EP2692905A3 - Galvanic coating system and method for operating the same - Google Patents

Galvanic coating system and method for operating the same Download PDF

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Publication number
EP2692905A3
EP2692905A3 EP13176328.6A EP13176328A EP2692905A3 EP 2692905 A3 EP2692905 A3 EP 2692905A3 EP 13176328 A EP13176328 A EP 13176328A EP 2692905 A3 EP2692905 A3 EP 2692905A3
Authority
EP
European Patent Office
Prior art keywords
workpiece
operating
working container
coating system
counterelectrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP13176328.6A
Other languages
German (de)
French (fr)
Other versions
EP2692905A2 (en
Inventor
Harry Schaaf
Sergei Nicolaewich Belov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Belov Sergei
Original Assignee
Belov Sergei
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Belov Sergei filed Critical Belov Sergei
Publication of EP2692905A2 publication Critical patent/EP2692905A2/en
Publication of EP2692905A3 publication Critical patent/EP2692905A3/en
Withdrawn legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/06—Filtering particles other than ions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/08—Rinsing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium

Abstract

Die Erfindung betrifft eine galvanische Beschichtungsanlage (1) und ein Verfahren zum Betrieb dieser zur nacheinander erfolgenden Aufbringung mehrerer Schichten auf ein als Elektrode geschaltetes Werkstück (5) mittels eines auf die jeweilige Schicht abgestimmten Elektrolyten und Beschaltung des Werkstücks (5) gegen eine Gegenelektrode (4) sowie einer Spülung des Werkstücks (5) zumindest zwischen der Aufbringung zweier Schichten. Um eine derartige Beschichtungsanlage (1) mit verringertem Platzbedarf, mit einem verringerten Handhabungsaufwand, geringeren Herstellungskosten und einer geringeren Belastung mit Industrieabfall ausbilden zu können, sind ein einziger Arbeitsbehälter (2) mit einer beschichtungsneutralen Gegenelektrode (4) und mehrere, die notwendigen Arbeitslösungen (9, 10, 11, 12) enthaltende Vorratsbehälter (14, 15, 16, 17) vorgesehen und zwischen Arbeitsbehälter (2) und Vorratsbehältern (14, 15, 16, 17) eine Speiseleitung (18) zum wechselseitigen Beschicken des Arbeitsbehälters (2) mit Inhalten der Vorratsbehälter (14, 15, 16, 17) vorgesehen.

Figure imgaf001
The invention relates to a galvanic coating installation (1) and to a method for operating it to successively apply a plurality of layers to a workpiece (5) connected as an electrode by means of an electrolyte matched to the respective layer and wiring the workpiece (5) against a counterelectrode (4) ) and a rinse of the workpiece (5) at least between the application of two layers. In order to be able to form such a coating system (1) with reduced space requirements, with a reduced handling effort, lower production costs and a lower load with industrial waste, a single working container (2) with a coating-neutral counterelectrode (4) and several, the necessary working solutions (9 , 10, 11, 12) containing reservoir (14, 15, 16, 17) and provided between the working container (2) and reservoirs (14, 15, 16, 17) a feed line (18) for reciprocally feeding the working container (2) Contents of the reservoir (14, 15, 16, 17) are provided.
Figure imgaf001
EP13176328.6A 2012-07-31 2013-07-12 Galvanic coating system and method for operating the same Withdrawn EP2692905A3 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102012106986.7A DE102012106986A1 (en) 2012-07-31 2012-07-31 Galvanic coating system and method for its operation

Publications (2)

Publication Number Publication Date
EP2692905A2 EP2692905A2 (en) 2014-02-05
EP2692905A3 true EP2692905A3 (en) 2016-01-06

Family

ID=48808176

Family Applications (1)

Application Number Title Priority Date Filing Date
EP13176328.6A Withdrawn EP2692905A3 (en) 2012-07-31 2013-07-12 Galvanic coating system and method for operating the same

Country Status (3)

Country Link
EP (1) EP2692905A3 (en)
DE (1) DE102012106986A1 (en)
EA (1) EA028777B1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016046642A2 (en) * 2014-09-26 2016-03-31 King Abdullah University Of Science And Technology Systems and methods for large-scale nanotemplate and nanowire fabrication
CN107012498A (en) * 2016-11-23 2017-08-04 瑞尔太阳能投资有限公司 A kind of multilayer film electrochemical deposition device and method

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6200436B1 (en) * 1999-04-27 2001-03-13 Advanced Micro Devices, Inc. Recycling consistent plating system for electroplating
EP1091024A1 (en) * 1998-04-30 2001-04-11 Ebara Corporation Method and device for plating substrate
US6267853B1 (en) * 1999-07-09 2001-07-31 Applied Materials, Inc. Electro-chemical deposition system
DE10341998A1 (en) * 2003-09-04 2005-03-31 Gramm Gmbh & Co. Kg Galvanizing or coating applicator has non-self priming pump with secondary self priming pump between process chamber and discharge tank
US20050155865A1 (en) * 2003-05-16 2005-07-21 Koji Mishima Electrolytic processing apparatus and method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH613880A5 (en) * 1975-09-29 1979-10-31 Emile Steiger
DE2944401A1 (en) 1979-11-02 1981-05-14 GAMA Maschinen und Einrichtungen für die Galvanotechnik Gm bH, 7129 Ilsfeld Electroplating plant using two or more treatment stations - where each station has modular structure contg. tanks, pump, filter and heater for treatment liq.
DE10229564B4 (en) * 2002-07-01 2009-07-16 Martin Thum Method and apparatus for chemical deburring and polishing
RU2398920C2 (en) * 2004-03-23 2010-09-10 Гломакс С.Р.Л. Facility and installation for metal items electro-galvanic coating
RU98415U1 (en) * 2010-04-27 2010-10-20 Вадим Николаевич Чернов BLASTING SYSTEM

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1091024A1 (en) * 1998-04-30 2001-04-11 Ebara Corporation Method and device for plating substrate
US6200436B1 (en) * 1999-04-27 2001-03-13 Advanced Micro Devices, Inc. Recycling consistent plating system for electroplating
US6267853B1 (en) * 1999-07-09 2001-07-31 Applied Materials, Inc. Electro-chemical deposition system
US20050155865A1 (en) * 2003-05-16 2005-07-21 Koji Mishima Electrolytic processing apparatus and method
DE10341998A1 (en) * 2003-09-04 2005-03-31 Gramm Gmbh & Co. Kg Galvanizing or coating applicator has non-self priming pump with secondary self priming pump between process chamber and discharge tank

Also Published As

Publication number Publication date
EA028777B1 (en) 2017-12-29
EP2692905A2 (en) 2014-02-05
EA201300781A1 (en) 2014-02-28
DE102012106986A1 (en) 2014-02-06

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