EP1873174A4 - Photocurable composition, article with fine pattern and method for producing same - Google Patents

Photocurable composition, article with fine pattern and method for producing same

Info

Publication number
EP1873174A4
EP1873174A4 EP06729706A EP06729706A EP1873174A4 EP 1873174 A4 EP1873174 A4 EP 1873174A4 EP 06729706 A EP06729706 A EP 06729706A EP 06729706 A EP06729706 A EP 06729706A EP 1873174 A4 EP1873174 A4 EP 1873174A4
Authority
EP
European Patent Office
Prior art keywords
fine pattern
article
mass
photocurable composition
mold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP06729706A
Other languages
German (de)
French (fr)
Japanese (ja)
Other versions
EP1873174B1 (en
EP1873174A1 (en
Inventor
Akihiko Asakawa
Yasuhide Kawaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of EP1873174A1 publication Critical patent/EP1873174A1/en
Publication of EP1873174A4 publication Critical patent/EP1873174A4/en
Application granted granted Critical
Publication of EP1873174B1 publication Critical patent/EP1873174B1/en
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C37/0053—Moulding articles characterised by the shape of the surface, e.g. ribs, high polish
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/003—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor characterised by the choice of material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1811—C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C08F220/24—Esters containing halogen containing perhaloalkyl radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/106—Esters of polycondensation macromers
    • C08F222/1065—Esters of polycondensation macromers of alcohol terminated (poly)urethanes, e.g. urethane(meth)acrylates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0833—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using actinic light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32—Component parts, details or accessories; Auxiliary operations
    • B29C43/36—Moulds for making articles of definite length, i.e. discrete articles
    • B29C43/361—Moulds for making articles of definite length, i.e. discrete articles with pressing members independently movable of the parts for opening or closing the mould, e.g. movable pistons
    • B29C2043/3615—Forming elements, e.g. mandrels or rams or stampers or pistons or plungers or punching devices
    • B29C2043/3634—Forming elements, e.g. mandrels or rams or stampers or pistons or plungers or punching devices having specific surface shape, e.g. grooves, projections, corrugations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B29C2059/023—Microembossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0888—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using transparant moulds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
    • B29K2105/0002—Condition, form or state of moulded material or of the material to be shaped monomers or prepolymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2011/00—Optical elements, e.g. lenses, prisms
    • B29L2011/0016—Lenses
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Toxicology (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Thermal Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

Disclosed is a photocurable composition which enables to efficiently produce an article with a fine pattern that is excellent in physical properties such as heat resistance, chemical resistance, mold releasability and optical characteristics (transparency and low refractive index property). Also disclosed is a method for producing an article with a fine pattern which enables to transfer a fine pattern of a mold to the article surface with high accuracy. Specifically disclosed is a photocurable composition characterized by containing 50-98 mass% of a monomer which contains no fluorine atom and has a viscosity at 25˚C of 0.1-100 mPa s, 0.1-45 mass% of a fluorine-containing monomer, more than 0.1 mass% but not more than 20 mass% of a fluorine-containing surfactant and/or a fluorine-containing polymer and 1-10 mass% of a photopolymerization initiator without substantially containing a solvent. Also specifically disclosed is a method for producing an article with a fine pattern, which is composed of a cured material having a surface on which a fine pattern of a mold is transferred, or an article with a fine pattern integrated with a substrate, which method is characterized by using the above-described photocurable composition, a substrate and a mold having a fine pattern on the surface thereof.
EP06729706A 2005-04-21 2006-03-22 Photocurable composition, article with fine pattern and method for producing same Not-in-force EP1873174B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005123583 2005-04-21
JP2005186742 2005-06-27
PCT/JP2006/305739 WO2006114958A1 (en) 2005-04-21 2006-03-22 Photocurable composition, article with fine pattern and method for producing same

Publications (3)

Publication Number Publication Date
EP1873174A1 EP1873174A1 (en) 2008-01-02
EP1873174A4 true EP1873174A4 (en) 2009-09-02
EP1873174B1 EP1873174B1 (en) 2010-07-21

Family

ID=37214589

Family Applications (1)

Application Number Title Priority Date Filing Date
EP06729706A Not-in-force EP1873174B1 (en) 2005-04-21 2006-03-22 Photocurable composition, article with fine pattern and method for producing same

Country Status (7)

Country Link
US (1) US8540925B2 (en)
EP (1) EP1873174B1 (en)
JP (1) JP5286784B2 (en)
KR (1) KR101319775B1 (en)
CN (1) CN101160331B (en)
DE (1) DE602006015628D1 (en)
WO (1) WO2006114958A1 (en)

Families Citing this family (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4736522B2 (en) * 2005-04-28 2011-07-27 旭硝子株式会社 Method of manufacturing processed substrate processed by etching
JP4742665B2 (en) * 2005-04-28 2011-08-10 旭硝子株式会社 Method of manufacturing processed substrate processed by etching
JP4929722B2 (en) 2006-01-12 2012-05-09 日立化成工業株式会社 Photo-curable nanoprint resist material and pattern formation method
KR20090006066A (en) * 2006-04-07 2009-01-14 아사히 가라스 가부시키가이샤 Wire grid polarizer and method for producing the same
KR101345280B1 (en) * 2006-05-24 2013-12-26 엘지디스플레이 주식회사 A resin compositions and in-plane printing process method for use in this
JP5309436B2 (en) * 2006-10-16 2013-10-09 日立化成株式会社 Resin microstructure, method for producing the same, and polymerizable resin composition
JP2008202022A (en) * 2007-01-23 2008-09-04 Fujifilm Corp Curable composition for optical nano imprint lithography, and pattern forming method using the same
JP2008189821A (en) * 2007-02-05 2008-08-21 Fujifilm Corp Photocurable composition
US8142702B2 (en) * 2007-06-18 2012-03-27 Molecular Imprints, Inc. Solvent-assisted layer formation for imprint lithography
EP2159236B1 (en) * 2007-06-20 2012-05-02 Asahi Glass Company, Limited Photocurable composition and process for producing molded object having fine pattern in surface
JP2009048689A (en) * 2007-08-16 2009-03-05 Fujifilm Corp Manufacturing method of magnetic recording medium and magnetic recording medium
JP5424623B2 (en) * 2008-01-21 2014-02-26 キヤノン株式会社 Resin composition and optical element, diffractive optical element and laminated diffractive optical element molded thereby
JP5435879B2 (en) * 2008-02-14 2014-03-05 株式会社ダイセル Curable resin composition for nanoimprint
JP2009214419A (en) * 2008-03-11 2009-09-24 Fujifilm Corp Image forming method and cured matter made by using the same
JP2009222792A (en) * 2008-03-13 2009-10-01 Fujifilm Corp Photosensitive resin composition, and method for forming light-shielding image
WO2009113615A1 (en) * 2008-03-13 2009-09-17 富士フイルム株式会社 Photosensitive resin composition, photosensitive resin hardened film, and method for forming light-shielding image
KR101652680B1 (en) 2008-05-29 2016-08-31 아사히 가라스 가부시키가이샤 Photocurable composition and manufacturing method for a molded body having a fine pattern on the surface
JP2011028823A (en) 2008-10-31 2011-02-10 Asahi Glass Co Ltd Aberration correction device, optical device, and optical head device
WO2010064609A1 (en) 2008-12-05 2010-06-10 旭硝子株式会社 Photocurable composition and method for manufacturing a molded body having a fine surface pattern
CN101767403A (en) * 2008-12-26 2010-07-07 比亚迪股份有限公司 Forming method of intramode decorative product
JP5443772B2 (en) * 2009-01-21 2014-03-19 パナソニック株式会社 Resin composition for composite optical element and composite optical element
WO2010090269A1 (en) * 2009-02-05 2010-08-12 旭硝子株式会社 Photocurable composition and method for producing molded article having surface micropattern
EP2221664A1 (en) * 2009-02-19 2010-08-25 Solvay Solexis S.p.A. Nanolithography process
JP5665329B2 (en) * 2009-03-09 2015-02-04 富士フイルム株式会社 Curable composition for imprint, pattern forming method and pattern
EP2412779A4 (en) * 2009-03-25 2014-01-15 Daikin Ind Ltd Surfactant comprising fluorine-containing polymer
JP5518538B2 (en) 2009-03-26 2014-06-11 富士フイルム株式会社 RESIST COMPOSITION, RESIST LAYER, IMPRINT METHOD, PATTERN FORMED BODY, MAGNETIC RECORDING MEDIUM MANUFACTURING METHOD, AND MAGNETIC RECORDING MEDIUM
US9410006B2 (en) * 2009-05-29 2016-08-09 Nissan Chemical Industries, Ltd. Fluorine-containing highly branched polymer and resin composition containing the same
JP5566639B2 (en) * 2009-07-16 2014-08-06 富士フイルム株式会社 Curable composition for imprint, cured product, and pattern forming method
JP5493635B2 (en) * 2009-09-18 2014-05-14 日油株式会社 Resin composition for color filter protective film and color filter
JPWO2011125800A1 (en) * 2010-03-31 2013-07-11 Jsr株式会社 Curable composition for nanoimprint, semiconductor element, and nanoimprint method
EP2594971A1 (en) 2010-07-15 2013-05-22 Asahi Glass Company, Limited Process for producing metamaterial, and metamaterial
JP5647829B2 (en) * 2010-07-30 2015-01-07 Ａｇｃセイミケミカル株式会社 Photocurable composition and method for producing molded article having fine pattern on surface
CN103038860B (en) 2010-08-04 2016-05-18 旭硝子株式会社 Photocurable composition and surface have the manufacture method of the formed body of fine pattern
TWI480324B (en) * 2010-08-04 2015-04-11 Asahi Glass Co Ltd A photohardenable composition, and a molded article having a fine pattern on its surface
JP5691717B2 (en) * 2010-10-20 2015-04-01 ダイキン工業株式会社 Resin mold material composition for imprint
KR101597880B1 (en) * 2010-10-20 2016-02-25 가부시끼가이샤 도꾸야마 Photo-curable nanoimprint composition, method for forming pattern using the composition, and nanoimprint replica mold comprising cured product of composition
JP2012116108A (en) * 2010-12-01 2012-06-21 Asahi Kasei Corp Resin mold
TWI471693B (en) 2011-11-10 2015-02-01 Canon Kk Photo-curable composition and patterning method using the same
JP5978761B2 (en) * 2012-05-23 2016-08-24 旭硝子株式会社 Photocurable composition for imprint and method for producing molded article having fine pattern on surface
JP6176937B2 (en) 2012-09-19 2017-08-09 キヤノン株式会社 Photo-curable composition for imprint and method for producing film
EP2902416A4 (en) * 2012-09-27 2016-04-13 Jnc Corp Polymerizable composition for photofabrication
TWI495552B (en) * 2012-12-20 2015-08-11 Jiin Ming Industry Co Ltd Method of manufacturing transfer die
RU2537860C2 (en) * 2013-01-09 2015-01-10 Федеральное государственное бюджетное учреждение науки Институт металлоорганической химии им. Г.А. Разуваева Российской академии наук (ИМХ РАН) Photopolymerising composition for single-stage obtaining of polymer nanoporous material with hydrophobic surface of pores, nanoporous polymer material with selective sorptive properties, method of obtaining thereof, method of its obtaining, method of single-stage formation of water-separating filtering elements on its basis and method of purification of organic liquids from water
TWI645252B (en) 2014-12-25 2018-12-21 日商富士軟片股份有限公司 Photocurable composition for imprint, pattern forming method, and element manufacturing method
TW201627431A (en) * 2014-12-25 2016-08-01 Fujifilm Corp Photocurable composition for imprinting, pattern formation method, and device production method
CN105668557B (en) * 2016-01-14 2017-08-25 哈尔滨工业大学 A kind of fixed point chemical modification method of the surface graphene reacted based on Solid-Phase Photochemistry
WO2018173930A1 (en) * 2017-03-23 2018-09-27 Ａｇｃ株式会社 Curable composition for imprinting use, and replica mold and method for producing same
KR20180115396A (en) * 2017-04-12 2018-10-23 삼성디스플레이 주식회사 Photocurable resin and patterned body manufactured therefrom
US11939459B2 (en) 2018-11-26 2024-03-26 Central Glass Company, Limited Photosensitive resin composition, method for producing cured product of fluororesin, fluororesin, fluororesin film, bank and display element
CN111319175B (en) * 2019-01-15 2022-06-07 陈龙 Earphone shell and manufacturing method thereof
US11718580B2 (en) 2019-05-08 2023-08-08 Meta Platforms Technologies, Llc Fluorene derivatized monomers and polymers for volume Bragg gratings
US11780819B2 (en) 2019-11-27 2023-10-10 Meta Platforms Technologies, Llc Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings
US11879024B1 (en) * 2020-07-14 2024-01-23 Meta Platforms Technologies, Llc Soft mold formulations for surface relief grating fabrication with imprinting lithography

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1227114A2 (en) * 2001-01-25 2002-07-31 Telephotonics, Inc. Fluorinated photopolymer composition and waveguide device
US20030166814A1 (en) * 2002-02-28 2003-09-04 David Sparrowe Prepolymer material, polymer material, imprinting process and their use

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2468664A (en) * 1945-08-28 1949-04-26 Du Pont Tetrafluoroethylene copolymers
JPS6131411A (en) * 1984-07-23 1986-02-13 Suriibondo:Kk Curable composition
US5439621A (en) * 1993-04-12 1995-08-08 Minnesota Mining And Manufacturing Company Method of making an array of variable focal length microlenses
US5635331A (en) * 1994-10-13 1997-06-03 Minnesota Mining And Manufacturing Company Substrate and a color proofing article having release agent/adhesive mixture coated thereon
US6482742B1 (en) 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography
JPH10120738A (en) * 1996-10-17 1998-05-12 Toagosei Co Ltd Production of fluorine-containing graft polymer
JP3521054B2 (en) * 1997-08-27 2004-04-19 セントラル硝子株式会社 Composition for powder coating
JP3700365B2 (en) 1997-12-19 2005-09-28 ユニマテック株式会社 Method for producing fluorine-containing graft copolymer
US6334960B1 (en) 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
US6306563B1 (en) * 1999-06-21 2001-10-23 Corning Inc. Optical devices made from radiation curable fluorinated compositions
US6417284B1 (en) * 1999-09-30 2002-07-09 Nexpress Solutions Llc Adhesion priming composition for fluoropolymer coatings
JP2002105141A (en) * 2000-09-28 2002-04-10 Jsr Corp Curing composition and its cured product
US6548219B2 (en) * 2001-01-26 2003-04-15 International Business Machines Corporation Substituted norbornene fluoroacrylate copolymers and use thereof in lithographic photoresist compositions
US6949325B2 (en) * 2003-09-16 2005-09-27 International Business Machines Corporation Negative resist composition with fluorosulfonamide-containing polymer
KR20070084250A (en) 2004-11-30 2007-08-24 아사히 가라스 가부시키가이샤 Mold and process for production of substrates having transferred micropatterns thereon

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1227114A2 (en) * 2001-01-25 2002-07-31 Telephotonics, Inc. Fluorinated photopolymer composition and waveguide device
US20030166814A1 (en) * 2002-02-28 2003-09-04 David Sparrowe Prepolymer material, polymer material, imprinting process and their use

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2006114958A1 *

Also Published As

Publication number Publication date
JPWO2006114958A1 (en) 2008-12-18
US8540925B2 (en) 2013-09-24
JP5286784B2 (en) 2013-09-11
CN101160331A (en) 2008-04-09
DE602006015628D1 (en) 2010-09-02
WO2006114958A1 (en) 2006-11-02
US20080107870A1 (en) 2008-05-08
EP1873174B1 (en) 2010-07-21
KR20080000598A (en) 2008-01-02
CN101160331B (en) 2010-12-15
EP1873174A1 (en) 2008-01-02
KR101319775B1 (en) 2013-10-17

Similar Documents

Publication Publication Date Title
EP1873174A4 (en) Photocurable composition, article with fine pattern and method for producing same
KR101219354B1 (en) Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
CN101679568B (en) Photocurable composition and process for producing molded object having fine pattern in surface
EP1818366A4 (en) Resin composition for optical material, resin film for optical material and optical waveguide using same
ATE541231T1 (en) PROCESS FOR PRODUCTION OF AN OPTICAL FILM WAVEGUIDE
KR20110021727A (en) Photocurable composition and manufacturing method for a molded body having a fine pattern on the surface
KR20170093229A (en) Poly- or prepolymer composition, or embossing lacquer comprising such a composition and use thereof
CN102639636A (en) Methods for increasing the ion permeability of contact lenses
TWI427113B (en) Curable resins and articles made therefrom
CN104737272A (en) Photocurable resin composition for imprinting, method for producing mold for imprinting, and mold for imprinting
TW200619232A (en) The curable composition, the method of manufacturing fine structure, and the method of forming pattern
JP5406522B2 (en) Precision optical component molding composition
JP2005227701A (en) Curable organopolysiloxane composition for optical transmission member, flexible optical transmission member comprising organopolysiloxane hardened product, and method for manufacturing flexible optical transmission member
JP2008533228A5 (en)
CN101120061A (en) Compositions for articles comprising replicated microstructures
JP2014223795A (en) Method for producing component
US11635683B2 (en) Method for manufacturing device, and composition
JP2011178155A (en) Resin mold, molded object, and method for manufacturing molded object
JP6442602B2 (en) Optical sheet containing nanopattern and method for producing the same
TW201829475A (en) Curable composition for imprinting, cured object, pattern formation method, and lithography method
TWI707910B (en) Photo-curing resin composition and optics formed by using the same
Jin et al. Replication of micro optical element with continuous relief profile in fused silica using UV-embossing and reactive ion etching
KR20150039454A (en) Acrylic plastic lens for dispersion of light and the method of preparing it
KR101091521B1 (en) Manufacturing method of optical sheet using homogeneous resin composition
JP7346411B2 (en) Curable resin composition, (meth)acrylic elastomer and sheet

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20071025

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR

DAX Request for extension of the european patent (deleted)
A4 Supplementary search report drawn up and despatched

Effective date: 20090805

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: NL

Ref legal event code: T3

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

REF Corresponds to:

Ref document number: 602006015628

Country of ref document: DE

Date of ref document: 20100902

Kind code of ref document: P

REG Reference to a national code

Ref country code: SE

Ref legal event code: TRGR

REG Reference to a national code

Ref country code: ES

Ref legal event code: FG2A

Effective date: 20101209

LTIE Lt: invalidation of european patent or patent extension

Effective date: 20100721

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100721

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100721

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101121

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100721

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101122

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100721

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101021

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100721

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101022

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100721

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100721

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100721

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100721

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100721

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100721

26N No opposition filed

Effective date: 20110426

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 602006015628

Country of ref document: DE

Effective date: 20110426

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20110331

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

REG Reference to a national code

Ref country code: IE

Ref legal event code: MM4A

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20110331

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20110322

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20110331

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20120321

Year of fee payment: 7

Ref country code: IT

Payment date: 20120317

Year of fee payment: 7

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: ES

Payment date: 20120419

Year of fee payment: 7

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20110322

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100721

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100721

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20130322

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20130322

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20130322

REG Reference to a national code

Ref country code: ES

Ref legal event code: FD2A

Effective date: 20140610

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20130323

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 20150319

Year of fee payment: 10

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: AT

Payment date: 20150320

Year of fee payment: 10

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: BE

Payment date: 20150319

Year of fee payment: 10

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 11

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160331

REG Reference to a national code

Ref country code: AT

Ref legal event code: MM01

Ref document number: 474864

Country of ref document: AT

Kind code of ref document: T

Effective date: 20160322

REG Reference to a national code

Ref country code: NL

Ref legal event code: MM

Effective date: 20160401

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160401

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160322

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 12

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 13

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20180323

Year of fee payment: 13

REG Reference to a national code

Ref country code: DE

Ref legal event code: R081

Ref document number: 602006015628

Country of ref document: DE

Owner name: AGC INC., JP

Free format text: FORMER OWNER: ASAHI GLASS CO., LTD., TOKIO/TOKYO, JP

Ref country code: DE

Ref legal event code: R082

Ref document number: 602006015628

Country of ref document: DE

Representative=s name: MUELLER-BORE & PARTNER PATENTANWAELTE PARTG MB, DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20190331

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: SE

Payment date: 20200323

Year of fee payment: 15

Ref country code: DE

Payment date: 20200320

Year of fee payment: 15

REG Reference to a national code

Ref country code: DE

Ref legal event code: R119

Ref document number: 602006015628

Country of ref document: DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210323

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20211001