EP2469575A1 - Electron emitting body and x-ray emitting device - Google Patents

Electron emitting body and x-ray emitting device Download PDF

Info

Publication number
EP2469575A1
EP2469575A1 EP10791766A EP10791766A EP2469575A1 EP 2469575 A1 EP2469575 A1 EP 2469575A1 EP 10791766 A EP10791766 A EP 10791766A EP 10791766 A EP10791766 A EP 10791766A EP 2469575 A1 EP2469575 A1 EP 2469575A1
Authority
EP
European Patent Office
Prior art keywords
carbon
substrate
electron
electron emission
emission body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP10791766A
Other languages
German (de)
French (fr)
Other versions
EP2469575A4 (en
Inventor
Ryouichi Suzuki
Yoshihisa Ishiguro
Masanori Haba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Life Technology Research Institute Inc
Original Assignee
Life Technology Research Institute Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Life Technology Research Institute Inc filed Critical Life Technology Research Institute Inc
Publication of EP2469575A1 publication Critical patent/EP2469575A1/en
Publication of EP2469575A4 publication Critical patent/EP2469575A4/en
Withdrawn legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/04Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/06Cathodes
    • H01J35/065Field emission, photo emission or secondary emission cathodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/04Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/06Cathodes
    • H01J35/064Details of the emitter, e.g. material or structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/04Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08Anodes; Anti cathodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00Electrodes common to discharge tubes
    • H01J2201/30Cold cathodes
    • H01J2201/304Field emission cathodes
    • H01J2201/30446Field emission cathodes characterised by the emitter material
    • H01J2201/30453Carbon types
    • H01J2201/30469Carbon nanotubes (CNTs)
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00X-ray tubes
    • H01J2235/06Cathode assembly
    • H01J2235/068Multi-cathode assembly
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00X-ray tubes
    • H01J2235/08Targets (anodes) and X-ray converters
    • H01J2235/081Target material

Definitions

  • the present invention relates to an x-radiation device using an electron emission body (an emitter) and this electron emission body,
  • the carbon nano-tube shown in patent document 1 and graphene sheet shown in patent document 2 are multilayered, and, as an electron emission body in vacuo to perform the field emission which an electric field is centralized, and releases an electron, the carbon film of a piled up tip shape is known.
  • an electron emitting layer comprising the carbon nano-tube is formed in the substrate surface where a cathode electrode was formed, and an electron emitting layer and the electrically conductive layer of the electric potential are provided in the peripheral side outside this electron emitting layer, and, as structure to prevent an electronic direction released by an electron emission body from spreading, the structure that provided the gate electrode above of the electron emitting layer is further disclosed in patent document 3.
  • the emitter in which the carbon nano-tube is oriented densely, and was formed so that the axis imitates the thickness direction of the substrate is disclosed in patent document 4 ion the surface of the substrate comprising silicon carbide single crystals.
  • the gate electrode is provided the upward around emitter, and a lens electrode is located in the spaced-apart point from this gate electrode, and constitution to make electron beam released by an emitter converge with a lens electrode is disclosed in patent document 6.
  • patent document 3 there are some descriptions in patent document 3, 5 or 6 about preventing an electron beam emitted by an emitter (an electron emission body). However, there is no description in patent document 3 and 5 about the conversion of the electron beam into one point. Their method is to restrain the expansion of the electron beam with gate electrodes, and not to raise electron beam density.
  • An electron emission body concerning the present invention was the electron emission body which formed the carbon film which released an electron by applying the voltage in to the surface of substrate, and it was said that the surface of the above substrate was concave to solve the problem, and the above carbon film was comprised of many carbon projections of different-shapes formed on the surface of the film. As the shape is concave, it is one which focuses on one point. In this case, the axis core of the projection lengthens towards an above focus.
  • a preferable example is a projection comprising with the ridge which is formed in the substrate surface and a spiculum lengthening from the ridge. And the ridge has a hollow pillar on which a graphene sheet was wound in the spiral.
  • guard electrode on the fringe of the substrate.
  • This guard electrode projects higher than the carbon film, and the radius of curvature of the outer circumferential side is greater than a radius of curvature of the carbon film side.
  • composition of the x-radiation device concerning the present invention assumes the electron emission body as the cathode, and a metal target is assumed as an anode, and this anode is located at the concave focus position of the substrate.
  • an electron beam emitted by an emission face made in the form of a concave converges to one point, the electron beam density is increased in the electron emission body concerning the present invention.
  • an electron beam can be further centralized.
  • Strong X-rays are emitted by a target to which the electron emission body is connected so that targets such as the cathode (cathoda1), tungsten become the anode (anodal), and by placing a target at the focus position of the electron beam.
  • targets such as the cathode (cathoda1), tungsten become the anode (anodal), and by placing a target at the focus position of the electron beam.
  • the electron emission body is comprised of a substrate 1 which is made from e.g. steel materials, carbon film 2 and ring shaped guard electrode 3.
  • the height of Ring-shaped guard electrode 3 projects higher than that of the carbon film 2 on the fringe of the substrate 1. Also, the radius of curvature R1 of the peripheral side on the outside guard electrode 3 is set larger than the radius of curvature R2 of the carbon film 2 side.
  • the partial electric field concentration with carbon film 2 is restrained by assuming the shape of guard electrode 3 R1 is larger or equal to R2, and it can prevent current deterioration and electric discharge phenomenon with heat degradation.
  • a concave surface (a dent spherical surface) 11 is formed on substrate 1. This concave surface 11 has a constant radius of curvature, and focus F for parallel incident rays if exist.
  • a carbon film 2 is formed with a thickness of a few micrometers to a few tens of micrometers on the concave surface 11, As shown in FIG. 2 , Large number of projections 21 are unfolds in the shape of a surface, and the projection 21 is constructed of a ridge 22 formed on the surface of the concave surface 11 and the spiculum 23 lengthening from this ridge 22.
  • a method to form the carbon film 2 is described based on FIG, 3 .
  • the concave surface 11 is formed on the surface of substrate 1, then the concave surface 11 polished using a polishing stick 4.
  • a mixture of diamond powder, silica powder and water is used for the polishing.
  • the carbon film is layered using a parallel plate-shaped plasma CVD device 5.
  • substrate 1 is set on electrode 51 of the bottom that is grounded so that concave surface 11 becomes the top, and the cathode side of DC power supply 53 is connected to upper electrode 52, and it grounds in the anode side.
  • plasma CVD device 5 is exhausted with vacuum exhaust system 54, and hydrogen gas is introduced from gas introduction system 55, and internal pressure is slowly depressurized to 30 torr degree. In this state, plasma is generated between electrode 51 and 52, and an electric current is increased up to around 2.5A. The oxidation film of the substrate surface is removed by this processing.
  • the electron of the plasma which occurred in plasma CVD device 5 collides with the methane gas, and the carbon atom is isolated, and the carbon atom is absorbed by the fine particles (carbon and silica) to become the seed of the crystalline on the surface of the concave surface 11, then the crystals of carbon grows slowly.
  • Gases such as Acetylene, ethylene, propane, or the steam of carbon monoxide, carbon dioxide, ethanol and organic solvent of acetone can be used besides methane for the reaction gas.
  • ridge 22 grows up slowly and subsequently spiculum 23 grows starting from the tip of ridge 22.
  • This spiculum 23 has a hollow pillar on which a graphene sheet was wound in a spiral. Since the axis of carbon projection 21 formed in this way, is perpendicular to a tangent line of the concave surface 11, the axis of a large number of carbon projections 21 will cross in focus F of the concave surface 11.
  • the electron emission body prepared by the above-mentioned method can be incorporated, for example, in an x-radiation device shown in FIG 4 . That is, the x-radiation device inserts the electron emission body as the cathode (emitter) in case 6 with decompression condition (1 - 1000torr), and a metal targets 61 such as tungsten is located at the position of focus F. This metal target 61 seals airtight into a case 6.
  • a tunnel electron estimated from a formula of Fowler-Nordheim, is released from the carbon 2 towards the metal target 61. Because it is released along an axis of carbon projection 21, as for this released electronic (an electron beam), an extremely high-density electron will collide to with the metal target 61 in focus F, and strong X-rays penetrate metal target 61 are generated.
  • it is a transmissive x-radiation device, in which electron beams are passing through the target, but it can also be a reflection type x-radiation device, in which electron beams generate X-rays by the reflection from the target.
  • the x-radiation device which incorporated an electron emission body concerning the present invention and this electron emission body can be applied, for example, to Non Destructive Inspection apparatuses.

Landscapes

  • Cold Cathode And The Manufacture (AREA)

Abstract

Provided are an electron emitting body having a high electron beam density and an X-ray emitting device embedding the electron emitting body. The electron emitting body has a substrate, the surface of which forms a concave surface, and a carbon film comprising a large number of projections made of carbon and expanded two-dixnensionally. The carbon crystal grows such that first a swell portion (22) gradually becomes larger and then a needle-like portion (23) grows from the head of the swell portion (22). The needle-like portion (23) has a graphene sheet obliquely wound therearound in a multi-layer fashion and has a hollow inside. The axis of a carbon projection (21) thus formed is substantially orthogonal to a line tangent to the concave surface (11), so that the axes of a plurality of the carbon projections (21) intersect with each other at the focal point (F) of the concave surface (11).

Description

    TECHNICAL FIELD
  • The present invention relates to an x-radiation device using an electron emission body (an emitter) and this electron emission body,
  • BACKGROUND ART
  • The carbon nano-tube shown in patent document 1 and graphene sheet shown in patent document 2 are multilayered, and, as an electron emission body in vacuo to perform the field emission which an electric field is centralized, and releases an electron, the carbon film of a piled up tip shape is known.
  • Also, an electron emitting layer comprising the carbon nano-tube is formed in the substrate surface where a cathode electrode was formed, and an electron emitting layer and the electrically conductive layer of the electric potential are provided in the peripheral side outside this electron emitting layer, and, as structure to prevent an electronic direction released by an electron emission body from spreading, the structure that provided the gate electrode above of the electron emitting layer is further disclosed in patent document 3.
  • Also, the emitter in which the carbon nano-tube is oriented densely, and was formed so that the axis imitates the thickness direction of the substrate is disclosed in patent document 4 ion the surface of the substrate comprising silicon carbide single crystals.
  • Also, the electron emitting layer that responded to the shape of the recess by providing the recess in the surface contacting with the electron emitting layer of the glass substrate is formed, and subject matter to raise electronic convergence characteristics released from the electron emitting layer is disclosed in patent document 5,
  • Also, the gate electrode is provided the upward around emitter, and a lens electrode is located in the spaced-apart point from this gate electrode, and constitution to make electron beam released by an emitter converge with a lens electrode is disclosed in patent document 6.
  • PRIOR ART PATENTED DOCUMENTS
    • [patent document 1] Japanese Patent Laid-Open No. 2006-290,691 bulletin
    • [patent document 2] Japanese Patent Laid-Open No. 2008-150,253 bulletin
    • [patent document 3] Japanese Patent Laid-Open No. 2002-093307 bulletin
    • [patent document 4] Japanese Patent Laid-Open No. 2000-100,317 bulletin
    • [patent document 5] Japanese Patent Laid-Open No. 2002-100,282 bulletin
    • [patent document 6] Japanese Patent Laid-Open No. 2000-133,117 bulletin
    DISCLOSURE OF THE INVENTION OBJECT OF THE INVENTION
  • Among the patent documents, there are some descriptions in patent document 3, 5 or 6 about preventing an electron beam emitted by an emitter (an electron emission body).
    However, there is no description in patent document 3 and 5 about the conversion of the electron beam into one point. Their method is to restrain the expansion of the electron beam with gate electrodes, and not to raise electron beam density.
  • On the other hand, in patent document 6, there is a description about electron beam convergence using a lens electrode. However an electron beam emitted from a point-shaped emitter is radiated once, and then it converges with a lens electrode. This means that the radiated electron beam simply returns to the electron beam density, In this case, electron beam density is not increased.
  • Even more particularly, when it comes to a plane shaped emitter, it has some expansion e even if it makes an electron beam converge using a gate electrode and a lens electrode.
  • MEANS FOR SOLVING THE PROBLEM
  • An electron emission body concerning the present invention was the electron emission body which formed the carbon film which released an electron by applying the voltage in to the surface of substrate, and it was said that the surface of the above substrate was concave to solve the problem, and the above carbon film was comprised of many carbon projections of different-shapes formed on the surface of the film.
    As the shape is concave, it is one which focuses on one point. In this case, the axis core of the projection lengthens towards an above focus.
  • For a projection comprising carbon, a preferable example is a projection comprising with the ridge which is formed in the substrate surface and a spiculum lengthening from the ridge. And the ridge has a hollow pillar on which a graphene sheet was wound in the spiral.
  • Also, it is preferable to provide the guard electrode on the fringe of the substrate.
    This guard electrode projects higher than the carbon film, and the radius of curvature of the outer circumferential side is greater than a radius of curvature of the carbon film side.
  • Also, the composition of the x-radiation device concerning the present invention assumes the electron emission body as the cathode, and a metal target is assumed as an anode, and this anode is located at the concave focus position of the substrate.
  • EFFECT OF THE INVENTION
  • Because an electron beam emitted by an emission face made in the form of a concave converges to one point, the electron beam density is increased in the electron emission body concerning the present invention.
    When the substrate provides the guard electrode circumferentially, an electron beam can be further centralized.
  • Strong X-rays are emitted by a target to which the electron emission body is connected so that targets such as the cathode (cathoda1), tungsten become the anode (anodal), and by placing a target at the focus position of the electron beam.
  • BRIEF DESCRIPTION OF DRAWINGS
    • [FIG. 1] General view of the electron emission body concerning the present invention
    • [FIG. 2] Feature enlarged view of the electron emission body
    • [FIG. 3] Figure (a) and (b) describes an example of the formation method of the carbon film,
    • [FIG. 4] Schematic illustration of the x-radiation device which incorporated an electron emission body concerning the present invention
    PREFERRED EMBODIMENT OF THE INVENTION EXAMPLE
  • Preferred embodiment of the invention is described below based on the attached drawings.
    As shown in FIG. 1, the electron emission body is comprised of a substrate 1 which is made from e.g. steel materials, carbon film 2 and ring shaped guard electrode 3.
  • The height of Ring-shaped guard electrode 3 projects higher than that of the carbon film 2 on the fringe of the substrate 1.
    Also, the radius of curvature R1 of the peripheral side on the outside guard electrode 3 is set larger than the radius of curvature R2 of the carbon film 2 side.
    The partial electric field concentration with carbon film 2 is restrained by assuming the shape of guard electrode 3 R1 is larger or equal to R2, and it can prevent current deterioration and electric discharge phenomenon with heat degradation.
  • A concave surface (a dent spherical surface) 11 is formed on substrate 1.
    This concave surface 11 has a constant radius of curvature, and focus F for parallel incident rays if exist.
  • A carbon film 2 is formed with a thickness of a few micrometers to a few tens of micrometers on the concave surface 11,
    As shown in FIG. 2, Large number of projections 21 are unfolds in the shape of a surface, and the projection 21 is constructed of a ridge 22 formed on the surface of the concave surface 11 and the spiculum 23 lengthening from this ridge 22.
  • A method to form the carbon film 2 is described based on FIG, 3.
    As shown in FIG. 3 (a), firstly the concave surface 11 is formed on the surface of substrate 1, then the concave surface 11 polished using a polishing stick 4. A mixture of diamond powder, silica powder and water is used for the polishing.
  • Minute carbon particles or silica particles are attached to the surface of the concave surface 11 by the polishing, and these finer particles become the starting point for the growth of the carbon projection 21.
  • Then, as shown in shown in FIG. 3(b), the carbon film is layered using a parallel plate-shaped plasma CVD device 5.
    Specifically, substrate 1 is set on electrode 51 of the bottom that is grounded so that concave surface 11 becomes the top, and the cathode side of DC power supply 53 is connected to upper electrode 52, and it grounds in the anode side.
  • And plasma CVD device 5 is exhausted with vacuum exhaust system 54, and hydrogen gas is introduced from gas introduction system 55, and internal pressure is slowly depressurized to 30 torr degree.
    In this state, plasma is generated between electrode 51 and 52, and an electric current is increased up to around 2.5A.
    The oxidation film of the substrate surface is removed by this processing.
  • Then, mixed gases with hydrogen gas and methane gas is introduced in the plasma CVD device 5 from gas introduction system 55, and internal pressure force is slowly raised to 75torr degree.
    While maintaining this internal pressure, an electric current is slowly increased from 2.5A to 6.0A.
  • The electron of the plasma which occurred in plasma CVD device 5 collides with the methane gas, and the carbon atom is isolated, and the carbon atom is absorbed by the fine particles (carbon and silica) to become the seed of the crystalline on the surface of the concave surface 11, then the crystals of carbon grows slowly.
  • Gases such as Acetylene, ethylene, propane, or the steam of carbon monoxide, carbon dioxide, ethanol and organic solvent of acetone can be used besides methane for the reaction gas.
  • In the growing process of the carbon crystal, firstly ridge 22 grows up slowly and subsequently spiculum 23 grows starting from the tip of ridge 22.
    This spiculum 23 has a hollow pillar on which a graphene sheet was wound in a spiral.
    Since the axis of carbon projection 21 formed in this way, is perpendicular to a tangent line of the concave surface 11, the axis of a large number of carbon projections 21 will cross in focus F of the concave surface 11.
  • The electron emission body prepared by the above-mentioned method can be incorporated, for example, in an x-radiation device shown in FIG 4.
    That is, the x-radiation device inserts the electron emission body as the cathode (emitter) in case 6 with decompression condition (1 - 1000torr), and a metal targets 61 such as tungsten is located at the position of focus F. This metal target 61 seals airtight into a case 6.
  • With the setting mentioned above, DC voltage is applied between substrate 1 as the cathode and metal target 61 as the anode. The current density of 100mA/cin2 was measured instantly.
  • Then the strong electric field that is formed at the tip of the carbon projections 21, which comprise carbon film 2. A tunnel electron, estimated from a formula of Fowler-Nordheim, is released from the carbon 2 towards the metal target 61. Because it is released along an axis of carbon projection 21, as for this released electronic (an electron beam), an extremely high-density electron will collide to with the metal target 61 in focus F, and strong X-rays penetrate metal target 61 are generated.
  • As illustrated, it is a transmissive x-radiation device, in which electron beams are passing through the target, but it can also be a reflection type x-radiation device, in which electron beams generate X-rays by the reflection from the target.
  • INDUSTRIAL APPLICABILITY
  • The x-radiation device which incorporated an electron emission body concerning the present invention and this electron emission body can be applied, for example, to Non Destructive Inspection apparatuses.
  • DENOTATION OF REFERENCE NUMERALS
  • 1... A substrate, 11 ... A concave surface of substrate, 2 ... A carbon film, 21 ... A projection to comprise carbon film, 22 ... A ridge comprising projections, 23 ... A spiculum which comprises projections, 3 ... A guard electrode, 4 ... A polishing stick, 5 ... A plasma CVD device, 51, 52 ... parallel plate electrodes, 53 ... A DC power supply, 54 ... vacuum exhaust system, 55 ... gas introduction system, 61 ... A metal target, R1 ... A radius of curvature of the peripheral side, outside guard electrode, R2 ... A radius of curvature of the carbon film side of the guard electrode, F ... focus

Claims (5)

  1. An electron emission body having a carbon film formed on the surface of a substrate which releases an electron when a voltage is applied to the surface of the substrate, comprising:
    the surface of the substrate is concave
    the carbon film comprises a large number of projections composed of carbon in the shape of a plane.
  2. The electron emission body of claim 1, wherein:
    the surface of the substrate is concave with one focal point;
    the axis cores of the projections are oriented to the direction of the focal point.
  3. The electron emission body of claim 1, wherein:
    the carbon projection is made from a ridge formed on the substrate surface and a spiculum growing from the ridge,
    the spiculum forms a hollow pillar on which a graphene sheet was wound in a spiral.
  4. The electron emission body of claim 1, wherein:
    the fringe of the substrate is provided with a guard electrode,
    the guard electrode projects higher than the carbon film, and the radius of curvature of the outer circumferential side is bigger than the radius of curvature of the carbon film side.
  5. A cathode comprising of the electron emission body as claimed in any one of claim 1 to claim 4, wherein:
    A metal target is assumed as an anode,
    the anode is placed at the concave focus position of the concave substrate
EP10791766.8A 2009-06-24 2010-02-23 Electron emitting body and x-ray emitting device Withdrawn EP2469575A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009149991A JP5424098B2 (en) 2009-06-24 2009-06-24 Electron emitter and X-ray emission device
PCT/JP2010/001204 WO2010150438A1 (en) 2009-06-24 2010-02-23 Electron emitting body and x-ray emitting device

Publications (2)

Publication Number Publication Date
EP2469575A1 true EP2469575A1 (en) 2012-06-27
EP2469575A4 EP2469575A4 (en) 2014-04-09

Family

ID=43386229

Family Applications (1)

Application Number Title Priority Date Filing Date
EP10791766.8A Withdrawn EP2469575A4 (en) 2009-06-24 2010-02-23 Electron emitting body and x-ray emitting device

Country Status (7)

Country Link
US (1) US20120194057A1 (en)
EP (1) EP2469575A4 (en)
JP (1) JP5424098B2 (en)
KR (1) KR20120060198A (en)
CN (1) CN102576634A (en)
AU (1) AU2010264005A1 (en)
WO (1) WO2010150438A1 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5044005B2 (en) * 2010-11-08 2012-10-10 マイクロXジャパン株式会社 Field emission device
JP6039314B2 (en) * 2012-08-30 2016-12-07 キヤノン株式会社 Imaging apparatus and imaging method
CN103219212B (en) * 2013-05-08 2015-06-10 重庆启越涌阳微电子科技发展有限公司 Graphene serving as cathode of X-ray tube and X-ray tube thereof
CN104465280B (en) * 2014-12-05 2017-01-25 中国科学院深圳先进技术研究院 Carbon nano ray tube for CT imaging
JP6617368B2 (en) * 2015-06-08 2019-12-11 国立研究開発法人理化学研究所 How to make an electron source
JP6206541B1 (en) 2016-06-13 2017-10-04 株式会社明電舎 Field emission device and reforming method
JP6206546B1 (en) 2016-06-23 2017-10-04 株式会社明電舎 Field emission device and reforming method
JP6226033B1 (en) 2016-06-24 2017-11-08 株式会社明電舎 Field emission device and field emission method
CN111613496B (en) * 2020-06-08 2022-12-09 东南大学 Graphene-coated barium-tungsten cathode and preparation method thereof
CN114709283B (en) * 2022-03-15 2024-10-01 太一光伏科技(常州)有限公司 Laminating device of double-sided PREC battery

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008150253A (en) * 2006-12-19 2008-07-03 Dialight Japan Co Ltd Carbon film and carbon film structure
WO2010013772A1 (en) * 2008-07-31 2010-02-04 株式会社ライフ技術研究所 Electron emitter and field emission device provided with electron emitter

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000133117A (en) 1998-08-18 2000-05-12 Nec Corp Field emission type cold-cathode device and manufacture thereof
JP2000100317A (en) 1998-09-18 2000-04-07 Noritake Co Ltd Field electron emission device
US6972513B2 (en) 2000-07-19 2005-12-06 Matsushita Electric Industrial Co., Ltd. Electron emission device, method of manufacturing the same, and image display apparatus using the same
JP2002093307A (en) * 2000-09-14 2002-03-29 Canon Inc Electron emission device and manufacturing method of the same, electron source and image forming apparatus
JP2003016913A (en) * 2001-07-02 2003-01-17 Canon Inc Electron emitting element, electron source, image forming device and manufacturing method of electron emitting element
KR100438835B1 (en) * 2001-12-18 2004-07-05 삼성에스디아이 주식회사 Method of manufacturing a floated structure from a substrate and floated gate electrode and Field Emission Device adopting the same
JP2005174715A (en) * 2003-12-10 2005-06-30 Quantum 14:Kk Electron beam source and x-ray source
KR20050111705A (en) * 2004-05-22 2005-11-28 삼성에스디아이 주식회사 Field emission device and display adopting the same
JP4917758B2 (en) 2005-04-13 2012-04-18 株式会社ピュアロンジャパン Carbon metal nanotree and method for producing the same
TWI435358B (en) * 2005-08-10 2014-04-21 Pureron Japan Co Ltd A carbon film having a shape suitable for the emission of electric field, a carbon film structure, and an electron emitter
US8518542B2 (en) * 2009-05-26 2013-08-27 Life Technology Research Institute, Inc. Carbon film and carbon film structure

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008150253A (en) * 2006-12-19 2008-07-03 Dialight Japan Co Ltd Carbon film and carbon film structure
WO2010013772A1 (en) * 2008-07-31 2010-02-04 株式会社ライフ技術研究所 Electron emitter and field emission device provided with electron emitter

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
HAE JIN KIM ET AL: "Beam Emission Test on Carbon Nanotube Cathode of a Gridded Pierce Gun", VACUUM ELECTRONICS CONFERENCE, 2006 HELD JOINTLY WITH 2006 IEEE INTERN ATIONAL VACUUM ELECTRON SOURCES., IEEE INTERNATIONAL MONTEREY, CA, USA 25-27 APRIL 2006, PISCATAWAY, NJ, USA,IEEE, 25 April 2006 (2006-04-25), pages 479-480, XP010932978, ISBN: 978-1-4244-0108-6 *
PIERCE J R: "Rectilinear Electron Flow in Beams", JOURNAL OF APPLIED PHYSICS, AMERICAN INSTITUTE OF PHYSICS, 2 HUNTINGTON QUADRANGLE, MELVILLE, NY 11747, vol. 11, 1 August 1940 (1940-08-01), pages 548-554, XP002354651, ISSN: 0021-8979, DOI: 10.1063/1.1712815 *
See also references of WO2010150438A1 *

Also Published As

Publication number Publication date
AU2010264005A1 (en) 2012-02-16
US20120194057A1 (en) 2012-08-02
KR20120060198A (en) 2012-06-11
CN102576634A (en) 2012-07-11
JP2011008998A (en) 2011-01-13
JP5424098B2 (en) 2014-02-26
EP2469575A4 (en) 2014-04-09
WO2010150438A1 (en) 2010-12-29

Similar Documents

Publication Publication Date Title
EP2469575A1 (en) Electron emitting body and x-ray emitting device
US10658146B2 (en) Transmission type target, transmission type target unit, xray tube, X-ray generating apparatus, and radiography system
JP5670111B2 (en) X-ray generation target, X-ray generation apparatus, and method for manufacturing X-ray generation target
EP0365366A1 (en) Continuous thin diamond film and method for making same
JP5032827B2 (en) Static eliminator
JP4533926B2 (en) Film forming apparatus and film forming method
JP2015518245A (en) Electrode material with low work function and high chemical stability
JP2015518245A5 (en)
JP4533925B2 (en) Film forming apparatus and film forming method
CN110709959B (en) Cathode structure for cold field electron emission and preparation method thereof
US20110175038A1 (en) Coated carbon nanoflakes
Sarrazin et al. Carbon-nanotube field emission X-ray tube for space exploration XRD/XRF instrument
JP2020537288A (en) Silicon electron emitter design
Momen-Baghdadabad et al. Characterization of carbonized magnesium formed in a low energy plasma focus device
JP2009205800A (en) Electron source
JP4699968B2 (en) Plasma CVD equipment
US12087540B2 (en) Field emission-type tomosynthesis system, emitter for field emission-type tomosynthesis system, and method of manufacturing emitter
RU2717526C1 (en) Cold cathode manufacturing method
JP2007042352A (en) Field electron emitting source, magnetron using it, and microwave applied device
JP6381756B2 (en) Transmission type target, radiation generating tube including the transmission type target, radiation generation apparatus, and radiation imaging apparatus
Dutta et al. Effect of Helium Ion Irradiation on FP479 Graphite
Yamanaka et al. An apparatus for beam-rocking reflection high-energy electron diffraction and total reflection angle x-ray spectroscopy
JP2008293879A (en) X-ray source and x-ray inspection device
JP2007186368A (en) Carbonaceous structure, field emission chip, method for production of the field emission chip, and fixture for practicing the production method
Samudrala et al. Nanocrystalline diamond micro-anvil grown on single crystal diamond as a generator of ultra-high pressures Gopi K. Samudrala1, Samuel L. Moore1, Nenad Velisavljevic2, Georgiy M. Tsoi1, Paul A. Baker1, Yogesh K. Vohra1a

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20120123

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR

RIN1 Information on inventor provided before grant (corrected)

Inventor name: ISHIGURO, YOSHIHISA

Inventor name: HABA, MASANORI

Inventor name: SUZUKI, RYOUICHI

DAX Request for extension of the european patent (deleted)
A4 Supplementary search report drawn up and despatched

Effective date: 20140306

RIC1 Information provided on ipc code assigned before grant

Ipc: H01J 1/304 20060101AFI20140228BHEP

Ipc: H01J 35/06 20060101ALI20140228BHEP

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20141007