EP1990661A1 - Filtre diffractif à ordre zéro isotrope - Google Patents

Filtre diffractif à ordre zéro isotrope Download PDF

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Publication number
EP1990661A1
EP1990661A1 EP08155759A EP08155759A EP1990661A1 EP 1990661 A1 EP1990661 A1 EP 1990661A1 EP 08155759 A EP08155759 A EP 08155759A EP 08155759 A EP08155759 A EP 08155759A EP 1990661 A1 EP1990661 A1 EP 1990661A1
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EP
European Patent Office
Prior art keywords
microstructures
zero
order diffractive
layer
substrate
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EP08155759A
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German (de)
English (en)
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EP1990661B1 (fr
Inventor
Nicolas Blondiaux
Mickaël Guillaumee
Raphaël Pugin
Ross Stanley
Alexander Stuck
Harald Walter
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Centre Suisse dElectronique et Microtechnique SA CSEM
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Centre Suisse dElectronique et Microtechnique SA CSEM
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/203—Filters having holographic or diffractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods

Definitions

  • the present invention relates to zero-order filters, sometimes called resonant gratings, and more particularly to an isotropic zero-order diffractive colour filter, to a method to manufacture an embossing tool and to a method to manufacture such a filter.
  • Zero-order diffractive filters are used in different applications. These filters are based on the resonant reflection of a leaky waveguide.
  • the documents related to colour filters, especially to security devices based on ZOF, are discussed in the following paragraphs.
  • the WO 03/059643 also describes very similar ZOF for use in security elements.
  • the elements have the same drawbacks as the filters in the US 4,484,797 .
  • Such ZOF possess diffractive, sub-wavelength microstructures with a short range ordering and a long range disordering.
  • the optical characteristics of such ZOF is isotropic, thus the reflection and/or transmission spectra show no change upon rotation.
  • Such ZOF can be used in a variety of fields.
  • security devices e.g. for banknotes, credit cards, passports, tickets, document security, anti-counterfeiting, brand protection and the like
  • heat-reflecting panes or windows or spectrally selective reflecting pigments e.g. for banknotes, credit cards, passports, tickets, document security, anti-counterfeiting, brand protection and the like
  • heat-reflecting panes or windows or spectrally selective reflecting pigments e.g. for banknotes, credit cards, passports, tickets, document security, anti-counterfeiting, brand protection and the like
  • heat-reflecting panes or windows spectrally selective reflecting pigments.
  • the invention also relates to a method to manufacture an embossing tool for embossing such microstructures, as defined in claim 10.
  • the invention also relates to a method to manufacture an isotropic zero-order diffractive colour filter, as defined in claim 15.
  • the invention also relates to a pigment containing such isotropic zero-order diffractive colour filters.
  • the invention also relates to a security device, in particular for banknotes or passports, containing such isotropic zero-order diffractive colour filters.
  • Figure 1 shows schematic side view drawings of known ZOF, with a) rectangular and b) sinusoidal grating shape.
  • Black denotes HRI (high refractive index) material, white LRI (low refractive index) material.
  • A is the period and t the depth of the grating, p the width of the lower grating line, ⁇ the rotational angle, ⁇ the viewing angle and c the thickness of the HRI layer.
  • Figure 2a shows a scanning electron microscope (SEM) image of a silica bead layer with a bead diameter of 595nm, with a short range ordering and a ling rang disordering, deposited on a Si-wafer substrate by spin-coating from ethanol solution. Some areas with short range ordering are highlighted in an exemplary manner by using black circles.
  • SEM scanning electron microscope
  • Figure 2b shows the corresponding Fourier Transformation (FT) analysis of the image of figure 2a .
  • Figure 2c shows a SEM image of a silica bead layer with a bead diameter of 403nm with a short range ordering and a long range disordering, deposited on a Si-wafer substrate by spin-coating from ethanol solution.
  • Figure 2d shows the corresponding FT analysis of the image of figure 2c .
  • Figure 3 is a schematic drawing of one possible manufacturing method of the invention.
  • Figures 4a and 4b are reflection spectra of an isotropic ZOF based on the bead layer shown in figure 2c ) at a) varying rotation angle ⁇ but fixed viewing angle of 30° and at b) varying viewing angle ⁇ but fixed rotational angle.
  • Figure 5 shows a plot of the position of the most prominent peak in the reflection spectrum as a function of the beat diameter measured at a viewing or tilting angle of 30°.
  • ZOF used as security devices offer a high level of security for special designs of the security devices, it would be advantageous to have a ZOF which varies the colour only upon tilting. In other applications an isotropic reflection characteristic of ZOF would be beneficial, too.
  • an isotropic ZOF is called an isotropic ZOF.
  • Such an isotropic ZOF enables a design of a security device with a logo or writing that varies the colour upon rotation (state-of-the-art linear ZOF) and that is embedded in a background with no colour effect upon rotation (isotropic ZOF).
  • the design can be inverted with a colour effect upon rotation of the background and a colour stable logo or writing. At the same time and in both cases both areas would have a colour change upon tilting.
  • the whole security device could be manufactured with the same technique as the two colour effects are based on the same physical effect.
  • isotropic ZOF is in optically variable pigments.
  • a micro-structured (e.g. with a linear grating) wave-guiding layer is split in small flakes or pigments which can be used in inks.
  • ZOF pigments are described in WO2007137438A1 which is incorporated herein by reference.
  • One possibility to produce such pigments is to emboss the microstructure in a first layer coated on a substrate, wherein the layer can be dissolved in a certain solvent. The embossed substrate is then coated with a waveguiding second layer which is not solvable in the solvent. Next the first layer is dissolved in the certain solvent which leads to a breaking of the micro-structured waveguiding second layer in small flakes or pigments.
  • the size of such pigments is in the range of a few ⁇ m 2 up to a few hundred ⁇ m 2 .
  • smaller pigments are preferred. In most cases these pigments show no uniform orientation after the ink is applied to a substrate.
  • the colour and colour effect of the object to which the ink is applied is a mixture of the colours which are seen in the different rotational viewing direction. This distinctly reduces the colour contrast and therefore the visibility of the colour effect.
  • Colour effect pigments based on isotropic ZOF with no colour effect upon rotation according to this invention circumvent the problem of the orientation of the pigments.
  • An advantage compared to state-of-the-art optically variable inks (OVIs) based on thin film interference e.g. disclosed in U.S. Patent No.
  • ZOF pigments need only one layer whereas OVIs are made of at least five layers. Therefore ZOF pigments are potentially cheaper to produce. Further such pigments can be distinctly thinner. Preferred the thickness of the pigments or flakes is in the range of 50nm up to 500nm, especially preferred between 100nm and 250nm. Due to the lower thickness isotropic ZOF pigments can be made smaller while keeping the aspect ratio of thickness to size unchanged. This aspect ratio is important to realise pigments which align parallel to a surface during a printing process, e.g. during screen printing.
  • the size of such isotropic ZOF pigments or flakes is in the range of 1x1 ⁇ m 2 up to 200x200 ⁇ m 2 , preferred it is in the range of 1 ⁇ 1 ⁇ m 2 up to 50x50 ⁇ m 2 , especially preferred in the range of 2x2 ⁇ m 2 up to 5x5 ⁇ m 2 .
  • Pigments of the especially preferred size can be used even in gravure printing processes. Of course asymmetric shapes like rectangular, ellipse etc. are possible for such pigments or flakes, too.
  • State-of-the-art ZOF consist of microstructures - more precisely parallel or crossed grating lines - with a depth t and a period A that is in most cases smaller than the wavelength of light for which the filter is designed and a waveguiding layer (see figure 1 ).
  • the latter has the thickness c and is made of a material with high index of refraction n high (HRI-layer) surrounded by material with lower index of refraction n low (LRI-layer) in the range of 1.1-1.7, wherein n high > n low + 0.2.
  • the waveguide layer can be provided with the grating or the grating can be placed on top or below the layer.
  • the material above and below the waveguide layer can have a different index of refraction. One can even be air.
  • the high index of refraction layer together with the grating acts as a leaky waveguide.
  • Such ZOFs illuminated by polarised or unpolarised polychromatic visible light are capable of separating zero-order diffraction output light from higher order diffraction output light.
  • a part of the incident light is directly transmitted and a part is diffracted and then trapped in the waveguiding layer. Some of the trapped light is rediffracted out such that it interferes with the transmitted part.
  • ⁇ At a certain wavelength and angular orientation ⁇ a resonance occurs which leads to complete destructive interference. No such light is transmitted.
  • ZOFs possess characteristic reflection and transmission spectra depending on the viewing angle ⁇ and the orientation of the grating lines with respect to the observer ⁇ . For each pair of angles they directly reflect a particular spectral range or colour.
  • Zero-order diffractive filters the light is reflected at a viewing angle which is equal to the incidence angle. More details concerning zero-order diffractive filters can be found in M.T. Gale, "Zero-Order Grating Microstructures" in R.L. van Renesse, Optical Document Security, 2nd Ed., pp. 267 287 . It is known to manufacture ZOFs as laminated foils in roll to roll processes with thermally evaporated ZnS as the HRI layer deposited on foil substrates which were micro-structured by hot-embossing. Such filters are used as security devices.
  • a diffractive microstructure with a short range ordering over at least four times the period of the microstructure is needed.
  • Preferred is a short range ordering over at least 10 times the period.
  • the microstructure must possess a well defined length scale for diffraction to couple light into the wave-guiding layer and out again. Without being bound to theory it is believed that a short range ordering of less than four times the period of the microstructure results in a dramatic drop of the diffraction efficiency.
  • no long range order or rotational symmetry should be present.
  • the microstructure possesses a translational symmetry. As a result no colour change upon lateral moving of the filter in the plane of the filter occurs if the viewing angle is kept constant.
  • FIG. 2 shows SEM images of bead layers fulfilling the criterion and the corresponding FT-spectra.
  • Figures 2a and 2b show the result for a bead layer (bead diameter 595nm, periodicity ca. 650nm) with a mostly cubic short range ordering over smaller length scale compared to the bead layer in figure 2c and 2d (bead diameter 403nm, periodicity 340nm). The latter possesses a mostly hexagonal short range ordering.
  • both FT-analyses of the SEM images show the described ring structure.
  • quasi-crystals lack a translational symmetry but still give diffraction spots in the Fourier Transformation.
  • the periodic microstructures are built up of grains which lead to light scattering.
  • some grains are highlighted by black circles. The scattering modifies the colour effect but does not destroy it if the scattering efficiency is kept low.
  • the period is adjusted.
  • diffractive microstructures with a period in the range of 150 nm to 2 ⁇ m are needed.
  • the period of the microstructures in figure 2 can be adjusted by the bead diameter.
  • Table I parameter suitable range preferred range especially preferred range period of the microstructure ⁇ 150nm - 2000nm 250nm - 1200nm 250nm - 700nm
  • Thickness of waveguiding layer c 30nm - 500nm 80nm - 250nm 80nm - 200nm
  • the microstructure is combined not only with one waveguiding layer, but with a layer stack.
  • a layer stack examples are multilayers of high-low index of refraction material.
  • E.g. a ZnS-MgF 2 -ZnS coating produces stronger colour effects compared to a single ZnS layer as described in the WO2006/038120 .
  • Other possible layer stacks are combinations of the waveguiding layer with a mirror layer and a transparent spacer layer as known from the EP1775142A1 . All these combinations are capable to produce strong colour effects upon tilting with no colour effect upon rotation.
  • microstructure is made up of bead-shaped structures. This is just one possibility which can be realised as described later in this document. All microstructures fulfilling the parameters of table 1 and the criterion in equation 2 are suitable and are within the scope of this invention.
  • microstructures used in the invention can be obtained from self-assembled beads, from self-assembly structures of polymers or block copolymers, by etching a substrate through a mask comprising such microstructures, or by embossing a substrate by means of an embossing tool comprising such replicated microstructures.
  • the microstructures with the short range ordering but large range disordering are based on self-assembled bead layers as described next.
  • the first step is to deposit beads of uniform size on a substrate.
  • the obtained layer can be post-treated e.g. sintered. If the right deposition method and parameters are chosen, a homogeneous layer with the desired short range ordering and long range disordering is obtained. Homogeneous samples of up to 3-inch size were realised.
  • Figure 2 shows SEM images of such layers made up of silica beads (purchased from microParticles GmbH) which were deposited by spin-coating from ethanol solution. The deposition was done at room temperature.
  • beads are e.g. polystyrene, melamine.
  • the beads having a diameter of 403nm and a poly-dispersity index of 0.02 were spin-coated on a 3-inch Si-wafer and sintered for 5h at 800°C.
  • the deposition parameters were chosen to fully coat the substrate with beads. These parameters can vary, depending on the short range order desired. Typically, a concentration of 5 to 10% in weight per volume and a spin speed between 1000 and 2000 round per minutes (rpm) has been used. A first spinning at 500 rpm for 2 seconds is also necessary to obtain homogeneous films within the whole wafer. Most parts of the substrate were coated with a monolayer but small areas showed double layer formation (see figure 3a ). As these areas are on the order of several tenths of micrometers the steps from monolayer to bi-layer do not disturb the light diffraction distinctly.
  • microstructures For mass production of such microstructures - e.g. in roll-to-roll embossing or UV replication processes - the microstructures must be transferred into an embossing tool.
  • Said structures can be formed by a bead layer, by using polymer demixing or block-copolymer phase separation, or by etching the substrate through a mask comprising such structures.
  • the structures can also be micro- and nano-structures obtained by the combination of polymer demixing with block-copolymer phase separation.
  • a silver layer of approximately 300nm thickness was thermally evaporated on top of the bead layer made up of 403nm beads as a starting layer for the subsequent electroforming step ( figure 3b ).
  • the evaporation angle was set to 90° (perpendicular to the surface plane).
  • the thickness was set to 300nm (more than half the bead diameter) to ensure a complete covering of the bead coated substrate with the silver layer. If a lower or higher depth of the microstructure is needed an additional step has to be performed.
  • the depth of the microstructure can be reduced by coating the bead layer with an additional layer. Preferred are evaporation or sputtering processes which lead to a reduced depth due to the correlated surface of the coated layer.
  • Possible materials are MgF2, SiO2 and the like. An increased depth can be realised by etching processes as known in the art wherein the beads act as etch masks (so called colloidal lithography techniques). Other possible materials for the starting layer are e.g. gold or nickel.
  • the silver layer was used as a starting layer for an electroforming step to produce an embossing Ni-Shim. A Nickel layer of 400 ⁇ m thickness was grown in an electroforming bath ( figure 3c ). As the beads were partially embedded in the silver layer, a silver etch step was used to remove the beads together with the silver layer. Due to the structure correlation in the evaporation process the surface of the remaining Ni-Shim still possesses the bead structure.
  • thermoplastic polymers E.g.
  • the polymer substrate or foil can be made of acrylonitrile butadiene styrene ABS, polycarbonate PC, polyethylene PE, polyetherimide PEI, polyetherketone PEK, poly(ethylene naphthalate) PEN, poly(ethylene therephtalate) PET, polyimide PI, poly(methyl methacrylate) PMMA, poly-oxy-methylene POM, mono oriented polypropylene MOPP, polystyrene PS, polyvinyl chloride PVC and the like.
  • the microstructures are embossed in a roll-to-roll process in an embossable layer which is deposited on a carrier substrate, e.g. the above mentioned polymer substrate of foils.
  • embossable layer Possible materials for this embossable layer are synthetic organic polymer material such as ethylene vinyl acetate, polyvinyl acetate, polystyrene, polyurethane and combinations thereof.
  • the embossed PC foil showed a nice and isotropic light diffraction. After deposition of a ZnS waveguiding layer of approximately 90nm thickness in a thermal evaporation step a zero-order diffractive filter with no rotational colour change was realised ( figure 3e ). As expected a colour change upon tilting is still present showing the characteristic peak splitting of ZOF.
  • Non-limiting examples of possible materials for the wave-guiding layer are TiO 2 , Si 3 N 4 , ZrO 2 , Cr 2 O 3 or ZnO. All transparent materials fulfilling the requirements of the needed index of refraction (see equation 1) and transparency may be used.
  • the microstructures with the short range ordering but large range disordering are manufactured by self-assembly processes in polymer blend or block copolymer films.
  • Phase separation of polymer blends occurs when the system is brought from a stable state (single phase) to an unstable or meta-stable state (biphasic).
  • the temperature-quench and solvent-quench methods In the first method, the starting system is a binary polymer blend prepared in the one-phase region to form a homogeneous blend. The system is then subjected to a rapid change in temperature (temperature quench) to bring the blend from the one phase to the two phase region of its phase diagram.
  • the second method uses a ternary system composed of two polymers and a common solvent for both polymers. At low polymer concentrations, the polymer chains are well dissolved and do not interact with neighbouring polymer chains. Upon removal of the solvent, the polymer concentration increases until a threshold value above which the system phase separates. The system then undergoes phase separation until it is completely depleted of solvent.
  • the polymer films made using the solvent quench approach are typically made by means of spin coating.
  • a well known system for polymer demixing is a blend of polystyrene (PS) and poly-methyl-methacrylate (PMMA).
  • Samples prepared from 1% w/v PS(101 kDa)/PMMA(106 kDa) solution coated with 3000 rpm spin velocity were characterised by AFM. Fourier analysis and the power spectrum (2D iso PSD) of the image were made. The length-scales of the domains were then obtained by calculating the invert of the peak positions. Characteristic length-scales of 900 nm were determined. Due to the large period of 900 nm of these microstructures the reflection characteristic of the isotropic ZOF lies in the near infra red spectral region, thus it is not visible to the human eye.
  • Smaller length scales of the microstructures based on the self-assembly processes can be realised by lower concentrations, changing solvent, tuning molecular weight of polymers or by block-copolymer self-assembly processes resulting in isotropic ZOF with reflection peaks in the visible spectral range.
  • Such processes are described e.g. in C. J. Hawker and T. P. Russell “Block Copolymer Lithography: Merging "Bottom- Up” with “Top-Down” Processes" in MRS bulletin, 30, 2005, p.952-966 .
  • Multiscale surface patterning may also be envisioned via e.g. the combination of polymer demixing with block-copolymer phase separation.
  • both micro- and nano- surface structures could be simultaneously prepared with a high control over size and morphologies.
  • both micro- and nano-structures with controlled depth e.g. higher aspect ratio
  • the scope of this invention is not limited to the mentioned methods for manufacturing the microstructures with the short range ordering but large range disordering as defined above. All methods capable of producing such microstructures are possible. Examples of such methods are electron-beam lithography or laser writing.

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EP08155759.7A 2007-05-07 2008-05-07 Filtre diffractif à ordre zéro isotrope Not-in-force EP1990661B1 (fr)

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EP2108944A2 (fr) 2008-04-09 2009-10-14 CSEM Centre Suisse d'Electronique et de Microtechnique SA Recherche et Développement Capteur environnemental optique et procédé de fabrication du capteur
EP2264491A1 (fr) * 2009-06-15 2010-12-22 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Filtre diffractif à ordre zéro et son procédé de fabrication
EP2447744A1 (fr) 2010-11-01 2012-05-02 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Filtre optique pixélisé et son procédé de fabrication
EP2447743A1 (fr) 2010-11-01 2012-05-02 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Filtre optique isotrope et son procédé de fabrication
DE102010051597A1 (de) * 2010-11-16 2012-05-16 Automotive Lighting Reutlingen Gmbh Optisches Linsenelement, Lichtmodul für einen Kraftfahrzeugscheinwerfer mit einem solchen Linsenelement und Kraftfahrzeugscheinwerfer mit einem solchen Lichtmodul
EP2838095A1 (fr) 2013-08-15 2015-02-18 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Dispositif photovoltaïque de collecte de lumière
WO2015036570A1 (fr) 2013-09-13 2015-03-19 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Joint inviolable de guide de lumière
WO2015096859A1 (fr) * 2013-12-23 2015-07-02 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Dispositif de résonance de mode guidé

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DE102009056933A1 (de) * 2009-12-04 2011-06-09 Giesecke & Devrient Gmbh Sicherheitselement mit Farbfilter, Wertdokument mit so einem solchen Sicherheitselement sowie Herstellungsverfahren eines solchen Sicherheitselementes
CN103328176B (zh) * 2011-01-14 2015-07-29 吉坤日矿日石能源株式会社 微细图案转印用模具的制造方法及使用该模具的衍射光栅的制造方法、以及具有该衍射光栅的有机el元件的制造方法
KR101341072B1 (ko) * 2013-09-04 2013-12-19 안재광 복수의 나노 구조물 및 입체 렌즈를 이용한 진품 확인용 라벨
US20220138305A1 (en) * 2019-02-05 2022-05-05 Tokyo Ohka Kogyo Co., Ltd. Authentication object, authentication system, and authentication medium production method

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US5475533A (en) * 1993-08-02 1995-12-12 Applied Physics Research, L.P. Apparatus for enhancing the brightness of an image and method of making the same
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EP1742091A1 (fr) * 2005-07-06 2007-01-10 Avago Technologies General IP Pte. Ltd. Dispositif optique avec propriétés réfractives et diffractives
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EP2108944A2 (fr) 2008-04-09 2009-10-14 CSEM Centre Suisse d'Electronique et de Microtechnique SA Recherche et Développement Capteur environnemental optique et procédé de fabrication du capteur
EP2264491A1 (fr) * 2009-06-15 2010-12-22 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Filtre diffractif à ordre zéro et son procédé de fabrication
US8970955B2 (en) 2009-06-15 2015-03-03 Csem Centre Suisse D'electronique Et De Microtechnique Sa—Recherche Et Developpement Zero-order diffractive filter and method for manufacturing thereof
US9213128B2 (en) 2010-11-01 2015-12-15 Csem Centre Suisse D'electronique Et De Microtechnique Sa - Recherche Et Developpement Isotropic optical filter and method of manufacturing thereof
EP2447744A1 (fr) 2010-11-01 2012-05-02 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Filtre optique pixélisé et son procédé de fabrication
EP2447743A1 (fr) 2010-11-01 2012-05-02 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Filtre optique isotrope et son procédé de fabrication
DE102010051597A1 (de) * 2010-11-16 2012-05-16 Automotive Lighting Reutlingen Gmbh Optisches Linsenelement, Lichtmodul für einen Kraftfahrzeugscheinwerfer mit einem solchen Linsenelement und Kraftfahrzeugscheinwerfer mit einem solchen Lichtmodul
DE102010051597B4 (de) * 2010-11-16 2017-05-11 Automotive Lighting Reutlingen Gmbh Optisches Linsenelement, Lichtmodul für einen Kraftfahrzeugscheinwerfer mit einem solchen Linsenelement und Kraftfahrzeugscheinwerfer mit einem solchen Lichtmodul
EP2838095A1 (fr) 2013-08-15 2015-02-18 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Dispositif photovoltaïque de collecte de lumière
WO2015036045A1 (fr) 2013-09-13 2015-03-19 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Scellé d'inviolabilité à guide de lumière
WO2015036570A1 (fr) 2013-09-13 2015-03-19 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Joint inviolable de guide de lumière
WO2015096859A1 (fr) * 2013-12-23 2015-07-02 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Dispositif de résonance de mode guidé
JP2017503203A (ja) * 2013-12-23 2017-01-26 セエスウエム サントル スイス デレクトロニクエ ドゥ ミクロテクニク ソシエテ アノニム−ルシェルシェ エ デブロップマン 導波モード共鳴デバイス
US9946019B2 (en) 2013-12-23 2018-04-17 CSEM Centre Suisse d'Electronique et de Microtechnique SA—Recherche et Développement Guided mode resonance device

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