EP2688712A4 - METHOD AND SYSTEM FOR CONVERGENT POLISHING - Google Patents

METHOD AND SYSTEM FOR CONVERGENT POLISHING

Info

Publication number
EP2688712A4
EP2688712A4 EP12760262.1A EP12760262A EP2688712A4 EP 2688712 A4 EP2688712 A4 EP 2688712A4 EP 12760262 A EP12760262 A EP 12760262A EP 2688712 A4 EP2688712 A4 EP 2688712A4
Authority
EP
European Patent Office
Prior art keywords
convergent
polishing
convergent polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP12760262.1A
Other languages
German (de)
French (fr)
Other versions
EP2688712A1 (en
EP2688712B1 (en
Inventor
Tayyab I Suratwala
William A Steele
Michael D Feit
Richard P Desjardin
Daniel C Mason
Rebecca J Dylla-Spears
Lana L Wong
Philip E Miller
Paul Geraghty
Jeffrey D Bude
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lawrence Livermore National Security LLC
Original Assignee
Lawrence Livermore National Security LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lawrence Livermore National Security LLC filed Critical Lawrence Livermore National Security LLC
Priority to EP16207175.7A priority Critical patent/EP3187304B1/en
Publication of EP2688712A1 publication Critical patent/EP2688712A1/en
Publication of EP2688712A4 publication Critical patent/EP2688712A4/en
Application granted granted Critical
Publication of EP2688712B1 publication Critical patent/EP2688712B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
    • B24B13/005—Blocking means, chucks or the like; Alignment devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
    • B24B37/102—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being able to rotate freely due to a frictional contact with the lapping tool
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/34—Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00—Component parts such as frames, beds, carriages, headstocks
    • B24B41/06—Work supports, e.g. adjustable steadies
    • B24B41/067—Work supports, e.g. adjustable steadies radially supporting workpieces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/04—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor involving a rotary work-table

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
EP12760262.1A 2011-03-21 2012-03-20 Method and system for convergent polishing Active EP2688712B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP16207175.7A EP3187304B1 (en) 2011-03-21 2012-03-20 Method and system for convergent polishing

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161454893P 2011-03-21 2011-03-21
PCT/US2012/029837 WO2012129244A1 (en) 2011-03-21 2012-03-20 Method and system for convergent polishing

Related Child Applications (1)

Application Number Title Priority Date Filing Date
EP16207175.7A Division EP3187304B1 (en) 2011-03-21 2012-03-20 Method and system for convergent polishing

Publications (3)

Publication Number Publication Date
EP2688712A1 EP2688712A1 (en) 2014-01-29
EP2688712A4 true EP2688712A4 (en) 2015-07-15
EP2688712B1 EP2688712B1 (en) 2017-01-04

Family

ID=46879717

Family Applications (2)

Application Number Title Priority Date Filing Date
EP12760262.1A Active EP2688712B1 (en) 2011-03-21 2012-03-20 Method and system for convergent polishing
EP16207175.7A Active EP3187304B1 (en) 2011-03-21 2012-03-20 Method and system for convergent polishing

Family Applications After (1)

Application Number Title Priority Date Filing Date
EP16207175.7A Active EP3187304B1 (en) 2011-03-21 2012-03-20 Method and system for convergent polishing

Country Status (6)

Country Link
EP (2) EP2688712B1 (en)
JP (2) JP5968418B2 (en)
KR (1) KR20140019392A (en)
CN (1) CN103534062A (en)
RU (1) RU2610991C2 (en)
WO (1) WO2012129244A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6321022B2 (en) 2012-11-02 2018-05-09 ローレンス リバモア ナショナル セキュリティー， エルエルシー Method for preventing aggregation of charged colloids without losing surface activity
CN110977679A (en) * 2019-12-20 2020-04-10 成都精密光学工程研究中心 Processing equipment and method for full-caliber low-defect planar workpiece
CN112405209A (en) * 2020-11-11 2021-02-26 上饶市光耀光学设备制造有限公司 Fine grinding and polishing device for processing optical lens

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5649849A (en) * 1995-03-24 1997-07-22 Eastman Kodak Company Method and apparatus for realtime monitoring and feedback control of the shape of a continuous planetary polishing surface
US20040060502A1 (en) * 2002-09-26 2004-04-01 University Of Florida High selectivity and high planarity dielectric polishing
JP2004330338A (en) * 2003-05-06 2004-11-25 Shin Etsu Chem Co Ltd Work polishing apparatus and work polishing method
US20060116054A1 (en) * 2000-05-31 2006-06-01 Jsr Corporation Polishing body
US20060124592A1 (en) * 2004-12-09 2006-06-15 Miller Anne E Chemical mechanical polish slurry
US20100311308A1 (en) * 2009-01-29 2010-12-09 Lawrence Livermore National Security, Llc Apparatus and Method for Deterministic Control of Surface Figure During Full Aperture Polishing

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH041532Y2 (en) * 1985-03-19 1992-01-20
JPS63283859A (en) * 1987-05-13 1988-11-21 Hitachi Ltd Wafer polishing jig
JPH05228828A (en) * 1992-02-19 1993-09-07 Ibiden Co Ltd Method and jig for polishing crystal body
JP3439501B2 (en) * 1993-06-10 2003-08-25 株式会社住田光学ガラス Lens joining device
CA2159797A1 (en) * 1994-10-28 1996-04-29 John H. Ko Compliant lens block and tape
JPH09117859A (en) * 1995-10-27 1997-05-06 Matsushita Electric Ind Co Ltd Method of polishing substrate to be polished
JP3880102B2 (en) * 1996-07-29 2007-02-14 東京エレクトロン株式会社 Polishing apparatus and polishing method
US6149506A (en) * 1998-10-07 2000-11-21 Keltech Engineering Lapping apparatus and method for high speed lapping with a rotatable abrasive platen
US6099604A (en) * 1997-08-21 2000-08-08 Micron Technology, Inc. Slurry with chelating agent for chemical-mechanical polishing of a semiconductor wafer and methods related thereto
US6692573B1 (en) * 2000-06-01 2004-02-17 Agilent Technologies, Inc. Automated pitch button dispensing station and method
US6443811B1 (en) * 2000-06-20 2002-09-03 Infineon Technologies Ag Ceria slurry solution for improved defect control of silicon dioxide chemical-mechanical polishing
JP2003179021A (en) * 2001-12-11 2003-06-27 Sony Corp Chemical mechanical polishing equipment
US6935922B2 (en) * 2002-02-04 2005-08-30 Kla-Tencor Technologies Corp. Methods and systems for generating a two-dimensional map of a characteristic at relative or absolute locations of measurement spots on a specimen during polishing
WO2006025641A1 (en) * 2004-09-02 2006-03-09 Joon-Mo Kang Retaining ring for chemical mechanical polishing
JP2006159384A (en) * 2004-12-10 2006-06-22 Tochigi Nikon Corp Manufacturing method of optical components
US7368388B2 (en) * 2005-04-15 2008-05-06 Small Robert J Cerium oxide abrasives for chemical mechanical polishing
JP4787063B2 (en) * 2005-12-09 2011-10-05 株式会社荏原製作所 Polishing apparatus and polishing method
JP2007298608A (en) * 2006-04-28 2007-11-15 Victor Co Of Japan Ltd Method for manufacturing optical component
US7829464B2 (en) * 2006-10-20 2010-11-09 Spansion Llc Planarization method using hybrid oxide and polysilicon CMP
WO2008058196A2 (en) * 2006-11-08 2008-05-15 St. Lawrence Nanotechnology, Inc. Chemical mechanical polishing of moisture sensitive surfaces and compositions therefor
US20090284837A1 (en) * 2008-05-13 2009-11-19 Micron Technology, Inc. Method and apparatus providing uniform separation of lens wafer and structure bonded thereto
US20090311945A1 (en) * 2008-06-17 2009-12-17 Roland Strasser Planarization System
JP5291746B2 (en) * 2011-03-22 2013-09-18 株式会社荏原製作所 Polishing equipment

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5649849A (en) * 1995-03-24 1997-07-22 Eastman Kodak Company Method and apparatus for realtime monitoring and feedback control of the shape of a continuous planetary polishing surface
US20060116054A1 (en) * 2000-05-31 2006-06-01 Jsr Corporation Polishing body
US20040060502A1 (en) * 2002-09-26 2004-04-01 University Of Florida High selectivity and high planarity dielectric polishing
JP2004330338A (en) * 2003-05-06 2004-11-25 Shin Etsu Chem Co Ltd Work polishing apparatus and work polishing method
US20060124592A1 (en) * 2004-12-09 2006-06-15 Miller Anne E Chemical mechanical polish slurry
US20100311308A1 (en) * 2009-01-29 2010-12-09 Lawrence Livermore National Security, Llc Apparatus and Method for Deterministic Control of Surface Figure During Full Aperture Polishing

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2012129244A1 *

Also Published As

Publication number Publication date
JP6232172B2 (en) 2017-11-15
EP3187304A1 (en) 2017-07-05
WO2012129244A1 (en) 2012-09-27
KR20140019392A (en) 2014-02-14
EP2688712A1 (en) 2014-01-29
EP2688712B1 (en) 2017-01-04
JP2014511769A (en) 2014-05-19
CN103534062A (en) 2014-01-22
RU2013146696A (en) 2015-04-27
JP5968418B2 (en) 2016-08-10
RU2610991C2 (en) 2017-02-17
EP3187304B1 (en) 2022-12-21
JP2016190318A (en) 2016-11-10

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