EP2706556A3 - A method for coincident alignment of a laser beam and a charged particle beam - Google Patents
A method for coincident alignment of a laser beam and a charged particle beam Download PDFInfo
- Publication number
- EP2706556A3 EP2706556A3 EP13183272.7A EP13183272A EP2706556A3 EP 2706556 A3 EP2706556 A3 EP 2706556A3 EP 13183272 A EP13183272 A EP 13183272A EP 2706556 A3 EP2706556 A3 EP 2706556A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- laser beam
- charged particle
- particle beam
- coincident alignment
- coincident
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 title abstract 3
- 230000008685 targeting Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/08—Holders for targets or for other objects to be irradiated
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
- H01J37/228—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object whereby illumination and light collection take place in the same area of the discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
- H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/1501—Beam alignment means or procedures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Plasma & Fusion (AREA)
- Electron Sources, Ion Sources (AREA)
- Laser Beam Processing (AREA)
- Microscoopes, Condenser (AREA)
Abstract
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/607,329 US8766213B2 (en) | 2012-09-07 | 2012-09-07 | Automated method for coincident alignment of a laser beam and a charged particle beam |
Publications (3)
Publication Number | Publication Date |
---|---|
EP2706556A2 EP2706556A2 (en) | 2014-03-12 |
EP2706556A3 true EP2706556A3 (en) | 2016-03-09 |
EP2706556B1 EP2706556B1 (en) | 2017-05-31 |
Family
ID=49111054
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP13183272.7A Active EP2706556B1 (en) | 2012-09-07 | 2013-09-06 | A method for coincident alignment of a laser beam and a charged particle beam |
Country Status (4)
Country | Link |
---|---|
US (3) | US8766213B2 (en) |
EP (1) | EP2706556B1 (en) |
JP (1) | JP6275412B2 (en) |
CN (1) | CN103681190B (en) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8766213B2 (en) * | 2012-09-07 | 2014-07-01 | Fei Company | Automated method for coincident alignment of a laser beam and a charged particle beam |
US9991090B2 (en) | 2012-11-15 | 2018-06-05 | Fei Company | Dual laser beam system used with an electron microscope and FIB |
WO2016090302A2 (en) | 2014-12-05 | 2016-06-09 | Convergent Dental, Inc. | Systems and methods for alignment of a laser beam |
US9536697B2 (en) * | 2015-05-19 | 2017-01-03 | Hermes Microvision Inc. | System and method for calibrating charge-regulating module |
US9978557B2 (en) | 2016-04-21 | 2018-05-22 | Fei Company | System for orienting a sample using a diffraction pattern |
US10777383B2 (en) * | 2017-07-10 | 2020-09-15 | Fei Company | Method for alignment of a light beam to a charged particle beam |
JP7308710B2 (en) * | 2019-09-25 | 2023-07-14 | 株式会社日立ハイテクサイエンス | Focused ion beam device |
US11257657B2 (en) * | 2020-02-18 | 2022-02-22 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam device with interferometer for height measurement |
US20230141594A1 (en) * | 2020-04-09 | 2023-05-11 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Thermal laser evaporation system and method of providing a thermal laser beam at a source |
US11538714B2 (en) | 2020-05-21 | 2022-12-27 | Applied Materials, Inc. | System apparatus and method for enhancing electrical clamping of substrates using photo-illumination |
US11315819B2 (en) | 2020-05-21 | 2022-04-26 | Applied Materials, Inc. | System apparatus and method for enhancing electrical clamping of substrates using photo-illumination |
US11875967B2 (en) | 2020-05-21 | 2024-01-16 | Applied Materials, Inc. | System apparatus and method for enhancing electrical clamping of substrates using photo-illumination |
KR20230008864A (en) * | 2020-05-21 | 2023-01-16 | 어플라이드 머티어리얼스, 인코포레이티드 | Substrate processing method |
WO2021249872A1 (en) | 2020-06-10 | 2021-12-16 | Asml Netherlands B.V. | Replaceable module for a charged particle apparatus |
CN113964006B (en) * | 2020-07-21 | 2023-09-12 | 聚束科技(北京)有限公司 | Beam spot tracking method and system of particle beam device |
KR20240034830A (en) * | 2021-07-22 | 2024-03-14 | 에이에스엠엘 네델란즈 비.브이. | Systems and devices for stabilizing electron sources in charged particle systems |
DE102021128117A1 (en) | 2021-10-28 | 2023-05-04 | Carl Zeiss Microscopy Gmbh | Method for producing a sample on an object, computer program product and material processing device for carrying out the method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1123481A (en) * | 1997-06-27 | 1999-01-29 | Advantest Corp | Micro-object analyzing apparatus, and adjusting apparatus for micro-object detecting means used in the micro-object analyzing apparatus |
CN102364329A (en) * | 2011-09-19 | 2012-02-29 | 华东师范大学 | Automatic collection system of laser-induced breakdown spectroscopy |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07232290A (en) * | 1994-02-23 | 1995-09-05 | Matsushita Electric Ind Co Ltd | Focus adjusting device for laser beam machine |
US6828566B2 (en) * | 1997-07-22 | 2004-12-07 | Hitachi Ltd | Method and apparatus for specimen fabrication |
JPH11179579A (en) * | 1997-12-22 | 1999-07-06 | Sony Corp | Method and device for correcting optical axis, and exposure-machining device using it |
JP2002334818A (en) * | 2001-05-08 | 2002-11-22 | Tokyo Electron Ltd | Semiconductor manufacturing apparatus and method of manufacturing the same |
US6661009B1 (en) * | 2002-05-31 | 2003-12-09 | Fei Company | Apparatus for tilting a beam system |
US20110163068A1 (en) | 2008-01-09 | 2011-07-07 | Mark Utlaut | Multibeam System |
US7880151B2 (en) | 2008-02-28 | 2011-02-01 | Fei Company | Beam positioning for beam processing |
US10493559B2 (en) | 2008-07-09 | 2019-12-03 | Fei Company | Method and apparatus for laser machining |
US8168961B2 (en) | 2008-11-26 | 2012-05-01 | Fei Company | Charged particle beam masking for laser ablation micromachining |
US8524139B2 (en) | 2009-08-10 | 2013-09-03 | FEI Compay | Gas-assisted laser ablation |
DE102010008296A1 (en) * | 2010-02-17 | 2011-08-18 | Carl Zeiss NTS GmbH, 73447 | Laser processing system, object holder and laser processing method |
CN102812533B (en) * | 2010-04-07 | 2015-12-02 | Fei公司 | Combination laser device and charged particle beam system |
EP2610889A3 (en) | 2011-12-27 | 2015-05-06 | Fei Company | Drift control in a charged particle beam system |
US8766213B2 (en) * | 2012-09-07 | 2014-07-01 | Fei Company | Automated method for coincident alignment of a laser beam and a charged particle beam |
-
2012
- 2012-09-07 US US13/607,329 patent/US8766213B2/en active Active
-
2013
- 2013-08-13 JP JP2013168166A patent/JP6275412B2/en active Active
- 2013-09-06 EP EP13183272.7A patent/EP2706556B1/en active Active
- 2013-09-06 CN CN201310404108.2A patent/CN103681190B/en active Active
-
2014
- 2014-06-12 US US14/303,227 patent/US9263235B2/en active Active
-
2016
- 2016-01-08 US US14/991,507 patent/US9754764B2/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1123481A (en) * | 1997-06-27 | 1999-01-29 | Advantest Corp | Micro-object analyzing apparatus, and adjusting apparatus for micro-object detecting means used in the micro-object analyzing apparatus |
CN102364329A (en) * | 2011-09-19 | 2012-02-29 | 华东师范大学 | Automatic collection system of laser-induced breakdown spectroscopy |
Non-Patent Citations (3)
Title |
---|
ECHLIN MCLEAN P ET AL: "A new TriBeam system for three-dimensional multimodal materials analysis", REVIEW OF SCIENTIFIC INSTRUMENTS, AIP, MELVILLE, NY, US, vol. 83, no. 2, 1 February 2012 (2012-02-01), pages 23701 - 23701, XP012161856, ISSN: 0034-6748, [retrieved on 20120203], DOI: 10.1063/1.3680111 * |
HWANG DAVID ET AL: "In situ monitoring of material processing by a pulsed laser beam coupled via a lensed fiber into a scanning electron microscope", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART A, AVS /AIP, MELVILLE, NY., US, vol. 26, no. 6, 30 October 2008 (2008-10-30), pages 1432 - 1438, XP012114036, ISSN: 0734-2101, DOI: 10.1116/1.2987946 * |
KRAL L: "Automatic beam alignment system for a pulsed infrared laser", REVIEW OF SCIENTIFIC INSTRUMENTS, AIP, MELVILLE, NY, US, vol. 80, no. 1, 7 January 2009 (2009-01-07), pages 13102 - 13102, XP012127861, ISSN: 0034-6748, DOI: 10.1063/1.3058604 * |
Also Published As
Publication number | Publication date |
---|---|
JP6275412B2 (en) | 2018-02-07 |
EP2706556B1 (en) | 2017-05-31 |
JP2014054670A (en) | 2014-03-27 |
US8766213B2 (en) | 2014-07-01 |
US20150060660A1 (en) | 2015-03-05 |
US9754764B2 (en) | 2017-09-05 |
CN103681190A (en) | 2014-03-26 |
US9263235B2 (en) | 2016-02-16 |
US20140070113A1 (en) | 2014-03-13 |
EP2706556A2 (en) | 2014-03-12 |
CN103681190B (en) | 2018-06-05 |
US20160126059A1 (en) | 2016-05-05 |
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