EP2592627A1 - Optiques à réfraction pour photons gamma - Google Patents

Optiques à réfraction pour photons gamma Download PDF

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Publication number
EP2592627A1
EP2592627A1 EP11195264.4A EP11195264A EP2592627A1 EP 2592627 A1 EP2592627 A1 EP 2592627A1 EP 11195264 A EP11195264 A EP 11195264A EP 2592627 A1 EP2592627 A1 EP 2592627A1
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Prior art keywords
laue
crystals
lens
crystal
series
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German (de)
English (en)
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Dietrich Habs
Marc Günther
Michael Jentschel
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Max Planck Gesellschaft zur Foerderung der Wissenschaften eV
Ludwig Maximilians Universitaet Muenchen LMU
INSTITUT MAX VON LAUE - PAUL LANGEVIN
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Max Planck Gesellschaft zur Foerderung der Wissenschaften eV
Ludwig Maximilians Universitaet Muenchen LMU
INSTITUT MAX VON LAUE - PAUL LANGEVIN
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Priority to EP11195264.4A priority Critical patent/EP2592627A1/fr
Priority to PCT/EP2012/004494 priority patent/WO2013068078A1/fr
Publication of EP2592627A1 publication Critical patent/EP2592627A1/fr
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/065—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using refraction, e.g. Tomie lenses
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Definitions

  • the present invention is in the field of radiation physics.
  • the present invention deals with the manipulation of ⁇ -beams.
  • ⁇ -radiation is produced by the decay of high energy states in atomic nuclei, also referred to as ⁇ -decay.
  • ⁇ -radiation is more generally used for any type of electromagnetic radiation having quantum energies beyond some lower boundary, irrespectively of the way the ⁇ -radiation is generated.
  • ⁇ -radiation energies There is no generally accepted lower boundary of ⁇ -radiation energies, but in the present disclosure, all electromagnetic radiation having a photon energy of 100 keV and beyond will be regarded as ⁇ -radiation for simplicity. Below 200 keV, the electromagnetic radiation is often referred to as x-ray radiation, so there is a certain overlap between hard x-ray radiation and the lower part of the ⁇ -spectrum.
  • ⁇ -radiation has been employed in various fields of technology in the past. For example, ⁇ -radiation is frequently used in radiation treatment of cancer.
  • ⁇ -radiation is frequently used in radiation treatment of cancer.
  • electrons are accelerated in a linear accelerator to energies of several MeV and then directed onto a target, where x-ray and ⁇ -radiation is generated in form of bremsstrahlung.
  • ⁇ -beams have been used in non-contact industrial sensors in various fields, including refining, mining, food industry and pulp and paper industries, in particular for measuring thicknesses, densities of materials or levels of fluids by assessing the absorption of ⁇ -beams.
  • ⁇ -beams are frequently used in medical imaging techniques, in particular positron emission tomography (PET) or single-photon emission computer tomography (SPECT).
  • PET positron emission tomography
  • SPECT single-photon emission computer tomography
  • SPECT single-photon emission computer tomography
  • the ⁇ -beams generated this way also have the advantage that the ⁇ -photons are delivered into a rather small opening cone, see for example H.R. Weller et al., Prog. Part. Nucl. Phys. 62, 257 (2009 ).
  • ⁇ -beams can generally only be shaped by so-called collimators, which basically block parts of the beam with a very accurately shaped ⁇ -absorbing material such as lead.
  • collimators basically block parts of the beam with a very accurately shaped ⁇ -absorbing material such as lead.
  • simply blocking the part of the initial beam that does not fit the desired criteria implies that a large fraction of the initial ⁇ -beam is discarded, making this way of collimation inherently inefficient.
  • the problem underlying the invention is to provide a method and means for manipulating a beam of ⁇ -photons.
  • This problem is solved by using one or more refractive optical elements for one or more of shaping, deflecting, guiding by total internal reflection and monochromatizing a beam of ⁇ -photons having an energy for which the energy dependent index of refraction of the material of said refracted optical element has a real part that is larger than 1.
  • the energy of the ⁇ -photons is larger than 100 keV, preferably larger than 300 keV, more preferably larger than 500 keV, larger than 700 keV and larger than 1 MeV.
  • a focusing lens of claim 10 a focusing lens array of claim 11, a Fresnel lens or, a Fresnel zone plate of claim 13 and a monochromator of claim 14.
  • Preferred embodiments are defined in the dependent claims.
  • ⁇ photo In the x-ray regime, ⁇ photo is negative, i.e. the index of refraction n is smaller than 1.
  • a typical value of ⁇ photo at 80 keV and aluminum is -0.8 x 10 -7 .
  • refractive optical elements for use with x-rays are complementary to what one knows from ordinary glass optics for visible light, in the sense that e.g. a focusing lens for x-rays would have a concave shape instead of a convex shape as is familiar from "classical” optics, i.e. from the IR, visible or UV regime.
  • ⁇ photo - 2.70 * ⁇ 2 * ⁇ * Z A * 10 - 6
  • ⁇ is the wavelength measured in angstrom
  • ⁇ is the density in g/cm 3
  • Z is the atomic number
  • A is the atomic mass in g.
  • Equation (1) The second observation made from equation (1) is that with decreasing wavelength, i.e. increasing photon energy, ⁇ photo converges quadratically towards 0, as mentioned above. For this reason, it is currently believed that beyond approximately 200 keV, ⁇ becomes prohibitively small such as to allow for any practically useful refractive optical elements.
  • the inventors have now found in very precise and quite involved experiments that surprisingly, for energies beyond some threshold, the value of ⁇ increases again and in fact acquires a positive value.
  • the index of refraction is > 1 again, and the value of ⁇ , i.e. the difference of n from unity, is large enough to allow for the design of useful refractive optical elements.
  • the exact value of the threshold where ⁇ turns positive will depend on the material used. For Si, experiments presented below demonstrate that at about 700 keV, ⁇ becomes positive and in fact acquires a value that is sufficiently large to allow for the design of useful refractive optical elements.
  • the threshold will be low. According to theoretical considerations, it is believed that for high-Z materials like Thorium, the threshold may be as low as about 100 keV only.
  • the use employs the fact that the index of refraction n of the optical material has a real part > 1, or, in other words, that ⁇ > 0.
  • the design of the optical elements will be different from refractive x-ray optical elements and conceptually in fact more similar to ordinary light optics.
  • refractive optical elements for ⁇ -photons having an energy of more than 700 keV a focusing lens would have a convex shape, whereas an x-ray focusing lens has a concave shape.
  • the shaping of the ⁇ -beam comprises one or more of the following:
  • a collimation is understood to shape a diverging beam to a less diverging, preferably parallel beam.
  • the ⁇ -beam may be focused or collimated using a convex lens or a plurality of convex lenses arranged in series, each convex lens having at least one, preferably two lens surfaces having a shape that is convex in at least one dimension.
  • An example of a lens surface having a shape that is "convex in one dimension" would be a cylindrical lens which has a lens surface that is convex in a plane perpendicular to the cylinder axis but free of curvature in a plane parallel to the cylinder axis.
  • Such lenses are also referred to as "1-D-lenses" and 1-D-lenses are sometimes advantageous from a manufacturing point of view, since they can for example be manufactured by vertically etching the lens surface from a wafer, as will be explained in more detail below.
  • a lens with a lens surface that is convex in only one dimension would only focus the ⁇ -beam in one dimension.
  • the convex lens has at least one, preferably two lens surfaces having a convex shape in two dimensions, and in particular, a rotation-ellipsoid shape.
  • a 2-D-lens Such lens is referred to as a 2-D-lens, as it can focus the ⁇ -beam in two dimensions.
  • the convex lens is made from an embossed foil comprising one of Be, Al, Ni, Ta or Th as its main constituents. By embossing the foil, two-dimensional lenses can be manufactured easily and efficiently and with great precision of about 5 nm.
  • 2-D- ⁇ -lens could also be made by micromachining.
  • the tangential radius R at the apex of the lens is ⁇ 2000 ⁇ m, preferably ⁇ 1000 ⁇ m and more preferably between 5 ⁇ m and 500 ⁇ m.
  • the tangential radius R at the apex of the lens is ⁇ 2000 ⁇ m, preferably ⁇ 1000 ⁇ m and more preferably between 5 ⁇ m and 500 ⁇ m.
  • radii down to 1 ⁇ m can be used.
  • a number N of said convex lenses are arranged in series, for example stacked one behind the other in a lens holder.
  • N is preferably between 2 and 10000, more preferably between 10 and 200.
  • the number of optical elements that can be arranged in series such as to accumulate the refractive effect of the individual refractive optical elements but still at a moderate total absorption is much higher for ⁇ -radiation than for x-ray radiation.
  • the body of said lens has a hole for ventilation, to thereby prevent the formation of air cushions and to avoid bending of the lens when mounting the lens array.
  • the shape of the hole is not limited, as long as it allows for sufficient ventilation.
  • the ⁇ -beam is focused or collimated by an array of lenses, wherein said array of lenses comprises at least one series arrangement of lenses allowing for being consecutively passed by a ⁇ -beam, and wherein at least the majority of the lenses has at least one, preferably two lens surfaces having a convex shape in at least one dimension.
  • the "series arrangement” of lenses could be an arrangement of lenses along their optical axes.
  • the term “lens surface” refers to the "entrance surface” and "exit surface” of the lens.
  • the mean radius of curvature of the convex shape or the tangential radius at the apex of the convex shape is preferably between 1 ⁇ m and 500 ⁇ m, preferably between 10 ⁇ m and 80 ⁇ m.
  • the convex lens surface may have a conical shape (in case of a 2-D-lens) or a triangular prism-like shape (in case of a 1-D-lens), in which case no tangential radius at the apex of the convex shape is defined, but a prism angle instead.
  • we refer to the mean radius of curvature of the convex shape which is defined as the radius of an arch or a sphere containing the apex and an edge portion of the lens surface.
  • a number N of lenses are arranged in series such as to be consecutively passed by a ⁇ -beam, wherein N ⁇ 10, preferably N ⁇ 100 and more preferably, N ⁇ 300. In some applications N may even be ⁇ 1000.
  • N may even be ⁇ 1000.
  • the array of lenses comprises a number M of series arrangements of lenses arranged in parallel, wherein M ⁇ 2, preferably M ⁇ 4 and more preferably M ⁇ 10.
  • M ⁇ 2 preferably M ⁇ 4 and more preferably M ⁇ 10.
  • the lens array is at least in part made from one or more wafers, in particular Si and/or Ge wafers, in which the lens surfaces are formed by etching.
  • Si and/or Ge provide a sufficient index of refraction to construct useful refractive optical elements therefrom.
  • the advantage of using Si and/or Ge is that one can resort to well-established lithography and etching technology, in particular electron beam lithography, to efficiently and precisely manufacture miniature structures, thereby allowing to manufacture arrays of very large numbers of lenses with a very small radius of curvature in a cost efficient way. Also, due to this manufacturing, the individual lenses can be aligned very precisely.
  • the one or more wafers has/have a thickness between 20 ⁇ m and 200 ⁇ m, preferably between 50 ⁇ m and 100 ⁇ m. If the thickness is below 100 ⁇ m, it is possible to etch precise vertical walls constituting the lens surfaces, for example by ion beam deep etching or the like. Note that alternative manufacturing methods, including improved methods that will become available in the future are also possible.
  • the lens array is at least in part made from a stack of a plurality of identically etched wafers, wherein the wafers of the stack are preferably grown or fused together. This allows obtaining a total thickness of the stack of wafers of for example 5 mm or more, preferably 8 mm or more, thereby allowing to shape a ⁇ -beam having a corresponding beam width. If desired, even larger stacks of identically etched wafers can be formed.
  • the lens surfaces have a convex shape only in one dimension, i.e. are 1-D lenses only.
  • the lens array can only focus a ⁇ -beam in the plane of the wafer but not in a plane perpendicular to the wafer plane.
  • the ⁇ -beam is focused or collimated by two arrays of lenses according to one of the embodiments described above, which are arranged in series and are oriented with respect to each other such that each of the two lens arrays focuses or collimates a ⁇ -beam within different planes, such as two perpendicular planes.
  • the ⁇ -beam is deflected by an array of prisms, wherein the array of prisms comprises at least one series arrangement of prisms allowing for being consecutively passed by a ⁇ -beam.
  • a number N of prisms are arranged in series, such as to be consecutively passed by a ⁇ -beam.
  • N may be ⁇ 2, preferably ⁇ 10 and more preferably ⁇ 100.
  • the suitable number of N also depends on the angle of the prism. However, if desired, the number of prisms arranged in series can be easily increased to hundreds or even thousands, in view of the comparatively small absorption of ⁇ -radiation in matter.
  • At least the majority of prisms in the array of prisms has a wedge-shape with a base surface having a triangular shape.
  • the height of the triangular shape is preferably smaller than 200 ⁇ m, preferably smaller than 50 ⁇ m.
  • the base surface may further have an isosceles triangle shape, wherein the angle ⁇ between the two equal sides of said isosceles triangle is preferably between 5° and 120°, more preferably between 15° and 90°.
  • the array of prisms may also comprise a number M of series arrangements of prisms arranged in parallel, wherein M ⁇ 2, preferably M ⁇ 4 and more preferably M ⁇ 10. Again, this allows deflecting a large diameter beam with a suitably large number of series arrangements of comparatively small prisms arranged in parallel.
  • the array of prisms is likewise preferably at least in part made from one or more wafers, in particular Si and/or Ge wafers, in which the prisms are formed by etching.
  • the one or more wafers has/have a thickness between 20 ⁇ m and 200 ⁇ m, preferably between 50 ⁇ m and 100 ⁇ m, and the array of prisms may at least in part be made from a stack of a plurality of identically etched wafers wherein said wafers of said stack are preferably grown or fused together such as to yield a total thickness of the stack of 5 mm or more, preferably 8 mm or more.
  • a lens array and a prism array each according to one of the embodiments described above, can be combined in a refractive optical element.
  • the refractive optical element may comprise a lens array as described above that is configured for separating a ⁇ -beam into individual beamlets and focusing the individual beamlets by means of a plurality of series arrangements of lenses arranged in parallel.
  • the refractive optical element may further comprise a prism array as described above, that is arranged such as to receive and deflect the individual beamlets.
  • the individual beamlets may be deflected by the array of prisms such as to converge the individual beamlets at a common focal point or focal area.
  • the ⁇ -beam is shaped using a one-dimensional or two-dimensional Fresnel lens.
  • a two-dimensional Fresnel lens can be used for focusing or collimating a ⁇ -beam.
  • the Fresnel lens has a convex shape in its central zone, wherein the radius of curvature in the central zone is preferably between 1 ⁇ m and 200 ⁇ m.
  • the "radius of curvature” may refer to the mean radius of curvature in the central zone or the radius of curvature at the apex of the central zone.
  • the advantage of a Fresnel lens is that it allows reducing lens material and hence limits the absorption of ⁇ -energy by the lens. Preferably, after each phase advance by 2 ⁇ , a jump back in thickness occurs.
  • a ⁇ -beam is shaped using a Fresnel zone plate having zones of at least two different materials with different values of atomic number Z and atomic mass A, thus leading to a different phase advance.
  • the ⁇ -beam may be focused or collimated using a Fresnel zone plate, wherein the central zone is a zone of larger optical phase advance ⁇ .
  • the ⁇ -beam is provided by a Compton back-scattering of laser light from an electron beam.
  • Generating a ⁇ -beam by Compton back-scattering leads to ⁇ -beams having comparatively small opening angles and energy spread.
  • the apparative effort necessary for this type of ⁇ -beam generation is still moderate.
  • the refractive optical elements as described herein can be ideally employed in combination with a ⁇ -source generating a ⁇ -beam by Compton back scattering of laser light from an electron beam.
  • seeded quantum FEL ⁇ -beams with much improved brilliance become possible.
  • novel refractive optical elements for use with ⁇ -photons can further be employed in combination with diffractive optical means.
  • a very important example of such a combination is a novel monochromator for monochromatizing a beam of ⁇ -photons. While the monochromator is discussed with reference to ⁇ -photons in the following, it is emphasized that the same design can also be used for x-ray photons or low energy neutrons In particular, the monochromator disclosed herein can be used for photons having energies as low as 10 keV and neutrons having energies below 1 eV.
  • the monochromator comprises a plurality of pairs of Laue-crystals, each pair of Laue-crystals having
  • the first Laue-crystals of all pairs of Laue-crystals are parallel to each other and the second Laue-crystals of all pairs of Laue-crystals are parallel to each other as well.
  • the first Laue-crystals of the pairs of Laue-crystals are arranged in series with refractive deflection means arranged inbetween such that the part of the beam that is transmitted without diffraction by one of said first Laue-crystals is deflected prior to impinging on the next first Laue-crystal in said series of first Laue-crystals.
  • Laue-diffraction is equivalent to "Bragg-reflection", except that the diffracted beam passes through the crystal.
  • a Laue-diffraction can be regarded as a Bragg-reflection at crystal planes that are vertical to the crystal surface.
  • Laue-diffracted at the first Laue-crystal is Laue-diffracted at the first Laue-crystal.
  • the remainder of the beam that does not satisfy the Bragg-condition will simply be transmitted without diffraction by the first Laue-crystal.
  • Laue-condition and Bragg-condition are equivalent and are hence used interchangeably herein.
  • the planes of the two crystals are parallel, too, so that all wavelengths and angles that are diffracted by the first crystal simultaneously satisfy the Bragg-condition at the second crystal and are diffracted likewise.
  • the second Laue-crystal When the second Laue-crystal is, however, inclined with regard to the first Laue-crystal by e.g. twice the Bragg-angle of the desired wavelength (energy), only the photons with the corresponding wavelength will obey the Bragg-condition at the second crystal as well and hence be diffracted, while photons with other wavelengths will be transmitted without diffraction by the second Laue-crystal.
  • This configuration of the Laue spectrometer is called the "dispersive mode" for obvious reasons and inherently acts as a monochromator with a very narrow rocking curve and very small band width of typically 10 -6 .
  • the efficiency of such a monochromator is very limited, since the first Laue-crystal is very selective with regard to impinging angles in the sense that only photons within a very limited angular range will actually be diffracted by the first Laue-crystal. What is more, the angular range that is "accepted" by the first Laue-crystal decreases with energy. For ⁇ -energies above 700 keV that are of particular interest in the framework of the present invention, this means that only ⁇ -beams deviating from the Bragg-angle by several 10 nrad will actually be "accepted", i.e. diffracted by the first Laue-crystal.
  • a plurality of pairs of Laue-crystals is employed, each pair having a first and a second Laue-crystal.
  • the first Laue-crystals of all pairs of Laue-crystals are arranged in series with refractive deflection means arranged inbetween such that the part of the beam that is transmitted without diffraction by one of the first Laue-crystals - because it may be outside the angular acceptance range of said first Laue-crystal - is deflected prior to impinging on the next first Laue-crystal in said series.
  • the refractive deflection means arranged between consecutive first Laue-crystals in said series of first Laue-crystals are adapted to deflect the beam by an angle ⁇ that is larger than but still reasonably close the angular acceptance width of the first Laue-crystal for the desired ⁇ -photon energy.
  • the angle ⁇ is given by 5 nrad ⁇ ⁇ ⁇ 200 nrad, preferably 10 nrad ⁇ ⁇ ⁇ 100 nrad
  • the number of pairs of Laue-crystals employed in the monochromator is at least 5, preferably at least 10 and more preferably at least 50.
  • the first and second Laue-crystals of each pair of Laue-crystals are either parallel to each other, which corresponds to the non-dispersive mode, or inclined with respect to each other such as to allow for an energy selection by two consecutive Laue diffractions, and in particular inclined by twice the Bragg-angle of the desired wavelength.
  • the dispersive geometry is preferably used for monochromatization, while the non-dispersive mode may be used to align all optical elements, in particular the deflection means.
  • the first and second Laue-crystals are shiftable between the two configurations. This will for example allow precisely adjusting the refractive deflection elements in the parallel mode and then decreasing the energy width by shifting the first and second Laue-crystals with respect to each other to the dispersive geometry.
  • all first Laue-crystals are part of one fixed first unit, and all second Laue-crystals are part of one fixed second unit.
  • the first and second units are preferably each made from a single crystal block, as this ensures that all first crystals and all second crystals are mutually parallel with each other.
  • both blocks are taken from the same ingot, which allows for a perfect match of the first and second Laue-crystals.
  • the Laue-crystals may in particular consist of Si and/or Ge.
  • a collimating lens, lens stack or lens array is arranged upstream of the monochromator such as to parallelize or at least reduce the divergence of the beam prior to entering the monochromator. This way, the efficiency of the monochromator can be dramatically increased.
  • one of the collimating lenses, lens stacks or lens arrays described above may be employed.
  • the geometry will rather be such that a beam that has already been Laue-diffracted by a first (second) Laue-crystal of one pair passes a first (second) Laue-crystal of another pair of Laue-crystals for the practical reasons that it is difficult to keep these Laue-crystals of the further pair out of the way of the diffracted beam.
  • all first (second) Laue-crystals are parallel to each other, this would imply that the already Laue-diffracted beam is Laue-diffracted at the fist (second) Laue-crystal of this other pair of Laue-crystals again.
  • this is prevented by ensuring that a beam that has already been Laue-diffracted by a first (second) Laue-crystal of one pair is deflected using a refractive optical element prior to passing a first (second) Laue-crystal of another pair of Laue-crystals. This way, it can be ensured that the beam is diffracted only once at a first Laue-crystal and once at a second Laue-crystal forming the abovementioned pair of Laue-crystals.
  • the refractive optical elements arranged between two adjacent first Laue-crystals for deflecting a beam transmitted without diffraction by the previous first Laue-crystal in said series are arranged to also deflect the beam that is Laue-diffracted by said previous first Laue-crystal. Accordingly, this way it can be ensured that the Laue-diffracted beam is not Laue-diffracted at any further first Laue-crystal in said series, because after deflection, i.e. an angle change, it no longer obeys the Bragg-condition.
  • the first and second Laue-crystals are arranged in the monochromator such that the first and second Laue-crystals of each pair are adjacent to each other.
  • first and second Laue-crystals are arranged in the monochromator such that all first Laue-crystals are arranged in a series and all second Laue-crystals are arranged in a further series that is arranged downstream of the series of first Laue-crystals with regard to the propagation direction of the beam. Further, first refractive deflection means are placed between each two neighbouring first Laue-crystals, and second refractive deflection means are placed between each two neighbouring second Laue-crystals.
  • the second refractive deflection means in the n th gap between neighbouring second Laue-crystals when counted in opposite propagation direction of the beam is adapted to compensate for the deflection provided by the first refractive deflection means in the n th gap between neighbouring first Laue-crystals when counted in propagation direction of the beam.
  • each beam that is Laue-diffracted at any first Laue-crystal may pass through all downstream first and second Laue-crystals while it is still ensured that it is only Laue-diffracted by the corresponding second Laue-crystal of the pair.
  • the most upstream one of the first Laue-crystals and the most downstream one of the second Laue-crystals form a pair
  • the second most upstream one of the first Laue-crystals and the second most downstream one of the second Laue-crystals form a further pair and so on.
  • the present invention is based on the surprising finding that for ⁇ -energies larger than some material dependent threshold, the real part of the index of refraction is larger than unity and in fact differs from unity by a sufficient extent, such as to allow for the construction of refractive optical elements.
  • this threshold is at approximately 700 keV
  • the inventors have performed index of refraction measurements at the GAMS double crystal spectrometer at the high-flux reactor of the Institute Laue - Langevin (ILL) in Grenoble.
  • the spectrometer is installed at the exit "H7" of the tangential beam tube "H6/H7".
  • Samples for the creation of ⁇ -radiation have been placed in a thermal neutron flux of 4x10 5 s -1 cm -2 .
  • three samples with a total mass of 10 g and a surface of about 30 cm 2 were used.
  • the samples When exposed to the neutron flux, the samples undergo a thermal neutron capture reaction and consequently emit monochromatic ⁇ -beams, wherein the energy of the ⁇ -photons depends on the chemical and isotopic composition of the sample.
  • the emission rates of a particular ⁇ -energy can be as high as 10 15 s -1 .
  • the ⁇ -beam emerging from the sample was collimated over a total distance of 17 m with a cross section of 4x20 mm 2 and then fed into the GAMS double crystal spectrometer 10 that is schematically shown in Fig. 1 .
  • Fig. 2 a schematic top view of the double crystal spectrometer 10 with and without a prism 18 placed in the beam path are shown.
  • the GAMS spectrometer was developed over many years as an ultra high resolution ⁇ -spectrometer for measuring of, for example, absolute wavelength standards or neutron binding energies, see E.G. Kessler et al., Nucl Inst. Meth. A 45 7, 187 (2001 ).
  • the double crystal spectrometer 10 comprises two perfect single crystals 12, 14.
  • the lattice spacing d of the crystals 12, 14 is known to be homogeneous with ⁇ d / d ⁇ 10 -7 .
  • the ⁇ -beam impinging on the first crystal 12 is shown at reference sign 16.
  • the ⁇ -beam 16 consists of two parts that are symbolically represented by individual rays 16a, 16b, of which one part 16b passes a prism 18 arranged between the crystal slabs 12 and 14, while the other part 16a bypasses the prism 18.
  • the first crystal 12 is used to select a proper energy and to obtain a ⁇ -beam with an extremely low divergence of approximately 10 nrad .
  • the second crystal 14 is rotated stepwisely through a small angular range around the Bragg-angle, which is also referred to a "rocking" of the second crystal.
  • the intensity profile of the ⁇ -beam that is Laue-diffracted at the second crystal 14 is recorded as a function of crystal angle using a Ge detector.
  • the corresponding measured intensity versus rocking angle profile for one ⁇ -photon energy is shown in Fig. 3 , where the upper curve represents the intensity profile of beam 16a that bypassed the prism 18 and the lower curve corresponds to the intensity profile of the beam part 16b that was deflected by the prism 18.
  • Fig. 3 the angle is measured by a number of optical fringes in a way further explained in the article by E.G. Kessler et al. cited above.
  • the two rocking curves for the beam portions 16a and 16b are shifted with respect to each other in angular space, which is due to a deflection of beam portion 16b in the prism 18. From this deflection, the index of refraction of the material of the prism 18 can be determined for the respective ⁇ -energy.
  • the switching between the beam parts 16a and 16b was effected with a lead shutter that was installed on the collimation system behind the spectrometer 10. This ensures that the movement of the lead shutter is mechanically decoupled from the spectrometer 10.
  • Fig. 5 shows the energy dependent cross sections for the photo effect, Rayleigh scattering, Compton scattering and pair creation as known from experiment and available in the literature. Further, in the dotted curve, Fig. 5 shows a "corrected pair creation" cross section that has been recently measured close to the threshold by one of the inventors (M. Jentschel et al., accepted for publication in Phys. Ref. C Rapid Communications). Finally, Fig. 5 also shows the estimated cross sections due to the elastic and inelastic virtual pair creation, which is referred to as "Delbrück scattering" in the following.
  • ⁇ photo i.e. the contribution due to the coherent virtual photo effect
  • equation (1) has been taken from experimental measurements, i.e. equation (1).
  • the surprising and non-obvious behaviour of the index of refraction discovered by the inventors calls for new designs of optical elements that are currently not used.
  • focusing lenses for x-rays have been developed in the past, they cannot be employed for focusing ⁇ -photons beyond say 700 keV, because the qualitative behaviour of the index of refraction changes as compared to the x-ray regime.
  • the dominant contribution to the index of refraction in the x-ray regime ⁇ photo has a negative sign, meaning that the real part of the index of refraction is smaller than one.
  • a cross section ( Fig. 8(a) ) and a perspective view ( Fig. 8(b) ) of a 2-D focusing ⁇ -lens according to an embodiment of the invention is shown.
  • the ⁇ -lens is "two-dimensional" in the sense that it is optically active in two dimensions, meaning that the lens surfaces are curved in two orthogonal sections A-A (shown in Fig. 8(a) and B-B (not shown).
  • This means that a ⁇ -beam will be focused in two dimensions, such as to converge to a focal "point".
  • the lens 22 is made from a nickel foil that is squeezed between two profiled pistons to acquire the convex shape that is particularly apparent from Fig. 8(a) .
  • the lens surfaces 24 and 26 of the lens 22 have a rotational ellipsoid shape that is characterized by an inscribed tangential radius at its apex 30.
  • the radius R at the apex 30 is smaller than 2000 ⁇ m, preferably smaller than 1000 ⁇ m and preferably between 5 ⁇ m and 500 ⁇ m. The smaller the radius of curvature (i.e. the larger the curvature), the smaller the focal length.
  • the lens 22 has mounts 32 at two sides, which may have a length of about 10 mm. With these mounts, a plurality of lenses 22 can be stacked one behind the other in a lens holder (not shown), to thereby add up the focusing power of multiple lenses. In practice, several hundreds or even a thousand of lenses 22 can be manufactured and stacked one behind the other.
  • a hole 34 for ventilation is provided in the body of the lenses 22, thereby preventing a deformation of the lenses 22 when the lens stack is evacuated.
  • Fig. 9 a schematic plan view ( Fig. 9(a) ) and a schematic perspective view ( Fig. 9(b) ) of an array 36 of 1-D lenses is shown.
  • the lens array 36 is comprised of three series arrangements 38a, 38b, 38c of lenses 40 that are arranged in series for being consecutively passed by a ⁇ -beam.
  • N 6 lenses 40 are arranged in series in each of the series arrangements 38a, 38b, 38c, however, the number N may in practice be much larger, i.e. N ⁇ 10, preferably N ⁇ 100 and more preferably N ⁇ 300, in order to increase the refractive power of the lens array 36.
  • Each of the lenses 40 constituting the lens array 36 has two lens surfaces 42, 44 that have a convex shape in one dimension only.
  • the convex shape can be seen in the plan view of Fig. 9(a) , the shape having a tangential radius R at the apex of each lens surface 42, 44 of between 1 ⁇ m and 500 ⁇ m, preferably between 10 ⁇ and 80 ⁇ m.
  • This means that ⁇ -beams 46 as shown in Fig. 9(a) will only be focused in the paper plane of Fig. 9(a) , but not within a plane vertical to the paper plane of Fig. 9(a) . Accordingly, when the lens array 36 of Fig.
  • a ⁇ -beam 46 would be focused onto a line rather than onto a focal point.
  • two lens arrays 36 could be arranged in series one after the other and rotated by 90° with respect to each other such as to achieve a focusing in two dimensions.
  • the lens array 36 of Fig. 9 can be made from a wafer, such as an Si and/or Ge wafer by vertical etching, thereby leading to the vertical wall parts of the lens surfaces 42, 44.
  • a wafer such as an Si and/or Ge wafer by vertical etching, thereby leading to the vertical wall parts of the lens surfaces 42, 44.
  • first a mask is generated by electron beam lithography.
  • the material between neighbouring lenses 40 is etched for example by ion beam deep etching.
  • the wafer thickness is between 20 ⁇ m and 100 ⁇ m and more preferably between 50 ⁇ m and 200 ⁇ m. With these thicknesses, precise vertical walls can still be etched.
  • a plurality of identical lens arrays 36 as shown in Fig. 9 can be manufactured and then stacked one on top of the other to thereby increase the total thickness of the lens array 36.
  • the wafers in the stack can be grown or fused together. This way, a total thickness of a lens array 36 of more than 5 mm or even more than 8 mm can be achieved.
  • Fig. 10(a) a plan view and in Fig. 10(b) a perspective view of an array 48 of triangular prisms 50 is shown.
  • the triangular prisms 50 have an isosceles triangle shape, wherein the height (h) of the triangle shape is smaller than 200 ⁇ m, preferably even smaller than 100 ⁇ m and more preferably even smaller than 50 ⁇ m, as miniaturizing again allows for increasing the number of prisms 50 to accommodate in the array and hence for increasing the total refractory power.
  • the prisms 50 are also referred to as "wedges" or "microwedges” in the following.
  • the wedge array 48 of Fig. 10 is likewise etched from a semiconductor wafer, in particular Si and/or Ge. Accordingly, the thickness of the wedges of Fig. 10 corresponds to the thickness of the wafer, which is again typically between 20 ⁇ m and 200 ⁇ m. As before, a plurality of identical wedge arrays 48 can be stacked on top of each other, to thereby produce a thicker wedge array 48 having a thickness of several millimetres or even beyond a centimeter.
  • the wedge array 48 of Fig. 10 is also comprised of a number M of series arrangements 52a, 52b, 52c of wedges that are arranged in parallel, where the number M can again be chosen as desired.
  • each series arrangement 52a, 52b, 52c of wedges 50 contains a number N of wedges 50 arranged in series such as to be consecutively passed by a ⁇ -beam.
  • the number N will depend on the total deflection angle that is intended. From a manufacturing point of view, hundreds of or even a thousand wedges 50 can be easily provided in each arrangement of prisms 52a, 52b, 52c.
  • a combination of a lens array 36 of the kind shown in Fig. 9 and two wedge arrays 48 of the kind shown in Fig. 10 is schematically shown.
  • the lens array 36 can cover an incoming ⁇ -beam 46 having a diameter that is much larger than the diameter of any individual lens 40.
  • the plurality of series arrangements of lenses 36a to 36f separates the ⁇ -beam 46 into a corresponding number of beamlets 54a to 54f and focuses the same.
  • each of the beamlets 54a to 54f is only focused in one dimension.
  • the beamlets 54a-f could as well be focused in two dimensions.
  • two wedge arrays 48 are shown, which deflect the individual beamlets 54a-f.
  • the wedge arrays 48 could be devised such as to focus individual beamlets 54a-f onto a line.
  • the angles of wedges 50 in different series arrangements of prisms 52a to 52c can be adjusted accordingly.
  • Fig. 11 demonstrates how the invention allows to focus a ⁇ -beam having a comparatively large diameter onto a narrow line or a narrow spot using a plurality of microscopic optical elements, in particular small convex lenses 40 having very small radii of curvature and microwedges 50.
  • a plurality of microscopic optical elements in particular small convex lenses 40 having very small radii of curvature and microwedges 50.
  • Fig. 12(a) and (b) show a plan view and a perspective view of a one-dimensional Fresnel lens 56.
  • the general design is similar to what is known from light optics, although of course with a much smaller radius of curvature.
  • the radius of curvature at the apex of the central zone 58 is smaller than 200 ⁇ m, preferably even smaller than 100 ⁇ m.
  • the Fresnel lens 56 similar to classical optics, seeks to avoid thick lenses with an excessive use of material and absorption by a step design.
  • the shape of the lens is continued from the ground surface.
  • ⁇ on the order of 10 -12 m and ⁇ on the order of 10 -9 the typical height h of the Fresnel lens 56 would be on the order of 1 mm.
  • Fig. 12(c) shows a similar design but for a 2-D-lens.
  • Fig. 13 shows a Fresnel zone plate having zones of at least two materials with different values of atomic number Z and atomic mass A, thus leading to a different phase advance ⁇ .
  • the central zone is a zone of larger phase advances ⁇ (namely Au) as compared to the material of smaller phase advance, Si.
  • the novel refractive optical element for use with ⁇ -photons described in the present invention can also be employed in combination with diffractive means.
  • An important example of this combination is a novel monochromator that will be described with reference to Figs. 15 to 21 .
  • the double crystal spectrometer 10 of Fig. 1 that has been used in the experimental measurement of the index of refraction for ⁇ -beams is explained in more detail with reference to Fig. 14.
  • Fig. 14 has been taken from E.G. Kessler et al., Nucl Inst. Meth. A 457, 187 (2001 ).
  • Fig. 14 has been taken from E.G. Kessler et al., Nucl Inst. Meth. A 457, 187 (2001 ).
  • the first and second crystals 12, 14 are referred to as "Laue-crystals" in the following, because they allow for a Laue-diffraction of the ⁇ -beams at the crystal.
  • the Laue-diffraction is the analogue of a Bragg-reflection except that the lattice planes involved in the diffraction are vertical with respect to the crystal surface onto which the radiation impinges rather than parallel to it, as is the case in Bragg-reflection.
  • the angle satisfying the Laue-condition is therefore also often referred to as the Bragg-angle.
  • Fig. 14 shows the two-crystal spectrometer 10 in the non-dispersive geometry, in which the first and second Laue-crystals 12, 14 are parallel to each other.
  • the portion of the incoming ⁇ -beam that satisfies the Bragg-condition with regard to angle and wavelength, i.e. energy, is Laue-diffracted at the first Laue-crystal 12.
  • the remainder of the beam that does not satisfy the Bragg-condition will simply be transmitted without diffraction by the first Laue-crystal 12 (undiffracted transmitted beam not shown in Fig. 14 ).
  • the crystal planes within the two crystals 12, 14 are parallel and consequently all wavelengths that are diffracted by the first Laue-crystal 12 will simultaneously satisfy the Bragg-condition at the second Laue-crystal 14 and will likewise be diffracted.
  • the second Laue-crystal 14 is inclined with regard to the first Laue-crystal 12 by twice the Bragg angle of a given wavelength ⁇ .
  • photons deviating from ⁇ that have been Laue diffracted by the first Laue-crystal 12 do no longer meet the Bragg-condition at the second Laue-crystal 14 and will therefore be transmitted without diffraction by the second Laue-crystal 14 (undiffracted transmitted beam not shown).
  • the two-crystal spectrometer 10 acts as a monochromator, since the photons which are Laue-diffracted by the second Laue-crystal 14 are within a very narrow energy band.
  • the efficiency i.e. the fraction of photons of the original beam within a certain wavelength range ⁇ ⁇ ⁇ that pass the monochromator, is strictly limited for the following reasons.
  • A is a parameter that is linearly dependent on the wavelength and crystal thickness and further dependent on material and orientation specific parameters. From the above equation, it is easily demonstrated that the width of I( ⁇ ) is proportional to ⁇ meaning that the intensity-angle-profile I( ⁇ ), which is also referred to as the "rocking curve", becomes very narrow for large energies.
  • Example calculations of I( ⁇ ) for a 2.5 mm thick single crystal of Si in [220] orientation are shown in Fig. 15 for photons of 100 keV, 500 keV and 1000 keV. As can be seen, the width of theses curves decreases with energy and can be as small as a few tens of nanoradiants (nrad).
  • the width of I( ⁇ ) can be called the "acceptance with” of the single crystal, since it defines an angular range of photons of the given wavelength ⁇ that will be “accepted” by the crystal in the sense that it is Laue-diffracted thereby. Conversely, this means that radiation impinging at an angle outside this acceptance range will not be Laue-diffracted by the first Laue-crystal 12, even if it has the desired energy (the appropriate wavelength ⁇ ) and will hence be lost for the monochromator of Fig. 14 .
  • Fig. 16 is a schematic representation of a monochromator 60 according to an embodiment of the present invention.
  • the monochromator 60 comprises three pairs of Laue-crystals, 62a/62b, 64a/64a, 66a/66b which in combination each form a two-crystal spectrometer 10 in the dispersive geometry as shown on the right hand side of Fig. 14 . All the first Laue-crystals 62a, 64a, 66a of all pairs of Laue-crystals 62a/62b, 64a/64a, 66a/66b are parallel to each other.
  • all the second Laue-crystals 62b, 64b, 66b of all pairs of Laue-crystals 62a/62b, 64a/64a, 66a/66b are parallel to each other.
  • the first Laue-crystals 62a, 64a, 66a of the pairs of Laue-crystals 62a/62b, 64a/64a, 66a/66b are arranged in series with refractive deflection means 68 arranged inbetween neighbouring first Laue-crystals 62a, 64a, 66a such that the part of the beam that is transmitted without diffraction by one of the first Laue-crystals 62a, 64a is deflected prior to impinging on the next first Laue-crystal 64a, 66a in the series.
  • the refractive deflection means 68 is symbolically represented by a wedge prism 68 in Fig. 16 , it is understood that in practice the wedge arrays as for example described
  • Panel A of Fig. 17 shows the intensity-angle profile of the incoming beam impinging on the first Laue-crystal 62a of the first pair of Laue-crystals 62a/62b. Only the portion of the beam that fulfils the Bragg-condition with respect to the first crystal 62a will be Laue-diffracted at the first Laue-crystal 62a. However, most of the beam will actually not meet the Bragg-condition and hence be transmitted without diffraction through the first crystal 62a of the first pair of Laue-crystals 62a/62b. This is indeed seen from panel B of Fig.
  • FIG. 17 which shows the intensity-angle profile at location B of Fig. 16 , i.e. the intensity-angle profile of the beam that was transmitted without diffraction through the first Laue-crystal 62a.
  • panel B of Fig. 17 a small angular band of the intensity is missing, corresponding to the narrow angular band that has been Laue-diffracted by the first Laue-crystal 62a.
  • Panel C of Fig. 17 shows the intensity-angle profile at position C just behind the refractive deflection means 68.
  • the shape of the intensity-angle profile has not changed, but it has been shifted in angle space due to the refractive deflection means 68.
  • the beam with the shifted intensity-angle profile impinges onto the first Laue-crystal 64a of the second pair of Laue-crystals 64a/64b.
  • the beam now contains a portion obeying the Bragg-condition with regard to angle and energy again, allowing for a further Laue-diffraction at the first Laue-crystal 64a of the second pair of Laue-crystals 64a/64b.
  • the angular acceptance range for Laue-diffraction is always the same.
  • This procedure can be repeated with many pairs of Laue-crystals, where in each case the part of the beam that is transmitted without diffraction by the previous first Laue-crystal is deflected prior to impinging on the next first Laue-crystal in the series. Since only the Laue-diffracted portion of the beam adds to the output of the monochromator 60, it is seen that the efficiency of the monochromator 60 is thereby increased. When neglecting the losses within the multiple pairs of Laue-crystals and the refractive deflection means, the efficiency is generally proportional to the number of pairs of Laue-crystals. Herein, it is again advantageous that the absorption of ⁇ -rays in matter is much less than in case of x-rays.
  • Fig. 18 schematically shows the energy and angular distribution of the ⁇ -beam entering the monochromator 60. If only a single pair of Laue-crystals was used, only a small section of the angle-energy range of the impinging beam will be Laue-diffracted, which is schematically indicated by the small square 70 in Fig. 18 . Namely, the small area 70 corresponds to the part of the angle-energy distribution that satisfies the Bragg-condition at the first Laue-crystal 62a, while the rest of the beam is transmitted without diffraction by the first Laue-crystal 62a and would be lost in an ordinary double-crystal spectrometer.
  • the full band 72 of desired energies can be consecutively harvested from the ⁇ -beam, thereby increasing the efficiency of the monochromator 60.
  • the beam that is Laue-diffracted at the second Laue-crystal 62b of the first pair of Laue-crystals 62a/62b does not pass through the second Laue-crystal 64b of the second pair of Laue-crystals 64a/64b.
  • each beam of the desired energy is Laue-diffracted exactly once at a first Laue-crystal 62a, 64a, 66a and once at a corresponding second Laue-crystal 62b, 64b, 66b.
  • Fig. 19 An example of such an arrangement is shown in the monochromator 74 of Fig. 19 .
  • Fig. 19 again three pairs of Laue-crystals 62a/62b, 64a/64b, 66a/66b and refractive deflection means 68 are shown.
  • all first Laue-crystals 62a, 64a, 66a are part of a (fixed) first unit 76 that is made from a single crystal block.
  • all second Laue-crystals 62b, 64b and 66b are part of one fixed second unit 78 and are also made from a single crystal block.
  • both units 76 and 78 are taken from the same ingot, so that the lattice structures ideally match.
  • the refractive deflection means 68 arranged between two adjacent first Laue-crystals 62a/64a, 64a/66a for deflecting a beam transmitted without diffraction by the previous first Laue-crystals 62a, 64a in the series is arranged to also deflect the beam that is Laue-diffracted by the previous first Laue-crystal 62a, 64a. This way, it is avoided that a beam that has been Laue-diffracted at one of the first Laue-crystals 62a, 64a is diffracted at another first Laue-crystal 64a, 66a in the monochromator 74 again.
  • the geometry of the monochromator 74 ensures that a beam that has been Laue-diffracted at one of the second Laue-crystals 62b, 64b is deflected once before passing another second Laue-crystal 64b, 66b, thereby avoiding a further Laue-diffraction at a second Laue-crystal.
  • the tilt angle between the first Laue-crystals 62a, 64a, 66a and the second Laue-crystals 62b, 64b, 66b does not correspond to twice the Bragg-angle, since the angular shift of the refractive deflection means 68 needs to be taken into account.
  • the beams that are Laue-diffracted at the plural second Laue-crystals 62b, 64b, 66b diverge when leaving the monochromator 74, since they have passed different numbers of refractive deflection means 68.
  • these individual beams extracted from the monochromator 74 can be focused to a single spot using an appropriate lens system.
  • a further monochromator 80 is shown, which has the currently most preferred geometry.
  • the monochromator 80 also comprises two units 76, 78, where the first unit 76 contains three first Laue-crystals 62a, 64a, 66a and the second unit 78 contains three second Laue-crystals 62b, 64b, 66b. Note that in the monochromator 80, the first and second units 76, 78 are arranged in series, while in the monochromator 74 of Fig. 19 , they were arranged in an interleaved relationship. That is to say, in the monochromator 80 of Fig.
  • all first Laue-crystals 62a, 64a, 66a are arranged in a series and all second Laue-crystals 62b, 64b, 66b are arranged in a further series that is arranged downstream of the series of first Laue-crystals 62a, 64a, 66a with regard to the propagation direction of the beam.
  • the order of the second crystals 62b, 64b, 66b in the second unit 78 is reversed in the sense that the most upstream first Laue-crystal 62a of the first unit 76 forms a Laue-crystal pair with the most downstream second crystal 62b of the second unit 78 and so on.
  • Refractive deflection means 68 are placed between each two neighbouring first Laue-crystals 62a, 64a, 66a of the first unit 76 in order to provide for the desired angular shift.
  • Further refractive deflection means 82 are placed between each two neighbouring second Laue-crystals 62b, 64b, 66b of the second unit 78.
  • the further refractive deflection means 82 compensate the effects of the refractive deflection means 68 arranged in the first unit 76.
  • the refractive deflection means 68 and 82 could be identical wedge arrays similar to those shown in Fig. 10 but with reversed orientation, as is symbolically shown in Fig. 20
  • the reflection means 82 in the n th gap between neighbouring second Laue-crystals 62b, 64b, 66b when counted in opposite propagation direction of the beam is adapted to compensate for the deflection provided by the deflection means 68 in the n th gap between neighbouring first Laue-crystals 62a, 64a, 66a when counted in propagation direction of the beam.
  • each of the monochromators 60, 74 and 80 is further increased if the inherently diverging beam is made less diverging or even parallelized prior to entering the monochromator 60, 74, 80.
  • the collimation lenses, lens stacks or lens arrays discussed above with reference to Figs. 8 , 9 , 12 and 13 can be ideally used. Note in this regard that a focusing lens acts as a collimation lens if the source of the diverging beam is placed in the focal point of the lens.
  • a schematic perspective view of a Laue-crystal unit 84 is shown, that could be used as one of the units 76 or 78 of Fig. 20 .
  • the unit shows three Laue-crystals 62, 64, 66 which are made from one ingot. Further shown are the refractive deflection means 68, which are formed by wedge arrays 68 in the present example. Note that Fig. 21 is also highly schematic and not drawn to scale. Further, the wedge arrays 68 can be adjusted with respect to each other by means of a flexure cut 86 and a piezo actuator 88. By controlling the piezo actuator 88, the relative orientation of the wedge arrays 68 can therefore be adjusted such as to tune the monochromator 80.
  • the monochromator 80 of Fig. 20 is particularly useful in that it allows not only generating a highly monochromatic ⁇ -beam with a comparatively high efficiency, but at the same time parallelizing the outputted ⁇ -beam.
  • the present invention provides various refractive optical means for shaping, deflecting or monochromatizing a beam of ⁇ -photons. This will find many useful applications, some of which are briefly discussed below.
  • beams can be collimated or focused. Accordingly, it is possible to focus ⁇ -beams having a diameter of a few 10 ⁇ m to the submicrometer or even subnanometer regime, leading to a flux increase of 10 6 or more, possibly even up to 10 10 .
  • Such high fluxes are for example important when small targets of expensive separated and/or enriched isotopes are used to efficiently produce radioisotopes for medical applications as is explained in further detail in D. Habs and U. Köster, Appl. Phys. B 103, 501 (2011).
  • a further use for ⁇ -beams with highly increased flux is the excitation of neutron-halo isomers at ⁇ -energies close to the neutron binding energy of typically 7 to 8 MeV, which corresponds to the region of the so-called pygmy resonance.
  • a second short wavelength laser can release cold neutrons resulting in a very brilliant micro neutron beam, see D. Habs et al., App. Phys. B 103 485 (2011 ).
  • the flux increase by focusing the ⁇ -beam would result in an equivalent strong increase of the brilliance of the neutron beam.
  • neutron beams with small diameter ( ⁇ m, nm or even fm) would become available.
  • ⁇ -beams can be used to address the nuclear isotopes.
  • the advantage of ⁇ -beams is that they are much more penetrating than x-rays but still have very large selective cross sections when resonance is met. Accordingly, within large containments, specific isotopes can be addressed with matched ⁇ -optics without destructive sample preparation.
  • the detection of the resonance can be done for example with nuclear resonance fluorescence (NRF) techniques and/or secondary triggered nuclear reactions, such as ⁇ - or ⁇ -decays.
  • NRF nuclear resonance fluorescence
  • ⁇ -beams can be ideally used in microscopy and tomography applications by tuning the ⁇ -energy to nuclear resonances.
  • ⁇ -tomography one can for example examine radioactive waste without having to open the containment, e.g. by looking for absorption in the beam by NRF.
  • ⁇ -tomography methods one can also study complex systems like airplane engines, car batteries, burning rods or nuclear reactors (while under operation) or the like.
  • tomography can also be used to examine medical patients with high isotope selectivity from larger distance.
  • the present inventors are currently working on a project to produce the first ⁇ -FEL (free electron laser) which is expected to lead to even more brilliant ⁇ -beams.
  • a seeding of the electron laser interacting with a partially coherent ⁇ -beam is essential, which becomes possible with the new focusing system described herein.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104681118A (zh) * 2015-02-13 2015-06-03 浙江工业大学 一种焦斑可调的二维x射线平面组合折射透镜

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113030139B (zh) * 2021-05-31 2021-08-13 中国工程物理研究院激光聚变研究中心 一种新型晶体及紧凑型成像装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD133487A1 (de) * 1977-09-20 1979-01-03 Bothe,Hans-Karl,Dd Kristallanordnung zur beugung von roentgen-oder gamma-strahlung
US20080019482A1 (en) * 2006-07-20 2008-01-24 Akio Yoneyama X-ray imaging apparatus and method with an x-ray interferometer
US20100296171A1 (en) * 2009-05-20 2010-11-25 General Electric Company Optimizing total internal reflection multilayer optics through material selection

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE20000595U1 (de) 2000-01-17 2000-03-09 Linde Ag Siphon für ein Warenpräsentationsmöbel

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD133487A1 (de) * 1977-09-20 1979-01-03 Bothe,Hans-Karl,Dd Kristallanordnung zur beugung von roentgen-oder gamma-strahlung
US20080019482A1 (en) * 2006-07-20 2008-01-24 Akio Yoneyama X-ray imaging apparatus and method with an x-ray interferometer
US20100296171A1 (en) * 2009-05-20 2010-11-25 General Electric Company Optimizing total internal reflection multilayer optics through material selection

Non-Patent Citations (23)

* Cited by examiner, † Cited by third party
Title
ALEXEI ERKO, MOURAD IDIR, THOMAS KRIST, ALAN G. MICHETTE: "Modern Developments in X-Ray and Neutron Optics", 2008, SPRINGER BERLIN HEIDELBERG NEW YORK, ISBN: 978-3-540-74560-0, article A. SNIGIREV, I. SNIGIREVA: "Hard X-Ray Microoptics", pages: 260 - 279, XP002690461 *
BETHE; HA. BETHE; F. ROHRLICH ET AL., PHYS. REV., vol. 86, 1952, pages 10
C. G. SCHROER ET AL., PHYS. REV. LET., vol. 1001, 2008, pages 090801
C. HUGENSCHMIDT ET AL., APPL. PHYS. B, 2011
D. HABS ET AL: "Intense, brilliant micro [gamma]-beams in nuclear physics and applications", PROCEEDINGS OF SPIE, vol. 8075, 5 May 2011 (2011-05-05), pages 807507, XP055049819, ISSN: 0277-786X, DOI: 10.1117/12.891512 *
D. HABS; U. KOSTER, APPL. PHYS. B, vol. 103, 2011, pages 501
D.M PAGANIN: "Coherent X-Ray Optics", 2006, OXFORD UNIVERSITY PRESS
D.M. PAGANIN: "Coherent X-Ray Optics", 2006, OXFORD UNIVERSITY PRESS
E.G. KESSLER ET AL., NUCL INST. METH. A, vol. 457, 2001, pages 187
E.G. KESSLER, NUCL INST. METH. A, vol. 457, 2001, pages 187
EG. KESSLER ET AL., NUCL INST. METH. A, vol. 457, 2001, pages 187
F. ROHRLICH ET AL., PHYS. REV., vol. 86, 1952, pages 1
F. ROHRLICH ET AL., PHYS. REV., vol. 86, no. 1, 1952
GERALD K. SKINNER: "Design and Imaging Performance of Achromatic Diffractive-Refractive X-Ray and Gamma-Ray Fresnel Lenses", APPLIED OPTICS, vol. 43, no. 25, 1 January 2004 (2004-01-01), pages 4845, XP055049669, ISSN: 0003-6935, DOI: 10.1364/AO.43.004845 *
H.A. BETHE ET AL., PROC. ROY. SOC. (LONDON, vol. 146, 1934, pages 83
HA. BETHE; F. ROHRLICH, PHYS. REV., vol. 86, 1952, pages 10
HABS ET AL., APP. PHYS. B, vol. 103, 2011, pages 485
HR. WELLER ET AL., PROG. PART. NUCL. PHYS., vol. 62, 2009, pages 257
J S. TOLL, THE DISPERSION RELATION FOR LIGHT AND THE APPLICATIONS INVOLVING ELECTRON PAIRS, PRINCETON UNIVERSITY, 1952
KESSLER ET AL., NUCL INST. METH. A, vol. 457, 2001, pages 187
R.L. MÖSSBAUER, Z.F. PHYSIK, vol. 151, 1958, pages 124
R.L. MÖSSBAUER: "Recoilless Nuclear Resonance Absorption", ANN. REV. NUCL. SCI., vol. 12, 1962, pages 123
TAKEYAMA A ET AL: "Computed tomography for reconstructing refractive index distribution using an X-ray shearing interferometer", SICE. PROCEEDINGS OF THE SICE ANNUAL CONFERENCE. INTERNATIONALSESSION PAPERS, TOKYO, JP, vol. 4, 7 August 2002 (2002-08-07), pages 2524 - 2526, XP008096633 *

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CN104681118B (zh) * 2015-02-13 2017-05-24 浙江工业大学 一种焦斑可调的二维x射线平面组合折射透镜

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