EP2038208A4 - Nanodevice structure and fabricating method thereof - Google Patents
Nanodevice structure and fabricating method thereofInfo
- Publication number
- EP2038208A4 EP2038208A4 EP20070747074 EP07747074A EP2038208A4 EP 2038208 A4 EP2038208 A4 EP 2038208A4 EP 20070747074 EP20070747074 EP 20070747074 EP 07747074 A EP07747074 A EP 07747074A EP 2038208 A4 EP2038208 A4 EP 2038208A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- fabricating method
- nanodevice
- nanodevice structure
- fabricating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
- H01J1/304—Field-emissive cathodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/0006—Interconnects
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B1/00—Nanostructures formed by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J31/00—Cathode ray tubes; Electron beam tubes
- H01J31/08—Cathode ray tubes; Electron beam tubes having a screen on or from which an image or pattern is formed, picked up, converted, or stored
- H01J31/10—Image or pattern display tubes, i.e. having electrical input and optical output; Flying-spot tubes for scanning purposes
- H01J31/12—Image or pattern display tubes, i.e. having electrical input and optical output; Flying-spot tubes for scanning purposes with luminescent screen
- H01J31/123—Flat display tubes
- H01J31/125—Flat display tubes provided with control means permitting the electron beam to reach selected parts of the screen, e.g. digital selection
- H01J31/127—Flat display tubes provided with control means permitting the electron beam to reach selected parts of the screen, e.g. digital selection using large area or array sources, i.e. essentially a source for each pixel group
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/60—Forming conductive regions or layers, e.g. electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2207/00—Microstructural systems or auxiliary parts thereof
- B81B2207/07—Interconnects
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/30—Cold cathodes
- H01J2201/304—Field emission cathodes
- H01J2201/30446—Field emission cathodes characterised by the emitter material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/30—Cold cathodes
- H01J2201/304—Field emission cathodes
- H01J2201/30446—Field emission cathodes characterised by the emitter material
- H01J2201/30453—Carbon types
- H01J2201/30469—Carbon nanotubes (CNTs)
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2329/00—Electron emission display panels, e.g. field emission display panels
- H01J2329/02—Electrodes other than control electrodes
- H01J2329/04—Cathode electrodes
- H01J2329/0407—Field emission cathodes
- H01J2329/0439—Field emission cathodes characterised by the emitter material
- H01J2329/0444—Carbon types
- H01J2329/0455—Carbon nanotubes (CNTs)
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
- H10K85/221—Carbon nanotubes
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060063840A KR100797093B1 (en) | 2006-07-07 | 2006-07-07 | Nano device structure and fabricating method thereof |
PCT/KR2007/003043 WO2008004777A1 (en) | 2006-07-07 | 2007-06-22 | Nanodevice structure and fabricating method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2038208A1 EP2038208A1 (en) | 2009-03-25 |
EP2038208A4 true EP2038208A4 (en) | 2014-07-23 |
Family
ID=38894716
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP20070747074 Withdrawn EP2038208A4 (en) | 2006-07-07 | 2007-06-22 | Nanodevice structure and fabricating method thereof |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP2038208A4 (en) |
JP (1) | JP2009543327A (en) |
KR (1) | KR100797093B1 (en) |
WO (1) | WO2008004777A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101170806B1 (en) * | 2010-02-12 | 2012-08-02 | 고려대학교 산학협력단 | Method for selective patterning of polyethyleneimine and a semiconductor device manufactured by using the same |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050122351A1 (en) * | 2003-10-28 | 2005-06-09 | Semiconductor Energy Laboratory Co., Ltd | Liquid droplet ejection system and control program of ejection condition of compositions |
US20060110847A1 (en) * | 2004-11-19 | 2006-05-25 | Masaaki Fujimori | Field effect transistor and its manufacturing method |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100658667B1 (en) * | 2001-02-16 | 2006-12-15 | 삼성에스디아이 주식회사 | Method of making triode type field emission display device with carbon emission layer |
US6955767B2 (en) * | 2001-03-22 | 2005-10-18 | Hewlett-Packard Development Company, Lp. | Scanning probe based lithographic alignment |
KR100465731B1 (en) * | 2003-02-11 | 2005-01-13 | 엘지전자 주식회사 | A spacer manufacturing device of flat display part and the same methode |
US20070157873A1 (en) * | 2003-09-12 | 2007-07-12 | Hauptmann Jonas R | Method of fabrication and device comprising elongated nanosize elements |
TWI221341B (en) | 2003-09-18 | 2004-09-21 | Ind Tech Res Inst | Method and material for forming active layer of thin film transistor |
US7226819B2 (en) | 2003-10-28 | 2007-06-05 | Semiconductor Energy Laboratory Co., Ltd. | Methods for forming wiring and manufacturing thin film transistor and droplet discharging method |
KR100757519B1 (en) * | 2005-01-27 | 2007-09-11 | 한국화학연구원 | Fabrication Method of Electrode for Plasma Display Panel Using Precoating Solution |
KR20060131551A (en) * | 2005-06-16 | 2006-12-20 | 엘지.필립스 엘시디 주식회사 | Electrode structure of flexible display device and method of fabrication thereof |
-
2006
- 2006-07-07 KR KR1020060063840A patent/KR100797093B1/en not_active IP Right Cessation
-
2007
- 2007-06-22 WO PCT/KR2007/003043 patent/WO2008004777A1/en active Application Filing
- 2007-06-22 JP JP2009517966A patent/JP2009543327A/en active Pending
- 2007-06-22 EP EP20070747074 patent/EP2038208A4/en not_active Withdrawn
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050122351A1 (en) * | 2003-10-28 | 2005-06-09 | Semiconductor Energy Laboratory Co., Ltd | Liquid droplet ejection system and control program of ejection condition of compositions |
US20060110847A1 (en) * | 2004-11-19 | 2006-05-25 | Masaaki Fujimori | Field effect transistor and its manufacturing method |
Non-Patent Citations (1)
Title |
---|
See also references of WO2008004777A1 * |
Also Published As
Publication number | Publication date |
---|---|
JP2009543327A (en) | 2009-12-03 |
EP2038208A1 (en) | 2009-03-25 |
KR100797093B1 (en) | 2008-01-22 |
KR20080004912A (en) | 2008-01-10 |
WO2008004777A1 (en) | 2008-01-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20090121 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC MT NL PL PT RO SE SI SK TR |
|
AX | Request for extension of the european patent |
Extension state: AL BA HR MK RS |
|
RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: LEE, EUNG-SUG Inventor name: YOON, YEO-HWAN Inventor name: SONG, JIN-WON Inventor name: HAN, CHANG-SOO |
|
DAX | Request for extension of the european patent (deleted) | ||
A4 | Supplementary search report drawn up and despatched |
Effective date: 20140620 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: H01J 31/12 20060101ALI20140613BHEP Ipc: B82B 3/00 20060101ALI20140613BHEP Ipc: H01J 1/304 20060101ALI20140613BHEP Ipc: B82B 1/00 20060101AFI20140613BHEP Ipc: H01L 21/00 20060101ALI20140613BHEP Ipc: B81B 7/00 20060101ALI20140613BHEP Ipc: G03F 9/00 20060101ALI20140613BHEP Ipc: H01L 51/00 20060101ALI20140613BHEP |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
INTG | Intention to grant announced |
Effective date: 20150703 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20151114 |