EP2164705A2

EP2164705A2 - Seamless continuous material for security elements, and methods and cylinder for the production thereof

Info

Publication number: EP2164705A2
Application number: EP08758776A
Authority: EP
Inventors: Wittich Kaule; Wolfgang Rauscher; Marius Dichtl
Original assignee: Giesecke and Devrient GmbH
Current assignee: Giesecke and Devrient Currency Technology GmbH
Priority date: 2007-06-01
Filing date: 2008-05-27
Publication date: 2010-03-24
Anticipated expiration: 2028-05-27
Also published as: WO2008145333A3; US8783728B2; CN101687414B; WO2008145333A2; CN101687414A; US20100187806A1; EP2164705B1; DE102007025667A1

Abstract

The application relates to a method for producing continuous material for security elements comprising micro-optical moire magnification arrays that have a motif screen composed of a plurality of micro-motif elements as well as a focusing element screen composed of a plurality of micro-focusing elements for moire-magnified viewing of the micro-motif elements. In said method, a) a motif screen composed of an at least locally periodic array of micro-motif elements is provided in the form of a first one-dimensional or two-dimensional grid, b) a focusing element screen composed of an at least locally periodic array of a plurality of micro-focusing elements is provided in the form of a second one-dimensional or two-dimensional grid, c) a pattern repeat of the motif screen and/or the focusing element screen is predefined on the continuous material, d) it is verified whether the grid of the motif screen and/or the grid of the focusing element screen is/are periodically repeated in the predefined pattern repeat, and if that is not the case, a linear transformation is determined which distorts the first and/or the second grid in such a way that the grid is periodically repeated in the predefined pattern repeat, and e) the motif screen or the focusing element screen is replaced by the motif screen or focusing element screen distorted by the determined linear transformation.

Description

Endless material for security elements

The invention relates to an endless material for security elements with micro-optical moire magnification arrangements and to a method for producing such continuous material.

Data carriers, such as securities or identity documents, but also other valuables, such as branded articles, are often provided with security elements for the purpose of security, which permit verification of the authenticity of the data carrier and at the same time serve as protection against unauthorized reproduction. The security elements can be embodied, for example, in the form of a security thread embedded in a banknote, a covering film for a banknote with a hole, an applied security strip or a self-supporting transfer element which is applied to a document of value after its manufacture.

Security elements with optically variable elements, which give the viewer a different image impression under different viewing angles, play a special role, since they can not be reproduced even with high-quality color copiers. For this purpose, the security elements can be equipped with security features in the form of diffraction-optically active microstructures or nanostructures, such as with conventional embossed holograms or other hologram-like diffraction structures, as described, for example, in the publications EP 0 33033 A1 or EP 0 064 067 A1.

It is also known to use lens systems as security features. Thus, for example, EP 0 238 043 A2 describes a security thread made of a transparent material, on the surface of which a grid of several parallel cylindrical lenses is embossed. The Thickness of the security thread is chosen so that it corresponds approximately to the focal length of the cylindrical lenses. On the opposite surface of a printed image is applied register accurate, the print image is designed taking into account the optical properties of the cylindrical lenses. Due to the focusing effect of the cylindrical lenses and the position of the printed image in the focal plane different subregions of the printed image are visible depending on the viewing angle. By appropriate design of the printed image so that information can be introduced, which are visible only at certain angles. Although the image can be moved around an axis parallel to the cylindrical lenses, the subject moves only approximately continuously from one location on the security thread to another location.

For some time, so-called Moire magnification arrangements are used as security features. The principal operation of such moiré magnification arrangements is described in the article "The Moire Magnifier", MC Hutley, R. Hunt, RF Stevens and P. Savander, Pure Appl. Opt. 3 (1994), pp. 133-142 Moire magnification thereafter refers to a phenomenon that occurs when viewing a raster of identical image objects through a lenticular of approximately the same pitch. As with any pair of similar rasters, this results in a moire pattern, in which case each of the moire fringes is in the form of an enlarged raster and / or rotated image of the repeated elements of the image grid appears.

In the production of such moiré magnification arrangements, an endless security element film is usually first produced as roll material, with the use of conventional production methods always being used Breakage, especially gaps or misalignment in the appearance of the security elements occur. These fractures are due to the fact that the precursors for the stamping tools used in the manufacture are generally manufactured as flat sheets which are mounted on a printing or embossing cylinder. At the seams, the mutually adjacent image patterns usually do not match and lead after printing or embossing in the appearance of the finished security elements to motive disorders of the type mentioned.

Based on this, the object of the invention is to avoid the disadvantages of the prior art and in particular to provide a method for producing security elements with micro-optical moiré magnification arrangements with trouble-free motif images, as well as a corresponding continuous material.

This object is achieved by the method for producing continuous material for security elements having the features of the main claim. An endless material for security elements, a production method for security elements, methods for the production of printing or embossing cylinders and correspondingly produced printing or embossing cylinders are specified in the independent claims. Further developments of the invention are the subject of the dependent claims.

The invention relates to a method for producing continuous material for security elements with moiré micro-optical magnification arrangements, which have a motif grid of a multiplicity of micromotif elements and a focusing element grid of a multiplicity of microfocusing elements for moire-magnified viewing of the micromotif elements, in which a) a motif grid is provided from an at least locally periodic arrangement of micromotif elements in the form of a first one- or two-dimensional grid,

b) a focusing element grid is provided from an at least locally periodic arrangement of a plurality of microfocusing elements in the form of a second one-dimensional or two-dimensional grid,

c) a repeat of the motif grid and / or the focusing element grid is specified on the endless material,

d) it is checked whether the grid of the motif grid and / or the grid of the focusing element grid in the predetermined repeat periodically repeats, and if this is not the case, a linear transformation is determined which the first and / or the second grid so distorted that it repeats periodically in the given rapport, and

e) for the further production of the endless material, the motif grid or the Fokussierelementraster by the determined by the linear

Transformation distorted motif grid or the distorted by the determined linear transformation focus element grid is replaced.

The distortion according to the invention can relate only to the motif grid, only the focusing element grid or both screens. Depending on the given grids, the motif grid and the focusing element grid may also require different distortions, as explained in more detail below. In this method, in step c), a repeat q is preferably predetermined along the endless longitudinal direction of the endless material. In particular, the longitudinal direction repeat q is given by the circumference of a stamping or printing cylinder for the generation of the motif grid and / or the focusing telegram.

According to an advantageous method procedure, a grid point P of the first and / or the second grid is selected in step d), which is located in the vicinity of the end point Q of the vector indicated by the longitudinal direction repeat.

tor, and a linear transformation V is found, the P on

Q images. Advantageously, a grid point P whose distance from Q along the grid vector or the two grid vectors is less than 10 grid periods, preferably less than 5, more preferably less than 2, and in particular less than is selected as the grid point lying near the end point Q a grating period is. In particular, the grid point closest to the end point Q can be selected as the grid point P.

The linear transformation V will be useful using the relationship

calculated, where the coordinate vectors of the grid point

P and the end point Q and £ = and any vectors put. In order to obtain slightly distorted gratings, the vectors a and b differ with advantage according to magnitude and direction only slightly or are even the same. After a simple special case, the linear transformation V is calculated using the relationship

calculated.

It can also happen that the nearest grid point P and the repeat end point Q coincide, ie p _x = 0 and p _y = q. In this case, the transformation matrix V is the unit matrix, so that no adaptation transformation is required.

Furthermore, it may also be the case that the nearest grid point P and the repeat end point Q lie one behind the other in the y direction (repeat direction), that is, p _x = 0 and p _y ≠ q. In this case, instead of adjusting the moiremagnifier data, the repeat length can also be adapted, as described below.

In addition to specifying a longitudinal direction repeat, in step c) a repeat b along the transverse direction of the endless material can be specified. In particular, it can be provided that the continuous material is cut into parallel longitudinal strips in a later method step, wherein the transverse direction repeat b is given by the width of these longitudinal strips. Appropriately, in step d)

a lattice point P of the first and / or the second lattice selected in the vicinity of the end point Q of the lattice

There is a rapport of the given vector, a lattice point A of the first and / or the second lattice, which is located near the end point B of the lattice

is located, and

- Finds a linear transformation V that maps P to Q and A to B.

Preferably, the grid points located near the end points Q and B are those grid points P and A whose distances of Q or B along the grid vector or the two grid vectors are each less than 10 grid periods, preferably less than 5, particularly preferably less than 2 and in particular less than one grating period. In particular, the grid point closest to the end point Q can be selected as grid point P and the grid point closest to the end point B can be selected as grid point A.

The linear transformation V becomes advantageous using the relationship ^{q 0} IJfl ^{a *} y PyJ

where (PA and (Ö) are the coordinate vectors of the grid point P

Uv UJ

or the end point Q, and the coordinate vector represent the lattice point A and the end point B, respectively.

In addition or as an alternative to the longitudinal direction repeat, the transverse direction repeat b can be specified. Also comes in place of the preset a repeat in the longitudinal or transverse direction, the specification of a desired repeat in one or two arbitrary directions into consideration. The determination of the required linear transformation for the distortion of the first and / or second grating is analogous to the procedure described.

As explained in detail below, the first and second gratings can each be one-dimensional translation gratings, for example cylindrical lenses as microfocusing elements and motifs of arbitrary length in one direction as micromotif elements, or else two-dimensional Bravais gratings.

In a preferred embodiment of the manufacturing method is provided that

a desired image to be viewed is determined with one or more moire picture elements, the arrangement of enlarged moire picture elements being selected in the form of a two-dimensional Bravais grid whose grid cells are given by vectors F ₁ and I ₂ ;

the focussing element raster in step b) is provided as an array of microfocusing elements in the form of a two-dimensional Bravais lattice, the lattice cells of which are given by vectors w, and vv ₂ ;

in step a) the motif grid with the micromotif elements using the relationships ü = w - (f + wy '-f r = W - (T + Wy ¹ - R + r ₀

is calculated, where ϊii RR == \ eeiπnen pixel of the desired

Picture, 7 = an

Represents shift between the arrangement of microfocusing elements and the arrangement of micromotif elements, and the

Matrices T ₁ W and Ü by f or )

ß _, where tu, tu, uu, U ₂ i and W _1I , wa the Components of the grid cell vectors T ₁ , U ₁ and W ₁ , with i = 1, 2 represent.

In another likewise preferred embodiment of the production method, it is provided that

determining a desired image to be viewed with one or more moire pixels,

the focussing element raster in step b) as an arrangement of microfocusing elements in the form of a two-dimensional Bravais

Lattice cells whose grid cells are given by vectors w and w ₂ ,

a desired movement of the image to be seen when tilting sideways and when tilting the moire magnification is determined, with the desired movement in

Form of the matrix elements of a transformation matrix Ä is given, and

in step a) the motif grid with the micromotif elements under

Using the relations ü = O- Ä ^{~ x} ) -w

and r = Ä ^{~ ι} - R + r ₀

where R - I is a pixel of the desired fxλ (x λ

Image, F = one pixel of the motif image, F ₀ = °

\ ^y ) U <J

Matrices A, FT and {/ are given by Λ = ^fα "" ¹² IW = f ^W "^ ¹ O or Q - -, where uu, U ₂ , and wii, W2i respectively are the components nenten of the grid cell vectors U ₁ and W ₁ , with i = 1, 2 represent.

In both variants mentioned, the vectors w, and U ₂ , or w, and vv ₂ can be modulated in a location-dependent manner, the local period parameters | w,, | w ₂ |, Z (W ₁ , U ₂ ) or W-,, Z (vv,, vv ₂ ) only change slowly in relation to the periodicity length. The motif grid and the focusing element grid are expediently arranged on opposite surfaces of an optical spacer layer. The spacer layer may comprise, for example, a plastic film and / or a lacquer layer.

In an advantageous embodiment of the method, step e) comprises providing a printing or embossing cylinder with the distorted focusing element grid. More specifically, in step e), a flat plate may be provided with the distorted focusing element grid, and the flat plate or a flat impression of the plate may be mounted on a printing or embossing cylinder to form a cylinder with sutures having a cylinder circumference q. Alternatively, in step e), a coated cylinder with cylinder circumference q can be provided with the distorted focusing telegram by a material-removing method, in particular by laser ablation.

Method step e) advantageously comprises impressing the distorted focusing element grid into an embossable lacquer layer, in particular into a thermoplastic lacquer or UV lacquer, which is arranged on the front side of an optical spacer layer.

In a further advantageous embodiment of the method, the step e) comprises providing a printing or embossing cylinder with the distorted motif grid. Specifically, in step e), a flat plate may be provided with the distorted motif grid, and the flat plate or a flat impression of the plate may be mounted on a printing or embossing cylinder to form a cylinder having sutures having a cylinder circumference q. Alternatively, in step e), a coated cylinder with cylinder circumference q are provided with the distorted motif grid by a material-removing method, in particular by laser ablation.

Method step e) also advantageously includes impressing the distorted motif grid in an embossable lacquer layer, in particular in a thermoplastic lacquer or UV lacquer, which is arranged on the rear side of an optical spacer layer. In another variant of the method, step e) comprises printing the distorted motif grid on a carrier layer, in particular on the back side of an optical spacer layer.

According to an alternative production method for continuous material for security elements with moiré micro-optical magnification arrangements, which have a motif grid of a plurality of micromotif elements and a focusing element grid of a plurality of microfocusing elements for moire-magnified viewing of the micromotif elements, it is provided that

a) a motif grid is provided from an at least locally periodic arrangement of micromotif elements in the form of a first one- or two-dimensional lattice,

c) a repeat of the motif grid and / or the focusing element grid is specified on the endless material, d) it is checked whether the grid of the motif grid and / or the grating of the focusing element grid in the predetermined repeat repeats periodically, and if this is not the case, the repeat pattern for the motif grid and / or for the focusing element grid is changed so that the first and / or the second grid is periodically repeated in the changed repeat, and

e) for the further production of the continuous material of the specified repeat is replaced by the amended repeat.

In this variant of the method as well, a repeat q along the endless longitudinal direction of the endless material and / or a repeat b along the transverse direction of the endless material are advantageously predefined in step c).

The invention also relates to an endless material for security elements for security papers, documents of value and the like, which can be produced in particular by a method described above, and which has micro-optical moiré magnification arrangements which are free from interference over a length of 10 meters or more, in particular free from seams, gaps or offset points are arranged. Preferably, the micro-optical moiré magnification arrangements are even arranged up to a length of 100 meters or more, over a length of 1000 meters or more, or even over a length of 10,000 meters or more without interference.

Advantageously, the micro-optical moiré magnification arrangements with a predetermined repeat are arranged without interference on the endless material, in particular with a repeat q along the endless longitudinal direction of the continuous material and / or with a repeat b along the transverse direction of the continuous material. The invention further relates to a continuous material for security elements for security papers, documents of value and the like, which can be produced in the described manner, and which contains micro-moire micro magnification arrangements, which

have a motif grid of an at least locally periodic arrangement of micromotif elements in the form of a first one- or two-dimensional grid,

a focussing element grid comprising an at least locally periodic arrangement of a plurality of microfocusing elements in the form of a second one-dimensional or two-dimensional lattice for moire-magnified viewing of the micromotif elements,

- Wherein the motif grid and the Fokussierelementraster are arranged with a predetermined repeat gap and without offset on the endless material.

The first and second grids may be, in particular, one-dimensional translation gratings or also two-dimensional Bravais gratings. In this case, the motif grid and the focusing element grid are preferably over a length of 10 meters or more, preferably over a length of 100 meters or more, particularly preferably over a length of 1000 meters or more, with the predetermined repeat gaplessly and without offset on the endless material arranged.

The motif grid and the focusing element grid of the endless material are preferably with a repeat q along the endless longitudinal direction of the continuous material and / or with a repeat b along the transverse direction of the continuous material.

The invention further comprises a method for producing a security element for security papers, documents of value and the like, in which an endless material of the described type is produced and cut in the desired shape of the security element. In particular, the endless material is thereby cut into longitudinal strips of the same width and with an identical arrangement of the micro-optical moire magnification arrangements. The invention also includes a security element for security papers, documents of value and the like, which is made of a continuous material of the type described, in particular with the method just mentioned.

In a further aspect, the invention comprises a method for producing a printing or embossing cylinder for the production of the focusing distance in a production process for continuous material of the type described, in which

a focussing element grid of an at least locally periodic arrangement of a multiplicity of microfocusing elements in the form of a one-dimensional or two-dimensional lattice and the circumference q of the finished printing or embossing cylinder are specified,

the grid of the focusing element grid is distorted by means of a linear transformation in such a way that it repeats periodically in the repeat of the predetermined circumference q, and a printing or embossing cylinder is provided with the distorted focusing element master. Preferably, a flat plate is provided with the distorted focusing element grid, and the flat plate or a flat impression of the plate is mounted on a printing or embossing cylinder, so that a cylinder with seams with a cylinder circumference q is formed. According to a likewise advantageous method alternative, a coated cylinder with cylinder circumference q is provided with the distorted focusing element grid by a material-removing method, in particular by laser ablation. The first and second grating may in particular be one-dimensional translation gratings or two-dimensional Bravais gratings.

In a further aspect, the invention comprises a method for producing a printing or embossing cylinder for the production of the motif grid in a production method for continuous material of the type described, in which

a motif grid of an at least locally periodic arrangement of a plurality of micromotif elements in the form of a one- or two-dimensional Bravais grid and the circumference q of the finished printing or embossing cylinder is specified,

the grid of the motif grid is distorted by means of a linear transformation so that it repeats periodically in the repeat of the given circumference q, and

a printing or embossing cylinder is provided with the distorted motif grid. In this case, a flat plate is advantageously provided with the distorted motif grid, and the flat plate or a flat impression of the plate is mounted on a printing or embossing cylinder, so that a cylinder with seams with a cylinder circumference q is formed. After a likewise advantageous method alternative, a coated cylinder with cylinder circumference q is provided with the distorted motif grid by a material-removing method, in particular by laser ablation. The first and second grating may in particular be one-dimensional translation gratings or two-dimensional Bravais gratings.

Furthermore, the invention comprises a printing or embossing cylinder for the production of a focusing element grid or a motif grid, which can be produced in the described manner.

In all variants, the moiré enlargement arrangements can have a focusing element grid, in particular lenticular raster, but also other types of raster, such as hole rasters or a raster of concave mirrors. In all these cases, the inventive method can be used with advantage, especially when cylindrical tools are used for embossing or printing.

Further embodiments and advantages of the invention are explained below with reference to the figures. For better clarity, a representation true to scale and proportion is dispensed with in the figures.

Show it: 1 is a schematic representation of a banknote with an embedded security thread and a glued transfer element,

2 schematically the layer structure of a security thread according to the invention in cross-section,

3 shows in (a) and (b) an illustration of the breakage points in the appearance of security elements with moiré magnification arrangements occurring in the case of prior art production methods,

Fig. 4 is a motif grid, the micromotif elements by on the

Lattice sites of a low-symmetry Bravais lattice Hiding letters "F" are formed,

5 schematically shows the conditions when viewing a moire

Magnification arrangement for defining the occurring sizes,

6 is a motif grid in the form of a two-dimensional Bravais

Grids with the unit cell side vectors W ₁ and U ₂ and the drawn circumference q of the printing cylinder provided for the generation of the motif grid,

7 shows a motif grid as in FIG. 6 with the drawn circumference q and the width b of the strips into which the embossed endless material is to be cut, FIG. 8 shows a motif grid in the form of a one-dimensional translation grid with a translation vector u and the predetermined longitudinal repeat q, and

Fig. 9 is a motif grid as shown in Fig. 8 with marked longitudinal repeat q and Querrapport b.

The invention will now be explained using the example of a security element for a banknote. Fig. 1 shows a schematic representation of a banknote 10, which is provided with two security elements 12 and 16 according to embodiments of the invention. The first security element represents a security thread 12 that emerges at certain window areas 14 on the surface of the banknote 10, while it is embedded in the intervening areas inside the banknote 10. The second security element is formed by a glued transfer element 16 of any shape. The security element 16 can also be designed in the form of a cover film, which is arranged over a window area or a through opening of the banknote.

Both the security thread 12 and the transfer element 16 may include a moire magnification arrangement according to an embodiment of the invention. The mode of operation and the production method according to the invention for such arrangements will be described in more detail below with reference to the security thread 12.

Fig. 2 shows a schematic diagram of the layer structure of the security thread 12 in cross section, wherein only the parts of the layer structure required for the explanation of the functional principle are shown. The security thread 12 contains a carrier 20 in the form of a transparent plastic film, in the Example of an approximately 20 micron thick polyethylene terephthalate (PET) film. The upper side of the carrier film 20 is provided with a grid-like arrangement of microlenses 22 which form on the surface of the carrier film a two-dimensional Bravais grid with a preselected symmetry. The Bravais lattice may, for example, have a hexagonal lattice symmetry, but because of the higher security against forgery, preferred are lower symmetries and thus more general shapes, in particular the symmetry of a parallelogram lattice.

The spacing of adjacent microlenses 22 is preferably chosen as small as possible in order to ensure the highest possible area coverage and thus a high-contrast representation. The spherically or aspherically configured microlenses 22 preferably have a diameter between 5 .mu.m and 50 .mu.m and in particular a diameter between merely 10 .mu.m and 35 .mu.m and are therefore not visible to the naked eye. It is understood that in other designs, larger or smaller dimensions come into question. For example, the moire magnifier structures for moire magnifier structures may have a diameter of between 50 μm and 5 mm, while moiré magnifier structures that can only be deciphered with a magnifying glass or a microscope also have a size of less than 5 μm can be used.

On the underside of the carrier foil 20, a motif layer 26 is arranged, which contains a likewise grid-like arrangement of identical micromotif elements 28. The arrangement of the micromotif elements 28 forms a two-dimensional Bravais lattice with a preselected symmetry, again assuming a parallelogram lattice for illustration. As indicated in FIG. 2 by the offset of the micromotif elements 28 with respect to the microlenses 22, the Bravais lattice differs from the microlenses 22 in FIG. According to the invention, the elements 28 in its symmetry and / or in the size of its lattice parameters are slightly offset from the Bravais lattice of the microlenses 22 in order to produce the desired moire magnification effect. The grating period and the diameter of the micromotif elements 28 are of the same order of magnitude as those of the microlenses 22, ie preferably in the range of 5 .mu.m to 50 .mu.m and in particular in the range of 10 .mu.m to 35 .mu.m, so that the micromotif elements 28 themselves are visible to the naked eye are not recognizable. In designs with the above-mentioned larger or smaller microlenses, of course, the micromotiv elements are correspondingly larger or smaller.

The optical thickness of the carrier film 20 and the focal length of the microlenses 22 are coordinated so that the micromotif elements 28 are located approximately at the distance of the lens focal length. The carrier foil 20 thus forms an optical spacer layer which ensures a desired constant spacing of the microlenses 22 and the micromotif elements 28.

Due to the slightly differing lattice parameters, the observer sees a slightly different subarea of the micromotif elements 28 when viewed from above through the microlenses 22, so that the large number of microlenses 22 as a whole produces an enlarged image of the micromotif elements 28. The resulting moire magnification depends on the relative difference of the lattice parameters of the Bravais lattice used. If, for example, the grating periods of two hexagonal grids differ by 1%, the result is a 100-fold moire magnification. For a more detailed illustration of the mode of operation and advantageous arrangements of the micromotif elements and the microlenses, reference is made to copending German patent application 10 2005 062 132.5 and international application PCT / EP2006 / 012374 referenced, the disclosure of which is included in the present application in this respect.

In the production of security elements with such moire magnification arrangements, an endless security-element film is usually first produced as roll material, fractures 30 always appearing in the appearance 32 in known production processes, as illustrated in FIG. 3 (a). These breakages in appearance are due to the fact that the precursors for the embossing tools used in the manufacture are generally made as flat plates which are mounted on a printing or embossing cylinder 34, as shown schematically in Fig. 3 (b). At the seams 36, the adjacent motif grids 38, 38 'and / or the associated lenticular grid generally do not coincide and, after printing or embossing, lead to motif disturbances in the form of gaps or an offset in the appearance of the finished security elements.

Even if the designs required for moirέ magnification arrangements are generated directly in cylindrical form without going through flat plates, the complicated patterns of the lenticular grid and the motif grid usually do not fit seamlessly, ie completely and without offset, on a given cylinder surface.

For the explanation of the procedure according to the invention, the required quantities are first defined and briefly described with reference to FIGS. 4 and 5. For a more detailed description, reference is additionally made to the aforementioned German patent application 10 2005 062 132.5 and the international application PCT / EP2006 / 012374, the disclosure content of which is incorporated in the present application in this respect. According to the invention, the micromotif elements 28 and the microlenses 22 are each in the form of a raster, wherein in the context of this description raster is understood to mean a two-dimensional periodic or at least locally periodic arrangement of the lenses or the motif elements. A periodic raster can always be described by a Bravais lattice with constant lattice parameters. In the case of a locally periodic arrangement, the period parameters can change from place to place, but only slowly in relation to the periodicity length, so that the micro-raster can always be described locally with sufficient accuracy by means of Bravais gratings with constant grid parameters. For the sake of simplicity of illustration, a periodic arrangement of the microelements is therefore always assumed below.

FIGS. 4 and 5 schematically show a moire magnification arrangement 50, not drawn to scale, having a motif plane 52 in which a motif grid 40 shown in greater detail in FIG. 4 is arranged and with a lens plane 54 in which the microlens grid is located. The moire magnification arrangement 50 generates a moire image plane 56 which describes the magnified image perceived by the viewer 58.

The motif grid 40 includes a plurality of micromotif elements 42 in the form of the letter "F" arranged at the lattice sites of a low-symmetry Bravais lattice 44. The unit cell of the parallelogram grating shown in FIG. 4 can be represented by vectors w ₁ and w ₂ (with the components i ₁ , w ₂₁ and m ₁₂ , w _22, respectively). In a compact

Spelling the unit cell can also be given in matrix form by a motif grid matrix Ü:

Ü = (ü _t , ü ₂ ) = \ In the same way, the arrangement of microlenses in the lens plane 54 is described by a two-dimensional Bravais grating whose grating cell is indicated by the vectors W ₁ and vv ₂ (with the components W ₁₁ , W ₂₁ and W ₁₂ , W _n, respectively). With the vectors 7. and F ₂ (with the components / _,,, t _2x and t _n , t ₂₂ ), the grid cell in the moire image plane 56 is described.

I x 1 With r - \ a general point of the motif plane 52 is designated, with

(xλ

R - \ a general point of Moire image plane 56. These sizes genü¬

already to describe a perpendicular view (viewing direction 60) of the moire magnification arrangement. In order to be able to take into account non-perpendicular viewing directions, such as the direction 62, a shift between the lens plane 54 and Mo¬

plane 52, which is defined by a displacement vector in the motif level 52 is specified. Analogous to the motif grid matrix, the Mat¬. For compact description of the lens grid and the image grid

rizen w = ( ^W " ^Wχi I and f =" ¹² used.

The moire image grid results from the grating vectors of the micromotif element array and the microlens array to T = W - (W - Oy ¹ - Ü and the pixels of the moiré image plane 56 can be calculated using the relationship

R = W - (W - Üy ^ι - (F - F ₀ ) can be determined from the pixels of the motif plane 52. Conversely, the grating vectors of the micromotif element arrangement result from the lenticular grid and the desired moiré image grating U = W- (T + wy ^x -f and r = W - (T + WY ^X -R + r ₀ .

Defining the transformation matrix A = W - (W -Ü) ^', which merges the coordinates of the points of the motif plane 52 and the points of the moire image plane 56,

R =, 4- (F -F ₀ ), or r = A ^'] -R + r ₀ , the two others can be calculated from two of the four matrices Ö, W, f, Ä. In particular:

T = AU = W - (W -Uy ^] -U = (AJ) -W (Ml)

U = W- (T + W) - '- f = AT ^X -T = (IA ^) - W (M2)

W = O (T -T -üy ^ι = (A-Iy '-T = ^(A-1 Jy -AE-u (M3)

A = W- (W- xy ^x = (f + w) -w ^~] = f- üy ^] (M4)

The transformation matrix A also describes the movement of a moire image during the movement of the moire-forming arrangement 50, which results from the displacement of the motif plane 52 against the lens plane 54. The columns of the transformation matrix A can be interpreted as vectors, where

It can now be seen that the vector O ₁ indicates the direction in which the moire image moves when the motif and lenticular arrangement is tilted sideways, and that the vector _{2 2} indicates in which direction the moiré moves when you tilt the arrangement of motif and lenticular grid backwards. The direction of movement is given at a given Ä as follows: With lateral tilting of the motive plane, the moire moves at an angle Y ₁ to the horizontal, given by a "a ,, Analog, the moire moves at an angle γ ₂ in front-rearward tilting Horizontal, given by a "tan γ ₂ = - ^JL . aπ

According to the invention, the images given in particular by (M1) to (M4) are now supplemented by further linear transformations which describe a distortion of the Bravais grid of the motif grid or of the lens grid, and which are selected so that the motif grid and / or the Lenticular grid periodically repeated in a predetermined repeat. The procedure according to the invention will now be explained in more detail with reference to a few concrete examples.

Example 1:

With reference to Fig. 6, a motif image 70 having a motif grid in the form of a two-dimensional Bravais grid with the unit cell side vectors w, and ü _{2 is} given and the circumference q of the printing or embossing cylinder provided for generating the motif grid. In order to accommodate the predetermined motif image on the cylinder without fracture, but to change the given motif pattern as little as possible, the procedure is as follows: All grid points of the given motif grid are covered by {m • S ₁ + n • ü ₂ } with integers m and n. The motif image 70 can be applied without interruption to a cylinder with the circumference q if and only if there are integers M and N for which: wherein the circumferential direction is chosen in the following without restriction of the generality as y-direction in a Cartesian coordinate system. The end point Q of this defined by the circumference of the cylinder

Vector is also shown in Fig. 6. An after points of view such as subject size, magnification, movement, etc. calculated motif grid or a correspondingly calculated lenticular usually satisfy the condition (1) not.

Therefore, according to the invention, the Bravais lattice of the motif grid 70 is slightly distorted by a linear transformation so that the condition (1) for the distorted Bravais lattice is satisfied. The distorted grid then repeats periodically with a longitudinal direction repeat q and therefore fits without gaps and without offset on an associated printing or embossing cylinder with circumference q.

To determine a suitable transformation, a grid point P =

the undistorted Bravais lattice near the end of the punkts Q lies. For the lowest possible distortion, as in FIG. 6, the grid point P closest to the end point Q can be selected for this purpose. The concrete selection of the grid point P can be effected, for example, by the coordinates of all grid points in the computer be determined a surface which is slightly larger than a roll of the cylinder (at least some grid cells larger in size and in width) and that from these grid points then the one with the smallest distance to Q is determined.

How easy to see forms the linear transformation

V ^V - ^" fiθ ^{1 0} JIlPθ ^P p-, TJ ^' - -f [θ ^{1 ~ P} q * / p ^{/ P} _y ' 1 J ( ⁽ 2 ² a ^a ) ⁾ ablates the grid point P on the end point Q, and causes therefore the desired distortion.As a new, slightly distorted Bravais grid for the motif image is the through

Ü '= V - Ö (3) given motif grid grid used. Accordingly, the new

Coordinates f '= \ of a general point F = the motif plane 52

by means of be calculated.

In this way one obtains a motif image with a motif grid in the form of a Bravais lattice with unit cell side vectors u [and ü ₂ 'and pixels 7', given by the relationships (2a), (3) and (4), the gapless and fits without offset on the given printing or embossing cylinder.

The effect of lattice distortion can be estimated from the typical dimensions of the embossing cylinders and grid cells. Usually, the grid cell dimensions are in the order of magnitude of 20 .mu.m, and the circumference of a suitable embossing cylinder is approximately

20 cm or more. With a distortion on the order of a grid Thus, the properties of the generated Moirebildes, such as magnification and movement angle, change only in the per thousand range and therefore are not visible to a viewer. Also, the above-mentioned larger distances between grid point P and end point Q still provide very good to acceptable results with relative changes in the grid in the range of up to several percent.

Example 2:

Like Example 1, Example 2 proceeds from a given motif image from a motif grid in the form of a two-dimensional Bravais grid with the unit cell side vectors, and U ₂ and the circumference q of the printing cylinder provided for generating the motif grid.

For the lattice transformation, however, the more general linear transformation takes place instead of the linear transformation defined by equation (2a) l ^b y

with arbitrary vectors b = used, which also the l ^a yj

Point P maps to the end point Q.

The untransformed grid and the transformed grid differ as little as possible when the vectors b and a differ as little as possible or even equal. For illustration, some special cases are picked out:

2.1 Choosing b and 5 equal and both rectified vertically

to UrriTangSf ichtuiig the cylinder, so a =, so simplified the transformation (2b) transforms to the transformation given above

(2a).

2.2 If you choose b = ä = M ₁ , then the grid vector ü _{x is} preserved during the transformation, only the grid vector U ₂ is slightly changed so that the distorted grid fits the cylinder.

2.3 If one chooses b = a = U ₂ , then during the transformation the lattice vector M _{2 is} preserved and the lattice vector M ₁ is slightly changed so that the distorted lattice fits the cylinder.

Example 3:

Referring to Fig. 7, in Example 3, as in Example 1, a motif image 80 having a motif grid in the form of a two-dimensional Bravais grid with the unit cell side vectors M ₁ and U ₂ and the circumference q of the motif grid is provided Prescribed printing or embossing cylinder. In addition, the embossed endless material to be cut in a subsequent process step in strips of width b, the moire pattern on all strips should be the same side. The distorted Bravais grid of the motif image 80 is thus repeated periodically in the y direction with the longitudinal direction repeat q and in the x direction periodically with the transverse direction repeat b in this example. To determine a suitable transformation is according to the invention

selected a grid point P of the undistorted Bravais grid, the near the end point Q lies. In addition, a grid point A =

selected near the end point B of the

Wanted Cross-direction Rapport Given Vector Lies.

The transformation then becomes a linear transformation used, which, as you see immediately, a special case of the general

Transformation (2b) with b - = (bλ). This transformation V forms

the grid point P on the end point Q and the grid point A on the end point B from. Since P and A are respectively selected near the endpoints Q and B, the resulting distortion of the grating is small.

The motive image transformed via the relationships (2c) and (3) and the motive image transformed via the relations (2c) and (4) are structurally repeated in the x-direction with period b and in the y-direction with period q. The motif image therefore fits seamlessly and without offset on the given printing or embossing cylinder and can be cut after production in identical strips of width b. Example 4:

Example 4 describes a preferred approach in making an entire moire magnification arrangement:

First, a grid arrangement W = (w, w ₂ ) = for a Lin senraster arbitrarily specified. If this grid arrangement does not match the cylinder circumference provided for the production of the lenticular grid, it is converted into a suitable arrangement as described with reference to example 1 or 2.

Furthermore, an enlargement and movement behavior is predefined for the moire pattern, which, as explained above, can be expressed by a motion matrix A. From the lenticular grid W and the motion matrix Ä. With the aid of the relation (M2) the motive grid U can be determined:

U = W - AT '- W (5)

The resulting moire pattern appears in the image plane with a grid array f passing through

T = A - U (6) is given.

A motif image, which is arranged in a motif grid grid calculated according to relationship (5), will generally not fit without interruption on an independently predetermined cylinder diameter, so that one with In the rhythm of the circumference of the cylinder, this film-shaped foil material shows disturbances in the motif image and thus also in the moire image.

According to the invention, the motif grid grating Ü is therefore, as described in Example 1 or 2, by a transformed motif grid grid

Ü '= V ■ Ö replaced. This also results in a new motion matrix A ', wherein the new magnification and motion behavior described by this motion matrix Ä' differs only insignificantly from the desired magnification and movement behavior described by the original motion matrix A when using the method according to the invention.

Specifically, the new motion matrix λ ', which describes the magnification and motion behavior of the transformed grid, is given by

A = V - A - V - '(7)

and the resulting transformed moire pattern appears in the image plane with a grid array f 'passing through

f '= Ä' - Ö '= V - f (8).

Example 5:

In Example 5, a calculation example for moire-forming gratings is given for the procedures explained in Examples 1 to 4. The simple For better illustration, a hexagonal lattice symmetry is assumed for the rasters.

The lenticular grid is a hexagonal lattice with a side length of 20 μm. The motif grid should have the same side length, but be rotated by an angle of 0.573 ° relative to the lenticular grid. The moire pattern should have an approximately 100-fold magnification and approximately orthoparallactic motion in the image plane.

The lenticular grid W is chosen so that it already fits on a cylinder with 200 mm circumference:

W = f ^W ^"WI2 l = 002 - f ^{cos 30} ° ^cos (- ³⁰ °) l _{= 0 02} (0.866025 ... 0.866025..Λ l ^w i ₂ ^W ₂₂ J 'U ^{n 30} ° sin (. - 30 °) J '\ 0,5 -0,5 J

For the motif grid grid rotated by 0.573 ° at the desired magnification of 100 times and approximately orthoparallactic motion:

- (0.01741965 0.01721964 "| ~ [θ, OO982628 - 0.0101727lJ

However, this motif grid grid does not fit interruption-free on a cylinder with 200 mm circumference and is therefore according to the invention replaced by a transformed motif grid grid Ü '= V ■ Ü, where

with (p _x ; p _y ) = (0.00811617; 199.99992) is chosen so that

- (0.01741924 0.01722006 "| ~ [θ, OO98263O - 0.0101727lJ results.

The original and the transformed motion matrix are through given.

The moiré magnification of the original motif grid is 100.0 times as designed, the magnification with the transformed motif grid is 100.4 times horizontally and 100.0 times vertically, and thus has only changed insignificantly. The transformed motif grid grid results in a trouble-free motif image on a printing or embossing cylinder with a circumference of 200 mm, while the original motif grid grid leads to motif disturbances of the type shown in FIG. 3 (a).

Example 6:

Example 6 is based on Example 5, in addition to the endless material produced in this example is cut into identical strips with a width of 40 mm.

First, as in Example 5, the undistorted motif grid is calculated from the lenticular grid and the desired magnification and motion behavior:

0.01741965 0.01721964 "| ~ [θ, OO982628 - 0.0101727lJ However, this motif grid does not fit nondisruptively on a cylinder with a circumference of 200 mm, nor does it repeat periodically at a distance of 40 mm. It is therefore according to the invention replaced by a transformed motif grid grid Ü '= V ■ Ö, where

is chosen with (p _x ; p _y ) = (0.00811617; 199.99992) and (a _x ; a _y ) = (39.99495; -0.00994503), so that

, (0.01742912 0.01722982 "j ~ [θ, OO98363 - 0.0101555δJ.

For the transformed motion matrix results in this case:

-, (0,485129 102,55493 ^) ~ [l00,39976 - 0,788365j The moire magnification of the original motif grid is by design 100.0 times, the magnification with the transformed motif grid is horizontally 100.4 -fold and vertical 102.6-fold, so has changed very little. In addition, results with the transformed motif grid grid on a printing or embossing cylinder with 200 mm circumference a trouble-free motif image, which has adjacent strips of a width of 40 mm adjacent to each other for further processing. Example 7:

As explained above, moiré magnifiers can be realized not only with two-dimensional gratings but also with linear translation structures, for example with cylindrical lenses as microfocusing elements and with motifs that are arbitrarily extended in one direction as micromotif elements. Even with such linear translation structures, the Moire Magnifier data can be advantageously adapted to a predetermined repeat, as now explained with reference to the motif images 90 and 95 of Figures 8 and 9.

A linear translation structure can be described by a translation vector u, that is to say by a displacement d and a displacement direction ψ, as shown in FIG. 8 (see also formula (NI) on page 69 of the abovementioned international application PCT / EP2006 / 012374).

The parallel lines 92 in FIG. 8 schematically represent a motif arranged repeatedly displaced with the translation vector M. In addition, a vector of length q is drawn with the end point Q, which stands for the given longitudinal repeat.

Such a translation structure can then be accommodated in the repeat without impact position if ψ = 0, or if there is an integer n such that

n d / sin ^ = q

applies. If this is not the case, as in the embodiment illustrated in FIG. 8, this condition can be met in the following manner by a slight change of the quantities d, ψ or q. As already described in example 1, a transformation matrix V can be found with the aid of which the motif structure and the movement behavior can be adapted to the repeat with a minimum change. In Fig. 8, a point P is located on the translation structure near the point Q.

The transformation V described by the above equation (2a)

then maps the point P to the point Q.

As a new, slightly distorted and to the given rapport matching motif -translational grid is then a grid with the translation vector

u '= V - ü

used. The new coordinates of a point (x ', y') in the motif plane matching the given repeat, which are slightly changed in relation to the old coordinates (x, y) in the old motive plane which does not match the given repeat, are then as in equation (4) given by

The new motion matrix A 'in the translation grid matching the given repeat, which only has the opposite motion to the old motion matrix A describes slightly changed motion behavior is given by equation (7):

A '= VA V- ¹

Analogous to the adaptation in the case of a two-dimensional Bravais grid according to example 3, an adaptation to a transverse repeat can also take place in the case of a linear translation structure in addition to adaptation to the longitudinal repeat, as explained with reference to the motif image 95 of FIG.

The longitudinal repeat is represented in FIG. 9 by a vector (0, q) with end point Q, the transverse repeat by a vector (b, 0) with end point B. Furthermore, points P and A are selected with the coordinates (p _x , p _y ) and (a _{X /} a _y ) in the translation structure, which are close to Q and B, respectively.

As described in example 3, this information provides a transformation matrix V, with the help of which the motif structure and the movement behavior can be adapted with minimal change to both repetitions, namely with equation (2c):

It will be understood that the methods described herein of seamlessly placing a motif grid in a repeat are also applicable to seamlessly placing a lens grid in a repeat (eg, on an embossing cylinder). Example 8 Embossing or impression cylinder with seams

An example of the manufacture and seamless imaging of lenticular cylinders and motif grid cylinders having seams will now be described in more detail, it being understood that other methods known in the art may be used to make the cylinders themselves.

In this example, the printing or embossing cylinders themselves have seams, the design of moire magnification arrangements is inventively designed so that it fits together before and after a seam.

8. 1 lenticular cylinder:

By means of different techniques, plates can be produced with latticed, free-standing, generally cylindrical resist structures, which are referred to as lacquer points. These paint spots are produced in a lattice-like arrangement which results for the lenticular grid using the above-described relationships (1) to (8).

Such plates can be produced for example by means of classical photolithography, by means of lithographic direct-write methods, such as laser writing or e-beam lithography, or by suitable combinations of both approaches.

In a so-called "thermal reflow process", the plate with the lacquer points is then heated, so that the resist structures flow away and generally form latticed, arranged small hills, preferably small spherical caps. Shaped in transparent materials These hill lens properties, lens diameter, lens curvature, focal length, etc. on the geometric structure of the paint dots, especially their diameter and the thickness of the paint layer, can be determined.

Another possibility is the direct structuring of the plates with latticed, free-standing hills, for example by means of laser ablation. In particular, plastic, ceramic or metal surfaces are processed with high-energy laser radiation, for example with excimer laser radiation.

On a plate produced in this way, the so-called resist master, a nickel layer, for example 0.05 to 0.2 mm thick, is deposited and this is lifted off the plate. This gives a nickel foil, the so-called shim, with depressions that correspond to the above hills in the Resistmaster. This nickel foil is suitable as an embossing stamp for embossing a lenticular grid.

The nickel foil is precisely cut to size and welded with the embossing recesses outwards to form a cylindrical tube, the sleeve. The sleeve can be attached to an embossing cylinder. Since in the exposure control for the emboss pattern, the cylinder circumference including the sleeve was taken into account by using the relationships (1) to (8) according to the invention, the grating period also fits in the area of the weld seam.

With the aid of this embossing cylinder, the calculated lens grid is then embossed into an embossable lacquer layer, for example a thermoplastic lacquer or UV lacquer, on the front side of a foil. 8. 2 motif grid cylinders:

The production takes place analogously to the lenticular cylinder, whereby plates are produced with lattice-shaped, free-standing, freely designed motifs.

According to the invention, lens raster, motif raster and cylinder circumference are in the relationships given by equations (1) to (8), so that the grating period also fits in the area of the weld seam.

Using this embossing cylinder, the motif grid is embossed into an embossable lacquer layer, for example a thermoplastic lacquer or UV lacquer, on the back side of the foil, which contains the associated lenticular grid on the front side. To increase the contrast, the motif grid can be colored, as explained in the co-pending German patent application 10 2006 029 852.7, the disclosure of which is incorporated in the present application in this respect.

Overall, a moiré magnification arrangement is obtained, which shows an enlarged and moved motif and, compared with the prior art, shows a substantially improved behavior in the case of the embossing seams occurring in roll material.

The further processing of the double-sided with lenticular grid and motif grid embossed film can be done in different ways. For example, the motif grid can be metallized over the entire area, or the motif grid can be obliquely vapor-deposited, and then a two-dimensional application of a color layer to the partially metallized areas can take place, or the embossed motif grid can be applied by full-surface application of Color layers and subsequent wiping or by using the above-mentioned dyeing technique of German Patent Application 10 2006 029 852.7 be colored.

Example 9 Embossing or impression cylinder without seams

Seamless cylinders for use in stamping or printing machines as such are state of the art and known for example from the documents WO 2005/036216 A2 or DE 10126264 Al. However, there is no teaching as to how such cylinders are designed to meet the special requirements of Moire magnification arrangements.

In a preferred moire magnification arrangement, a lens grid is mounted on one side of a film and a matching motif grid on the other side of the film. In this case, embossing or impression cylinders are imaged, for example, according to the methods described in the prior art, wherein the design is carried out according to the above-described inventive calculation using the relationships (1) to (8).

Such cylinders can be produced, for example, as follows, it being understood that other methods known from the prior art can be used for the production of the cylinders themselves.

9.1 Lens grid cylinder:

In a metal, ceramic or plastic-coated cylinder by laser ablation, in particular by material removal using a computer-controlled laser, trough-shaped lattice-like recesses created which serve as embossing or printing forms for a lenticular grid. In this case, the programming of the laser feed control according to the invention is carried out using the relationships (1) to (8), so that a seamless pattern without interruption arises on the cylinder.

9. 2 motif grid cylinders:

In a metal, ceramic or plastic-coated cylinder lattice-like arranged recessed motifs or relief-like raised motifs are introduced in recessed environment by laser ablation, in particular by material removal using a computer-controlled laser, which serve as embossing or printing forms for a motif grid. In this case, the programming of the laser feed control according to the invention is carried out using the relationships (1) to (8), so that a seamless pattern without interruption arises on the cylinder.

With the aid of these embossing cylinders, embossable layers of lacquer, for example thermoplastic lacquer or UV lacquer, on the front and back side of a foil imprint lenticular grid and motif grid. To increase the contrast, the motif grid can be colored, as described in Example 7.

According to the present invention, the lenticular, motif and cylinder circumferences are in the relationships given by equations (1) to (8) so as to obtain moiré magnification arrangements having an enlarged and moving motive and, moreover, no discontinuity in roll material Show discontinuities. It should be noted that the cylinder circumferences of lens and motif cylinders may be the same or different, and the calculation using relations (1) to (8) provides the desired results in terms of magnification and motion performance of the moiré magnification arrangement in the latter case as well Template.

The further processing of the double-sided impressed with lenticular grid and motif grid film can be done in the manner described in Example 7 types. Likewise, the mentioned lenticular and motif grid cylinders can be used as printing forms. This is particularly suitable for the motif grid cylinder.

A particularly preferred production process is obtained when a lenticular grid is introduced by means of embossing in an embossable lacquer layer, for example a thermoplastic lacquer or UV lacquer, of a film, and the corresponding motif grid on the opposite side of the film by means of classical printing processes or in the German application 10 2006 029 852.7 mentioned method is applied.

Claims

Patent claims

1. A method for producing continuous material for security elements with moiré micro-optical magnification arrangements, which have a motif grid of a multiplicity of micromotif elements and a focusing element grid of a plurality of microfocusing elements for moire-magnified viewing of the micromotif elements, in which

a) a motif grid is provided from an at least locally periodic arrangement of micromotif elements in the form of a first one- or two-dimensional grid,

b) a focusing element grid is provided from an at least locally periodic arrangement of a multiplicity of microfocusing elements in the form of a second one-dimensional or two-dimensional grid,

d) it is checked whether the grating of the motif grid and / or the grating of the focusing element grid is repeated periodically in the predetermined repeat and, if this is not the case, a linear transformation is detected which thus distorts the first and / or the second grating in that it repeats periodically in the predetermined repeat, and

e) for the further production of the endless material, the motif grid or the Fokussierelementraster by the determined by the linear Transformation distorted motif grid or the distorted by the determined linear transformation focus element grid is replaced.

2. The method according to claim 1, characterized in that in step c) a repeat q is predetermined along the endless longitudinal direction of the endless material.

3. The method according to claim 1, characterized in that the longitudinal direction repeat q is given by the circumference of a stamping or printing cylinder for generating the motif grid and / or the focusing element grid.

4. Method according to claim 2 or 3, characterized in that in step d) a lattice point P of the first and / or the second lattice is selected which is located in the vicinity of the end point Q of the lattice defined by the longitudinal direction.

given a given vector, and a linear transformation

V is determined, which maps P to Q.

5. Method according to claim 4, characterized in that a grid point P is chosen as the grid point lying in the vicinity of the end point Q, whose distance from Q along the grid vector or the two grid vectors is less than 10 grid periods, preferably less than 5, particularly preferred less than 2 and in particular less than one grating period.

6. The method according to claim 4, characterized in that the end point Q nearest the grid point is selected as the grid point P.

7. The method according to at least one of claims 4 to 6, characterized in that the linear transformation V using the relationship

calculated, the coordinate vectors of the grid

point P or the end point Q and b = any vector represent.

8. The method according to at least one of claims 4 to 7, characterized in that the linear transformation V using the relationship

calculated, the coordinate vectors of the grid point P and the end point Q, respectively.

9. The method according to at least one of claims 2 to 8, characterized in that in step c) a repeat b is predetermined along the transverse direction of the continuous material.

10. The method according to claim 9, characterized in that the continuous material is cut in a later method step in parallel longitudinal strips, and the transverse direction repeat b is given by the width of these longitudinal strips.

11. The method according to claim 9 or 10, characterized in that in step d) a grid point P of the first and / or the second grid is selected, which in the vicinity of the end point Q of the longitudinal direction by the

(Oportation rapport given vector lies,

VV

a lattice point A of the first and / or the second lattice is selected, which lies near the end point B of the vector given by the transverse fbλ direction repeat, and

a linear transformation V is determined, which maps P to Q and A to B.

12. The method according to claim 11, characterized in that as grid points located in the vicinity of the end points Q and B such grid points P and A are selected whose distances of Q and B along the grid vector or the two grid vectors each less than 10 grid periods , preferably less than 5, more preferably less than 2 and in particular less than one grating period.

13. The method according to claim 11 or 12, characterized in that the end point Q nearest the grid point is selected as the grid point P and the end point B closest grid point as the grid point A.

14. The method according to at least one of claims 11 to 13, characterized in that the linear transformation V using the relationship

calculated, the coordinate vectors of the grid

point P and the end point Q, and and the coordination l ^a yj represent the vector vectors of the grid point A and the end point B.

15. The method according to at least one of claims 1 to 14, characterized in that the first and second lattice are one-dimensional translation lattice.

16. The method according to at least one of claims 1 to 14, characterized in that the first and second grid are two-dimensional Bravais grid.

17. The method according to claim 16, characterized in that

determining a desired image to be viewed with one or more moire pixels, the array being selected from enlarged moire pixels in the form of a two-dimensional Bravais lattice whose lattice cells are given by vectors T ₁ and F ₂ ;

the focussing element raster in step b) is provided as an array of microfocusing elements in the form of a two-dimensional Bravais lattice, the lattice cells of which are given by vectors w, w ₂ , and in step a) the motif grid with the micromotif elements using the relationships

U = W - (T + wy ^λ -f and r = W - (f + Wy ¹ -R + r ₀

is calculated, where R = a pixel of the desired fxλ (xλ

Image, r = one pixel of the motif grid, F ₀ = °

Matrices f, W and Ü by f or J jj _ are given, where tii, tu, uu, ua and W ₁ J, wa the

Components of the grid cell vectors I ₁ , U ₁ and W ₁ , with i = 1, 2 represent.

18. The method according to claim 16, characterized in that

a desired image to be viewed with one or more moire pixels is determined, the focus element raster in step b) being an array of

Microfocusing elements in the form of a two-dimensional Bravais lattice, whose lattice cells are given by vectors vv, and M> ₂ , determining a desired movement of the image to be viewed in the case of lateral tilting and tilting of the moiré magnification arrangement, wherein the desired movement is given in the form of the matrix elements of a transformation matrix Ä, and in step a) the motif grid with the micromotif elements is used Relationships

O = (I-A ^) - W

and r = A ^{~ λ} - R + r ₀

is calculated, where R is a pixel of the desired

Picture, r = an index Represents shift between the arrangement of microfocusing elements and the arrangement of micromotif elements, and the

Matrices A, W and C / by A or j

where U _1I , u ₂ i or W _1I , W ₂ i are the components nenten of the grid cell vectors U ₁ and W ₁ , with i = l, 2 represent.

19. The method according to claim 17 or 18, characterized in that the vectors w, and U ₂ , or w, and W _{1 are} modulated location-dependent, wherein the local period parameters | M, |, IM ₂ LZ (W,, U ₂ ) or w,, W ₂ , Z (w _x , w ₂ ) only change slowly in relation to the periodicity length.

20. The method according to at least one of claims 1 to 19, characterized in that the motif grid and the focusing element grid are arranged on opposite surfaces of an optical spacer layer.

21. The method according to at least one of claims 1 to 20, characterized in that the step e) comprises providing a printing or embossing cylinder with the distorted Fokussierelementraster.

22. The method according to claim 21, characterized in that in

Step e) is provided a flat plate with the distorted focusing element grid, and the flat plate or a flat impression of the plate is mounted on a printing or embossing cylinder, so that a cylinder with seams with a cylinder circumference q is formed.

23. The method according to claim 21, characterized in that in step e) a coated cylinder with cylinder circumference q is provided by a material-removing method, in particular by laser ablation, with the distorted Fokussierelementraster.

24. The method according to at least one of claims 1 to 23, characterized in that the step e) comprises the impressing of the distorted focusing element grid in an embossable lacquer layer.

25. The method according to at least one of claims 1 to 24, characterized in that the step e) comprises providing a printing or embossing cylinder with the distorted motif grid.

26. The method according to claim 25, characterized in that in step e) a flat plate is provided with the distorted motif grid, and the flat plate or a flat impression of the plate is mounted on a printing or embossing cylinder, so that a cylinder with seams with a Cylinder circumference q is created.

27. The method according to claim 25, characterized in that in step e) a coated cylinder with cylinder circumference q is provided with the distorted motif grid by a material-removing process, in particular by laser ablation.

28. The method according to at least one of claims 1 to 27, characterized in that the step e) comprises impressing the distorted motif grid in an embossable lacquer layer.

29. The method according to at least one of claims 1 to 27, characterized in that step e) comprises printing the distorted motif grid on a carrier layer, in particular on an optical spacer layer.

30. A method for producing continuous material for security elements with moiré micro-optical magnification arrangements, which have a motif grid of a multiplicity of micromotif elements and a focusing element grid of a plurality of microfocusing elements for moire-magnified viewing of the micromotif elements, in which

a) a motif grid is provided from an at least locally periodic arrangement of micromotif elements in the form of a first one- or two-dimensional grid, b) a focusing element grid is provided from an at least locally periodic arrangement of a plurality of microfocusing elements in the form of a second one-dimensional or two-dimensional grid,

d) it is checked whether the grid of the motif grid and / or the grid of the focusing element grid in the predetermined repeat repeats periodically, and if this is not the case, the repeat length for the

Motif grid and / or for the focusing element grid is changed so that the first and / or the second grid in the amended rapport repeats periodically, and

31. The method according to claim 30, characterized in that in step c) a repeat q is predetermined along the endless longitudinal direction of the endless material.

32. The method according to claim 30 or 31, characterized in that in step c) a repeat b is predetermined along the transverse direction of the endless material.

33. Continuous material for security elements for security papers, documents of value and the like, in particular producible according to one of claims 1 to 32, with micro-optical moiré magnification arrangements, the over a length of 10 meters or more without interference, in particular free of seams, gaps or offset points are arranged.

34. continuous material according to claim 33, characterized in that the micro-optical moiré magnification arrangements on a length of 100

Meters or more, preferably over a length of 1000 meters or more, are arranged trouble-free.

35. continuous material according to claim 33 or 34, characterized in that the micro-optical moiré magnification arrangements are arranged with a predetermined repeat motivational disturbance on the continuous material, in particular with a repeat q along the endless longitudinal direction of the continuous material and / or with a repeat b along the transverse direction of the endless material.

36. Continuous material for security elements for security papers, documents of value and the like, producible according to one of claims 1 to 32, with micro-optical moiré magnification arrangements, the

a focussing element grid comprising an at least locally periodic arrangement of a plurality of microfocusing elements in the form of a second one-dimensional or two-dimensional lattice for moire-magnified viewing of the micromotif elements, wherein the motif grid and the focusing element grid are arranged with a predetermined repeat gap and without offset on the endless material.

37. Continuous material according to claim 36, characterized in that the first and second lattices are one-dimensional translation lattices.

38. Continuous material according to claim 36, characterized in that the first and second gratings are two-dimensional Bravais gratings.

39. continuous material according to at least one of claims 36 to 38, characterized in that the motif grid and the focusing element grid on a length of 10 meters or more, preferably over a length of 100 meters or more, and more preferably over a length of 1000 meters or more, are arranged with the specified repeat gap and without offset on the endless material.

40. The endless material according to claim 37, characterized in that the motif grid and the focusing element grid are arranged with a repeat q along the endless longitudinal direction of the endless material and / or with a repeat b along the transverse direction of the endless material.

41. A method for producing a security element for security papers, value documents and the like, in which an endless material according to one of claims 1 to 40 is produced and cut in the desired form of the security element.

42. The method according to claim 41, characterized in that the continuous material is cut into longitudinal strips of the same width and with an identical arrangement of the micro-optical moiré magnification arrangements.

43. Security element for security papers, documents of value and the like, produced from a continuous material according to one of claims 1 to 40, in particular according to the method of claim 41 or 42.

44. A method of manufacturing a printing or embossing cylinder for the production of the focusing element grid in the manufacturing method of claims 1 to 29, wherein

a Fokussierelementraster from an at least locally periodic arrangement of a plurality of Mikrofokussierelementen in the form of a one- or two-dimensional grid and the circumference q of the finished printing or embossing cylinder is given,

the grating of the focusing element grid is distorted by means of a linear transformation in such a way that it repeats periodically in the repeat of the predetermined circumference q, and

a printing or embossing cylinder is provided with the distorted Fokussierelementraster.

45. The method according to claim 44, characterized in that a flat plate is provided with the distorted focusing element grid, and the flat plate or a flat impression of the plate is mounted on a printing or embossing cylinder, so that a cylinder with seams with a cylinder circumference q is formed.

46. The method according to claim 44, characterized in that a coated cylinder with cylinder circumference q is provided with a material-removing method, in particular by laser ablation, with the distorted focusing element grid.

47. Method according to claim 44, characterized in that the grid is a one-dimensional translation grid.

48. The method according to at least one of claims 44 to 46, characterized in that the grid is a two-dimensional Bravais grid.

49. A method for producing a printing or embossing cylinder for the generation of the motif grid in the manufacturing method of claims 1 to 29, in which

a motif grid of an at least locally periodic arrangement of a plurality of micromotif elements in the form of a one- or two-dimensional grid and the circumference q of the finished printing or embossing cylinder is specified,

the motif grid is distorted by means of a linear transformation so that it repeats periodically in the repeat of the given circumference q, and

- A printing or embossing cylinder is provided with the distorted motif grid.

50. The method according to claim 49, characterized in that a flat plate is provided with the distorted motif grid, and the flat Plate or a flat impression of the plate is mounted on a printing or embossing cylinder, so that a cylinder with seams with a cylinder circumference q is formed.

51. The method according to claim 49, characterized in that a coated cylinder with a cylinder circumference q is provided with the distorted motif grid by a material-removing method, in particular by laser ablation.

52. Method according to claim 49, characterized in that the grid is a one-dimensional translation grid.

53. The method according to at least one of claims 49 to 51, characterized in that the grid is a two-dimensional Bravais grid.

54. Printing or embossing cylinder for the production of a focusing element grid or a motif grid in the production method of claims 1 to 29, producible according to one of claims 44 to 53.