ausreichender optischer Transparenz, hergestellt werden, was ebenso die Herstellungskosten anhebt.Metal layers, which are preferably made of silver, can hitherto be produced in the required thickness only by means of a known vacuum coating technique, in the required homogeneity while at the same time maintaining sufficient optical transparency, which likewise increases the production costs.

Außerdem sind verschiedene Möglichkeiten für die Reduktion von Silberverbindungen zu reinem Silber bekannt. Dabei ist aber ein hoher Aufwand und/oder ein erhöhter Energieeinsatz erforderlich.In addition, various possibilities for the reduction of silver compounds to pure silver are known. But a high effort and / or an increased use of energy is required.

Die JP 2000 144440 A offenbart eine Elektrolytlösung zur stromlosen Abscheidung von Silber. Die WO 2006/076611 A2 offenbart ein Verfahren zur Herstellung von Metallnanopartikeln. Die US 2009/0041404 A1 und die US 2005/0221116 A1 offenbaren jeweils eine Abscheidung einer 100 nm dicken Silberschicht auf einem Substrat.The JP 2000 144440 A discloses an electrolytic solution for the electroless deposition of silver. The WO 2006/076611 A2 discloses a process for the preparation of metal nanoparticles. The US 2009/0041404 A1 and the US 2005/0221116 A1 each reveal a deposition of a 100 nm thick silver layer on a substrate.

Es ist daher Aufgabe der Erfindung, Möglichkeiten für eine Herstellung elektrisch leitfähiger dünner Schichten auf Substratoberflächen anzugeben, die kostengünstig und flexibel herstellbar sind und eine einfache Möglichkeit für eine Reduktion einer Silberverbindung zu reinem Silber anzugeben.It is therefore an object of the invention to provide options for producing electrically conductive thin layers on substrate surfaces, which are inexpensive and flexible to produce and provide a simple way for a reduction of a silver compound to pure silver.

Erfindungsgemäß wird diese Aufgabe mit einem Verfahren, das die Merkmale des Anspruchs 1 aufweist, gelöst. Der Anspruch 7 betrifft einen Silberkomplex und der Anspruch 8 eine Lösung des Silberkomplexes. Vorteilhafte Ausgestaltungen und Weiterbildungen der Erfindung können mit in untergeordneten Ansprüchen bezeichneten Merkmalen erreicht werden.According to the invention, this object is achieved by a method having the features of claim 1. The claim 7 relates to a silver complex and the claim 8 is a solution of the silver complex. Advantageous embodiments and further developments of the invention can be achieved with features described in the subordinate claims.

Bei dem erfindungsgemäßen Verfahren zur Herstellung dünner elektrisch leitfähiger Schichten aus Silber auf einer Oberfläche von Substraten wird so vorgegangen dass, in einem ersten Verfahrensschritt Silbernitrat (AgNO3) und 2-Pyrrolidon in einem Lösungsmittel, bevorzugt Wasser oder einem Ethanol-Wassergemisch gelöst werden. Es können beispielsweise auch Wasser/Aceton oder Wasser/THF als Lösungsmittel eingesetzt werden.In the method according to the invention for producing thin electrically conductive layers of silver on a surface of substrates, the procedure is that, in a first method step, silver nitrate (AgNO 3 ) and 2-pyrrolidone in a solvent, preferably water or an ethanol / water mixture be solved. It is also possible, for example, to use water / acetone or water / THF as solvent.

Im Anschluss an das Lösen kann die erhaltene Lösung direkt einem zweiten Verfahrensschritt unterzogen werden. Es ist aber günstig, dass die Lösung bei Raumtemperatur unter Ausschluss von Licht über mehrere Tage gehalten wird, und dabei ein Verdampfen von Flüssigkeit erfolgt.Following dissolution, the solution obtained can be subjected directly to a second process step. However, it is favorable that the solution is kept at room temperature with exclusion of light for several days is, and there is an evaporation of liquid.

An Stelle von 2-Pyrrolidon könnte man auch 3-Pyrrolidon einsetzen. Aufgrund der abweichenden Sauerstoffatomposition könnte sich eine andere Kristallstruktur und ein etwas anderes Reduktionsverhalten zu Silber auftreten.Instead of 2-pyrrolidone, one could also use 3-pyrrolidone. Due to the deviating oxygen composition, a different crystal structure and a somewhat different reduction behavior to silver could occur.

Im Anschluss an diesen Verfahrensschritt wird in einem zweiten Verfahrensschritt die Lösung auf eine Oberfläche des zu beschichtenden Substrats aufgebracht und dann nachfolgend in einem dritten Verfahrensschicht eine chemische Reduktion, die zur Trennung von Silber von den anderen enthaltenen chemischen Komponenten führt, durch eine Bestrahlung mit elektromagnetischer Strahlung aus dem Wellenlängenspektrum des UV-Lichts über einen Zeitraum von mindestens 15 min, bevorzugt 20 min durchgeführt. Im Anschluss daran wird bei einem vierten Verfahrensschritt eine Wärmebehandlung bei einer Temperatur von maximal 500 °C, bevorzugt bei 250 °C, besonders bevorzugt 220 °C über einen Zeitraum von mindestens 30 min, bevorzugt 60 min durchgeführt und dabei eine zumindest nahezu ausschließlich aus Silber gebildete Schicht auf der Oberfläche des Substrats erhalten. In der Schicht können dabei Reste anderer chemischer Elemente und Verbindungen mit einem Anteil < 2 % verbleiben.Following this process step, in a second process step, the solution is applied to a surface of the substrate to be coated and then subsequently in a third process layer a chemical reduction, which leads to the separation of silver from the other contained chemical components, by irradiation with electromagnetic radiation from the wavelength spectrum of the UV light over a period of at least 15 min, preferably 20 min performed. Thereafter, in a fourth process step, a heat treatment is carried out at a temperature of at most 500 ° C., preferably at 250 ° C., more preferably 220 ° C. over a period of at least 30 min, preferably 60 min, and one at least almost exclusively of silver formed layer on the surface of the substrate. Remains of other chemical elements and compounds with a content of <2% can remain in the layer.

Die maximale Temperatur richtet sich dabei nach der für ein zu beschichtendes Substrat zulässigen Temperatur und ggf. nach der Schmelztemperatur von Silber. So sollte der Substratwerkstoff durch die eingesetzte Temperatur nicht negativ beeinträchtigt werden und sich zumindest weder verformen noch chemisch reagieren. Es sollten auch Diffusionsprozesse mit im Substratwerkstoff enthaltenen Komponenten vermieden werden.The maximum temperature depends on the temperature permissible for a substrate to be coated and, if appropriate, the melting temperature of silver. Thus, the substrate material should not be adversely affected by the temperature used and at least neither deform nor chemically react. Diffusion processes with components contained in the substrate material should also be avoided.

Im ersten Verfahrensschritt wird aus dem Silbernitrat und dem 2-Pyrrolidon [Ag(Pyl)2]NO3 - (C8H14Ag1N3O5) als Komplex gebildet, der kristallisieren kann. Dabei bildet sich die monokline Raumgruppe C2/c (No. 15) mit vier Formeleinheiten zu einer Zelleinheit. Die asymmetrische Einheit enthält die 2-Pyrrolidonmoleküle, ein halbes Silberatom, ein halbes Nitratanion, die bestimmte Positionen einer zweifachen Achse, von denen eine durch die N1-O4 Bindung führt, besetzen, wie dies aus der Darstellung von Figur 1 hervorgeht.In the first process step, silver nitrate and 2-pyrrolidone [Ag (pyl) 2] form NO3 - (C8H14Ag1N3O5) as a complex that can crystallize. The monoclinic space group C2 / c (No. 15) with four formula units forms a cell unit. The asymmetric unit contains the 2-pyrrolidone molecules, half a silver atom, half a nitrate anion, which occupy certain positions of a double axis, one of which passes through the N1-O4 bond, as shown in FIG FIG. 1 evident.

Das Silberatom weist eine gestörte irreguläre AgO6 Geometrie auf, die aus zwei Sauerstoffatomen eines Pyrrolidonmoleküls und vier Sauerstoffatomen des Nitratanions besteht. Die Abstände zwischen dem Silberatom und den Sauerstoffatomen liegen im Bereich 2,358 bis 2,683 Angström. Die Nitratanionen haben eine Linkerfunktion und verbinden die Struktur in 1-D-Polymerketten in eine Richtung. Die Silberatome sind mit linearen Polymerketten durch µ2-O Sauerstoffbrückenatomen mit signifikant größeren Abständen zwischen Ag1 und O4 von 2,683 Angström im Vergleich zum Abstand zwischen Ag1 zu O2 in Höhe von 2,536 Angström angeordnet. In der Kristallstruktur sind die 1-D-Polymerketten im 2D-Netzwerk durch intermolekulare N-H...O-Bindungen verbunden.The silver atom has a disordered irregular AgO 6 geometry consisting of two oxygen atoms of a pyrrolidone molecule and four oxygen atoms of the nitrate anion. The distances between the silver atom and the oxygen atoms are in the range 2.358 to 2.683 angstroms. The nitrate anions have a linker function and connect the structure in 1-D polymer chains in one direction. The silver atoms are arranged with linear polymer chains through μ 2 -O oxygen-bridge atoms with significantly larger distances between Ag1 and O4 of 2.683 angstroms compared to the distance between Ag1 and O2 of 2.536 angstroms. In the crystal structure, the 1-D polymer chains in the 2D network are linked by intermolecular NH ... O bonds.

Um die Kristallisation des [Ag(Pyl)2]NO3 während des Auftrags auf die Substratoberfläche, die durch Verdampfen des Lösungsmittels auftreten kann, zu vermeiden oder zumindest zu reduzieren kann ein Pyrollidon-derivat als Kristallisationsinhibitor, bevorzugt tert-Butylpyrrolidon mit einem Anteil von mindestens 2-Masse-% bis maximal 20 Masse-% der Lösung zugegeben werden. Diese Zugabe kann vor dem, während der Durchführung oder nach dem ersten Verfahrensschritt erfolgen. Durch den Einsatz eines Kristallisationsinhibitors kann eine homogene und gleichmäßige Silberschicht erhalten werden.In order to avoid or at least reduce the crystallization of the [Ag (pyl) 2 ] NO 3 during application to the substrate surface, which may occur due to evaporation of the solvent, a pyrollidone derivative as crystallization inhibitor, preferably tert-butylpyrrolidone, may be used at least 2% by mass to a maximum of 20% by mass of the solution are added. This addition may take place before, during or after the first process step. By using a crystallization inhibitor, a homogeneous and uniform silver layer can be obtained.

Beim ersten Verfahrensschritt zur Herstellung der Lösung sollte ein Verhältnis von Wasser zu Ethanol von 1 zu 4, es können aber auch kleinere Anteile an Wasser gewählt werden.In the first process step for the preparation of the solution, a ratio of water to ethanol of 1 to 4, but it can also be selected smaller amounts of water.

Bei Silber und 2-Pyrrolidon sollte ein Mol-Verhältnis von 1 zu 2 eingehalten werden.For silver and 2-pyrrolidone, a molar ratio of 1 to 2 should be maintained.

Außerdem sollte während des ersten Verfahrensschritts jeglicher Einfluss elektromagnetischer Strahlung vermieden und die Lösung in einem hermetisch geschlossenen optisch nichttransparentem Behälter eingeschlossen sein.In addition, during the first process step, any influence of electromagnetic radiation should be avoided and the solution enclosed in a hermetically sealed optically nontransparent container.

Vor der Durchführung des zweiten Verfahrensschritts sollte die Oberfläche des Substrats gereinigt werden. Hierfür kann eine geeignete Flüssigkeit, die unter Berücksichtigung des Substratmaterials ausgewählt werden kann, eingesetzt werden. Bei einem Substrat aus Glas kann dies beispielsweise "Piranha-Lösung", also eine wässrige Lösung von Peroxomonoschwefelsäure sein. Es kann mit Ultraschallunterstützung gereinigt werden.Before performing the second process step, the surface of the substrate should be cleaned. For this purpose, a suitable liquid, which can be selected taking into account the substrate material, are used. For example, for a glass substrate, this may be "piranha solution", So be an aqueous solution of Peroxomonosschwefelsäure. It can be cleaned with ultrasound support.

Der Auftrag der Lösung nach dem ersten Verfahrensschritt auf die Oberfläche des Substrats, das neben dem bereits erwähnten Glas auch aus einem bevorzugt optisch transparenten Polymer bestehen kann, kann durch ein Tauch-, Rotationsbeschichtung oder ein Druckverfahren erfolgen. Es sollte lediglich gesichert sein, dass eine konstante Schichtdicke erreicht werden kann, um über die beschichtete Fläche homogene elektrische und/oder optische Eigenschaften der ausgebildeten Schicht zu erreichen.The order of the solution after the first process step on the surface of the substrate, which can also consist of a preferably optically transparent polymer in addition to the aforementioned glass, can be done by a dip, spin coating or a printing process. It should only be ensured that a constant layer thickness can be achieved in order to achieve homogeneous electrical and / or optical properties of the layer formed over the coated surface.

Als Druckverfahren können beispielsweise und bevorzugt solche eingesetzt werden, die der Nanoimprint Lithografie oder dem Mikrokontaktdrucken zuzuzählen sind. Damit lassen sich auch geometrisch unterschiedlich strukturierte Schichten auf Substratoberflächen herstellen. Dies ist auch mit Siebdrucktechnik möglich. In einfachster Weise kann ein Substrat auch in die vorbereitete Lösung eingetaucht und wieder herausgezogen werden (dipcoating), bevor der dritte und vierte Verfahrensschritt durchgeführt werden. Die Ausbildung der Schichten kann auch durch Spincoating erfolgen.For example, and preferably those which are to be counted as nanoimprint lithography or microcontact printing can be used as the printing method. It is thus also possible to produce geometrically differently structured layers on substrate surfaces. This is also possible with screen printing technology. In the simplest way, a substrate can also be immersed in the prepared solution and pulled out again (dipcoating) before the third and fourth process steps are carried out. The formation of the layers can also be done by spin coating.

Es sollte darauf geachtet werden, dass die mit der Erfindung ausgebildeten Schichten eine maximale Schichtdicke von 200 nm nicht überschreiten sollten. Schichtdicken im Bereich 50 nm bis 100 nm sind zu bevorzugen, um eine ausreichende elektrische Leitfähigkeit einhalten zu können.Care should be taken that the layers formed by the invention should not exceed a maximum layer thickness of 200 nm. Layer thicknesses in the range 50 nm to 100 nm are to be preferred in order to be able to comply with a sufficient electrical conductivity.

Das tert-Butylpyrrolidon kann aus 20 ml Tetrahydrofuran (THF), Triethylamin und tert-Butylamin hergestellt werden, die mit Argon gespült und miteinander bei einer Temperatur von 0 °C vermischt werden. Der Mischung wird 4-Chlorbutyrylchlorid zugegeben und ein intensives Rühren bei dieser Temperatur durchgeführt. Anschließend wird Triethyamin-Hydro-Chlorid ausgefiltert und es wird ein zweifaches Waschen mit THF durchgeführt. Das erhaltene Filtrat wird bei verringertem Umgebungsdruck konzentriert und das so erhaltene Ausgangsprodukt mit Acetat vermischt und dann einmal mit HCL und zweimal mit Lauge gewaschen. Die gebildete organische Phase kann auf einem Substrat mit MgSO4 getrocknet und das Lösungsmittel bei reduziertem Druck entfernt werden.The tert-butylpyrrolidone can be prepared from 20 ml of tetrahydrofuran (THF), triethylamine and tert-butylamine, which are purged with argon and mixed together at a temperature of 0 ° C. 4-Chlorobutyryl chloride is added to the mixture and vigorous stirring is carried out at this temperature. Subsequently, triethylamine hydrochloride is filtered out and a double washing with THF is carried out. The resulting filtrate is concentrated under reduced pressure and the resulting starting material is mixed with acetate and then washed once with HCL and twice with brine. The resulting organic phase can be dried on a substrate with MgSO4 and the solvent removed at reduced pressure.

Das dann erhaltene tert-Buty-4-Chlorbutanamid wird in THF gelöst und einer Lösung von Kalium tert-Butylat mit THF zugegeben. Nach längerem Rühren im Eisbad kann diese Mischung aus dem Behälter in ein anderes Behältnis gegeben und darin mit Ethylacetat vermischt und dann zweimal mit Lauge gewaschen werden. Die erhaltene organische Phase kann wieder mit MgSO4 getrocknet und das Lösungsmittel mit Unterdruck entzogen werden. Nach einer Destillation bei reduziertem Druck und einer Temperatur von 75 °C kann das tert-Butylpyrrolidon als farblose Flüssigkeit erhalten werden.The tert-buty-4-chlorobutanamide then obtained is dissolved in THF and added to a solution of potassium tert-butylate with THF. After prolonged stirring in an ice bath, this mixture from the container can be placed in another container and mixed therein with ethyl acetate and then washed twice with brine. The resulting organic phase can be dried again with MgSO 4 and the solvent removed under reduced pressure. After distillation at reduced pressure and a temperature of 75 ° C, the tert-butylpyrrolidone can be obtained as a colorless liquid.

Diese Herstellung ist beispielsweise von K. Takao u.a. in "Molecular and Crystal Structures of Uranyl Nitrate Complexes with N-Alkylated 2-Pyrrolidone Derivates: Design and Optimization of Promising Precepitant for Uranyl Ion"; Cristal Growth&Design; 2008; 8(7); S. 2364-2376 beschrieben.This production is for example of K. Takao et al. In "Molecular and Crystal Structures of Uranyl Nitrate Complexes with N-Alkylated 2-Pyrrolidone Derivatives: Design and Optimization of Promising Precipitant for Uranyl Ion"; Cristal Growth &Design;2008; 8 (7); Pp. 2364-2376 described.

Mit der Erfindung können ausreichend leitfähige dünne Silberschichten hergestellt werden, die bei einer Dicke von 100 nm elektrische Schichtwiderstände < 10 Ω/□ aufweisen, wobei es sich hier um einen Flächenwiderstand handelt, was mit dem "□" zum Ausdruck gebracht ist.With the invention, sufficiently conductive thin silver layers can be produced which have electrical resistivities <10 Ω / □ at a thickness of 100 nm, which is a sheet resistance, which is expressed by the "□".

Nachfolgend soll die Erfindung an einem Beispiel näher erläutert werden.Below, the invention will be explained in more detail by way of example.

Dabei zeigt Figur 1 - in schematischer Form die Linkfunktion von Nitratanionen, die die 1-D-Polymerketten des [Ag(Pyl)2]NO3 verbinden.It shows FIG. 1 in schematic form, the linkage function of nitrate anions connecting the 1-D polymer chains of [Ag (pyl) 2 ] NO 3 .

Bei der Herstellung einer dünnen Silberschicht auf einem Substrat wurden zuerst 0,34 g (2 mmol) Silbernitrat in 1 ml deionisiertem Wasser gelöst. Zu dieser Lösung wurden 0,34 g (4 mmol) 2-Pyrrolidon gegeben. Bereits bei der Herstellung dieser Lösung oder auch danach wurde der Einfluss elektromagnetischer Strahlung, insbesondere der von Licht, durch geeignete Maßnahmen, wie z.B. durch den Einsatz eines strahlungsundurchlässigen Gefäßes unterbunden.When preparing a thin layer of silver on a substrate, first 0.34 g (2 mmol) of silver nitrate was dissolved in 1 ml of deionized water. To this solution was added 0.34 g (4 mmol) of 2-pyrrolidone. Already in the preparation of this solution or even afterwards, the influence of electromagnetic radiation, in particular that of light, has been reduced by suitable measures, such as e.g. prevented by the use of a radiopaque vessel.

Das gebildete Reaktionsprodukt [Ag(Pyl)2]NO3 kristallisiert während einer Lagerung bei normaler Raumtemperatur aus und das Wasser als Lösungsmittel verdampft langsam.The formed reaction product [Ag (pyl) 2 ] NO 3 crystallizes out during storage at normal room temperature and the water as solvent evaporates slowly.

Für die Herstellung dünner Schichten kann der vorzugsweise nach mehrtägiger Lagerung der vorab in einem ersten Verfahrensschritt hergestellten Lösung zusätzliches Wasser mit Ethanol zugegeben werden, so dass ein Verhältnis von Wasser zu Ethanol von 1 zu 4 eingehalten und eine 0,8 M Lösung erhalten worden ist.For the production of thin layers, the water, preferably after several days storage of the solution previously prepared in a first process step can be added with ethanol, so that a ratio of water to ethanol of 1 to 4 and maintained a 0.8 M solution.

Das Substrat wurde vorab mit einer aus einem Teil 30 % H2O2 und drei Teilen konzentrierter H2SO4 gebildeten Lösung über einen Zeitraum von 30 min gereinigt und anschließend mit deionisiertem Wasser sorgfältig gewaschen und danach getrocknet.The substrate was preliminarily cleaned with a solution of 30% H 2 O 2 and three parts of concentrated H 2 SO 4 over a period of 30 minutes, then thoroughly washed with deionized water and then dried.

Auf die Oberfläche des so vorbereiteten Substrats wurde die vorher hergestellte Lösung mit dem [Ag(Pyl)2]NO3 durch eintauchen und wieder herausziehen aufgebracht und dann über einen Zeitraum von 20 min mit elektromagnetischer Strahlung in einer UV-Box mit einem F-Strahler bestrahlt. Die Bestrahlung erfolgte im Wellenlängenbereich zwischen 280 nm und 400 nm, so dass ein Teilbereich der eingesetzten Strahlung oberhalb 315 nm und der Rest im UV-Bereich lag.On the surface of the substrate thus prepared was applied the previously prepared solution with the [Ag (pyl) 2 ] NO 3 by immersion and extraction, and then over a period of 20 minutes with electromagnetic radiation in a UV box with an F-emitter irradiated. The irradiation took place in the wavelength range between 280 nm and 400 nm, so that a partial region of the radiation used was above 315 nm and the remainder in the UV range.

Bei dieser Bestrahlung erfolgt die Reduktion des [Ag(Pyl)2]NO3 und es wurde reines Silber erhalten.In this irradiation, reduction of [Ag (pyl) 2 ] NO 3 occurs and pure silver is obtained.

Im Anschluss daran erfolgte eine Wärmebehandlung bei der mit einer Heizrate von 5 K/min auf eine maximale Temperatur von 220 °C erwärmt und die Temperatur über 60 min gehalten wurde, um die restlichen Bestandteile des Pyrrolidons zu entfernen.This was followed by a heat treatment in which heated at a heating rate of 5 K / min to a maximum temperature of 220 ° C and the temperature was kept for 60 min to remove the remaining constituents of the pyrrolidone.

Dabei konnte eine ca. 100 nm dicke Schicht auf dem Substrat erhalten werden, die einen elektrischen Widerstand von < 10 Ω/□ aufwies.In this case, an approximately 100 nm thick layer could be obtained on the substrate, which had an electrical resistance of <10 Ω / □.

Bei einem Auftrag der Lösung auf die Substratoberfläche durch Mikrokontaktdruck konnte eine Schichtdicke von 60 nm der Silberschicht erreicht werden. Es können dabei Linienstrukturen mit einer Breite von 20 µm gedruckt werden. Es besteht aber die Möglichkeit kleinere, filigranere Strukturen bis in den "Nanometerbereich" zu drucken.When the solution was applied to the substrate surface by microcontact printing, a layer thickness of 60 nm of the silver layer could be achieved. Line structures with a width of 20 μm can be printed. However, it is possible to print smaller, filigree structures down to the "nanometer range".

Der mit dem ersten Verfahrensschritt erhaltenen Lösung können zur Unterdrückung der Kristallisation des [Ag(Pyl)2]NO3 Komplexes 10 Masse-% des Pyrrolidondervats tert-Butylpyrrolidon zugegeben werden. Dadurch kann eine Fehlordnung in der Polymerkette erreicht werden, die die Kristallisation verhindert, was das Auftragen der Lösung auf die Substratoberfläche erleichtert.The solution obtained by the first process step may be added to suppress the crystallization of the [Ag (pyl) 2 ] NO 3 complex 10% by mass of the pyrrolidone derivative tert-butylpyrrolidone. As a result, a disorder in the polymer chain can be achieved, which prevents the crystallization, which facilitates the application of the solution to the substrate surface.

Claims (9)

  1. A method for producing thin electrically conductive layers of silver on a surface of substrates, in which
    in a first method step silver nitrate and 2-pyrrolidone are dissolved in a solvent, preferably water or an ethanol/water mixture, and in so doing the formation of [Ag(Pyl)2]NO3 takes place by complexing, and following this method step
    in a second method step the solution is applied to a surface of the substrate to be coated, and then
    in a third method step a chemical reduction, which results in the separation of silver from the other chemical components contained, is carried out by irradiation with electromagnetic radiation from the wavelength spectrum of UV-light over a period of at least 15 min., and following thereon
    in a fourth method step a heat treatment is carried out at a temperature of at most 500°C, preferably at 220°C over a period of at least 30 min, preferably 60 min, and in so doing a layer formed at least virtually exclusively of silver on the surface of the substrate is obtained.
  2. A method according to Claim 1, characterised in that the solution obtained in the first method step is kept at room temperature with light excluded for several days, and in so doing evaporation of liquid takes place.
  3. A method according to Claim 1 or 2, characterised in that in the fourth method step a heating rate in the range from 3K/min to 10 K/min, preferably of 5 K/min, is maintained.
  4. A method according to one of the preceding claims, characterised in that a molar ratio of silver to 2-pyrrolidone of 1 to 2 is maintained.
  5. A method according to one of the preceding claims, characterised in that in or directly after the first method step a pyrrolidone derivative, preferably tert. butylpyrrolidone with a proportion of at least 2 mass % to a maximum of 20 mass % is added to the solution.
  6. A method according to one of the preceding claims, characterised in that in the second method step the coating is carried out with a printing or dipping process.
  7. A crystalline silver complex having the formula [Ag(2-pyrrolidone)2]NO3, produceable by crystallising a complex of silver nitrate and 2-pyrrolidone, wherein a monoclinic space group C2/c with four formula units to a cell unit is formed.
  8. A solution of the silver complex according to Claim 7 containing silver nitrate, 2-pyrrolidone, water and a further organic solvent, characterised in that the solution additionally contains tert. butylpyrrolidone.
  9. A solution according to Claim 8, characterised in that the solution contains ethanol and tetrahydrofuran or acetone as further organic solvents.
EP12733165.0A 2011-07-18 2012-07-10 Method for producing thin electrically conductive layers of silver, a silver layer, a silver complex, the solution of said silver complex, and the use of the silver complex in a solution Not-in-force EP2735002B1 (en)

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